Photosensitive resin composition and preparation method thereof
By employing a rigid-flexible synergistic design of polyimide and polyurethane acrylate and a specific process flow, an interpenetrating polymer network is formed, resolving the contradiction between flexibility and heat resistance in photosensitive resin compositions, making them suitable for high-end electronic devices.
Patent Information
- Application Number
- CN202610540037.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-22
- Publication Date
- 2026-07-03
AI Technical Summary
Existing photosensitive resin compositions present a contradiction between mechanical properties and thermal stability, making it difficult to balance flexibility and heat resistance, thus failing to meet the application requirements of high-end electronic devices.
The design employs a rigid-flexible synergistic approach of polyimide and polyurethane acrylate, combined with epoxy resin to enhance interfacial adhesion. Through a process involving high-temperature dissolution, medium-temperature mixing, fineness control, and segmented curing, an interpenetrating polymer network structure is formed.
Without sacrificing photosensitivity and flame retardancy, it achieves simultaneous improvement in mechanical flexibility and thermal stability, making it suitable for flexible circuit boards and foldable display devices.