Photoelectric detection equipment and photoelectric detection method

Abstract

The present disclosure relates to the field of automatic detection technology, and proposes a photoelectric detection device and a photoelectric detection method. The photoelectric detection device includes a feeding part, a transmission component and a detection component. The feeding part is used to carry the film material to be detected; the transmission component is used to drive the feeding part to move; the detection component is arranged on the moving path of the feeding part, and the detection component includes a transmittance detection part and a surface resistance detection part, which are used to measure the optical transmittance and surface resistance of the film material to be detected. The photoelectric detection device disclosed in the present disclosure can realize automatic measurement of the optical transmittance and surface resistance of the film material to be detected through the feeding part, the transmission component and the transmittance detection part and the surface resistance detection part of the detection component, so as to judge whether the film material to be detected is qualified. Since the whole process belongs to automated measurement, the detection efficiency is improved, and it is suitable for batch rapid detection of production lines.

Description

Technical Field

[0001] The present disclosure relates to the field of automatic detection technology, and in particular to a photoelectric detection device and a photoelectric detection method. Background Art

[0002] Graphene material has excellent electrical, mechanical, optical and thermodynamic properties. It is a new type of material with excellent comprehensive performance and great application prospects. At present, many scientific research institutes and enterprises at home and abroad have achieved pilot-scale production of graphene film materials, but due to unstable equipment or immature processes, the performance uniformity of the obtained materials is relatively poor. The batch and stable preparation of high-quality graphene materials is conducive to the large-scale application of downstream, so the process detection of the batch preparation production line of graphene film materials is particularly important.

[0003] Currently, the detection of graphene film materials in the industry mainly adopts manual single-point detection method, which usually requires special sample preparation. It is an offline detection method with low efficiency and is not suitable for rapid batch detection on production lines. Summary of the invention

[0004] A main purpose of the present disclosure is to overcome at least one defect of the above-mentioned prior art and provide a photoelectric detection device and a photoelectric detection method.

[0005] According to a first aspect of the present invention, there is provided a photoelectric detection device, comprising:

[0006] The loading part is used to carry the film material to be tested;

[0007] A transmission component, which is used to drive the loading part to move;

[0008] The detection component is arranged on the moving path of the feeding part, and the detection component includes a transmittance detection part and a surface resistance detection part, which are used to measure the optical transmittance and surface resistance of the film material to be detected.

[0009] In one embodiment of the present invention, the transmission component includes:

[0010] First transmission unit;

[0011] The second transmission part, the first transmission part and the second transmission part are arranged at an interval and have the same extension direction, and a detection gap is formed between the first transmission part and the second transmission part;

[0012] Among them, at least part of the transmittance detection part and at least part of the surface resistance detection part are arranged opposite to the detection gap, so that after the loading part drives the film material to be detected to move to a position opposite to the detection gap, the transmittance detection part and the surface resistance detection part are used to measure the optical transmittance and surface resistance of the film material to be detected.

[0013] In one embodiment of the present invention, the transmittance detection unit includes a first probe and a second probe, the first probe and the surface resistance detection unit are both located above the detection gap, and at least a portion of the second probe is located within the detection gap or below the detection gap;

[0014] Wherein, the first probe and the second probe are arranged opposite to each other.

[0015] In one embodiment of the present invention, the loading portion is a hollow structure to avoid blocking the first probe and the second probe from measuring the optical transmittance of the film to be tested.

[0016] In one embodiment of the present invention, the transmittance detection part and the surface resistance detection part can be movably arranged to adjust the relative positions between the transmittance detection part and the surface resistance detection part and the film material to be detected on the loading part.

[0017] In one embodiment of the present invention, the photoelectric detection device further comprises:

[0018] The transverse movement mechanism is arranged on the moving path of the feeding part, the detection component is arranged on the transverse movement mechanism, and the transverse movement mechanism drives the detection component to move in a direction perpendicular to the moving direction of the feeding part.

[0019] In one embodiment of the present invention, the light transmittance detection unit includes a first probe and a second probe arranged opposite to each other, and the traverse mechanism includes:

[0020] A first transverse moving part, the first transverse moving part is located above the transmission component, and the first probe and the surface resistance detection part are arranged on the first transverse moving part;

[0021] A second transverse moving part, wherein the first transverse moving part and the second transverse moving part are arranged opposite to each other, and the second transverse moving part is located below the transmission component, and the second probe is arranged on the second transverse moving part;

[0022] The driving part is drivingly connected to the first transverse moving part and the second transverse moving part, so as to drive the first probe, the surface resistance detection part and the second probe to move synchronously through the first transverse moving part and the second transverse moving part.

[0023] In one embodiment of the present invention, the photoelectric detection device further comprises:

[0024] A lifting mechanism, the lifting mechanism is movably arranged on the transverse movement mechanism, and the detection component is arranged on the lifting mechanism, so that the detection component is arranged on the transverse movement mechanism through the lifting mechanism;

[0025] The lifting mechanism is located above the transmission component, and the part of the lifting mechanism driving the detection component is movably arranged in a direction close to or away from the feeding part.

[0026] In one embodiment of the present invention, the photoelectric detection device further comprises:

[0027] A rotary drive mechanism is arranged on the lifting mechanism, and the rotary drive mechanism includes a first mounting end and a second mounting end, and the first mounting end and the second mounting end are respectively facing two directions, and part of the transmittance detection part and the surface resistance detection part are respectively arranged on the first mounting end and the second mounting end, so that the rotary drive mechanism drives the transmittance detection part or the surface resistance detection part toward the film material to be detected.

[0028] In one embodiment of the present invention, part of the transmittance detection unit and the surface resistance detection unit are directly arranged on the lifting mechanism, and are both arranged toward the extension direction of the transmission component, so as to simultaneously obtain the optical transmittance and surface resistance of the film material to be detected.

