Analysis method and display method

Abstract

To provide a technique for easily confirming the positional relationship of a plurality of structures constituting a device including errors.SOLUTION: An analysis method confirms a positional relationship between a first structure composed of a plurality of members and a second structure and includes: a step (S2) of calculating a contact possibility range by integrating design values and design errors of each member of the first structure, and a step (S4) of analyzing the positional relationship between the first structure and the second structure based on the contact possibility range. When a reference body of the first structure is composed of a first member to be fixed, a second member, and an intermediate member (optional) interposed between the first member and the second member, in the step (S2) of calculating the contact possibility range, the contact possibility range of the second member is calculated by integrating all design errors of the first member, the intermediate member, and the second member. Thus, the positional relationship of the plurality of structures constituting a device can be easily confirmed, including errors.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present invention relates to an analysis method for analyzing the positional relationship between a plurality of structures in a computer model and a method for displaying the analysis results. [Background technology]

[0002] Conventionally, when designing various devices or changing their operation, computer models are used to perform operation simulations to analyze the positional relationships between structures within the device, and this allows confirmation of whether contact between structures does not occur, whether structures contact each other well, or whether desired distances can be maintained between structures.

[0003] A computer model of a conventional device is described, for example, in Patent Document 1. In Patent Document 1, a device is assembled in a virtual space called a digital twin, and the device in the virtual space is operated using application programs and data in the same way as a real device. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Patent No. 7312835 Summary of the Invention [Problem to be solved by the invention]

[0005] However, conventional simulations have not been able to detect problems such as unintended contact between structures due to design errors in the components that make up each structure.In response to this, in the field of equipment design, there has been a need to easily analyze the positional relationships between structures and identify points where problems may occur when designing equipment (especially before assembling the equipment) or when changing its operation.

[0006] An object of the present invention is to provide a technique that can easily check the positional relationship of multiple structures that make up an apparatus, including any errors. [Means for solving the problem]

[0007] In order to solve the above problem, a first invention is a method for analyzing a positional relationship between a first structure composed of a plurality of members and a second structure, the method comprising: a) calculating a contact possibility range by integrating a design value and a design error for each of the members of the first structure; and b) analyzing the positional relationship between the first structure and the second structure based on the contact possibility range of the first structure, wherein the plurality of members of the first structure include a first member fixed to a reference body, a second member attached directly or indirectly to the first member, and a contact possibility range between the first member and the second member. and one or more intermediate members that are interposed between the first member and the second member when two members are indirectly attached to each other, and in step a), when the second member is directly attached to the first member, the range of possible contact of the second member is calculated by adding up the design errors of the first member and the second member, and when the second member is indirectly attached to the first member via the intermediate member, the range of possible contact of the second member is calculated by adding up all the design errors of the first member, the intermediate member, and the second member.

[0008] A second aspect of the present invention is the analysis method of the first aspect of the present invention, wherein in the step b), it is determined whether or not the second structure enters the possible contact range of any of the members of the first structure.

[0009] A third invention is an analysis method of the first invention, wherein the second structure is composed of a plurality of components, and c) before step b), further includes a step of calculating a contact possibility range by integrating a design value and a design error for each of the components of the second structure, and in step b), the positional relationship between the first structure and the second structure is analyzed based on the contact possibility range of the first structure and the contact possibility range of the second structure.

[0010] The fourth invention is characterized in that in step b) of the third invention, it is determined whether the contact possibility range of any of the members of the first structure overlaps with the contact possibility range of any of the members of the second structure.

