Optical film, polarizer, and display panel

Abstract

An optical film (10), a polarizer (100), and a display panel. The reflectivity of the optical film (10) with regard to a first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film (10) with regard to a second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light being greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light being greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength being greater than 380 nm and less than 780 nm.

Description

Optical film, polarizer and display panel TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to an optical film, a polarizer and a display panel. BACKGROUND

[0002] The display panel will have a certain reflection under the influence of external ambient light, causing the projection problem of the ambient object on the screen, affecting the picture quality of the display. Generally, a functional film such as a low reflection (LR) film is pasted on the surface of the display to eliminate or reduce the adverse effects of ambient light on the screen, thereby improving the display quality of the display.

[0003] However, the current low reflection film has a large fluctuation in the reflectivity of the visible light range, which will affect the low reflection effect and the display effect of the display panel. SUMMARY

[0004] The embodiments of the present application provide an optical film, a polarizer and a display panel, which can reduce the fluctuation of the reflectivity of the optical film in the visible light range and improve the low reflection effect of the optical film.

[0005] The embodiments of the present application provide an optical film, which comprises:

[0006] a substrate;

[0007] a hard layer disposed on one side of the substrate;

[0008] a low reflection layer disposed on the side of the hard layer away from the substrate, the low reflection layer being distributed with adjusting particles;

[0009] The reflectivity of the optical film to the first type of light decreases with the increase of the wavelength of the first type of light, the reflectivity of the optical film to the second type of light increases with the increase of the wavelength of the second type of light, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm.

[0010] In order to achieve the above-mentioned purposes, the embodiments of the present application further provide a polarizer, which comprises a polarizing layer and an optical film, the optical film being disposed on one side of the polarizing layer, and the optical film comprising:

[0011] a substrate;

[0012] a hard layer disposed on one side of the substrate;

[0013] An antireflection layer is disposed on a side of the hard layer away from the substrate, and the antireflection layer has adjusting particles distributed therein.

[0014] The reflectivity of the optical film to the first type of light decreases with an increase of the wavelength of the first type of light, the reflectivity of the optical film to the second type of light increases with an increase of the wavelength of the second type of light, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm.

[0015] According to the above purposes of the present application, the embodiments of the present application further provide a display panel, which comprises a panel body and a polarizer, and the polarizer is arranged on the light-out side of the panel body.

[0016] The polarizer comprises a polarizing layer and an optical film, the optical film is arranged on one side of the polarizing layer, and the optical film comprises:

[0017] A substrate;

[0018] A hard layer is arranged on one side of the substrate;

[0019] An antireflection layer is arranged on a side of the hard layer away from the substrate, and the antireflection layer has adjusting particles distributed therein;

[0020] The reflectivity of the optical film to the first type of light decreases with an increase of the wavelength of the first type of light, the reflectivity of the optical film to the second type of light increases with an increase of the wavelength of the second type of light, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm. BRIEF DESCRIPTION OF DRAWINGS

[0021] FIG. 1 is a light reflectivity curve of an antireflection film according to an embodiment;

[0022] FIG. 2 is a structural diagram of an optical film according to an embodiment of the present application;

[0023] FIG. 3 is a light reflectivity curve of an optical film in Example 1 according to an embodiment of the present application;

[0024] FIG. 4 is a light reflectivity curve of an optical film in Example 2 according to an embodiment of the present application;

[0025] FIG. 5 is a light reflectivity curve of an optical film in Example 3 according to an embodiment of the present application;

[0026] FIG. 6 is a light reflectance curve of the optical film in Example 4 according to an embodiment of the present application;

[0027] FIG. 7 is a light reflectance curve of the optical film in Example 5 according to an embodiment of the present application;

[0028] FIG. 8 is a schematic view of a structure of a polarizer according to an embodiment of the present application;

[0029] FIG. 9 is a schematic view of another structure of a polarizer according to an embodiment of the present application;

[0030] FIG. 10 is a schematic view of a structure of a display panel according to an embodiment of the present application. Embodiments of the present application

[0031] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0032] The following disclosure provides many different embodiments, or examples, for implementing different structures of the present application. For the purpose of simplification, the components and arrangements of specific examples are described in the following disclosure. Of course, they are only examples and are not intended to limit the present application. In addition, reference numerals and / or letters can be repeated in different examples in the present application, and such repetition is for the purpose of simplification and clarity, and does not indicate a relationship between the various embodiments and / or arrangements being discussed. In addition, the present application provides examples of various specific processes and materials, but those skilled in the art can realize the application of other processes and / or the use of other materials.

[0033] Please refer to FIG. 1, which is a test curve of the reflectivity of the current anti-reflective film to light in the visible light range, wherein the wavelength range of visible light can be 380nm to 780nm; as shown in FIG. 1, the reflectivity of the anti-reflective film to visible light fluctuates greatly and extends in a wavy line, thereby seriously affecting the anti-reflective effect of the anti-reflective film and being not conducive to the improvement of the display effect of the display panel.

[0034] Please refer to FIG. 2, the present application provides an optical film 10, the optical film 10 includes a substrate 11, a hard layer 12 and an anti-reflective layer 13; the hard layer 12 is arranged on one side of the substrate 11, the anti-reflective layer 13 is arranged on the side of the hard layer 12 away from the substrate 11, and the anti-reflective layer 13 is distributed with adjusting particles 132.

