Radiation-sensitive composition, interlayer insulating film, method for manufacturing the same, and display element

By using a combination of alkali-soluble polymers and polymers with specific structures and quinone diazide compounds, a hardened film with high radiation sensitivity, excellent dry etching resistance and transparency was formed, solving the problems of film roughness and insufficient transparency in the prior art and achieving higher composition performance.

CN122131542APending Publication Date: 2026-06-02JSR CORPORATION
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
JSR CORPORATION
Filing Date
2025-12-01
Publication Date
2026-06-02

AI Technical Summary

Technical Problem

Existing radiosensitive linear compositions suffer from problems such as film roughness and insufficient transparency when forming a hardened film, especially with reduced radiation sensitivity after decreasing the amount of quinone diazide compound added.

Method used

A radiosensitive linear composition containing an alkali-soluble polymer (A), a quinone diazide compound (B), and a polymer with a specific structure (C) is used. By irradiating the coating with radiation, developing, and heating, an interlayer insulating film is formed. The interaction between the polymer (C) and the quinone diazide compound (B) enhances the solubility of the exposed part and reduces the solubility of the unexposed part, thereby improving radiation sensitivity and transparency.

Benefits of technology

This process resulted in a hardened film with high radiation sensitivity, excellent dry etching resistance, and good transparency, solving the problems of film roughness and insufficient transparency, and improving the overall performance of the composition.

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Abstract

This invention provides a radiosensitive linear composition capable of forming a hardened film with high radiation sensitivity, dry etching resistance, and excellent transparency; an interlayer insulating film formed from said composition; a display element including said interlayer insulating film; and a method for manufacturing the interlayer insulating film. This invention relates to a radiosensitive linear composition comprising: an alkali-soluble polymer (A) (excluding polymer (C)); a quinone diazide compound (B); a polymer (C) comprising a structural unit (V) represented by formula (1) and a structural unit (VI) derived from at least one compound selected from the group consisting of maleimide, N-substituted maleimide, and maleic anhydride, wherein the total content of said structural unit (V) and structural unit (VI) is 55% by mass or more relative to all structural units constituting polymer (C); and a solvent (S).
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Citation Information

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