A kind of organic/inorganic hybrid tin-lead mixed perovskite material and preparation method thereof

Abstract

The invention provides an organic / inorganic hybridized tin-lead mixed perovskite material and a preparation method thereof. A dimethyl ammonium bromide solid, a lead bromide solid and a tin bromide solid are mixed, added to an N, N-dimethyl formamide solvent and uniformly stirred, and then a reaction solution is obtained; the reaction solution is subjected to pulse electromagnetic field treatment, dropped on a conductive glass substrate and subjected to low-speed spin-coating and high-speed spin-coating respectively, a perovskite film is formed and subjected to vacuum drying in a vacuum drying box, and then the organic / inorganic hybridized tin-lead perovskite film is obtained. The material and the method have the advantages that the preparation process of the method is simple, the preparation stability is good, the cycle is short, the process cost is effectively reduced, the content of a lead element can be reduced, environment pollution can be reduced, the light absorptivity of the material is higher, and the material can be used for manufacturing of a solar cell light absorption layer.

Description

technical field

[0001] The invention relates to a preparation method of an organic / inorganic hybrid perovskite material, in particular to a CH-based 3 NH 3 Pb x sn (1-x) Br 3 Preparation method of tin-lead mixed perovskite structure material. Background technique

[0002] Perovskite-type solar cells are a new type of solar cells. Compared with crystalline silicon cells, their preparation costs are low, the preparation process is simple, and they have high efficiency. They have become a research hotspot in solar cells.

[0003] The light-absorbing layer plays a key role in perovskite solar cells. At present, the light-absorbing layer of perovskite solar cells generally uses organic-inorganic hybrid materials—CH 3 NH 3 wxya 3 (X=I, Br, Cl), which has a high light absorption coefficient and exhibits excellent photoelectric properties in the photocatalytic process. However, this organic-inorganic hybrid material is mainly lead halide, and the content of lead element in t...

Examples

Embodiment 1

[0032] (1) Clean the substrate

[0033] Use FTO conductive glass with a thickness of 3mm as the substrate, first ultrasonically clean it in acetone for 12 minutes, then clean it in absolute ethanol for 12 minutes, and finally rinse it with deionized water and dry it;

[0034] (2) Preparation of reaction solution

[0035] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.001mol solid lead bromide (PbBr 2 ) and 0.009mol solid tin bromide (SnBr 2 ), add 12mL of N,N-dimethylformamide (DMF) solution, stir until the solid powder is completely dissolved, and obtain a reaction solution, which is subjected to pulsed electromagnetic field treatment with a pulse voltage of 400V, a pulse frequency of 2Hz, and a pulse time of is 80s;

[0036] (3) Spin coating film formation

[0037] Drop the treated reaction solution on the conductive glass substrate, and perform low-speed spin-coating and high-speed spin-coating respectively with a homogenizer to form a perovskite fi...

Embodiment 2

[0041] (1) Clean the substrate

[0042] Use FTO conductive glass with a thickness of 4mm as the substrate, first ultrasonically clean it in acetone for 14 minutes, then clean it in absolute ethanol for 14 minutes, and finally rinse it with deionized water and dry it;

[0043] (2) Preparation of reaction solution

[0044] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.003mol solid lead bromide (PbBr 2 ) and 0.007mol solid tin bromide (SnBr 2), add 15mL of N,N-dimethylformamide (DMF) solution, stir until the solid powder is completely dissolved, and obtain a reaction solution, which is subjected to pulsed electromagnetic field treatment with a pulse voltage of 500V, a pulse frequency of 3Hz, and a pulse time of for 90s;

[0045] (3) Spin coating film formation

[0046] Drop the treated reaction solution on the conductive glass substrate, and perform low-speed spin-coating and high-speed spin-coating respectively with a homogenizer to form a perovskite fi...

