Direct fluid injection implant cleaning system and method

Abstract

This invention discusses systems and methods for cleaning implants. The system includes an implant support comprising a plurality of nozzles that direct cleaning fluid toward the inner surface of the implant.

Description

Cross-references to related applications

[0001] This application claims priority to U.S. Provisional Application No. 63 / 667,395, filed July 3, 2024, entitled “DIRECT FLUID INJECTION IMPLANTCLEANING SYSTEM AND METHOD,” which is incorporated herein by reference in its entirety. Technical Field

[0002] This technology relates to implant cleaning systems and methods. Specifically, this technology relates to the cleaning of dental implants / implants. Background Technology

[0003] Dental implants are used to attach dental prostheses to the bone. For example, dental implants can be used to attach dentures. In some cases, the dental implant is anchored within the bone, and a mounting component is used to attach the dental prosthesis / denture to the implant. The dental prosthesis is typically screwed or cemented into the dental implant.

[0004] Dental implants are typically manufactured using milling, a process that involves shaping the implant from a solid material. Milling uses a series of cutting tools attached to a rotating spindle to remove portions of the solid material. Milling generates debris, such as dust, during the removal of implant material adhering to the implant's surface. This debris must be removed from the implant before use.

[0005] Automation of the milling process allows for the rapid manufacture of dental implants. This rapid production can lead to a backlog of implants that require rigorous cleaning before use. Therefore, a process capable of thoroughly cleaning multiple dental implants before use is desired. Summary of the Invention

[0006] This technology uses a cleaning system to clean multiple implants simultaneously. An implant support is used in the cleaning system to hold multiple implants at the same time. Each implant is positioned above a nozzle. A cap is positioned at a fixed distance above the implant. This distance is pre-selected to create a gap between the implant and the cap. During use, the implant can be pushed against the cap by the cleaning fluid, allowing the fluid to clean the inner surface of the implant. The cleaning fluid exits the interior of the implant through the gap created between the nozzle and the implant.

[0007] In one embodiment, an implant support used in a cleaning system includes a body and a plurality of nozzles disposed within the body. Each of the plurality of nozzles includes an inlet and an outlet. Each of the plurality of nozzles is disposed within the body such that the outlet of each of the plurality of nozzles extends away from the body. For example, each of the plurality of nozzles may be disposed within a cavity formed in the body. The outlet of each of the plurality of nozzles may extend above the cavity. The plurality of nozzles may be arranged in an array configuration within the body.

[0008] The implant support includes one or more conduits dispersed within the body. Each of a plurality of nozzles is disposed within the body such that the inlet of each nozzle is coupled to one or more of the conduits. The one or more conduits may include a central conduit extending through the body. The inlet of each nozzle may be fluidly coupled to the central conduit.

[0009] The implant support includes an inlet port coupled to the one or more conduits. During use, cleaning fluid enters the one or more conduits dispersed within the body via the inlet port.

[0010] The implant support includes a cap comprising a plurality of openings extending into the cap. Each of the plurality of openings in the cap may be tapered. In one embodiment, the plurality of openings in the cap includes a tapered upper portion and a cylindrical lower portion. The cap is positioned above a nozzle such that the plurality of openings in the cap are substantially aligned with the plurality of nozzles. The cap is positioned at a fixed distance above the nozzles such that when the implant is placed on the nozzles, an end portion of the implant partially extends into the opening. A gap exists between the end portion of the implant and the bottom surface of the opening.

[0011] The implant support may also include a spacer positioned between the body and the cap, wherein the spacer holds the cap at a fixed distance above the nozzle.

[0012] The implant support body includes a front surface and a back surface opposite to the front surface. Multiple nozzles may be disposed within the front surface and the back surface of the body.

[0013] The implant support may also include a fastener system that is connected to the body and extends through the cap. The fastener system is used to secure the cap to the body.

[0014] In one embodiment, the implant support as described above is placed in a cleaning system, and multiple implants attached to the implant support are cleaned simultaneously. A cleaning system includes: a frame support structure; a fluid infusion reservoir coupled to the frame support structure; and a fluid manifold coupled to the frame support structure and to an inlet port of each of the one or more implant supports. The fluid infusion reservoir is configured to contain cleaning fluid.

[0015] The frame support structure is formed as an open framework, which has sides that allow fluid to contact one or more implant supports during use.

[0016] The cleaning system may also include a vacuum source coupled to a fluid injection reservoir, wherein the vacuum source applies a vacuum to the fluid injection reservoir to draw cleaning fluid into the reservoir. The cleaning system may also include a control system comprising a controller and one or more valves. During use, the controller provides control signals to the one or more valves to control the application of a vacuum to the fluid injection reservoir.

