Display substrate and manufacturing method therefor, and display device

Abstract

Provided are a display substrate and a manufacturing method therefor, and a display device. The display substrate comprises a base substrate and a touch layer located on the base substrate; the touch layer comprises a second conductive layer; the second conductive layer comprises a first conductive sub-layer and a second conductive sub-layer; the first conductive sub-layer comprises a plurality of first conductive portions; the second conductive sub-layer comprises a plurality of second conductive portions; and the plurality of first conductive portions are electrically connected to the plurality of second conductive portions in a one-to-one correspondence manner. The orthographic projections of the first conductive portions on the base substrate are within the orthographic projections of the corresponding second conductive portions on the base substrate; and the edges of the orthographic projections of the first conductive portions on the base substrate do not overlap the edges of the orthographic projections of the corresponding second conductive portions on the base substrate.

Description

Display substrate, its preparation method, and display device Technical Field

[0001] This disclosure relates to the field of display technology, and in particular to a display substrate, a method for preparing the substrate, and a display device. Background Technology

[0002] With the rapid development of display technology, touchscreens have been widely used in electronic products such as smartphones, tablets, and televisions. Intercapacitive touchscreens mainly include OGM touchscreens implemented using One Glass Solution Metal Mesh (OGM) capacitive touch technology and OGS touchscreens implemented using One Glass Solution (OGS) full lamination technology. However, in conventional OGS touchscreens, due to process limitations, the thickness of the indium tin oxide (ITO) film formed by magnetron sputtering is limited to no more than 1500 Å per deposition, resulting in a relatively high sheet resistance (e.g., greater than 15 Ω / □), which cannot meet the requirements for touch sensitivity and active stylus input.

[0003] It should be noted that the information disclosed in the background section above is only used to enhance the understanding of the background of this disclosure, and therefore may include information that does not constitute prior art known to those skilled in the art. Summary of the Invention

[0004] In one aspect, a display substrate is provided, comprising: a substrate and a touch layer located on the substrate.

[0005] The touch layer includes a second conductive layer, which further includes a first sub-conductive layer and a second sub-conductive layer. The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. The plurality of first conductive portions and the plurality of second conductive portions are electrically connected in a one-to-one correspondence.

[0006] Wherein, the orthographic projection of the first conductive portion on the substrate falls within the orthographic projection of the corresponding second conductive portion on the substrate; and

[0007] The edge of the orthographic projection of the first conductive part on the substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive part on the substrate.

[0008] According to some exemplary embodiments, the touch layer further includes a first conductive layer and a first insulating layer, wherein the first insulating layer is located between the first conductive layer and the second conductive layer.

[0009] According to some exemplary embodiments, the first conductive layer is located on the side of the second conductive layer close to the substrate.

[0010] According to some exemplary embodiments, the first sub-conductive layer is located on the side of the first insulating layer away from the substrate; the second sub-conductive layer is located on the side of the first sub-conductive layer away from the substrate.

[0011] According to some exemplary embodiments, the second sub-conductive layer is located on the side of the first insulating layer away from the substrate; the first sub-conductive layer is located on the side of the second sub-conductive layer away from the substrate.

[0012] According to some exemplary embodiments, two adjacent first conductive portions among a plurality of first conductive portions are spaced apart by a minimum first spacing distance in the horizontal direction, and two adjacent second conductive portions among a plurality of second conductive portions are spaced apart by a minimum second spacing distance in the horizontal direction. The first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light-emitting surface of the display substrate.

[0013] According to some exemplary embodiments, at least one first conductive portion includes a first surface adjacent to the substrate and a first side surface adjacent to the first surface, with a first slope angle between the first surface and the first side surface; at least one second conductive portion includes a second surface adjacent to the substrate and a second side surface adjacent to the second surface, with a second slope angle between the second surface and the second side surface; and

[0014] The first slope angle is smaller than the second slope angle.

[0015] According to some exemplary embodiments, the difference between the first spacing distance and the second spacing distance is in the range of 6 micrometers to 14 micrometers.

[0016] According to some exemplary embodiments, the first conductive layer has a first refractive index, the first insulating layer has a second refractive index, and the first refractive index is less than the second refractive index; and / or,

[0017] The second conductive layer has a third refractive index, which is less than the second refractive index.

[0018] According to some exemplary embodiments, the first sub-conductive layer has a first thickness in a third direction, the second sub-conductive layer has a second thickness in a third direction, the sum of the first thickness and the second thickness is in the range of 1500 angstroms to 3000 angstroms, and the third direction is perpendicular to the light-emitting surface of the display substrate.

[0019] According to some exemplary embodiments, the material of the first sub-conductive layer includes indium tin oxide; and / or, the material of the second sub-conductive layer includes indium tin oxide.

[0020] According to some exemplary embodiments, the sheet resistance of the second conductive layer is in the range of 7Ω / □ to 11Ω / □.

[0021] According to some exemplary embodiments, the first conductive layer includes a plurality of bridging portions, and at least a portion of the plurality of first conductive portions is electrically connected to the bridging portions.

[0022] According to some exemplary embodiments, the first insulating layer includes a plurality of first insulating portions, at least a portion of which are correspondingly disposed with at least a portion of the bridging portions.

[0023] The orthographic projection of the first insulating portion on the substrate at least partially overlaps with the orthographic projection of the corresponding bridging portion on the substrate; and

[0024] The width of the first insulating portion in the first direction is greater than the width of the corresponding bridging portion in the first direction; and the width of the first insulating portion in the second direction is less than the width of the corresponding bridging portion in the second direction, the first direction and the second direction are parallel to the horizontal direction, and the first direction and the second direction intersect.

[0025] According to some exemplary embodiments, the width of the first insulating portion in the second direction is greater than the first spacing distance.

[0026] According to some exemplary embodiments, the first conductive layer comprises a single layer or multiple layers of conductive layers; and / or,

[0027] The material of the first conductive layer includes indium tin oxide, metal, or metal alloy.

[0028] According to some exemplary embodiments, the touch layer includes a touch electrode, which includes a plurality of first sub-touch electrodes and a plurality of second sub-touch electrodes. The plurality of first sub-touch electrodes extend along a first direction and are spaced apart along a second direction, and the plurality of second sub-touch electrodes extend along a second direction and are spaced apart along a first direction. The first direction and the second direction intersect. The first sub-touch electrodes and the second sub-touch electrodes are insulated from each other. At least one of the first sub-touch electrodes and the second sub-touch electrodes includes a plurality of main body portions and a plurality of bridging portions. The plurality of main body portions are located in the second conductive layer, and the plurality of bridging portions are located in the first conductive layer. Two adjacent main body portions are electrically connected through one of the bridging portions.

[0029] In another aspect, a display device is provided, wherein the display device includes a display substrate as described in any of the preceding claims.

[0030] In another aspect, a method for fabricating a display substrate is provided, comprising:

[0031] Provide substrates;

[0032] A first conductive material layer is formed on the substrate, and a patterning process is performed on the first conductive material layer to form a first conductive layer;

[0033] A first insulating material layer is formed on the side of the first conductive layer away from the substrate, and a patterning process is performed on the first insulating material layer to form a first insulating layer; and

[0034] A second conductive material layer is formed on the side of the first insulating layer away from the substrate, and a patterning process is performed on the second conductive material layer to form a second conductive layer. The second conductive layer includes a first sub-conductive layer and a second sub-conductive layer. The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. The plurality of first conductive portions and the plurality of second conductive portions are electrically connected in a one-to-one correspondence.

[0035] Wherein, the orthographic projection of the first conductive portion on the substrate falls within the orthographic projection of the corresponding second conductive portion on the substrate; and

[0036] The edge of the orthographic projection of the first conductive part on the substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive part on the substrate.

