Radiation source
A tunable radiation source with an optomechanical component adjusts the angle of incidence to generate high brilliance X-ray radiation, addressing the challenge of accurate metrology in semiconductor manufacturing by providing compact and cost-effective high frequency radiation for improved process control.
Patent Information
- Application Number
- PCT/EP2025/088254
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-17
- Filing Date
- 2025-12-18
- Publication Date
- 2026-07-23
AI Technical Summary
Existing semiconductor manufacturing processes face challenges in accurately measuring small features and structures due to the lack of high brilliance, high frequency radiation sources suitable for high volume manufacturing, leading to inaccurate metrology results and inefficiencies in processes like lithography and etching.
A tunable radiation source comprising an electron source, a laser source, and an optomechanical component that adjusts the angle of incidence between the laser beam and electron pulses to generate high brilliance X-ray radiation, enabling compact and cost-effective generation of high frequency radiation suitable for semiconductor manufacturing.
The radiation source provides a robust and repeatable method to tune output radiation wavelength, enhancing the accuracy of metrology and process control in semiconductor manufacturing by generating high brilliance X-ray radiation, suitable for high volume manufacturing applications.