Display device

Abstract

A display device according to an embodiment includes a display panel including a display area and a peripheral area located around the display area, the display area including a separation layer, the separation layer including a first opening through which light is emitted from an organic light emitting diode; a touch electrode disposed on the display panel; a touch electrode passivation layer covering the touch electrode and including a second opening corresponding to the first opening; and a high refractive index layer covering the touch electrode passivation layer and the second opening. The touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral area, and the touch electrode passivation layer is not formed in the opening region.

Description

[0001] Cross-references to related applications

[0002] This application claims priority and benefits to Korean Patent Application No. 10-2019-0128429, filed on October 16, 2019, with the Korean Intellectual Property Office, the contents of which are incorporated herein by reference in their entirety. Technical Field

[0003] Embodiments of this disclosure relate to display devices, and more specifically, to display devices including touch sensing functionality. Background Technology

[0004] Mobile phone use is becoming increasingly common, and mobile phones offer a variety of functions beyond simply making calls. These functions typically include touch-sensing capabilities that make using smartphones easier.

[0005] In particular, with the development of flexible organic light-emitting devices, display devices are being manufactured by forming an additional layer on the organic light-emitting panel to provide touch sensing functionality. Summary of the Invention

[0006] The implementation provides a display device that prevents organic materials supplied by the inkjet process from flowing into the surrounding environment, thereby preventing the presence of foreign matter or covering of alignment marks.

[0007] Furthermore, the embodiments provide a display device with improved light efficiency at the front of the touch-sensitive organic light-emitting device.

[0008] A display device according to an embodiment includes: a display panel including a display area and a peripheral area surrounding the display area, the display area including a separating layer, the separating layer including a first opening through which light is emitted from an organic light-emitting diode; a touch electrode disposed on the display panel; a touch electrode passivation layer covering the touch electrode and including a second opening corresponding to the first opening; and a high refractive index layer covering the touch electrode passivation layer and the second opening, wherein the touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral area, and wherein the touch electrode passivation layer is not formed in the opening region.

[0009] The display device may also include an outer dam region formed in the peripheral region outside the opening area of ​​the touch electrode passivation layer, wherein the outer dam region may include a first dam structure formed of the same material as the touch electrode passivation layer and having the same height as the touch electrode passivation layer.

[0010] The first dam structure formed in the outer dam area may also include an inner protrusion.

[0011] The first dam structure formed in the outer dam area may also include a dam opening formed on the upper surface of the first dam.

[0012] The display device may also include an extension area formed in the peripheral area between the display area and the opening area of ​​the touch electrode passivation layer.

[0013] The display panel may also include an encapsulation layer covering the organic light-emitting diode and the first opening, and the encapsulation layer may include at least one organic encapsulation layer and at least one inorganic encapsulation layer.

[0014] The partition layer may also include a partition layer periphery opening located in the peripheral area that corresponds to the opening area.

[0015] The display panel may also include an interlayer insulating layer disposed below the organic light-emitting diode, and the interlayer insulating layer may include an interlayer insulating layer peripheral opening located in the peripheral region corresponding to the opening region.

[0016] The display device may also include an additional opening area located in the peripheral region between the extension area and the opening area, and the touch electrode passivation layer is not formed in the additional opening area.

[0017] The display device may also include an inner dam area located in the peripheral region outside the additional opening area of ​​the touch electrode passivation layer, and the inner dam area may include a second dam structure formed of the same material as the touch electrode passivation layer and having the same height as the touch electrode passivation layer.

[0018] The second dam structure may also include an internal protrusion.

[0019] The second dam structure may also include a dam opening formed on the upper surface of the second dam.

[0020] The display panel may also include an encapsulation layer covering the organic light-emitting diode and the first opening, and the encapsulation layer may include at least one organic encapsulation layer and at least one inorganic encapsulation layer.

[0021] At least one organic encapsulation layer extends through the extension region and the additional opening region to at least a portion of the inner dam region, and at least one inorganic encapsulation layer covers the opening region and extends through the inner dam region to the outer dam region.

[0022] The partition layer may also include a partition layer periphery opening located in the peripheral area that corresponds to the opening area.

[0023] The partition layer may also include an additional partition layer periphery opening located in the periphery area that corresponds to the additional opening area.

[0024] The display panel may also include an interlayer insulating layer disposed below the organic light-emitting diode, and the interlayer insulating layer may include an interlayer insulating layer peripheral opening located in the peripheral region corresponding to the opening region.

[0025] The interlayer insulation layer may also include an additional interlayer insulation layer peripheral opening located in the peripheral region that corresponds to the additional opening region.

[0026] A display device according to an embodiment includes: a display panel including a display area and a peripheral area surrounding the display area; a touch electrode disposed on the display panel; a touch electrode passivation layer covering the touch electrode, wherein the touch electrode passivation layer includes an opening formed in a portion corresponding to the peripheral area, wherein the touch electrode passivation layer is not formed in the opening area; a high refractive index layer covering the touch electrode passivation layer, wherein a material identical to the material of the high refractive index layer is partially formed in the opening area; and an outer dam region formed in the peripheral area outside the opening area of ​​the touch electrode passivation layer. The outer dam region includes a first dam structure formed of the same material as the touch electrode passivation layer and having the same height as the touch electrode passivation layer.

[0027] The display panel may include a separation layer located in the display area, and the separation layer includes a first opening through which light is emitted from an organic light-emitting diode, and the touch electrode passivation layer may include a second opening corresponding to the first opening, and a high refractive index layer may cover the second opening.

[0028] A display device according to an embodiment includes: a display panel including a display area and a peripheral area surrounding the display area; the display panel including a substrate and a separator layer disposed on the substrate and having a first opening, wherein light is emitted from an organic light-emitting diode through the first opening; a touch electrode disposed on the display panel; a touch electrode passivation layer covering the touch electrode and including a second opening corresponding to the first opening; and a high refractive index layer covering the touch electrode passivation layer and the second opening, wherein the touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral area, wherein the touch electrode passivation layer is not formed in the opening region, and wherein the separator layer further includes a separator layer peripheral opening located in the peripheral area corresponding to the opening region.

[0029] The display panel may also include an extension area formed in the peripheral area between the display area and the opening area of ​​the touch electrode passivation layer.

[0030] The display panel may also include an additional opening area located in the peripheral area between the extension area and the opening area.

[0031] The passivation layer of the touch electrode may not be formed in the additional opening area.

[0032] The partition layer may also include an additional partition layer periphery opening located in the periphery area that corresponds to the additional opening area.

[0033] The display panel may also include an outer dam area formed in the peripheral region outside the opening area of ​​the touch electrode passivation layer, and an inner dam area formed in the peripheral region outside the additional opening area of ​​the touch electrode passivation layer.