[0037] According to some exemplary embodiments, forming the second conductive layer includes:

[0038] A first sub-conductive material layer is formed on the side of the first insulating layer away from the substrate, and a patterning process is performed on the first sub-conductive material layer to form the first sub-conductive layer; and

[0039] A second sub-conductive material layer is formed on the side of the first sub-conductive layer away from the substrate, and a patterning process is performed on the second sub-conductive material layer to form the second sub-conductive layer.

[0040] The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. Two adjacent first conductive portions are spaced apart by a minimum first spacing distance in the horizontal direction, and two adjacent second conductive portions are spaced apart by a minimum second spacing distance in the horizontal direction. The first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light-emitting surface of the display substrate.

[0041] According to some exemplary embodiments, the patterning process for forming the first sub-conductive layer and the patterning process for forming the second sub-conductive layer share the same mask; and

[0042] The photolithography process in the patterning process for forming the first sub-conductive layer includes forming a pattern using illumination light with a first exposure amount, and the photolithography process in the patterning process for forming the second sub-conductive layer includes forming a pattern using illumination light with a second exposure amount, wherein the first exposure amount is greater than the second exposure amount. Attached Figure Description

[0043] The foregoing contents, as well as other objects, features, and advantages of this disclosure, will become clearer from the following description of embodiments with reference to the accompanying drawings, in which:

[0044] Figure 1 is a plan view of a display substrate according to an embodiment of the present disclosure;

[0045] Figure 2 is a partial planar schematic diagram of some exemplary display substrates;

[0046] Figure 3 is a schematic diagram of the cross section taken along line AA' in Figure 2;

[0047] Figure 4 is a partial plan view of a display substrate according to an embodiment of the present disclosure;

[0048] Figure 5 is a schematic diagram of the cross section taken along line BB' in Figure 4;

[0049] Figure 6 is a partial cross-sectional schematic diagram of a display substrate according to an embodiment of the present disclosure;

[0050] FIG7A is a partial planar schematic diagram of a display substrate according to an embodiment of the present disclosure, FIG7B is a partial cross-sectional schematic diagram of region S1 in FIG7A, and FIG7C is a partial cross-sectional schematic diagram of region S2 in FIG7A.

[0051] Figure 8 is a partially enlarged planar schematic diagram of region S0 in Figure 1;

[0052] Figure 9A is a plan view of a display substrate according to an embodiment of the present disclosure, Figure 9B is a plan view of a display substrate according to an embodiment of the present disclosure, and Figure 9C is a partial cross-sectional view taken by line CC' in Figure 9B.

[0053] Figure 10 is a structural block diagram of a display device according to an embodiment of the present disclosure;

[0054] Figure 11 is a partial flowchart of a method for fabricating a display substrate according to an embodiment of the present disclosure;

[0055] Figure 12 is a partial flowchart of a method for preparing a display substrate according to an embodiment of the present disclosure;

[0056] Figure 13 is a partial flowchart of a method for fabricating a display substrate according to an embodiment of the present disclosure; and

[0057] Figures 14A-14J are partial cross-sectional schematic diagrams of display substrates according to embodiments of the present disclosure.

[0058] It should be noted that, for clarity, the dimensions of layers, structures, or regions in the accompanying drawings used to describe embodiments of the present invention may be enlarged or reduced; that is, these drawings are not drawn to actual scale. Detailed Implementation

[0059] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. All other embodiments obtained by those skilled in the art based on the described embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.

[0060] It should be noted that, for clarity and / or descriptive purposes, the dimensions and relative dimensions of components may be enlarged in the accompanying drawings. Therefore, the dimensions and relative dimensions of the individual components are not necessarily limited to those shown in the drawings. In the specification and accompanying drawings, the same or similar reference numerals indicate the same or similar parts.

[0061] Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as “comprising” or “including” mean that an element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects.

[0062] In this document, unless otherwise specified, directional terms such as "up," "down," "left," "right," "inner," and "outer" are used to indicate orientation or positional relationships based on the accompanying drawings, and are used only for the convenience of describing this disclosure, and are not intended to indicate or imply that the device, element, or component referred to must have a specific orientation, or be constructed or operated in a specific orientation. It should be understood that when the absolute position of the described object changes, the relative positional relationships they represent may also change accordingly. Therefore, these directional terms should not be construed as limitations on this disclosure.

[0063] In this document, the terms “approximately,” “about,” “approximately,” and other similar terms are used as terms of approximation rather than as terms of degree, and they are intended to account for inherent deviations in measured or calculated values ​​that would be recognized by one of ordinary skill in the art. Taking into account factors such as process variations, measurement problems, and errors associated with the measurement of a particular quantity (i.e., limitations of the measurement system), “about” or “approximately” as used herein includes stated values ​​and indicates that a particular value is within an acceptable range of deviation for one of ordinary skill in the art. For example, “about” may mean within one or more standard deviations, or within ±10% or ±5% of the stated value.

[0064] In this document, the directional terms "first direction" and "second direction" are used to describe different orientations of the touch module or display substrate, such as the row and column directions of the touch electrodes. It should be understood that such representations are merely exemplary descriptions and not limitations of this disclosure.

[0065] In this document, unless otherwise stated, the term "electrical connection" can mean that two components or elements are directly electrically connected, for example, component or element A is in direct contact with component or element B, and an electrical signal can be transmitted between them; it can also mean that two components or elements are electrically connected through a conductive medium, such as a conductive wire, for example, component or element A is electrically connected to component or element B through a conductive wire to transmit an electrical signal between the two components or elements; it can also mean that two components or elements are electrically connected through at least one electronic component, for example, component or element A is electrically connected to component or element B through at least one thin-film transistor to transmit an electrical signal between the two components or elements.

[0066] The technical terms used in this disclosure are briefly described below to help those interested in the subject matter better understand this solution.

[0067] OGM touchscreen: refers to a touchscreen in which touch electrodes containing a metal mesh are formed on a substrate. For example, the substrate can be an encapsulation film or encapsulation layer in a display substrate.

[0068] OGS touch screen: refers to a touch screen in which ITO material touch electrodes and ITO material or metal material bridging are directly formed on the substrate.

[0069] Currently, touch modules in touch-enabled display devices mainly fall into two categories: in-cell touch modules and on-cell touch modules. Taking LCD displays as an example, in-cell touch modules place the touch electrodes inside the LCD cell, eliminating the need to increase the cell's thickness. However, touch input consumes display time, making it difficult to support high-frequency products. On-cell touch modules, on the other hand, do not consume display time and can support high-frequency products. For instance, some gaming monitors can achieve refresh rates exceeding 240Hz, which in-cell touch technology struggles to meet, while on-cell touch technology can.

[0070] Taking organic light-emitting diode (OLED) display devices as an example, the embedded touch module integrates the touch electrodes onto the cover glass or encapsulation layer to achieve touch functionality.

[0071] Touchscreens can be categorized into mutual capacitance touchscreens and self-capacitive touchscreens based on their touch method. Because mutual capacitance touchscreens enable multi-touch, they have become the mainstream and future trend in the current touchscreen market. Mutual capacitance touchscreens primarily include OGM touchscreens and OGS touchscreens. With the continuous upgrading of display module resolution, the metal mesh in OGM touchscreens is prone to moiré patterns, affecting display quality. While conventional OGS touchscreens do not have moiré pattern issues, due to process limitations, the thickness of the ITO film formed by magnetron sputtering is limited to no more than 1500 Å per deposition, resulting in a relatively high sheet resistance of ITO (e.g., greater than 15Ω / □), which cannot meet customer requirements for touch sensitivity and active stylus input. In embodiments of this disclosure, the display device may include an OLED display device, a quantum dot light-emitting diode (QLED) display device, a mini light-emitting diode (Mini LED) display device, a micro light-emitting diode (Micro LED) display device, etc.

