A method and apparatus for improving the utilization of a solid state reaction source
By using pressure sensors and controllers to monitor the remaining amount of solid-state reaction source in real time, and combining this with gas filters to prevent particulate contamination, the problem of low utilization rate of solid-state reaction source is solved, thereby improving wafer production efficiency and product quality.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- PIOTECH (SHANGHAI) CO LTD
- Filing Date
- 2026-05-29
- Publication Date
- 2026-07-17
AI Technical Summary
In existing technologies, the utilization rate of solid-state reaction sources is low, resulting in waste and particulate contamination. Furthermore, the inability to effectively monitor the remaining amount leads to high equipment maintenance costs and affects wafer yield.
A pressure sensor is used to measure the remaining amount of solid reaction source. The controller determines whether it is sufficient for wafer deposition and issues a warning or alarm when it is insufficient. Combined with a gas filter, particles are prevented from entering the reaction chamber, thus improving utilization.
This enables efficient utilization of solid-state reaction sources, reduces waste and particulate contamination, and improves wafer yield and equipment maintenance efficiency.
Smart Images
Figure CN122406185A_ABST