[0034] The outer dam area may include a first dam structure formed of the same material as the touch electrode passivation layer and having the same height as the touch electrode passivation layer, and the inner dam area may include a second dam structure formed of the same material as the touch electrode passivation layer and having the same height as the touch electrode passivation layer.

[0035] In the plan view, the opening area and the outer opening of the partition layer can overlap with each other.

[0036] According to the implementation method, carbonized foreign matter or covering of alignment marks is prevented due to the flow of organic material provided by the inkjet process.

[0037] Furthermore, the implementation method improves the light efficiency at the front of the touch-sensitive organic light-emitting device. Attached Figure Description

[0038] Figure 1 This is a schematic front view of a display device according to an embodiment.

[0039] Figure 2 It is along Figure 1 The sectional view taken from line II-II.

[0040] Figure 3 It is along Figure 1 The sectional view taken from line III-III.

[0041] Figure 4 and Figure 5 It is based on Figure 3 A cross-sectional view of a variation of the implementation method.

[0042] Figure 6 This is a schematic front view of a display device according to another embodiment.

[0043] Figure 7 yes Figure 6 A magnified view of a portion of the image.

[0044] Figure 8 It is along Figure 7 A sectional view taken from line VIII-VIII.

[0045] Figure 9 and Figure 10 It is based on Figure 8 A cross-sectional view of a variation of the implementation method.

[0046] Figures 11 to 13This illustrates that the material according to this embodiment does not flow out of the dam.

[0047] Figure 14 and Figure 15 A variation of the dam structure according to the implementation method is shown.

[0048] Figures 16 to 18 It is shown that whether the material flows out of the dam according to the implementation method depends on the dam structure. Detailed Implementation

[0049] Embodiments of this disclosure will be described more fully below with reference to the accompanying drawings, in which embodiments of this disclosure are illustrated. As those skilled in the art will recognize, embodiments may be modified in various ways without departing from the spirit or scope of this disclosure.

[0050] Furthermore, for better understanding and ease of description, the dimensions and thicknesses of each structure shown in the accompanying drawings are arbitrarily illustrated, but the embodiments of this disclosure are not limited thereto. In the drawings, the thicknesses of layers, films, panels, regions, etc., may be exaggerated for clarity.

[0051] It should be understood that when an element such as a layer, film, region or substrate is referred to as being “on” another element, it may be directly on that other element, or there may be an intermediary element present.

[0052] Next, refer to Figures 1 to 3 A display device 10 according to an embodiment is described.

[0053] Figure 1 This is a schematic front view of a display device according to an embodiment. Figure 2 It is along Figure 1 The sectional view taken from line II-II, and Figure 3 It is along Figure 1 The sectional view taken from line III-III.

[0054] Reference Figure 2 The display device 10 according to the embodiment includes a display panel 100 having an organic light-emitting diode, a touch sensing layer 300 disposed on the display panel 100 and having a touch sensing function, a polarizing layer 210 disposed on the touch sensing layer 300, an adhesive layer 230 and a window 220.

[0055] Reference Figure 1 According to the embodiment, the display panel 100 includes a display area 101 and peripheral areas 102, 103, and 104 surrounding the display area 101, wherein organic light-emitting diodes are formed in the display area 101 to display images. Furthermore, the display device 10 also includes a driver 500 formed on one side.

[0056] According to the embodiment, a plurality of pixels for displaying images are formed in the display area 101, and each pixel includes an organic light-emitting diode. Figure 1 A pixel opening 165 (hereinafter referred to as the first opening) is shown, which corresponds to an organic light-emitting diode, and since light is emitted through the pixel opening 165, one pixel opening 165 corresponds to one pixel.

[0057] Reference Figure 2 According to an embodiment, a pixel opening 165 is formed in a separator layer 160. The display panel 100 includes a substrate 110, an interlayer insulating layer 150 disposed on the substrate 110, and an organic light-emitting diode (OLED) disposed on the interlayer insulating layer 150. An anode 181 (hereinafter referred to as a first electrode), partially covered by the separator layer 160, an organic light-emitting layer 182 formed in the pixel opening 165 of the separator layer 160, and a cathode 183 (hereinafter referred to as a second electrode) covering the organic light-emitting layer 182, are disposed in the separator layer 160 along with an OLED. Here, the organic light-emitting layer 182 may further include at least one of an electron transport layer, an electron injection layer, a hole transport layer, and a hole injection layer.

[0058] According to the embodiment, pixel aperture 165 and organic light-emitting diode are formed in the display area 101 of display panel 100.

[0059] The following is for reference. Figure 2 The structure of the display panel 100 is described in more detail.

[0060] According to the embodiment, the anode 181 of the organic light-emitting diode receives current from the output terminal 171 of a transistor, and this transistor can be a driving transistor or a switching transistor. Furthermore, a driving voltage line 172 is provided on the same layer as the output terminal 171 of the transistor, through which the driving voltage is transmitted.

[0061] According to the implementation method, Figure 2 An anode 181 of an organic light-emitting diode and an output terminal 171 of a transistor are shown to be electrically connected through an opening in an interlayer insulating layer 150. The transistor's output terminal 171 and a drive voltage line 172 are disposed in a data conductive layer.

[0062] According to the implementation method, Figure 2An output terminal 171 and a drive voltage line 172 of a transistor are shown formed on a substrate 110. However, various other electrodes and semiconductor layers can be formed between the substrate 110 and the data conductive layer. For example, since a transistor includes a semiconductor layer, a gate electrode, and source and drain electrodes, at least one gate conductive layer and a semiconductor layer can be disposed between the substrate 110 and the data conductive layer. The substrate 110 can be formed of plastic, flexible polyimide (PI), or glass.

[0063] According to an embodiment, the organic light-emitting diode (OLED) and the separator layer 160 are covered by an encapsulation layer 190. The encapsulation layer 190 prevents external air or moisture from penetrating into the organic light-emitting layer 182 of the OLED. The encapsulation layer 190 includes at least one organic encapsulation layer 191 and at least one inorganic encapsulation layer 192. Although in Figure 2 Only one organic encapsulation layer 191 and one inorganic encapsulation layer 192 are shown in the illustration, but the implementation is not limited to this, and in other embodiments, another layer may be included, and an additional inorganic encapsulation layer may be further formed below the organic encapsulation layer 191. Here, the organic encapsulation layer 191 is formed of monomers, and the inorganic encapsulation layer 192 is formed of silicon nitride (SiN). x () Layer formation.

[0064] According to an embodiment, the encapsulation layer 190 is part of the display panel 100, and references Figure 2 A touch sensing layer 300 is formed on the display panel 100.

[0065] According to an embodiment, the touch sensing layer 300 includes a touch sensing insulating layer 301, a touch electrode 310, a touch electrode passivation layer 320, and a high refractive index layer 330.

