Nano-scale highly-dispersed structured white carbon black material and preparation method therefor

Abstract

The present invention relates to the technical field of white carbon black materials, and relates to a nano-scale highly-dispersed structured white carbon black material and a preparation method therefor. Disclosed in the present invention is a novel nano-scale highly-dispersed structured white carbon black, which comprises 98% by weight or more of SiO2 and 2-5% by weight of free water, has a specific surface area of 120 m2 / g to 390 m2 / g, and has a primary particle size of < 10 nm in a primary fixed structure. Also disclosed in the present invention is a preparation method for the novel nano-scale highly-dispersed structured white carbon black, wherein the nano-scale highly-dispersed structured white carbon black is directly prepared by means of dissolution, synthesis, filtration and spraying, and the method fundamentally solves the worldwide problems of poor dispersion of white carbon black and failure in being standard-compliant in one-step synthesis which have long troubled the white carbon black industry. In addition, the process of the present invention can reduce the production cost of white carbon black by means of avoiding ultrafine processing and grinding means, and creatively produces an alternative for fumed silica.

Description

A nanoscale highly dispersed silica shaped structure material and its preparation method Technical Field

[0001] This invention relates to the field of silica materials technology, and in particular to a nanoscale highly dispersed silica shaped structure material and its preparation method. Background Technology

[0002] A novel nanoscale, highly dispersed, shaped silica, also known as hydrated silica, boasts performance comparable to fumed silica. However, significant differences exist in cost and yield: the former is inexpensive and produces abundant output, while the latter is costly and has limited production. Currently, there are two main industrial-scale silica production processes both domestically and internationally: one is the fumed silica process using silicon tetrachloride or silicon trichloride as raw materials, and the other is the precipitation process using water glass as raw material.

[0003] Current Status and Development Trends of Fumed Silica

[0004] Fumed silica is known for its high product dispersibility, but its complex process, high cost, huge investment, and high energy consumption limit its output and application expansion. Overseas, the annual output of a single fumed silica plant typically exceeds 5,000 tons, and the product range is diverse with various grades.

[0005] In the domestic market, the fumed silica production process is almost entirely monopolized by foreign giants such as Cabot and Wacker. While a few small-scale facilities exist domestically, such as Guangzhou Gibbs Technology Industry Co., Ltd., which built a production line utilizing organosilicon byproducts to produce fumed silica, increasing annual output from 500 tons to 2,000 tons, it is worth noting that East China University of Science and Technology and Shanghai Chlor-Alkali Co., Ltd. have successfully developed and promoted "nano-grade silica fumed silica combustion preparation technology and equipment," breaking the monopoly of a few developed countries in this field.

[0006] The development trend of fumed silica is to simplify the production process and reduce production costs while maintaining high dispersibility.

[0007] Current Status and Development Trends of Precipitated Silica

[0008] With societal progress and increasingly stringent environmental protection requirements, the rubber tire industry has a growing need for low rolling resistance and low emissions. Therefore, the replacement of carbon black with highly dispersed, high-performance silica has become an inevitable trend.

[0009] Whether using the fumed silica or precipitated silica method, the development of high-performance silica is trending towards higher dispersion ratios and nano-sized particles. Internationally, major producers of precipitated silica include France, Germany, the United States, and Japan, with Europe's total production reaching approximately 1 million tons annually. German companies lead in annual production, exceeding 500,000 tons; Rhodia of France follows closely with over 350,000 tons annually; the United States and the Americas together produce over 700,000 tons; and Asia, including Japan, South Korea, and China, also produces over 750,000 tons annually. In addition, Spain, the United Kingdom, Belgium, and Italy also have some production, but this is mostly through subsidiaries of German and American companies.

[0010] The three largest companies in Germany, France, and the United States account for more than half of the global production of precipitated silica. These companies are not only major producers of fumed silica, but their precipitated silica products also feature small average particle size and narrow particle size distribution. Currently, high-quality precipitated silica in the domestic market is mainly supplied by these companies.

[0011] However, while imported precipitated high-dispersibility silica products undergo secondary surface treatment to improve dispersibility, the process is complex and costly, and still cannot achieve complete dispersion. This increases user costs and requires additional chemical reagents and dispersants to achieve the desired results.

[0012] Currently, although fumed silica is highly favored for its high quality, its large-scale production faces challenges due to complex processes, large equipment investments, limited raw material sources, and high costs. In contrast, while conventional precipitated silica has a large output, its product performance is difficult to achieve high dispersion levels, mainly producing micron-sized products with particle sizes between 35-45 micrometers, which cannot meet the market demand for ultrafine products.

