Micro-patterning for waveguide input port
A non-linear and irregularly oscillating boundary line in waveguides reduces scattering interference, effectively minimizing visual defects and improving image quality by ensuring adjacent light rays destructively interfere, thus overcoming previous limitations.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- ENVISICS LTD
- Filing Date
- 2025-12-15
- Publication Date
- 2026-06-25
AI Technical Summary
Existing waveguides suffer from visual artefacts and defects caused by constructive scattering interference at the boundary of the input port and reflective coating, which previous attempts to minimize have not fully eliminated.
Introduce a non-linear and irregularly oscillating boundary line between the input port and reflective section of the waveguide, using a modified photolithographic mask to create a pattern of alternating peaks and troughs that suppress scattering intensity through destructive interference.
Reduces the appearance of visual artefacts by ensuring adjacent light rays receive different phase shifts, maintaining manufacturing simplicity while enhancing image quality.
Smart Images

Figure EP2025087091_25062026_PF_FP_ABST