[0029] According to a second aspect of the present invention, there is provided a photoelectric detection method, comprising:

[0030] Place the loading part carrying the film material to be tested on the transmission component;

[0031] Control the transmission component to drive the loading part to move;

[0032] At least one of the optical transmittance and the surface resistance of the film material to be tested is obtained, and whether the film material to be tested is qualified is determined according to the optical transmittance and / or the surface resistance.

[0033] In one embodiment of the present invention, obtaining at least one of the optical transmittance and the surface resistance of the film material to be tested, and judging whether the film material to be tested is qualified according to the optical transmittance and / or the surface resistance, comprises:

[0034] Obtaining optical transmittance values ​​at multiple positions of the film material to be tested, calculating the average value to obtain an average optical transmittance value, and judging whether the average optical transmittance value is within a preset transmittance range value, when the average optical transmittance value is not within the preset transmittance range value, judging that the film material to be tested is unqualified;

[0035] When the average optical transmittance value is within the preset transmittance range, the film material to be tested is subjected to surface scanning measurement to obtain an optical transmittance data group, and the uniformity of the optical transmittance data group is judged to obtain a transmittance uniformity value. When the transmittance uniformity value is less than a first preset value, the film material to be tested is judged to be unqualified.

[0036] When the transmittance uniformity value is not less than the first preset value, the surface resistance values ​​at multiple positions of the film material to be tested are obtained, the average value is calculated to obtain the average surface resistance value, and it is determined whether the average surface resistance value is within the preset surface resistance range value. When the average surface resistance value is not within the preset surface resistance range value, it is determined that the film material to be tested is unqualified;

[0037] When the average surface resistance value is within the preset surface resistance range, the film material to be tested is subjected to surface scanning measurement to obtain a surface resistance data group, and the surface resistance data group is subjected to uniformity judgment to obtain a surface resistance uniformity value. When the surface resistance uniformity value is less than a second preset value, the film material to be tested is judged to be unqualified. When the surface resistance uniformity value is not less than the second preset value, the film material to be tested is judged to be qualified. Or,

[0038] Obtaining the surface resistance values ​​at multiple positions of the film material to be tested, calculating the average value to obtain the average surface resistance value, and judging whether the average surface resistance value is within the preset surface resistance range value, when the average surface resistance value is not within the preset surface resistance range value, judging that the film material to be tested is unqualified;

[0039] When the average surface resistance value is within the preset surface resistance range, the film material to be tested is subjected to surface scanning measurement to obtain a surface resistance data group, and the surface resistance data group is subjected to uniformity judgment to obtain a surface resistance uniformity value. When the surface resistance uniformity value is less than a second preset value, the film material to be tested is judged to be unqualified.

[0040] When the surface resistance uniformity value is not less than the second preset value, the optical transmittance values ​​at multiple positions of the film material to be tested are obtained, the average value is calculated to obtain the average optical transmittance value, and it is determined whether the average optical transmittance value is within the preset transmittance range value. When the average optical transmittance value is not within the preset transmittance range value, it is determined that the film material to be tested is unqualified;

[0041] When the average optical transmittance value is within the preset transmittance range, a surface scanning measurement is performed on the film material to be tested, an optical transmittance data group is obtained, and a uniformity judgment is performed on the optical transmittance data group to obtain a transmittance uniformity value. When the transmittance uniformity value is less than a first preset value, the film material to be tested is judged to be unqualified. When the transmittance uniformity value is not less than the first preset value, the film material to be tested is judged to be qualified; or,

[0042] Simultaneously obtaining the surface resistance values ​​and optical transmittance values ​​at multiple positions of the film material to be tested, calculating the average values ​​to obtain the average surface resistance value and the average optical transmittance value, and judging whether the average surface resistance value is within the preset surface resistance range value, and whether the average optical transmittance value is within the preset transmittance range value, when the average surface resistance value is not within the preset surface resistance range value or the average optical transmittance value is not within the preset transmittance range value, judging that the film material to be tested is unqualified;

[0043] When the average surface resistance value is within the preset surface resistance range, and the average optical transmittance value is within the preset transmittance range, a surface scanning measurement is performed on the film material to be inspected, a surface resistance data group and an optical transmittance data group are obtained, and a uniformity judgment is performed on the surface resistance data group and the optical transmittance data group to obtain a surface resistance uniformity value and a transmittance uniformity value. When the surface resistance uniformity value is less than a second preset value or the transmittance uniformity value is less than a first preset value, the film material to be inspected is judged to be unqualified; when the surface resistance uniformity value is not less than the second preset value, and the transmittance uniformity value is not less than the first preset value, the film material to be inspected is judged to be qualified.

[0044] The photoelectric detection device of the present invention can automatically measure the optical transmittance and surface resistance of the film material to be detected through the feeding part, the transmission component and the transmittance detection part and the surface resistance detection part of the detection component, so as to judge whether the film material to be detected is qualified. Since the whole process is an automated measurement, the detection efficiency is improved and it is suitable for batch rapid detection of production lines. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Various objects, features and advantages of the present disclosure will become more apparent by considering the following detailed description of preferred embodiments of the present disclosure in conjunction with the accompanying drawings. The accompanying drawings are merely exemplary illustrations of the present disclosure and are not necessarily drawn to scale. In the accompanying drawings, the same reference numerals always refer to the same or similar parts. Among them:

[0046] Figure 1 is a schematic structural diagram of a photoelectric detection device according to an exemplary embodiment;

[0047] Figure 2 is a partial structural schematic diagram of a photoelectric detection device according to an exemplary embodiment;

[0048] Figure 3 is a schematic structural diagram of a photoelectric detection device according to another exemplary embodiment;

[0049] Figure 4 is a partial structural schematic diagram of a photoelectric detection device according to another exemplary embodiment;

[0050] Figure 5 is a schematic flow chart of a photoelectric detection method according to an exemplary embodiment;

[0051] Figure 6 is a schematic flow chart of a photoelectric detection method according to another exemplary embodiment.