[0017] The cleaning system also includes an air inlet coupled to the fluid injection reservoir. The cleaning system may also include a control system comprising a controller and one or more valves. During operation, the controller provides control signals to the one or more valves to control the airflow into the fluid injection reservoir.

[0018] The cleaning system described above can be used to clean multiple implants. In one embodiment, multiple implants are placed on one or more implant supports, as described herein. One or more implant supports are placed in the cleaning system, as described herein. The cleaning system is placed in a cleaning fluid reservoir containing cleaning fluid. The cleaning system is positioned in the cleaning fluid such that one or more implant supports are immersed in the cleaning fluid. Once placed in the cleaning reservoir, at least a portion of the cleaning fluid from the cleaning fluid reservoir is transferred to a fluid injection reservoir. The inner surface of the implant is cleaned by directing the cleaning fluid from the fluid injection reservoir through a fluid manifold into one or more implant supports. The cleaning fluid is ejected from a plurality of nozzles attached to the implant supports to apply the cleaning fluid to the inner surface of the implant.

[0019] One or more types of cleaning solutions can be used to clean implants. In one embodiment, the cleaning solution comprises an aqueous solution of a surfactant. Another cleaning solution that can be used includes an aqueous solution of an acidic detergent. Purified water can also be used to clean implants.

[0020] In one embodiment, multiple cleaning fluid reservoirs are used sequentially to clean the implant. Each of the multiple cleaning fluid reservoirs may contain the same or different cleaning fluids. In one embodiment, at least one cleaning fluid reservoir has a cleaning fluid comprising an aqueous solution of a surfactant. At least one cleaning fluid reservoir has a cleaning fluid comprising an aqueous solution of an acidic detergent. At least one cleaning fluid reservoir contains purified water.

[0021] The method for cleaning the implant also includes drying the implant. The implant can be dried by placing the cleaning system in a drying reservoir. The drying reservoir heats the air surrounding the cleaning system. The implant can also be dried by directing heated air into the implant support. Attached Figure Description

[0022] The present technology will be more fully understood by referring to the following detailed description in conjunction with the accompanying drawings, in which: Figure 1A An example of the implant is shown.

[0023] Figure 1B It shows Figure 1A A cross-sectional view of the implant.

[0024] Figure 2 An implant with an implant extension is shown.

[0025] Figure 3 The cleaning system is shown.

[0026] Figure 4 A projected view of the implant support is shown.

[0027] Figure 5 A side view of the implant support is shown.

[0028] Figure 6 A cross-sectional side view of the implant support is shown.

[0029] Figure 7 It shows Figure 6 An enlarged view of the sectional view.

[0030] Figure 8 Different nozzle configurations are shown.

[0031] Figure 9 A side view of an implant support is shown, the implant support having an implant positioned above a nozzle.

[0032] Figure 10 It shows Figure 9 An enlarged view of the implant and cap shown.

[0033] Figure 11 This is a cross-sectional view of the opening formed in the lid.

[0034] Figure 12 A flowchart of the cleaning process is shown.

[0035] Figure 13 A cleaning system is shown placed in a cleaning fluid reservoir.

[0036] Figure 14A schematic diagram of the pneumatic and fluid components of the cleaning system is shown. Detailed Implementation

[0037] Typical dental implants used for placing dental prostheses into the recipient's mouth are shown in the figure. Figure 1A and Figure 1B In this invention, the dental implant 100 is intended to refer to an anchoring component of a multi-part implantation system (e.g., two-part, three-part, etc.). The dental implant 100 is the bone-integrated portion of the multi-part implantation system. The dental implant is recessed into the bone up to approximately 1.5-3 mm above the bony prominence at the mucosal level.

[0038] Dental implant 100 has an outer surface 110, which is a surface that contacts bone, such as Figure 1A As shown. The outer surface 110 may be threaded to allow the implant to be screwed into the bone. The dental implant 100 also has an inner surface 120 configured to receive a dental prosthesis (e.g., a denture), such as... Figure 1B As shown. The inner surface 120 may also have threads that are complementary to the bolts attached to the dental prosthesis. Exemplary dental implants are described in U.S. Patent No. 11,331,167, which is incorporated herein by reference.