[0066] According to the embodiment, the touch sensing layer 300 also includes a display area 101 and peripheral areas 102, 103 and 104 surrounding the display area 101, which correspond to the display area 101 and peripheral areas 102, 103 and 104 of the display panel 100, and the touch sensing layer 300 of the display area 101 senses touch by using touch electrodes 310.

[0067] According to an embodiment, a touch electrode passivation layer 320 is disposed on and covers the touch electrode 310, and has an opening 325 in the display area 101 of the touch sensing layer 300 that exposes the touch sensing insulating layer 301. The opening 325 may be referred to as an optical path control opening 325 or a second opening 325, and is wider than the pixel opening 165 while overlapping with the pixel opening 165.

[0068] According to an embodiment, a high refractive index layer 330 is formed on the touch electrode passivation layer 320 and within the optical path control opening 325. The high refractive index layer 330 is formed of a material having a higher refractive index than the touch electrode passivation layer 320. For example... Figure 2 As indicated by the arrow, light emitted by the organic light-emitting diode through the pixel opening 165 is reflected by the tilted surface of the touch electrode passivation layer 320, causing the light to be emitted in a direction substantially perpendicular to the front surface of the display device 10. In this case, if the total internal reflection condition is met, the light is totally internalized and emitted from the front surface of the display device 10. Since the light is dissipated while propagating to the sides in this manner, the light efficiency at the front is improved by 10-20%. Here, the high refractive index layer 330 is formed from a monomer.

[0069] According to the implementation method, peripheral regions 102, 103, and 104 are formed. Figure 1 The three regions are defined based on the structure of the touch electrode passivation layer 320 of the touch sensing layer 300. That is, referring to... Figure 3 Touch electrode passivation layers 320 of the touch sensing layer 300 are formed in portions of display area 101 and peripheral areas 102, 103, and 104, and the touch electrode passivation layer material (i.e., the material used for the touch electrode passivation layer 320) is not disposed in the opening area 103 of the peripheral areas 102, 103, and 104 to form a peripheral opening 326. The touch sensing insulating layer 301 is exposed in the opening area 103. In the two areas separated by the peripheral opening 326, area 102 is referred to as the outer dam area 102, and area 104 is referred to as the extension area 104.

[0070] According to the embodiment, a first dam structure is formed in the outer dam area 102. The first dam structure has the same material and the same height as the touch electrode passivation layer 320, and the first dam structure is disposed outside the opening area 103.

[0071] According to the embodiment, the extension region 104 is formed between the opening region 103 and the display region 101, and the touch electrode passivation layer 320 extends continuously from the display region 101 into the extension region 104.

[0072] According to one embodiment, the encapsulation layer 190 extends to the ends of the peripheral regions 102, 103, and 104. However, it has a structure in which the organic encapsulation layer 191 extends only to some areas of the peripheral regions 102, 103, and 104, and the inorganic encapsulation layer 192 extends to the ends of the remaining areas. According to another embodiment, the end portion of the organic encapsulation layer 191 can vary, but in this embodiment, the organic encapsulation layer 191 extends through the opening region 103 and the extension region 104 to a portion of the outer dam region 102, and the inorganic encapsulation layer 192 is disposed on its outer side. Figure 3 In the cross-section, only the portions forming both the organic encapsulation layer 191 and the inorganic encapsulation layer 192 are shown.

[0073] Reference Figure 2 and Figure 3 According to the embodiment, the high refractive index layer 330 is not formed in the peripheral regions 102, 103, and 104. In the display region 101, the high refractive index layer 330 is formed by inkjet printing to fill the optical path control opening 325, and since the material for the high refractive index layer 330 is not sprayed in the peripheral regions 102, 103, and 104, the high refractive index layer 330 is not formed in the peripheral regions 102, 103, and 104. However, when the material for the high refractive index layer 330 is actually sprayed, some material may flow toward the peripheral regions 102, 103, and 104. But even if the material for the high refractive index layer 330 is formed in a portion of the upper region of the extension region 104 or beyond the extension region 104, it is confined in the opening region 103, so that it does not form above or beyond the outer dam region 102. In this case, the material for the high refractive index layer 330 is formed on the extension region 104 of the peripheral regions 102, 103, and 104, or in the opening region 103. Figure 3 For clarity, the material used for the high refractive index layer 330 has been omitted.

[0074] According to the embodiment, if the material used for the high refractive index layer 330 is sprayed beyond the outer dam area 102, defects may occur in subsequent processes. That is, when the substrate 110 is subsequently cut, a laser is used to cut the substrate 110, and at this time, the material used for the high refractive index layer 330 may react with the laser and generate carbonized foreign matter that covers the alignment marks formed for substrate alignment, thereby causing misalignment.

[0075] According to the embodiment, in order to prevent this situation, an opening region 103 and an outer dam region 102 are formed in the touch electrode passivation layer 320 below the layer on which the material for the high refractive index layer 330 is formed, so that the material for the high refractive index layer 330 does not flow out of the outer dam region 102.

[0076] According to an embodiment, the touch electrode 310 is formed on the touch sensing insulating layer 301, and the touch sensing insulating layer 301 is made of silicon nitride (SiN). x )form.

[0077] According to the embodiment, the touch electrode 310 formed in the display area 101 of the touch sensing layer 300 is formed only in the area where the touch electrode passivation layer 320 is formed and is covered by the touch electrode passivation layer 320, and is not formed in the optical path control opening 325. As a result, the pixel opening 165 and the touch electrode 310 do not overlap.

[0078] exist Figure 2 In the embodiment, only one touch electrode 310 is shown, however, multiple touch electrodes 310 are formed, and according to the method of sensing touch, touch can be sensed by self-capacitance type or mutual capacitance type. In the self-capacitance type or mutual capacitance type, touch is sensed by two touch electrodes extending in directions that intersect each other.

[0079] According to the embodiment, the polarization layer 210 is disposed on the touch sensing layer 300, and the window 220 is attached by an adhesive layer 230 disposed on the polarization layer 210.

[0080] According to the embodiment, the polarization layer 210 prevents light incident from the outside from being reflected by the touch electrode 310 and recognized by the user, and the window 220 protects the touch sensing layer 300 and the display panel 100, and may have an additional coating if necessary.

[0081] According to one embodiment, the display device 10 further includes a driver 500 formed on one side of the display panel 100. The driver 500 is disposed on one side of the substrate 110 and drives pixels and senses touch. In addition, various pads to be connected to the driver 500 are formed in the periphery of the driver 500.

[0082] According to one embodiment, when the substrate 110 is flexible, the driver 500 is a driver chip directly attached to the substrate 110. Alternatively, according to another embodiment, another flexible substrate may be attached to one side of the substrate 110, and the driver chip may be formed on the flexible substrate.