[0052] The following are the descriptions of the reference numerals:

[0053] 10. Feeding part; 20. Transmission assembly; 21. First transmission part; 22. Second transmission part; 23. Detection gap; 30. Detection assembly; 40. Transmittance detection part; 41. First probe; 42. Second probe; 50. Surface resistance detection part; 60. Transverse movement mechanism; 61. First transverse movement part; 62. Second transverse movement part; 63. Driving part; 70. Lifting mechanism; 80. Rotation driving mechanism; 81. First mounting end; 82. Second mounting end. DETAILED DESCRIPTION

[0054] Typical embodiments that embody the features and advantages of the present disclosure will be described in detail in the following description. It should be understood that the present disclosure can have various changes in different embodiments without departing from the scope of the present disclosure, and the descriptions and drawings therein are essentially for illustrative purposes rather than for limiting the present disclosure.

[0055] In the following description of different exemplary embodiments of the present disclosure, reference is made to the accompanying drawings, which form a part of the present disclosure and in which different exemplary structures, systems and steps that can implement multiple aspects of the present disclosure are shown by way of example. It should be understood that other specific schemes of components, structures, exemplary devices, systems and steps can be used, and structural and functional modifications can be made without departing from the scope of the present disclosure. Moreover, although the terms "above", "between", "within", etc. may be used in this specification to describe different exemplary features and elements of the present disclosure, these terms are used herein only for convenience, such as according to the direction of the examples in the accompanying drawings. Nothing in this specification should be construed as requiring a specific three-dimensional orientation of the structure to fall within the scope of the present disclosure.

[0056] An embodiment of the present invention provides a photoelectric detection device, please refer to Figures 1 to 4 The photoelectric detection device includes: a loading part 10, which is used to carry the film material to be detected; a transmission component 20, which is used to drive the loading part 10 to move; a detection component 30, which is arranged on the moving path of the loading part 10, and the detection component 30 includes a transmittance detection part 40 and a surface resistance detection part 50, which are used to measure the optical transmittance and surface resistance of the film material to be detected.

[0057] The photoelectric detection device of one embodiment of the present invention can automatically measure the optical transmittance and surface resistance of the film material to be detected through the feeder 10, the transmission component 20 and the transmittance detection part 40 and the surface resistance detection part 50 of the detection component 30, so as to judge whether the film material to be detected is qualified. Since the whole process is an automated measurement, the detection efficiency is improved and it is suitable for batch rapid detection of production lines.

[0058] In one embodiment, the photoelectric detection device can be used to detect graphene film materials, that is, the film material to be detected is a graphene film material. The two indicators of optical transmittance and surface resistance are macroscopic manifestations of the performance of graphene film materials. The number of layers of graphene film materials can be calculated according to the transmittance, and the surface resistance directly reflects the defect density, crystallization quality and other properties of graphene film materials. This embodiment achieves efficient online detection and rapid evaluation of the overall performance of graphene film materials by obtaining the measurement of optical transmittance and surface resistance through one device. The photoelectric detection equipment is also suitable for rapid batch detection of other transparent conductive films.

[0059] In one embodiment, the photoelectric detection device further includes a control unit, which is connected to both the transmittance detection unit 40 and the surface resistance detection unit 50 to obtain data measured by the transmittance detection unit 40 and the surface resistance detection unit 50. The control unit can be used to process and judge the measured data to determine whether the film material to be detected is qualified.

[0060] In one embodiment, the detection assembly 30 further includes a film thickness measurement probe.

[0061] In one embodiment, the transmittance detection unit 40 is a four-probe probe, and the surface resistance detection unit 50 is a surface resistance probe.

[0062] In one embodiment, the photoelectric detection device also includes a cleaning part, which is arranged above the transmission component 20 and is used to clean the film material to be detected on the loading part 10, wherein the cleaning part can be a blowing mechanism or an air suction mechanism to reduce the impact of particle contamination on the detection results.

[0063] like Figure 1 and Figure 3 As shown, the transmission component 20 includes: a first transmission part 21; a second transmission part 22, the first transmission part 21 and the second transmission part 22 are arranged at intervals and have the same extension direction, and a detection gap 23 is formed between the first transmission part 21 and the second transmission part 22; wherein, at least a part of the transmittance detection part 40 and at least a part of the surface resistance detection part 50 are arranged opposite to the detection gap 23, so that after the loading part 10 drives the film material to be detected to move to a position opposite to the detection gap 23, the transmittance detection part 40 and the surface resistance detection part 50 are used to measure the optical transmittance and surface resistance of the film material to be detected.

[0064] In one embodiment, the first transmission part 21 may be provided with a feed port, that is, the loading part 10 carrying the film material to be detected is transported from the first transmission part 21 to the second transmission part 22. When part of the loading part 10 reaches the detection gap 23, that is, part of the film material to be detected is located in the detection gap 23, at this time, the transmittance detection part 40 and the surface resistance detection part 50 are used to measure the optical transmittance and surface resistance of the film material to be detected. The detection gap 23 belongs to the measurement position of the transmittance detection part 40 and the surface resistance detection part 50. Of course, the second transmission part 22 may also be provided with a feed port, that is, the loading part 10 is first placed on the second transmission part 22. This setting method may not be limited, as long as the normal transmission function is guaranteed.