[0039] Implants placed in the bone tissue of a recipient, such as dental implants 100, are typically manufactured using computer-controlled manufacturing processes. One such process is computer numerical control (CNC) machining. In CNC machining, a pre-programmed controller provides instructions to control various manufacturing tools to form the implant from the provided starting material. The implant may be made from a solid rod of metal or polymer, which undergoes milling, grinding, drilling, and slotting operations to precisely form the desired implant. These operations generate debris in the form of dust and particles, which can adhere to the surface of the implant. Additionally, the milling process is typically performed in the presence of oil as a coolant and lubricant. After the milling process is complete, the implant is contaminated with oil and debris, which must be removed before the implant can be used. Removing oil and debris from the inner surface of the implant can be particularly difficult.

[0040] Figure 2The image shows an implant 200 having an implant extension 250. The implant extension 250 is formed as a single piece with the implant. An axial retraction portion 255 is formed at the interface between the implant 200 and the implant extension 250. The implant extension is used to transport the implant after processing during manufacturing without contacting the implant. This allows the implant to be mechanically moved to other processing stations without unintentionally damaging the implant. When the manufacturing process is complete, the implant extension may break off from the implant at the axial retraction portion 255. An exemplary implant having an implant extension is the dental implant described in U.S. Patent No. 11,857,390, which is incorporated herein by reference.

[0041] Figure 3 A cleaning system 300 for simultaneously cleaning multiple implants is shown. The cleaning system includes a frame support structure 305, one or more implant supports 350, a fluid injection reservoir 310, and a fluid manifold 320. The cleaning system also includes a vacuum gauge 330, an air inlet connector 335, an air inlet gauge 340, and a programmable logic controller (PLC) 345. The cleaning system also includes a fluid inlet conduit 315 and a fluid outlet conduit 325. The fluid outlet conduit 325 couples the fluid injection reservoir 310 to the fluid manifold 320.

[0042] The cleaning system includes a frame support structure 305. The frame support structure 305 forms the framework to which the various components of the cleaning system are attached. The frame support structure is formed as an open framework, such that the sides are generally open. During use, fluid can pass through the open sides of the framework and come into contact with the implant disposed therein.

[0043] Figure 4 A projected view of an implant support 350 is shown; the implant support 350 includes a body 355, a plurality of nozzles 360 disposed in the body, a cap 365, and an inlet port 370. Figure 5 A side view of an implant support 350 is shown, in which multiple implants are positioned above nozzles. The body includes a front surface 362 and a back surface 364 opposite to the front surface. In some embodiments, the nozzles are disposed within the front surface and the back surface of the body, such as... Figure 5 As shown.

[0044] Multiple nozzles 360 can be configured in an array. The implant support may include any number of nozzles. The number of nozzles disposed in the body is limited only by the size of the body and the required spacing between the nozzles. The spacing between the nozzles is partly determined by the size of the implant. When the implant is placed on the nozzle, it should not be in direct contact with or able to contact the implant on adjacent nozzles. Figure 4In the implant support 350 shown, the front surface of the implant includes 240 nozzles arranged in a 20×12 array. The back surface also includes 240 nozzles, which are also in the same 20×12 array configuration. Therefore, in the depicted embodiment, a total of 480 nozzles are provided on the body of the implant support.

[0045] Reference Figure 3 The cleaning system shown can contain up to four implant supports 350, each holding 480 nozzles. The total number of nozzles that can be cleaned simultaneously using the cleaning system 300, and therefore the total number of implants, is 1920. Although only four implant supports in the cleaning system 300 are shown, it should be understood that more or fewer implant supports 350 can be present in the cleaning system by changing the frame support structure 305.

[0046] Above the nozzle, a cover 365 is provided on both the front and back surfaces of the body. The cover 365 includes a plurality of openings 390 extending into the cover. When positioned above the nozzle, the plurality of openings in the cover are substantially aligned with the plurality of nozzles.

[0047] The cap 365 is coupled to the body via a fastener system 375 that extends through the cap and into the body. The fastener system may also include a spacer 380 positioned between the body and the cap. The spacer holds the cap at a fixed distance above the nozzle. In one embodiment, in Figure 6 As shown, the fastener system includes a screw 377 and a connector (e.g., a nut) 379. In the described embodiment, the screw 377 extends from the body through the spacer 380 and through the cap 365. The connector 379 is attached to the screw to secure the cap to the spacer, creating a gap between the implant and the cap. Figure 4 As shown, the implant support may include at least four fastener systems 375 for securing the cap to the body. Figure 5 As shown, each surface of the body (front surface and back surface) may have the aforementioned cover and fastening system.

[0048] The cap 365 is positioned at a fixed distance above the nozzle. For example... Figure 5 As shown, when the implant is placed on the nozzle, the end of the implant partially extends into the opening. The cap 365 is positioned at a pre-selected fixed distance, such that a gap exists between the end of the implant and the bottom surface of the opening 390, as shown in more detail... Figure 10 In one embodiment, the cover 365 is held at a fixed distance by a spacer 380.