[0072] Embodiments of this disclosure provide a display substrate. Specifically, the display substrate includes: a substrate and a touch layer located on the substrate; the touch layer includes a second conductive layer. The second conductive layer includes a first sub-conductive layer and a second sub-conductive layer. The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. The plurality of first conductive portions and the plurality of second conductive portions are electrically connected in a one-to-one correspondence, wherein the orthographic projection of the first conductive portion on the substrate falls within the orthographic projection of the corresponding second conductive portion on the substrate. Furthermore, the edge of the orthographic projection of the first conductive portion on the substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive portion on the substrate.

[0073] With this design, the second conductive layer can be formed by stacking two conductive layers. For example, the second conductive layer can be formed by stacking two ITO coating processes, thereby increasing the thickness of the second conductive layer and reducing its sheet resistance. This is beneficial for improving the touch sensitivity of the display substrate and meeting the requirements of active styluses. In addition, the two conductive layers in the second conductive layer can be formed using the same mask, eliminating the need for additional mask costs.

[0074] Figure 1 is a plan view of a display substrate according to an embodiment of the present disclosure.

[0075] Exemplarily, in an embodiment of this disclosure, a display substrate 100 is provided. Referring to FIG1, the display substrate 100 includes a substrate 1 and a touch layer 2 located on the substrate 1. The touch layer 2 may include touch electrodes 20. For example, the touch electrodes 20 include a plurality of first sub-touch electrodes 201 and a plurality of second sub-touch electrodes 202. The plurality of first sub-touch electrodes 201 extend along a first direction X and are spaced apart along a second direction Y, and the plurality of second sub-touch electrodes 202 extend along the second direction Y and are spaced apart along the first direction X, wherein the first direction X and the second direction Y intersect. The first direction X and the second direction Y are parallel to the light-emitting surface of the display substrate 100. Light emitted by the light-emitting device in the display substrate 100 is emitted to the outside after passing through the light-emitting surface of the display substrate 100.

[0076] It should be noted that the embodiments of this disclosure do not limit the shape and number of the first sub-touch electrode 201 and the second sub-touch electrode 202. The shape and number of the first sub-touch electrode 201 and the second sub-touch electrode 202 can be selected according to actual needs, as long as the position of the touch point can be determined by detecting the capacitance. The embodiments of this disclosure do not limit the type of the first sub-touch electrode 201 and the second sub-touch electrode 202. For example, the first sub-touch electrode 201 can be a driving electrode, and the second sub-touch electrode 202 can be a sensing electrode. Alternatively, the first sub-touch electrode 201 can be a sensing electrode, and the second sub-touch electrode 202 can be a driving electrode.

[0077] It should also be noted that the first sub-touch electrode 201 and the second sub-touch electrode 202 are arranged intersectingly. This can be either that the first sub-touch electrode 201 and the second sub-touch electrode 202 are perpendicular to each other, or that the angle between the first sub-touch electrode 201 and the second sub-touch electrode 202 is an acute angle. The embodiments disclosed herein illustrate this with the example of the first sub-touch electrode 201 and the second sub-touch electrode 202 being perpendicular to each other.

[0078] For example, the first sub-touch electrode 201 and the second sub-touch electrode 202 are insulated from each other, for example, the first sub-touch electrode 201 and the second sub-touch electrode 202 can be isolated by an insulating layer at the intersection position.

[0079] In some embodiments, the first sub-touch electrode 201 and the second sub-touch electrode 202 may be located in different conductive layers. An insulating layer is provided between the layer containing the first sub-touch electrode 201 and the layer containing the second sub-touch electrode 202, thereby achieving insulation isolation between the first sub-touch electrode 201 and the second sub-touch electrode 202 at their junction.

[0080] In some embodiments, a portion of the first sub-touch electrode 201 may be located on the same layer as the second sub-touch electrode 202. Alternatively, a portion of the second sub-touch electrode 202 may be located on the same layer as the first sub-touch electrode 201. The first sub-touch electrode 201 and the second sub-touch electrode 202 may be connected via a bridging portion.

[0081] Exemplarily, at least one of the first sub-touch electrode 201 and the second sub-touch electrode 202 includes a plurality of main body portions 230 and a plurality of bridging portions 210. For example, continuing to refer to FIG1, the main body portion 230 includes a second main body portion 2302, and the bridging portion 210 includes a second bridging portion 2102. The second sub-touch electrode 202 includes a plurality of second main body portions 2302 and a plurality of second bridging portions 2102. Two adjacent second main body portions 2302 can be electrically connected through a second bridging portion 2102, thereby realizing the extension design of the second sub-touch electrode 202 along the second direction Y.

[0082] For example, the second body portion 2302 of the first sub-touch electrode 201 and the second sub-touch electrode 202 can be located on the same layer. The second bridging portion 2102 of the first sub-touch electrode 201 and the second sub-touch electrode 202 can be located on different layers. For example, the junction of the first sub-touch electrode 201 and the second bridging portion 2102 of the second sub-touch electrode 202 can be isolated by an insulating layer.

[0083] It should be noted that in this paper, "same layer" refers to a layer structure formed by using the same film deposition process to form a film layer for a specific pattern, and then using the same photomask to pattern that film layer in a single patterning process. Depending on the specific pattern, a single patterning process may include multiple exposure, development, or etching processes, and the specific pattern in the formed layer structure may be continuous or discontinuous. These specific patterns may also be at different heights. Multiple elements, components, structures, and / or portions located in the "same layer" are made of the same material and formed by the same single patterning process; typically, multiple elements, components, structures, and / or portions located in the "same layer" have approximately the same thickness.

[0084] For example, continuing to refer to FIG1, the touch layer 2 may further include multiple touch traces 241. One end of the touch trace 241 may be electrically connected to the first sub-touch electrode 201 and / or the second sub-touch electrode 202 in the touch electrode 20, and the other end of the touch trace 241 may be electrically connected to an external touch driving circuit or touch chip, thereby realizing signal transmission between the touch electrode 20 and the external touch driving circuit or touch chip.

[0085] Figure 2 is a partial planar schematic diagram of some exemplary display substrates, and Figure 3 is a cross-sectional schematic diagram taken along line AA' in Figure 2.

[0086] For example, referring to Figures 1-3, the display substrate includes a substrate 1 and a touch layer 2 located on the substrate 1. For example, the touch layer 2 may include: a first conductive layer 21 disposed on the substrate 1; a first insulating layer 22 disposed on the side of the first conductive layer 21 away from the substrate 1; and a second conductive layer 23 disposed on the side of the first insulating layer 22 away from the substrate 1.

[0087] For example, the second main body portion 2302 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both be located in the second conductive layer 23. The second bridging portion 2102 of the second sub-touch electrode 202 may be located in the first conductive layer 21.

[0088] For example, the touch layer 2 may include a plurality of first insulating portions 221 located in the first insulating layer 22. The second bridging portion 2102 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may be isolated by the first insulating portions 221. The second body portion 2302 of the second sub-touch electrode 202 may be electrically connected to the portion of the second bridging portion 2102 that is not covered by the first insulating portions 221.

[0089] In related technologies, to avoid moiré patterns that affect display performance, touch electrodes are typically made of ITO material. For example, the material of the second conductive layer 23 includes ITO. ITO is prepared by magnetron sputtering. Due to process limitations, the thickness of ITO film formed by a single magnetron sputtering process cannot exceed 1500 angstroms, resulting in a relatively high sheet resistance of ITO. This leads to a low signal transmission rate in the touch electrode, causing insufficient touch sensitivity of the display substrate and failing to meet the requirements of an active pen.