[0083] Reference Figure 3 According to the embodiment, the polarizing layer 210, the adhesive layer 230, and the window 220 are also formed in the peripheral regions 102, 103, and 104. Specifically, when the polarizing layer 210 is disposed on the opening region 103, an empty space is formed in the peripheral opening 326 and filled with air. However, according to the embodiment, the material for the high refractive index layer 330 can be disposed in some regions of the peripheral opening 326.

[0084] Reference Figure 1 According to the embodiment, peripheral regions 102, 103 and 104 are formed along the periphery of the display device 10 and have an opening region 103 and an outer dam region 102. In addition, an extension region 104 extends from the edge of the display region 101 to the opening region 103, and a touch electrode passivation layer 320 is continuously formed from the display region 101 to the extension region 104.

[0085] In the following text, see references Figure 4 and Figure 5 describe Figure 1 Variations of the implementation method.

[0086] exist Figure 3 In this embodiment, since the standard used to divide the peripheral regions 102, 103 and 104 is based on the structure of the touch electrode passivation layer 320 of the touch sensing layer 300 rather than the structure of the display panel 100, the opening and the first dam structure are formed only in the touch sensing layer 300, and the opening does not extend into the peripheral regions 102, 103 and 104 of the display panel 100.

[0087] However, in Figure 4 and Figure 5 In one embodiment, an opening is formed in the peripheral regions 102, 103 and 104 of the display panel 100.

[0088] Figure 4 and Figure 5 It is based on Figure 3 A cross-sectional view of a variation of the implementation method.

[0089] First, description Figure 4 The implementation method.

[0090] exist Figure 4 In the implementation method, with Figure 3 The implementation method is different. An opening 166 (hereinafter referred to as the peripheral opening of the partition layer) corresponding to the opening area 103 is formed in the partition layer 160 of the display panel 100.

[0091] According to the embodiment, the mask used when forming the peripheral opening 326 in the touch electrode passivation layer 320 is the same as the mask used when forming the peripheral opening 166 in the separator layer 160, which reduces manufacturing costs. As a result, in Figure 4 In the opening area 103, the position of the outer opening 326 coincides with the position of the outer opening 166 of the partition layer.

[0092] like Figure 4 As shown, according to an embodiment, the organic encapsulation layer 191 of the encapsulation layer 190 is disposed within and fills the peripheral opening 166 of the separator layer. However, the embodiment is not limited to this, and in other embodiments, the inorganic encapsulation layer 192, instead of the organic encapsulation layer 191, is disposed in the peripheral opening 166 of the separator layer.

[0093] Next, the description Figure 5 The implementation method.

[0094] exist Figure 5 In the implementation method, with Figure 4 The implementation method is different. Instead of forming an opening in the partition layer 160 of the display panel 100, an opening 156 is formed in the outer periphery of the interlayer insulating layer 150.

[0095] According to the embodiment, the mask used when forming the peripheral opening 326 in the touch electrode passivation layer 320 is the same mask used when forming the peripheral opening 156 in the interlayer insulating layer 150, in order to reduce manufacturing costs. As a result, as Figure 5 As shown, within the opening region 103, the position of the peripheral opening 326 coincides with the position of the peripheral opening 156 of the interlayer insulation layer.

[0096] like Figure 5 As shown, according to an embodiment, the separator 160 is disposed within and fills the outer opening 156 of the interlayer insulation layer.

[0097] and Figure 4 and Figure 5 Similarly, openings 156 and 166 are formed in the display panel 100 to prevent organic material from overflowing out of the outer dam area 102 through the opening area 103 when the display panel 100 and the touch sensing layer 300 are formed by inkjet method. Figure 4 The implementation method prevents material used for the organic encapsulation layer 191 from flowing through the outer dam area 102, while Figure 5 The implementation method prevents the material used for the separator layer 160 from flowing through the outer dam area 102. Due to this structure, even when organic material sprayed by inkjet method flows into the peripheral area, it prevents the organic material from reacting with the laser, thereby preventing the generation of carbonized foreign matter and not covering the alignment marks formed for substrate alignment.

[0098] The above text has already referenced Figure 1 An implementation of an opening region 103 is described.

[0099] Next, refer to Figures 6 to 10 Describe an implementation method that forms two opening zones and has two dam structures.

[0100] First, refer to Figures 6 to 8 Describe an implementation with two dams and two opening zones.

[0101] Figure 6 This is a schematic front view of a display device according to another embodiment. Figure 7 yes Figure 6 A magnified view of a portion, and Figure 8 It is along Figure 7 A sectional view taken from line VIII-VIII.

[0102] exist Figure 6 In the implementation method, the peripheral regions 102, 103, 104, 105, and 106 are... Figure 1The difference between the outer regions 102, 103 and 104 is that there are two dam areas 102 and 105 and two opening areas 103 and 106.

[0103] according to Figure 6 The peripheral regions 102, 103, 104, 105, and 106 of the implementation include an outer dam region 102, an opening region 103, an inner dam region 105, an additional opening region 106, and an extension region 104. The extension region 104 is the space located between the display region 101 and the additional opening region 106.

[0104] according to Figure 6 The implementation method, and Figure 1 Compared to the previous implementation, the inner dam area 105 and the additional opening area 106 are additionally formed between the extension area 104 and the opening area 103.

[0105] According to the embodiment, the additional opening area 106 is disposed between the opening area 103 and the extension area 104, and is an area where the touch electrode passivation layer 320 is not formed.

[0106] According to the embodiment, the inner dam area 105 is disposed outside the additional opening area 106 and forms a second dam structure, which is formed of the same material as the touch electrode passivation layer 320 and has the same height as the touch electrode passivation layer 320.

[0107] exist Figure 6 In the implementation method, the display area 101 and Figure 2 The same applies to the display area 101. Pixel openings 165 are formed in the touch electrode passivation layer 320, and a high refractive index layer 330 is disposed in and fills the pixel openings 165. As a result, light emitted by the organic light-emitting diode through the pixel openings 165 encounters the slope of the touch electrode passivation layer 320 and is reflected, causing the light to be emitted in a direction substantially perpendicular to the front surface of the display device 10. Since more light is emitted perpendicular to the front surface in this manner, less light is emitted to the sides, which improves the light efficiency at the front surface.

[0108] Figure 6 The embodiment illustrates the structure of the touch electrode passivation layer 320 of the touch sensing layer 300 in the peripheral regions 102, 103, 104, 105, and 106, and also shows the region before laser cutting. Figure 7 In the image, the dashed line indicates the portion that was laser-cut.

