Display device

Abstract

A display device is provided. The display device includes: a light-emitting element; and a sealing member that is located on the light-emitting element and seals the light-emitting element, wherein the sealing member includes a first inorganic layer located on the light-emitting element, an organic layer located on the first inorganic layer, and a second inorganic layer located on the organic layer.

Description

[0001] This application claims the priority and benefit of Korean Patent Application Nos. 10-2019-0024168, filed on Feb. 28, 2019, and 10-2019-0103375, filed on Aug. 23, 2019, the entire contents of which are incorporated herein by reference. Technical Field

[0002] The present disclosure relates to a display device. Background Art

[0003] A display device is a device for displaying an image. Various display devices are being developed for use in multimedia devices such as televisions, mobile phones, tablet computers, navigation devices, and game devices. In addition, in recent years, development of a self-emitting display device having improved light utilization efficiency and improved color balance has been underway.

[0004] The self-emitting display device includes a light-emitting element including an anode, a light-emitting layer, and a cathode. The light-emitting layer is very vulnerable to moisture or oxygen. Thus, when moisture or oxygen penetrates the light-emitting layer from the outside, there is a problem in that various defects such as dark spots and pixel shrinkage may occur due to deterioration of the light-emitting layer, and a sealing member for protecting the light-emitting element is used to remedy such a problem. Summary of the Invention

[0005] Aspects of embodiments of the present disclosure are directed to a display device having improved efficiency.

[0006] In addition, the present disclosure provides a display device that blocks foreign substances such as oxygen and moisture from flowing into the display device from the outside and has improved reliability.

[0007] According to some embodiments of the inventive concept, there is provided a display device including a light-emitting element and a sealing member disposed on the light-emitting element to seal the light-emitting element, wherein the sealing member includes: a first inorganic layer disposed on the light-emitting element and having a refractive index of 1.58 to 1.64; an organic layer disposed on the first inorganic layer; and a second inorganic layer disposed on the organic layer and having a refractive index of 1.58 to 2.00.

[0008] In some embodiments, the first inorganic layer has a thickness of 0.5 μm to 1.5 μm.

[0009] In some embodiments, the first inorganic layer includes at least one of silicon oxynitride, silicon nitride, and silicon oxide.

[0010] In some embodiments, the second inorganic layer has a thickness of 0.5 μm to 1.5 μm.

[0011] In some embodiments, the second inorganic layer includes two or more sub-inorganic layers having different refractive indices from each other.

[0012] In some embodiments, the second inorganic layer includes a first sub-inorganic layer having a refractive index of 1.58 to 1.64 and a second sub-inorganic layer having a refractive index of 1.80 to 2.00.

[0013] In some embodiments, the ratio of the thickness of the first sub-inorganic layer to the thickness of the second sub-inorganic layer is 3:1 to 5:1.

[0014] In some embodiments, the thickness of the first sub-inorganic layer is 0.5 μm to 0.6 μm.

[0015] In some embodiments, the thickness of the second sub-inorganic layer is 0.1 μm to 0.2 μm.

[0016] In some embodiments, the first sub-inorganic layer includes silicon oxynitride or silicon oxide.

[0017] In some embodiments, the second sub-inorganic layer includes at least one of silicon nitride, aluminum oxide, and titanium oxide.

[0018] In some embodiments, the second sub-inorganic layer is located on top of the sealing member.

[0019] In some embodiments, the second inorganic layer includes silicon nitride that does not contain an Si-O bond and has a thickness of 0.15 μm to 0.25 μm.

[0020] In some embodiments, the hydrogen content of the second inorganic layer is less than or equal to 2.8×10 22 atoms / cm 3 .

[0021] In some embodiments, for the entire second inorganic layer, the molar ratio of nitrogen to silicon is 1 to 1.3.

[0022] In some embodiments, the second inorganic layer has a density of 2.3 g / cm 3 to 2.6 g / cm 3 .

[0023] In some embodiments, the light-emitting element includes: a first electrode; a second electrode located on the first electrode; and an intermediate layer located between the first electrode and the second electrode and including a light-emitting layer having at least one of an organic light-emitting material and a quantum dot light-emitting material.

[0024] In some embodiments, the display device further includes a cover layer located between the light-emitting element and the sealing member.

[0025] In some embodiments, the display device further includes a cover layer located between the cover glass and the sealing member and having a refractive index of 1.3 to 1.4.

[0026] In some embodiments, the display device further includes a color control layer located on the sealing member and including quantum dots.

[0027] According to some embodiments of the inventive concept, there is provided a display device including: a light-emitting element; a first inorganic layer located on the light-emitting element and having a first thickness; an organic layer located on the first inorganic layer; and a second inorganic layer located on the organic layer, wherein the second inorganic layer includes a first sub-inorganic layer having a second thickness smaller than the first thickness and a second sub-inorganic layer located on the first sub-inorganic layer and having a third thickness smaller than the second thickness.

[0028] In some embodiments, the ratio of the second thickness to the third thickness is 3:1 to 5:1.

[0029] In some embodiments, the first inorganic layer has a first refractive index, the first sub-inorganic layer has a second refractive index, and the second sub-inorganic layer has a third refractive index greater than the first refractive index and the second refractive index.

[0030] In some embodiments, the first refractive index is 1.58 to 1.64.

[0031] In some embodiments, the second refractive index is 1.58 to 1.64, and the third refractive index is 1.80 to 2.00.

[0032] According to some embodiments of the inventive concept, there is provided a display device including a light-emitting element and a sealing member located on the light-emitting element and sealing the light-emitting element, wherein the sealing member includes: a first inorganic layer; an organic layer located on the first inorganic layer; and a second inorganic layer located on the organic layer, and wherein the second inorganic layer includes silicon nitride not containing an Si-O bond, has a thickness of 0.15 μm to 0.25 μm, has a molar ratio of nitrogen to silicon of 1 to 1.3 for the entire second inorganic layer, and has a hydrogen content of less than or equal to 2.8×10 22 atoms / cm 3 ².

[0033] In some embodiments, the second inorganic layer has a density of 2.3 g / cm 3 ³ to 2.6 g / cm 3 ³.

[0034] In some embodiments, the refractive index of the first inorganic layer is 1.58 to 1.64, and the refractive index of the second inorganic layer is 1.58 to 2.00. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The accompanying drawings are included to provide a further understanding of the inventive concept and are incorporated into and constitute a part of this specification. The accompanying drawings illustrate exemplary embodiments of the inventive concept and, together with the description, are used to describe the principles of the inventive concept. In the drawings:

[0036] Figure 1A is an assembled perspective view of a display device according to an exemplary embodiment of the inventive concept;

[0037] Figure 1B is an exploded perspective view of a display device according to an exemplary embodiment of the inventive concept;

[0038] Figure 2 is a circuit diagram of one of the pixels included in a display device according to an exemplary embodiment of the inventive concept;

[0039] Figure 3 is along Figure 1B a cross-sectional view taken along line I-I' shown in;

[0040] Figure 4A is a cross-sectional view of a display device according to an exemplary embodiment of the inventive concept;

[0041] Figure 4B is a graph showing the efficiency of a display device according to an exemplary embodiment of the inventive concept and a display device of a comparative example (both including a blue light-emitting layer);

[0042] Figure 4C is a graph showing the efficiency of a display device according to an exemplary embodiment of the inventive concept and a display device of a comparative example (both including a white light-emitting layer);

[0043] Figure 5A is a cross-sectional view of a display device according to an exemplary embodiment of the inventive concept;

[0044] Figure 5B is a graph showing the efficiency of a display device according to an exemplary embodiment of the inventive concept and a display device of a comparative example;

[0045] Figures 6A to 6C is a cross-sectional view of a display device according to an exemplary embodiment of the inventive concept; and

[0046] Figures 7A to 7B is a cross-sectional view of a display device according to an exemplary embodiment of the inventive concept. Detailed Description

[0047] Throughout this specification, like reference numerals denote like elements. In the drawings, the thickness, ratios, and dimensions of elements may be exaggerated for effective description of the technical content.

