Prober and measurement method using same

WO2026140421A1PCT designated stage Publication Date: 2026-07-02TOKYO SEIMITSU CO LTD

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
TOKYO SEIMITSU CO LTD
Filing Date
2025-10-10
Publication Date
2026-07-02

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    Figure JP2025036008_02072026_PF_FP_ABST
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Abstract

A prober 1 has a chuck with a suction groove for applying negative pressure for suction formed on the upper surface thereof. This prober measurement method comprises: a step in which a workpiece to be measured is placed on the upper surface of the chuck; a step in which the suction force resulting from the negative pressure is adjusted in accordance with the characteristics or state of the workpiece; and a step in which a probe is brought into contact with the workpiece and measurement is performed.
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Claims

1. A method for measuring a prober having a chuck with an adsorption groove formed on its upper surface for applying negative pressure for adsorption, comprising: placing a workpiece to be measured on the upper surface of the chuck; adjusting the adsorption force due to the negative pressure according to the characteristics or condition of the workpiece; and bringing a probe into contact with the workpiece to perform a measurement.

2. The probe measurement method according to claim 1, wherein the step of adjusting the adsorption force is to adjust the adsorption force based on the temperature of the workpiece at the time of measurement.

3. The probe measurement method according to claim 2, wherein the step of adjusting the adsorption force is to acquire temperature information of the workpiece by bringing the probe into contact with the workpiece.

4. The probe measurement method according to claim 1, wherein the step of adjusting the suction force is to adjust the suction force based on the magnitude of the frictional resistance of the workpiece in contact with the upper surface of the chuck.

5. The probe measurement method according to any one of claims 1 to 4, wherein at least two levels are set as the adjustment level of the adsorption force, and the step of adjusting the adsorption force is to adjust the adsorption force in stages according to the characteristics or condition of the workpiece.

6. A prober for performing measurements by bringing a probe into contact with a workpiece, comprising: a chuck having a suction groove formed on its upper surface for applying negative pressure to attract the workpiece; a pressure adjustment unit for adjusting the suction force due to the negative pressure; and a control unit for controlling the pressure adjustment unit, wherein the control unit controls the pressure adjustment unit according to the characteristics or condition of the workpiece placed on the chuck, and adjusts the suction force due to the negative pressure.

7. The prober according to claim 6, wherein the control unit maintains an adjustment standard that associates information of the workpiece to be measured with the level of the suction force, acquires information of the workpiece placed on the chuck, identifies a level corresponding to the acquired workpiece information based on the adjustment standard, and controls the pressure adjustment unit so that the suction force becomes the identified level.

8. The prober according to claim 7, further comprising a pressure sensor for detecting negative pressure supplied to the chuck, wherein the control unit performs feedback control so that the pressure detected by the pressure sensor approaches a target pressure corresponding to the level of the suction force.

9. The prober according to claim 6, further comprising a temperature adjustment unit that adjusts the temperature of the chuck by heating or cooling the chuck, wherein the control unit controls the pressure adjustment unit based on the temperatures of both the workpiece and the chuck.