[0035] The reflectivity of the optical film 10 to the first type of light decreases with the increase of the wavelength of the first type of light, the reflectivity of the optical film 10 to the second type of light increases with the increase of the wavelength of the second type of light, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm.

[0036] In the implementation process, the reflectivity of the optical film 10 to the first type of light decreases with the increase of the wavelength of the first type of light, the reflectivity of the optical film 10 to the second type of light increases with the increase of the wavelength of the second type of light, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to the preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, thereby the fluctuation of the reflectivity of the optical film 10 to visible light can be reduced, the reflectivity of the optical film 10 to visible light is prevented from fluctuating in a wave shape, and the antireflection effect of the optical film 10 is improved.

[0037] In an embodiment of the present application, the preset wavelength is greater than or equal to 500 nm and less than or equal to 650 nm.

[0038] In an embodiment of the present application, the average reflectivity of the optical film to the first type of light and the second type of light is greater than or equal to 0.6% and less than or equal to 1.5%.

[0039] In an embodiment of the present application, the reflectivity of the optical film to light with the preset wavelength is greater than or equal to 0.1% and less than or equal to 0.6%.

[0040] In an embodiment of the present application, the thickness of the substrate is greater than or equal to 15 microns and less than or equal to 120 microns.

[0041] The refractive index of the substrate is greater than or equal to 1.45 and less than or equal to 1.65.

[0042] The in-plane retardation value of the material of the substrate is greater than or equal to 0 nm and less than or equal to 1000 nm, or the in-plane retardation value of the material of the substrate is greater than or equal to 3000 nm.

[0043] In an embodiment of the present application, the thickness of the hard layer is greater than or equal to 2 microns and less than or equal to 16 microns.

[0044] The hardness of the hard layer is greater than or equal to 2H / 500g.

[0045] The refractive index of the hard layer is greater than or equal to 1.45 and less than or equal to 1.7.

[0046] In an embodiment of the present application, the thickness of the antireflection layer is greater than or equal to 75 nm and less than or equal to 125 nm.

[0047] The refractive index of the antireflection layer is greater than or equal to 1.2 and less than or equal to 1.4.

[0048] In an embodiment of the present application, the antireflection layer comprises a resin matrix and the adjusting particles distributed in the resin matrix, and the mass ratio of the resin matrix to the adjusting particles is greater than or equal to 1:2 and less than or equal to 2:1.

[0049] In an embodiment of the present application, the adjusting particles are hollow particles, and the ratio of the shell thickness of the adjusting particles to the diameter of the adjusting particles is greater than or equal to 1 / 15 and less than or equal to 1 / 5.

[0050] In an embodiment of the present application, the porosity of the adjusting particles is greater than or equal to 40% and less than or equal to 70%.

[0051] The diameter of the adjusting particles is greater than or equal to 40 nm and less than or equal to 90 nm.

[0052] Further, the parameters of each film layer in the optical film 10 provided by the embodiments of the present application are described below in combination with specific embodiments.

[0053] In some embodiments, the material of the substrate 11 is selected from resin materials, for example, the material of the substrate 11 can be selected from at least one of triacetyl cellulose (TAC), polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), copolymers of cycloolefin (COC), cyclic olefin polymer (COP), and polyethylene naphthalate two formic acid glycol ester (PEN).

[0054] In some embodiments, the material of the substrate 11 can be selected from a high molecular material having an in-plane retardation value greater than or equal to 0 nm and less than or equal to 1000 nm, or a high molecular material having an in-plane retardation value greater than or equal to 3000 nm; for example, the in-plane retardation value of the material of the substrate 11 can be selected from 0 nm, 10 nm, 20 nm, 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, 1000 nm, 3000 nm, 4000 nm, 5000 nm, 6000 nm, 7000 nm, 8000 nm, 9000 nm, 10000 nm, 11000 nm, or 12000 nm.

[0055] In some embodiments, the thickness of the substrate 11 can be greater than or equal to 15 microns and less than or equal to 120 microns; for example, the thickness of the substrate 11 can be 15 microns, 20 microns, 25 microns, 30 microns, 35 microns, 40 microns, 45 microns, 50 microns, 55 microns, 60 microns, 65 microns, 70 microns, 75 microns, 80 microns, 85 microns, 90 microns, 95 microns, 100 microns, 105 microns, 110 microns, 115 microns, or 120 microns, etc.

[0056] In some embodiments, the substrate 11 can include at least one sub-layer, when the substrate 11 includes a plurality of the sub-layers, the material of each of the sub-layers can be independently selected from any of the above-mentioned materials; and the thickness of the substrate 11 defined above is the sum of the thicknesses of the at least one sub-layer.

[0057] In some embodiments, the refractive index of the substrate 11 can be greater than or equal to 1.45 and less than or equal to 1.65; for example, the refractive index of the substrate 11 can be 1.45, 1.46, 1.47, 1.48, 1.49, 1.50, 1.51, 1.52, 1.53, 1.54, 1.55, 1.56, 1.57, 1.58, 1.59, 1.6, 1.61, 1.62, 1.63, 1.64, or 1.65, etc.