[0011] A fifth invention is a method for displaying an analysis result of a positional relationship between a first structure composed of a plurality of members and a second structure, the method comprising: a) calculating a possible contact range by integrating a design value and a design error for each of the members of the first structure; and b) analyzing the positional relationship between the first structure and the second structure based on the possible contact range of the first structure. and d) a step of displaying the positional relationship between the first structure and the second structure, wherein the multiple members of the first structure include a first member fixed to a reference body, a second member attached directly or indirectly to the first member, and one or more intermediate members interposed between the first member and the second member when the first member and the second member are indirectly attached, and in step a), when the second member is directly attached to the first member, the range of possible contact of the second member is calculated by adding up the design errors of the first member and the second member, and when the second member is indirectly attached to the first member via the intermediate member, the range of possible contact of the second member is calculated by adding up all the design errors of the first member, the intermediate member, and the second member, and in step d), the outline of the design value of each member of the first structure and the outline of the range of possible contact are displayed alternately, or are displayed simultaneously.

[0012] A sixth invention is a method for displaying a positional relationship between a first structure and a second structure, the method comprising the steps of: a) calculating a contact possibility range by integrating a design value and a design error for each of the members of the first structure; b) analyzing the positional relationship between the first structure and the second structure based on the contact possibility range of the first structure; and d) displaying the positional relationship between the first structure and the second structure, wherein the plurality of members of the first structure include a first member fixed to a reference body, a second member attached directly or indirectly to the first member, and one or more members interposed between the first member and the second member when the first member and the second member are indirectly attached. and an intermediate member, wherein in step a), if the second member is directly attached to the first member, the range of possible contact of the second member is calculated by adding up the design errors of the first member and the second member, and if the second member is indirectly attached to the first member via the intermediate member, the range of possible contact of the second member is calculated by adding up all the design errors of the first member, the intermediate member, and the second member, and in step b), it is determined whether the second structure encroaches on the range of possible contact of any of the members of the first structure, and in step d), the member of the first structure whose range of possible contact has been encroached on by the second structure is displayed in a special display.

[0013] A seventh invention is a display method according to the sixth invention, wherein the special display includes any one of a change in brightness, a change in transparency or opacity of the display, addition of a pattern or text, a time-series change in the display, and display of a moving image. [Effects of the Invention]

[0014] According to the first to seventh aspects of the present invention, the positional relationships of the multiple structures that make up the device can be easily confirmed, including any errors.

[0015] In particular, according to the second and fourth aspects of the invention, interference between structures can be confirmed.

[0016] In particular, according to the fifth to seventh aspects of the invention, the analysis results of the positional relationship of the structures can be visually confirmed.

[0017] In particular, according to the sixth and seventh aspects of the invention, interference between structures can be visually confirmed. [Brief explanation of the drawings]

[0018] [Figure 1] FIG. 1 is a block diagram showing a configuration of an analysis device. [Figure 2] FIG. 1 is a perspective view showing an exposure device. [Figure 3] 10 is a flowchart showing the flow of a positional relationship analysis process. [Figure 4] 10 is a display example of a design value model and an expansion model. DETAILED DESCRIPTION OF THE INVENTION

[0019] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Note that the components described in the embodiment are merely examples and are not intended to limit the scope of the present invention. In the drawings, the dimensions and numbers of each part may be exaggerated or simplified as necessary to facilitate understanding.

[0020] In addition, in the drawings, arrows indicating the mutually orthogonal X, Y, and Z directions are appropriately added to facilitate understanding of the positional relationships of each element. In the following explanation, the X and Y directions are defined as horizontal directions, and the Z direction is defined as vertical. The +Z direction is defined as upward, and the -Z direction is defined as downward.

[0021] <1. Configuration of the analysis device> 1 is a block diagram showing a conceptual configuration of an analysis device 1 according to one embodiment of the present invention. The analysis device 1 analyzes the positional relationships of multiple structures that make up the device so that they can be confirmed, including errors.

[0022] As shown in FIG. 1, the analysis device 1 has a calculation unit 11, an input unit 12, and a display unit 13. The calculation unit 11 is a unit for performing various calculations. The calculation unit 11 is configured, for example, by a computer having a processor such as a CPU, a memory such as RAM, and a storage unit such as a hard disk drive. The storage unit stores computer programs and various data for executing analysis processing in the calculation unit 11. The calculation unit 11 can perform analysis processing regarding the positional relationships of multiple structures that make up the device by reading the computer programs and various data from the storage unit to the memory and having the processor perform calculation processing in accordance with the computer programs and data.