Embodiment 3

[0050] (1) Clean the substrate

[0051] Use FTO conductive glass with a thickness of 5mm as the substrate, first ultrasonically clean it in acetone for 16 minutes, then clean it in absolute ethanol for 16 minutes, and finally rinse it with deionized water and dry it;

[0052] (2) Preparation of reaction solution

[0053] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.005mol solid lead bromide (PbBr 2 ) and 0.005mol solid tin bromide (SnBr 2 ), add 16mL of N,N-dimethylformamide (DMF) solution, stir until the solid powder is completely dissolved, and obtain a reaction solution, which is subjected to pulsed electromagnetic field treatment with a pulse voltage of 600V, a pulse frequency of 4Hz, and a pulse time of for 100s;

[0054] (3) Spin coating film formation

[0055] Add the pulse-treated reaction solution dropwise on the conductive glass substrate, and perform low-speed spin-coating and high-speed spin-coating with a homogenizer to form a perovskite...

technical field

[0001] The invention relates to a preparation method of an organic / inorganic hybrid perovskite material, in particular to a CH-based 3 NH 3 Pb x sn (1-x) Br 3 Preparation method of tin-lead mixed perovskite structure material. Background technique

[0002] Perovskite-type solar cells are a new type of solar cells. Compared with crystalline silicon cells, their preparation costs are low, the preparation process is simple, and they have high efficiency. They have become a research hotspot in solar cells.

[0003] The light-absorbing layer plays a key role in perovskite solar cells. At present, the light-absorbing layer of perovskite solar cells generally uses organic-inorganic hybrid materials—CH 3 NH 3 wxya 3 (X=I, Br, Cl), which has a high light absorption coefficient and exhibits excellent photoelectric properties in the photocatalytic process. However, this organic-inorganic hybrid material is mainly lead halide, and the content of lead element in t...

Examples

Embodiment 1

[0032] (1) Clean the substrate

[0033] Use FTO conductive glass with a thickness of 3mm as the substrate, first ultrasonically clean it in acetone for 12 minutes, then clean it in absolute ethanol for 12 minutes, and finally rinse it with deionized water and dry it;

[0034] (2) Preparation of reaction solution

[0035] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.001mol solid lead bromide (PbBr 2 ) and 0.009mol solid tin bromide (SnBr 2 ), add 12mL of N,N-dimethylformamide (DMF) solution, stir until the solid powder is completely dissolved, and obtain a reaction solution, which is subjected to pulsed electromagnetic field treatment with a pulse voltage of 400V, a pulse frequency of 2Hz, and a pulse time of is 80s;

[0036] (3) Spin coating film formation

[0037] Drop the treated reaction solution on the conductive glass substrate, and perform low-speed spin-coating and high-speed spin-coating respectively with a homogenizer to form a perovskite fi...

Embodiment 2

[0041] (1) Clean the substrate

[0042] Use FTO conductive glass with a thickness of 4mm as the substrate, first ultrasonically clean it in acetone for 14 minutes, then clean it in absolute ethanol for 14 minutes, and finally rinse it with deionized water and dry it;

[0043] (2) Preparation of reaction solution

[0044] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.003mol solid lead bromide (PbBr 2 ) and 0.007mol solid tin bromide (SnBr 2), add 15mL of N,N-dimethylformamide (DMF) solution, stir until the solid powder is completely dissolved, and obtain a reaction solution, which is subjected to pulsed electromagnetic field treatment with a pulse voltage of 500V, a pulse frequency of 3Hz, and a pulse time of for 90s;

[0045] (3) Spin coating film formation

[0046] Drop the treated reaction solution on the conductive glass substrate, and perform low-speed spin-coating and high-speed spin-coating respectively with a homogenizer to form a perovskite fi...

Embodiment 3

[0050] (1) Clean the substrate

[0051] Use FTO conductive glass with a thickness of 5mm as the substrate, first ultrasonically clean it in acetone for 16 minutes, then clean it in absolute ethanol for 16 minutes, and finally rinse it with deionized water and dry it;

[0052] (2) Preparation of reaction solution

[0053] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.005mol solid lead bromide (PbBr 2 ) and 0.005mol solid tin bromide (SnBr 2 ), add 16mL of N,N-dimethylformamide (DMF) solution, stir until the solid powder is completely dissolved, and obtain a reaction solution, which is subjected to pulsed electromagnetic field treatment with a pulse voltage of 600V, a pulse frequency of 4Hz, and a pulse time of for 100s;

[0054] (3) Spin coating film formation

[0055] Add the pulse-treated reaction solution dropwise on the conductive glass substrate, and perform low-speed spin-coating and high-speed spin-coating with a homogenizer to form a perovskite...

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