[0065] In one embodiment, the width of the detection gap 23 is less than half the width of the loading part 10; wherein the width of the detection gap 23 is the distance between the first transmission part 21 and the second transmission part 22, and the width of the loading part 10 is the dimension in its moving direction, that is, to ensure that the loading part 10 will not fall out of the detection gap 23.

[0066] In one embodiment, considering that the measurement process of the film material to be tested is a multi-point measurement, the first transmission part 21 and the second transmission part 22 need to cooperate with each other during the measurement process to ensure the moving direction of the loading part 10. The first transmission part 21 and the second transmission part 22 can realize transmission in two directions when used specifically.

[0067] In one embodiment, the first transmission part 21 and the second transmission part 22 can be belt drive, chain drive, roller drive or floating platform, etc., as long as the transmission of the loading part 10 can be guaranteed.

[0068] like Figure 2 and Figure 4 As shown, the transmittance detection unit 40 includes a first probe 41 and a second probe 42. The first probe 41 and the surface resistance detection unit 50 are both located above the detection gap 23, and at least a portion of the second probe 42 is located in the detection gap 23 or below the detection gap 23; wherein the first probe 41 and the second probe 42 are arranged opposite to each other. The first probe 41 and the second probe 42 are used to obtain the optical transmittance of the film material to be detected, that is, one transmits and the other receives, so as to obtain the optical transmittance of the film material to be detected.

[0069] In one embodiment, the feeding part 10 is a hollow structure to avoid blocking the first probe 41 and the second probe 42 from measuring the optical transmittance of the film to be tested. In the specific measurement process, the feeding part 10 cannot affect the measurement of the optical transmittance, so it is necessary to ensure that the feeding part 10 is a hollow structure, but it is necessary to ensure that the film to be tested is effectively fixed.

[0070] In one embodiment, the transmittance detection unit 40 and the surface resistance detection unit 50 are both movably arranged to adjust the relative positions between the transmittance detection unit 40 and the surface resistance detection unit 50 and the film material to be detected on the loading unit 10. Considering that in the specific measurement process, it is necessary to obtain the measurement values ​​at different positions of the film material to be detected, the first transmission unit 21 and the second transmission unit 22 drive the loading unit 10 to move, combined with the movement of the transmittance detection unit 40 and the surface resistance detection unit 50, can effectively improve the measurement efficiency and ensure the reliable acquisition of the measurement voltage.

[0071] like Figure 1 and Figure 3 As shown, the photoelectric detection device further includes: a transverse movement mechanism 60, which is arranged on the moving path of the feeding part 10, and the detection component 30 is arranged on the transverse movement mechanism 60, and the transverse movement mechanism 60 drives the detection component 30 to move in a direction perpendicular to the moving direction of the feeding part 10. The transverse movement mechanism 60 is mainly arranged to ensure that the detection component 30 can move in a direction parallel to the feeding part 10, that is, combined with the transmission direction of the first transmission part 21 and the second transmission part 22 for the feeding part 10, the relative movement of the detection component 30 relative to the feeding part 10 on the entire horizontal plane can be achieved, thereby ensuring that the detection component 30 can measure the entire surface of the film material to be detected.

[0072] like Figure 2 and Figure 4 As shown, the transmittance detection unit 40 includes a first probe 41 and a second probe 42 that are relatively arranged, and the transverse movement mechanism 60 includes: a first transverse movement unit 61, the first transverse movement unit 61 is located above the transmission component 20, and the first probe 41 and the surface resistance detection unit 50 are arranged on the first transverse movement unit 61; a second transverse movement unit 62, the first transverse movement unit 61 and the second transverse movement unit 62 are relatively arranged, and the second transverse movement unit 62 is located below the transmission component 20, and the second probe 42 is arranged on the second transverse movement unit 62; a driving unit 63, the driving unit 63 is drivingly connected to the first transverse movement unit 61 and the second transverse movement unit 62, so as to drive the first probe 41, the surface resistance detection unit 50 and the second probe 42 to move synchronously through the first transverse movement unit 61 and the second transverse movement unit 62.

[0073] In one embodiment, the first probe 41 and the second probe 42 are used to obtain the optical transmittance of the film material to be detected, that is, one transmits and the other receives, so as to obtain the optical transmittance of the film material to be detected. Therefore, when in use, it is necessary to ensure that the two move synchronously, so a driving unit 63 is used to simultaneously drive the first probe 41 and the second probe 42 to move.

[0074] In one embodiment, the transverse movement mechanism 60 can be a linear module (can be a synchronous belt type and a ball screw type), or it can be a motor driving two pulley assemblies at the same time. Its main purpose is to achieve synchronous movement of the first probe 41, the surface resistance detection unit 50 and the second probe 42. The specific settings here are not limited.

[0075] like Figure 2 and Figure 4 As shown, the photoelectric detection device also includes: a lifting mechanism 70, the lifting mechanism 70 is movably arranged on the transverse mechanism 60, and the detection component 30 is arranged on the lifting mechanism 70, so that the detection component 30 is arranged on the transverse mechanism 60 through the lifting mechanism 70; wherein, the lifting mechanism 70 is located above the transmission component 20, and the lifting mechanism 70 drives the part of the detection component 30 to be movably arranged in the direction close to or away from the feeding part 10. The setting of the lifting mechanism 70 can adjust the distance between the detection component 30 and the film material to be detected. For example, when the surface resistance detection part 50 is a contact probe, it needs to contact the film material to be detected during measurement, and the adjustment can be completed by the lifting mechanism 70. The lifting mechanism 70 can be a linear module, a cylinder, an oil cylinder or other mechanisms, as long as it can ensure the up and down movement of the detection component 30.