[0023] The calculation unit 11 has a model generation unit 81 and a simulation execution unit 82 as processing units realized on software. The input unit 12 can input various data to the calculation unit 11. The display unit 13 can display the analysis results of the calculation unit 11. The input unit 12 uses input devices such as a keyboard and a mouse. The display unit 13 uses display devices such as a liquid crystal display. A touch panel may be used to serve as both the input unit 12 and the display unit 13.

[0024] A design value model M0 of the device to be analyzed and error information D0 are input to the model generation unit 81. The design value model M0 and error information D0 may be input from the outside via an interface, may be read out from a memory unit 100 in the calculation unit 11 in advance, or may be constructed in the model generation unit 81 from information input from the input unit 12.

[0025] The design value model M0 is created using various 3D model generation software such as 3D CAD. The design value model M0 may be configured only of the structures of the equipment to be analyzed whose positional relationships are to be understood, or may include all of the structures. In addition, instead of inputting a pre-created design value model M0, the calculation unit 11 may use a computer program that generates an equipment model for simulation, and input required information from the input unit 12 to generate the design value model M0.

[0026] The error information D0 includes the specification of the structure for which the contact possibility range is to be calculated, the reference point for each structure, and the design error value for each structure or each member. The model generation unit 81 corrects the design value model M0 based on the error information D0 to generate an expansion model M1. The expansion model M1 is a model that represents the outer shape of each member of the structure when each member constituting the structure has a maximum error in the expansion direction. Details of the expansion model M1 will be described later.

[0027] The simulation execution unit 82 causes each structure of the design value model M0 and the expansion model M1 to perform operations that simulate actual operations when the device is in use, in accordance with operation information input from the input unit 12. At this time, the positional relationships of each structure are analyzed while the structures are operating. The simulation execution unit 82 displays the state of this operation and the analysis results R on the display unit 13. The analysis of the positional relationships of the structures and the method of displaying the analysis results will be described later.

[0028] <2. Substrate processing equipment / analysis target example> 2 is a perspective view showing an exposure apparatus 9, which is an example of an apparatus to be analyzed in the analysis apparatus 1 according to the first embodiment. The exposure apparatus 9 is a substrate processing apparatus that processes a substrate W, and is an apparatus that irradiates light onto the upper surface of the substrate W on which a layer of a photosensitive material (photosensitive layer) such as resist has been formed, to draw a pattern. The substrate W is, for example, a semiconductor substrate, a printed circuit board, a substrate for a color filter, a glass substrate for a flat panel display used in a liquid crystal display device or a plasma display device, or a substrate for an optical disc.

[0029] As shown in FIG. 2, the exposure apparatus 9 includes a base 91, a stage 92, a stage moving mechanism 93, a gantry 94, an exposure unit 95, and a control unit 90.

[0030] The base 91 has a rectangular shape when viewed from above, and supports a stage 92, a stage moving mechanism 93, and a gantry 94 from below.

[0031] The stage 92 has a support stage 21, an X-stage 23, and a Y-stage 25. The support stage 21 has an upper surface 2S as a support surface that supports the substrate W. The upper surface 2S is a horizontal surface parallel to the X and Y directions. The substrate W is placed on the upper surface 2S in a horizontal position. A plurality of suction holes are formed in the upper surface 2S. The support stage 21 can fix the substrate W to the upper surface 2S by applying a negative pressure (suction pressure) to the suction holes. Note that a chuck that grips the periphery of the substrate W may be provided on the upper surface 2S, and the substrate W may be fixed to the upper surface 2S by the chuck.

