Method for removing object parts from objects and carrier system

Abstract

The invention relates to a method for removing object parts from objects, in which material defects are locally induced (80) in an object material along object parts to be removed; the object parts are removed (88) from the objects by etching the objects in an etching medium which etches the object material containing the material defects more strongly than defect-free object material; the objects are arranged (82) in a holder (40) before the etching; the holder (40) is arranged (84) in a filter basket (10) before the etching; for the purpose of etching the objects, at least some of a carrier system (60) formed from the filter basket (10) with the holder (40) arranged therein is arranged (86) in the etching medium; at least a portion of the object parts removed from the objects are retained (90) in the filter basket. The invention further relates to a filter basket and a holder and to a carrier system for carrying out the method.

Description

[0001] REN060DE0 18.07.2024

[0002] 1

[0003] Methods for extracting object parts from objects and support systems

[0004] The invention relates to a carrier system, a filter basket and a holder, which represent sub-elements of the carrier system, and a method for removing object parts from objects.

[0005] In many technical fields, it is necessary to extract object components from objects. More recently, the need has arisen to create structures in the millimeter or micrometer range and to extract object components of this size from objects. This is the case, for example, in the semiconductor industry and especially in the manufacturing of integrated circuits. Complex and customized structures in these size ranges are required for embedding and contacting a wide variety of components. These structures are often embedded in substrates, frequently glass substrates.

[0006] One way to create the desired small-scale structures is to induce material defects in the objects, often achieved using laser irradiation. The material defects are induced in the object material in the shape of the structure to be produced. Subsequently, the objects are selectively etched, for example, in an etching solution. In this selective etching process, the areas with material defects are etched more intensely than the surrounding areas. This makes it possible to remove parts of the objects and thus create the desired structures. REN060DE0 18.07.2024

[0007] 2

[0008] However, object fragments remaining in the etching medium can cause damage to system components such as pumps or pipelines used to circulate the etching medium. A known measure to prevent such damage is to install filters upstream of pumps or pipelines. These filters, however, can become clogged and consequently impair the flow of the etching medium. Such filters therefore require extensive maintenance, such as filter replacement, which involves process interruptions.

[0009] Furthermore, detached object particles remaining in the etching medium impair the etching rate, as these particles are continuously etched. Consequently, they also shorten the service life of the etching medium, sometimes referred to as its lifetime. A known measure to reduce this problem is to drain the etching medium, clean the filters by backflushing with a backflushing solution, and remove the detached object particles from the system. This process always requires discarding a portion of the etching medium, which also increases the overall process effort.

[0010] Against this background, the present invention is based on the objective of providing a cost-effective and reliable method for extracting object parts from objects. This objective is achieved by a method with the features of claim 13.

[0011] Furthermore, the invention is based on the objective of providing suitable means for carrying out this method. This objective is achieved by a carrier system according to claim 11, a filter basket according to claim 1, and a holder according to claim 9. The holder and the filter basket constitute REN060DE0 18.07.2024

[0012] Three cooperating sub-elements of the support system, which complement each other.

[0013] Advantageous further developments are each the subject of dependent subclaims.

[0014] The filter basket according to the invention is suitable for receiving a holder and has a bottom wall which is provided with openings through which a fluid can flow. Furthermore, at least one side wall is provided. This side wall has openings through which the fluid can flow. A fluid is a flowable medium in a liquid or gaseous state. In particular, it can be an etching medium in a liquid or gaseous state.

[0015] The described filter basket allows objects to be arranged in the holder, the holder to be placed in the filter basket, and the fluid to be directed through the openings to the objects for treatment. Simultaneously, detached object fragments can be retained in the filter basket. These fragments, along with the filter basket, can be easily separated from the fluid, for example, by removing the filter basket from the etching solution. The filter basket thus eliminates the need for the filter systems for pumps and pipelines described above or significantly extends their maintenance intervals. Furthermore, the relatively simple removal of detached object fragments from the etching medium extends the service life of the etching medium. Realizing even one of these advantages already reduces the process effort. REN060DE0 18.07 .2024.

[0016] 4

[0017] Advantageously, at least two side walls are provided with openings through which the fluid can flow. This allows for larger fluid flows even with small openings. Preferably, the aforementioned at least two side walls are arranged opposite each other. This has proven to be advantageous from a fluid dynamics perspective in certain applications.