[0090] To reduce the sheet resistance of the touch electrodes, embodiments of this disclosure optimize the touch layer design. By employing a stacked design, the thickness of the second conductive layer is increased, reducing the sheet resistance of the second conductive layer, thereby improving the touch sensitivity of the display substrate and meeting the requirements of an active pen.

[0091] Figure 4 is a partial plan view of a display substrate according to an embodiment of the present disclosure, and Figure 5 is a cross-sectional view taken along line BB' in Figure 4.

[0092] By way of example, in an embodiment of this disclosure, referring to FIG4 and FIG5, the display substrate 100 may include: a substrate 1 and a touch layer 2 located on the substrate.

[0093] For example, the touch layer 2 may include a first conductive layer 21 and a second conductive layer 23, and a first insulating layer 22 located between the first conductive layer 21 and the second conductive layer 23.

[0094] In some embodiments, the first sub-touch electrode 201 and the second sub-touch electrode 202 can be connected by a bridging portion. For example, the touch layer 2 may include: a first conductive layer 21 disposed on the substrate 1; a first insulating layer 22 disposed on the side of the first conductive layer 21 away from the substrate; and a second conductive layer 23 disposed on the side of the first insulating layer 22 away from the substrate. The bridging portion may be located in the first conductive layer 21.

[0095] In some embodiments, the second body portion 2302 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both be located in the second conductive layer 23. The second bridging portion 2102 of the second sub-touch electrode 202 may be located in the first conductive layer 21.

[0096] For example, referring to FIG5, the second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence, thereby forming a double-layer stacked structure, increasing the thickness of the second conductive layer 23, and reducing the sheet resistance of the second conductive layer 23.

[0097] For example, the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 are located in the second conductive layer 23, which adopts a double-layer conductive layer design. That is, the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 adopt a double-layer design, thereby reducing the sheet resistance of the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201.

[0098] Since the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 occupy a high proportion in the entire touch electrode (e.g., the area ratio exceeds 80%), reducing the sheet resistance of the second main body portion 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 can greatly improve the signal transmission rate of the touch electrode, thereby improving the touch sensitivity of the display substrate.

[0099] For example, referring to FIG4, the orthographic projection of the first conductive portion 2311 on the substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1.

[0100] This design increases the thickness of the second conductive layer 23 and reduces its sheet resistance. It also facilitates the alignment of the two conductive layers, preventing short circuits or uneven film thickness, which improves the reliability of the display substrate and the touch performance.

[0101] For example, referring to FIG5, the first sub-conductive layer 231 is located on the side of the first insulating layer 22 away from the substrate 1. The second sub-conductive layer 232 is located on the side of the first sub-conductive layer 231 away from the substrate 1. That is, the orthographic projection of the upper second sub-conductive layer 232 on the substrate can cover the orthographic projection of the lower first sub-conductive layer 231 on the substrate, thereby ensuring that the upper second conductive portion 2321 can wrap around or partially wrap around the lower first conductive portion 2311 that is electrically connected to it.

[0102] This design minimizes the damage to the film layer of the lower first sub-conductive layer 231 caused by the etching process during the patterning process of the upper second sub-conductive layer 232. This improves the overall film quality of the second conductive layer 23, reduces the sheet resistance of the second conductive layer 23, and thus enhances the touch sensitivity and touch performance of the display substrate.

[0103] For example, the material of the first sub-conductive layer 231 may include indium tin oxide (ITO). And / or, the material of the second sub-conductive layer 232 may include indium tin oxide (ITO). The first sub-conductive layer 231 and the second sub-conductive layer 232 may form a mesh-like touch electrode.

[0104] For example, the transmittance of the second conductive layer 23 to visible light is greater than or equal to 90%. For instance, the transmittance of the second conductive layer 23 to visible light is approximately 91.94%.

[0105] The second conductive layer adopts a double-layer ITO design. On the one hand, it can reduce the sheet resistance of the touch electrode and improve the touch sensitivity of the display substrate. On the other hand, it can ensure that most areas of the grid-like touch electrode have high transparency, which can avoid moiré patterns and improve the image quality of the display substrate.

[0106] In related technologies, the second conductive layer is formed using a single ITO sputtering process. Due to process limitations, the thickness of the ITO film formed in a single process cannot exceed 1500 angstroms, and the sheet resistance of the ITO can be as low as 15Ω / □. The relatively high sheet resistance of the ITO film formed in a single process results in a low signal transmission rate for the touch layer, which cannot meet the requirements of display devices for touch sensitivity and active stylus.

[0107] In some embodiments of this disclosure, the first sub-conductive layer 231 and the second sub-conductive layer 232 can be formed in two sputtering coating processes, thereby overcoming the defect of thin ITO thickness in a single sputtering coating process.

[0108] For example, the first sub-conductive layer 231 has a first thickness h1 in the third direction Z, and the second sub-conductive layer 232 has a second thickness h2 in the third direction Z. The first thickness h1 may be equal to or unequal to the second thickness h2. The third direction Z is the light-emitting direction of the display substrate. Alternatively, the third direction Z is perpendicular to the light-emitting surface of the display substrate.

[0109] For example, the sum of the first thickness h1 and the second thickness h2 is in the range of 1500 angstroms to 3000 angstroms. The sheet resistance of the second conductive layer 23 is in the range of 7 Ω / □ to 11 Ω / □.

[0110] It should be noted that, in the embodiments of this disclosure, "first thickness" refers to the maximum thickness of the first sub-conductive layer in the overlapping region of the first sub-conductive layer and the second sub-conductive layer, and "second thickness" refers to the maximum thickness of the second sub-conductive layer in the overlapping region of the first sub-conductive layer and the second sub-conductive layer.

[0111] It should also be noted that the sheet resistance of the second conductive layer here refers to the sheet resistance of the second conductive layer in the overlapping area of ​​the first sub-conductive layer and the second sub-conductive layer.

[0112] Compared with the use of a single-layer ITO for the second conductive layer in related technologies, the second conductive layer in the display substrate of the present disclosure adopts a double-layer ITO design, which can reduce the sheet resistance by 27%-54%, greatly improve the signal transmission rate in the touch electrode, thereby improving the touch sensitivity of the display substrate and meeting the needs of the active pen.

[0113] For example, continuing to refer to FIG5, two adjacent first conductive portions 2311 of the plurality of first conductive portions 2311 are spaced apart by a minimum first spacing distance d1 in the horizontal direction (e.g., the second direction Y). Two adjacent second conductive portions 2321 of the plurality of second conductive portions 2321 are spaced apart by a minimum second spacing distance d2 in the horizontal direction (e.g., the second direction Y). The horizontal direction is parallel to the light-emitting surface of the display substrate. For example, the horizontal direction can be parallel to the first direction X or the second direction Y, or it can be other directions at a certain angle to the first direction X or the second direction Y.

[0114] For example, the first spacing distance d1 is greater than the second spacing distance d2. For example, the first spacing distance d1 can be approximately equal to 40 micrometers, for example, the first spacing distance d1 is in the range of 38 micrometers to 42 micrometers. The second spacing distance d2 can be approximately equal to 30 micrometers. For example, the second spacing distance d2 is in the range of 28 micrometers to 32 micrometers.

[0115] In some embodiments, the first sub-conductive layer 231 and the second sub-conductive layer 232 can be fabricated using the same photomask. For example, during the patterning process of the first sub-conductive layer 231, a photolithography process and an etching process are used to form a first sub-conductive layer 231 containing multiple first conductive portions 2311. During the patterning process of the second sub-conductive layer 232, a photolithography process and an etching process are used to form a second sub-conductive layer 232 containing multiple second conductive portions 2321. The first sub-conductive layer 231 and the second sub-conductive layer 232 can use the same photomask. By changing the exposure amount in the photolithography process, the critical dimensions in the first sub-conductive layer 231 and the second sub-conductive layer 232 can be adjusted, so that the first spacing distance d1 is greater than the second spacing distance d2. It should be noted that the "critical dimension" here refers to the minimum spacing distance among multiple components or structures located in the same layer.