[0013] There are numerous domestic manufacturers of precipitated silica, but their products are limited in variety, low in quality, have low activity, are difficult to control in particle size, and exhibit poor affinity. Furthermore, the surface of the particles suffers from hydrophilic agglomeration and bonding, affecting the product's binding strength. Based on dispersibility, precipitated silica can be classified into low-dispersibility (LDS), easily dispersible (EDS), and high-dispersibility (HDS) products. Currently, over 90% of silica products on the market are LDS grade. Only wholly foreign-owned enterprises and Sino-foreign joint ventures can produce EDS grade products, while there are no reports on the production of HDS grade products. Summary of the Invention

[0014] To address the above problems, this invention provides a nanoscale highly dispersed silica shaped structure material and its preparation method.

[0015] In a first aspect, the present invention provides a nanoscale highly dispersed silica shaped structure material, wherein the nanoscale highly dispersed silica shaped structure material contains more than 98% SiO2 by weight and 2% to 5% free water by weight; the specific surface area of ​​the nanoscale highly dispersed silica shaped structure material is 120 m². 2 / g~390 m 2 / g, and the original particle size in the primary shaped structure is <10 nanometers.

[0016] Secondly, the present invention provides a method for preparing the nanoscale highly dispersed silica shaped structure material according to any one of the first aspects, the preparation method comprising the following steps:

[0017] Sodium silicate was dissolved in a solvent, then concentrated sulfuric acid and a dispersant were added and stirred to react, yielding the first reactant.

[0018] Add a pH adjuster and a dispersant to the first reactant until the pH of the system is 4-10, and then allow it to mature to obtain the second reactant.

[0019] The second reactant is subjected to pressure filtration, washing, slurrying and drying to obtain the nano-scale highly dispersed silica shaped structure material.

[0020] Further, the dispersant includes Na2SO4; the solvent includes water; the concentrated sulfuric acid has a mass percentage concentration of 93-99%; and the sodium silicate contains 8.2%-12% Na2O and 26%-35% SiO2 by weight.

[0021] Furthermore, in preparing the first reactant, the amounts of sodium silicate, concentrated sulfuric acid, and Na2SO4 are in the following relationship (100~130 kg / m³). 3 (0.2~0.5 kg / m) 3 (0.02~0.06g / L).

[0022] Furthermore, when adjusting the pH value of the first reactant, the amount of Na2SO4 added is 0.02 g / L to 0.06 g / L.

[0023] Furthermore, the operating conditions for the stirring reaction include: a temperature of 60~89℃ and a time of 0.75 hours~1.2 hours.

[0024] Furthermore, the curing working conditions parameters include: temperature of 45~65℃ and time of 45 minutes~60 minutes.

[0025] Furthermore, the steps of pressure filtration, washing, slurrying, and drying of the second reactant include the following processes:

[0026] a. Filtration: The second reactant is subjected to pressure filtration to initially remove moisture from the second reactant, resulting in a filter cake with a solid content of 18~23wt%.

[0027] b. Washing: The filter cake is washed with water to remove the dispersant from the filter cake;

[0028] c. Pulping: The washed filter cake is pulped to form a liquid slurry;

[0029] d. Drying: The slurry is dried to obtain a product containing 2% to 5% free water by weight.

[0030] Furthermore, the drying process employs spray drying, and the operating conditions for the spray drying include: using a spray dryer with both large and small nozzles, and the inlet temperature during spraying is 580~980℃.

[0031] Furthermore, the drying is carried out by spray drying, and an activator is added to the slurry during the spray drying process. The activator includes at least one of diethylene glycol, n-butanol, propylene glycol, triethanolamine, cyclohexylamine, and diphenylguanidine; the amount of the activator added is 0.2 g / L to 22 g / L.