[0048] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will also be understood that terms, such as those defined in commonly used dictionaries, should be understood as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0049] Hereinafter, the present invention will be explained in detail with reference to the accompanying drawings.

[0050] Figure 1A is an assembled perspective view of a display device DD according to an exemplary embodiment of the inventive concept. Figure 1B is an exploded perspective view of a display device DD according to an exemplary embodiment of the inventive concept. Figure 2 is a circuit diagram of one of the pixels included in a display device DD according to an exemplary embodiment of the inventive concept.

[0051] Referring to Figure 1A and Figure 1B , a display device DD according to an embodiment of the inventive concept includes a substrate member BS, a display layer DL disposed on the substrate member BS, and a sealing member EN disposed on the display layer DL.

[0052] The display device DD is shown in an embodiment as including a planar display surface, but is not limited thereto. The display device DD may also include a curved display surface or a three-dimensional display surface. The three-dimensional display surface includes a plurality of display regions indicating (e.g., showing) different spatial directions and may also include, for example, a polygonal columnar display surface.

[0053] The display device DD according to an embodiment may be a rigid display device or a flexible display device. When the display device DD is a flexible display device, the display device DD may be a foldable display device.

[0054] The display device DD includes a display area DA and a non-display area NDA. The display area DA displays an image. When viewed in the thickness direction of the display device DD, the display area DA may have a substantially rectangular shape, but is not limited thereto.

[0055] The display area DA includes a plurality of pixel regions PX-B, PX-G, and PX-R. The pixel regions PX-B, PX-G, and PX-R may be arranged in a matrix form. The pixel regions PX-B, PX-G, and PX-R may be defined by a pixel defining film PDL (see Figure 3 ). The pixel regions PX-B, PX-G, and PX-R may have pixels PX disposed therein (see Figure 2 ). Each pixel includes a light-emitting element ED (see Figure 2)。In an embodiment of the inventive concept, the pixel may be a light-emitting pixel or a transmissive pixel.

[0056] The display device DD may include a first pixel region, a second pixel region, and a third pixel region that emit light beams having different wavelengths from each other. In Figure 1B the embodiment shown, the first pixel region may be a blue pixel region PX-B, the second pixel region may be a green pixel region PX-G, and the third pixel region may be a red pixel region PX-R. That is, in the embodiment, the display device DD may include a blue pixel region PX-B, a green pixel region PX-G, and a red pixel region PX-R. The blue pixel region PX-B is a blue light-emitting region that emits blue light, and the green pixel region PX-G and the red pixel region PX-R represent a green light-emitting region and a red light-emitting region, respectively.

[0057] The non-display area NDA does not display an image (e.g., is not capable of displaying an image). When viewed in the thickness direction DR3 of the display device DD, the non-display area NDA may surround the display area DA, for example. The non-display area NDA may be adjacent to the display area DA in the first direction DR1 and the second direction DR2.

[0058] Referring to Figure 2 , each pixel PX may be connected to a line portion composed of a gate line GL, a data line DAL, and a driving voltage line DVL. Each pixel PX includes a thin film transistor TFT1 and TFT2 connected to the line portion, a light-emitting element ED, and a capacitor Cst connected to the thin film transistors TFT1 and TFT2.

[0059] The gate line GL extends in the first direction DR1. The data line DAL extends in a second direction DR2 that intersects the gate line GL. The driving voltage line DVL extends in substantially the same direction as the data line DAL (i.e., in the second direction DR2). The gate line GL transmits a scan signal to the thin film transistors TFT1 and TFT2, the data line DAL transmits a data signal to the thin film transistors TFT1 and TFT2, and the driving voltage line DVL provides a driving voltage to the thin film transistors TFT1 and TFT2.

[0060] The thin film transistors TFT1 and TFT2 may include a driving thin film transistor TFT2 for controlling the light-emitting element ED and a switching thin film transistor TFT1 for switching the driving thin film transistor TFT2. In an embodiment of the inventive concept, each pixel PX is described as including two thin film transistors TFT1 and TFT2, but is not limited thereto. Each pixel PX may include a single thin film transistor and a single capacitor, or may also include three or more thin film transistors and two or more capacitors.

[0061] The switching thin-film transistor TFT1 includes a first gate electrode, a first source electrode, and a first drain electrode. The first gate electrode is connected to the gate line GL, and the first source electrode is connected to the data line DAL. The first drain electrode is connected to the first common electrode through a contact hole (or contact opening). The switching thin-film transistor TFT1 transmits the data signal applied to the data line DAL to the driving thin-film transistor TFT2 in response to the scanning signal applied to the gate line GL.

[0062] The light-emitting element ED includes a first electrode connected to the driving thin-film transistor TFT2 and a second electrode receiving a second power supply voltage. The light-emitting element ED may include a light-emitting pattern disposed between the first electrode and the second electrode.

[0063] The light-emitting element ED emits light during the on-period of the driving thin-film transistor TFT2. The color of the light generated in the light-emitting element ED is determined by the material forming the light-emitting pattern. For example, the color of the light generated in the light-emitting element ED may be any one of red, green, blue, and white.

[0064] Referring again to Figure 1A and Figure 1B , the sealing member EN is disposed on the substrate member BS and the display layer DL. The sealing member EN covers the display layer DL. The sealing member EN protects the display layer DL from external oxygen, moisture, and contaminants. A detailed description of the sealing member EN will be provided below.

[0065] Figure 3 is a cross-sectional view taken along the line I-I' shown in Figure 1B .

[0066] Referring to Figure 3 , the display device DD includes a substrate member BS, a display layer DL, a cover layer CAL, a cover layer COL, and a sealing member EN. The substrate member BS may include a substrate layer SUB, a buffer layer BFL, thin-film transistors TFT, etc.

[0067] The substrate layer SUB is not particularly limited as long as the substrate layer SUB is formed of a commonly used material, and the substrate layer SUB may be formed of an insulating material such as glass, plastic, and quartz. Examples of the organic polymer constituting the substrate layer SUB may include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyimide, and polyethersulfone. The material forming the substrate layer SUB may be selected in consideration of mechanical strength, thermal stability, transparency, surface smoothness, ease of processing, waterproofness, etc.

[0068] A functional layer may be disposed on the substrate layer SUB. In Figure 3Exemplarily, the buffer layer BFL is shown as being set as a functional layer, but the functional layer may also include a barrier layer. The buffer layer BFL can be used to improve the bonding force between the substrate member BS and the display layer DL, and the barrier layer can be used to prevent or substantially prevent foreign substances from flowing into the display layer DL.