[0116] For example, during the patterning process of the first sub-conductive layer 231, a larger exposure of UV light can be used to irradiate the photoresist. After development, the area of ​​photoresist removed will be larger, allowing for a larger area of ​​ITO etched by the etchant in the subsequent etching process. This increases the minimum spacing between two adjacent first conductive portions 2311 in the first sub-conductive layer 231, for example, controlling the first spacing d1 to be approximately 40 micrometers. Conversely, during the patterning process of the second sub-conductive layer 232, a smaller exposure of UV light can be used to irradiate the photoresist. After development, the area of ​​photoresist removed will be smaller, allowing for a smaller area of ​​ITO etched by the etchant in the subsequent etching process. This results in a relatively smaller minimum spacing between two adjacent second conductive portions 2321 in the second sub-conductive layer 232, for example, controlling the second spacing d2 to be approximately 30 micrometers.

[0117] This design allows for the patterning of two different sizes of the first sub-conductive layer 231 and the second sub-conductive layer 232 without adding a mask, which helps reduce costs.

[0118] For example, the difference between the first spacing distance d1 and the second spacing distance d2 is in the range of 6 micrometers to 14 micrometers. For instance, the first spacing distance d1 is in the range of 38 micrometers to 42 micrometers, and the second spacing distance d2 is in the range of 28 micrometers to 32 micrometers.

[0119] This design ensures sufficient spacing between adjacent first conductive parts 2311 and / or adjacent second conductive parts 2321, avoiding defects such as short circuits due to insufficient alignment accuracy.

[0120] For example, the first conductive layer 21 may include a plurality of bridging portions 210, and at least a portion of the plurality of first conductive portions 2311 is electrically connected to the bridging portion 210.

[0121] For example, the first conductive layer 21 may include a single layer or multiple layers of conductive layers. For instance, the first conductive layer 21 may include a single layer of ITO. Alternatively, the first conductive layer 21 may include multiple layers of conductive layers, such as a combination of aluminum and silver conductive layers.

[0122] This design allows for flexible adjustment of parameters such as the material type, film structure, and thickness of the first conductive layer, which helps improve the conductivity of the first conductive layer and thus enhances the reliability of the bridging portion in the touch electrode.

[0123] In related technologies, the touch layer in the display substrate has a patterned design, which results in gaps between adjacent touch electrodes. The light paths reflected from the touch electrodes and gaps to the human eye are different, which can easily cause color differences. This makes the pattern of the touch electrodes easily noticeable to the human eye and affects the clarity of the display.

[0124] In some embodiments of this disclosure, the propagation path of light in the touch electrode and the gap area can be changed by adjusting the refractive index of the portion of the film layer adjacent to ITO, making the pattern of the touch electrode less noticeable to the human eye, thus achieving the anti-shadow effect of the touch electrode.

[0125] Exemplarily, the first conductive layer 21 has a first refractive index, and the first insulating layer 22 has a second refractive index, the first refractive index being less than the second refractive index. For example, the material of the first conductive layer 21 may include ITO, a metal, or a metal alloy (e.g., aluminum, silver, or a magnesium-silver alloy). The first refractive index is less than or equal to 2.1. The material of the first insulating layer 22 may include a high refractive index insulating material; for example, the material of the first insulating layer 22 may include titanium dioxide. The second refractive index is greater than or equal to 2.1. For example, the second refractive index is approximately equal to 2.5.

[0126] For example, the second conductive layer 23 has a third refractive index that is less than the second refractive index. For example, the material of the second conductive layer 23 may include ITO. For example, the third refractive index is in the range of 1.8 to 2.1.

[0127] For example, Table 1 shows the optical test comparison data of two different OGS touch screens. OGS1 is a touch screen where both the first conductive layer 21 and the second conductive layer 23 in the touch layer are single-layer ITO designs. OGS2 is a touch screen where the first conductive layer 21 is a single-layer ITO design and the second conductive layer 23 is a double-layer ITO design, wherein a first insulating layer 22 with a high refractive index is used between the first conductive layer 21 and the second conductive layer 23.

[0128] Table 1 Comparison of optical tests for two different OGS touchscreens

[0129] It should be noted that in Table 1, "Li" represents the rating of the optical test results, and the smaller the number i after "L" (e.g., 2, 2.5, and 3), the better the anti-shadow effect. "Pattern" refers to the areas with conductive structures in the touch layer other than the bridging parts, and "bridge point" refers to the area where the bridging parts are located in the touch layer. "Dark-state anti-shadow" refers to the anti-shadow effect when the display is off, and "bright-state anti-shadow" refers to the anti-shadow effect when the display is on. By comparing the OGS1 and OGS2 displays, it can be seen that in the screen-off state, the anti-shadow effect at the bridge points of the OGS2 display is better than that of the OGS1 display.

[0130] In the bridging region (the area near the bridging portion 210), reflective interfaces are generated between the bridging portion 210 with different refractive indices and the first insulating portion 221, and between the first insulating portion 221 with different refractive indices and the first conductive portion 2311 and / or the second conductive portion 2321. External incident light is reflected at each reflective interface. The reflected light from different interfaces interferes when it reaches the human eye, causing the reflected light of different vectors to superimpose and cancel each other out. This makes the optical path difference of the reflected light in the bridging region and other regions tend to be consistent, resulting in a smaller color difference between the bridging region and other regions. This improves the blanking level of the bridge point and enhances the display effect of the display substrate. Here, "bridge point" refers to the bridging portion in the touch electrode.

[0131] For example, continuing to refer to FIG5, the display substrate 100 may further include: a first blanking layer IM1 located between the first conductive layer 21 and the substrate 1, and a second blanking layer IM2 located on the side of the second conductive layer 23 away from the substrate 1.

[0132] For example, the refractive index of the touch electrode may be greater than the refractive index of the first anti-reflection layer IM1. And / or, the refractive index of the touch electrode may be greater than the refractive index of the second anti-reflection layer IM2.

[0133] By setting more reflective interfaces, more interfaces generate reflected light, thereby achieving a greater degree of coherent cancellation of reflected light. This better reduces the chromatic aberration of reflected light between the touch electrodes (e.g., the first sub-touch electrode 201 and the second sub-touch electrode 202) and other areas outside the touch electrodes (e.g., the gap between the first sub-touch electrode 201 and the second sub-touch electrode 202), thus better eliminating the shadow on the touch electrode pattern and making the pattern of the first sub-touch electrode 201 and the second sub-touch electrode 202 less perceptible to the human eye. It should be noted that chromatic aberration is a dispersion phenomenon caused by the difference in the optical paths of different lights; the smaller the difference in the optical paths, the smaller the chromatic aberration.

[0134] By way of example, referring to Figures 1, 4 and 5, the first sub-touch electrode 201 and the second sub-touch electrode 202 in the display substrate 100 can be isolated by an insulating layer. For example, the first insulating layer 22 may include a plurality of first insulating portions 221, at least some of the first insulating portions 221 being disposed corresponding to at least some of the bridging portions 210, thereby isolating the first sub-touch electrode 201 and the second sub-touch electrode 202 at their junction.

[0135] For example, continuing to refer to FIG4, the orthographic projection of the first insulating portion 221 on the substrate at least partially overlaps with the orthographic projection of the corresponding bridging portion 210 on the substrate.