[0076] like Figure 1 and Figure 2 As shown, the photoelectric detection device also includes: a rotating drive mechanism 80, the rotating drive mechanism 80 is arranged on the lifting mechanism 70, the rotating drive mechanism 80 includes a first mounting end 81 and a second mounting end 82, the first mounting end 81 and the second mounting end 82 are respectively facing two directions, and a part of the transmittance detection part 40 and the surface resistance detection part 50 are respectively arranged on the first mounting end 81 and the second mounting end 82, so that the rotating drive mechanism 80 drives the transmittance detection part 40 or the surface resistance detection part 50 toward the film material to be detected. The setting of the rotating drive mechanism 80 can switch the transmittance detection part 40 and the surface resistance detection part 50 during the specific measurement, that is, the sequential measurement of the optical transmittance and the surface resistance can be completed. The transmittance detection part 40 and the surface resistance detection part 50 can be used to detect the film material to be detected at the same position, and the accuracy of the evaluation is relatively high.

[0077] In one embodiment, the first probe 41 and the surface resistance detection unit 50 are respectively arranged on the first mounting end 81 and the second mounting end 82. During measurement, the first probe 41 or the surface resistance detection unit 50 is directed toward the film material to be detected. After first completing the measurement of the optical transmittance or the surface resistance, the rotating drive mechanism 80 drives the first probe 41 and the surface resistance detection unit 50 to rotate. At this time, the positions of the first probe 41 and the surface resistance detection unit 50 change, and then the measurement of the surface resistance or the optical transmittance is completed.

[0078] In one embodiment, the rotation driving mechanism 80 may be a rotation cylinder, a rotation oil cylinder, or a motor that drives certain mechanisms to rotate the first probe 41 and the surface resistance detection unit 50 .

[0079] like Figure 3 and Figure 4 As shown, part of the transmittance detection unit 40 and the surface resistance detection unit 50 are directly arranged on the lifting mechanism 70, and are both arranged toward the extension direction of the transmission component 20, so as to simultaneously obtain the optical transmittance and surface resistance of the film material to be detected. The transmittance detection unit 40 and the surface resistance detection unit 50 will not be switched in position, that is, the two will measure the optical transmittance and surface resistance of the film material to be detected at the same time, and the detection points obtained by the two will not be the same, but the efficiency is relatively high.

[0080] A specific embodiment of the photoelectric detection device of the present invention is an automatic detection device for the photoelectric properties of graphene film materials, including a feeding unit (feeding unit 10), a detection unit (detection component 30), a substrate transmission unit (transmission component 20), a data processing unit, etc. The detection unit has two measurement functions of optical transmittance and surface resistance. The feeding unit can realize the accurate positioning of circular or rectangular substrates of different sizes (film materials to be detected); the substrate transmission unit can ensure accurate transmission through special transmission methods and combinations, and improve the speed of transmission and detection. The detection unit includes a transmittance detection unit 40 and a surface resistance detection unit 50. The substrate transmission unit realizes the forward and backward movement of the substrate through a conveyor belt or an air flotation table, and cooperates with the left and right movement of the measuring probe (transmittance detection unit 40 or surface resistance detection unit 50) to realize the surface scanning function of the measurement. Because the transmittance measurement requires the transmitting and receiving probes facing each other up and down, the movement of the upper and lower two probes (the first probe 41 and the second probe 42) in the present invention adopts the method of a two-axis synchronous linear module (transverse movement mechanism 60). The integration of measuring probes is not limited to optical transmittance and surface resistance probes, and can be expanded as needed, such as adding a film thickness measuring probe. The movement of the measuring probe is driven by a motor and a synchronous belt to simultaneously drive the movement of the two probes above and below the substrate. The graphene film materials tested include graphene glass directly grown by chemical vapor deposition, graphene wafers, or graphene film materials transferred to a substrate.

[0081] Among them, the substrate transmission unit is divided into two parts (the first transmission part 21 and the second transmission part 22), which mainly completes the transmission of the substrate in the horizontal direction. The two parts of the transmission unit are pre-designed with a horizontal spacing, which is mainly to reserve space for the vertical movement of the detection unit (detection gap 23). The function of measuring the entire surface of the substrate is completed through the cooperation of the transmission unit and the detection unit. Among them, the detection unit and the transmission unit are added with an upper cover to form a closed space, and a side exhaust function component is added in the vertical direction of the substrate transmission, in order to reduce the influence of particles on the surface of the substrate on the detection results. The data processing unit can organize the data collected by the probe, and can output and display it, and judge whether the detection object (film material to be detected) is qualified or unqualified according to the set detection result judgment conditions.

[0082] The photoelectric detection device of the present invention can realize the rapid and automatic acquisition of the two indicators of optical transmittance and surface resistance. And based on the correspondence between the two indicators of optical transmittance and surface resistance and the performance of graphene film materials, the performance and quality of graphene film materials can be quickly judged. The photoelectric detection device of the present invention is a large-scale production line for graphene film materials, and can perform macroscopic rapid evaluation of graphene film materials through surface resistance and optical transmittance, which can improve the detection efficiency on the production line, improve the quality of graphene film materials indirectly, and ensure the large-scale application of high-quality graphene film materials.

[0083] An embodiment of the present invention also provides a photoelectric detection method, please refer to Figure 5 , including: placing a loading part 10 carrying a film material to be inspected on a transmission component 20; controlling the transmission component 20 to drive the loading part 10 to move; obtaining at least one of the optical transmittance and the surface resistance of the film material to be inspected, and judging whether the film material to be inspected is qualified according to the optical transmittance and / or the surface resistance.

[0084] In one embodiment, the photoelectric detection method is applied to a photoelectric detection device on.