[0058] In addition, in some embodiments, the substrate 11 can have a light transmittance greater than or equal to 85%, for example, the substrate 11 can have a light transmittance of 85%, 86%, 87%, 88%, 89%, 90%, 91%, 92%, 93%, 94%, or 95%, etc.; the substrate 11 can have a haze less than or equal to 8%, for example, the substrate 11 can have a haze of 8%, 7%, 6%, 5%, 4%, 3%, 2%, 1%, 0.9%, 0.8%, 0.7%, 0.6%, 0.5%, 0.4%, 0.3%, 0.2%, or 0.1%, etc.

[0059] Further, the hard layer 12 is disposed on one side of the substrate 11, and the hard layer 12 has a relatively large hardness, which can be used to improve the hardness and mechanical properties of the optical film 10.

[0060] It should be noted that the hard layer 12 can be formed on the substrate 11 by coating, for example, the hard layer 12 can be prepared by micro-concave coating, slot coating, lip coating, etc.

[0061] In some embodiments, the material of the hard layer 12 includes a resin, for example, which can include a curable resin, in particular, which can be a polymerizable and crosslinkable resin; wherein the curable resin can include at least one of a thermally cured resin and a light cured resin.

[0062] It can be understood that the light used to irradiate the light-cured resin during curing can include ultraviolet light, electron beams, etc. When the light used to irradiate the light-cured resin during curing is ultraviolet light curing, ultraviolet light emitted by an ultrahigh-pressure mercury lamp, a high-pressure mercury lamp, a low-pressure mercury lamp, a metal halide lamp, etc. can be used. When the light used to irradiate the light-cured resin during curing is electron beam curing, Cockcroftwald-type, Vandegraft-type, resonant transformer-type, etc. electron beam accelerators can be used.

[0063] Further, in some embodiments, the light-cured resin can include at least one of a monomer and an oligomer, preferably, the light-cured resin includes a combination of a monomer and an oligomer.

[0064] In some embodiments, the monomer can include a monomer having a weight average molecular weight less than 1000; in particular, the monomer can include a monomer having a functionality of 2 or more, for example, the monomer can include isobornyl di(meth)acrylate, tripropyleneglycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol octa(meth)acrylate, etc.

[0065] In some embodiments, the oligomer has a weight average molecular weight greater than or equal to 1000 and less than 10000; in particular, the oligomer can include a multifunctional oligomer having 2 or more functional groups, for example, the oligomer can include a polyester (meth)acrylate, a polyurethane (meth)acrylate, a polyester-polyurethane (meth)acrylate, a polyether (meth)acrylate, a polyol (meth)acrylate, an epoxy (meth)acrylate, or the like.

[0066] In some embodiments, the thermally cured resin can include a resin having at least one thermally cured functional group, for example, the thermally cured resin can include a melamine resin, an unsaturated polyester resin, a polyurethane resin, an epoxy resin, or the like.

[0067] In some embodiments, the hardness of the hard layer 12 can be greater than or equal to 2H / 500g, for example, the hardness of the hard layer 12 can be 2H / 500g, 3H / 500g, 4H / 500g, or 5H / 500g, or the like.

[0068] In some embodiments, the thickness of the hard layer 12 can be greater than or equal to 2 microns and less than or equal to 16 microns; for example, the thickness of the hard layer 12 can be 2 microns, 3 microns, 4 microns, 5 microns, 6 microns, 7 microns, 8 microns, 9 microns, 10 microns, 11 microns, 12 microns, 13 microns, 14 microns, 15 microns, or 16 microns, or the like; preferably, the thickness of the hard layer 12 can be greater than or equal to 4 and less than or equal to 14 microns.

[0069] In some embodiments, the refractive index of the hard layer 12 can be greater than or equal to 1.45 and less than or equal to 1.7; for example, the refractive index of the hard layer 12 can be 1.45, 1.46, 1.47, 1.48, 1.49, 1.5, 1.51, 1.52, 1.53, 1.54, 1.55, 1.56, 1.57, 1.58, 1.59, 1.60, 1.61, 1.62, 1.63, 1.64, 1.65, 1.66, 1.67, 1.68, 1.69, or 1.7, or the like.

[0070] Further, the anti-reflective layer 13 is disposed on the side of the hard layer 12 away from the substrate 11, the refractive index of the anti-reflective layer 13 is relatively small, and is less than the refractive index of the substrate 11, and also less than the refractive index of the hard layer 12, which can effectively improve the anti-reflective effect of the optical film 10.

[0071] It should be noted that the anti-reflective layer 13 can be formed on the hard layer 12 by coating, for example, the anti-reflective layer 13 can be prepared by micro-concave coating, slot coating, lip coating, or the like.

[0072] In some embodiments, the antireflection layer 13 comprises a resin matrix 131 and the adjusting particles 132 distributed in the resin matrix 131, and a mass ratio of the resin matrix 131 to the adjusting particles 132 is greater than or equal to 1:2 and less than or equal to 2:1; for example, the mass ratio of the resin matrix 131 to the adjusting particles 132 can be 1:2, 2:3, 3:4, 1:1, 1:1.5 or 1:2, etc.