[0136] For example, the width d4 of the first insulating portion 221 in the first direction X is greater than the width d3 of the corresponding bridging portion 210 in the first direction X. The width d5 ​​of the first insulating portion 221 in the second direction Y is less than the width d6 of the corresponding bridging portion 210 in the second direction Y. The first direction X and the second direction Y are parallel to the horizontal direction and intersect each other.

[0137] For example, referring to Figures 4 and 5, the width d5 ​​of the first insulating portion 221 in the second direction Y is greater than the first spacing distance d1. The width d6 of the bridging portion 210 in the second direction Y is greater than the first spacing distance d1.

[0138] This design allows for better electrical connection between the bridging portion 210 and the second main body portion 2302 of the second sub-touch electrode 202, while preventing the bridging portion 210 from short-circuiting with the first sub-touch electrode 201, thereby ensuring better insulation between the first sub-touch electrode 201 and the second sub-touch electrode 202 at their junction.

[0139] For example, in some embodiments of this disclosure, the display substrate may include a black matrix layer BM located between the first anti-reflection layer IM1 and the substrate 1. The black matrix layer BM can reduce optical crosstalk between adjacent pixels and improve the display effect of the display substrate.

[0140] For example, the display substrate may include a first protective layer OC located on the side of the second anti-reflection layer IM2 away from the substrate 1. For instance, the first protective layer OC may include an optical adhesive layer that protects the underlying touch layer.

[0141] In some embodiments of this disclosure, when the second conductive layer 23 adopts a double conductive layer design, it can include not only the case where the projected area of ​​the upper conductive layer (e.g., the second sub-conductive layer 232) is greater than the projected area of ​​the lower conductive layer (e.g., the first sub-conductive layer 231), but also the case where the projected area of ​​the upper conductive layer (e.g., the first sub-conductive layer 231) is smaller than the projected area of ​​the lower conductive layer (e.g., the second sub-conductive layer 232).

[0142] Figure 6 is a partial cross-sectional schematic diagram of a display substrate according to an embodiment of the present disclosure.

[0143] Exemplary, in some embodiments of this disclosure, referring to FIG6, the touch layer 2 may include: a first conductive layer 21 disposed on a substrate 1; a first insulating layer 22 disposed on the side of the first conductive layer 21 away from the substrate; and a second conductive layer 23 disposed on the side of the first insulating layer 22 away from the substrate. The second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence, thereby forming a double-layer stacked structure, which can increase the thickness of the second conductive layer 23 and reduce the sheet resistance of the second conductive layer 23.

[0144] For example, the second sub-conductive layer 232 is located on the side of the first insulating layer 22 away from the substrate 1. The first sub-conductive layer 231 is located on the side of the second sub-conductive layer 232 away from the substrate 1. The orthographic projection of the first conductive portion 2311 on the substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1.

[0145] This design increases the thickness of the second conductive layer 23, reduces its sheet resistance, and facilitates the alignment of the double conductive layers, preventing short circuits or uneven film thickness. This improves the reliability of the display substrate and enhances the touch performance. Figure 7A is a partial planar schematic diagram of a display substrate according to an embodiment of this disclosure, Figure 7B is a partial cross-sectional schematic diagram of region S1 in Figure 7A, and Figure 7C is a partial cross-sectional schematic diagram of region S2 in Figure 7A.

[0146] Exemplary examples, in some embodiments of this disclosure, referring to Figures 7A-7C, show the orthographic projection of the first conductive portion 2311 on the substrate 1 falling within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The second conductive portion 2321 is located on the side of the first conductive portion 2311 away from the substrate.

[0147] Exemplarily, at least one first conductive portion 2311 includes a first surface m1 near the substrate 1 and a first side surface m2 adjacent to the first surface m1, with a first slope angle α1 between the first surface m1 and the first side surface m2. At least one second conductive portion 2321 includes a second surface m3 near the substrate 1 and a second side surface m4 adjacent to the second surface m3, with a second slope angle α2 between the second surface m3 and the second side surface m4. Exemplarily, the first slope angle α1 is smaller than the second slope angle α2. For example, the first slope angle α1 may be approximately equal to 9.39°, and the second slope angle α2 may be approximately equal to 10.51°.

[0148] This design allows for a smaller first slope angle α1 at the edge region of the first conductive portion 2311 in the lower layer. This results in a smoother transition of the film layer of the second conductive portion 2321 above the first conductive portion 2311 at the edge region of the first conductive portion 2311. This improves the film quality of the second conductive portion 2321, thereby enhancing the overall film quality of the second conductive layer 23 and ultimately improving the reliability and touch performance of the display substrate.

[0149] Figure 8 is a magnified planar schematic diagram of the S0 region in Figure 1.

[0150] Exemplary examples, in some embodiments of this disclosure, referring to Figures 1, 5, and 8, show substrate 100 may include a third conductive layer 24 located on the side of the second conductive layer 23 away from the substrate 1. The third conductive layer 24 may include multiple touch traces 241. At least a portion of the first sub-touch electrode 201 and the second sub-touch electrode 202 is electrically connected to the touch traces 241. For example, the touch traces 241 may include a first portion 2411 located in the touch area TA, and the first portion 2411 may overlap with at least a portion of the first sub-touch electrode 201 and / or the second sub-touch electrode 202, thereby achieving electrical connection between the touch traces 241 and the first sub-touch electrode 201 and / or the second sub-touch electrode 202. The touch traces 241 may also include a second portion 2412 located in the non-touch area TN. The non-touch area TN may be an edge region surrounding the touch area TA.

[0151] In some embodiments, the routing design of the second part 2412 of the touch trace 241 can concentrate one end of the touch trace 241 connected to the grid-shaped touch electrode into a smaller area, which helps to reduce the wiring space occupied by the touch trace and facilitates the electrical connection between the touch trace 241 and the external touch circuit or touch chip.

[0152] Figure 9A is a plan view of a display substrate according to an embodiment of the present disclosure, Figure 9B is a plan view of a display substrate according to an embodiment of the present disclosure, and Figure 9C is a partial cross-sectional view taken by line CC' in Figure 9B.

[0153] Exemplary, in some embodiments of this disclosure, referring to FIG9A, the first sub-touch electrode 201 may be formed into a continuously extending structure by body portions 230 and bridging portions 210 located on different layers. For example, the body portion 230 may include a first body portion 2301. The bridging portion 210 may include a first bridging portion 2101. The first sub-touch electrode 201 includes a plurality of first body portions 2301 and a plurality of first bridging portions 2101. The first bridging portion 2101 is located in the first conductive layer 21, and the first body portions 2301 are located in the second conductive layer 23. Two adjacent first body portions 2301 may be electrically connected through a first bridging portion 2101, thereby realizing the extension design of the first sub-touch electrode 201 along the first direction X.

[0154] For example, the second sub-touch electrode 202 is located in the second conductive layer 23. The first main body portion 2301 of the first sub-touch electrode 201 and the second sub-touch electrode 202 can both be located in the second conductive layer. The first main body portion 2301 of the first sub-touch electrode 201 and the second sub-touch electrode 202 can both adopt a double conductive layer design, thereby reducing the sheet resistance of the touch electrode and improving the touch sensitivity of the display substrate.

[0155] This design allows for more flexible arrangement of the touch electrodes, ensuring that most electrodes use a double-layer conductive layer design. This guarantees that the sheet resistance of most areas of the touch electrodes is low, thereby improving the overall conductivity of the touch electrodes and enhancing the touch sensitivity of the display substrate.

[0156] In some embodiments, referring back to FIG1, a touch trace 241 may be electrically connected to a first sub-touch electrode 201 or a second sub-touch electrode 202.