[0032] The technical solutions provided in the embodiments of the present invention have at least the following advantages compared with the prior art:

[0033] This invention discloses a novel nanoscale highly dispersed shaped silica, containing more than 98% SiO2 by weight and 2%~5% free water by weight, with a specific surface area of ​​120 m². 2 / g~390 m 2 / g, the primary particle size in the one-time shaped structure is <10 nanometers. This invention also discloses a novel method for preparing nanoscale highly dispersed shaped silica, which directly prepares shaped nanoscale highly dispersed silica through dissolution-synthesis-filtration-spraying, fundamentally solving the long-standing global problem in the silica industry—poor dispersion of silica and the inability to synthesize to standard in one step. At the same time, the process of this invention not only reduces the production cost of silica, but also creates a substitute for gas-phase silica by eliminating the need for ultrafine grinding and other methods. Attached Figure Description

[0034] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0035] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0036] Figure 1 is a schematic flowchart of a method for preparing a nanoscale highly dispersed silica shaped structure material according to an embodiment of the present invention.

[0037] Figure 2 shows the original particle size of the nanoscale highly dispersed silica shaped structure material provided in Example 1 of the present invention, which is <10 nm.

[0038] Figure 3 is a comparison of the microscopic characterization of the silica material obtained by the prior art of this invention.

[0039] Figure 4 is a comparison of the microscopic characterization of the silica material obtained by the prior art of this invention.

[0040] Figure 5 is a comparison of the microscopic characterization of the silica material obtained by the prior art of this invention.

[0041] Figure 6 shows the original particle size of the nanoscale highly dispersed silica shaped structure material provided in Example 1 of the present invention, which is <10 nm.

[0042] Figure 7 shows the original particle size of the nanoscale highly dispersed silica shaped structure material provided in Example 2 of the present invention, which is <10 nm.

[0043] Figure 8 shows the original particle size of the nanoscale highly dispersed silica shaped structure material provided in Example 3 of the present invention, which is <10 nm. Embodiments of the present invention

[0044] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0045] Unless otherwise specified, all raw materials, reagents, instruments and equipment used in this invention can be purchased from the market or prepared by existing methods.

[0046] In a first aspect, the present invention provides a nanoscale highly dispersed silica shaped structure material, wherein the nanoscale highly dispersed silica shaped structure material contains more than 98% SiO2 by weight and 2% to 5% free water by weight; the specific surface area of ​​the nanoscale highly dispersed silica shaped structure material is 120 m². 2 / g~390 m 2 / g, and the original particle size in the primary shaped structure is <10 nanometers.

[0047] This invention discloses a novel nanoscale highly dispersed shaped silica, containing more than 98% SiO2 by weight and 2%~5% free water by weight, with a specific surface area of ​​120 m². 2 / g~390 m 2 / g, the primary particle size in the one-time shaped structure is <10 nanometers. This invention also discloses a novel method for preparing nanoscale highly dispersed shaped silica, which directly prepares shaped nanoscale highly dispersed silica through dissolution-synthesis-filtration-spraying, fundamentally solving the long-standing global problem in the silica industry—poor dispersion of silica and the inability to synthesize to standard in one step. At the same time, the process of this invention not only reduces the production cost of silica, but also creates a substitute for gas-phase silica by eliminating the need for ultrafine grinding and other methods.

[0048] Secondly, the present invention provides a method for preparing the nanoscale highly dispersed silica shaped structure material according to any one of the first aspects, the preparation method comprising the following steps:

[0049] Sodium silicate was dissolved in a solvent, then concentrated sulfuric acid and a dispersant were added and stirred to react, yielding the first reactant.

[0050] Add a pH adjuster and a dispersant to the first reactant until the pH of the system is 4-10, and then allow it to mature to obtain the second reactant.

[0051] The second reactant is subjected to pressure filtration, washing, slurrying and drying to obtain the nano-scale highly dispersed silica shaped structure material.

[0052] The chemical reaction process of this invention mainly includes: Na2O3·36SiO2 + H2SO4 → 3·36SiO2 + Na2SO4 + H2O. The method of this invention involves controlling the addition of synthetic acids and bases to the reaction. The precipitation reaction of silica is an acid-base neutralization and metathesis reaction, and obtaining high-performance, highly dispersed nano-sized shaped silica is not easy. This is because the synthesis mechanism is complex, and many complex physicochemical parameters affect the reaction. A key aspect is preventing the silica solid solution from agglomerating into microporous silica gel, thus destroying the shaped structure. The presence of microporous gel is one of the reasons for the high specific surface area of ​​silica, mainly containing "acidic specific surface area," and forming a tight network structure that easily traps excessive sodium ions. Drying causes the product particle size to harden, whiteness to decrease, and the specific surface area to increase, directly leading to poor dispersion of silica and affecting the use of subsequent products.