[0069] The thin film transistor TFT can be disposed on the buffer layer BFL. The thin film transistor TFT can include a driving thin film transistor for controlling the light emitting element ED and a switching thin film transistor for switching the driving thin film transistor.

[0070] The thin film transistor TFT can include a semiconductor layer SM, a gate electrode GE, a source electrode SE, and a drain electrode DE. The semiconductor layer SM is formed of a semiconductor material and operates as an active layer of the thin film transistor TFT. The semiconductor layer SM can be formed of an inorganic semiconductor or an organic semiconductor.

[0071] The gate insulating layer GI is disposed on the semiconductor layer SM. The gate insulating layer GI covers the semiconductor layer SM. The gate insulating layer GI can include at least one of an organic insulating material and an inorganic insulating material.

[0072] The gate electrode GE is disposed on the gate insulating layer GI. The gate electrode GE can be formed to cover a region corresponding to the channel region of the semiconductor layer SM.

[0073] The source electrode SE and the drain electrode DE are disposed on the interlayer insulating layer IL. The drain electrode DE can be in contact with the drain region of the semiconductor layer SM through a contact hole (or contact opening) formed in the gate insulating layer GI and the interlayer insulating layer IL, and the source electrode SE can be in contact with the source region of the semiconductor layer SM through a contact hole (or contact opening) formed in the gate insulating layer GI and the interlayer insulating layer IL.

[0074] The passivation layer PL is disposed on the source electrode SE, the drain electrode DE, and the interlayer insulating layer IL. The passivation layer PL can be used as a protective film for protecting the thin film transistor TFT and can also be used as a planarization film for planarizing its top surface.

[0075] The display layer DL can include a light emitting element ED and a pixel defining film PDL.

[0076] The light emitting element ED is disposed on the passivation layer PL. The light emitting element ED includes a first electrode EL1, a second electrode EL2 disposed on the first electrode EL1, and an intermediate layer CL disposed between the first electrode EL1 and the second electrode EL2. The light emitting element ED can be a top emission type. However, the light emitting element ED is not limited thereto and can also be a bottom emission type.

[0077] The first electrode EL1 can be a pixel electrode or an anode. The first electrode EL1 can be a transmissive electrode, a transmissive-reflective electrode, or a reflective electrode. When the first electrode EL1 is a transmissive electrode, the first electrode EL1 can include a transparent metal oxide such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and indium tin zinc oxide (ITZO). When the first electrode EL1 is a transmissive-reflective electrode or a reflective electrode, the first electrode EL1 can include Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or a mixture of these metals.

[0078] The second electrode EL2 can be a common electrode or a cathode. The second electrode EL2 can be a transmissive electrode, a transmissive-reflective electrode, or a reflective electrode. When the second electrode EL2 is a transmissive electrode, the second electrode EL2 can include Li, Ca, LiF / Ca, LiF / Al, Al, Mg, BaF, Ba, Ag, or a compound or mixture thereof (e.g., a mixture of Ag and Mg). However, the second electrode EL2 is not limited thereto and can also include, for example, indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), or indium tin zinc oxide (ITZO). When the second electrode EL2 is a transmissive-reflective electrode or a reflective electrode, the second electrode EL2 can include Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF / Ca, LiF / Al, Mo, Ti, or a compound or mixture thereof (e.g., a mixture of Ag and Mg). Alternatively, the second electrode EL2 can be a structure including a reflective film or a transmissive-reflective film formed of the materials described above and a transparent conductive film formed of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium tin zinc oxide (ITZO), etc.

[0079] The pixel defining layer PDL can be disposed on the first electrode EL1. For example, the pixel defining layer PDL can cover a part of the first electrode EL1 and expose another part of the first electrode EL1. The pixel defining layer PDL can include a metal fluoride ionic compound, but is not limited thereto. For example, the pixel defining layer PDL can be composed of any one of LiF, BaF2, and CSF. When the metal fluoride ionic compound has a set or predetermined thickness, the metal fluoride ionic compound has an insulating property.

[0080] The pixel defining layer PDL can define an opening PDL-OP. The opening PDL-OP of the pixel defining layer PDL can define a light emitting region.

[0081] The intermediate layer CL can be disposed between the first electrode EL1 and the second electrode EL2. The intermediate layer CL can be disposed in the opening PDL-OP defined in the pixel defining film PDL. The intermediate layer CL can be superimposed on the light-emitting region defined by the opening PDL-OP of the pixel defining film PDL. The intermediate layer CL will be described in more detail with reference to Figure 4A the intermediate layer CL will be described in more detail.

[0082] The sealing member EN includes a first inorganic layer IOL1, an organic layer OL, and a second inorganic layer IOL2. However, the sealing member EN is not limited thereto and may also include one inorganic layer and one organic layer. The sealing member EN is disposed on the light-emitting element ED and seals the light-emitting element ED.

[0083] The first inorganic layer IOL1 is disposed on the display layer DL. The first inorganic layer IOL1 is disposed on the light-emitting element ED. For example, the first inorganic layer IOL1 can be disposed closer to the light-emitting element ED than the second inorganic layer IOL2. The first inorganic layer IOL1 can be disposed in contact with the second electrode EL2 of the light-emitting element ED. The first inorganic layer IOL1 can be disposed to be superimposed on the light-emitting element ED and the pixel defining film PDL. The first inorganic layer IOL1 can include an inorganic material. The first inorganic layer IOL1 can be formed by a deposition method or the like. For example, plasma enhanced chemical vapor deposition (PECVD) can be used to form the first inorganic layer IOL1. The first inorganic layer IOL1 can seal the light-emitting element ED and serve as a barrier film for preventing or substantially preventing foreign substances from flowing into the light-emitting element ED.

[0084] The organic layer OL is disposed on the first inorganic layer IOL1. The organic layer OL can be directly disposed on the first inorganic layer IOL1. The organic layer OL has a set or predetermined thickness, can serve as a protective film for protecting the light-emitting element ED, can relieve the internal stress of the sealing member EN, and can serve as a planarization film for planarizing the top surface of the first inorganic layer IOL1. The organic layer OL can include an organic material. For example, it can include acrylic resin, epoxy resin, polyimide, and polyethylene, but is not limited thereto. The refractive index of the organic layer OL including the above organic materials can be about 1.35 to about 1.55. The organic layer OL can be formed by a deposition method, a coating method, or the like.

[0085] The second inorganic layer IOL2 is disposed on the organic layer OL. The second inorganic layer IOL2 may be directly disposed on the organic layer OL. The second inorganic layer IOL2 may be disposed to overlap with the light-emitting element ED and the pixel defining film PDL. In a plan view, the second inorganic layer IOL2 may completely overlap with the first inorganic layer IOL1. The second inorganic layer IOL2 includes an inorganic material. The second inorganic layer IOL2 may include the same or different inorganic materials as those included in the first inorganic layer IOL1. The second inorganic layer IOL2 may be formed by a deposition method or the like. For example, plasma enhanced chemical vapor deposition (PECVD) or inductively coupled plasma chemical vapor deposition (ICPCVD) may be used to form it. The second inorganic layer IOL2 may seal the light-emitting element ED and may serve as a barrier film for preventing or substantially preventing foreign substances from flowing into the light-emitting element ED.

