Display substrate and manufacturing method thereof, and display device

Abstract

Provided are a display substrate and a manufacturing method thereof, and a display device. The display substrate comprises: a base substrate, a first insulating layer, a first electrode pattern, a connecting electrode pattern, a second electrode, a light-emitting functional layer, and a first filling layer; the first electrode pattern is located in a display area of ​​the display substrate, and the first electrode pattern comprises a plurality of first electrodes spaced apart from each other; the connecting electrode pattern is located in a peripheral area of ​​the display substrate; the second electrode is located in the display area and the peripheral area, and is connected to the connecting electrode pattern, and the second electrode and the first electrode pattern are spaced apart from each other; the light-emitting functional layer is located between the first electrode pattern and the second electrode; the first filling layer is located between the connecting electrode pattern and the first electrode pattern; the first electrode pattern and the connecting electrode pattern are located on a side of the first insulating layer away from the base substrate and are in contact with the first insulating layer respectively, the portion of the first insulating layer located between the first electrode pattern and the connecting electrode pattern has a groove, and the first filling layer is at least partially located in the groove.

Description

Technical Field

[0001] At least one embodiment of the present disclosure relates to a display substrate and a manufacturing method thereof, and a display device. Background Art

[0002] With the continuous development of the display device market, Organic Light Emitting Diode (OLED) displays have become one of the current mainstream display devices due to their advantages such as self-luminescence, high contrast, thin thickness, wide viewing angle, fast response speed, bendability and wide operating temperature range, and have become a research hotspot for major manufacturers.

[0003] An organic light emitting diode generally includes a first electrode, a second electrode and an organic electroluminescent element sandwiched between the two electrodes, the organic electroluminescent element includes a light emitting functional layer, the light emitting functional layer includes a light emitting layer, and the light emitting functional layer may also include at least one of a hole transport layer, a hole injection layer, an electron transport layer and an electron injection layer, and the organic electroluminescent unit may emit light under the electrical drive of the first electrode and the second electrode. Generally, the mainstream manufacturing process of the light emitting functional layer is to use a fine metal mask (FMM) to evaporate the light emitting functional layer, and use a sputtering process and an etching process to make the first electrode.

[0004] Based on the characteristics of AR / VR products, silicon-based OLEDs are required to have high resolution, which will bring higher process difficulty. Summary of the invention

[0005] At least one embodiment of the present disclosure relates to a display substrate and a manufacturing method thereof, and a display device.

[0006] In a first aspect, at least one embodiment of the present disclosure provides a display substrate, the display substrate comprising: a base substrate, a first insulating layer, a first electrode pattern, a connecting electrode pattern, a second electrode, a light-emitting functional layer and a first filling layer; the first insulating layer is located on the base substrate; the first electrode pattern is located in the display area of ​​the display substrate, the first electrode pattern comprises a plurality of first electrodes spaced apart from each other, and the first electrode is configured to receive a pixel driving signal; the connecting electrode pattern is located in the peripheral area of ​​the display substrate, the connecting electrode pattern surrounds the first electrode pattern; the second electrode is located in the display area and the peripheral area and is connected to the connecting electrode pattern, the second electrode is spaced apart from the first electrode pattern, and the second electrode is configured to receive a first power supply signal; the light-emitting functional layer is located between the first electrode pattern and the second electrode; the first filling layer is located between the connecting electrode pattern and the first electrode pattern; the first filling layer and the light-emitting functional layer are different layers; the first electrode pattern and the connecting electrode pattern are located on a side of the first insulating layer away from the base substrate and are in contact with the first insulating layer respectively, the portion of the first insulating layer located between the first electrode pattern and the connecting electrode pattern has a groove, and the first filling layer is at least partially located in the groove.

[0007] In a display substrate provided by an embodiment of the present disclosure, the first electrode pattern includes an edge first electrode close to the connecting electrode pattern, and the first filling layer is in contact with the connecting electrode pattern and the edge first electrode respectively.

[0008] In a display substrate provided by an embodiment of the present disclosure, the connection electrode pattern is ring-shaped.

[0009] In a display substrate provided by an embodiment of the present disclosure, the second electrode is in contact with the first filling layer.

[0010] In a display substrate provided in an embodiment of the present disclosure, the first filling layer includes an insulating layer.

[0011] In a display substrate provided by an embodiment of the present disclosure, the first filling layer includes at least one conductive filling part and at least one insulating filling part, the edge first electrode contacts the insulating filling part, and the edge first electrode and the conductive filling part are spaced apart from each other.

[0012] In a display substrate provided by an embodiment of the present disclosure, the first filling layer includes a plurality of conductive filling parts and a plurality of insulating filling parts, and the plurality of conductive filling parts and the plurality of insulating filling parts are alternately arranged.

[0013] In the display substrate provided by an embodiment of the present disclosure, at least two of the pattern density of the plurality of conductive filling portions, the pattern density of the connecting electrode patterns, and the pattern density of the first electrode patterns are the same.

[0014] The display substrate provided by an embodiment of the present disclosure further includes a pixel definition layer, wherein the pixel definition layer includes a plurality of pixel definition portions, and the pixel definition portions are located between adjacent first electrodes.

[0015] In a display substrate provided by an embodiment of the present disclosure, the first filling layer or at least one insulating filling portion in the first filling layer is located in the same layer as the pixel definition layer.

[0016] In a display substrate provided by an embodiment of the present disclosure, the first electrode pattern and the connecting electrode pattern are located in the same layer.

[0017] The display substrate provided by an embodiment of the present disclosure further includes a second filling layer, the second filling layer includes at least one second filling portion, the connecting electrode pattern includes a plurality of connecting electrodes, and the second filling portion is located between adjacent connecting electrodes.

[0018] In a display substrate provided in an embodiment of the present disclosure, the second filling layer includes an insulating layer.

[0019] In a display substrate provided by an embodiment of the present disclosure, the second filling layer and the first filling layer are located on the same layer.

[0020] In the display substrate provided in an embodiment of the present disclosure, the light-emitting functional layer is in contact with the first filling layer.

[0021] In a display substrate provided by an embodiment of the present disclosure, the light-emitting functional layer is in contact with a portion of the first filling layer.

[0022] In a display substrate provided in an embodiment of the present disclosure, the first electrode is an anode of the light-emitting element, and the second electrode is a cathode of the light-emitting element.

[0023] In a display substrate provided in an embodiment of the present disclosure, the base substrate includes a silicon wafer.

[0024] At least one embodiment of the present disclosure further provides a display device, comprising any display substrate described in the first aspect.

[0025] At least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, comprising: forming a first insulating layer on a base substrate; forming a first electrode pattern, the first electrode pattern being located in a display area of ​​the display substrate, the first electrode pattern comprising a plurality of first electrodes spaced apart from each other, the first electrode being configured to receive a pixel driving signal; forming a connecting electrode pattern, the connecting electrode pattern being located in a peripheral area of ​​the display substrate, the connecting electrode pattern surrounding the first electrode pattern; forming a second electrode, the second electrode being located in the display area and the peripheral area, the second electrode being connected to the connecting electrode pattern, the second electrode being spaced apart from the first electrode pattern, and the second electrode being configured to receive a first power supply signal; forming a light-emitting functional layer, the light-emitting functional layer being located between the first electrode pattern and the second electrode; and forming a first filling layer, the first filling layer being located between the connecting electrode pattern and the first electrode pattern; the first filling layer and the light-emitting functional layer being different layers, the first electrode pattern and the connecting electrode pattern being located on a side of the first insulating layer away from the base substrate and respectively contacting the first insulating layer, the portion of the first insulating layer located between the first electrode pattern and the connecting electrode pattern having a groove, and the first filling layer being at least partially located in the groove.

[0026] In a method for manufacturing a display substrate provided in an embodiment of the present disclosure, the first electrode pattern includes an edge first electrode close to the connecting electrode pattern, and the first filling layer is in contact with the connecting electrode pattern and the edge first electrode respectively.

[0027] In a method for manufacturing a display substrate provided by an embodiment of the present disclosure, the second electrode is in contact with the first filling layer.

[0028] The manufacturing method of the display substrate provided in an embodiment of the present disclosure further includes forming a pixel definition layer, the pixel definition layer includes a plurality of pixel definition parts, the first electrode pattern includes a plurality of first electrodes spaced apart from each other; the pixel definition parts are located between adjacent first electrodes.

[0029] In a method for manufacturing a display substrate provided by an embodiment of the present disclosure, the pixel definition layer and the first filling layer are formed by adopting the same patterning process, and the first electrode pattern and the connecting electrode pattern are formed by adopting the same patterning process.

[0030] In the manufacturing method of the display substrate provided by one embodiment of the present disclosure, forming the first filling layer includes forming at least one conductive filling part and forming at least one insulating filling part, and the first electrode pattern, the connecting electrode pattern and the at least one conductive filling part are formed by the same composition process; and the pixel definition layer and the at least one insulating filling part are formed by the same composition process.

[0031] A method for manufacturing a display substrate provided by an embodiment of the present disclosure also includes forming a second filling layer, the second filling layer includes at least one second filling portion, the connecting electrode pattern includes a plurality of connecting electrodes, and the second filling portion is located between adjacent connecting electrodes; the second filling layer is formed in the same composition process of forming the pixel definition layer and the at least one insulating filling portion.

[0032] In a second aspect, at least one embodiment of the present disclosure provides a display substrate, comprising: a first electrode pattern, a connecting electrode pattern, a second electrode and a light-emitting functional layer; the first electrode pattern is located in a display area of ​​the display substrate, and comprises a plurality of first electrodes spaced apart from each other, and the first electrodes are configured to receive pixel driving signals; the connecting electrode pattern is located in a peripheral area of ​​the display substrate, and comprises a plurality of connecting electrodes; the second electrode is located in the display area and the peripheral area, and is connected to the connecting electrode pattern, the second electrode is spaced apart from the first electrode pattern, and the second electrode is configured to receive a first power supply signal; the light-emitting functional layer is located between the first electrode pattern and the second electrode; the connecting electrode pattern surrounds the first electrode pattern, and at least two of the plurality of connecting electrodes are in the form of blocks spaced apart from each other.

[0033] The display substrate provided by an embodiment of the present disclosure further includes a base substrate and a first insulating layer located on the base substrate, and the first electrode pattern and the connecting electrode pattern are located on a side of the first insulating layer away from the base substrate and in contact with the first insulating layer.