[0053] The electrolyte used is added to the precipitation reaction solution as a silica sol stabilizer; in the concentrated sulfuric acid process, Na₂SO₄ solution can be used as a stabilizer. Silica sol has good stability under suitable conditions, mainly due to the charged nature of the material.

[0054] pH control: SiO2 particles begin to carry a negative charge above pH 3.5. In silica sol, the SiO2 particles become charged because surface SiO2 molecules interact with water molecules to form M2SiO3, which then ionizes, resulting in a weakly alkaline sol. Due to the strong ionization of M2SiO3, the material carries a high charge, but M... + The diffusion ability of ions is stronger than that of hydrogen ions, so silica sol is more stable.

[0055] The effect of stirring: SiO2 gel is an irreversible microporous gel, therefore it can only be re-dissolved by solvent and stirring when its coagulation bonds are not strong. This is the basis for providing sufficient stirring intensity in the production of silica. However, there is a limit to the stirring speed. Therefore, the stirring speed is selected in the range of 43~200 rpm during the production process.

[0056] The method of this invention is a technology for the industrial production of nanoscale highly dispersed shaped silica, which solves the long-standing global problem of poor product shaped structure and microporous gel dispersion that has plagued the silica industry for a long time, namely the one-time synthesis of shaped silica using large-capacity concentrated sulfuric acid.

[0057] Compared with existing technologies, this invention employs a large-capacity precipitation method to produce nanoscale highly dispersed and shaped silica in a single process, meaning a single production line can achieve an annual output of 20,000 tons. No subsequent ultrafine or grinding processes are required. Simultaneously, the synthesis time for each step is reduced from 4.6 hours to 2.6 hours, and the use of catalysts, currently a hot research topic in the industry, is abandoned. The dispersant Na2SO4 is developed; nanoscale highly dispersed and shaped silica with a primary SiO2 particle size <10nm is produced, exhibiting high dispersibility and bidirectional adjustment between amorphous and shaped forms, with free water content controlled between 2% and 5%.

[0058] The method of this invention is energy-saving and consumption-reducing. In the chemical reaction, concentrated sulfuric acid (98% or higher, without dilution) is directly added to the synthesis reaction, utilizing its exothermic reaction to complete the synthesis. In the filter press pulping process, a filter press and pulping machine are used, reducing water consumption by 50% and electricity consumption by 85% per ton of product. In the spray drying process, large and small nozzles are used to refine the pulp, controlling the set and free water content during drying to between 2% and 5%, reducing subsequent processing costs. It also improves quality assurance.

[0059] In some specific embodiments, the dispersant includes Na2SO4; the solvent includes water; the concentrated sulfuric acid has a mass percentage concentration of 93-99%; and the sodium silicate contains 8.2%-12% Na2O and 26%-35% SiO2 by weight.

[0060] In some specific embodiments, when preparing the first reactant, the amounts of sodium silicate, concentrated sulfuric acid, and Na2SO4 are in the following relationship: (100~130 kg / m3): (0.2~0.5 kg / m3): (0.02~0.06 g / L).

[0061] In some specific embodiments, when adjusting the pH value of the first reactant, the amount of Na2SO4 added is 0.02 g / L to 0.06 g / L.

[0062] In some specific embodiments, the operating conditions of the stirring reaction include: a temperature of 60~89℃, a time of 0.75 hours~1.2 hours, and a rotation speed of 43~220 rpm.

[0063] In some specific embodiments, the curing working conditions include: a temperature of 45~65℃ and a time of 45 minutes~60 minutes.

[0064] In some specific embodiments, the steps of pressure filtration, washing, slurrying, and drying the second reactant include the following processes:

[0065] a. Filtration: The second reactant is subjected to pressure filtration to initially remove moisture from the second reactant, resulting in a filter cake with a solid content of 18~23wt%.

[0066] b. Washing: Wash the filter cake with water to remove the dispersant from the filter cake;

[0067] c. Pulping: The washed filter cake is pulped to form a liquid slurry;

[0068] d. Drying: The slurry is dried to obtain a product containing 2% to 5% free water by weight.

[0069] In some specific embodiments, the drying is carried out by spray drying, and the operating conditions parameters of the spray drying include: using a spray dryer with large and small nozzles, and the temperature of the spray entering the tower is 580~980℃.

[0070] In some specific embodiments, the drying is carried out by spray drying, during which an activator is added to the slurry. The activator includes at least one of diethylene glycol, n-butanol, propylene glycol, triethanolamine, cyclohexylamine, and diphenylguanidine. The amount of the activator added is 0.2 g / L to 22 g / L.