[0073] In some embodiments, a material of the resin matrix 131 can comprise a resin material with a refractive index less than or equal to 1.53 and a functionality greater than or equal to 2, and further, the resin matrix 131 can comprise one or more combinations of monomers and oligomers; for example, the resin matrix 131 can comprise polyethylene glycol diacrylate, ethoxylated trimethylolpropane triacrylate, multi-functional monomers such as dipentaerythritol hexaacrylate, polyurethane (meth)acrylate, fluorine-modified polyurethane (meth)acrylate, fluorine-silicon-modified polyurethane (meth)acrylate, etc.

[0074] In some embodiments, a material of the adjusting particles 132 can comprise at least one of silicon oxide, silicon carbide, silicon nitride, zinc oxide, magnesium oxide, aluminum oxide, calcium sulfate, calcium carbonate, potassium titanate, aluminum sulfate; preferably, the material of the adjusting particles 132 in the embodiments of the present application can be silicon dioxide.

[0075] The adjusting particles 132 are hollow particles, i.e., the adjusting particles 132 contain a hollow space inside and a shell layer covering the hollow space, so that the adjusting particles 132 can improve the transmittance of the antireflection layer 13 on the basis of achieving a low refractive index, thereby improving the transmittance of the optical film 10, and further, the hollow particles can reduce the refractive index of the antireflection layer 13, thereby reducing the reflectivity of the optical film 10, and a ratio of a shell thickness of the adjusting particles 132 to a diameter of the adjusting particles 132 is greater than or equal to 1 / 15 and less than or equal to 1 / 5; for example, the ratio of the shell thickness of the adjusting particles 132 to the diameter of the adjusting particles 132 can be 1 / 15, 2 / 15 or 1 / 5, etc.

[0076] In some embodiments, a porosity of the adjusting particles 132 is greater than or equal to 40% and less than or equal to 70%; for example, the porosity of the adjusting particles 132 can be 40%, 45%, 50%, 55%, 60%, 65% or 70%, etc.

[0077] In some embodiments, the diameter of the adjusting particles 132 is greater than or equal to 40 nm and less than or equal to 90 nm, for example, the diameter of the adjusting particles 132 can be 40 nm, 45 nm, 50 nm, 55 nm, 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, 85 nm or 90 nm, etc.

[0078] It can be understood that the diameter of the adjusting particles 132 in the above embodiments contains the shell thickness of the adjusting particles 132.

[0079] Further, the embodiments of the present application modify the surface of the adjusting particles 132 to facilitate the dispersibility of the adjusting particles 132 in the resin matrix 131 or to enhance the toughness of the adjusting particles 132, etc.

[0080] In some embodiments, when the adjusting particles 132 are surface modified, the surface of the adjusting particles 132 is modified by at least one of inorganic cations, inorganic anions, polymers, coupling agents or surfactants, that is, the surface of the adjusting particles 132 includes at least one of inorganic cation groups, inorganic anion groups, polymer groups, coupling agent groups or surfactant groups.

[0081] In some embodiments, the surface of the adjusting particles 132 is modified by at least one of inorganic magnesium salts, inorganic calcium salts, inorganic barium salts, inorganic strontium salts, stearic acid, stearate salts, sulfonic acid surfactants, thio surfactants, silane coupling agents, titanate coupling agents, aluminate coupling agents, metal complex coupling agents, phosphate coupling agents, borate coupling agents, polyacrylamides, alkyl phosphate esters, aryl phosphate esters, alkyl phosphate salts, aryl phosphate salts, alkyl alcohol amide phosphate esters, alkyl alcohol amide phosphate salts, imidazoline phosphate esters, imidazoline phosphate salts, high polymer phosphate salts and siloxane phosphate esters.

[0082] In some embodiments, the material of the anti-reflective layer 13 can also include leveling agents and other functional additives, for example, the leveling agents can include siloxanes, fluorine and fluorocarbons, etc.

[0083] In some embodiments, the mass fraction of the resin matrix 131 is greater than or equal to 30% and less than or equal to 60%, the mass fraction of the adjusting particles 132 is greater than or equal to 30% and less than or equal to 60%, and the mass fraction of the leveling agent in the material of the anti-reflective layer 13 can be greater than or equal to 0.1% and less than or equal to 2%.

[0084] In some embodiments, the thickness of the antireflection layer 13 is greater than or equal to 75 nm and less than or equal to 125 nm; for example, the thickness of the antireflection layer 13 can be 75 nm, 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 105 nm, 110 nm, 115 nm, 120 nm, or 125 nm, etc.

[0085] In some embodiments, the refractive index of the antireflection layer 13 is greater than or equal to 1.2 and less than or equal to 1.4; for example, the refractive index of the antireflection layer 13 can be 1.2, 1.25, 1.3, 1.35, or 1.4, etc.

[0086] It should be noted that the substrate 11 can be provided with an easy-to-stick layer on the side close to the hard layer 12 to adjust the surface tension of the substrate 11 on the side close to the hard layer 12, so as to improve the adhesion of the hard layer 12, that is, the adhesion between the hard layer 12 and the easy-to-stick layer is greater than the adhesion between the hard layer 12 and the substrate 11; in some embodiments, the material of the easy-to-stick layer can include at least one of polyester, polyurethane, and acrylate.

