Metrology tool and method
By employing a multi-exposure technique within a single frame using a detector array, and utilizing a controller to read out the total radiation dose of the detector elements over multiple discrete time intervals, the throughput and reproducibility issues of existing measurement tools during wavelength switching are resolved. This achieves efficient radiation attenuation and averaging of dynamic effects, thereby improving the performance of the measurement tool.
Patent Information
- Application Number
- CN202480077102.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-12-07
- Filing Date
- 2024-11-14
- Publication Date
- 2026-07-03
AI Technical Summary
Existing measurement tools struggle to maintain reasonable throughput when switching between different wavelengths using broadband radiation sources, potentially leading to reproducibility issues and system dynamics, especially in low-k1 lithography processes where current technologies struggle to effectively attenuate radiation to avoid wavelength variations and improve throughput.
By employing a detector array and using multiple exposures within a single frame, the total radiation dose of the detector elements is read out by the controller over multiple discrete time intervals. Combined with a switch and capacitor structure, this achieves effective attenuation of radiation and averaging of dynamic effects.
It improves the throughput of measurement tools, reduces the impact of system dynamic effects, prevents wavelength variations, and improves the reproducibility and efficiency of measurements.
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Abstract
Citation Information
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