[0032] The X stage 23 is disposed below the support stage 21 and rotatably supports the support stage 21. The X stage 23 is located above the Y stage 25. The Y stage 25 is disposed below the X stage 23 and supports the X stage 23 and the sub-scanning mechanism 32.

[0033] The stage movement mechanism 93 is a mechanism that moves the support stage 21 in the main scanning direction (Y direction), the sub-scanning direction (X-axis direction), and the rotation direction (rotation direction around the Z axis (θ-axis direction)). The stage movement mechanism 93 has a sub-scanning mechanism 32, a main scanning mechanism 34, and a rotation mechanism 35.

[0034] The sub-scanning mechanism 32 moves the X stage 23 relative to the Y stage 25 in the X direction, which is the sub-scanning direction. The main scanning mechanism 34 moves the Y stage 25 relative to the base 91 in the Y direction, which is the main scanning direction. The sub-scanning mechanism 32 and the main scanning mechanism 34 are configured, for example, by a linear motor mechanism including a linear motor and a guide, or a ball screw mechanism including a rotary motor, a ball screw, and a guide. The rotation mechanism 35 is provided on the X stage 23, and rotates the support stage 21 about a rotation axis A1 extending in the Z direction. The sub-scanning mechanism 32, the main scanning mechanism 34, and the rotation mechanism 35 operate based on control commands from the control unit 90.

[0035] The gantry 94 is fixed to the base 91. The gantry 94 has two support columns 41 and a beam 43. The lower part of the support column 41 is fixed to the base 91 and extends in the Z direction. The two support columns 41 are arranged at a distance from each other in the X direction. The beam 43 connects the upper parts of the two support columns 41 and extends in the X direction. In this example, the support stage 21 and the Y stage 25 of the stage movement mechanism 93 are arranged between the two support columns 41 in the X direction, and the beam 43 is arranged above the support stage 21.

[0036] The gantry 94 is a member that supports the exposure unit 95. Each exposure head 51 of the exposure unit 95, which will be described later, is fixed to the −Y side surface of the beam portion 43 of the gantry 94.

[0037] The exposure unit 95 has one or more exposure heads 51. In this example, five exposure heads 51 are arranged along the X-axis direction. Each exposure head 51 has a spatial light modulator 510. The spatial light modulator 510 modulates laser light based on strip data corresponding to the drawing pattern.

[0038] The exposure unit 95 has a light irradiation section 53. The light irradiation section 53 irradiates the exposure heads 51 with laser light. The light irradiation section 53 is housed, for example, inside the gantry 94. The light irradiation section 53 has a laser driver 531, a laser oscillator 533, and an illumination optical system 535. When the laser driver 531 is activated, the laser oscillator 533 emits laser light to the illumination optical system 535. The illumination optical system 535 changes the magnification of the laser light incident from the laser oscillator 533 and homogenizes the light amount distribution. The laser light emitted from the illumination optical system 535 is irradiated onto the spatial light modulator 510 of each exposure head 51.

[0039] The spatial light modulator 510 spatially modulates the laser light irradiated from the light irradiation unit 53 on a channel-by-channel basis, and reflects necessary light that contributes to pattern drawing and unnecessary light that does not contribute to pattern drawing in different directions. Note that spatially modulating light means changing the spatial distribution (amplitude, phase, polarization, etc.) of the light. The exposure head 51 irradiates the modulated laser light onto the substrate W moving directly below the exposure head 51. In this way, the drawing pattern is exposed on the unprocessed substrate W.

[0040] The spatial light modulator 510 may be, for example, a diffraction grating type optical element such as a GLV (Grating Light Valve, a registered trademark of Silicon Light Machines, Inc., USA) or a DMD (Digital Mirror Device).

[0041] The control unit 90 includes a processor such as a CPU and a storage unit such as a RAM. The storage unit stores a program for controlling the operation of the exposure apparatus 9. The processor executes the program stored in the storage unit, allowing the control unit 90 to control each unit and perform drawing processing. Note that some of the functions of the control unit 90 may be realized by a dedicated circuit.

