Measuring array for determining the position of a projection exposure system

The optical measuring arrangement with 2D retroreflectors and controlled beam properties in a resonator cavity addresses the challenge of accurate large-distance measurement, enhancing stability and efficiency in projection and lithography systems.

WO2026114664A1PCT designated stage Publication Date: 2026-06-04CARL ZEISS SMT GMBH
View PDF 10 Cites 0 Cited by

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
CARL ZEISS SMT GMBH
Filing Date
2025-11-14
Publication Date
2026-06-04

Smart Images

  • Figure EP2025083065_04062026_PF_FP_ABST
    Figure EP2025083065_04062026_PF_FP_ABST
Patent Text Reader

Abstract

The invention relates to an optical measuring array (100) for measuring the distance of a component relative to a reference along at least one measuring axis, comprising a sensor (101) having a sensor head (102) and a measurement target (103) which is connected or can be connected to the component, wherein the sensor head (102) has an incoupling mirror (104), for coupling in a measurement beam (106), and an end mirror (105), which mirrors enclose a resonator cavity (107) of an optical resonator, and wherein the measurement target (103) is designed to deflect the measurement beam (106) back and forth between the mirrors (104, 105, 108, 109) of the sensor head (102). The sensor head (102) additionally comprises at least two retroreflectors (108, 109).
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Measuring device for measuring a lighting property

    DE102012205181A1

  • Projection exposure system for microlithography with an optical distance measuring device

    DE102012212663A1

  • Device and method for evaluating a functional property of a test component

    DE102019213794A1

  • Measuring arrangement for determining the position of a movable component

    DE102023208513A1

  • Measuring arrangement for determining the position of a movable component, optical system, in particular microlithographic projection exposure system

    DE102023209192A1