[0086] The display device DD may further include a cover layer CAL. The cover layer CAL may be disposed between the light-emitting element ED and the sealing member EN. The cover layer CAL may be disposed to cover the second electrode EL2. The cover layer CAL may be disposed between the second electrode EL2 and the first inorganic layer IOL1.

[0087] The cover layer CAL may have a light-transmitting property and may be used to protect the light-emitting element ED. In addition, the cover layer CAL may be used to help the light generated in the light-emitting layer to be effectively emitted to the outside. The cover layer CAL may include at least one of an inorganic material and an organic material having a light-transmitting property. In addition, the cover layer CAL may also be formed of two or more materials having different refractive indexes from each other. For example, the cover layer CAL may be formed by a combination of a high refractive index material and a low refractive index material. The high refractive index material and the low refractive index material may be an organic material or an inorganic material. The thickness of the cover layer CAL is not particularly limited. For example, it may be from about 30 nm to about 1000 nm.

[0088] The display device DD may further include a cover layer COL. The cover layer COL may be disposed between the light-emitting element ED and the sealing member EN. In addition, the cover layer COL may be disposed between the cover layer CAL and the sealing member EN. The refractive index of the cover layer COL may be from about 1.3 to about 1.4. The cover layer COL may be used to help the light generated in the light-emitting layer to be effectively emitted to the outside. The material included in the cover layer COL is not particularly limited. For example, it may include lithium fluoride (LiF).

[0089] Figure 4A is a cross-sectional view of a display device DD-1 according to an exemplary embodiment of the inventive concept, Figure 4B and Figure 4CFIG. is a diagram showing the relative efficiencies of display device DD-1 and display device DD-1' according to an exemplary embodiment of the inventive concept and display devices Com-DD1 and Com-DD1' of comparative examples.

[0090] When compared with Figure 3 In comparison, the substrate member BS is schematically shown in Figure 4A Hereinafter, a detailed description of components identical to those of the display device described with reference to Figures 1A to 3 will not be provided.

[0091] Referring to Figure 4A , the intermediate layer CL may include a light-emitting layer EML. The light-emitting layer EML may emit light of any one color among red, green, blue, and white. The light-emitting layer EML may be a single layer. In addition, the light-emitting layer EML may have a multi-layer structure called tandem. For example, the light-emitting layer EML may be a two-layer tandem structure such as a blue light-emitting layer / blue light-emitting layer, a blue light-emitting layer / yellow light-emitting layer, a blue light-emitting layer / green light-emitting layer, etc., or a three-layer tandem structure such as a blue light-emitting layer / blue light-emitting layer / blue light-emitting layer, a blue light-emitting layer / yellow light-emitting layer / blue light-emitting layer, a blue light-emitting layer / green light-emitting layer / blue light-emitting layer, etc. In addition, a charge generation layer may also be included at each position between the light-emitting layers.

[0092] The light-emitting layer EML may include a light-emitting material. The type of the light-emitting material is not specifically limited and may be an organic compound and / or an inorganic compound. In an embodiment, the light-emitting material may be a quantum dot material. The core of the quantum dot may be selected from II-VI group compounds, III-V group compounds, IV-VI group compounds, group IV elements, group IV compounds, and combinations thereof.

[0093] A plurality of common layers other than the light-emitting layer may also be provided in the intermediate layer CL. For example, the intermediate layer CL may be formed by sequentially laminating a hole transport region HTR, a light-emitting layer EML, and an electron transport region ETR. The hole transport region HTR is provided on the first electrode EL1 and may include at least one of a hole injection layer, a hole transport layer, a hole buffer layer, and an electron blocking layer. The electron transport region ETR is provided on the light-emitting layer EML and may include at least one of a hole blocking layer, an electron transport layer, and an electron injection layer.

[0094] The sealing member EN includes a first inorganic layer IOL1, an organic layer OL directly provided on the first inorganic layer IOL1, and a second inorganic layer IOL2 directly provided on the organic layer OL.

[0095] In an embodiment, the refractive index of the first inorganic layer IOL1 may be about 1.64 or less. When the refractive index of the first inorganic layer IOL1 is greater than about 1.64, the difference in refractive index between the first inorganic layer IOL1 and the organic layer OL becomes large, and thus the ratio of the light that undergoes interface reflection between the first inorganic layer IOL1 and the organic layer OL to the light emitted from the light-emitting layer EML increases. Accordingly, the microcavity effect of the light-emitting element ED is affected, and the efficiency of the display device DD-1 decreases.

[0096] Referring Figure 4B and Figure 4C , differences in the light efficiency of the display device according to the refractive index of the first inorganic layer IOL1 can be seen. The efficiency of the display device DD-1 is evaluated by measuring current-voltage-luminance (IVL) characteristics. The comparative examples and the embodiment have the same structure as the display device DD-1 according to Figure 4A , except that the refractive indices of the first inorganic layer IOL1 of the sealing member EN are different from each other. In the drawings, the same structures are omitted, and only the structure of the sealing member is shown. For example, the display devices Com-DD1 and Com-DD1' of the comparative examples include a sealing member including a first inorganic layer IOL1' having silicon oxynitride and a refractive index of about 1.76, an organic layer OL, and a second inorganic layer IOL2 having a refractive index of about 1.90, and the display devices DD-1 and DD-1' of the embodiment include a sealing member including a first inorganic layer IOL1 having silicon oxynitride and a refractive index of about 1.60, an organic layer OL, and a second inorganic layer IOL2 having a refractive index of about 1.90.

[0097] Figure 4B is a graph showing the relative light efficiency when the display device includes a blue light-emitting layer. When the efficiency of the display device Com-DD1 of the comparative example is taken as 100%, the display device DD-1 according to the embodiment has an efficiency of about 102%, which is about 2% higher when compared with the display device of the comparative example. Figure 4C is a graph showing the relative light efficiency when the display device includes a white light-emitting layer. When the efficiency of the display device Com-DD1' of the comparative example is taken as 100%, the display device DD-1' according to the embodiment has an efficiency of about 103.5%, which is about 3.5% higher when compared with the display device of the comparative example. It is considered that the efficiency of the display device is improved due to the reduction in the interface reflection between the first inorganic layer IOL1 and the organic layer OL caused by the decrease in the refractive index of the first inorganic layer IOL1. Accordingly, the efficiency of the display devices DD, DD-1, and DD-1' according to the embodiments of the inventive concept can be improved by controlling the refractive index of the first inorganic layer IOL1 to be about 1.64 or less.

[0098] In addition, in an embodiment, the refractive index of the first inorganic layer IOL1 may be about 1.58 or greater. When the refractive index of the first inorganic layer IOL1 is less than about 1.58, the function of the first inorganic layer IOL1 as a barrier film deteriorates, such that oxygen, moisture, foreign substances, etc. cannot be properly prevented from flowing into the light-emitting element ED. Specifically, as a result of a wet high-temperature storage (WHTS) measurement test, when the refractive index of the first inorganic layer IOL1 is less than about 1.58, a large number of dark spots, etc. are generated and the display device is evaluated as defective or unusable, but when the refractive index of the first inorganic layer IOL1 is about 1.58 or greater, the display device is evaluated as good. Here, the WHTS measurement test is a storage test under high-temperature and high-humidity conditions, which means that the display device is placed in an oven at a temperature of about 85°C and a humidity of about 85% for about 500 hours to qualitatively evaluate whether dark spots, etc. appear. Therefore, by controlling the refractive index of the first inorganic layer IOL1 to be about 1.58 or greater, the first inorganic layer IOL1 can effectively serve as a barrier film, such that the reliability of the display devices DD, DD-1, and DD-1' according to the embodiments of the inventive concept is improved.