[0018] Advantageously, the bottom wall and / or at least one side wall has at least one mesh, the mesh of which forms at least a portion of the flowable openings. In this way, comparatively small openings, such as those required for retaining detached object parts with sizes in the micrometer or millimeter range, can be provided in large numbers at low cost. Preferably, both the at least one side wall and the bottom wall have a mesh, the mesh of which forms at least a portion of the flowable openings. This makes it possible to provide a further increased number of openings. To increase the number of openings even further, it is particularly preferable that the bottom wall and each side wall have at least one mesh, the mesh of which forms at least a portion of the flowable openings.

[0019] In an advantageous embodiment, the meshes of all nets arranged in the bottom wall and / or at least one side wall provide a total of at least 80% of the total flowable area formed by all flowable openings. Openings that are not intended to be flowed through by the fluid in the intended application of the filter basket and are therefore not flowed through by the fluid during normal operation, for example, a loading opening located on the top, do not constitute flowable openings in REN060DE0 18.07.2024

[0020] 5. These meshes represent the present meaning and do not contribute to the total flowable area. Preferably, the meshes of all nets arranged in the bottom wall and / or the at least one side wall together provide at least 90% of the total flowable area, particularly preferably at least 95%. In this way, the advantageous effects of the nets, including their reliable retention effect, can be utilized to the greatest extent possible.

[0021] It has proven advantageous to manufacture one or more of the nets from a metal mesh, as these can be produced relatively inexpensively with the mesh size required for each specific application. In many applications, the material properties of metals or metal alloys can also be beneficial, as will be explained below. Alternatively, one or more of the nets can be made from a temperature-resistant plastic, such as polyetheretherketone, commonly known as PEEK. Another option is to manufacture one or more of the nets from a composite material with a core material coated with a temperature-resistant layer. Suitable materials for the temperature-resistant coating include, for example, polytetrafluoroethylene (PTFE) or perfluororalkoxy polymers (PFA).

[0022] Advantageously, the bottom wall and / or at least one side wall has a honeycomb structure. The at least one mesh is arranged within the cells of this honeycomb structure. In this way, the mechanical stability of the bottom wall and / or at least one side wall can be improved and adapted to the requirements of the respective application, while simultaneously providing a large number of flow-through openings. REN060DE0 18.07.2024

[0023] 6

[0024] Advantageously, the honeycomb structure is formed from honeycombs that have the shape of a regular hexagon, an equilateral triangle, or a rhombus. This makes it possible to stabilize the bottom wall and / or the side walls to the extent required for the respective application, while simultaneously maximizing the surface area of ​​the mesh.

[0025] In one embodiment, all meshes and / or all honeycomb structures consist of a nickel alloy with a nickel content > 95%, preferably nickel alloy N1201 (which in this context refers to material LC-N199 according to DIN 17740, material number 2.4068), and particularly preferably of pure nickel. Meshes and / or honeycomb structures designed in this way are corrosion-resistant at temperatures above 120°C in alkaline etching media. Filter baskets with such meshes and / or honeycomb structures can therefore be used in all alkaline etching media, for example NaOH, KOH, or LiOH, over a wide temperature and concentration range. This is particularly suitable for etching glass or semiconductor materials in a temperature range of 80°C to 170°C and a concentration range of 25% to 80%.Etching processes in alkaline media are less hazardous and less environmentally damaging than comparable etching processes in acidic media. Furthermore, many glass materials can be etched more controllably and selectively in alkaline media than in acidic media. The corrosion resistance at high temperatures allows for higher process temperatures and, consequently, higher etching rates, thus shortening process times. In a particularly advantageous design of the filter basket, all other aspects are therefore also covered by REN060DE0 18.07.2024.

[0026] 7. Components of the filter basket that come into contact with an etching medium are made of the nickel materials mentioned above, preferably pure nickel. As an alternative to manufacturing filter basket components from the aforementioned nickel materials, it may be considered to manufacture the core of the filter basket components from a different material and coat them with the aforementioned nickel materials. This may offer cost and / or manufacturing advantages in the respective application. Similar to the meshes, the filter basket components may alternatively be made of a temperature-resistant plastic, for example, PEEK. In addition, it is possible to manufacture one or more of the filter basket components from a composite material that has a core material provided with a temperature-resistant coating. Suitable materials for the temperature-resistant coating include, for example, PTFE or PFA.

[0027] To reliably filter out even the smallest object particles, especially tiny glass particles, and to correspondingly increase the service life of an etching medium, the mesh sizes of all nets are advantageously chosen to be smaller than 100 pm. Preferably, these mesh sizes are smaller than 50 pm and particularly preferably smaller than 25 pm.