[0071] In some specific embodiments, a schematic flowchart of a method for preparing a nanoscale highly dispersed silica shaped structure material provided by the present invention is shown in Figure 1.

[0072] It should be noted that, unless otherwise specified or specifically described, the raw material components involved in the nano-scale highly dispersed silica shaped structure material and its application provided in the embodiments of the present invention can be directly purchased from commercial products or made in-house according to existing preparation methods; at the same time, unless otherwise specified or specifically described, the operation steps involved in the preparation method can be carried out according to existing silica preparation methods.

[0073] The present invention will be further illustrated below with reference to specific embodiments. It should be understood that these embodiments are for illustrative purposes only and are not intended to limit the scope of the invention. Experimental methods in the following embodiments, unless otherwise specified, are generally performed according to national standards. If no corresponding national standard exists, then generally accepted international standards, conventional conditions, or conditions recommended by the manufacturer are followed.

[0074] The method for determining the physicochemical properties of silica in this invention includes: 1) silica content (%), tested according to HG / T3061-1999, ISO-1994 standards; 2) specific surface area (m²). 23) Loss on heating (%) was tested according to HG / T3073-1999; 4) Loss on ignition (%) was tested according to HG / T3065-1999; 5) pH was tested according to HG / T3067-1999; 6) Total copper content (mg / kg) was tested according to HG / T3068-1999; 7) Total manganese content (mg / kg) was tested according to HG / T3069-1999; 8) Total iron content (mg / kg) was tested according to HG / T3070-1999; 9) Sodium sulfate content (%) was tested according to ISO787-8; 10) Gel content (particles) was tested according to GB / T28601-2012; 11) Dispersion coefficient (%) was tested using an optical microscope.

[0075] Example 1

[0076] This example provides a nanoscale highly dispersed silica shaped structure material, the preparation method of which includes the following process:

[0077] Sodium silicate is dissolved in a solvent, then concentrated sulfuric acid and a dispersant are added and stirred to obtain the first reactant. The dispersant is Na₂SO₄; the solvent is water; the concentrated sulfuric acid has a mass percentage concentration of 98%; the sodium silicate contains 10% Na₂O and 30% SiO₂ by weight; the weight ratio of sodium silicate, concentrated sulfuric acid, and Na₂SO₄ is 120 kg / m³. 3 0.3 kg / m 3 0.04 g / L; The working conditions for the stirring reaction include: temperature 70℃, time 1 h, and rotation speed 150 rpm;

[0078] A pH adjuster and a dispersant are added to the first reactant to bring the system pH to 7, and then the mixture is allowed to mature to obtain the second reactant; wherein the amount of Na2SO4 added is 0.05 g / L; the maturation conditions include: temperature of 55°C and time of 55 minutes.

[0079] The second reactant is pressure filtered to initially remove moisture, resulting in a filter cake with a solid content of 20 wt%. The filter cake is then washed with water to remove the dispersant. The washed filter cake is then pulped to form a slurry. The slurry is then dried using spray drying, in which an activator, propylene glycol, is added. The operating conditions for spray drying include: using a spray dryer with both large and small nozzles, a tower inlet temperature of 780°C, and obtaining a product containing 3% free water by weight, thus obtaining the nano-scale highly dispersed silica shaped structure material.

[0080] The original particle size of the nanoscale highly dispersed silica shaped structure material obtained in this example is <10nm, and it mostly exists in the form of <1µm aggregates, as shown in Figures 2 and 6; it contains more than 98% SiO2 by weight and 3% free water by weight; the specific surface area of ​​the nanoscale highly dispersed silica shaped structure material is 390 m². 2 / g.

[0081] Example 2

[0082] Based on Example 1, the ratio of sodium silicate, concentrated sulfuric acid, and Na2SO4 used in the preparation of the first reactant was adjusted to 100 kg / m³. 3 0.2 kg / m 3 The original particle size of the nanoscale highly dispersed silica shaped structure material obtained in this example is <10nm, and it mostly exists in the form of <1.5um agglomerates, as shown in Figure 7.

[0083] Example 3

[0084] Based on Example 1, the ratio of sodium silicate, concentrated sulfuric acid, and Na2SO4 used in the preparation of the first reactant was adjusted to 130 kg / m³. 3 0.5 kg / m 3 The original particle size of the nanoscale highly dispersed silica shaped structure material obtained in this example is <10nm, and it mostly exists in the form of <2.0um agglomerates, as shown in Figure 8.