[0049] The implant support 350 includes an inlet port 370 and one or more conduits 372 dispersed within the body. Figure 6and Figure 7 (as shown in the image). Figure 4 and Figure 5 An embodiment is shown with an inlet port 370 located on one side of the implant support. (Refer to...) Figure 3 An inlet port 370 (not shown) is coupled to a fluid manifold 320 via a connection port 322 on the fluid manifold. In one embodiment, the implant support 350 is placed on a track 307 of the frame support structure 305, and the inlet port 370 is connected to the connection port 322. Fluid for cleaning and drying the implant (particularly the inner surface of the implant) can enter the implant support from the fluid manifold through the connection port and the inlet port.

[0050] Figure 6 A cross-sectional side view of the implant support 350 is shown. Figure 7 It shows Figure 6 An enlarged view of the cross-section shows the implant positioned on the nozzle. (e.g.) Figure 6 and Figure 7 As shown, the implant support 350 includes one or more conduits 376 and a plurality of nozzles 360 dispersed within a body 355. In one embodiment, the conduits dispersed within the body include a central conduit 374 and one or more branch conduits 372. The nozzles 360 are positioned such that each nozzle is coupled to one or more conduits for delivering cleaning fluid. For example, each nozzle may be coupled to a branch conduit 376, which connects to the central conduit 374. During use, fluid flows into the implant support through the inlet port 370 and into the central conduit 374. The fluid then travels from the central conduit to the branch conduits 376. Cleaning fluid enters the nozzle 360 ​​through the nozzle inlet and exits from the nozzle for cleaning or drying the implant. Although the use of branch conduits is described in the specific embodiments described herein, it should be understood that branch conduits are not required. In alternative embodiments not shown, the implant body includes only the central conduit, and the nozzles are positioned such that the nozzle inlet is located in the central conduit or is positioned such that the inlet opening is disposed along the wall of the central conduit.

[0051] A nozzle 360 ​​is disposed within the body of the implant support. The nozzle may be positioned within a cavity 357 formed within the body of the support. The nozzle may be positioned such that the outlet of each of a plurality of nozzles extends away from the body of the implant support. The nozzle 360 ​​may be configured with a holder 361 that contacts the bottom 359 of the cavity. The nozzle inlet extends through the bottom 359 of the cavity at the junction of the cavity and the branch conduit 376. An O-ring or gasket 378 may be positioned between the nozzle and the cavity to prevent fluid leakage through the cavity.

[0052] The nozzle 360 ​​may have a shape and / or size complementary to the shape and / or size of the inner surface of the implant. The nozzle 360 ​​has an outlet 367, an inlet 368, and a nozzle holder 361. (See, for example, [reference needed]) Figure 8 As described above, the nozzle holder contacts the bottom of the chamber, and the inlet is connected to an internal conduit (e.g., a branch conduit) in the body of the implant support. Figure 8 Different nozzle configurations are shown. In some embodiments, the nozzle outlet has an outer diameter of 2 mm to 4 mm. The nozzle outlet may also have an external shape complementary to the inner surface of the implant. Using a nozzle with a complementary shape minimizes the gap between the nozzle and the implant. This allows for efficient cleaning with minimal cleaning fluid requirements.

[0053] Cleaning fluid exiting the nozzle is sprayed against the inner surface of the implant. The cleaning fluid removes debris and oil from the inner surface of the implant. In one embodiment, the implant is not fixed to the nozzle. Several advantages are achieved by leaving the implant unattached to the nozzle. One advantage is that the implant can be easily placed on the nozzle. This allows the implant support to be loaded with the implant quickly. Another advantage is that the implant can "float" above the nozzle while fluid is being sprayed from it. Figure 7 As shown, the movement of the implant away from the nozzle creates an opening between the nozzle and the implant due to the pressure of the fluid ejected from the nozzle, allowing the fluid to leave the interior of the implant. As the fluid leaves the interior of the implant, debris and oil are carried away by the fluid.

[0054] By creating design gaps and openings between the implant, nozzle, and cap, the implant can be made to "float" above the nozzle during the cleaning process. Figure 9 and Figure 10 A side view of an implant support is shown, which has an implant 200 positioned above a nozzle. Figure 10 It shows Figure 9 An enlarged view of the implant and cap shown. The implant 200 includes an implant extension 250 extending into an opening 390 formed in the cap 365. When the cap is secured to the body of the implant support, a gap 394 exists between the implant extension 250 and the bottom 392 of the opening. This gap allows the implant to travel outward away from the body as fluid is guided at the inner surface of the implant, as indicated by the arrow (). Figure 9 The contact between the implant extension and the bottom of the opening 392 will stop the outward movement of the implant.