[0034] In a display substrate provided in an embodiment of the present disclosure, a portion of the first insulating layer located between adjacent first electrodes has a first groove, a portion of the first insulating layer located between adjacent connecting electrodes has a second groove, and the first groove and the second groove are equal in size in a direction perpendicular to the base substrate.

[0035] In a display substrate provided in an embodiment of the present disclosure, a shape of the connecting electrode is the same as a shape of the first electrode.

[0036] In the display substrate provided in an embodiment of the present disclosure, the pattern density of the connecting electrode pattern is the same as the pattern density of the first electrode pattern.

[0037] The display substrate provided in one embodiment of the present disclosure also includes a first dummy electrode pattern, which includes a plurality of first dummy electrodes; the first dummy electrode pattern is located between the connecting electrode pattern and the first electrode pattern, and the shape of the first dummy electrode is the same as that of the first electrode.

[0038] In a display substrate provided by an embodiment of the present disclosure, a pattern density of the first dummy electrode pattern is the same as a pattern density of the first electrode pattern.

[0039] In the display substrate provided by an embodiment of the present disclosure, no via holes are provided in the portion of the first insulating layer overlapping with the plurality of first dummy electrodes in a direction perpendicular to the base substrate.

[0040] The display substrate provided in one embodiment of the present disclosure also includes a second dummy electrode pattern, which includes a plurality of second dummy electrodes; the second dummy electrode pattern is located on a side of the connecting electrode pattern away from the first electrode pattern, and the shape of the second dummy electrode is the same as that of the first electrode.

[0041] In a display substrate provided by an embodiment of the present disclosure, a pattern density of the second dummy electrode pattern is the same as a pattern density of the first electrode pattern.

[0042] In the display substrate provided by an embodiment of the present disclosure, no via holes are provided in a portion of the first insulating layer that overlaps with the plurality of second dummy electrodes in a direction perpendicular to the base substrate.

[0043] The display substrate provided by one embodiment of the present disclosure also includes an insulating filling layer, which covers the multiple first dummy electrodes. The multiple first dummy electrodes and the insulating filling layer constitute a first filling layer. The first electrode pattern includes an edge first electrode close to the connecting electrode, and the insulating filling layer is in contact with the connecting electrode and the edge first electrode, respectively.

[0044] In a display substrate provided by an embodiment of the present disclosure, the second electrode is in contact with the insulating filling layer.

[0045] In the display substrate provided by an embodiment of the present disclosure, the edge first electrode and the plurality of first dummy electrodes are insulated from each other.

[0046] The display substrate provided by an embodiment of the present disclosure further includes a pixel definition layer, wherein the pixel definition layer includes a plurality of pixel definition portions, and the pixel definition portions are located between adjacent first electrodes.

[0047] In the display substrate provided in an embodiment of the present disclosure, the insulating filling layer and the pixel definition layer are located on the same layer.

[0048] The display substrate provided by an embodiment of the present disclosure further includes a second filling layer, the second filling layer includes at least one second filling portion, and the second filling portion is located between adjacent connecting electrodes.

[0049] In a display substrate provided by an embodiment of the present disclosure, the second filling portions are in contact with the adjacent connecting electrodes respectively.

[0050] In a display substrate provided in an embodiment of the present disclosure, the second filling layer includes an insulating layer.

[0051] In the display substrate provided by an embodiment of the present disclosure, the second filling layer and the insulating filling layer are located on the same layer.

[0052] In the display substrate provided by an embodiment of the present disclosure, the insulating filling layer includes a plurality of insulating filling parts, and the insulating filling parts are located between adjacent first dummy electrodes.

[0053] In the display substrate provided in an embodiment of the present disclosure, the light-emitting functional layer is in contact with the first filling layer.

[0054] In a display substrate provided by an embodiment of the present disclosure, the light-emitting functional layer is in contact with a portion of the first filling layer.

[0055] In a display substrate provided by an embodiment of the present disclosure, the connection electrode pattern is ring-shaped.

[0056] In a display substrate provided in an embodiment of the present disclosure, the first electrode is an anode of the light-emitting element, and the second electrode is a cathode of the light-emitting element.

[0057] In a display substrate provided in an embodiment of the present disclosure, the base substrate includes a silicon wafer.

[0058] At least one embodiment of the present disclosure further provides a display device, comprising any display substrate in the second aspect described above.

[0059] At least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, comprising: forming a first electrode pattern, the first electrode pattern being located in a display area of ​​the display substrate and comprising a plurality of first electrodes spaced apart from each other, the first electrode being configured to receive a pixel driving signal; forming a connecting electrode pattern, the connecting electrode pattern being located in a peripheral area of ​​the display substrate and comprising a plurality of connecting electrodes; forming a second electrode, the second electrode being located in the display area and the peripheral area and connected to the connecting electrode pattern, the second electrode being spaced apart from the first electrode pattern, the second electrode being configured to receive a first power supply signal; and forming a light-emitting functional layer, the light-emitting functional layer being located between the first electrode pattern and the second electrode; the connecting electrode pattern surrounds the first electrode pattern, and at least two of the plurality of connecting electrodes are in the form of blocks spaced apart from each other.

[0060] In the method for manufacturing a display substrate provided in an embodiment of the present disclosure, the pattern density of the connecting electrode pattern is the same as the pattern density of the first electrode pattern.

[0061] A method for manufacturing a display substrate provided by an embodiment of the present disclosure also includes: forming a first dummy electrode pattern, the first dummy electrode pattern including a plurality of first dummy electrodes; the first dummy electrode pattern is located between the connecting electrode pattern and the first electrode pattern; the pattern density of the first dummy electrode pattern is the same as the pattern density of the first electrode pattern.

[0062] A method for manufacturing a display substrate provided by an embodiment of the present disclosure also includes forming an insulating filling layer, wherein the insulating filling layer covers the multiple first dummy electrodes, the multiple first dummy electrodes and the insulating filling layer constitute a first filling layer, the first electrode pattern includes an edge first electrode close to the connecting electrode, and the insulating filling layer is in contact with the connecting electrode and the edge first electrode, respectively.

[0063] The manufacturing method of the display substrate provided by one embodiment of the present disclosure also includes: forming a second dummy electrode pattern, wherein the second dummy electrode pattern includes a plurality of second dummy electrodes; the second dummy electrode pattern is located on a side of the connecting electrode pattern away from the first electrode pattern, and the pattern density of the second dummy electrode pattern is the same as the pattern density of the first electrode pattern.

[0064] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a pixel definition layer, wherein the pixel definition layer includes a plurality of pixel definition parts, and the pixel definition parts are located between adjacent first electrodes.

[0065] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a second filling layer, wherein the second filling layer includes at least one second filling portion, and the second filling portion is located between adjacent connecting electrodes.

[0066] The manufacturing method of the display substrate provided by an embodiment of the present disclosure also includes forming a first dummy electrode pattern, a second dummy electrode pattern, a pixel definition layer, an insulating filling layer and a second filling layer; the first dummy electrode pattern includes a plurality of first dummy electrodes, and the first dummy electrode pattern is located between the connecting electrode pattern and the first electrode pattern; the second dummy electrode pattern includes a plurality of second dummy electrodes; the second dummy electrode pattern is located on the side of the connecting electrode pattern away from the first electrode pattern, the pixel definition layer includes a plurality of pixel definition parts, and the pixel definition parts are located between adjacent first electrodes; the insulating filling layer covers the plurality of first dummy electrodes; the second filling layer includes at least one second filling part, and the second filling part is located between adjacent connecting electrodes; the pixel definition layer, the insulating filling layer and the second filling layer are formed by the same composition process; the first electrode pattern, the connecting electrode pattern, the first dummy electrode pattern and the second dummy electrode pattern are formed by the same composition process.

[0067] In a method for manufacturing a display substrate provided by an embodiment of the present disclosure, the insulating filling layer includes a plurality of insulating filling parts, and the insulating filling parts are located between adjacent first dummy electrodes.

[0068] In the third aspect, at least one embodiment of the present disclosure also provides a display substrate, comprising: a first electrode pattern, a connecting electrode pattern, a second electrode, a light-emitting functional layer and a first dummy electrode pattern; the first electrode pattern is located in the display area of ​​the display substrate, and comprises a plurality of first electrodes spaced apart from each other, and the first electrodes are configured to receive pixel driving signals; the connecting electrode pattern is located in the peripheral area of ​​the display substrate; the second electrode is located in the display area and the peripheral area, and is connected to the connecting electrode pattern, the second electrode is spaced apart from the first electrode pattern, and the second electrode is configured to receive a first power supply signal; the light-emitting functional layer is located between the first electrode pattern and the second electrode; the first dummy electrode pattern comprises a plurality of first dummy electrodes, the connecting electrode pattern surrounds the first electrode pattern, the first dummy electrode pattern is located between the connecting electrode pattern and the first electrode pattern, and at least two of the plurality of first dummy electrodes are in the form of blocks separated from each other.

[0069] The display substrate provided by an embodiment of the present disclosure also includes a base substrate and a first insulating layer located on the base substrate, and the first electrode pattern, the connecting electrode pattern and the first dummy electrode pattern are located on a side of the first insulating layer away from the base substrate and in contact with the first insulating layer.

[0070] In the display substrate provided by an embodiment of the present disclosure, no via holes are provided in the portion of the first insulating layer overlapping with the plurality of first dummy electrodes in a direction perpendicular to the base substrate.

[0071] In a display substrate provided by an embodiment of the present disclosure, the first dummy electrode is floating.

[0072] In a display substrate provided in an embodiment of the present disclosure, the connection electrode pattern includes a plurality of connection electrodes, and the connection electrodes are in a block shape.

[0073] In a display substrate provided by an embodiment of the present disclosure, a shape of the connecting electrode is the same as a shape of the first electrode, and a shape of the first dummy electrode is the same as a shape of the first electrode.

[0074] In the display substrate provided in an embodiment of the present disclosure, the pattern density of the connecting electrode pattern is the same as the pattern density of the first electrode pattern, and the pattern density of the first dummy electrode pattern is the same as the pattern density of the first electrode pattern.

[0075] The display substrate provided in an embodiment of the present disclosure further includes a second dummy electrode pattern, which includes a plurality of second dummy electrodes; the second dummy electrode pattern is located on a side of the connecting electrode pattern away from the first electrode pattern.