[0085] In addition, the microscopic characterization comparison diagrams of the silica materials obtained using existing technologies are shown in Figures 3, 4 and 5.

[0086] Various embodiments of the present invention may exist in the form of a range; it should be understood that the description in the form of a range is merely for convenience and brevity and should not be construed as a hard limitation on the scope of the invention; therefore, it should be considered that the range description has specifically disclosed all possible subranges and single numerical values ​​within that range. For example, it should be considered that the range description from 1 to 6 has specifically disclosed subranges such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 6, from 3 to 6, etc., and single numbers within the range, such as 1, 2, 3, 4, 5, and 6, regardless of the range. Furthermore, whenever a numerical range is referred to herein, it means including any referenced number (fraction or integer) within the range referred to.

[0087] The above description is merely a specific embodiment of the present invention, enabling those skilled in the art to understand or implement the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.

Claims

1. A nanoscale highly dispersed silica shaped structure material, characterized in that, The nanoscale highly dispersed silica shaped structure material contains more than 98% SiO2 by weight and 2% to 5% free water by weight; the specific surface area of ​​the nanoscale highly dispersed silica shaped structure material is 120 m². 2 / g~390 m 2 / g, and the original particle size in the primary shaped structure is <10 nanometers.

2. A method for preparing the nanoscale highly dispersed silica shaped structure material according to claim 1, characterized in that, The preparation method includes the following steps: Sodium silicate was dissolved in a solvent, then concentrated sulfuric acid and a dispersant were added and stirred to react, yielding the first reactant. Add a pH adjuster and a dispersant to the first reactant until the pH of the system is 4-10, and then allow it to mature to obtain the second reactant. The second reactant is subjected to pressure filtration, washing, slurrying and drying to obtain the nano-scale highly dispersed silica shaped structure material.

3. The method for preparing nanoscale highly dispersed silica shaped structured material according to claim 2, characterized in that, The dispersant includes Na2SO4; the solvent includes water; the concentrated sulfuric acid has a mass percentage concentration of 93-99%; and the sodium silicate contains 8.2%-12% Na2O and 26%-35% SiO2 by weight.

4. The method for preparing the nanoscale highly dispersed silica shaped structure material according to claim 3, characterized in that, When preparing the first reactant, the amounts of sodium silicate, concentrated sulfuric acid, and Na2SO4 are in the following relationship: (100~130 kg / m³) 3 (0.2~0.5 kg / m) 3 (0.02~0.06g / L).

5. The method for preparing the nanoscale highly dispersed silica shaped structure material according to claim 3, characterized in that, When adjusting the pH value of the first reactant, the amount of Na2SO4 added is 0.02 g / L to 0.06 g / L.

6. The method for preparing nanoscale highly dispersed silica shaped structured material according to claim 2, characterized in that, The operating conditions for the stirring reaction include: a temperature of 60~89℃ and a time of 0.75 hours~1.2 hours.

7. The method for preparing nanoscale highly dispersed silica shaped structure material according to claim 2, characterized in that, The curing conditions include: a temperature of 45-65°C and a time of 45-60 minutes.

8. The method for preparing nanoscale highly dispersed silica shaped structured material according to claim 2, characterized in that, The steps of pressure filtration, washing, slurrying and drying the second reactant include the following processes: a. Filtration: The second reactant is subjected to pressure filtration to initially remove moisture from the second reactant, resulting in a filter cake with a solid content of 18~23wt%. b. Washing: Wash the filter cake with water to remove the dispersant from the filter cake; c. Pulping: The washed filter cake is pulped to form a liquid slurry; d. Drying: The slurry is dried to obtain a product containing 2% to 5% free water by weight.

9. The method for preparing the nanoscale highly dispersed silica shaped structure material according to claim 8, characterized in that, The drying process employs spray drying, and the operating conditions for spray drying include: using a spray dryer with both large and small nozzles, and the inlet temperature during spraying is 580~980℃.

10. The method for preparing the nanoscale highly dispersed silica shaped structure material according to claim 9, characterized in that, The drying process employs spray drying, during which an activator is added to the slurry. The activator includes at least one of diethylene glycol, n-butanol, propylene glycol, triethanolamine, cyclohexylamine, and diphenylguanidine. The amount of activator added is 0.2 g / L to 22 g / L.

Images