[0099] In an embodiment, the thickness of the first inorganic layer IOL1 may be from about 0.5 μm to about 1.5 μm. The thickness of the first inorganic layer IOL1 may be greater than or equal to the thickness of the second inorganic layer IOL2. In another embodiment, the thickness of the first inorganic layer IOL1 may be from about 0.7 μm to about 1.2 μm.

[0100] In an embodiment, the first inorganic layer IOL1 may include an inorganic material having a relatively small absorption coefficient, and may include, for example, at least one of silicon oxynitride (SiON), silicon nitride (SiN), and silicon oxide (SiO), but is not limited thereto. By adjusting the thickness range of the first inorganic layer IOL1 and including an inorganic material having a relatively small absorption coefficient in the first inorganic layer IOL1, the amount of light absorbed by the first inorganic layer IOL1 can be minimized or substantially reduced, while the first inorganic layer IOL1 can effectively perform the function of a barrier film, such that a reduction in the efficiency of the display devices DD, DD-1, and DD-1' can be prevented or substantially reduced.

[0101] In an embodiment, the thickness of the organic layer OL may be from about 0.5 μm to about 1.3 μm. The organic layer OL may be a single layer, or may include multiple layers.

[0102] In an embodiment, the refractive index of the second inorganic layer IOL2 may be from about 1.58 to about 2.00. In an embodiment, the thickness of the second inorganic layer IOL2 may be from about 0.1 μm to about 1.5 μm. In another embodiment, the thickness of the second inorganic layer IOL2 may be from about 0.1 μm to about 1.0 μm. The second inorganic layer IOL2 may be a single layer, or may include a plurality of sub-inorganic layers. When the second inorganic layer IOL2 includes a plurality of sub-inorganic layers, the refractive index and / or thickness of the sub-inorganic layers may be the same as or different from each other within this range, and a detailed description will be provided below.

[0103] Referring back Figure 4A , when the second inorganic layer IOL2 is a single layer in an embodiment, the thickness of the second inorganic layer IOL2 may be from about 0.15 μm to about 0.25 μm, and more preferably, from about 0.15 μm to about 0.2 μm. The second inorganic layer IOL2 may include silicon nitride (Si x N y , where x and y are independent of each other and are both integers from 1 to 5). For example, the second inorganic layer IOL2 may be composed of silicon nitride such as Si3N4.

[0104] The silicon nitride may not contain Si-O (silicon-oxygen) bonds. In addition, the hydrogen content per unit volume (cm 3 ) in the silicon nitride may be from about 0 atoms / cm 3 to about 2.8×10 22 atoms / cm 3 . The molar ratio of nitrogen to silicon in the silicon nitride may be from about 1 to about 1.3.

[0105] When the silicon nitride satisfies the above conditions, the absorption coefficient of the silicon nitride for light having a central wavelength of about 460 nm may converge to zero. Therefore, since the amount of blue light absorbed by the second inorganic layer IOL2 after the blue light is emitted from the light-emitting layer EML is reduced, the light-emitting efficiency of the display device DD for blue light can be improved.

[0106] When the second inorganic layer IOL2 includes silicon nitride that satisfies the above conditions, the density of the second inorganic layer IOL2 may be from about 2.3 g / cm 3 to about 2.6 g / cm 3 . Therefore, the second inorganic layer IOL2 may have excellent barrier properties and can more effectively prevent moisture from penetrating from the outside.

[0107] When the thickness of the second inorganic layer IOL2 is from about 0.15 μm to about 0.25 μm, even when the sealing member EN is applied to the foldable display device and folded several times, damage to the sealing member EN can be prevented or substantially reduced. Accordingly, penetration of external moisture due to damage to the sealing member EN can be prevented or substantially prevented, so that the durability of the display device DD can be improved. When the thickness of the second inorganic layer IOL2 is less than about 0.15 μm, the moisture resistance of the sealing member EN is reduced, and when the thickness of the second inorganic layer IOL2 exceeds about 0.25 μm, the durability of the sealing member EN deteriorates in the case where the sealing member EN is applied to the foldable display device.

[0108] Hereinafter, effects of the second inorganic layer IOL2 according to embodiments of the inventive concept and a display device DD including the second inorganic layer IOL2 will be described in detail with reference to examples and comparative examples.

[0109] The display devices of Example 1 and Comparative Example 1 have the same stacked structure as the Figure 4A display device DD-1 shown therein. The display devices of Example 1 and Comparative Example 1 are manufactured of the same materials and structures except for the second inorganic layer.

[0110] In the display device of Example 1, silicon nitride was deposited to form a second inorganic layer having a thickness of about 0.2 μm. In the display device of Comparative Example 1, silicon nitride was deposited to form a second inorganic layer having a thickness of about 0.7 μm.

[0111] Properties of the second inorganic layers of Example 1 and Comparative Example 1 are shown in Table 1 below.

[0112] Table 1

[0113] Analysis items Example 1 Comparative Example 1 <![CDATA[Absorption coefficient (M -1 cm -1 )]]> 0 <![CDATA[4.8×10 -3 > Si-O bond None Present <![CDATA[Hydrogen content (atoms / cm 3 )]]> <![CDATA[2.58×10 22 > <![CDATA[3.24×10 22 > <![CDATA[Component ratio (N / Si 2p )]]> 49.86 / 48.50 47.94 / 50.50 Density <![CDATA[2.520g / cm 3 > <![CDATA[2.101g / cm 3 >

[0114] When the second inorganic layers according to Example 1 and Comparative Example 1 were measured using a Fourier transform infrared spectrometer, a peak corresponding to an Si-O bond was not detected in the second inorganic layer of Example 1, and a peak corresponding to an Si-O bond was detected in the second inorganic layer of Comparative Example 1. Accordingly, it can be seen that the second inorganic layer of Example 1 does not contain an Si-O bond. The hydrogen content of the second inorganic layers of Example 1 and Comparative Example 1 was measured using a dynamic secondary ion mass spectrometer (D-SIMS).

[0115] The molar percentages of nitrogen and silicon in the second inorganic layers of Example 1 and Comparative Example 1 were measured using an X-ray photoelectron spectrometer (XPS). Si 2pis the number of moles of the 2p orbital of silicon (Si) measured. The molar percentages of nitrogen and silicon in the second inorganic layer of Example 1 are approximately 49.86% and approximately 48.50%, respectively. Thus, the molar ratio of nitrogen to silicon in the second inorganic layer of Example 1 was measured to be approximately 1 or greater. The molar percentages of nitrogen and silicon measured by the same method in the second inorganic layer of Comparative Example 1 are approximately 47.94% and approximately 50.50%, respectively. Thus, the molar ratio of nitrogen to silicon in the second inorganic layer of Comparative Example 1 was measured to be approximately 1 or less.

[0116] The density of the second inorganic layer of Example 1 and Comparative Example 1 was measured using an X-ray reflectometer.