[0076] In the display substrate provided by an embodiment of the present disclosure, no via holes are provided in a portion of the first insulating layer that overlaps with the plurality of second dummy electrodes in a direction perpendicular to the base substrate.

[0077] In a display substrate provided by an embodiment of the present disclosure, the second dummy electrode is block-shaped, and the shape of the second dummy electrode is the same as that of the first electrode.

[0078] In a display substrate provided by an embodiment of the present disclosure, a pattern density of the second dummy electrode pattern is the same as a pattern density of the first electrode pattern.

[0079] In a display substrate provided by an embodiment of the present disclosure, at least one of a portion of the first insulating layer located between adjacent first electrodes and a portion of the first insulating layer located between adjacent connecting electrodes has a groove.

[0080] The display substrate provided by one embodiment of the present disclosure also includes an insulating filling layer, which covers the multiple first dummy electrodes. The multiple first dummy electrodes and the insulating filling layer constitute a first filling layer. The first electrode pattern includes an edge first electrode close to the connecting electrode, and the insulating filling layer is in contact with the connecting electrode and the edge first electrode, respectively.

[0081] In a display substrate provided by an embodiment of the present disclosure, the second electrode is in contact with the insulating filling layer.

[0082] In the display substrate provided by an embodiment of the present disclosure, the edge first electrode and the plurality of first dummy electrodes are insulated from each other.

[0083] The display substrate provided by an embodiment of the present disclosure further includes a pixel definition layer, wherein the pixel definition layer includes a plurality of pixel definition portions, and the pixel definition portions are located between adjacent first electrodes.

[0084] In the display substrate provided in an embodiment of the present disclosure, the insulating filling layer and the pixel definition layer are located on the same layer.

[0085] The display substrate provided by an embodiment of the present disclosure further includes a second filling layer, the second filling layer includes at least one second filling portion, and the second filling portion is located between adjacent connecting electrodes.

[0086] In a display substrate provided by an embodiment of the present disclosure, the second filling portions are in contact with the adjacent connecting electrodes respectively.

[0087] In a display substrate provided in an embodiment of the present disclosure, the second filling layer includes an insulating layer.

[0088] In the display substrate provided by an embodiment of the present disclosure, the second filling layer and the insulating filling layer are located on the same layer.

[0089] The display substrate provided by an embodiment of the present disclosure further includes a sensor electrode pattern, wherein the sensor electrode pattern includes a plurality of sensor electrodes; the sensor electrodes are block-shaped, and the sensor electrodes are configured to receive a detection driving signal.

[0090] In a display substrate provided by an embodiment of the present disclosure, a shape of the sensor electrode is the same as a shape of the first electrode.

[0091] In the display substrate provided by an embodiment of the present disclosure, the pattern density of the sensor electrode pattern is the same as the pattern density of the first electrode pattern.

[0092] The display substrate provided in an embodiment of the present disclosure further includes a third filling layer, the third filling layer includes a plurality of third filling portions, and the third filling portions are located between adjacent sensor electrodes, adjacent sensor electrodes and at least one of the first dummy electrodes.

[0093] In the display substrate provided in an embodiment of the present disclosure, the light-emitting functional layer is in contact with the first filling layer.

[0094] In a display substrate provided by an embodiment of the present disclosure, the light-emitting functional layer is in contact with a portion of the first filling layer.

[0095] In a display substrate provided by an embodiment of the present disclosure, the connection electrode pattern is ring-shaped.

[0096] In a display substrate provided in an embodiment of the present disclosure, the first electrode is an anode of the light-emitting element, and the second electrode is a cathode of the light-emitting element.

[0097] In a display substrate provided in an embodiment of the present disclosure, the base substrate includes a silicon wafer.

[0098] At least one embodiment of the present disclosure further provides a display device, comprising any display substrate described in the third aspect.

[0099] At least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, comprising: forming a first electrode pattern, the first electrode pattern is located in a display area of ​​the display substrate and includes a plurality of first electrodes spaced apart from each other, the first electrodes being configured to receive a pixel driving signal; forming a connecting electrode pattern, the connecting electrode pattern being located in a peripheral area of ​​the display substrate; forming a second electrode, the second electrode is located in the display area and the peripheral area and is connected to the connecting electrode pattern, the second electrode is spaced apart from the first electrode pattern, and the second electrode is configured to receive a first power supply signal; forming a light-emitting functional layer, the light-emitting functional layer is located between the first electrode pattern and the second electrode; and forming a first dummy electrode pattern, the first dummy electrode pattern including a plurality of first dummy electrodes; the connecting electrode pattern surrounds the first electrode pattern, the first dummy electrode pattern is located between the connecting electrode pattern and the first electrode pattern, and at least two of the plurality of first dummy electrodes are in the form of blocks spaced apart from each other.

[0100] In a method for manufacturing a display substrate provided by an embodiment of the present disclosure, the first dummy electrode is in a block shape, and a pattern density of the first dummy electrode pattern is the same as a pattern density of the first electrode pattern.

[0101] A method for manufacturing a display substrate provided by an embodiment of the present disclosure also includes: forming a second dummy electrode pattern, the second dummy electrode pattern including a plurality of second dummy electrodes; the second dummy electrode pattern is located on a side of the connecting electrode pattern away from the first electrode pattern, and the pattern density of the second dummy electrode pattern is the same as the pattern density of the first electrode pattern.

[0102] A method for manufacturing a display substrate provided by an embodiment of the present disclosure also includes forming an insulating filling layer, wherein the insulating filling layer covers the multiple first dummy electrodes, the multiple first dummy electrodes and the insulating filling layer constitute a first filling layer, the first electrode pattern includes an edge first electrode close to the connecting electrode, and the insulating filling layer is in contact with the connecting electrode and the edge first electrode, respectively.

[0103] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a sensor electrode pattern, wherein the sensor electrode pattern includes a plurality of sensor electrodes; the sensor electrodes are block-shaped, and the pattern density of the sensor electrode pattern is the same as the pattern density of the first electrode pattern.

[0104] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a pixel definition layer, wherein the pixel definition layer includes a plurality of pixel definition parts, and the pixel definition parts are located between adjacent first electrodes.

[0105] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a second filling layer, wherein the second filling layer includes at least one second filling portion, and the second filling portion is located between adjacent connecting electrodes.

[0106] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a third filling layer, the third filling layer including a plurality of third filling parts, the third filling parts being located between adjacent sensor electrodes, adjacent sensor electrodes and at least one of the first dummy electrodes.

[0107] The manufacturing method of the display substrate provided by an embodiment of the present disclosure also includes forming a second dummy electrode pattern, a sensor electrode pattern, a pixel definition layer, an insulating filling layer, a second filling layer and a third filling layer; the sensor electrode pattern includes a plurality of sensor electrodes; the second dummy electrode pattern includes a plurality of second dummy electrodes; the second dummy electrode pattern is located on the side of the connecting electrode pattern away from the first electrode pattern; the pixel definition layer includes a plurality of pixel definition parts, and the pixel definition parts are located between adjacent first electrodes; the insulating filling layer covers the plurality of first dummy electrodes; the second filling layer includes at least one second filling part, and the second filling part is located between adjacent connecting electrodes; the third filling layer includes a plurality of third filling parts, and the third filling part is located between adjacent sensor electrodes, adjacent sensor electrodes and at least one of the first dummy electrodes; the pixel definition layer, the insulating filling layer, the second filling layer and the third filling layer are formed by the same composition process; the first electrode pattern, the connecting electrode pattern, the first dummy electrode pattern, the second dummy electrode pattern and the sensor electrode pattern are formed by the same composition process.

[0108] In a manufacturing method provided by an embodiment of the present disclosure, the insulating filling layer includes a plurality of insulating filling parts, and the insulating filling parts are located between adjacent first dummy electrodes. BRIEF DESCRIPTION OF THE DRAWINGS

[0109] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, but are not intended to limit the present disclosure.

[0110] Figure 1 is a plan view schematic diagram of an organic light emitting diode display substrate;

[0111] FIG. 2A to FIG. 2D is a schematic diagram of a method for manufacturing a first electrode pattern in an organic light emitting diode display substrate;

[0112] Figure 3 is a plan view schematic diagram of an organic light emitting diode display substrate;

[0113] Figure 4 is a cross-sectional schematic diagram of an organic light emitting diode display substrate;

[0114] Figure 5A A cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0115] Figure 5B A cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0116] Fig. 6A A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0117] Figure 6B A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0118] Fig. 7A A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0119] Figure 7B A cross-sectional schematic diagram of a display substrate provided in an embodiment of the present disclosure

[0120] Fig. 8A A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0121] Figure 8B A cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0122] Fig. 9 A top view of a first electrode pattern, a connecting electrode pattern and a conductive filling portion in a display substrate provided in an embodiment of the present disclosure;

[0123] Fig.10 A top view of a first filling layer, a second filling layer, and a pixel definition layer in a display substrate provided in an embodiment of the present disclosure;

[0124] Fig.11 A schematic diagram of area division of a display substrate provided by an embodiment of the present disclosure;

[0125] Fig.12 A schematic top view of a display substrate provided in one embodiment of the present disclosure;

[0126] Fig.13A A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0127] Fig. 13B A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0128] Fig.14A A cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0129] Fig. 14B A cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0130] Fig.15 A top view of an insulating filling layer, a second filling layer and a pixel definition layer in a display substrate provided in an embodiment of the present disclosure;

[0131] Fig.16 A schematic diagram of area division of a display substrate provided by an embodiment of the present disclosure;

[0132] Fig.17A A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0133] Fig. 17B A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0134] Fig.18 A schematic cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0135] Fig.19 A top view of a structure formed by patterning a pixel definition film in a display substrate provided by an embodiment of the present disclosure;

[0136] Fig. 20 A cross-sectional view of a display substrate provided in one embodiment of the present disclosure;

[0137] Fig.21 A schematic diagram of a conductive film formed in a method for manufacturing a display substrate provided in an embodiment of the present disclosure;

[0138] Fig. 22 A schematic diagram of a pixel definition film formed in a method for manufacturing a display substrate provided in an embodiment of the present disclosure; and

[0139] Fig.23 A schematic diagram of the circuit principle of a silicon-based organic light-emitting display panel provided for some embodiments of the present disclosure. DETAILED DESCRIPTION

[0140] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0141] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, "include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0142] In the manufacturing process of the organic light emitting diode display device, the manufacturing process of the first electrode generally includes: forming a conductive layer on a base substrate by a sputtering process; forming a photoresist pattern on a side of the conductive layer away from the base substrate; etching the conductive layer using the photoresist pattern as a mask to form a first electrode pattern, and removing the photoresist pattern. For example, the material of the conductive layer includes indium tin oxide, but is not limited thereto.