[0042] The control unit 90 controls the light irradiation unit 53 of the exposure unit 95, thereby causing the light irradiation unit 53 to emit a line beam of light toward the exposure head 51. The control unit 90 also controls the stage movement mechanism 93, thereby causing the support stage 921 to move relative to the exposure head 51 in the Y direction, which is the main scanning direction, and the X direction, which is the sub-scanning direction. Then, based on the drawing recipe stored in the storage unit 900 and position information of the support stage 921, the control unit 90 controls the spatial light modulator 510 of the exposure head 51. More specifically, the control unit 90 controls the drive voltage applied to each channel of the spatial light modulator 510, thereby causing the spatial light modulator 510 to modulate the line beam of light so as to correspond to the drawing pattern. As a result, pattern light corresponding to the drawing pattern is formed, and the pattern light is emitted from the exposure head 51.

[0043] The drawing recipe describes, in a predetermined data format, for example, pattern data indicating a drawing pattern to be formed on the substrate W and various conditions for drawing (such as the amount of light emitted from the exposure unit 95 and the moving speed of the support stage 921). The pattern data is, for example, data obtained by rasterizing CAD data generated using CAD (Computer Aided Design), and position information on the substrate W to be irradiated with light is recorded in pixel units.

[0044] When exposing the substrate W in the exposure device 9, the Y stage 25 is moved in the Y direction to perform main scanning movement, which moves the substrate W supported by the support stage 21 in the Y direction (main scanning direction). Then, the exposure head 51 irradiates the substrate W moving in the Y direction with pattern light. After the main scanning movement, the X stage 23 is moved in one direction in the X direction by the width of the pattern light to perform sub-scanning movement, which moves the substrate W. The exposure device 9 exposes the photosensitive layer of the substrate W by repeatedly performing such main scanning movement and sub-scanning movement.

[0045] <3. Positional relationship analysis method using an analysis device> Next, the process of analyzing the positional relationship of the structures of the device to be analyzed in the analysis device 1 will be described with reference to Fig. 3 and Fig. 4. Fig. 3 is a flowchart showing the flow of the process of analyzing the positional relationship of the structures of the device to be analyzed. Fig. 4 is a display example of the analysis result showing an example of the design value model M0 and the expansion model M1.

[0046] As shown in FIG. 3, in the positional relationship analysis process of the structures of the target device, first, a design value model M0 including design values ​​of each member of each structure and error information D0 indicating the design error of each design value are input to the model generation unit 81 from the input unit 12 or by input operation from the input unit 12 (step S1).

[0047] The error information D0 only needs to include the design errors of the members of the two structures (first structure and second structure) whose positional relationship is to be analyzed. The error information D0 may also include the design error of only the structure (for example, only the first structure) that moves relative to the reference body, of the two structures whose positional relationship is to be analyzed. In this embodiment, the error information D0 includes the design error of only the first structure of the two structures, and the possible contact range is calculated for only the first structure.

[0048] The model generation unit 81 calculates the contact possibility range of the first structure based on the input design value model M0 and error information D0 (step S2).

[0049] The possible contact range indicates the range in which each component may exist when the contact error of each component is taken into account from the design value model M0. The expansion model M1 is the outer shape of the possible contact range of the component for which the design error has been input. In this case, the possible contact range is calculated by accumulating the design errors of multiple components.

[0050] Here, a method for generating the expansion model M1 will be described with reference to Fig. 4. Fig. 4 is a schematic diagram of the modeled first structural body K1 and second structural body K2 of the exposure tool 9, viewed from the Y direction.