[0117] The absorption coefficient of the second inorganic layer of Example 1 and Comparative Example 1 was measured using blue light having a central wavelength of approximately 460 nm.

[0118] The refractive index of the second inorganic layer of Example 1 and Comparative Example 1 was approximately 1.9.

[0119] The water vapor transmission rate (MVTR) value was measured for the display devices of Example 1 and Comparative Example 1. The MVTR measurement results are shown in Table 2 below.

[0120] Table 2

[0121] Example 1 Comparative Example 1 <![CDATA[MVTR (g / m 2 day)]]> <![CDATA[2.0×10 -6 > <![CDATA[3.1×10 -6 >

[0122] The display device according to Example 1 is thinner than the display device of Comparative Example 1, but has a lower water vapor transmission rate. The second inorganic layer of Example 1 does not contain Si-O bonds, has a molar ratio of nitrogen to silicon of approximately 1 or greater, has a small hydrogen content of approximately 2.8×10 22 atoms / cm 3 or less, and has a higher density compared to the density of the second inorganic layer of Comparative Example 1. As a result, it is considered that the second inorganic layer of Example 1 has excellent barrier properties and thus exhibits a low water vapor transmission rate. To measure the light durability of the display device according to the embodiment, the amount of change in transmittance according to the degree of exposure to light was measured for the display devices according to the embodiment and the comparative example, and the measurement results are shown in Table 3. The amount of change in transmittance was measured by the following method.

[0123] The amount of change in transmittance 1 is the value of two measurements using deep blue light having a central wavelength of approximately 405 nm, and the amount of change in transmittance 2 is the value of two measurements using deep blue light having a central wavelength of approximately 430 nm.

[0124] A second inorganic layer with a thickness of approximately 2 μm was deposited for each of Example 2 and Comparative Example 2, a second inorganic layer with a thickness of approximately 4 μm was deposited for each of Example 3 and Comparative Example 3, and a second inorganic layer with a thickness of approximately 7 μm was deposited for each of Example 4 and Comparative Example 4. The properties of the second inorganic layers of Example 2 to Example 4 are the same as those of the second inorganic layer of Example 1 shown in Table 1, and the properties of the second inorganic layers of Comparative Example 2 to Comparative Example 4 are the same as those of the second inorganic layer of Comparative Example 1 shown in Table 1.

[0125] The amount of change in light transmittance according to the examples and comparative examples was obtained by measuring the light transmittance before exposure to light and the light transmittance after a total of 40 cycles of exposure to light, and thus the percentage of change in light transmittance before and after exposure to light was calculated. During one cycle, each display device was exposed to light with an intensity of approximately 1120 watts (W) for approximately 8 hours.

[0126] The amount of change in light transmittance is represented as a negative value when the light transmittance increases, and the amount of change in light transmittance is represented as a positive value when the light transmittance decreases.

[0127] Table 3

[0128]

[0129] Referring to Table 3, even when the display devices of Example 2 to Example 4 were exposed to light, the light transmittance basically did not change. For Comparative Example 2 to Comparative Example 4, the light transmittance decreased after the display devices were exposed to light, and the light transmittance of light with a central wavelength of approximately 405 nm decreased particularly significantly. Moreover, due to the increase in the thickness of the second inorganic layer, the light transmittance further decreased. In addition, referring to Comparative Example 4, when a second inorganic layer with a thickness of approximately 7 μm was formed, the light transmittance of light with a central wavelength of approximately 430 nm decreased significantly. It is considered that since Example 2 to Example 4 respectively have high durability by including the second inorganic layer with the properties shown in Table 1, the light transmittance did not change for Example 2 to Example 4 because the damage by light was small. It is considered that since the second inorganic layers with low durability are included in Comparative Example 2 to Comparative Example 4 respectively, the light transmittance decreased due to the second inorganic layer damaged by light. In addition, it is considered that as the second inorganic layer becomes thicker, the damaged area becomes wider, and thus the percentage of decrease in light transmittance becomes larger.

[0130] Hereinafter, the effects of the second inorganic layer IOL2 including a plurality of sub-inorganic layers and the display device including the second inorganic layer IOL2 will be described in detail with reference to Figure 5A and Figure 5B examples and comparative examples.

[0131] Figure 5A It is a cross-sectional view of a display device DD-2 according to an exemplary embodiment of the inventive concept. Figure 5B It is a diagram showing the relative efficiency of a display device DD-2 according to an exemplary embodiment of the inventive concept and a display device Com-DD2 of a comparative example. Hereinafter, detailed descriptions will not be provided for components that are the same as those of the display device described with reference to Figures 1A to 4C the display device.

[0132] Referring to Figure 5A , the display device DD-2 may include a sealing member EN-1, and the sealing member EN-1 may include a second inorganic layer IOL2 including a plurality of sub-inorganic layers. The second inorganic layer IOL2 may include a first sub-inorganic layer Sub-IOL1 and a second sub-inorganic layer Sub-IOL2 having different refractive indexes and thicknesses from each other.

[0133] When the second inorganic layer IOL2 includes two sub-inorganic layers Sub-IOL1 and Sub-IOL2, the thickness of the second inorganic layer IOL2 may be from about 0.5 μm to about 1.5 μm. For example, the thickness of the second inorganic layer IOL2 may be from about 0.5 μm to about 1.0 μm.

[0134] The first sub-inorganic layer Sub-IOL1 may be directly disposed on the organic layer OL. The refractive index of the first sub-inorganic layer Sub-IOL1 may be the same as or similar to the refractive index of the first inorganic layer IOL1, for example, it may be from about 1.58 to about 1.64. Since the first sub-inorganic layer Sub-IOL1 is directly disposed on the organic layer OL, the refractive index of the first sub-inorganic layer Sub-IOL1 may be controlled to be similar to the refractive index of the first inorganic layer IOL1, so that the first sub-inorganic layer Sub-IOL1 prevents or substantially reduces the deterioration of the efficiency of the display device DD-2 and effectively performs the function of a barrier film.

[0135] The first sub-inorganic layer Sub-IOL1 may be thinner than the first inorganic layer IOL1 and may be thicker than the second sub-inorganic layer Sub-IOL2. In an embodiment, the thickness t1 of the first sub-inorganic layer Sub-IOL1 may be from about 0.5 μm to about 0.6 μm.

[0136] In an embodiment, the first sub-inorganic layer Sub-IOL1 may include an inorganic material having a relatively small absorption coefficient. For example, it may include silicon oxynitride (SiON) or silicon oxide (SiO), but is not limited thereto. By adjusting the thickness and refractive index range of the first sub-inorganic layer Sub-IOL1 and including an inorganic material having a relatively small absorption coefficient in the first sub-inorganic layer Sub-IOL1, the amount of light absorbed by the first sub-inorganic layer Sub-IOL1 can be minimized or substantially reduced. At the same time, the first sub-inorganic layer Sub-IOL1 can effectively perform the function of a barrier film, thereby preventing or substantially reducing the reduction in the efficiency of the display device DD-2.