[0143] During the research, the inventors of the present application found that in the process of etching the conductive layer, the display area of ​​the organic light-emitting diode display device needs to form a first electrode pattern, and the conductive layer portion of the peripheral area of ​​the organic light-emitting diode display device needs to be completely or partially removed. The pattern density of the display area and the peripheral area is different, which leads to a large difference in the amount of conductive material that needs to be etched and removed in the display area and the peripheral area per unit area under the same dry etching process. The selectivity of the dry etching process is poor, which, on the one hand, easily leads to the difficulty in controlling the process film thickness and size uniformity of the first electrode pattern finally formed, and on the other hand, easily leads to over-etching of the insulating layer under the first electrode pattern.

[0144] Figure 1 FIG. 1 is a schematic plan view of an organic light emitting diode display substrate. Figure 1 As shown, the organic light emitting diode display substrate 10 includes a display area 11 and a peripheral area 12 surrounding the display area 11; the display area 11 is provided with a first electrode pattern 13; the first electrode pattern 13 includes a plurality of first electrodes 130, thereby driving the light emitting layer (not shown) in the light emitting diode display substrate 10 to emit light.

[0145] Figure 2A-2D Schematic diagram of a method for manufacturing a first electrode pattern in an organic light emitting diode display substrate. Figure 2A As shown, an insulating layer 15 is formed on a base substrate 16, and a conductive layer 17 is formed on a side of the insulating layer 15 away from the base substrate 16; Figure 2B As shown, a photoresist pattern 18 is formed on the side of the conductive layer 17 away from the insulating layer 15; Figure 2C As shown, the conductive layer 17 is etched using the photoresist pattern 18 as a mask to form a first electrode pattern 13; Figure 2D As shown, the photoresist pattern 18 is stripped.

[0146] like Figure 1 and Figure 2A-2D As shown, the organic light-emitting diode display substrate includes a display area and a peripheral area, and the portion of the conductive layer located in the display area is dry-etched to form a first electrode pattern, while the portion of the conductive layer located in the peripheral area is completely removed, resulting in a large difference in the amount of conductive material that needs to be etched and removed in the display area and the peripheral area per unit area under the same dry-etching process, resulting in etching non-uniformity. When the etching parameters (for example, dry-etching gas concentration, flow rate, etc.) are set to be sufficient to etch away the portion of the conductive layer located in the peripheral area, the portion of the conductive layer located in the display area is prone to over-etching, resulting in the process film thickness and size uniformity of the formed first electrode pattern being difficult to control. On the other hand, due to the poor selectivity of the dry-etching process, the insulating layer under the first electrode pattern is easily etched, resulting in various defects.

[0147] Generally, the pattern density of the conductive pattern in the peripheral area is different from the pattern density of the first electrode pattern in the display area, and the pattern density of the peripheral area and the display area is very different. For example, the pattern density of the conductive pattern in the peripheral area is less than the pattern density of the first electrode pattern in the display area, and the conductive pattern may not be set in the peripheral area or a small amount of conductive pattern may be set. When the conductive layer 17 is dry-etched, the concentration of active groups, sidewall protection substances, etc. near the surface of the conductive layer 17 in the display area and the peripheral area is uniformly distributed. Therefore, the active groups and sidewall protection substances per unit area in the area with high pattern density are less than the active groups and sidewall protection substances per unit area in the area with low pattern density. Therefore, the etching depth of the area with high pattern density is less than the etching depth of the area with low pattern density. This is the so-called loading effect, which causes the etching depth of the peripheral area to be greater than the etching depth of the display area, which can make the loss of the insulating layer material below the portion of the conductive layer 17 located in the peripheral area and the portion of the conductive layer 17 located in the display area have a large difference.

[0148] The inventors found that the loss of the insulating layer 15 in the peripheral area 12 is greater than that in the display area 11. When the loss of the insulating layer 15 in the peripheral area 12 is large, it is easy to cause a short circuit or poor contact of subsequent film layers.

[0149] Figure 3 Schematic diagram of a plan view of an organic light emitting diode display substrate. Figure 1 Compared with the display substrate shown, Figure 3 The peripheral area 12 of the display substrate shown includes a connection electrode area 12a, so that the peripheral area 12 includes three areas: the connection electrode area 12a, the first dummy area 121 and the second dummy area 122. The first dummy area 121 is located between the connection electrode area 12a and the display area 11, and the second dummy area 122 is located on the side of the connection electrode area 12a away from the display area 11. Figure 3 As shown, the second dummy area 122 is located on a side of the connecting electrode area 12a away from the first dummy area 121. The first dummy area 121 can prevent the components that need to be insulated from each other in the display area and the connecting electrode area 12a from short-circuiting, and the second dummy area 122 can facilitate the packaging of the display substrate and improve the packaging effect.

[0150] Figure 4 The invention is a cross-sectional schematic diagram of an organic light emitting diode display substrate. Figure 4 Can Figure 3 A cross-sectional view of Figure 4As shown, an insulating layer 01 is provided on the base substrate 16, and a via 011 and a via 012 are provided in the insulating layer 01. The via 011 and the via 012 are filled with conductive materials to form connectors respectively. The conductive materials include metals such as tungsten, but are not limited thereto. On the insulating layer 01 are connecting electrodes 14 and first electrode patterns 13 located on the same layer. The first electrode pattern 13 includes a plurality of first electrodes 130. The first electrode 130 is connected to a component below, such as a drain of a thin film transistor (not shown in the figure) through a connecting member located in the via 011, and the connecting electrode 14 is connected to a connecting line below (not shown in the figure) through a connecting member located in the via 012. As shown Figure 4 As shown, after forming the connecting electrode 14 and the first electrode pattern 13, a pixel definition layer 01 is formed, and the pixel definition layer 01 includes a plurality of pixel definition parts 010, and one of the plurality of pixel definition parts 010 is provided between adjacent first electrodes 130. For example, the plurality of pixel definition parts 010 may be connected to each other and formed integrally, but is not limited thereto. The pixel definition layer 01 may include a plurality of hollow areas to expose the plurality of first electrodes 130 respectively. The pixel definition layer 01 is configured to define a plurality of sub-pixels. For example, each hollow area corresponds to a sub-pixel. For example, each first electrode 130 corresponds to a sub-pixel. As shown in FIG. Figure 4 As shown, after forming the pixel definition layer 01, the light-emitting function layer 03 is formed, and the light-emitting function layer 03 covers the first electrode pattern 13 and the pixel definition layer 01. Figure 4 As shown, after the light-emitting functional layer 03 is formed, the second electrode 04 is formed, and the second electrode 04 and the first electrode pattern 13 are spaced apart from each other to avoid direct connection between the second electrode 04 and the first electrode 130, and the second electrode 04 is connected to the connecting electrode 14. For example, the first electrode 130 can be made of a transparent conductive material, for example, the transparent conductive material includes indium tin oxide, but is not limited thereto.

[0151] When the connection electrode and the first electrode pattern are formed in the same layer, the portion of the conductive layer located in the first dummy area 121 and the portion of the conductive layer located in the second dummy area 122 need to be etched in one piece, and there is also etching non-uniformity in the process.

[0152] like Figure 4 As shown, at the boundary position of the light-emitting functional layer 03 near the connecting electrode area 12a, the second electrode 04 has a large height difference, which easily causes the second electrode to break and reduces the connection reliability between the second electrode and the connecting electrode. A common display substrate has a pixel definition layer only in the display area, and there is no pixel definition layer material in the peripheral area (non-pixel area), which leads to uneven contact between the second electrode and the connecting electrode. The second electrode can be made of metal. For example, the second electrode can be made of at least one metal material such as magnesium, silver, etc., but is not limited thereto and can be determined according to needs.

[0153] In order to solve the above-mentioned problem that the second electrode has a large height difference, which easily causes the second electrode to break and reduces the connection reliability between the second electrode and the connecting electrode and etching unevenness, an embodiment of the present disclosure provides a display substrate and a manufacturing method thereof, and a display device.

[0154] In a first aspect, the embodiments of the present disclosure reduce the height difference of the second electrode 106 and / or improve etching uniformity by providing the first filling layer 104 a .

[0155] Figure 5A FIG. 1 is a cross-sectional view of a display substrate provided by an embodiment of the present disclosure. Figure 5A As shown, the display substrate 100a includes: a first electrode pattern 103, a connecting electrode pattern 103a, a second electrode 106 and a first filling layer 104a. The connecting electrode pattern 103a surrounds the first electrode pattern 103 (see Figure 3 The second electrode 106 is connected to the connecting electrode pattern 103a. The second electrode 106 and the first electrode pattern 103 are spaced apart from each other. The second electrode 106 is configured to receive a first power supply signal. The first filling layer 104a is located between the connecting electrode pattern 103a and the first electrode pattern 103.

[0156] For example, Figure 5A As shown, the second electrode 106 does not contact the first electrode pattern 103. Figure 5A As shown, the display substrate includes a base substrate 101. The second electrode 106 and the first electrode pattern 103 are spaced apart from each other in a direction parallel to the base substrate 101, and the second electrode 106 and the first electrode pattern 103 are spaced apart from each other in a direction perpendicular to the base substrate 101. For example, the connection electrode pattern 103a and the first electrode pattern 103 are spaced apart from each other in a direction parallel to the base substrate 101.

[0157] like Figure 5A As shown, the display substrate 100a includes: a display area 11 and a peripheral area 12, and the peripheral area 12 surrounds the display area 11. The first electrode pattern 103 is located in the display area 11 of the display substrate; the connecting electrode pattern 103a is located in the peripheral area 12 of the display substrate, and the second electrode 106 is located in the display area 11 and the peripheral area 12. For example, the second electrode 106 is in a block shape, extending from the display area 11 to the peripheral area 12.

[0158] The display substrate provided by the embodiment of the present disclosure can reduce the height difference of the second electrode 106 and improve the connection reliability between the second electrode 106 and the connection electrode pattern 103 a by providing the first filling layer 104 a .