[0085] In one embodiment, obtaining at least one of the optical transmittance and the surface resistance of the film material to be tested, and judging whether the film material to be tested is qualified according to the optical transmittance and / or the surface resistance, comprises:

[0086] Obtaining optical transmittance values ​​at multiple positions of the film material to be tested, calculating the average value to obtain an average optical transmittance value, and judging whether the average optical transmittance value is within a preset transmittance range value, when the average optical transmittance value is not within the preset transmittance range value, judging that the film material to be tested is unqualified;

[0087] When the average optical transmittance value is within the preset transmittance range, the film material to be tested is subjected to surface scanning measurement to obtain an optical transmittance data group, and the uniformity of the optical transmittance data group is judged to obtain a transmittance uniformity value. When the transmittance uniformity value is less than a first preset value, the film material to be tested is judged to be unqualified.

[0088] When the transmittance uniformity value is not less than the first preset value, the surface resistance values ​​at multiple positions of the film material to be tested are obtained, the average value is calculated to obtain the average surface resistance value, and it is determined whether the average surface resistance value is within the preset surface resistance range value. When the average surface resistance value is not within the preset surface resistance range value, it is determined that the film material to be tested is unqualified;

[0089] When the average surface resistance value is within the preset surface resistance range, the film material to be tested is subjected to surface scanning measurement to obtain a surface resistance data group, and the surface resistance data group is subjected to uniformity judgment to obtain a surface resistance uniformity value. When the surface resistance uniformity value is less than a second preset value, the film material to be tested is judged to be unqualified. When the surface resistance uniformity value is not less than the second preset value, the film material to be tested is judged to be qualified. Or,

[0090] Obtaining the surface resistance values ​​at multiple positions of the film material to be tested, calculating the average value to obtain the average surface resistance value, and judging whether the average surface resistance value is within the preset surface resistance range value, when the average surface resistance value is not within the preset surface resistance range value, judging that the film material to be tested is unqualified;

[0091] When the average surface resistance value is within the preset surface resistance range, the film material to be tested is subjected to surface scanning measurement to obtain a surface resistance data group, and the surface resistance data group is subjected to uniformity judgment to obtain a surface resistance uniformity value. When the surface resistance uniformity value is less than a second preset value, the film material to be tested is judged to be unqualified.

[0092] When the surface resistance uniformity value is not less than the second preset value, the optical transmittance values ​​at multiple positions of the film material to be tested are obtained, the average value is calculated to obtain the average optical transmittance value, and it is determined whether the average optical transmittance value is within the preset transmittance range value. When the average optical transmittance value is not within the preset transmittance range value, it is determined that the film material to be tested is unqualified;

[0093] When the average optical transmittance value is within the preset transmittance range, a surface scanning measurement is performed on the film material to be tested, an optical transmittance data group is obtained, and a uniformity judgment is performed on the optical transmittance data group to obtain a transmittance uniformity value. When the transmittance uniformity value is less than a first preset value, the film material to be tested is judged to be unqualified. When the transmittance uniformity value is not less than the first preset value, the film material to be tested is judged to be qualified; or,

[0094] Simultaneously obtaining the surface resistance values ​​and optical transmittance values ​​at multiple positions of the film material to be tested, calculating the average values ​​to obtain the average surface resistance value and the average optical transmittance value, and judging whether the average surface resistance value is within the preset surface resistance range value, and whether the average optical transmittance value is within the preset transmittance range value, when the average surface resistance value is not within the preset surface resistance range value or the average optical transmittance value is not within the preset transmittance range value, judging that the film material to be tested is unqualified;

[0095] When the average surface resistance value is within the preset surface resistance range, and the average optical transmittance value is within the preset transmittance range, a surface scanning measurement is performed on the film material to be inspected, a surface resistance data group and an optical transmittance data group are obtained, and a uniformity judgment is performed on the surface resistance data group and the optical transmittance data group to obtain a surface resistance uniformity value and a transmittance uniformity value. When the surface resistance uniformity value is less than a second preset value or the transmittance uniformity value is less than a first preset value, the film material to be inspected is judged to be unqualified; when the surface resistance uniformity value is not less than the second preset value, and the transmittance uniformity value is not less than the first preset value, the film material to be inspected is judged to be qualified.

[0096] In one embodiment, the process of judging whether the film material to be tested is qualified first selects multi-point measurement (it can be multiple points in a straight line, and of course multiple random points are not excluded) of optical transmittance or surface resistance, and compares the obtained structure with the preset qualified range. If it is not within the qualified range, it is directly judged as unqualified. If it is qualified, a surface scanning measurement is performed, that is, multiple measurement points in the entire surface are obtained, and then the uniformity is used to determine whether it is qualified. For the process of measuring optical transmittance or surface resistance in sequence, the two can be interchangeable, and ultimately both indicators need to meet the adjustment at the same time to be qualified. For the simultaneous measurement of optical transmittance and surface resistance, the two indicators also need to meet the adjustment at the same time to be qualified.

[0097] In one embodiment, the uniformity value of the sheet resistance and the uniformity value of the transmittance can be obtained based on the sheet resistance data set and the optical transmittance data set, uniformity value = (maximum value - minimum value) / (maximum value + minimum value), uniformity value = (maximum value - minimum value) / average value, or uniformity value = (maximum value - minimum value) / 2 average value. The above are all formulas for determining the uniformity value when judging uniformity, and the numerical values ​​of the first preset value and the second preset value can be determined according to the evaluation index of the film material to be tested.