[0109] exist Figure 6 In this implementation, the peripheral regions 102, 103, 104, 105, and 106 form five zones, and the classification of these zones is based on the structure of the touch electrode passivation layer 320 of the touch sensing layer 300. That is, referring to... Figures 6 to 8Touch electrode passivation layers 320 of the touch sensing layer 300 are formed in portions of display area 102, 104, and 105 of peripheral areas 102, 103, 104, 105, and 106. The touch electrode passivation layers 320 are not formed in the opening area 103 or the additional opening area 106 disposed between the opening area 103 and the extension area 104, thereby forming a peripheral opening 326 and an additional peripheral opening 327. The touch sensing insulating layer 301 is exposed in the opening area 103 and the additional opening area 106. An outer dam area 102 is positioned outward from the peripheral opening 326, an inner dam area 105 is positioned between the peripheral opening 326 and the additional peripheral opening 327, and an extension area 104 is positioned between the additional peripheral opening 327 and the display area 101.

[0110] Reference Figure 7 According to the embodiment, the area to be cut and removed is located outside the outer dam area 102, and the touch electrode passivation layer 320 is also formed in this area and subsequently removed in the cutting process.

[0111] Reference Figure 8 According to the embodiment, the high refractive index layer 330 is not formed in the peripheral regions 102, 103, 104, 105, and 106. That is, by inkjet printing, the material for the high refractive index layer 330 is not sprayed onto the peripheral regions 102, 103, 104, 105, and 106. However, the material for the high refractive index layer 330 may flow from the display region 101 to the peripheral regions 102, 103, 104, 105, and 106. In this case, in the peripheral regions 102, 103, 104, 105, and 106, due to the presence of two openings 326 and 327 and the two regions 102 and 105 in which two dam structures are formed, even if the material for the high refractive index layer 330 is formed in or through some of the extension regions 104, the material is confined within the two openings 326 and 327, so that no material is formed above or beyond the outer dam region 102. In this case, in the peripheral regions 102, 103, 104, 105, and 106, the material for the high refractive index layer 330 is formed on the extension region 104, within the additional opening region 106, above the inner dam region 105, or within the opening region 103. Figure 8 For clarity, the material used for the high refractive index layer 330 has been omitted.

[0112] According to the embodiment, if the material used for the high refractive index layer 330 flows through the outer dam region 102, defects may occur in subsequent processes. That is, such as... Figure 7 As shown, when using a laser to cut the substrate along the cutting line (see...) Figure 8When “110” is used, the material used for the high refractive index layer 330 may react with the laser to generate carbonized foreign matter, which covers the alignment marks formed for substrate alignment, and as a result, misalignment may occur.

[0113] To prevent this from happening, in this embodiment, two dam structures and two openings 326 and 327 are formed in the inner dam region 105, outer dam region 102, opening region 103 and additional opening region 106, in the layer of the touch electrode passivation layer 320 and below the layer of the high refractive index layer 330, so that the material for the high refractive index layer 330 does not flow through the outer dam region 102.

[0114] According to an embodiment, the touch sensing insulating layer 301 is disposed below the touch electrode passivation layer 320 and is made of silicon nitride (SiN). x It is formed and exposed by two openings 326 and 327 located in opening region 103 and additional opening region 106, respectively.

[0115] Reference Figure 8 According to the embodiment, polarization layer 210 and window 220 are also formed in peripheral regions 102, 103, 104, 105 and 106. In particular, when polarization layer 210 is provided on opening region 103 and additional opening region 106, empty spaces are formed in peripheral opening 326 and additional peripheral opening 327, and these empty spaces are filled with air.

[0116] However, according to the implementation, the material used for the high refractive index layer 330 can flow to be disposed in some areas of the peripheral opening 326.

[0117] Furthermore, according to an embodiment, the encapsulation layer 190 extends to the ends of the peripheral regions 102, 103, 104, 105, and 106. Figure 8 In this embodiment, the organic encapsulation layer 191 extends through the additional opening region 106 and the extension region 104 to the inner dam region 105, and the inorganic encapsulation layer 192 extends to cover the remaining areas of the inner dam region 105, the outer dam region 102, and the opening region 103. In addition to the organic encapsulation layer 191, the inorganic encapsulation layer 192 and the touch-sensing insulating layer 301 have a stepped structure with steps. However, the embodiment is not limited to this, and the organic encapsulation layer 191 may be formed in portions of the peripheral regions 102, 103, 104, 105, and 106.

[0118] Reference Figure 6According to the embodiment, peripheral regions 102, 103, 104, 105, and 106 are positioned along the periphery of the display device 10 and have two opening regions (opening region 103 and additional opening region 106) and two dam regions (inner dam region 105 and outer dam region 102). Furthermore, an extension region 104 extends outside the display region 101 to the additional opening region 106, and a touch electrode passivation layer 320 extends continuously from the display region 101 to the extension region 104.

[0119] like Figure 6 As shown, according to an embodiment, the dimensions of the peripheral regions 102, 103, 104, 105, and 106 located outside the display device 10 vary depending on the structure of the display device 10. Figure 6 The diagram shows a structure in which the driver 500 is disposed on the lower side of the display device 10, and thus the display device 10 has a wide peripheral region 102, 103, 104, 105 and 106.

[0120] Reference Figure 7 According to the embodiment, the widths of the outer dam area 102, the opening area 103, the inner dam area 105, and the additional opening area 106 are represented by A, B, C, and D, respectively. The width of each area varies depending on whether the area is on the upper, left, right, or lower side of the display device 10, and according to... Figure 6 The width of each region in the implementation is shown in Table 1 below.

[0121] (Table 1)

[0122]

[0123] Here, the references to the left, right, top, and bottom are based on Figure 6 .

[0124] On the other hand, Table 1 does not show the width of the extension area 104. However, according to the embodiment, the extension area 104 extending from the display area 101 is where wiring connected to the display area 101 is formed, and has a different width depending on the number of wirings, and has a width of 200-300 μm according to the embodiment.

[0125] According to the implementation method, the values ​​presented in Table 1 are for Figure 11 The actual experimental values, and in the following... Figure 11 In the process of forming a high refractive index layer 330, the material used for the high refractive index layer 330 does not extend beyond the outer regions 102, 103, 104, 105 and 106.

[0126] According to the implementation, the width A of the outer dam region 102 can be 300μm to 600μm, the width B of the opening region 103 can be 20μm to 200μm, the width C of the inner dam region 105 can be 20μm to 100μm, and the width D of the additional opening region 106 can be 50μm to 200μm.

[0127] Specifically, according to the embodiment, the widths of the peripheral regions 102, 103, 104, 105, and 106 positioned below the display area 101 are the same as or greater than the widths of the other peripheral regions 102, 103, 104, 105, and 106. Figure 7 In this embodiment, the width of the opening region 103 that ultimately blocks the material for the high refractive index layer 330 is greatest at the lower side, thereby creating a configuration that prevents the inflow of material for the high refractive index layer 330 to protect the driver 500, the pads attached to the driver 500, and the wiring located at the lower side.

