Charged particle optical arrangement for a charged particle beam device

By using charged particle optical arrangement in charged particle beam device, focusing error caused by electrode deformation is offset, improving detection accuracy and efficiency, solving the focusing error problem caused by electrode deformation, and increasing the output and throughput of semiconductor manufacturing.

CN122422969APending Publication Date: 2026-07-17ASML NETHERLANDS BV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
ASML NETHERLANDS BV
Filing Date
2024-12-11
Publication Date
2026-07-17

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Abstract

一种用于带电粒子束装置的带电粒子光学布置，所述带电粒子束装置被配置为对至少一个带电粒子束进行操作，所述电子光学布置包括：第一板，其限定至少一个第一孔径用于所述至少一个束穿过；以及第二板，其限定至少一个第二孔径用于所述至少一个束穿过；以及致动器布置，被配置为向所述第一板施加力。
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Citation Information

Patent Citations

  • Charged particle optical system comprising an electrostatic deflector

    EP2425444A1