[0087] In addition, the side of the substrate 11 close to the hard layer 12 can also be subjected to corona treatment to activate the surface of the substrate 11 on the side close to the hard layer 12, which can also increase the adhesion between the substrate 11 and the hard layer 12.

[0088] In addition, in some embodiments, the hardness of the optical film 10 is greater than or equal to 2H / 500g, for example, the hardness of the optical film 10 can be 2H / 500g, 3H / 500g, 4H / 500g, or 5H / 500g, etc.; the water drop angle of the optical film 10 is greater than or equal to 100° and less than or equal to 130°, for example, the water drop angle of the optical film 10 can be 100°, 105°, 110°, 115°, 120°, 125°, or 130°, etc.; the light transmittance of the optical film 10 is greater than or equal to 94%, for example, the light transmittance of the optical film 10 can be 94%, 95%, 96%, 97%, 98%, or 99%, etc.; the haze of the optical film 10 is less than or equal to 6%, for example, the haze of the optical film 10 can be 6%, 5%, 4%, 3%, 2%, 1%, 0.5%, or 0.1%, etc.

[0089] As mentioned above, the present embodiment sets the parameters of the film layers in the optical film 10 to improve the smoothness of the light reflectance curve of the optical film 10, and the present embodiment provides embodiments 1 to 5 to verify the light reflectance curve of the optical film 10 provided by the present embodiment.

[0090] In Example 1, the material of the substrate 11 includes polyethylene terephthalate (PET), the thickness of the substrate 11 is 50 microns, the refractive index of the substrate 11 is 1.61, the light transmittance of the substrate 11 is 91.5%, the haze of the substrate 11 is 0.9%, the in-plane retardation value of the substrate 11 is 780 nm, and the easy-adhesion layer is arranged on the side of the substrate 11 close to the hard layer 12.

[0091] The hard layer 12 is cured by ultraviolet light, the material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate, the thickness of the hard layer 12 is 8 microns, and the refractive index of the hard layer 12 is 1.5.

[0092] The mass ratio of the resin matrix 131 to the adjusting particles 132 in the anti-reflection layer 13 is 1:1, the diameter of the adjusting particles 132 is 70 nm, the porosity of the adjusting particles 132 is 65%, the refractive index of the anti-reflection layer 13 is 1.35, the thickness of the anti-reflection layer 13 is 100 nm, the material of the resin matrix 131 is a mixture of (meth)acrylate and modified acrylate, and the material of the adjusting particles 132 is silicon oxide.

[0093] In Example 2, the material of the substrate 11 includes polymethyl methacrylate (PMMA), the thickness of the substrate 11 is 40 microns, the refractive index of the substrate 11 is 1.5, the light transmittance of the substrate 11 is 92.2%, the haze of the substrate 11 is 0.2%, and the in-plane retardation value of the substrate 11 is 0.5 nm.

[0094] The hard layer 12 is cured by heat, the material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate, the thickness of the hard layer 12 is 15 microns, and the refractive index of the hard layer 12 is 1.53.

[0095] The mass ratio of the resin matrix 131 to the adjusting particles 132 in the anti-reflection layer 13 is 1:1.5, the diameter of the adjusting particles 132 is 70 nm, the porosity of the adjusting particles 132 is 65%, the refractive index of the anti-reflection layer 13 is 1.3, the thickness of the anti-reflection layer 13 is 85 nm, the material of the resin matrix 131 is a mixture of (meth)acrylate and modified acrylate, and the material of the adjusting particles 132 is silicon oxide.

[0096] In Example 3, the material of the substrate 11 includes triacetyl cellulose (TAC), the thickness of the substrate 11 is 60 micrometers, the refractive index of the substrate 11 is 1.5, the light transmittance of the substrate 11 is 92.7%, the haze of the substrate 11 is 0.2%, and the in-plane retardation value of the substrate 11 is 27 nm.

[0097] The hard coat layer 12 is cured by ultraviolet light, the material of the hard coat layer 12 is a mixture of (meth)acrylate and modified acrylate, the thickness of the hard coat layer 12 is 10 micrometers, and the refractive index of the hard coat layer 12 is 1.5.

[0098] The mass ratio of the resin matrix 131 to the adjusting particles 132 in the anti-reflective layer 13 is 1:1, the diameter of the adjusting particles 132 is 50 nm, the porosity of the adjusting particles 132 is 50%, the refractive index of the anti-reflective layer 13 is 1.38, the thickness of the anti-reflective layer 13 is 100 nm, the material of the resin matrix 131 is a mixture of (meth)acrylate and modified acrylate, and the material of the adjusting particles 132 is silicon oxide.

[0099] In Example 4, the material of the substrate 11 includes cyclic olefin polymer (COP), the thickness of the substrate 11 is 40 micrometers, the refractive index of the substrate 11 is 1.52, the light transmittance of the substrate 11 is 93.1%, the haze of the substrate 11 is 0.1%, the in-plane retardation value of the substrate 11 is 1.5 nm, and the side of the substrate 11 close to the hard coat layer 12 is subjected to corona treatment.

