Polishing pad

JP1825202SActive Publication Date: 2026-04-22FUJIBO HLDG
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Patent Information

Application Number
JP2025021071D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2025-10-17
Publication Date
2026-04-22
Estimated Expiration
2050-10-17

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Abstract

This article is a polishing pad comprising a polishing layer and a cushioning layer laminated together. The partial design features a configuration in which a plate-shaped window made of a transparent material is fitted into a recess formed in the polishing layer, and the product is used by transmitting light such as laser light through the window.
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