Method for treating a structural component of an electrochemical cell and coated structural component

The HiPIMS-based method for treating electrochemical cell components addresses the challenges of native oxide layers by forming an interfacial layer, enhancing adhesion and conductivity, and reducing noble metal loadings, resulting in durable and efficient coatings.

WO2026125633A2 Publication Date: 2026-06-18INDUSTRIE DE NORA SPA +1
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
INDUSTRIE DE NORA SPA
Filing Date
2025-12-11
Publication Date
2026-06-18

AI Technical Summary

⚠Technical Problem

Existing methods for coating structural components of electrochemical cells, such as porous transport layers, with noble metals like platinum face issues of high metal usage, inadequate adhesion, and non-uniformity due to the presence of native oxide layers, leading to delamination and increased interfacial resistance.

⚗Method used

A method involving High-Power Impulse Magnetron Sputtering (HiPIMS) is used to remove the native oxide layer and form an interfacial layer comprising substrate and etching metals, followed by a HiPIMS deposition of a coating metal layer, reducing noble metal loadings while improving adhesion and conductivity.

🎯Benefits of technology

The method results in coated structural components with enhanced durability and electrochemical performance, maintaining low interfacial resistance and improved adhesion, even with reduced noble metal usage.

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Abstract

The present invention relates to a method for treating a structural component of an electrochemical cell. The structural component comprises a substrate metal layer having an oxide layer on at least a portion of a surface of the substrate metal layer. The method comprises subjecting at least said portion of the surface to a first physical vapor deposition process using an etching metal, wherein the first physical vapor deposition process is a High-Power Impulse Magnetron Sputtering metal-ion etching (HiPIMS-MIE) process operated under conditions effective to remove at least part of the oxide layer and to form an interfacial layer comprising the substrate metal and the etching metal, and subsequently subjecting at least said portion of the surface to a second physical vapor deposition process using a coating metal, operated under conditions effective to form a coating metal layer. The invention further relates to coated structural components obtainable by the method and to electrochemical cells comprising such coated structural components.
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