[0100] The hard coat layer 12 is cured by ultraviolet light, the material of the hard coat layer 12 is a mixture of (meth)acrylate and modified acrylate, the thickness of the hard coat layer 12 is 10 micrometers, and the refractive index of the hard coat layer 12 is 1.5.

[0101] The mass ratio of the resin matrix 131 to the adjusting particles 132 in the anti-reflective layer 13 is 1:1, the diameter of the adjusting particles 132 is 70 nm, the porosity of the adjusting particles 132 is 65%, the refractive index of the anti-reflective layer 13 is 1.35, the thickness of the anti-reflective layer 13 is 120 nm, the material of the resin matrix 131 is a mixture of (meth)acrylate and modified acrylate, and the material of the adjusting particles 132 is silicon oxide.

[0102] In Example 5, the material of the substrate 11 includes polyethylene terephthalate (PET), the thickness of the substrate 11 is 80 microns, the refractive index of the substrate 11 is 1.61, the light transmittance of the substrate 11 is 91.9%, the haze of the substrate 11 is 1.5%, the in-plane retardation value of the substrate 11 is 8450 nm, and the easy-adhesion layer is arranged on one side of the substrate 11 close to the hard layer 12.

[0103] The hard layer 12 is cured by electron beam, the material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate, the thickness of the hard layer 12 is 5 microns, and the refractive index of the hard layer 12 is 1.5.

[0104] The mass ratio of the resin matrix 131 to the adjusting particles 132 in the anti-reflection layer 13 is 1:1.3, the diameter of the adjusting particles 132 is 70 nm, the porosity of the adjusting particles 132 is 65%, the refractive index of the anti-reflection layer 13 is 1.33, the thickness of the anti-reflection layer 13 is 90 nm, the material of the resin matrix 131 is a mixture of (meth)acrylate and modified acrylate, and the material of the adjusting particles 132 is silicon oxide.

[0105] In Examples 1 to 5, the parameters of the optical film 10 are shown in Table 1 and Table 2.

[0106] Table 1

[0107]

[0108] Table 2

[0109]

[0110] And the verification results are shown in Table 3 and the curves in Figures 2, 3, 4, 5 and 6.

[0111] The reflectivity test method includes: cutting the optical film 10 provided in Examples 1 to 5 into a size of 5 cm x 5 cm, and note that the film cutting process cannot contaminate and damage the surface coating. A black tape (product model: MTT-BB50) produced by Xinyun Optoelectronics (Changzhou) Co., Ltd. is used to tear off one side of the release film, and is attached to the substrate 11 side of the optical film 10, and note that the attachment should be flat and cannot have bubbles and wrinkles. A spectrophotometer (Japan Shimadzu, model: UV-3600plus) is used to measure the reflectivity at 5° angle reflection in the wavelength range of 380nm-780nm (0° is the vertical direction of the low-refractive coating surface). The conditions for measuring reflectivity: C light source, field angle 2°.

[0112] Table 3

[0113] Hardness Average reflectivity Minimum reflectivity Transmittance Haze Water drop angle reflectivity curve Example 12 1.25% 0.61% 94.50% 0.90% 105° smooth Example 22 0.90% 0.38% 95.50% 0.50% 110° smooth Example 33 1.36% 0.69% 95.10% 0.50% 110° smooth Example 42 1.22% 0.62% 95.70% 0.30% 105° smooth Example 53 0.95% 0.45% 95.40% 0.90% 110° smooth

[0114] As shown in Table 3 and the curves shown in FIG. 3, FIG. 4, FIG. 5, FIG. 6 and FIG. 7, the light reflection curve of the optical film 10 provided in the embodiments of the present application is a smooth curve, which can effectively reduce the fluctuation of the reflectivity of the optical film 10 to visible light, avoid the wave-like fluctuation of the reflectivity of the optical film 10 to visible light, and improve the antireflection effect of the optical film 10.

[0115] In the embodiments of the present application, the reflectivity of the optical film 10 to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film 10 to the second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm; that is, the reflectivity of the optical film 10 to light with a wavelength in the range of 380 nm to the preset wavelength decreases as the wavelength of the light increases, and the reflectivity of the optical film 10 to light with a wavelength in the range of the preset wavelength to 780 nm increases as the wavelength of the light increases.

[0116] It can be understood that the optical film 10 provided in the embodiments of the present application has a trend of first decreasing and then increasing in the visible light wavelength range, and the process of decreasing and increasing is a smooth curve.

[0117] In some embodiments, the preset wavelength is greater than or equal to 500 nm and less than or equal to 650 nm; that is, the reflectivity of the optical film 10 provided in the embodiments of the present application is the lowest to light with a wavelength in the range of 500 nm to 650 nm, and the light in this wavelength range is more sensitive to the human eye. Therefore, the optical film 10 provided in the embodiments of the present application can further reduce the influence of reflected light on the user when using the optical film 10.

[0118] Further, in some embodiments, the reflectivity of the optical film 10 to light having the preset wavelength is greater than or equal to 0.1% and less than or equal to 0.6%, that is, the optical film 10 provided in the embodiments of the present application effectively reduces the reflectivity of the optical film 10 to light in the range of the wavelength sensitive to the human eye, thereby improving the display effect of the display panel having the optical film 10.

