Method for determining wavefront aberrations caused by an optical system

DE102024133809A1Active Publication Date: 2026-05-21CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
CARL ZEISS SMT GMBH
Filing Date
2024-11-19
Publication Date
2026-05-21

AI Technical Summary

Technical Problem

Existing optical systems with small object field sizes, such as mask inspection systems and microscopes, face challenges in assigning wavefront aberrations to specific optical elements due to small field profiles, leading to inadequate alignment and reduced optical performance.

Method used

A method involving multiple measurements of wavefront aberrations at different effective exit pupils, achieved by varying the optical beam path using aperture diaphragms, allows for targeted assignment of aberrations to causative optical elements by distinguishing between pupil-near and field-near elements.

Benefits of technology

Enables precise adjustment of optical elements to minimize wavefront aberrations, improving optical system alignment and performance even in systems with small object fields.

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Abstract

The invention relates to a method and a device for determining wavefront aberrations caused by an optical system. In a method according to the invention, an object field (101) located in an object plane and illuminated by an illumination system is projected by a projection lens (100) onto an image field (105) located in an image plane, wherein for at least one field point in the image plane, a plurality of measurements of the wavefront aberration generated at that field point are carried out, these measurements differing from one another with respect to the respective effective exit pupil of the beam path.
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Citation Information

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