[0028] The holder according to the invention is suitable for being arranged in the filter basket described above. It has receiving devices for several objects. Furthermore, a bottom area through which a fluid can flow and a top area through which the fluid can flow are provided. The receiving devices are designed and arranged such that, when objects are held in the receiving devices, the fluid can flow from the bottom area along the objects into the top area. This enables efficient treatment of the objects. REN060DE0 18.07.2024

[0029] 8. The holder, in conjunction with the fluid (e.g., an etching solution) and the filter basket, efficiently retains dissolved object parts within the filter basket. The holder is advantageously designed for placement within the filter basket.

[0030] In one embodiment, the holder is configured to hold planar substrates. These are preferably glass or semiconductor substrates. Substrates in this context are defined as bodies with two opposing surfaces that are significantly larger than the connecting edges. For example, glass sheets, wafers, and the like are substrates. Such substrates are frequently used in the semiconductor industry, microsystems technology, microelectronics, and other technical fields to create structures within the substrate. The holder configured as described above can therefore be used profitably in these areas.

[0031] Advantageously, the substrate receiving devices are arranged and configured to hold the substrates inclined at an angle α relative to a vertical direction. The angle α is a maximum of 30°. Preferably, it is at least 1° and a maximum of 15°, and particularly preferably at least 2° and a maximum of 10°. In this way, the removal of substrate parts from the substrates can be facilitated without unduly impeding the fluid flow.

[0032] A further training system provides for several loading surfaces as receiving devices, onto which the substrates can be placed. These loading surfaces are arranged at a distance from each other. This allows for a comparatively unproblematic loading process. (REN060DE0 18.07.2024)

[0033] 9

[0034] Unloading the holder with the substrates. The proportion of the substrate area shaded from the fluid by the contact surfaces can be minimized. Preferably, slots are provided as additional receiving devices. These are arranged and configured to receive sections of the substrates. In this way, the substrates can be better secured against slipping in the holder. The slots are particularly preferably arranged in the bottom area of ​​the holder. This has proven advantageous during unloading of the holder.

[0035] The support system according to the invention comprises a filter basket according to any one of claims 1 to 8 and a holder according to any one of claims 9 to 10. The holder can be arranged in the filter basket. The holder and the filter basket constitute cooperating sub-elements of the support system, which complement each other. Both the holder and the filter basket can be configured in any of the ways described above.

[0036] The described carrier system allows multiple objects to be held in the holder and easily and conveniently arranged in the filter basket using the holder, as well as easily removed from the filter basket. After object parts have been removed from the objects, the holder with the objects can be removed from the filter basket. Removed object parts adhering to the objects or the holder can be separated from the objects and the holder relatively easily in a single rinsing step. Likewise, the filter basket can be cleaned of any retained, removed object parts in a single rinsing step. These rinsing steps are expediently carried out in a separate rinsing basin. By providing multiple carrier systems, objects arranged in one of the multiple carrier systems can be processed simultaneously. REN060DE0 18.07.2024

[0037] 10 other carrier systems are simultaneously cleaned of detached object parts and prepared for processing the next objects. In this way, a virtually continuous refinement of objects can be reliably and cost-effectively achieved.

[0038] If the holder is arranged in its operating position within the filter basket, the side walls of the filter basket, viewed vertically, advantageously extend upwards beyond at least one upper edge section of the holder. The side walls thus project upwards beyond this at least one upper edge section. In this way, it can be ensured for liquid and, to some extent, also for gaseous fluids that fluid components flowing through the support system flow over an upper edge of the filter basket, but not over the side walls of the filter basket. Consequently, particles carried in a fluid flow or floating and detached can be reliably retained by the filter basket without the need for a lid or similar device. Thus, a lid, which would increase the loading and unloading effort, can be dispensed with.

[0039] In the inventive method for extracting object parts from objects, material defects are first locally induced in an object material along the object parts to be extracted. This is preferably done by means of laser irradiation. The induction of material defects along the object parts to be extracted can be carried out in such a way that the material defects are arranged along boundary lines surrounding the object parts to be extracted. The material defects can be arranged at intervals from one another along the boundary lines. Alternatively, the material defects can be arranged directly adjacent to one another along REN060DE0 18.07.2024

[0040] The elements can be arranged along the boundary line or overlapping each other along the boundary line. The described arrangement options can be combined. Material defects can consist of the removal of object material or the modification of an originally existing object material. Furthermore, the object parts are extracted from the objects by etching the objects in an etching medium that etches object material containing the material defects more strongly than defect-free object material. Such etching is referred to here as selective etching. Further information and implementation variants for inducing material defects and selective etching are described in DE 10 2022 120 050 A1.