[0159] For example, Figure 5AAs shown, the first electrode pattern 103 includes a plurality of first electrodes 1030 spaced apart from each other, and the first electrodes 1030 are configured to receive pixel driving signals. The first electrode pattern 103 includes an edge first electrode 103e, and the edge first electrode 103e is close to the connecting electrode pattern 103a. The first filling layer 104a is in contact with the connecting electrode pattern 103a and the edge first electrode 103e, respectively. For example, the first filling layer 104a is an insulating layer, so as to facilitate the separation of the edge first electrode 103e and the second electrode 106. For example, the edge first electrode 103e is the first electrode 1030 closest to the connecting electrode pattern 103a.

[0160] like Figure 5A As shown, in a display substrate provided by an embodiment of the present disclosure, the side surfaces of the first filling layer 104 a are in contact with the side surfaces of the connecting electrode pattern 103 a and the side surfaces of the edge first electrode 103 e respectively.

[0161] like Figure 5A As shown, in a display substrate provided in an embodiment of the present disclosure, in order to reduce the height difference of the second electrode, the second electrode 106 is in contact with the first filling layer 104a.

[0162] Figure 5B A cross-sectional view of a display substrate provided according to an embodiment of the present disclosure. Figure 5B The display substrate 100aa shown in FIG. Figure 5A Compared with the display substrate 100a shown in FIG. 1 , the difference is that a groove G is provided in the first insulating layer 102 of the display substrate 100aa. The groove G is formed in the process of etching the conductive film. The provision of the groove G can help to space adjacent first electrodes from each other and improve the stability of the etching process. Figure 5B As shown, the size of the groove G in the first insulating layer 102 located between the edge first electrode 103e and the connecting electrode pattern 103a in the direction perpendicular to the base substrate 101 is larger than the size of the groove G in the first insulating layer 102 located between adjacent first electrodes 1030 or the size of the groove G in the first insulating layer 102 located between adjacent first electrodes 1030 in the direction perpendicular to the base substrate 101. Figure 5B As shown, a portion of the first filling layer 104 a is filled in the groove G between the edge first electrode 103 e and the connection electrode pattern 103 a .

[0163] Fig. 6A FIG. 1 is a cross-sectional schematic diagram of a display substrate provided by an embodiment of the present disclosure. Fig. 6A As shown, the difference between the display substrate 100b and the display substrate 100a is that the connection electrode pattern 103a includes a plurality of connection electrodes 103a0. Fig. 6AAs shown, the connection electrode pattern 103a includes an edge connection electrode 103ae close to the first electrode pattern 103, and the side of the first filling layer 104a contacts the side of the edge connection electrode 103ae and the side of the edge first electrode 103e respectively. The edge connection electrode 103ae is the connection electrode 103a0 closest to the first electrode pattern 103.

[0164] Figure 6B A cross-sectional view of a display substrate provided according to an embodiment of the present disclosure. Figure 6B The display substrate 100bb shown is Fig. 6A Compared with the display substrate 100b shown in FIG. 1 , the difference is that a groove G is provided in the first insulating layer 102 of the display substrate 100bb. Figure 6B As shown, the size of the groove G in the first insulating layer 102 located between the edge first electrode 103e and the connecting electrode 103a0 close to the edge first electrode 103e in the direction perpendicular to the base substrate 101 is greater than the size of the groove G in the first insulating layer 102 located between adjacent first electrodes 1030 in the direction perpendicular to the base substrate 101. Figure 6B As shown, a portion of the first filling layer 104 a is filled in the groove G between the edge first electrode 103 e and the connection electrode pattern 103 a .

[0165] Fig. 7A FIG. 1 is a cross-sectional schematic diagram of a display substrate provided by an embodiment of the present disclosure. Fig. 7A As shown, the display substrate 100c is different from the display substrate 100a in that the first filling layer 104a includes at least one conductive filling part 103d1 and at least one insulating filling part 104a0, and the edge first electrode 103e contacts the insulating filling part 104a0. For example, the edge first electrode 103e and the plurality of conductive filling parts 103d1 are insulated from each other. Fig. 7A 3 insulating filling parts 104a0 and two conductive filling parts 103d1 are shown in the figure. In the embodiment of the present disclosure, the number of insulating filling parts 104a0 and the number of conductive filling parts 103d1 are not limited to those shown in the figure, and can be determined as needed. For example, the pattern density of the plurality of conductive filling parts 103d1 is the same as the pattern density of the first electrode pattern 103, but is not limited thereto.

[0166] like Fig. 7A As shown, in a display substrate provided by an embodiment of the present disclosure, the first filling layer 104a includes a plurality of conductive filling parts 103d1 and a plurality of insulating filling parts 104a0, and the plurality of conductive filling parts 103d1 and the plurality of insulating filling parts 104a0 are alternately arranged. For example, the insulating filling part 104a0 is located adjacent to the conductive filling part 103d1.

[0167] Figure 7BA cross-sectional view of a display substrate provided according to an embodiment of the present disclosure. Figure 7B The display substrate 100cc shown is Fig. 7A Compared with the display substrate 100c shown in FIG. 1 , the difference is that a groove G is provided in the first insulating layer 102 of the display substrate 100cc. Figure 7B As shown, the size of the groove G in the first insulating layer 102 located between the edge first electrode 103e and the connecting electrode 103a0 close to the edge first electrode 103e in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 located between adjacent first electrodes 1030 in the direction perpendicular to the base substrate 101, and the size of the groove G in the first insulating layer 102 located between adjacent connecting electrodes 103a0 in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 located between adjacent first electrodes 1030 in the direction perpendicular to the base substrate 101. Figure 7B As shown, a portion of the insulating filling portion 104 a 0 is filled in the groove G between adjacent connecting electrodes 103 a 0 in the first insulating layer 102 . Figure 7B As shown, a portion of the insulating filling part 104 a 0 is filled in the groove G in the first insulating layer 102 between the connecting electrode pattern 103 a and the conductive filling part 103 d 1 . Figure 7B As shown, a portion of the insulating filling portion 104 a 0 is filled in the groove G in the first insulating layer 102 between the edge first electrode 103 e and the conductive filling portion 103 d 1 .

[0168] Fig. 8A FIG. 1 is a cross-sectional schematic diagram of a display substrate provided by an embodiment of the present disclosure. Fig. 8A As shown, the difference between the display substrate 100d and the display substrate 100c is that: the connection electrode pattern 103a includes a plurality of connection electrodes 103a0, the display substrate 100d also includes a second filling layer 104b, the second filling layer 104b includes at least one second filling portion 104b0, and the second filling portion 104b0 is located between adjacent connection electrodes 103a0. For example, the second filling portion 104b0 is in contact with the adjacent connection electrodes 103a0 respectively. For example, the pattern density of the plurality of conductive filling portions 103d1, the pattern density of the first electrode pattern 103, and the pattern density of the plurality of connection electrodes 103a0 are the same, but are not limited thereto.

[0169] Figure 8B A cross-sectional view of a display substrate provided according to an embodiment of the present disclosure. Figure 8B The display substrate 100dd shown is Fig. 8A Compared with the display substrate 100d shown in FIG. 1 , the difference is that a groove G is provided in the first insulating layer 102 of the display substrate 100dd. Figure 8BAs shown, the first insulating layer 102 includes a plurality of grooves G, and the plurality of grooves G have the same size in a direction perpendicular to the base substrate 101. All the grooves G in the first insulating layer 102 have the same size in a direction perpendicular to the base substrate 101. For example, the size of the groove G in the first insulating layer 102 between the edge first electrode 103e and the connecting electrode 103a0 close to the edge first electrode 103e in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 between adjacent first electrodes 1030 in the direction perpendicular to the base substrate 101, the size of the groove G in the first insulating layer 102 between adjacent conductive filling parts 103d1 in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 between adjacent first electrodes 1030 in the direction perpendicular to the base substrate 101, and the size of the groove G in the first insulating layer 102 between adjacent first connecting electrodes 103a0 in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 between adjacent first electrodes 1030 in the direction perpendicular to the base substrate 101.

[0170] like Fig. 8A As shown, in the display substrate provided in an embodiment of the present disclosure, the second filling layer 104b is an insulating layer. For example, the second filling layer 104b and the first filling layer 104a are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0171] For example, Fig. 8A As shown, the pattern density of the first electrode pattern 103, the pattern density of the plurality of conductive filling portions 103d1 and the pattern density of the connecting electrode pattern 103a are all the same, thereby improving etching uniformity, thereby improving the connection reliability between the second electrode 106 and the connecting electrode pattern 103a, and improving the performance of the display substrate.

[0172] like FIG. 5A to FIG. 8A As shown, in the display substrate provided by the embodiment of the present disclosure, the display substrate further includes a light-emitting functional layer 105, the light-emitting functional layer 105 is located between the first electrode pattern 103 and the second electrode 106, and the light-emitting functional layer 105 and the first filling layer 104a are different layers. For example, the light-emitting functional layer 105 is in contact with the first filling layer 104a. For example, the first electrode pattern 103 and the second electrode 106 are spaced apart from each other by the first filling layer 104a and the light-emitting functional layer 105.

[0173] like FIG. 5A to FIG. 8A As shown, in the display substrate provided in an embodiment of the present disclosure, the light-emitting functional layer 105 is in contact with a portion of the first filling layer 104a.

[0174] like FIG. 5A to FIG. 8AAs shown, in a display substrate provided in an embodiment of the present disclosure, the display substrate further includes a pixel definition layer 104, and the pixel definition layer 104 includes a plurality of pixel definition parts 1040; each of the plurality of pixel definition parts 1040 is located between adjacent first electrodes 1030. For example, the plurality of first electrodes 1030 are spaced apart from each other. For example, the plurality of first electrodes 1030 are spaced apart from each other in a direction parallel to the base substrate 101. For example, the plurality of first electrodes 1030 are independent of each other and spaced apart from each other.