[0137] The second sub-inorganic layer Sub-IOL2 may be disposed on the first sub-inorganic layer Sub-IOL1. The second sub-inorganic layer Sub-IOL2 may be disposed on top of the sealing member EN-1. The function of preventing oxygen, moisture, foreign substances, etc. from flowing into the light-emitting element ED is most important in the second sub-inorganic layer Sub-IOL2 disposed on top of the sealing member EN-1. Therefore, the refractive index of the second sub-inorganic layer Sub-IOL2 may be greater than the refractive indices of the first inorganic layer IOL1 and the first sub-inorganic layer Sub-IOL1. In an embodiment, the refractive index of the second sub-inorganic layer Sub-IOL2 may be from about 1.80 to about 2.00.

[0138] The thickness t2 of the second sub-inorganic layer Sub-IOL2 may be smaller than the thickness t1 of the first sub-inorganic layer Sub-IOL1. In an embodiment, the thickness t2 of the second sub-inorganic layer Sub-IOL2 may be from about 0.1 μm to about 0.2 μm. When the thickness t2 of the second sub-inorganic layer Sub-IOL2 is greater than about 0.2 μm, since the absorption coefficient of the second sub-inorganic layer Sub-IOL2 having a greater refractive index is greater than the absorption coefficient of the first sub-inorganic layer Sub-IOL1, the amount of light absorbed by the second sub-inorganic layer Sub-IOL2 will increase, and thus the efficiency of the display device will decrease.

[0139] In an embodiment, the ratio (t1:t2) of the thickness t1 of the first sub-inorganic layer Sub-IOL1 to the thickness t2 of the second sub-inorganic layer Sub-IOL2 may be from about 3:1 to about 5:1.

[0140] Referring to Figure 5B , the difference in the light efficiency of the display device according to the second inorganic layer IOL2 can be seen. The efficiency of the display device is evaluated by measuring the current-voltage-luminance (IVL) characteristics. The display device Com-DD2 of the comparative example has the same structure as the Figure 4B display device Com-DD1 of the comparative example. The display device DD-2 in the embodiment is the same as the Figure 5Ais the same as the display device in [reference], including a blue light-emitting layer, and including a sealing member including a first inorganic layer IOL1 having a refractive index of about 1.60, an organic layer OL, a first sub-inorganic layer Sub-IOL1 having a refractive index of about 1.60, and a second sub-inorganic layer Sub-IOL2 having a refractive index of about 1.90. When taking the efficiency of the display device Com-DD2 of the comparative example as 100%, the display device DD-2 according to the embodiment has an efficiency of about 109.1%, which is about 9.1% higher when compared with the display device of the comparative example. Compared with the display devices DD-1 and DD-1' according to the embodiments of [reference] and [reference], the improvement in efficiency is greater, which is considered to be due to the reduction in the thickness of the second sub-inorganic layer Sub-IOL2 having a refractive index of about 1.90, resulting in a reduction in the amount of light absorbed by the second sub-inorganic layer Sub-IOL2, so the efficiency of the display device DD-2 is further improved. Therefore, the display device DD-2 according to the exemplary embodiment of the inventive concept can have improved efficiency by including the first sub-inorganic layer Sub-IOL1 and the second sub-inorganic layer Sub-IOL2 whose refractive index and thickness are controlled. Figure 4B and Figure 4C Compared with the display devices DD-1 and DD-1' according to the embodiments of [reference] and [reference], the improvement in efficiency is greater, which is considered to be due to the reduction in the thickness of the second sub-inorganic layer Sub-IOL2 having a refractive index of about 1.90, resulting in a reduction in the amount of light absorbed by the second sub-inorganic layer Sub-IOL2, so the efficiency of the display device DD-2 is further improved. Therefore, the display device DD-2 according to the exemplary embodiment of the inventive concept can have improved efficiency by including the first sub-inorganic layer Sub-IOL1 and the second sub-inorganic layer Sub-IOL2 whose refractive index and thickness are controlled.

[0141] In the embodiment, the second sub-inorganic layer Sub-IOL2 may include an inorganic material having a relatively large absorption coefficient, for example, may include any one of silicon nitride, aluminum oxide, and titanium oxide.

[0142] Figures 6A to 6C is a cross-sectional view of a display device according to an exemplary embodiment of the inventive concept. Hereinafter, detailed descriptions will not be provided for components that are the same as those of the display device described with reference to [reference]. Figures 1A to 5B Hereinafter, detailed descriptions will not be provided for components that are the same as those of the display device described with reference to [reference].

[0143] Referring to [reference], Figure 6A the display device DD-3 may include a cover layer COL disposed between the light-emitting element ED and the sealing member EN-1. The cover layer COL may be directly disposed on the light-emitting element ED, and the sealing member EN-1 may be directly disposed on the cover layer COL.

[0144] Referring to [reference], Figure 6B the display device DD-4 may include a cover layer CAL disposed between the light-emitting element ED and the sealing member EN-1. The cover layer CAL may be directly disposed on the light-emitting element ED, and the sealing member EN-1 may be directly disposed on the cover layer CAL.

[0145] Referring to [reference], Figure 6C the display device DD-5 may include a sealing member EN-1 directly disposed on the light-emitting element ED. In this case, the display device DD-5 may not include a cover layer and a cover layer.

[0146] Figure 7A And Figure 7B is a cross-sectional view of a display device DD-6 including a color control layer CCL according to an exemplary embodiment of the inventive concept. Figure 7B Shows three pixel regions PX-R, PX-G, and PX-B according to an embodiment corresponding to Figure 7A . Hereinafter, detailed descriptions will not be provided for components identical to those of the display device described with reference to Figures 1A to 6C .

[0147] Referring to Figure 7A , the display device DD-6 may further include a color control layer CCL disposed on a sealing member EN. A cover layer CAL and / or a cover layer COL may be included between the light-emitting element ED and the sealing member EN.

[0148] Referring to Figure 7B , the light-emitting layer EML may be disposed to overlap all of the first to third pixel regions PX-R, PX-G, and PX-B, and may have an integral shape (e.g., formed as a single continuous and monolithic layer). The light-emitting layer EML may provide the same blue light.

[0149] Although shown in Figure 7B as including a single intermediate layer CL, the light-emitting element ED is not limited thereto and may also include an intermediate layer CL having a multi-layer structure called a tandem. For example, the light-emitting element may include a first intermediate layer, a second intermediate layer, and a third intermediate layer, and in this case, the light-emitting layer may have a structure such as a blue light-emitting layer / blue light-emitting layer / blue light-emitting layer.

[0150] The color control layer CCL may include a transmissive filter TF and a color conversion member CCF corresponding to the first pixel region PX-B, the second pixel region PX-G, and the third pixel region PX-R. In the present embodiment, a color control layer CCL including one transmissive filter TF and two color conversion members CCF1 and CCF2 is exemplarily shown to correspond to three pixel regions.

[0151] The transmissive filter TF may be disposed to correspond to the first pixel region PX-B. The transmissive filter TF does not include a light-emitting body and may transmit light provided from the light-emitting layer EML. The transmissive filter TF may include a transparent polymer resin and may also include at least one of a blue pigment and a blue dye to improve color purity.

[0152] The first color conversion member CCF1 and the second color conversion member CCF2 may be set to correspond to the second pixel region PX-G and the third pixel region PX-R, respectively, and may absorb light beams provided from the light-emitting layer EML to emit light beams of different colors. The first color conversion member CCF1 and the second color conversion member CCF2 may include light emitters, and the light emitters may include quantum dots.