[0041] The method according to the invention further provides that the objects are arranged in a holder before etching. Preferably, the holder according to claim 9 in one of its manifestly disclosed embodiments is used. The holder is arranged in a filter basket according to the invention before etching. Preferably, the filter basket according to claim 1 in one of its manifestly disclosed embodiments is used. A support system formed from the filter basket with the holder arranged therein is placed at least partially in the etching medium for the purpose of etching the objects. At least a portion of the object parts removed from the objects is retained in the filter basket.

[0042] The described method makes it possible to dispense with the installation of filter systems upstream of pumps or pipelines, or to significantly extend the maintenance intervals of such filter systems. Furthermore, detached object parts can be removed from the etching medium relatively easily by...

[0043] The filter basket is removed from the etching medium. In this way REN060DE0 18.07.2024

[0044] 12. In this way, a reduction in etching speed caused by etching products resulting from the etching of dissolved object particles that have accumulated in the etching medium can be avoided to a significant extent and in a cost-effective manner. The service life of the etching medium can therefore be extended. Furthermore, the now possible, cost-effective removal of dissolved object particles from the etching medium prevents the homogeneity of the etching medium flow from being compromised by dissolved object particles remaining in the etching medium.

[0045] Preferably, at least 90% by mass of the dissolved object parts, and particularly preferably at least 95% by mass of the dissolved object parts, are retained in the filter basket.

[0046] It can be provided that all object parts extending over a length of 100 pm or more in their smallest direction of expansion are retained in the filter basket. Particularly preferred is the retention of all object parts extending over a length of 50 pm or more in their smallest direction of expansion. And particularly preferred is the retention of all object parts extending over a length of 25 pm or more in their smallest direction of expansion. As described above, plant components such as pumps or pipelines can thus be protected cost-effectively against the damaging effects of the object parts. Retaining object parts extending over a length of 25 pm or more in their smallest direction of expansion has proven particularly effective in this context.With this design variant, any damaging effect of the object components on plant components could be largely ruled out. REN060DE0 18.07.2024.

[0047] 13

[0048] In one implementation of the process, selective etching continues until the object parts to be removed are completely detached. Compared to leaving bridges of object material and separating them by applying force, this reduces the risk of breakage in the objects, especially in substrates. Furthermore, smoother edge surfaces can be achieved.

[0049] The carrier system according to the invention can advantageously be used to carry out the described method. This also applies to the filter basket and the holder according to the invention.

[0050] A further development provides for the creation of an etching medium flow, by means of which the etching medium is guided at least partially through the bottom wall of the filter basket and the bottom area of ​​the holder along the objects. This enables reliable and uniform etching of the objects. Preferably, the aforementioned etching medium flow is maintained for at least 60% of the etching time, particularly preferably for at least 90% of the etching time, and ideally for the entire etching time.

[0051] Advantageously, essentially all of the etching medium introduced into the filter basket is discharged through the filter basket's side walls or bottom wall. In this way, all ejected object particles can be filtered by the filter basket and consequently retained within it. As a result, no ejected object particles remain in the etching medium, and its service life can be significantly extended. Plant areas located outside the filter basket remain unaffected by ejected object particles during proper operation. The risk of injury from sharp particles is eliminated.

[0052] 14

[0053] Etching medium prevents the formation of object fragments, such as glass pieces. Furthermore, failure or damage to system components like pumps or pipelines caused by detached object fragments can be completely avoided, eliminating the need for separate, maintenance-intensive filters on these components.

[0054] It has proven advantageous to direct at least 60% of the etching medium introduced into the filter basket out through the filter basket's side walls, preferably at least 80%, and particularly preferably at least 90%. This allows for particularly homogeneous etching results combined with good filtering performance from the filter basket. Preferably, the etching medium, guided along the objects, exits the holder via an upper edge of a side wall and is then directed out of the filter basket through a side wall. This has been shown to be conducive to homogeneous etching results.

[0055] Advantageously, the etching medium discharged from the filter basket is reused. For this purpose, a circulation system for the etching medium can be provided.

[0056] In an advantageous variant of the process, after etching, the support system is removed from the etching medium and the holder is separated from the filter basket. Subsequently, the filter basket is cleaned of any remaining, detached object parts. This is preferably done by rinsing the filter basket in a separate rinsing tank. In this way, detached object parts can be easily and conveniently removed from the etching medium. The processing of objects can be carried out simultaneously using one or more other REN060DE0 18.07.2024

[0057] 15

[0058] The carrier systems and filter baskets can be used continuously. Process interruptions that increase the workload can therefore be avoided. After cleaning, the filter basket can be reused. The holder can be cleaned similarly after etching to remove any detached object parts adhering to it or the objects. Whether this is necessary after every etching process for the holder can be assessed in each specific application.