[0128] Next, use Figure 9 and Figure 10 describe Figure 8 Variations of the implementation method.

[0129] exist Figure 8 In this embodiment, the peripheral regions 102, 103, 104, 105, and 106 are classified based on the structure of the touch electrode passivation layer 320 of the touch sensing layer 300 rather than on the structure of the display panel 100. That is, the peripheral opening 326 and the additional peripheral opening 327 are located where the touch electrode passivation layer 320 is not formed, to form the opening region 103 and the additional opening region 106, respectively, and the inner dam region 105, the outer dam region 102, and the extension region 104 are formed in the remaining regions.

[0130] In this embodiment, the opening does not extend into the peripheral areas 102, 103, 104, 105 and 106 of the display panel 100.

[0131] However, in Figure 9 and Figure 10 In one embodiment, two openings are formed in the peripheral regions 102, 103, 104, 105 and 106 of the display panel 100, respectively.

[0132] Figure 9 and Figure 10 It is based on Figure 8 A cross-sectional view of a variation of the implementation method.

[0133] First, description Figure 9 The implementation method.

[0134] exist Figure 9 In the implementation method, with Figure 8 The implementation methods differ, and the partition layer 160 of the display panel 100 includes an opening 166 (referred to as the partition layer peripheral opening) corresponding to the opening area 103 and an opening 167 (referred to as the additional partition layer peripheral opening) corresponding to the additional opening area 106.

[0135] According to the embodiment, the mask used when forming the peripheral opening 326 and the additional peripheral opening 327 in the touch electrode passivation layer 320 is the same as the mask used when forming the separator layer peripheral opening 166 and the additional separator layer peripheral opening 167 in the separator layer 160, which reduces manufacturing costs. As a result, as Figure 9 As shown, the position of the outer perimeter opening 326 and the position of the outer perimeter opening 166 of the partition layer coincide within the opening area 103, and the position of the additional outer perimeter opening 327 and the position of the additional partition layer outer perimeter opening 167 coincide within the additional opening area 106.

[0136] like Figure 9 As shown, according to an embodiment, the encapsulation layer 190 is disposed within the peripheral opening 166 of the separator layer and the peripheral opening 167 of the additional separator layer, and extends from the extension region 104 into the outer dam region 102. In this embodiment, as... Figure 9 As shown, the organic encapsulation layer 191 is disposed within the peripheral opening 167 of the additional separator layer, but does not extend into the peripheral opening 166 of the separator layer, and the inorganic encapsulation layer 192 extends into the outer dam region 102. However, the implementation is not limited to this, and in other embodiments, only the inorganic encapsulation layer 192 is provided without the organic encapsulation layer 191.

[0137] Next, the description Figure 10 The implementation method.

[0138] exist Figure 10 In the implementation method, with Figure 9 The implementation method is different. Instead of forming an opening in the partition layer 160 of the display panel 100, an interlayer insulating layer peripheral opening 156 and an additional interlayer insulating layer peripheral opening 157 are formed in the lower interlayer insulating layer 150.

[0139] According to the embodiment, the mask used when forming the peripheral opening 326 and the additional peripheral opening 327 in the touch electrode passivation layer 320 is the same as the mask used when forming the interlayer insulating layer peripheral opening 156 and the additional interlayer insulating layer peripheral opening 157 in the interlayer insulating layer 150, which reduces manufacturing costs. As a result, as Figure 10 As shown, the position of the peripheral opening 326 and the position of the peripheral opening 156 of the interlayer insulation layer coincide within the opening area 103, and the position of the additional peripheral opening 327 and the position of the additional interlayer insulation layer peripheral opening 157 coincide within the additional opening area 106.

[0140] like Figure 10 As shown, according to the embodiment, the separator layer 160 is disposed within and fills the outer opening 156 of the interlayer insulation layer and the outer opening 157 of the additional interlayer insulation layer.

[0141] exist Figure 9 and Figure 10 In this embodiment, during the formation of the display panel 100 and the touch sensing layer 300, openings 156, 157, 166, and 167 are formed in the display panel 100 to prevent organic material sprayed by the inkjet method from overflowing from the opening area 103 into the outer dam area 102. When the organic material sprayed by the inkjet method flows out of the outer dam area 102, the organic material may react with the laser and form carbonized foreign matter, and this carbonized foreign matter may block the alignment marks formed for aligning the substrate, which may lead to misalignment.

[0142] According to the implementation method, refer to Figures 11 to 13 Description check Figure 6 The result of whether the material used for the high refractive index layer 330 is properly blocked in the implementation method.

[0143] Figures 11 to 13 This illustrates that the material according to this embodiment does not flow out of the dam.

[0144] First, according to the implementation method, Figure 11 The values ​​shown represent the width and correspond to the values ​​on the left and right sides of Table 1 above. Therefore, in Figure 11 The image shows the peripheral areas 102, 103, 104, 105 and 106 on the left or right side of the display device 10.

[0145] exist Figure 11 In the diagram, YPVX represents the touch electrode passivation layer 320, and SiN... x This indicates the exposed touch-sensing insulating layer 301 in an embodiment where the touch-sensing insulating layer 301 is formed of silicon nitride. That is, in... Figure 11 In the middle, the outer dam area 102 is shown by the second dam (YPVX) and 380μm, and the opening area 103 is made of SiN. x The inner dam region 105 is shown at 50 μm and 40 μm, respectively, and the additional opening region 106 is shown at 40 μm, respectively, and is made of SiN. x And 100μm are shown.

[0146] exist Figure 11 In the embodiment, in the additional opening region 106 (SiN) xThe shape of the HRF material flow was captured in a 100 μm image, where HRF material is a high refractive index film and refers to the material used for the high refractive index layer 330. That is, although the material used for the high refractive index layer 330 flows in the additional opening region 106, the material used for the high refractive index layer 330 does not appear in the opening region 103. As a result, it can be confirmed that the material does not overflow the inner dam region 105 where the dam is provided, and no material used for the high refractive index layer 330 passes through the opening region 103 and exceeds the outer dam region 102; therefore, no carbonized foreign matter appears during laser cutting.

[0147] According to the implementation method, Figure 12 It shows that by like Figure 11 The results were obtained by photographing each part of the display device 10 to confirm that the material did not spill out of any part of the inner dam area 105 where the dam was located.

[0148] Figure 13 This is a photograph of a display device according to another embodiment, and it confirms that the material used for the high refractive index layer 330 does not flow into the opening region 103 between the outer dam region 102 and the inner dam region 105. As a result, no material used for the high refractive index layer 330 flows beyond the outer dam region 102, and therefore no carbonized foreign matter is generated during laser cutting.