[0119] In some embodiments, the average reflectivity of the optical film 10 to the first type of light and the second type of light is greater than or equal to 0.6% and less than or equal to 1.5%.

[0120] In summary, the reflectivity of the optical film 10 to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film 10 to the second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to the preset wavelength, and the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm; thereby the fluctuation of the reflectivity of the optical film 10 to visible light can be reduced, avoiding the reflectivity of the optical film 10 to visible light fluctuating in a wave shape, and improving the antireflection effect of the optical film 10.

[0121] In addition, referring to FIG. 8, the embodiments of the present application also provide a polarizer 100, the polarizer 100 comprising a polarizing layer 20 and the optical film 10, the optical film 10 being disposed on one side of the polarizing layer 20.

[0122] In some embodiments, the polarizing layer 20 is located on the side of the substrate 11 away from the hard layer 12, the polarizer 100 further comprising a compensation layer 31 disposed on the side of the polarizing layer 20 away from the substrate 11, and an adhesive layer 32 disposed on the side of the compensation layer 31 away from the polarizing layer 20.

[0123] It should be noted that the side of the substrate 11 close to the polarizing layer 20 can be provided with a tacky layer to adjust the surface tension of the side of the substrate 11 close to the polarizing layer 20, so as to improve the adhesion of the polarizing layer 20, that is, the adhesion between the polarizing layer 20 and the tacky layer is greater than the adhesion between the polarizing layer 20 and the substrate 11; in some embodiments, the material of the tacky layer can comprise at least one of polyester, polyurethane and acrylate.

[0124] In addition, the side of the substrate 11 close to the polarizing layer 20 can also be subjected to corona treatment to activate the surface of the side of the substrate 11 close to the polarizing layer 20, which can also increase the adhesion between the substrate 11 and the polarizing layer 20.

[0125] In some embodiments, the material of the adhesive layer 32 can be selected from at least one of water-based glue, pressure-sensitive glue, and ultraviolet glue, the material of the water-based glue can be selected from polyvinyl alcohol, the material of the pressure-sensitive glue can be selected from acrylate copolymer, and the material of the ultraviolet glue can be selected from multifunctional acrylate monomer.

[0126] In some embodiments, the polarizing sheet 100 further comprises a release film 33 arranged on the side of the adhesive layer 32 away from the polarizing layer 20 and a protective film 34 arranged on the side of the optical film 10 away from the polarizing layer 20, and the release film 33 and the protective film 34 can be removed during use of the polarizing sheet 100, and the side provided with the adhesive layer 32 is attached to the surface of the display.

[0127] In another embodiment of the present application, referring to FIG. 9, in the present embodiment, the polarizing sheet 100 further comprises an adhesive layer 32 arranged on the side of the polarizing layer 20 away from the substrate 11, that is, the difference between the polarizing sheet 100 provided in the present embodiment and the embodiment shown in FIG. 7 is that the compensating layer 31 is not arranged in the polarizing sheet 100.

[0128] As described above, the polarizing sheet 100 provided in the embodiments of the present application contains the optical film 10 provided in the above-mentioned embodiments, thereby effectively improving the antireflection effect of the polarizing sheet 100 and improving the display effect of the display using the polarizing sheet 100.

[0129] In addition, referring to FIG. 10, the present embodiment further provides a display panel, which comprises a panel body 200 and the polarizing sheet 100, and the polarizing sheet 100 is arranged on the light-emitting side of the panel body 200.

[0130] In some embodiments, the display panel can be a liquid crystal display panel or an organic light-emitting diode display panel.

[0131] It can be understood that since the display panel contains the polarizing sheet 100 described in the above-mentioned embodiments, that is, contains the optical film 10 described in the above-mentioned embodiments, the present embodiment can effectively improve the antireflection effect of the display panel and improve the display effect of the display panel.

[0132] In the above-mentioned embodiments, the description of each embodiment has its own focus, and the parts not described in detail in a certain embodiment can be referred to the relevant description of other embodiments.

[0133] The above has carried out the detailed introduction to the optical film, the polarizer and the display panel provided by the embodiment of the application, the principle and the implementation mode of the application are described in this paper, the above embodiment is only used to help understand the technical scheme of the application and its core idea; the ordinary skilled in the art should understand that: it can still modify the technical scheme recorded by the foregoing embodiments, or make equivalent replacement to part of the technical features; and these modifications or replacements do not make the essence of the corresponding technical scheme deviate from the scope of the technical scheme of the embodiments of the application.

Claims

1. An optical film, comprising: a substrate; a hard layer disposed on one side of the substrate; an anti-reflection layer disposed on a side of the hard layer distal to the substrate, the anti-reflection layer having adjusting particles distributed therein; wherein a reflectance of the optical film for a first type of light decreases as a wavelength of the first type of light increases, a reflectance of the optical film for a second type of light increases as a wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm.

2. The optical film of claim 1, wherein, The preset wavelength is greater than or equal to 500 nm and less than or equal to 650 nm.