[0059] The invention will now be explained in more detail with reference to the figures. Where expedient, elements with the same effect are provided with the same reference numerals. The invention is not limited to the embodiments shown in the figures – not even with regard to functional features. The preceding description as well as the subsequent description of the figures contains numerous features, some of which are summarized in the dependent subclaims. However, those skilled in the art will also consider these features, as well as all other features disclosed above and in the subsequent description of the figures, individually and combine them into meaningful further combinations. In particular, all the aforementioned features can each be combined individually and in any suitable combination with the filter basket according to claim 1 and / or the holder according to claim 9 and / or the support system according to claim 10 and / or the method according to claim 13.They show:

[0060] Figure 1 Arranging an embodiment of a holder in an embodiment of a filter basket for the purpose of forming an embodiment of a carrier system

[0061] Figure 2 Section through the holder from Figure 1 in a projection position REN060DE0 18.07.2024

[0062] 16

[0063] Figure 3 Section through the filter basket from Figure 1 in a projection position

[0064] Figure 4: Top view of the filter basket from Figure 1

[0065] Figure 5 Sectional view of the filter basket from Figure 1 along line AA

[0066] Figure 6 Side view of the filter basket from Figure 1

[0067] Figure 7 Enlarged detail view of sub-areas C, D, E from Figures 4, 5, 6

[0068] Figure 8 Top view of the holder from Figure 1

[0069] Figure 9 Sectional view of the holder from Figure 1 along line AA

[0070] Figure 10 Sectional view of the holder from Figure 1 along line BB

[0071] Figure 11 Support system formed with the filter basket and the holder from Figure 1

[0072] Figure 12 Top view of the support system from Figure 11

[0073] Figure 13 Sectional view of the support system from Figure 11 along line AA

[0074] Figure 14 Sectional view of the support system from Figure 11 along line BB REN060DE0 18.07.2024

[0075] 17

[0076] Figure 15 Further section through the support system from Figure 11 in a projection view

[0077] Figure 16 Schematic representation of an exemplary embodiment of the method according to the invention

[0078] Figure 17 Schematic representation of the formation of an etching medium flow

[0079] Figure 1 shows an embodiment of a holder 40 according to the invention and an embodiment of a filter basket 10 according to the invention. The filter basket 10 is suitable and designed to receive the holder 40. The holder 40 is positioned in the filter basket 10 by inserting it into the filter basket 10, as indicated by an arrow in Figure 1.

[0080] Figure 2 shows a projection view of a section through the holder 40 from Figure 1. A projection view of a section through the filter basket 10 from Figure 1 is shown in Figure 3. Figure 11 shows the filter basket 10 with the holder 40 arranged therein. The insertion of the holder 40 into the filter basket 10, indicated by the arrow in Figure 1, is completed in the representation of Figure 11. Figures 1 and 11 simultaneously illustrate an embodiment of a support system 60 according to the invention, which comprises the filter basket 10 and the holder 40 that can be arranged therein.

[0081] Details of the filter basket 10 from Figure 1 can be seen in Figures 4 to 7. Figure 4 shows a top view of the filter basket 10, Figure 5 a sectional view of the filter basket 10 along a line AA shown in Figure 4. A side view of the filter basket 10 from Figure 1 is shown in Figure 6. As can be seen from Figures 1 and 4 to 6, REN060DE0 18.07.2024

[0082] The filter basket 10 has a side wall 16, a narrow side wall 18, and a bottom wall 12. In the present embodiment, the side walls opposite the side wall 16 and the narrow side wall 18 are each designed analogously. The bottom wall 12 and each side wall 16, 18 each have a honeycomb structure 20. This is formed from honeycombs 22. Figure 7 shows an enlarged detail view of sub-areas C, D, E of the illustrations from Figures 4, 5, and 6. As can be seen in Figure 7, a mesh 13 is arranged in all honeycombs 22 of the honeycomb structure 20. Meshes 14 of the mesh 13 form flow-through openings in the side walls 16, 18, and the bottom wall 12. They can be permeated by a fluid, especially an etching solution.

[0083] In the present embodiment, the mesh 13 is formed from a metal fabric and consists of the aforementioned nickel alloy N1201. The honeycomb structures 20, as well as all other components of the filter basket 10 and the holder 40, are preferably also made of this nickel alloy. Consequently, the support system 60 exhibits the advantageous corrosion resistance described above in alkaline etching media over a wide temperature range and wide concentration ranges of the alkaline etching media.