[0051] 2, in this embodiment, when analyzing the positional relationship between the stage 92 and the exposure head 51, a reference body K0 that serves as a reference for both the stage 92 and the exposure head 51 is defined as the base 91, a first structure K1 that is the subject of positional relationship analysis is defined as the stage 92 and the stage movement mechanism 93, and a second structure K2 that is the subject of positional relationship analysis is defined as the gantry 94 and the exposure head 51 of the exposure unit 95. In addition, the origin O of error integration for each member provided on the reference body K0 is set on the top surface of the base 91 to which both the first structure K1 and the second structure K2 are fixed.

[0052] The first structure K1 has a plurality of members, which are, from bottom to top, a main scanning mechanism 34, a Y stage 25, a sub-scanning mechanism 32, an X stage 23, a rotation mechanism 35, and a support stage 21 on a base 91 which is a reference body K0.

[0053] That is, of the first structure K1, the first member fixed to the reference body K0 is the main scanning mechanism 34. The second member, which is disposed at a position farthest from the first member and is indirectly attached to the first member, is the support stage 21. The intermediate members present between the first member and the second member are the Y stage 25, the sub-scanning mechanism 32, the X stage 23, and the rotation mechanism 35. In this embodiment, an intermediate member is interposed between the first member and the second member, but if the second member is directly attached to the first member, no intermediate member is interposed.

[0054] In Figure 4, the outline of the contactable range of the Y stage 25, X stage 23 and support stage 21 when the error of the main scanning mechanism 34, sub-scanning mechanism 32 and rotation mechanism 35 is set to 0% and the maximum error of the Y stage 25, X stage 23 and support stage 21 when expanded is set to 110% is shown as expanded Y stage 25e, expanded X stage 23e and expanded support stage 21e.

[0055] 4, the underside of the expanded Y stage 25e is supported by the main scanning mechanism 34, so the position of the underside of the expanded Y stage 25e is the same as the designed position of the underside of the Y stage 25. In other words, the amount of expansion Δh1 in the vertical direction (Z-axis direction) of the expanded Y stage 25e is entirely reflected in the position of the upper surface of the expanded Y stage 25e.

[0056] Next, X stage 23e when expanded is supported above main scanning mechanism 34, Y stage 25e when expanded, and sub-scanning mechanism 32. For this reason, the position of the bottom surface of X stage 23e when expanded is located Δh1 above the designed position of the bottom surface of X stage 23. Here, if the amount of expansion of X stage 23e when expanded in the up-down direction (Z-axis direction) is Δh2, the position of the top surface of X stage 23e when expanded is located Δh1 + Δh2 above the designed top surface of X stage 23.

[0057] Similarly, support stage 21e during expansion is supported above main scanning mechanism 34, Y stage 25e during expansion, sub-scanning mechanism 32, X stage 23e during expansion, and rotation mechanism 35. For this reason, the position of the lower surface of support stage 21e during expansion is located Δh1+Δh2 above the position of the lower surface of support stage 21 as designed. Here, if the amount of expansion of support stage 21e in the up-down direction (Z-axis direction) is Δh3, the position of the upper surface of support stage 21e during expansion is located Δh1+Δh2+Δh3 above the upper surface of support stage 21 as designed.

[0058] In this way, the error in the Z-axis direction of the first structure K1 is calculated by accumulating the errors in the Z-axis direction of each member that makes up the first structure K1. If each member is also connected in the X-axis direction or the Y-axis direction, the errors of each member are also accumulated in each of these directions. The range in which each member exists when expanded becomes the possible contact range.

[0059] In step S2 and step S3 (described later), the possible contact range may be calculated for all design error ranges in the positive and negative directions for each component, and the contour of the possible contact range may be used as the expanded model M1. In this case, the possible contact range is the sum of the design errors of multiple components. Therefore, the possible contact range is not limited to cases where the error directions of each component are the same, such as when each component has the largest design error in the positive direction, when each component is exactly as designed, or when each component has the largest design error in the negative direction. It also includes cases where some components have design errors in the positive direction while other components have design errors in the negative direction. In this case, the positional relationship between the structures can be analyzed more accurately, but the amount of calculation in the model generation unit 81 increases.