3. The optical film of claim 1 or 2, wherein, An average reflectance of the optical film for the first type of light and the second type of light is greater than or equal to 0.6% and less than or equal to 1.5%.

4. The optical film of claim 1 or 2, wherein, A reflectance of the optical film for light having the preset wavelength is greater than or equal to 0.1% and less than or equal to 0.6%.

5. The optical film of claim 1, wherein, The substrate has a thickness greater than or equal to 15 microns and less than or equal to 120 microns; The substrate has a refractive index greater than or equal to 1.45 and less than or equal to 1.65; The substrate has an in-plane retardation value of a material of the substrate greater than or equal to 0 nm and less than or equal to 1000 nm, or the substrate has an in-plane retardation value of a material of the substrate greater than or equal to 3000 nm.

6. The optical film of claim 1, wherein, The hard layer has a thickness greater than or equal to 2 microns and less than or equal to 16 microns; The hard layer has a hardness greater than or equal to 2H / 500g; The hard layer has a refractive index greater than or equal to 1.45 and less than or equal to 1.

7.

7. The optical film of claim 1, wherein, The anti-reflection layer has a thickness greater than or equal to 75 nm and less than or equal to 125 nm; The anti-reflection layer has a refractive index greater than or equal to 1.2 and less than or equal to 1.

4.

8. The optical film of claim 1, wherein, The anti-reflection layer comprises a resin matrix and the adjusting particles distributed in the resin matrix, a mass ratio of the resin matrix to the adjusting particles is greater than or equal to 1:2 and less than or equal to 2:

1.

9. The optical film of claim 1 or 8, wherein, The adjusting particles are hollow particles, a ratio of a shell thickness of the adjusting particles to a diameter of the adjusting particles is greater than or equal to 1 / 15 and less than or equal to 1 / 5.

10. The optical film of claim 9, wherein, The adjusting particles have a porosity greater than or equal to 40% and less than or equal to 70%; The adjusting particles have a diameter greater than or equal to 40 nm and less than or equal to 90 nm. 11.A polarizing sheet, comprising a polarizing layer and an optical film disposed on one side of the polarizing layer, the optical film comprising: a substrate; a hard layer disposed on one side of the substrate; an anti-reflection layer disposed on a side of the hard layer distal to the substrate, the anti-reflection layer having adjusting particles distributed therein; The reflectivity of the optical film to the first type of light decreases with the increase of the wavelength of the first type of light, the reflectivity of the optical film to the second type of light increases with the increase of the wavelength of the second type of light, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm.

12. The polarizing sheet according to claim 11, wherein The preset wavelength is greater than or equal to 500 nm and less than or equal to 650 nm.

13. The polarizing sheet according to claim 11 or 12, wherein The average reflectivity of the optical film to the first type of light and the second type of light is greater than or equal to 0.6% and less than or equal to 1.5%.

14. The polarizing sheet according to claim 11 or 12, wherein The reflectivity of the optical film to light with the preset wavelength is greater than or equal to 0.1% and less than or equal to 0.6%.

15. The polarizing sheet according to claim 11, wherein The thickness of the substrate is greater than or equal to 15 microns and less than or equal to 120 microns. The refractive index of the substrate is greater than or equal to 1.45 and less than or equal to 1.

65. The in-plane retardation value of the material of the substrate is greater than or equal to 0 nm and less than or equal to 1000 nm, or the in-plane retardation value of the material of the substrate is greater than or equal to 3000 nm.

16. The polarizing sheet according to claim 11, wherein The thickness of the hard layer is greater than or equal to 2 microns and less than or equal to 16 microns. The hardness of the hard layer is greater than or equal to 2H / 500g. The refractive index of the hard layer is greater than or equal to 1.45 and less than or equal to 1.

7.

17. The polarizing sheet according to claim 11, wherein The thickness of the antireflection layer is greater than or equal to 75 nm and less than or equal to 125 nm. The refractive index of the antireflection layer is greater than or equal to 1.2 and less than or equal to 1.

4.

18. The polarizing sheet according to claim 11, wherein The antireflection layer comprises a resin matrix and the adjusting particles distributed in the resin matrix, and the mass ratio of the resin matrix to the adjusting particles is greater than or equal to 1:2 and less than or equal to 2:

1.

19. The polarizing sheet according to claim 11 or 18, wherein The adjusting particles are hollow particles, and the ratio of the shell thickness of the adjusting particles to the diameter of the adjusting particles is greater than or equal to 1 / 15 and less than or equal to 1 / 5.

20. A display panel, comprising a panel body and a polarizing sheet arranged on the light-emitting side of the panel body. The polarizing sheet comprises a polarizing layer and an optical film arranged on one side of the polarizing layer, and the optical film comprises: a substrate; a hard layer arranged on one side of the substrate; an antireflection layer arranged on the side of the hard layer away from the substrate, and the antireflection layer is distributed with adjusting particles; The reflectivity of the optical film to the first type of light decreases with the increase of the wavelength of the first type of light, the reflectivity of the optical film to the second type of light increases with the increase of the wavelength of the second type of light, the wavelength of the first type of light is greater than or equal to 380 nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780 nm, and the preset wavelength is greater than 380 nm and less than 780 nm.

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