[0084] The honeycombs 22 have the shape of a regular hexagon. The honeycomb structure 20 formed from the honeycombs 22 stabilizes the side walls 16, 18 and the bottom wall 12. At the same time, it makes it possible to cover large surface areas of the side walls 16, 18 and the bottom wall 12 with the meshes 13, so that even with small mesh sizes of the meshes 14, a sufficient flow of the fluid, in particular an etching solution, is ensured for the respective application. REN060DE0 18.07.2024

[0085] The protection of the 19 walls 16, 18 and the bottom wall 12 can be ensured. In this way, mesh sizes in the micrometer range can easily be provided. In the present embodiment, the mesh sizes of all nets 13 are smaller than 25 µm. This makes it possible to retain even the smallest object parts, which extend over a length of 25 µm or more in their smallest direction of expansion, in the filter basket 10. In this way, the service life of the etching media used, especially etching solutions, can be advantageously extended. As explained above, system components such as pumps or pipelines can be protected cost-effectively against the damaging effects of the object parts.

[0086] Details of the holder 40 from Figure 1 are shown in Figures 8 to 10. Figure 8 shows a top view of the holder 40, Figure 9 a sectional view of the holder 40 along line AA shown in Figure 8. A sectional view of the holder 40 along line BB shown in Figure 8 is shown in Figure 10. As can be seen in Figures 1 and 8 to 10, the holder 40 has recesses 43a, 43b in a base region 42, allowing a fluid to flow through the base region 42. A head region 44 is open and thus also allows the fluid, for example an etching solution, to flow through it.

[0087] The present embodiment of the holder 40 is designed to hold planar substrates, in particular glass or semiconductor substrates. For this purpose, several contact surfaces 46 are provided as receiving devices, which are arranged at intervals from one another. The substrates to be held can be placed against these contact surfaces 46. Substrates 62 placed against the contact surfaces 46 are shown by way of example in Figure 17. REN060DE0 18.07.2024

[0088] 20

[0089] Slots 50 are provided as further receiving devices. In the present embodiment, the slots 50 are arranged in a strut 48 located in the base area 42. The arrangement of the slots 50 in the base area 42 has proven particularly advantageous in applications where the holder 40 is unloaded by tipping it upside down.

[0090] As can be seen in Figure 10, the contact surfaces 46 and the slots 50 are arranged and configured to hold the substrates inclined at an angle α relative to a vertical direction. Furthermore, the contact surfaces 46 and the slots 50 are designed and arranged such that, when substrates 62 are held in them, the fluid can flow from the bottom region 42 along the substrates 62 into the top region 44. This is particularly evident in Figure 17, which schematically illustrates the flow of an etching solution 67 through the holder 40 by means of black flow arrows.

[0091] Details of the support system 60 from Figure 11 can be seen in Figures 12 to 15. These figures show the support system 60 in a state in which the holder 40 is arranged in the filter basket 10 in its operating position. As can be seen particularly in Figures 13 and 14, in this state the side walls 16, 18 of the filter basket 10 extend upwards in the vertical direction beyond an upper edge section 52 of the holder 40. In this state, the side walls 16, 18 are therefore located above the upper edge section 52 of the holder 40. In this way, it can be ensured that a fluid flowing through the support system 60 flows over the upper edge section 52 and thus over an upper edge of the holder 40, but not over the side walls 16, 18 of the filter basket 10. As explained above, this can consequently lead to a change in the procedure and REN060DE0 18.07.2024

[0092] 21 so that the lid on the filter basket 10, which impairs the procedural effort, can be dispensed with.

[0093] Figure 16 illustrates a first embodiment of the method according to the invention by means of a schematic diagram. In this embodiment, the filter basket 10, the holder 40, and the support system 60 formed from them are used, which have been described in more detail in connection with Figures 1 to 15. Therefore, the corresponding reference numerals are used in the description of the embodiment. In the aforementioned first embodiment, substrates are used as objects. Accordingly, substrate parts are extracted from the substrates. For this purpose, material defects are first locally induced in a substrate material along the substrate parts to be extracted 80. In the present embodiment, this is done by means of laser irradiation. Substrates treated in this way are then arranged in the holder 40 82. The holder 40 is then arranged in the filter basket 10 84.

[0094] The carrier system 60 formed in this way is subsequently placed in an etching solution 86. The substrate particles are then selectively etched from the substrates in the etching solution 88. The detached substrate particles are retained in the filter basket 10 90. After completion of the etching process, the carrier system 60 is removed from the etching solution 92. The holder 40 is then separated from the filter basket 10 94. The filter basket 10 is rinsed in a separate basin 96 and thus cleaned of the detached and retained substrate particles.