[0153] The light-blocking part BM may be disposed between the transmissive filter TF and the first color conversion member CCF1 spaced apart from each other and between the first color conversion member CCF1 and the second color conversion member CCF2 spaced apart from each other. The light-blocking part BM may be formed by including an organic light-blocking material or an inorganic light-blocking material including a black pigment or a black dye. The light-blocking part BM may overlap with the peripheral region NPX. The light-blocking part BM may prevent or substantially prevent light leakage and define boundaries between the transmissive filter TF and the color conversion members CCF1 and CCF2 adjacent to each other. However, the light-blocking part BM may be omitted, and instead, the color conversion member CCF may be directly disposed.

[0154] According to an embodiment of the inventive concept, a display device having improved efficiency may be provided.

[0155] According to an embodiment of the inventive concept, a display device may effectively block foreign substances such as oxygen or moisture from flowing into the display device from the outside and may enhance the reliability of the display device.

[0156] Although exemplary embodiments of the inventive concept have been described herein, it is understood that various changes and modifications can be made by those skilled in the art within the spirit and scope of the inventive concept defined by the claims and their equivalents.

[0157] It will be understood that although terms such as "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers, and / or parts, these elements, components, regions, layers, and / or parts should not be limited by these terms. These terms are used to distinguish one element, component, region, layer, or part from another element, component, region, layer, or part. Thus, the first element, component, region, layer, or part discussed herein may be named the second element, component, region, layer, or part without departing from the spirit and scope of the inventive concept.

[0158] In addition, it will also be understood that when a layer is referred to as being "between" two layers, it may be the only layer between the two layers, or there may also be one or more intermediate layers.

[0159] The terms used herein are for the purpose of describing particular embodiments and are not intended to limit the inventive concept. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will also be understood that the terms "comprises", "comprising", when used in this specification, specify the presence of the stated features, integers, steps, operations, elements and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components and / or groups thereof. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0160] For the purposes of this disclosure, "at least one of X, Y, and Z" and "at least one selected from the group consisting of X, Y, and Z" can be understood to be only X, only Y, only Z, or any combination of two or more of X, Y, and Z, such as, by way of example, XYZ, XYY, YZ, and ZZ.

[0161] In addition, the use of "may" in describing embodiments of the inventive concept refers to "one or more embodiments of the inventive concept". Additionally, the term "exemplary" is intended to indicate an example or illustration.

[0162] It will be understood that when an element or layer is referred to as being "on", "connected to", "coupled to" or "adjacent to" another element or layer, it can be directly on, directly connected to, directly coupled to or directly adjacent to the other element or layer, or there can be one or more intervening elements or layers. When an element or layer is referred to as being "directly on", "directly connected to", "directly coupled to" another element or layer or "directly adjacent to" another element or layer, there are no intervening elements or layers.

[0163] As used herein, the terms "substantially", "about" and similar terms are used as approximate terms and not as terms of degree, and are intended to account for the inherent deviations in measured or calculated values that would be recognized by a person of ordinary skill in the art. In addition, the specific quantities or ranges recited in the written description or claims herein may also include the inherent deviations in measured or calculated values that would be recognized by a person of ordinary skill in the art.

[0164] Additionally, any numerical range recited herein is intended to include all sub-ranges subsumed within the recited range having the same degree of numerical precision. For example, a range of "1.0 to 10.0" is intended to include all sub-ranges between the recited minimum value of 1.0 and the recited maximum value of 10.0 (and including the endpoints), that is, having a minimum value equal to or greater than 1.0 and a maximum value equal to or less than 10.0, such as, by way of example, 2.4 to 7.6. Any maximum numerical limitation recited herein is intended to include all lower numerical limitations subsumed therein, and any minimum numerical limitation recited in this specification is intended to include all higher numerical limitations subsumed therein. Accordingly, the applicant reserves the right to amend this specification (including the claims) to expressly recite any sub-ranges subsumed within the ranges expressly recited herein. All such ranges in this specification are intended to be inherently described.

[0165] As used herein, the term "use" and its variations can be considered synonymous with "utilize" and its variations.

[0166] The display device and / or any other related device or component according to embodiments of the present invention described herein can be implemented using any suitable hardware, firmware (e.g., application specific integrated circuit), software, or a suitable combination of software, firmware, and hardware. For example, various components of the display device can be formed on one integrated circuit (IC) chip or on separate IC chips. Additionally, various components of the display device can be implemented on a flexible printed circuit film, a tape carrier package (TCP), a printed circuit board (PCB), or formed on the same substrate. Further, various components of the display device can be processes or threads running on one or more processors in one or more computing devices, executing computer program instructions and interacting with other system components for performing the various functions described herein. The computer program instructions are stored in a memory implemented in a computing device using a standard memory device such as, by way of example, random access memory (RAM). The computer program instructions can also be stored in other non-transitory computer-readable media such as, by way of example, CD-ROMs, flash drives, etc. Additionally, those skilled in the art should recognize that the functions of various computing devices can be combined or integrated into a single computing device, or the functions of a particular computing device can be distributed over one or more other computing devices, without departing from the scope of the exemplary embodiments of the present invention.

[0167] Accordingly, the scope of the inventive concept is to be determined by the broadest permissible interpretation of the claims and their equivalents, and should not be limited or restricted by the foregoing detailed description.

Claims

1. A display device, the display device comprising: Light-emitting element; and a sealing member, located on the light-emitting element and sealing the light-emitting element, wherein the sealing member includes: a first inorganic layer, located on the light-emitting element and having a refractive index of 1.58 to 1.64; an organic layer, located on the first inorganic layer; and a second inorganic layer, located on the organic layer and having a refractive index of 1.58 to 2.00, wherein the second inorganic layer includes silicon nitride and does not contain Si-O bonds, wherein, in the silicon nitride, the molar ratio of nitrogen to silicon is 1 to 1.3, and Among them, the second inorganic layer has a density of 2.3 g / cm 3 to 2.6 g / cm 3 .

2. The display device according to claim 1, wherein, the thickness of the first inorganic layer is 0.5 μm to 1.5 μm.

3. The display device according to claim 1, wherein, The first inorganic layer includes at least one of silicon oxynitride, silicon nitride, and silicon oxide.

4. The display device according to claim 1, wherein, The thickness of the second inorganic layer is 0.5 μm to 1.5 μm.

5. The display device according to claim 1, wherein, The second inorganic layer includes a first sub-inorganic layer having a refractive index of 1.58 to 1.64 and a second sub-inorganic layer having a refractive index of 1.80 to 2.

00.

6. The display device according to claim 5, wherein, The ratio of the thickness of the first sub-inorganic layer to the thickness of the second sub-inorganic layer is 3:1 to 5:

1.

7. The display device according to claim 6, wherein, The thickness of the first sub-inorganic layer is 0.5 μm to 0.6 μm.

8. The display device according to claim 6, wherein, The thickness of the second sub-inorganic layer is 0.1 μm to 0.2 μm.

9. The display device according to claim 1, wherein, The second inorganic layer has a thickness of 0.15 μm to 0.25 μm.

10. The display device according to claim 1, wherein, The hydrogen content of the second inorganic layer is less than or equal to 2.8×10 22 atoms / cm 3 .

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