[0175] like FIG. 5A to FIG. 8A As shown, in a display substrate provided in an embodiment of the present disclosure, the first electrode pattern 103 and the connecting electrode pattern 103a are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0176] like FIG. 5A to FIG. 8A As shown, the display substrate also includes a base substrate 101, and a first insulating layer 102 located on the base substrate 101. The first insulating layer 102 includes a first via hole V1 and a second via hole V2. The first via hole V1 and the second via hole V2 are filled with conductive materials to form connectors respectively, and the conductive materials include metals such as tungsten, but are not limited thereto. On the first insulating layer 102 are a connecting electrode pattern 103a and a first electrode pattern 103 located on the same layer. The first electrode pattern 103 includes a plurality of first electrodes 1030. The first electrode 1030 is connected to a component below, such as a drain of a thin film transistor (not shown in the figure) through a connector located in the second via hole V2, and the connecting electrode 103a0 or the connecting electrode pattern 103a is connected to a connecting line below (not shown in the figure) through a connector located in the first via hole V1. As shown Figure 5B , Figure 6B , FIG. 7B to FIG. 8B As shown, the first electrode pattern 103 and the connecting electrode pattern 103a are located on a side of the first insulating layer 102 away from the base substrate 101 and are respectively in contact with the first insulating layer 102, a portion of the first insulating layer 102 located between the first electrode pattern 103 and the connecting electrode pattern 103a has a groove, and the first filling layer 104a is at least partially located in the groove G.

[0177] like FIG. 5A to FIG. 8A As shown, the connection electrode pattern 103 a and the first electrode pattern 103 are in contact with the first insulating layer 102 , respectively.

[0178] like FIG. 5A to FIG. 8A As shown, the peripheral area 12 includes a first dummy area 121 and a second dummy area 122. The first dummy area 121 is located between the connection electrode area 12a and the display area 11, and the second dummy area 122 is located on a side of the connection electrode area 12a away from the display area 11.

[0179] like FIG. 5A to FIG. 8AAs shown, the orthographic projection of the first filling layer 104 a on the base substrate 101 partially overlaps with the orthographic projection of the light-emitting functional layer 105 on the base substrate 101 .

[0180] For example, Figure 5A and Fig. 6A As shown, the first filling layer 104a and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0181] like Fig. 7A As shown, in a display substrate provided in an embodiment of the present disclosure, at least one insulating filling portion 104a0 and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0182] like Fig. 7A and Fig. 8A As shown, in a display substrate provided in an embodiment of the present disclosure, the first electrode pattern 103, at least one conductive filling portion 103d1 and the connecting electrode pattern 103a are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0183] For example, Fig. 8A As shown, the second filling layer 104b, the first filling layer 104a and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0184] like 7A to 8A As shown, the multiple conductive filling parts 103 d 1 , the connecting electrode pattern 103 a and the first electrode pattern 103 are in contact with the first insulating layer 102 , respectively.

[0185] like 7A to 8A As shown, the portion of the first insulating layer 102 directly below the conductive filling portion 103d1 is not provided with a via hole. The portion of the first insulating layer 102 directly below the connecting electrode 103a0 is provided with a first via hole V1. The portion of the first insulating layer 102 directly below the first electrode 1030 is provided with a second via hole V2.

[0186] For example, the first electrode in the first electrode pattern may be an anode of the light-emitting element, and the second electrode may be a cathode of the light-emitting element. The connecting electrode is connected to the second electrode and is spaced apart from the first electrode. That is, the two electrodes of the light-emitting element may be the first electrode and the second electrode, respectively. The connecting electrode may be ring-shaped, in which case the connecting electrode may be referred to as a cathode ring. The light-emitting element may include a light-emitting functional layer. The light-emitting functional layer includes a light-emitting layer, and the light-emitting functional layer may also include at least one of a hole transport layer, a hole injection layer, an electron transport layer and an electron injection layer. The organic electroluminescent element may emit light under the electrical drive of the first electrode and the second electrode. The light-emitting element includes, for example, an organic light-emitting diode, but is not limited thereto.

[0187] Fig. 9 A top view of a first electrode pattern, a connecting electrode pattern and a conductive filling portion in a display substrate provided in an embodiment of the present disclosure. Fig. 9 As shown, the pattern density of the first electrode patterns 103 , the pattern density of the connecting electrode patterns 103 , and the pattern density of the plurality of conductive filling parts 103 d 1 may be the same. Fig. 9 The connecting electrode 103a0, the conductive filling portion 103d1 and the first electrode 1030 are shown. Fig. 9 As shown, the shape of the first electrode 1030, the shape of the connecting electrode 1030 and the shape of the conductive filling part 103d1 may be the same, but are not limited thereto. Fig. 9 Each connection electrode 103a0 located in the connection electrode area 12a is externally connected. That is, each connection electrode 103a0 is connected to a connector in a via hole located directly below it. Each connection electrode 103a0 is connected to a connector in a via hole in the first insulating layer that contacts the connection electrode 103a0. For example, a portion of the insulating layer that contacts each conductive filling portion 103d1 and is located below the conductive filling portion 103d1 is not provided with a via hole at a position corresponding to the conductive filling portion 103d1. For example, the connection electrode pattern 103a is ring-shaped.

[0188] Fig.10 A top view of a first filling layer, a second filling layer, and a pixel definition layer in a display substrate provided in an embodiment of the present disclosure. Fig.10 The first filling layer 104a, the second filling layer 104b and the pixel definition layer 104 are shown. Fig.10 As shown, the structure of the pixel definition film after patterning includes a plurality of hollow regions HR. The pixel definition film may cover the entire surface of the base substrate 101. The plurality of hollow regions HR include a hollow region HR0 located in the display region 11, a hollow region HR1 located in the first dummy region 121, and a hollow region HR2 located in the connection electrode region 12a. The hollow region HR0 is configured to expose the first electrode 1030, the hollow region HR1 is configured to expose the conductive filling portion 103d1, and the hollow region HR2 is configured to expose the connection electrode 103a0.

[0189] Fig. 9 and Fig.10 The top view shown corresponds to Fig. 8A The display panel shown is, but not limited to, this. Fig. 9 and Fig.10 A second dummy electrode pattern may also be disposed in the second dummy region 121 in the embodiment of the present invention. The second dummy electrode pattern may include a plurality of second dummy electrodes. The pattern density of the second dummy electrode pattern may be the same as the density of the first electrode pattern.

[0190] At least one embodiment of the present disclosure further provides a display device, comprising any display substrate in the first aspect. The display device includes, for example, a micro OLED display device, but is not limited thereto.

[0191] At least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, comprising: forming a first insulating layer on a base substrate; forming a first electrode pattern 103, the first electrode pattern 103 being located in a display area 11, the first electrode pattern 103 comprising a plurality of first electrodes 1030 spaced apart from each other, the first electrodes 1030 being configured to receive a pixel driving signal; forming a connecting electrode pattern 103a, the connecting electrode pattern 103a being located in a peripheral area 12 (a connecting electrode area 12a in the peripheral area 12), the connecting electrode pattern 103a surrounding the first electrode pattern 103; forming a second electrode 106, the second electrode 106 being located in the display area 11 and the peripheral area 12, the second electrode 106 being connected to the connecting electrode pattern 103a, the second electrode 106 being connected to the first electrode pattern 103a, and the second electrode 106 being connected to the first electrode pattern 103a. The electrode patterns 103 are spaced apart from each other, and the second electrode is configured to receive a first power supply signal; a light-emitting functional layer 105 is formed, and the light-emitting functional layer 105 is located between the first electrode pattern 103 and the second electrode 106; and a first filling layer 104a is formed, and the first filling layer 104a is located between the connecting electrode pattern 103a and the first electrode pattern 103; the first filling layer 104a and the light-emitting functional layer 105 are different layers, the first electrode pattern and the connecting electrode pattern are located on a side of the first insulating layer away from the base substrate and are respectively in contact with the first insulating layer, and a portion of the first insulating layer located between the first electrode pattern and the connecting electrode pattern has a groove, and the first filling layer is at least partially located in the groove.

[0192] In a method for manufacturing a display substrate provided in an embodiment of the present disclosure, the first electrode pattern includes an edge first electrode close to the connecting electrode pattern, and the first filling layer contacts the connecting electrode pattern and the edge first electrode respectively.

[0193] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the second electrode contacts the first filling layer.

[0194] A method for manufacturing a display substrate provided by an embodiment of the present disclosure further includes forming a pixel definition layer, wherein the pixel definition layer includes a plurality of pixel definition parts, and the first electrode pattern includes a plurality of first electrodes spaced apart from each other; the pixel definition parts are located between adjacent first electrodes.

[0195] In a method for manufacturing a display substrate provided in an embodiment of the present disclosure, the pixel definition layer and the first filling layer are formed by adopting the same patterning process, and the first electrode pattern and the connecting electrode pattern are formed by adopting the same patterning process.

[0196] In a method for manufacturing a display substrate provided in an embodiment of the present disclosure, forming a first filling layer includes forming at least one conductive filling portion and forming at least one insulating filling portion, and the first electrode pattern, the connecting electrode pattern and the at least one conductive filling portion are formed using the same composition process; and the pixel definition layer and the at least one insulating filling portion are formed using the same composition process.

[0197] A method for manufacturing a display substrate provided by an embodiment of the present disclosure also includes forming a second filling layer, wherein the second filling layer includes at least one second filling portion, the connecting electrode pattern includes a plurality of connecting electrodes, and the second filling portion is located between adjacent connecting electrodes; the second filling layer is formed in the same composition process of forming a pixel definition layer and at least one insulating filling portion.

[0198] In the manufacturing method of the display substrate provided in an embodiment of the present disclosure, forming the first filling layer 104a includes forming at least one conductive filling part 103d1 and forming at least one insulating filling part 104a0, the edge first electrode 103e is in contact with the insulating filling part 104a0, and the edge first electrode 103e and the conductive filling part 103d1 are insulated from each other. The edge first electrode 103e is close to the connecting electrode pattern 103a. For example, the edge first electrode 103e is the first electrode 1030 closest to the connecting electrode pattern 103a.

[0199] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, forming the first filling layer 104a includes forming at least one conductive filling portion 103d1 and forming at least one insulating filling portion 104a0.

[0200] In the manufacturing method of the display substrate provided in an embodiment of the present disclosure, forming the first filling layer 104a includes forming a plurality of conductive filling parts 103d1 and forming a plurality of insulating filling parts 104a0, and the plurality of conductive filling parts 103d1 and the plurality of insulating filling parts 104a0 are alternately arranged.

[0201] In a method for manufacturing a display substrate provided in an embodiment of the present disclosure, the manufacturing method also includes forming a pixel definition layer 104, and the formation of the pixel definition layer 104 includes forming a plurality of pixel definition parts 1040, and the first electrode pattern 103 includes a plurality of first electrodes 1030 spaced apart from each other; each of the plurality of pixel definition parts 1040 is located between adjacent first electrodes 1030.