[0098] For a specific process of the photoelectric detection method, the detection starts when the photoelectric detection equipment starts working. First, the film material to be detected is placed on the loading part 10. This process can be an automated operation of a manipulator. The loading part 10 is transported in parallel by the first transmission part 21. When the film material to be detected enters the detection area, the rotary drive mechanism 80 switches the detection probe to the surface resistance probe (surface resistance detection part 50). The transverse movement mechanism 60 drives the probe to move vertically in the substrate transmission direction at a set interval. When it reaches the designated point, the lifting mechanism 70 drives the probe to press down to obtain the required data. First, the surface resistance data is judged whether it is within the set value range. If so, the surface scanning of the surface resistance value of the film material to be detected is completed by the above-mentioned horizontal transmission and vertical movement. At this time, the data processing unit will determine the uniformity of the surface resistance value, and it will be judged as qualified if the uniformity is within the set range. When the above detection steps are qualified, the film material to be detected is driven by the second transmission part 22 to be transmitted in the opposite direction of the horizontal direction, and at the same time, the rotation drive mechanism 80 is switched to the transmittance test probe (transmittance detection part 40), and the transmittance data is first judged whether it is within the set value range. If it is, the surface scanning measurement of the transmittance is completed, and the data processing unit will judge the uniformity of the transmittance. If the uniformity is within the set range, the sample is judged to be qualified, and all the tests of the film material to be tested are completed. Among them, if it is judged that a certain data does not meet the set value range during the whole process, the sample unqualified detection ends, and the specific process is as follows Figure 6 shown.

[0099] For another specific process of the photoelectric detection method, the detection starts when the photoelectric detection device starts working. First, the film to be detected is placed on the loading part 10. This process can be automated by a robot. The loading part 10 is transported in parallel by the first transmission part 21. When the film to be detected enters the detection area, the surface resistance probe and the transmittance probe are simultaneously driven down by the lifting mechanism 70 to obtain the optical transmittance and surface resistance data. Since the transmittance probe and the surface resistance probe are not switched, the detection efficiency is further improved.

[0100] Those skilled in the art will readily appreciate other embodiments of the present invention after considering the specification and practicing the invention disclosed herein. The present invention is intended to cover any variations, uses, or adaptations of the present invention that follow the general principles of the present invention and include common knowledge or customary techniques in the art that are not disclosed by the present invention. The specification and example embodiments are to be considered exemplary only, and the true scope and spirit of the present invention are indicated by the following claims.

[0101] It should be understood that the present invention is not limited to the exact construction that has been described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the present invention is limited only by the appended claims.

Claims

1. A photoelectric detection device, characterized in that: include: A loading portion (10), the loading portion (10) being used to carry a film material to be detected; wherein the film material to be detected is a graphene film material; A transmission component (20), the transmission component (20) being used to drive the loading portion (10) to move; A detection component (30), the detection component (30) being arranged on a moving path of the feeding portion (10), the detection component (30) comprising a transmittance detection portion (40) and a surface resistance detection portion (50), for measuring the optical transmittance and surface resistance of the film material to be detected; The transmission component (20) comprises: A first transmission unit (21); a second transmission part (22), wherein the first transmission part (21) and the second transmission part (22) are arranged at an interval and have the same extension direction, and a detection gap (23) is formed between the first transmission part (21) and the second transmission part (22); Wherein, at least a portion of the transmittance detection portion (40) and at least a portion of the surface resistance detection portion (50) are both arranged opposite to the detection gap (23), so that after the loading portion (10) drives the film material to be detected to move to a position opposite to the detection gap (23), the transmittance detection portion (40) and the surface resistance detection portion (50) are used to simultaneously measure the optical transmittance and surface resistance of the film material to be detected; The transmittance detection part (40) and the surface resistance detection part (50) are both movably arranged to adjust the relative positions between the transmittance detection part (40) and the surface resistance detection part (50) and the film material to be detected on the loading part (10); A transverse movement mechanism (60), wherein the transverse movement mechanism (60) is arranged on a moving path of the feeding portion (10), the detection component (30) is arranged on the transverse movement mechanism (60), and the transverse movement mechanism (60) drives the detection component (30) to move in a direction perpendicular to the moving direction of the feeding portion (10).

2. The photoelectric detection device according to claim 1, characterized in that: The light transmittance detection unit (40) comprises a first probe (41) and a second probe (42), the first probe (41) and the surface resistance detection unit (50) are both located above the detection gap (23), and at least a portion of the second probe (42) is located within the detection gap (23) or below the detection gap (23); The first probe (41) and the second probe (42) are arranged opposite to each other.

3. The photoelectric detection device according to claim 2, characterized in that: The material loading portion (10) is a hollow structure to avoid blocking the first probe (41) and the second probe (42) from measuring the optical transmittance of the film material to be tested.

4. The photoelectric detection device according to claim 1, characterized in that: The light transmittance detection unit (40) comprises a first probe (41) and a second probe (42) which are arranged opposite to each other, and the transverse movement mechanism (60) comprises: A first transverse moving part (61), the first transverse moving part (61) being located above the transmission component (20), the first probe (41) and the surface resistance detection part (50) being arranged on the first transverse moving part (61); a second transverse moving portion (62), wherein the first transverse moving portion (61) and the second transverse moving portion (62) are arranged opposite to each other, and the second transverse moving portion (62) is located below the transmission component (20), and the second probe (42) is arranged on the second transverse moving portion (62); A driving unit (63), wherein the driving unit (63) is drivingly connected to the first transverse moving unit (61) and the second transverse moving unit (62), so as to drive the first probe (41), the surface resistance detection unit (50) and the second probe (42) to move synchronously via the first transverse moving unit (61) and the second transverse moving unit (62).

5. The photoelectric detection device according to claim 1, characterized in that: The photoelectric detection device also includes: a lifting mechanism (70), the lifting mechanism (70) being movably arranged on the transverse movement mechanism (60), and the detection component (30) being arranged on the lifting mechanism (70), so that the detection component (30) is arranged on the transverse movement mechanism (60) through the lifting mechanism (70); The lifting mechanism (70) is located above the transmission component (20), and the lifting mechanism (70) drives a portion of the detection component (30) to be movably arranged in a direction approaching or moving away from the loading portion (10).