[0157] In some embodiments, continuing to refer to FIG9A, a touch trace 241 may be electrically connected to a plurality of first sub-touch electrodes 201 or a plurality of second sub-touch electrodes 202. For example, a touch trace 241 may be electrically connected to two first sub-touch electrodes 201. This design reduces the number of touch traces, saves wiring space, and facilitates the realization of narrow bezels on the display substrate.

[0158] In embodiments of this disclosure, the touch layer may employ a bridging design, and one of the conductive layers in the touch layer (e.g., the second conductive layer) may employ a double-layer ITO design.

[0159] In other embodiments, the touch layer may not employ a bridging design. For example, referring to Figures 9B and 9C, the touch layer 2 may include a first conductive layer 21 and a second conductive layer 23, with a first sub-touch electrode 201 located on the first conductive layer 21 and a second sub-touch electrode 202 located on the second conductive layer 23. Alternatively, the first sub-touch electrode 201 may be located on the second conductive layer 23, and the second sub-touch electrode 202 may be located on the first conductive layer 21. The first sub-touch electrode 201 and the second sub-touch electrode 202 form a grid-like touch electrode pattern.

[0160] For example, at least one conductive layer in a touch layer that does not employ a bridging design can adopt a double-layer ITO design. For instance, one of the first conductive layer 21 and the second conductive layer 23 may adopt a double-layer ITO design, or both the first conductive layer 21 and the second conductive layer 23 may adopt a double-layer ITO design. For example, referring to FIG9C, the second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence, thereby forming a double-layer stacked structure, increasing the thickness of the second conductive layer 23, and reducing the sheet resistance of the second conductive layer 23.

[0161] It should be noted that in embodiments where the touch layer does not employ a bridging design, the vertical relationship between the first conductive layer and the second conductive layer is not limited. For example, the first conductive layer 21 can be located on the side of the second conductive layer 23 closer to the substrate 1. Alternatively, the first conductive layer 21 can be located on the side of the second conductive layer 23 farther from the substrate 1.

[0162] This design reduces the sheet resistance of at least one of the first and second sub-touch electrodes, thereby improving the overall touch sensitivity of the touch structure.

[0163] Figure 10 is a structural block diagram of a display device according to an embodiment of the present disclosure.

[0164] Optionally, embodiments of this disclosure also provide a display device. Referring to FIG10, the display device 200 may include the aforementioned display substrate 100. The display device may include, but is not limited to, any product or component with display function such as electronic paper, mobile phone, tablet computer, monitor, laptop computer, digital photo frame, and navigator. It should be understood that this display device has the same beneficial effects as the display substrate provided in the foregoing embodiments.

[0165] Figure 11 is a partial flowchart of a method for preparing a display substrate according to an embodiment of the present disclosure; Figure 12 is a partial flowchart of a method for preparing a display substrate according to an embodiment of the present disclosure; Figure 13 is a partial flowchart of a method for preparing a display substrate according to an embodiment of the present disclosure; and Figures 14A-14J are partial cross-sectional schematic diagrams of a display substrate according to an embodiment of the present disclosure.

[0166] By way of example, in an embodiment of this disclosure, a method for fabricating a display substrate is also provided. The method for fabricating a display substrate may include the following steps S01-S04.

[0167] In step S01, referring to FIG14A, a substrate 1 is provided. For example, the substrate 1 may include an encapsulation film of the display substrate or an encapsulation cover glass.

[0168] In step S02, referring to FIG14D, a first conductive material layer is formed on the substrate 1, and a patterning process is performed on the first conductive material layer to form a first conductive layer 21. For example, the first conductive layer 21 may include a plurality of bridging portions 210.

[0169] In some embodiments, referring to Figures 14B and 14C, the fabrication method further includes: forming a black matrix layer BM and a first anti-shadow layer IM1 on the side of the black matrix layer BM away from the substrate 1 on the substrate 1 before forming the first conductive layer 21.

[0170] In step S03, referring to FIG14E, a first insulating material layer is formed on the side of the first conductive layer 21 away from the substrate 1, and a patterning process is performed on the first insulating material layer to form a first insulating layer 22. For example, the first insulating layer 22 may include a plurality of first insulating portions 221, at least some of the orthographic projections of the first insulating portions 221 on the substrate and the orthographic projections of the bridging portions 210 on the substrate partially overlap.

[0171] In step S04, referring to Figures 14F and 14G, a second conductive material layer is formed on the side of the first insulating layer 22 away from the substrate 1, and a patterning process is performed on the second conductive material layer to form a second conductive layer 23. The second conductive layer 23 may include a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 includes a plurality of first conductive portions 2311, and the second sub-conductive layer 232 includes a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence.

[0172] In some embodiments, by adjusting the process parameters of the patterning process of the first sub-conductive layer 231 and the second sub-conductive layer 232, such as adjusting the photolithography process parameters, it can be made so that the orthographic projection of the first conductive portion 2311 on the substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the substrate 1.

[0173] For example, forming the second conductive layer in step S04 may specifically include the following steps S041-S042.

[0174] For example, in step S041, referring to FIG14F, a first sub-conductive material layer is formed on the side of the first insulating layer 22 away from the substrate 1, and a patterning process is performed on the first sub-conductive material layer to form the first sub-conductive layer 231.

[0175] For example, in step S042, referring to FIG14G, a second sub-conductive material layer is formed on the side of the first sub-conductive layer 231 away from the substrate 1, and a patterning process is performed on the second sub-conductive material layer to form the second sub-conductive layer 232. The first sub-conductive layer 231 includes a plurality of first conductive portions 2311, and the second sub-conductive layer 232 includes a plurality of second conductive portions 2321. Two adjacent first conductive portions 2311 are spaced by a minimum horizontal spacing of a first spacing distance d1, and two adjacent second conductive portions 2321 are spaced by a minimum horizontal spacing of a second spacing distance d2. The first spacing distance d1 is greater than the second spacing distance d2, and the horizontal direction is parallel to the light-emitting surface of the display substrate.

[0176] For example, the material of the first sub-conductive layer 231 may include ITO. The material of the second sub-conductive layer 232 may also include ITO.

[0177] By adopting a dual-layer ITO design, the sheet resistance of the touch electrodes can be reduced, improving the touch sensitivity of the display substrate. On the other hand, it can ensure that most areas of the grid-like touch electrodes have high transparency, avoiding moiré patterns and improving the display effect of the display substrate.

[0178] For example, the patterning process for forming the first sub-conductive layer 231 and the patterning process for forming the second sub-conductive layer 232 can share the same photomask. By adjusting the photolithography process parameters in the patterning process, such as changing the exposure amount in the photolithography process, two film layers with different shapes can be formed using the same photomask. For example, the photolithography process in the patterning process for forming the first sub-conductive layer 231 includes forming a pattern using illumination light with a first exposure amount. The photolithography process in the patterning process for forming the second sub-conductive layer 232 includes forming a pattern using illumination light with a second exposure amount. For example, the first exposure amount is greater than the second exposure amount, thereby making the first spacing distance d1 in the first sub-conductive layer 231 greater than the second spacing distance d2 in the second sub-conductive layer 232. By doing so, photomasks can be saved, which is beneficial for reducing costs.

[0179] For example, the method for preparing a display substrate may further include: after forming the second conductive layer 23, continuing to perform the following steps S05-S07.

[0180] In step S05, referring to FIG14H, a third conductive material layer is formed on the side of the second conductive layer 23 away from the substrate 1, and a patterning process is performed on the third conductive material layer to form the third conductive layer 24. Exemplarily, the touch trace 241 may be located in the third conductive layer 24.

[0181] In step S06, referring to FIG14I, a second anti-reflection layer IM2 is formed on the side of the third conductive layer 24 away from the substrate 1. Exemplarily, the first anti-reflection layer IM1 and the second anti-reflection layer IM2 can be located on the upper and lower sides of the touch electrode, respectively, to enclose the touch electrode. This allows the optical path difference in different regions to be adjusted using the interface between the multiple layers, making the pattern of the touch electrode difficult to observe with the naked eye.