[0202] In the manufacturing method of the display substrate provided in an embodiment of the present disclosure, the first filling layer 104 a or at least one insulating filling portion 104 a 0 and the pixel definition layer 104 are formed from the same film layer using the same patterning process.

[0203] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the first electrode pattern 103 and the connecting electrode pattern 103 a are formed from the same film layer using the same patterning process.

[0204] In a method for manufacturing a display substrate provided in an embodiment of the present disclosure, the manufacturing method also includes forming a second filling layer 104b, forming the second filling layer 104b includes forming at least one second filling portion 104b0, the connecting electrode pattern 103a includes a plurality of connecting electrodes 103a0, and the second filling portion 104b0 is located between adjacent connecting electrodes 103a0.

[0205] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the second filling portions 104b0 are in contact with adjacent connecting electrodes 103a0 respectively.

[0206] In the method for manufacturing a display substrate provided in an embodiment of the present disclosure, the second filling layer 104b is an insulating layer.

[0207] In the method for manufacturing a display substrate provided in an embodiment of the present disclosure, the second filling layer 104 b and the first filling layer 104 a are formed from the same film layer using the same patterning process.

[0208] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the light-emitting functional layer 105 is in contact with the first filling layer 104 a .

[0209] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the light-emitting functional layer 105 is in contact with a portion of the first filling layer 104 a .

[0210] The manufacturing method of the display substrate provided by an embodiment of the present disclosure includes: forming a first electrode pattern 103 located in the display area 11 of the display substrate; forming a connecting electrode pattern 103a located in the peripheral area 12 of the display substrate, the peripheral area 12 surrounds the display area 11; forming a second electrode 106, the second electrode 106 is connected to the connecting electrode pattern 103a, the second electrode 106 is located in the display area 11 and the peripheral area 12, and the second electrode 106 and the first electrode pattern 103 are spaced apart from each other; forming a light-emitting functional layer 105, the light-emitting functional layer 105 is located between the first electrode pattern 103 and the second electrode 106; and forming a first filling layer 104a, the first filling layer 104a is located between the connecting electrode pattern 103a and the first electrode pattern 103. The method can be used to form FIG. 5A to FIG. 8A Any display substrate shown.

[0211] The manufacturing method of the display substrate provided by an embodiment of the present disclosure includes: forming a first insulating layer on a base substrate; forming a conductive film on the first insulating layer, and performing a patterning process on the conductive film to simultaneously form a first electrode pattern 103 and a connecting electrode pattern 103a; forming a pixel definition film on the first electrode pattern 103 and the connecting electrode pattern 103a, and performing a patterning process on the pixel definition film to simultaneously form a first filling layer 104a and a pixel definition layer 104; forming a light-emitting function layer 105 on the first filling layer 104a and the pixel definition layer 104; and forming a second electrode 106 on the light-emitting function layer 105. The method can be used to form FIG. 5A to FIG. 8A Any display substrate shown.

[0212] The manufacturing method of the display substrate provided by an embodiment of the present disclosure includes: forming an insulating film on the base substrate 101, patterning the insulating film to form a first via hole V1 and a second via hole V2 to form a first insulating layer 102; filling the first via hole V1 and the second via hole V2 with conductive materials to form connectors respectively; forming a conductive film on the first insulating layer 102 and the connector, and performing a patterning process on the conductive film once to simultaneously form a first electrode pattern 103 and a connecting electrode pattern 103a; forming a pixel definition film on the first electrode pattern 103 and the connecting electrode pattern 103, and performing a patterning process on the pixel definition film once to simultaneously form a first filling layer 104a and a pixel definition layer 104; forming a light-emitting functional layer 105 on the first filling layer 104a and the pixel definition layer 104; and forming a second electrode 106 on the light-emitting functional layer 105. The method can be used to form FIG. 5A to FIG. 8A Any display substrate shown.

[0213] The manufacturing method of the display substrate provided by an embodiment of the present disclosure includes: forming an insulating film on the base substrate 101, patterning the insulating film to form a first via hole V1 and a second via hole V2 to form a first insulating layer 102; filling the first via hole V1 and the second via hole V2 with conductive materials to form connectors respectively; forming a conductive film on the first insulating layer 102 and the connector, and performing a patterning process on the conductive film once to simultaneously form a first electrode pattern 103, a connecting electrode pattern 103a and at least one conductive filling portion 103d1; forming a pixel definition film on the first electrode pattern 103, the connecting electrode pattern 103 and the at least one conductive filling portion 103d1, and performing a patterning process on the pixel definition film once to simultaneously form a pixel definition layer 104 and at least one insulating filling portion 104a0; forming a light-emitting functional layer 105 on the pixel definition layer 104 and the at least one insulating filling portion 104a0; and forming a second electrode 106 on the light-emitting functional layer 105. The manufacturing method can be used to form Fig. 7A The display substrate is shown.

[0214] A method for manufacturing a display substrate provided by an embodiment of the present disclosure includes: forming an insulating film on a base substrate 101, and patterning the insulating film to form a first via hole V1 and a second via hole V2 to form a first insulating layer 102; filling the first via hole V1 and the second via hole V2 with conductive materials to form connectors respectively; forming a conductive film on the first insulating layer 102 and the connector, and performing a patterning process on the conductive film once to simultaneously form a first electrode pattern 103, a connecting electrode pattern 103a and at least one conductive filling portion 103d1, wherein the connecting electrode pattern 103a includes a plurality of connecting electrodes 103a0; forming a pixel definition film on the first electrode pattern 103, the connecting electrode pattern 103 and the at least one conductive filling portion 103d1, and performing a patterning process on the pixel definition film once to simultaneously form a pixel definition layer 104, at least one insulating filling portion 104a0 and a second filling layer 104b; forming a light-emitting functional layer 105 on the pixel definition layer 104 and the at least one insulating filling portion 104a0; and forming a second electrode 106 on the light-emitting functional layer 105. This method can be used to form Fig. 8A The display substrate is shown.

[0215] For example, the display substrate described in the first aspect can be formed by adopting the above manufacturing method. The display substrate can be any of the above display substrates. For the specific description of the display substrate, please refer to the above, which will not be repeated here.

[0216] In a second aspect, in order to reduce the height difference of the second electrode 106 and / or improve etching uniformity, embodiments of the present disclosure provide a display substrate, a manufacturing method thereof, and a display device.

[0217] Fig.11FIG. 1 is a schematic diagram of a region division of a display substrate provided by an embodiment of the present disclosure. Fig.11 As shown, the display substrate includes a display area 11 and a peripheral area 12, and the peripheral area 12 includes a connection electrode area 12a, so that the peripheral area 12 includes three areas: the connection electrode area 12a, the first dummy area 121 and the second dummy area 122. The first dummy area 121 is located between the connection electrode area 12a and the display area 11, and the second dummy area 122 is located on a side of the connection electrode area 12a away from the display area 11. Fig.11 As shown, the second dummy area 122 is located on a side of the connecting electrode area 12a away from the first dummy area 121. The first dummy area 121 can prevent the components that need to be insulated from each other in the display area and the connecting electrode area 12a from short-circuiting, and the second dummy area 122 can facilitate the packaging of the display substrate and improve the packaging effect.

[0218] Fig.12 A schematic top view of a display substrate provided in accordance with an embodiment of the present disclosure. Fig.12 A top view of a structure formed after a conductive film undergoes a single patterning process is shown. Fig.12 The display region 11 , the peripheral region 12 , the connection electrode region 12 a , the first dummy region 121 , and the second dummy region 122 are shown. Fig.12 Also shown are the first electrode 1030, the first dummy electrode de10, the second dummy electrode de20 and the connecting electrode 103a0. The first electrode 1030 is located in the display area 11, the first dummy electrode de10 is located in the first dummy area 121, the second dummy electrode de20 is located in the second dummy area 122, and the connecting electrode 103a0 is located in the connecting electrode area 12a. For example, the connecting electrode pattern 103a is in a ring shape.

[0219] For example, Fig.12 As shown, in order to improve etching uniformity, the first dummy electrode de10 is in a block shape. Fig.12 As shown, in order to improve etching uniformity, the second dummy electrode de20 is in a block shape. Fig.12 As shown, in order to improve etching uniformity, the connecting electrode 103a0 is in a block shape. Fig.12 As shown, the first electrode 1030 is in a block shape. For example, the block shape includes a polygon, but is not limited thereto. Fig.12 As shown, the first electrode 1030 , the first dummy electrode de10 , the second dummy electrode de20 , and the connection electrode 103 a 0 have the same shape, but are not limited thereto.

[0220] Fig.13A FIG. 1 is a cross-sectional schematic diagram of a display substrate provided by an embodiment of the present disclosure. Fig.13AAs shown, the display substrate 200a includes: a first electrode pattern 103, located in the display area 11 of the display substrate, and including a plurality of first electrodes 1030 spaced apart from each other, the first electrodes being configured to receive pixel driving signals; a connecting electrode pattern 103a, located in the connecting electrode area 12a of the display substrate, and including a plurality of connecting electrodes 103a0; the connecting electrode area 12a surrounds the display area 11. For example, Fig.12 and Fig.13A As shown, the plurality of connecting electrodes 103 a 0 surround the plurality of first electrodes 1030 .

[0221] like Fig.12 and Fig.13A As shown, in a display substrate provided in an embodiment of the present disclosure, the display substrate further includes a second electrode 106, the second electrode 106 is connected to a plurality of connection electrodes 103a0; the peripheral area 12 surrounds the display area 11, the peripheral area 12 includes a connection electrode area 12a and a first dummy area 121; the second electrode 106 is located in the display area 11 and the peripheral area 12, and the second electrode 106 is spaced apart from the first electrode pattern 103. The second electrode is configured to receive a first power signal.

[0222] like Fig.12 and Fig.13A As shown, in order to improve etching uniformity, the pattern density of the connecting electrode pattern 103 a is the same as the pattern density of the first electrode pattern 103 .

[0223] like Fig.12 and Fig.13A As shown, in a display substrate provided in an embodiment of the present disclosure, the display substrate 200a further includes a first dummy electrode pattern de1, which is located in the first dummy area 121 and includes a plurality of first dummy electrodes de10. The first dummy area 121 is located between the connecting electrode area 12a and the display area 11. In order to improve etching uniformity, the pattern density of the first dummy electrode pattern de1 is the same as the pattern density of the first electrode pattern 103.

