High-pressure exosmosis-resistant safe infusion device for infusion of highly irritant drugs
By introducing a dual anti-backflow structure and an infusion pressure feedback system into the PICC device, the problems of drug extravasation and blood reflux during the infusion of highly irritating drugs have been solved, thereby improving the stability and safety of the infusion device.
CN121371375AInactive Publication Date: 2026-01-23重庆市渝北区人民医院
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Patent Information
- Application Number
- CN202511838694.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-08
- Publication Date
- 2026-01-23
- Estimated Expiration
- Not applicable · inactive patent
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Figure CN121371375A_ABST
Abstract
The invention discloses a high-pressure exosmosis-resistant safe infusion device for high-irritation medicine infusion, and relates to the field of infusion devices. According to the high-pressure-exosmosis-resistant safe infusion device for infusion of the high-irritation medicine, the injection tube, the first spring, the first clamping ball, the second spring and the second clamping ball are arranged in the catheter at the end of the remaining needle, when infusion pressure changes, thrust of infusion liquid medicine to the second clamping ball is increased, a gap between the second clamping ball and the infusion tube becomes small, and the infusion pressure is increased; when the pressure of the blood vessel of the patient changes, the thrust applied to the first clamping ball is increased, the first clamping ball can be pushed to the end of the infusion needle tube and the end of the injection tube, an infusion liquid medicine backflow channel is blocked, blood in the blood vessel is prevented from flowing back, and therefore the blood vessel is prevented from being infused. And through the arrangement of the double anti-backflow structures, the stability of the liquid medicine in the infusion device can be maintained, and the anti-exosmosis capacity of the infusion device is remarkably improved.
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