[0149] like Figures 11 to 13 As confirmed, according to the embodiment, it was identified that no material for the high refractive index layer 330 flowed into the opening region 103 after overflowing the inner dam region 105. Therefore, according to the embodiment, an opening region 103 and a dam structure are formed, and thus, in Figures 1 to 5 In the embodiment having an opening region 103 and a dam structure, no material for the high refractive index layer 330 flows out of the outer dam region 102, and no carbonized foreign matter is generated when laser cutting is performed.

[0150] In the following text, refer to Figure 14 and Figure 15 Variations describing implementations of dam structures formed in the outer dam area 102 or the inner dam area 105.

[0151] Figure 14 and Figure 15 A variation of the dam structure according to the implementation method is shown.

[0152] first, Figure 14An embodiment is shown in which the inner wall surface of the dam structure between the outer dam region 102 and the opening region 103, and between the inner dam region 105 and the additional opening region 106, has a structure in which protruding portions and recessed portions are repeatedly formed. The structure of the dam including the protruding portions (hereinafter also referred to as inner protruding portions) prevents the material for the high refractive index layer 330 from flowing across the dam, while the protruding portions and recessed portions increase the surface tension when the material for the high refractive index layer 330 flows from the inside. Figure 14 A relatively large inner protrusion is shown, but the inner protrusion can be much smaller. The extent and size of the protrusion can vary depending on the implementation. Furthermore, with... Figure 14 Unlike other features, the protruding portion can have an oscillating curve structure instead of a square wave shape. According to the implementation, the recessed portion can also have an oscillating curve shape.

[0153] Figure 14 One embodiment shows a structure in which the protrusion is included in both the outer dam area 102 and the inner dam area 105; however, according to other embodiments, the inner wall surface has a protrusion only in one of the two dam structures.

[0154] also, Figure 1 The implementation method can be transformed into an implementation method in which the inner wall surface of the outer dam area 102 has a protruding portion.

[0155] Next, Figure 15 An embodiment of the dam structure is shown, wherein a dam opening 328 is additionally formed in the dam structure. The dam opening 328 is formed on the upper surface of the dam structure in dam areas 102 and 105, and even if material for the high refractive index layer 330 overflows the dam structure, the material for the high refractive index layer 330 is trapped inside the dam opening 328, so that the material does not flow outward.

[0156] Figure 15 Only a simple rectangle (especially a rectangular column structure) is shown as the form of dam opening 328, but the implementation is not limited to this, and in other implementations, dam opening 328 can have various other structures, such as cylinders.

[0157] Furthermore, according to the embodiment, the depth of the dam opening 328 can be varied. That is, the depth of the dam opening 328 can be the same as the height of the dam structure, thereby exposing the underlying touch-sensing insulating layer 301. Alternatively, the lower portion of the dam opening 328 can be blocked, so that the touch-sensing insulating layer 301 is not exposed, and in this case, the height of the dam opening 328 can be varied.

[0158] also, Figure 15An embodiment is shown in which the size of the dam opening 328 formed in the outer dam area 102 is different from the size of the dam opening 328 formed in the inner dam area 105. The two dam openings 328 do not need to be the same in size, and may differ in shape, size, and depth.

[0159] Figure 15 The embodiment shown illustrates a structure in which dam opening 328 is included in both the outer dam area 102 and the inner dam area 105. However, the embodiment is not limited to this, and in another embodiment, only one of the two dams has an opening.

[0160] Next, refer to Figures 16 to 18 Description of the material used for the high refractive index layer 330, depending on Figure 14 and Figure 15 The blocking characteristics of the dam structure in the implementation method.

[0161] Figures 16 to 18 This shows that whether material flows through the dam depends on the dam structure.

[0162] and Figure 1 and Figure 6 The implementation method is similar. Figure 16 This is a photograph showing an embodiment in which the dam structure has a rod shape; with Figure 14 similar, Figure 17 It is a photograph showing the dam structure with additional internal protrusions; and with Figure 15 similar, Figure 18 It is a photograph showing a dam structure with dam openings.

[0163] According to the implementation method, Figure 16 The material used for the high refractive index layer 330 is shown to extend beyond the dam structure and to be positioned within the opening area. Figure 17 It is shown that the material for the high refractive index layer 330 is formed in most of the opening region and beyond the dam structure, thus showing that the blocking ability of the material for the high refractive index layer 330 is lower than that of the dam with the rod structure for the material for the high refractive index layer 330.

[0164] Reference Figure 18 According to the implementation method, the material of the high refractive index layer 330 does not flow through the dam structure. Therefore, it can be seen that in the three implementation methods, Figure 18 The dam structure has the strongest ability to block materials used in the high-refractive-index layer 330. However, Figure 18 The diagram shows that the dam structure is wide to form an opening in the dam.

[0165] Although embodiments of this disclosure have been described in conjunction with embodiments currently considered practical embodiments, it should be understood that embodiments of this disclosure are not limited to those disclosed. Rather, it is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.

Claims

1. A display device, comprising: A display panel includes a display area and a peripheral area surrounding the display area. The display area includes a partition layer, and the partition layer includes a first opening through which light is emitted from an organic light-emitting diode. Touch electrodes are disposed on the display panel; A touch electrode passivation layer covers the touch electrode and includes a second opening corresponding to the first opening; A high refractive index layer covers the touch electrode passivation layer and the second opening; as well as A window is provided on the high refractive index layer. The touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral region, wherein the touch electrode passivation layer is not formed in the opening region, and The window is disposed on the opening area of ​​the passivation layer of the touch electrode.

2. The display device according to claim 1, further comprising: The outer dam region is formed in the peripheral region outside the opening region of the touch electrode passivation layer, wherein, The outer dam area includes a first dam structure, which is formed of the same material as the touch electrode passivation layer and has the same height as the touch electrode passivation layer.

3. A display device, comprising: A display panel includes a display area and a peripheral area surrounding the display area. The display area includes a partition layer, and the partition layer includes a first opening through which light is emitted from an organic light-emitting diode. Touch electrodes are disposed on the display panel; A touch electrode passivation layer covers the touch electrode and includes a second opening corresponding to the first opening; A high refractive index layer covers the touch electrode passivation layer and the second opening; as well as The outer dam area is formed in the peripheral region outside the opening area of ​​the passivation layer of the touch electrode. The touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral region, wherein the touch electrode passivation layer is not formed in the opening region. The outer dam area includes a first dam structure, which is formed of the same material as the touch electrode passivation layer and has the same height as the touch electrode passivation layer. The first dam structure formed in the outer dam area further includes an inner protruding portion, or the first dam structure formed in the outer dam area further includes a dam opening formed on the upper surface of the first dam structure.

4. The display device according to claim 2, further comprising: An extension area is formed in the peripheral region between the display area and the opening area of ​​the touch electrode passivation layer.