[0055] In addition, such as Figure 9 and Figure 10 As shown, the area between the cap 365 and the body 255 of the implant support is open. The implant support does not include walls or panels that allow cleaning or drying fluids to flow across the outer surface of the implant. (See reference...) Figure 13 and Figure 14 During the cleaning process, the cleaning system 300 is placed in the cleaning or drying reservoir. The open frame support structure 305 and the open area between the implant support and the cap allow fluid within the cleaning or drying reservoir to clean the outer surface of the implant.

[0056] Figure 11 A cross-sectional view of an opening formed in the cap is shown; the opening 390 in the cap has a generally tapered upper portion 396 and a cylindrical lower portion 398. The tapered shape at the upper portion of the opening allows the cap to be placed on the implant more easily and quickly. Because the implant is loosely positioned above the nozzle, the implant may not be precisely aligned with the opening when the cap is placed on the implant support. The tapered opening allows the implant to be angled or off-center about the center when the cap is placed on the implant support. As the cap descends onto the implant, the tapered opening guides the implant (or implant extension) into the cylindrical lower portion of the opening. The cylindrical lower portion has a larger diameter than the diameter of the implant tip (e.g., the implant extension). This creates additional gaps around the sides of the implant extension, such as... Figure 11 As shown, it helps to align the implant within the opening.

[0057] As described above, the cap is positioned at a fixed distance above the nozzle such that when the implant is placed on the nozzle, the end of the implant (e.g., the implant extension) partially extends into the lower section 398 of the opening. A gap 394 exists between the implant end and the bottom surface of the lower section of the opening, as well as the side portion of the implant extension. The gap allows the implant to float above the nozzle during cleaning. Movement of the implant away from the nozzle is inhibited by contact between the implant and the bottom surface of the opening.

[0058] The conduit 397 extends from the lower section 398 of the opening through the cap to the top side of the cap (the side opposite the upper part of the opening). The conduit 397 has a smaller diameter than the diameter of the end of the implant (e.g., the implant extension). During use, the conduit 397 in the cap allows fluid to flow around the end of the implant. This allows the entire outer side of the implant to be cleaned.

[0059] The cleaning system can be used to clean multiple implants simultaneously. A flowchart of the cleaning process is shown below. Figure 12 In the first step, the implants are loaded onto the implant support. Multiple implants are loaded onto the implant support by placing them over the nozzle. Once the implants are placed over the nozzle, a cover is positioned over the implants and lowered onto the spacer. The cover is carefully positioned over the implants such that the implant extension from each implant enters an opening in the cover (see...). Figure 4Once correctly positioned, use the fastener system to secure the cap to the implant support. Then flip the implant support over and repeat the process on the opposite side. The fully loaded implant support is shown. Figure 5 middle.

[0060] Once one or more implant supports are loaded with implants, they are attached to the cleaning system. Each implant support is positioned on track 307. Inlet port 370 connects to connection port 322 on the fluid manifold. The inlet port and connection port can be complementary parts of a quick-connect / disconnect fluid connector.

[0061] The cleaning system then cleans the implant through a series of cleaning reservoirs. The process steps in each reservoir are largely the same. The process begins with placing the cleaning system in the cleaning fluid reservoir 400, as... Figure 13 As shown. The control system is activated and automatically executes a series of processing steps to clean the implant with cleaning fluid present in the cleaning reservoir. The control system includes a controller (e.g., a programmable logic controller) and one or more valves. The controller provides control signals to the one or more valves to control the fluid flow through the cleaning system.

[0062] Once activated, the controller initiates the cleaning process. In the first step of the cleaning process, cleaning fluid is drawn from the cleaning fluid reservoir into the fluid injection reservoir. In one embodiment, the cleaning system is connected to a vacuum source. Alternatively, the cleaning system may include a vacuum pump. Cleaning fluid is drawn into the fluid injection reservoir by applying a vacuum. The controller provides control signals to one or more valves to control the vacuum applied to the fluid injection reservoir. Once the pressure in the fluid injection reservoir decreases, a valve to fluid inlet line 315 opens, creating a fluid path between the cleaning fluid in the cleaning reservoir and the fluid injection reservoir. The depressurization in the fluid injection reservoir allows cleaning fluid to be drawn into it. When a sufficient amount of cleaning fluid has been drawn into the fluid injection reservoir, or when the fluid injection reservoir is substantially full, the connection between the fluid injection reservoir and the cleaning fluid is closed.