[0095] Figure 17 illustrates a further embodiment of the method according to the invention. This further embodiment comprises all process steps of the embodiment from REN060DE0 18.07.2024.

[0096] 22

[0097] Figure 16. To carry out the method, the filter basket 10, the holder 40, and the support system 60 are used, which have been explained with reference to Figures 1 to 15. In this further embodiment of the method according to the invention, an etching solution flow 66 is formed for the purpose of removing substrate parts 88 by selectively etching the substrates 62 in the etching solution 67. By means of this etching solution flow 66, the etching solution 67 is guided along the substrates 62 through the bottom wall 12 of the filter basket 10 and the bottom area 42 of the holder 40.

[0098] The etching solution 67, guided along the substrates 62, is discharged from the holder 40 via an upper edge 53 of a side wall 55 of the holder 40 97 and subsequently discharged from the filter basket 10 through the side walls 16, 18 of the filter basket 10 98. In this way, it enters a container 100 free of dissolved substrate particles. The etching solution 67, filtered in this manner, flows over the container 100 via 99, is collected, and is reintroduced into the carrier system 60 via a feed line 64.

[0099] REN060DE0 18.07.2024

[0100] 23

[0101] Reference character list

[0102] 10 filter baskets

[0103] 12 Floor wall

[0104] 13 network

[0105] 14 stitches

[0106] 16 side wall

[0107] 18 Narrow side wall

[0108] 20 honeycomb structure

[0109] 22 honeycombs

[0110] 40 holders

[0111] 42 Floor area

[0112] 43a Exemption

[0113] 43b Exclusion

[0114] 44 Head area

[0115] 46 Plant area

[0116] 48 Strut

[0117] 50 slots

[0118] 52 Upper edge section

[0119] 53 Top edge

[0120] 55 side wall

[0121] 60 carrier system

[0122] 62 Substrat

[0123] 64 Supply line

[0124] 66 Etching solution flow

[0125] 67 Etching solution

[0126] 80 Local induction of material defects in substrate material by means of laser irradiation

[0127] 82 Arrangement of substrates in holders

[0128] 84 Arrangement of holders in filter basket

[0129] 86 Arrangement of support system in etching solution

[0130] 88 Extraction of substrate parts by selective etching of the substrates in etching solution REN060DE0 18.07.2024

[0131] 24

[0132] 90 Retaining detached substrate particles in the filter basket

[0133] 92 Removal of carrier system from etching solution

[0134] 94 Separation of filter basket holder 96 Flushing filter basket in separate sink

[0135] 97 Drain etching solution from holder

[0136] 98 Draining etching solution from filter basket

[0137] 99 Etching solution overflows container

[0138] 100 containers at an angle of inclination relative to the vertical

Claims

1. REN060DE0 18.07.2024 25 Patent claims 1. Filter basket (10) having a holder (40) - a bottom wall (12) provided with openings (14) through which a fluid can flow; - at least one side wall (16, 18) provided with openings (14) through which the fluid can flow.

2. Filter basket (10) according to claim 1, characterized in that the bottom wall (12) and / or the at least one side wall (16, 18) has at least one mesh (13) whose meshes (14) form at least a part of the flowable openings (14), wherein preferably the bottom wall (12) and the at least one side wall (16, 18) have at least one mesh (13) whose meshes (14) form at least a part of the flowable openings (14), and particularly preferably the bottom wall (12) and each side wall (16, 18) have at least one mesh (13) whose meshes (14) form at least a part of the flowable openings (14).

3. Filter basket (10) according to claim 2, characterized in that the meshes (14) of all nets (13) arranged in the bottom wall (12) and / or the at least one side wall (16, 18) provide a total of at least 80% of a total flowable area formed by the entirety of all flowable openings, preferably at least 90% and particularly preferably at least 95%.

4. Filter basket (10) according to one of claims 2 to 3, characterized by , REN060DE0 18.07.2024 26 that at least one of the nets (13) , preferably all nets (13) , are formed from a metal mesh.

5. Filter basket (10) according to one of claims 1 to 4, characterized in that the bottom wall (12) and / or the at least one side wall (16, 18) has a honeycomb structure (20) and the at least one mesh (13) is arranged in honeycombs (22) of the honeycomb structure (20).

6. Filter basket (10) according to claim 5, characterized in that the honeycomb structure (20) is formed from honeycombs (22) which have the shape of a regular hexagon, an equilateral triangle or a rhombus, wherein the honeycomb structure (20) is preferably formed from honeycombs (22) which have the shape of a regular hexagon.