[0182] In step S07, referring to FIG14J, a first protective layer OC is formed on the side of the second anti-reflection layer IM2 away from the substrate 1. For example, the first protective layer OC may include an optical adhesive layer, which can protect the underlying touch layer.

[0183] While some embodiments of the general concept of this disclosure have been shown and described, those skilled in the art will understand that changes may be made to these embodiments without departing from the principles and spirit of the general concept of this disclosure, the scope of which is defined by the claims and their equivalents.

Claims

1. A display substrate, characterized in that, include: A substrate and a touch layer located on the substrate. The touch layer includes a second conductive layer, which further includes a first sub-conductive layer and a second sub-conductive layer. The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. The plurality of first conductive portions and the plurality of second conductive portions are electrically connected in a one-to-one correspondence. Wherein, the orthographic projection of the first conductive portion on the substrate falls within the orthographic projection of the corresponding second conductive portion on the substrate; and The edge of the orthographic projection of the first conductive part on the substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive part on the substrate.

2. The display substrate according to claim 1, wherein, The touch layer further includes a first conductive layer and a first insulating layer, wherein the first insulating layer is located between the first conductive layer and the second conductive layer.

3. The display substrate according to claim 2, wherein, The first conductive layer is located on the side of the second conductive layer that is close to the substrate.

4. The display substrate according to claim 3, wherein, The first sub-conductive layer is located on the side of the first insulating layer away from the substrate, and the second sub-conductive layer is located on the side of the first sub-conductive layer away from the substrate.

5. The display substrate according to claim 3, wherein, The second sub-conductive layer is located on the side of the first insulating layer away from the substrate, and the first sub-conductive layer is located on the side of the second sub-conductive layer away from the substrate.

6. The display substrate according to any one of claims 3-5, wherein, Two adjacent first conductive portions among a plurality of first conductive portions are spaced apart by a minimum first spacing distance in the horizontal direction, and two adjacent second conductive portions among a plurality of second conductive portions are spaced apart by a minimum second spacing distance in the horizontal direction. The first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light-emitting surface of the display substrate.

7. The display substrate according to claim 6, wherein, At least one of the first conductive portions includes a first surface near the substrate and a first side surface adjacent to the first surface, with a first slope angle between the first surface and the first side surface; At least one of the second conductive portions includes a second surface adjacent to the substrate and a second side surface adjacent to the second surface, wherein a second slope angle is formed between the second surface and the second side surface; and The first slope angle is smaller than the second slope angle.

8. The display substrate according to claim 6, wherein, The difference between the first interval distance and the second interval distance is in the range of 6 micrometers to 14 micrometers.

9. The display substrate according to any one of claims 3-8, wherein, The first conductive layer has a first refractive index, the first insulating layer has a second refractive index, and the first refractive index is less than the second refractive index; and / or, The second conductive layer has a third refractive index, which is less than the second refractive index.

10. The display substrate according to any one of claims 1-9, wherein, The first sub-conductive layer has a first thickness in a third direction, and the second sub-conductive layer has a second thickness in a third direction. The sum of the first thickness and the second thickness is in the range of 1500 angstroms to 3000 angstroms, and the third direction is perpendicular to the light-emitting surface of the display substrate.

11. The display substrate according to claim 1, wherein, The material of the first sub-conductive layer includes indium tin oxide; and / or, the material of the second sub-conductive layer includes indium tin oxide.

12. The display substrate according to claim 1, wherein, The sheet resistance of the second conductive layer is in the range of ΩΩ / □ to 11Ω / □.

13. The display substrate according to any one of claims 6-12, wherein, The first conductive layer includes a plurality of bridging portions, and at least a portion of the plurality of first conductive portions is electrically connected to the bridging portions.

14. The display substrate according to claim 13, wherein, The first insulating layer includes a plurality of first insulating portions, at least a portion of which are correspondingly disposed with at least a portion of the bridging portions. The orthographic projection of the first insulating portion on the substrate at least partially overlaps with the orthographic projection of the corresponding bridging portion on the substrate. as well as The width of the first insulating portion in the first direction is greater than the width of the corresponding bridging portion in the first direction; The width of the first insulating portion in the second direction is smaller than the width of the corresponding bridging portion in the second direction. The first direction and the second direction are parallel to the horizontal direction and intersect each other.

15. The display substrate according to claim 14, wherein, The width of the first insulating portion in the second direction is greater than the first spacing distance.

16. The display substrate according to any one of claims 3-15, wherein, The first conductive layer comprises a single layer or multiple layers of conductive layers; and / or, The material of the first conductive layer includes indium tin oxide, metal, or metal alloy.

17. The display substrate according to claim 1, wherein, The touch layer includes touch electrodes, each touch electrode including a plurality of first sub-touch electrodes and a plurality of second sub-touch electrodes. The plurality of first sub-touch electrodes extend along a first direction and are spaced apart along a second direction, and the plurality of second sub-touch electrodes extend along a second direction and are spaced apart along the first direction. The first direction and the second direction intersect. The first sub-touch electrodes and the second sub-touch electrodes are insulated from each other. At least one of the first sub-touch electrodes and the second sub-touch electrodes includes a plurality of main body portions and a plurality of bridging portions. The plurality of main body portions are located in the second conductive layer, and the plurality of bridging portions are located in the first conductive layer. Two adjacent main body portions are electrically connected through one of the bridging portions.

18. A display device, characterized in that, Includes the display substrate as described in any one of claims 1-17.

19. A method for preparing a display substrate, characterized in that, include: Provide substrates; A first conductive material layer is formed on the substrate, and a patterning process is performed on the first conductive material layer to form a first conductive layer; A first insulating material layer is formed on the side of the first conductive layer away from the substrate, and a patterning process is performed on the first insulating material layer to form the first insulating layer; as well as A second conductive material layer is formed on the side of the first insulating layer away from the substrate, and a patterning process is performed on the second conductive material layer to form a second conductive layer. The second conductive layer includes a first sub-conductive layer and a second sub-conductive layer. The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. The plurality of first conductive portions and the plurality of second conductive portions are electrically connected in a one-to-one correspondence. Wherein, the orthographic projection of the first conductive portion on the substrate falls within the orthographic projection of the corresponding second conductive portion on the substrate; and The edge of the orthographic projection of the first conductive part on the substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive part on the substrate.

20. The method according to claim 18, wherein, The formation of the second conductive layer includes: A first sub-conductive material layer is formed on the side of the first insulating layer away from the substrate, and a patterning process is performed on the first sub-conductive material layer to form the first sub-conductive layer; and A second sub-conductive material layer is formed on the side of the first sub-conductive layer away from the substrate, and a patterning process is performed on the second sub-conductive material layer to form the second sub-conductive layer. The first sub-conductive layer includes a plurality of first conductive portions, and the second sub-conductive layer includes a plurality of second conductive portions. Two adjacent first conductive portions are spaced apart by a minimum first spacing distance in the horizontal direction, and two adjacent second conductive portions are spaced apart by a minimum second spacing distance in the horizontal direction. The first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light-emitting surface of the display substrate.

21. The method according to claim 20, wherein, The patterning process for forming the first sub-conductive layer and the patterning process for forming the second sub-conductive layer share the same mask. as well as The photolithography process in the patterning process for forming the first sub-conductive layer includes forming a pattern using illumination light with a first exposure amount, and the photolithography process in the patterning process for forming the second sub-conductive layer includes forming a pattern using illumination light with a second exposure amount, wherein the first exposure amount is greater than the second exposure amount.

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