[0063] The next step in the cleaning process is to discharge cleaning fluid from the fluid injection reservoir through a fluid manifold to the implant support. A controller provides control signals to one or more valves to control the flow of cleaning fluid into the fluid manifold. In one embodiment, the fluid injection reservoir is pressurized by supplying pressurized air into it. The increased air pressure in the reservoir forces fluid through a fluid outlet line into the pressurized manifold. The cleaning fluid enters the fluid manifold and is distributed to each implant support.

[0064] Cleaning fluid enters each implant support through the inlet port. Once inside the implant support, the fluid travels through a central conduit and is distributed to each nozzle. The fluid then enters each nozzle and is discharged into the interior of the implant. The fluid discharged from the nozzles cleanses the inner surface of the implant, such as... Figure 7 As shown, as the fluid exits the implant's interior, it creates turbulence within the fluid surrounding the implant, thus cleaning the implant's outer surface. After exiting the implant, the fluid passes through the implant support and is collected in a cleaning fluid reservoir. At the end of the cleaning cycle, the cleaning system is moved to the next cleaning reservoir or drying reservoir.

[0065] Schematic diagrams of pneumatic and fluid components are shown in Figure 14 As described above, the cleaning system uses a combination of compressed gas (e.g., air) and vacuum to control fluid flow. In this embodiment, the cleaning system includes a compressed air source, a vacuum generator, valve 1, and valve 2. The cleaning system also includes: an air pressure regulator; a vacuum pressure regulator for adjusting vacuum pressure; an air gauge, a vacuum gauge, an exhaust port, and a one-way flow valve. The arrows in this diagram indicate fluid flow through the system.

[0066] During the first cycle of the cleaning process, the cleaning system is placed into a cleaning reservoir filled with cleaning fluid. The level of the cleaning fluid in the cleaning reservoir is adjusted by... Figure 14 The “water level” line indicates the position. To prepare for cleaning the internal features of the implant, the pneumatic and fluid components operate in State 1. In State 1, the vacuum generator is operated to create a vacuum in the vacuum pressure regulator. The vacuum pressure regulator is configured to control the vacuum pressure applied to the fluid injection reservoir (320). The vacuum applied to the fluid injection reservoir (310) is maintained in the fluid inlet conduit (315, see…). Figure 3 A vacuum is generated in the fluid inlet pipe, which extends into the cleaning fluid in the cleaning reservoir. A check valve is positioned along the fluid inlet pipe to prevent backflow of the cleaning fluid. The applied vacuum draws cleaning fluid from the cleaning reservoir into the fluid injection reservoir. During this phase, valve 1 is closed and valve 2 is open. By keeping valve 2 in the open position, air can flow through the vacuum generator, accompanied by air being expelled by the vacuum generator.

[0067] In the second cycle of the cleaning process, cleaning fluid is ejected from the nozzle to clean the inner surface of the implant. During the second cycle of the cleaning process, the pneumatic and fluid components operate in state 2. In state 2, compressed air flows through an air pressure regulator. In the air pressure regulator, the compressed air pressure of 90 psi is reduced to approximately 40 psi. The regulated compressed air is directed to the fluid injection reservoir (310) via a vacuum generator that is not in operation. The increased air pressure forces the cleaning fluid through the fluid outlet conduit (325, see...) Figure 3The pressurized fluid flows from the fluid injection reservoir into the manifold (320). The pressurized fluid entering the manifold is distributed to the implant support (350, see...) Figure 3 As discussed earlier, a check valve is positioned along the fluid outlet pipe to prevent backflow of clean fluid. During this phase, valve 1 is closed and valve 2 is closed, forcing compressed air into the fluid injection reservoir.

[0068] In the third cycle of the cleaning process, air is ejected from the nozzles during the drying cycle to dry the inner surface of the implant. At the beginning of the third cycle, the cleaning system is removed from the cleaning reservoir and placed in the drying reservoir. During the drying process, the pneumatic and fluid components operate in state 3. In state 3, compressed air is redirected to the air outlet pipe coupled to the manifold (320). Unregulated compressed air enters directly into the manifold, where it is distributed to the implant support. The compressed air entering the implant support is distributed to each nozzle, where it contacts the interior of the implant to assist in drying. During this phase, valve 1 is open and valve 2 is closed, forcing compressed air into the manifold.

[0069] The operation of pneumatic and fluid components can be controlled by a programmable logic controller (PLC). The PLC may have its own executable code that, when executed, causes the PLC to initiate the cleaning method described herein by providing control signals to various components of the cleaning system. For example, the PLC can automatically switch valves to open or closed positions and turn the vacuum generator on or off.