7. Filter basket (10) according to one of claims 2 to 6, characterized in that all nets (13) and / or all honeycomb structures (20) consist of a nickel alloy with a nickel content greater than 95%, preferably of the nickel alloy N1201 and particularly preferably of pure nickel.

8. Filter basket (10) according to one of claims 2 to 7, characterized in that the mesh sizes of all nets (13) are smaller than 100 pm, preferably smaller than 50 pm and particularly preferably smaller than 25 pm.

9. Holder (40) for arrangement in a filter basket (10) according to one of claims 1 to 8, comprising REN060DE0 18.07.2024 27 - Receiving devices (46, 50) for multiple objects; characterized in that - a floor area (42) through which a fluid can flow; - a head area (44) through which the fluid flows is provided; - the receiving devices (46, 50) are designed and arranged in such a way that, when objects are received in the receiving devices (46, 60), the fluid can flow from the bottom area (42) along the objects into the head area (44).

10. Holder (40) according to claim 9, characterized in that - the holder (40) is designed to hold planar substrates, preferably glass substrates or semiconductor substrates; - the receiving devices (46, 50) for the substrates are arranged and configured to hold the substrates inclined at an angle α relative to a vertical direction; - wherein the angle a is a maximum of 30°, preferably at least 1° and a maximum of 15°, particularly preferably at least 2° and a maximum of 10°; - several mounting surfaces (46) are provided as receiving devices, on which the substrates can be placed; - wherein the installation surfaces (46) are arranged apart from each other; - preferably slots (50) are provided as further receiving devices which are arranged and equipped to receive sections of the substrates; - wherein the slots (50) are particularly preferably arranged in the bottom area (42) of the holder (40). REN060DE0 18.07.2024 28 11. Carrier system (60) comprising - a filter basket (10) according to any one of claims 1 to 8; - a holder (40) according to one of claims 9 to 10; - wherein the holder (40) can be arranged in the filter basket (10) .

12. Carrier system (60) according to claim 11, characterized in that, when the holder (40) is arranged in the filter basket (10) in the operating position, the side walls (16, 18) of the filter basket (10) extend upwards in the vertical direction beyond at least one upper edge section (52) of the holder (40).

13. Method for extracting object parts from objects comprising the following steps: - Local induction of material defects (80) in an object material along object parts to be removed, preferably by means of laser irradiation; - Extracting (88) the object parts from the objects by etching the objects in an etching medium which etches object material containing material defects more strongly than defect-free object material; characterized in that - the objects are arranged in a holder (40) before etching (82) ; - the holder (40) is arranged in a filter basket (10) before etching (84) ; - for the purpose of etching the objects, a support system (60) formed from the filter basket (10) with a holder (40) arranged therein is arranged at least sectionally in the etching medium (86) ; REN060DE0 18.07.2024 29 - at least a part of the object parts extracted from the objects is retained in the filter basket (90) , preferably at least 80 mass percent of the extracted object parts, particularly preferably at least 90 mass percent of the extracted object parts.

14. Method according to claim 13, characterized in that the holder (40) is a holder according to one of claims 9 to 10 and the filter basket (10) is a filter basket (10) according to one of claims 1 to 8.

15. Method according to one of claims 13 to 14, characterized in that an etching medium flow (66) is formed by means of which the etching medium (67) is guided at least partially through the bottom wall (12) of the filter basket (10) and the bottom area (42) of the holder (40) along the objects (62), wherein this etching medium flow (66) is preferably maintained for at least 60% of an etching duration, particularly preferably for at least 90% of the etching duration and ideally for the entire etching duration.

16. Method according to claim 15, characterized in that substantially all of the etching medium (67) introduced into the filter basket (10) is discharged from the filter basket (10) through the side walls (16, 18) of the filter basket or the bottom wall (12) of the filter basket (10) (98).

17. Method according to one of claims 15 to 16, characterized in that the etching medium guided along the objects (62) REN060DE0 18.07.2024 30 (67) is discharged from the holder (40) via an upper edge (53) of a side wall (55) of the holder (40) (97) and further through a side wall (16, 18) of the filter basket (10) is discharged from the filter basket (10) (98).

18. Method according to one of claims 13 to 17, characterized in that, after etching (88), the support system (60) is removed from the etching medium (67) and the holder (40) is separated from the filter basket (10); and subsequently, the filter basket (10) is cleaned of the dissolved object parts remaining in the filter basket (10) (96), preferably by rinsing (96) the filter basket (10) in a separate rinsing basin.

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