Polishing composition for semiconductor processes and method for manufacturing a substrate using the same

The polishing composition with alkali metal ions and balanced metal ion ratios enhances dispersibility and defect control, addressing dispersibility and defect formation challenges in semiconductor CMP processes, achieving efficient and defect-free polishing of silicon oxide and tungsten films.

JP7885303B2Active Publication Date: 2026-07-06YOUNG CHANG CHEMICAL CO LTD
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Patent Information

Application Number
JP2024191127
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2023-11-02
Filing Date
2024-10-30
Publication Date
2026-07-06
Estimated Expiration
2044-10-30

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Patent Text Reader

Abstract

To provide a polishing composition for semiconductor processes that has excellent dispersibility and can embody a polished surface with a defect count regulated below a certain level when applied to chemical mechanical polishing (CMP) processes.SOLUTION: A polishing composition for semiconductor processes according to an embodiment of the present description contains abrasive particles and a first metal ion, which is an alkali metal ion. The abrasive particles present a surface positive charge. The content of the first metal ion in the polishing composition for semiconductor processes is 15 ppm (weight basis) to 100 ppm (weight basis). Such polishing compositions have excellent dispersion and can provide polished surfaces with defect counts regulated below a certain level.SELECTED DRAWING: None
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Citation Information

Patent Citations

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  • Ceria-based composite fine particle dispersion, manufacturing method therefor and polishing abrasive dispersion containing the ceria-based composite fine particle dispersion

    JP2018123046A

  • Polishing composition for semiconductor process and method for manufacturing semiconductor element applying polishing composition

    JP2022159256A

  • Chemical mechanical polishing slurry composition andplanarization method using same for semiconductordevice

    KR1020020029158A