[0060] Therefore, in step S2, the model generation unit 81 may create an expansion model M1 and a contraction model M2. As in the present embodiment, the expansion model M1 is generated by calculating the range of possible contact when each component has a maximum design error in the positive direction. The contraction model M2 is generated by calculating the range of possible contact when each component has a maximum design error in the negative direction. In this case, in steps S4 and S5 described later, the positional relationship is analyzed and displayed for the contraction model M2 as well as the expansion model M1.

[0061] Upon completion of the above-described step S2, the model generation unit 81 then calculates the contact possibility range of the second structure based on the input design value model M0 and error information D0 (step S3). As a result, an expansion model M1 configured with the contact possibility range of the first structure and the contact possibility range of the second structure is generated. Note that, in this embodiment, the error information D0 includes the design error of only the first structure out of the two structures, and does not take into account the design error of the second structure. In other words, the contact possibility range of the second structure is exactly the same as the design value model M0. Upon completion of step S3, the model generation unit 81 passes the design value model M0 and the generated expansion model M1 to the simulation execution unit 82.

[0062] Next, the simulation execution unit 82 analyzes the positional relationship between both the input design value model M0 and the expansion model M1 (step S4). At this time, if the first structure K1 and the second structure K2 move relatively, the first structure K1 and the second structure K2 are moved relatively by an input operation from the input unit 12 or based on the operation information included in the design value model M0.

[0063] In the position analysis of step S4, the simulation execution unit 82 analyzes whether or not the first structure K1 and the second structure K2 will come into contact with each other, or the specific numerical value of the gap between the opposing portions of the first structure K1 and the second structure K2. Whether or not there will be contact is determined based on whether or not the second structure will enter into the possible contact range of any member of the first structure, or conversely, whether or not the first structure will enter into the possible contact range of any member of the second structure.

[0064] Then, the simulation execution unit 82 displays the analysis result of step S4 on the display unit 13 (step S5). That is, the simulation execution unit 82 displays on the display unit 13 the positional relationship between the first structure K1 and the second structure K2.

[0065] The display of the display unit 13 may be switched between, for example, the outline of the design values ​​of each member based on the design value model M0 and the outline of the contact possibility range based on the expansion model M1. Also, for example, the outline of the design values ​​of each member based on the design value model M0 and the outline of the contact possibility range based on the expansion model M1 may be displayed in an overlapping manner.

[0066] Furthermore, when the simulation execution unit 82 determines that the first structure K1 and the second structure K2 will come into contact with each other, it displays a special display. For example, when the second structure K2 enters the possible contact range of one of the components of the first structure, a special display is displayed for the component of the first structure that the second structure has entered into the possible contact range. The special display may be, for example, a change in color or brightness, a change in transparency or opacity of the display, the addition of a pattern or text, a time-series change in the display such as blinking, or the display of a moving image. In addition to the special display, a warning window may appear, a warning sound may be emitted, or the like.

[0067] In this way, by calculating the possible contact range of the structure whose positional relationship you want to check and analyzing the positional relationship of the device configuration using the outline of the possible contact range, you can easily check the positional relationship of the multiple structures that make up the device, including any errors. Also, by using a special display, you can visually check interference between structures.

[0068] <4. Variations> Although the embodiments have been described above, the present invention is not limited to the above and various modifications are possible.

[0069] In the above embodiment, the positional relationship is analyzed for two structures, the first structure and the second structure, but the present invention is not limited to this. The positional relationship may be analyzed for three or more structures.