[0070] In some embodiments, the PLC may store data in a memory. In some embodiments, the PLC includes a non-transitory computer-readable medium comprising code stored for performing the process steps of the cleaning method described herein.

[0071] The implant can be cleaned through a series of cleaning steps. In one embodiment, five cleaning cycles and three drying cycles are used to clean the implant.

[0072] The first cleaning cycle, cleaning #1, is performed using a cleaning fluid comprising an aqueous solution of a surfactant. Depending on the surfactant in the aqueous solution, cleaning #1 can be performed at a pH range of 1.5 to 7.0. Cleaning #1 can be performed at an operating temperature of 20°C to 80°C. The implant is exposed to the cleaning solution in cleaning #1 for a period of 60 to 240 seconds. An exemplary cleaning composition and conditions for cleaning #1 are: KKS ultrasonic cleaning solution or Surtec cleaning solution, pH 2.5, temperature 70°C, and an exposure time of 200 seconds in a reservoir.

[0073] The second cleaning cycle, cleaning #2, is performed using a cleaning fluid comprising an aqueous solution of a surfactant. Depending on the surfactant in the aqueous solution, cleaning #2 can be performed at a pH range of 1.5 to 7.0. Cleaning #2 can be performed at an operating temperature of 20°C to 80°C. The implant is exposed to the cleaning solution in cleaning #2 for a period of 60 to 240 seconds. An exemplary cleaning composition and conditions for cleaning #2 are: KKS ultrasonic cleaning solution or Surtec cleaning solution, pH 2.5, temperature 70°C, and an exposure time of 200 seconds in a reservoir.

[0074] The third cleaning cycle, cleaning #3, is performed using a cleaning fluid comprising an aqueous solution of an acidic detergent. For example, the cleaning fluid used for cleaning #3 could be a citric acid-based detergent. Cleaning #3 can be performed at a pH range of 1.5 to 7.0. Cleaning #3 can be performed at an operating temperature of 20°C to 80°C. The implant is exposed to the cleaning solution in cleaning #3 for a period of 60 to 240 seconds. An exemplary cleaning composition and conditions for cleaning #3 are: HAMO acid rinsing, pH 3.5, at 25°C, and an exposure time of 200 seconds in a reservoir.

[0075] Following exposure to three chemical cleaning fluids, the implant was rinsed twice with purified water (rinse #1 and rinse #2). The purified water removed chemical residues (such as surfactants and acidic detergents) from the implant that may have been present in the previous cleaning steps. The purified water rinses were performed at operating temperatures ranging from 20°C to 80°C.

[0076] After the cleaning and rinsing steps are completed, the implant is dried using one or more dryers. In one embodiment, the implant may be dried three times (dryer #1, dryer #2, and dryer #3). The implant is dried by transferring the cleaning system to a drying reservoir. The drying reservoir heats the air surrounding the cleaning system to a temperature of 80°C to 120°C. Additionally, compressed drying air is heated to a temperature of 80°C to 140°C and fed into a fluid manifold. The fluid manifold distributes the heated air to each implant support to dry the inner surface of the implant. The cleaning system is exposed to heated conditions for 360 seconds to 1000 seconds. In an exemplary drying process, the implant is exposed to an ambient temperature of 80°C; the heated compressed drying air is heated to 123°C; and the drying time is 660 seconds. In some embodiments, only one dryer is used for the drying process.

[0077] After the cleaning and drying cycle is complete, the cleaning system is removed from the final drying reservoir. The implant support is then removed from the cleaning system. The cap on the implant support is released from the body, and the implant is removed and stored for use.

[0078] Specific systems and methods for cleaning implants have been disclosed. However, it will be apparent to those skilled in the art that many other modifications are possible beyond those already described without departing from the inventive concept of this document. Therefore, the subject matter of the invention is not limited except in the spirit of this disclosure. Furthermore, in interpreting this disclosure, all terms should be interpreted in the broadest manner consistent with the context. In particular, the terms “comprising” and “including” should be interpreted in a non-exclusive manner as referring to an element, component, or step that indicates that the referenced element, component, or step may be present or utilized, or combined with other elements, components, or steps not expressly referenced.

