Method and system for quantitative and time-resolved measurement of the material fluxes of a plasma acting on a surface.
The modified quartz crystal microbalance with a bias pulse system addresses the lack of temporal resolution in QCM systems by partitioning plasma pulses to differentiate ion and neutral fluxes, providing detailed analysis of plasma deposition and etching dynamics on microsecond timescales.
WO2026125054A1PCT designated stage Publication Date: 2026-06-18CENT NAT DE LA RECH SCI (C N R S) +2
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- CENT NAT DE LA RECH SCI (C N R S)
- Filing Date
- 2025-12-01
- Publication Date
- 2026-06-18
Smart Images
Figure EP2025084970_18062026_PF_FP_ABST
Abstract
Method for quantitatively and temporally characterizing particles of a plasma comprising ions and neutrals by means of a probe The method comprises: - applying several plasma pulses, - for each plasma pulse considered, applying a bias pulse consisting in applying a bias voltage on the probe, this voltage being intended to prevent the ions from reaching the probe, the total plasma duration being partitioned into N parts or time-steps of duration T, - the bias pulse is applied with a temporal overlap zone between the plasma pulse and the bias pulse, the temporal overlap zone being different on each application of a bias pulse, the temporal overlap zones sweeping the entire total plasma duration in steps of duration T, - carrying out, over at least the entire total plasma duration, a quantitative measurement Qn of the ions and neutrals reaching the probe, n ranging from 1 to N.
Need to check novelty before this filing date? Find Prior Art