6. The photoelectric detection device according to claim 5, characterized in that: The photoelectric detection device also includes: A rotational drive mechanism (80), wherein the rotational drive mechanism (80) is arranged on the lifting mechanism (70), and the rotational drive mechanism (80) comprises a first mounting end (81) and a second mounting end (82), wherein the first mounting end (81) and the second mounting end (82) face two directions respectively, and a portion of the transmittance detection portion (40) and the surface resistance detection portion (50) are respectively arranged on the first mounting end (81) and the second mounting end (82), so that the rotational drive mechanism (80) drives the transmittance detection portion (40) or the surface resistance detection portion (50) toward the film material to be detected.

7. The photoelectric detection device according to claim 5, characterized in that: Part of the light transmittance detection unit (40) and the surface resistance detection unit (50) are directly arranged on the lifting mechanism (70), and are both arranged towards the extension direction of the transmission component (20).

8. A photoelectric detection method, using the photoelectric detection device according to any one of claims 1 to 7, characterized in that: include: Placing a loading portion (10) carrying a film material to be inspected onto a transmission component (20); Controlling the transmission component (20) to drive the loading portion (10) to move; At least one of the optical transmittance and the surface resistance of the film material to be detected is obtained, and whether the film material to be detected is qualified is determined according to the optical transmittance and / or the surface resistance.

9. The photoelectric detection method according to claim 8, characterized in that: Obtaining at least one of the optical transmittance and the surface resistance of the film material to be detected, and judging whether the film material to be detected is qualified according to the optical transmittance and / or the surface resistance, comprising: Obtaining optical transmittance values ​​at multiple positions of the film material to be tested, calculating the average value to obtain an average optical transmittance value, and judging whether the average optical transmittance value is within a preset transmittance range value, when the average optical transmittance value is not within the preset transmittance range value, judging that the film material to be tested is unqualified; When the average optical transmittance value is within the preset transmittance range, the film material to be tested is subjected to surface scanning measurement to obtain an optical transmittance data group, and the optical transmittance data group is subjected to uniformity judgment to obtain a transmittance uniformity value. When the transmittance uniformity value is less than a first preset value, the film material to be tested is judged to be unqualified. When the transmittance uniformity value is not less than the first preset value, the surface resistance values ​​at multiple positions of the film material to be tested are obtained, the average value is calculated to obtain the average surface resistance value, and it is determined whether the average surface resistance value is within the preset surface resistance range value. When the average surface resistance value is not within the preset surface resistance range value, it is determined that the film material to be tested is unqualified; When the average surface resistance value is within the preset surface resistance range, the film material to be detected is subjected to surface scanning measurement to obtain a surface resistance data group, and the surface resistance data group is subjected to uniformity judgment to obtain a surface resistance uniformity value. When the surface resistance uniformity value is less than a second preset value, the film material to be detected is judged to be unqualified. When the surface resistance uniformity value is not less than the second preset value, the film material to be detected is judged to be qualified. Or, Obtaining the surface resistance values ​​at multiple positions of the film material to be detected, calculating the average value to obtain the average surface resistance value, and judging whether the average surface resistance value is within the preset surface resistance range value, when the average surface resistance value is not within the preset surface resistance range value, judging that the film material to be detected is unqualified; When the average surface resistance value is within the preset surface resistance range, the film material to be detected is subjected to surface scanning measurement to obtain a surface resistance data group, and the surface resistance data group is subjected to uniformity judgment to obtain a surface resistance uniformity value, and when the surface resistance uniformity value is less than a second preset value, the film material to be detected is judged to be unqualified; When the surface resistance uniformity value is not less than the second preset value, the optical transmittance values ​​at multiple positions of the film material to be tested are obtained, the average value is calculated to obtain the average optical transmittance value, and it is determined whether the average optical transmittance value is within the preset transmittance range value. When the average optical transmittance value is not within the preset transmittance range value, it is determined that the film material to be tested is unqualified; When the average optical transmittance value is within the preset transmittance range, the film material to be tested is subjected to surface scanning measurement to obtain an optical transmittance data group, and the optical transmittance data group is subjected to uniformity judgment to obtain a transmittance uniformity value; when the transmittance uniformity value is less than a first preset value, the film material to be tested is judged to be unqualified; when the transmittance uniformity value is not less than the first preset value, the film material to be tested is judged to be qualified; or, Obtaining the surface resistance values ​​and optical transmittance values ​​at multiple positions of the film material to be tested, calculating the average values ​​to obtain the average surface resistance value and the average optical transmittance value, and judging whether the average surface resistance value is within a preset surface resistance range value, and whether the average optical transmittance value is within a preset transmittance range value, when the average surface resistance value is not within the preset surface resistance range value or the average optical transmittance value is not within the preset transmittance range value, judging that the film material to be tested is unqualified; When the average surface resistance value is within the preset surface resistance range, and the average optical transmittance value is within the preset transmittance range, a surface scanning measurement is performed on the film material to be tested, a surface resistance data group and an optical transmittance data group are obtained, and a uniformity judgment is performed on the surface resistance data group and the optical transmittance data group to obtain a surface resistance uniformity value and a transmittance uniformity value. When the surface resistance uniformity value is less than a second preset value or the transmittance uniformity value is less than a first preset value, the film material to be tested is judged to be unqualified. When the surface resistance uniformity value is not less than the second preset value, and the transmittance uniformity value is not less than the first preset value, the film material to be tested is judged to be qualified.

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