Claims

1. An implant support for use in a cleaning system, said implant support comprising: ontology; A plurality of nozzles are partially disposed in the body, each of the plurality of nozzles including an inlet and an outlet, wherein each of the plurality of nozzles is disposed in the body such that the outlet of each of the plurality of nozzles extends away from the body; One or more conduits are dispersed within the body, wherein each of the plurality of nozzles is disposed within the body such that the inlet of each of the plurality of nozzles is coupled to one or more conduits in the conduit; An inlet port coupled to one or more of the pipes, wherein, during use, cleaning fluid enters via the inlet port into one or more pipes dispersed within the body; and A cover, the cover including a plurality of openings extending into the cover, wherein the cover is positioned above the nozzle such that the plurality of openings in the cover are substantially aligned with the plurality of nozzles; The cap is positioned at a fixed distance above the nozzle such that when the implant is placed on the nozzle, the end of the implant partially extends into the opening, and a gap exists between the end of the implant and the bottom surface of the opening.

2. The implant support according to claim 1, further comprising a spacer positioned between the body and the cap, wherein the spacer maintains the cap at a fixed distance above the nozzle.

3. The implant support according to claim 1 or 2, wherein the plurality of nozzles are arranged in an array within the body.

4. The implant support according to any one of claims 1 to 3, wherein the body includes a front surface and a back surface opposite to the front surface, wherein the plurality of nozzles are disposed within the front surface and the back surface of the body.

5. The implant support according to any one of claims 1 to 4, wherein the one or more conduits include a central conduit extending through the body, wherein the inlet fluid of each of the plurality of nozzles is fluidly coupled to the central conduit.

6. The implant support according to any one of claims 1 to 5, further comprising a fastener system connected to the body and extending through the cap, wherein the fastener system secures the cap to the body.

7. The implant support according to any one of claims 1 to 6, wherein each of the plurality of nozzles is disposed in a cavity formed in the body, and the outlet of each of the plurality of nozzles extends above the cavity.

8. The implant support according to any one of claims 1 to 7, wherein each of the plurality of openings in the cover is tapered.

9. The implant support according to any one of claims 1 to 8, wherein each of the plurality of openings in the cover comprises a tapered upper portion and a cylindrical lower portion.

10. A cleaning system, comprising: Framework support structure; A fluid injection reservoir coupled to the frame support structure, wherein the fluid injection reservoir is configured to contain cleaning fluid; One or more implant support members according to any one of claims 1 to 9, said implant support member being coupled to the frame support structure; as well as A fluid manifold coupled to the frame support structure and to the inlet port of each of the one or more implant supports.

11. The system of claim 10, wherein the frame support structure is formed as an open frame having sides that allow fluid to contact the one or more implant supports through the frame support structure during use.

12. The system of claim 10 or 11 further includes a vacuum source coupled to the fluid injection reservoir, wherein the vacuum source applies a vacuum to the fluid injection reservoir to draw clean fluid into the fluid injection reservoir.

13. The system of claim 12, further comprising a control system including a controller and one or more valves, wherein the controller provides control signals to the one or more valves during use to control the application of a vacuum to the fluid injection reservoir.

14. The system according to any one of claims 10 to 13, further comprising an air inlet coupled to the fluid injection reservoir.

15. The system of claim 14, further comprising a control system including a controller and one or more valves, wherein the controller provides control signals to the one or more valves during use to control the airflow into the fluid injection reservoir.

16. A method for cleaning an implant, comprising: Place multiple implants on one or more implant supports according to any one of claims 1 to 9; Place the one or more implant support components in the cleaning system according to any one of claims 10 to 15; The cleaning system is placed in a cleaning fluid reservoir containing cleaning fluid, wherein one or more implant supports are immersed in the cleaning fluid; At least a portion of the cleaning fluid is transferred from the cleaning fluid reservoir to the fluid injection reservoir; as well as The cleaning fluid is directed from the fluid injection reservoir through the fluid manifold into the one or more implant supports, wherein the cleaning fluid is ejected from a plurality of nozzles attached to the implant supports to apply the cleaning fluid to the inner surface of the implant.

17. The method of claim 16, wherein the cleaning fluid comprises an aqueous solution of a surfactant.

18. The method of claim 16, wherein the cleaning fluid comprises an aqueous solution of an acidic detergent.

19. The method of claim 16, wherein the cleaning fluid comprises purified water.

20. The method of any one of claims 16 to 19, wherein a plurality of cleaning fluid reservoirs are used sequentially to clean the implant.

21. The method of claim 20, wherein the plurality of cleaning fluid reservoirs comprises: A clean fluid reservoir having at least one aqueous solution comprising a surfactant; It has at least one cleaning fluid reservoir comprising an aqueous solution of an acidic detergent; as well as At least one clean fluid reservoir containing purified water.

22. The method according to any one of claims 16 to 21, further comprising placing the cleaning system in a drying reservoir, wherein the drying reservoir heats the air surrounding the cleaning system.

23. The method of claim 22, further comprising directing heated air into the implant support.

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