5. The display device according to claim 4, wherein, The display panel further includes an encapsulation layer covering the organic light-emitting diode and the first opening, and The encapsulation layer includes at least one organic encapsulation layer and at least one inorganic encapsulation layer.

6. A display device, comprising: A display panel includes a display area and a peripheral area surrounding the display area. The display area includes a partition layer, and the partition layer includes a first opening through which light is emitted from an organic light-emitting diode. Touch electrodes are disposed on the display panel; A touch electrode passivation layer covers the touch electrode and includes a second opening corresponding to the first opening; A high refractive index layer covers the touch electrode passivation layer and the second opening; The outer dam area is formed outside the opening area of ​​the passivation layer of the touch electrode in the peripheral area, and An extension region is formed in the peripheral region between the display area and the opening region of the touch electrode passivation layer. The touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral region, wherein the touch electrode passivation layer is not formed in the opening region. The outer dam area includes a first dam structure, which is formed of the same material as the touch electrode passivation layer and has the same height as the touch electrode passivation layer. The display panel further includes an encapsulation layer covering the organic light-emitting diode and the first opening, and The encapsulation layer includes at least one organic encapsulation layer and at least one inorganic encapsulation layer. The display panel further includes an interlayer insulating layer disposed below the organic light-emitting diode, and The partition layer also includes a partition layer periphery opening located in the peripheral region corresponding to the opening area, or The interlayer insulation layer includes an interlayer insulation layer peripheral opening located in the peripheral region that corresponds to the opening region.

7. A display device, comprising: A display panel includes a display area and a peripheral area surrounding the display area. The display area includes a partition layer, and the partition layer includes a first opening through which light is emitted from an organic light-emitting diode. Touch electrodes are disposed on the display panel; A touch electrode passivation layer covers the touch electrode and includes a second opening corresponding to the first opening; A high refractive index layer covers the touch electrode passivation layer and the second opening; as well as The outer dam area is formed in the peripheral region outside the opening area of ​​the passivation layer of the touch electrode. The touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral region, wherein the touch electrode passivation layer is not formed in the opening region. The outer dam area includes a first dam structure, which is formed of the same material as the touch electrode passivation layer and has the same height as the touch electrode passivation layer. The display device further includes: An extension region is formed in the peripheral region between the display area and the opening region of the touch electrode passivation layer; and An additional opening area is located in the peripheral region between the extension area and the opening area. Wherein, the passivation layer of the touch electrode is not formed in the additional opening region, and The display device further includes: The inner dam region is located in the peripheral region outside the additional opening region of the touch electrode passivation layer; The inner dam area includes a second dam structure, which is formed of the same material as the touch electrode passivation layer and has the same height as the touch electrode passivation layer.

8. The display device according to claim 7, wherein, The second dam structure also includes an internally projecting portion, or The second dam structure also includes a dam opening formed on the upper surface of the second dam structure.

9. The display device according to claim 7, wherein, The display panel also includes an encapsulation layer covering the organic light-emitting diode and the first opening. The encapsulation layer includes at least one organic encapsulation layer and at least one inorganic encapsulation layer. The at least one organic encapsulation layer extends through the extension region and the additional opening region to at least a portion of the inner dam region, and The at least one inorganic encapsulation layer covers the opening area and extends through the inner dam area to the outer dam area.

10. The display device according to claim 7, wherein, The partition layer also includes a partition layer periphery opening located in the peripheral region corresponding to the opening area, or The partition layer also includes an additional partition layer peripheral opening located in the peripheral region that corresponds to the additional opening area.

11. The display device according to claim 7, further comprising: An interlayer insulating layer is disposed below the organic light-emitting diode. The interlayer insulation layer includes an interlayer insulation layer peripheral opening located in the peripheral region corresponding to the opening region, and... The interlayer insulation layer further includes an additional interlayer insulation layer peripheral opening located in the peripheral region, corresponding to the additional opening region.

12. A display device, comprising: A display panel includes a display area and a peripheral area surrounding the display area; The display panel includes: Substrate; and A separation layer is disposed on the substrate and has a first opening through which light is emitted from the organic light-emitting diode. Touch electrodes are disposed on the display panel; A touch electrode passivation layer covers the touch electrode and includes a second opening corresponding to the first opening; A high refractive index layer covers the touch electrode passivation layer and the second opening; and A window is provided on the high refractive index layer. The touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral region, wherein the touch electrode passivation layer is not formed in the opening region. The partition layer further includes a peripheral opening in the peripheral region corresponding to the opening area, and The window is disposed on the opening area of ​​the passivation layer of the touch electrode.

13. The display device according to claim 12, wherein, The opening area and the outer opening of the partition layer overlap each other in the plan view.

14. The display device according to claim 12, further comprising: An extension area is formed in the peripheral region between the display area and the opening area of ​​the touch electrode passivation layer.

15. A display device, comprising: A display panel includes a display area and a peripheral area surrounding the display area; The display panel includes: Substrate; and A separation layer is disposed on the substrate and has a first opening through which light is emitted from the organic light-emitting diode. Touch electrodes are disposed on the display panel; A touch electrode passivation layer, covering the touch electrode and including a second opening corresponding to the first opening; and A high refractive index layer covers the touch electrode passivation layer and the second opening. The touch electrode passivation layer includes an opening region formed in a portion corresponding to the peripheral region, wherein the touch electrode passivation layer is not formed in the opening region, and The partition layer further includes a peripheral opening in the peripheral region corresponding to the opening area. The display device further includes: An extension region is formed in the peripheral region between the display area and the opening region of the touch electrode passivation layer; and An additional opening area is located in the peripheral region between the extension area and the opening area; Wherein, the passivation layer of the touch electrode is not formed in the additional opening region, and The partition layer also includes an additional partition layer peripheral opening located in the peripheral region that corresponds to the additional opening area.

16. The display device according to claim 15, wherein, The additional opening area and the outer opening of the additional partition layer overlap each other in the plan view.

17. The display device according to claim 15, further comprising: The outer dam area is formed outside the opening area of ​​the touch electrode passivation layer in the peripheral region, and The inner dam area is located in the peripheral region outside the additional opening area of ​​the touch electrode passivation layer.

18. The display device according to claim 17, wherein, The outer dam area includes a first dam structure, which is formed of the same material as the touch electrode passivation layer and has the same height as the touch electrode passivation layer. The inner dam area includes a second dam structure, which is formed of the same material as the touch electrode passivation layer and has the same height as the touch electrode passivation layer.

19. The display device according to claim 18, wherein, The second dam structure also includes an internal protrusion.

20. The display device according to claim 18, wherein, The second dam structure also includes a dam opening formed on the upper surface of the second dam structure.

Images