[0070] Although the present invention has been described in detail, the above description is merely illustrative in all respects and does not limit the present invention. It is understood that countless variations not illustrated can be envisioned without departing from the scope of the present invention. The configurations described in the above embodiments and variations can be combined or omitted as appropriate as long as they are not mutually inconsistent. [Explanation of symbols]

[0071] 1 Analysis device 9 Exposure equipment 11 Arithmetic section 12 Input section 13 Display section 81 Model Generation Unit 82 Simulation Execution Unit D0 error information K0 reference body K1 1st structure K2 second structure M0 design value model M1 expansion model M2 contraction model R analysis results

Claims

1. A method for analyzing a positional relationship between a first structure and a second structure, the first structure being composed of a plurality of members, the method comprising: a) calculating a contact possibility range by integrating a design value and a design error for each of the members of the first structure; b) analyzing a positional relationship between the first structure and the second structure based on the contact possibility range of the first structure; and The plurality of members of the first structure include: a first member fixed to the reference body; a second member attached directly or indirectly to the first member; one or more intermediate members interposed between the first member and the second member when the first member and the second member are indirectly attached to each other; Including, In the step a), When the second member is directly attached to the first member, the contact possibility range of the second member is calculated by integrating the design errors of the first member and the second member; An analysis method in which, when the second member is indirectly attached to the first member via the intermediate member, the contact possibility range of the second member is calculated by accumulating all of the design errors of the first member, the intermediate member, and the second member.

2. The analysis method according to claim 1, In the step b), it is determined whether the second structure enters the contact possibility range of any of the members of the first structure.

3. The analysis method according to claim 1, the second structure is composed of a plurality of members, c) before the step b), a step of calculating a contact possibility range by integrating a design value and a design error for each of the members of the second structure. and In the step b), a positional relationship between the first structure and the second structure is analyzed based on the contactable range of the first structure and the contactable range of the second structure.

4. The analysis method according to claim 3, In the step b), it is determined whether the possible contact range of any of the members of the first structure overlaps with the possible contact range of any of the members of the second structure.

5. A method for displaying an analysis result of a positional relationship between a first structure composed of a plurality of members and a second structure, the method comprising: a) calculating a contact possibility range by integrating a design value and a design error for each of the members of the first structure; b) analyzing a positional relationship between the first structure and the second structure based on the contact possibility range of the first structure; d) displaying the positional relationship between the first structure and the second structure; and The plurality of members of the first structure include: a first member fixed to the reference body; a second member attached directly or indirectly to the first member; one or more intermediate members interposed between the first member and the second member when the first member and the second member are indirectly attached to each other; Including, In the step a), When the second member is directly attached to the first member, the contact possibility range of the second member is calculated by integrating the design errors of the first member and the second member; When the second member is indirectly attached to the first member via the intermediate member, the contact possibility range of the second member is calculated by integrating all of the design errors of the first member, the intermediate member, and the second member; A display method in which, in step d), the design value contours of each of the members of the first structure and the contours of the contact possibility range are displayed in a switched manner, or displayed simultaneously.

6. A method for displaying a positional relationship between a first structure and a second structure, the first structure being made up of a plurality of members, the method comprising: a) calculating a contact possibility range by integrating a design value and a design error for each of the members of the first structure; b) analyzing a positional relationship between the first structure and the second structure based on the contact possibility range of the first structure; d) displaying the positional relationship between the first structure and the second structure; and The plurality of members of the first structure include: a first member fixed to the reference body; a second member attached directly or indirectly to the first member; one or more intermediate members interposed between the first member and the second member when the first member and the second member are indirectly attached to each other; Including, In the step a), When the second member is directly attached to the first member, the contact possibility range of the second member is calculated by integrating the design errors of the first member and the second member; When the second member is indirectly attached to the first member via the intermediate member, the contact possibility range of the second member is calculated by integrating all of the design errors of the first member, the intermediate member, and the second member; In the step b), it is determined whether the second structure enters the contact possibility range of any of the members of the first structure; In the step d), the member of the first structure that has entered the contact possibility range of the second structure is displayed in a special display.

7. The display method according to claim 6, The special display is Changes in brightness, Changes in display transparency or opacity, Adding patterns or letters, Time series changes in display, and Video display A display method including any one of the above.

Images