[0224] like Fig.12 and Fig.13A As shown, in a display substrate provided in an embodiment of the present disclosure, the display substrate further includes a second dummy electrode pattern de2, which is located in the second dummy area 122 and includes a plurality of second dummy electrodes de20; the second dummy area 122 is located on a side of the connecting electrode area 12a away from the display area 11. In order to improve etching uniformity, the pattern density of the second dummy electrode pattern de2 is the same as the pattern density of the first electrode pattern 103.

[0225] like Fig.13AAs shown, in a display substrate provided by an embodiment of the present disclosure, a first filling layer 104a is provided in the first dummy area 121, the first filling layer 104a includes a plurality of first dummy electrodes de10 and an insulating filling layer 104c, the first electrode pattern 103 includes an edge first electrode 103e close to the connecting electrode 103a0, and the insulating filling layer 104c is in contact with the connecting electrode 103a0 and the edge first electrode 103e, respectively. For example, the edge first electrode 103e is the first electrode 1030 closest to the connecting electrode 103a0.

[0226] like Fig.13A As shown, in the display substrate provided by an embodiment of the present disclosure, the second electrode 106 is in contact with the insulating filling layer 104c.

[0227] like Fig.13A As shown, in the display substrate provided by an embodiment of the present disclosure, the edge first electrode 103e and the plurality of first dummy electrodes de10 are insulated from each other.

[0228] In the display substrate provided in an embodiment of the present disclosure, the display substrate further includes a pixel definition layer 104 , and the pixel definition layer 104 includes a plurality of pixel definition portions 1040 . For example, each of the plurality of pixel definition portions 1040 is located between adjacent first electrodes 1030 .

[0229] like Fig.13A As shown, in a display substrate provided in an embodiment of the present disclosure, the insulating filling layer 104c and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0230] like Fig.13A As shown, in a display substrate provided in an embodiment of the present disclosure, the first electrode pattern 103 and the connecting electrode pattern 103a are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0231] like Fig.13A As shown, in the display substrate provided in an embodiment of the present disclosure, the display substrate further includes a second filling layer 104b, the second filling layer 104b includes at least one second filling portion 104b0, and the second filling portion 104b0 is located between adjacent connecting electrodes 103a0. Fig.13A As shown, in a display substrate provided by an embodiment of the present disclosure, the second filling portions 104b0 are in contact with adjacent connecting electrodes 103a0 respectively.

[0232] like Fig.13A As shown, in the display substrate provided in an embodiment of the present disclosure, the second filling layer 104b is an insulating layer. For example, the second filling layer 104b and the insulating filling layer 104c are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0233] like Fig.13A As shown, in a display substrate provided in an embodiment of the present disclosure, the display substrate further includes a light-emitting functional layer 105, the light-emitting functional layer 105 is located between the first electrode pattern 103 and the second electrode 106, and the light-emitting functional layer 105 is in contact with the insulating filling layer 104c. For example, the light-emitting functional layer 105 is in contact with the insulating filling layer 104c.

[0234] like Fig.13A As shown, in the display substrate provided in an embodiment of the present disclosure, the light-emitting functional layer 105 is in contact with a portion of the insulating filling layer 104c.

[0235] like Fig.13A As shown, in the display substrate provided in an embodiment of the present disclosure, the first dummy electrode de10 is not externally connected, and the portion of the first insulating layer directly below the first dummy electrode de10 that contacts the first dummy electrode de10 is not provided with a via hole, and reference may be made to the description of the first dummy electrode 103d1. The first via hole V1 and the second via hole V2 may refer to the previous description, and will not be repeated here.

[0236] In the embodiments of the present disclosure, Fig.13A The description is made by taking the example that the insulating filling layer 104 c completely covers the plurality of first dummy electrodes de10 , but the invention is not limited thereto.

[0237] Fig. 13B A cross-sectional view of a display substrate provided according to an embodiment of the present disclosure. Fig. 13B The display substrate 200aa shown in FIG. Fig.13A Compared with the display substrate 200a shown in FIG. 1 , the difference is that a groove G is provided in the first insulating layer 102 of the display substrate 200aa. Fig. 13B As shown, the size of the groove G in the first insulating layer 102 located in the display area 11 in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 located in the peripheral area 12 in the direction perpendicular to the base substrate 101. For example, the sizes of all the grooves G in the first insulating layer 102 in the direction perpendicular to the base substrate 101 are equal. Fig. 13B As shown, the groove G in the first insulating layer 102 located in the second dummy area 122, the groove G in the first insulating layer 102 located in the connecting dummy area 12a, the groove G in the first insulating layer 102 located in the first dummy area 121, and the groove G in the first insulating layer 102 located in the display area 11 are all equal in size in a direction perpendicular to the base substrate 101.

[0238] Fig.14A FIG. 1 is a cross-sectional view of a display substrate provided by an embodiment of the present disclosure. Fig.14A As shown, the display substrate 200b and Fig.13AThe difference of the display substrate 200a shown in the figure is that the insulating filling layer 104c may include a plurality of hollow regions HR11 to expose a plurality of first dummy electrodes de10 respectively, and the second electrode 106 is connected to the first dummy electrode de10 through the hollow regions in the insulating filling layer 104c. The insulating filling layer 104c includes a plurality of insulating filling portions 104c0. Fig.14A As shown, the insulating filling portion 104c0 is located between adjacent first dummy electrodes de10, or between adjacent first dummy electrodes de10 and edge first electrodes 103e, or between adjacent first dummy electrodes de10 and connection electrodes 103a0.

[0239] Fig. 14B A cross-sectional view of a display substrate provided according to an embodiment of the present disclosure. Fig. 14B The display substrate 200bb shown is Fig.14A Compared with the display substrate 200b shown in FIG. 1 , the difference is that a groove G is provided in the first insulating layer 102 of the display substrate 200bb. Fig. 14B As shown, the size of the groove G in the first insulating layer 102 located in the display area 11 in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 located in the peripheral area 12 in the direction perpendicular to the base substrate 101. For example, the sizes of all the grooves G in the first insulating layer 102 in the direction perpendicular to the base substrate 101 are equal. Fig. 14B As shown, the groove G in the first insulating layer 102 located in the second dummy area 122, the groove G in the first insulating layer 102 located in the connecting dummy area 12a, the groove G in the first insulating layer 102 located in the first dummy area 121, and the groove G in the first insulating layer 102 located in the display area 11 are all equal in size in a direction perpendicular to the base substrate 101.

[0240] Fig.15 A top view of an insulating filling layer, a second filling layer and a pixel definition layer in a display substrate provided in an embodiment of the present disclosure. Fig.15 The insulating filling layer 104c, the second filling layer 104b and the pixel definition layer 104 are shown. Fig.15 As shown, the structure of the pixel definition film after patterning includes a plurality of hollow regions HR. The plurality of hollow regions HR include a hollow region HR0 located in the display region 11 and a hollow region HR2 located in the second dummy region 122. The hollow region HR0 is configured to expose the first electrode 1030, and the hollow region HR2 is configured to expose the connecting electrode 103a0. Fig.15 The insulating filling layer, the second filling layer and the pixel definition layer shown may be Fig.13A 104c, the second filling layer 104b and the pixel definition layer 104. For example, Fig.14AThe top view of the first filling layer, the second filling layer and the pixel definition layer shown can be referred to Fig.10 , but not limited to this.

[0241] At least one embodiment of the present disclosure further provides a display device, comprising any display substrate in the second aspect. For example, the display device comprises a micro OLED display device.

[0242] At least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, including: forming a first electrode pattern 103, the first electrode pattern 103 is located in the display area 11 of the display substrate, and includes a plurality of first electrodes 1030 spaced apart from each other, the first electrode being configured to receive a pixel driving signal; forming a connecting electrode pattern 103a, the connecting electrode pattern 103a is located in the connecting electrode area 12a of the display substrate, and includes a plurality of connecting electrodes 103a0, the connecting electrode area 12a surrounds the display area 11; forming a second electrode 106, the second electrode 106 is located in the display area 11 and the peripheral area 12, the second electrode 106 is connected to the connecting electrode pattern 103a, the second electrode 106 is spaced apart from the first electrode pattern 103, and the second electrode is configured to receive a first power supply signal. The plurality of connecting electrodes 103a0 surround the plurality of first electrodes 1030. The connecting electrode 103a0 is in a block shape.

[0243] In the method for manufacturing a display substrate provided in an embodiment of the present disclosure, in order to improve etching uniformity, the pattern density of the connecting electrode pattern 103 a is the same as the pattern density of the first electrode pattern 103 .

[0244] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a first dummy electrode pattern de1, the first dummy electrode pattern de1 is located in the first dummy area 121 of the display substrate, and includes a plurality of first dummy electrodes de10; the first dummy area 121 is located between the connecting electrode area 12a and the display area 11; in order to improve etching uniformity, the pattern density of the first dummy electrode pattern de1 is the same as the pattern density of the first electrode pattern 103. For example, the first dummy electrode de10 is in a block shape. The peripheral area 12 includes the connecting electrode area 12a and the first dummy area 121.

[0245] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a second dummy electrode pattern de2, the second dummy electrode pattern de2 is located in the second dummy area 122 of the display substrate, and includes a plurality of second dummy electrodes de20; the second dummy area 122 is located on the side of the connecting electrode area 12a away from the display area 11, and in order to improve the etching uniformity, the pattern density of the second dummy electrode pattern de2 is the same as the pattern density of the first electrode pattern 103. For example, the second dummy electrode de20 is in a block shape. The peripheral area 12 includes the connecting electrode area 12a, the first dummy area 121 and the second dummy area 122.

[0246] In a method for manufacturing a display substrate provided in an embodiment of the present disclosure, a first filling layer 104a is formed in a first dummy area 121, the first filling layer 104a includes a plurality of first dummy electrodes de10 and an insulating filling layer 104c, the first electrode pattern 103 includes an edge first electrode 103e adjacent to the connecting electrode 103a0, and the insulating filling layer 104c contacts the connecting electrode 103a0 and the edge first electrode 103e, respectively.

[0247] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the second electrode 106 is in contact with the insulating filling layer 104 c.

[0248] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the edge first electrode 103e and the plurality of first dummy electrodes de10 are insulated from each other.

[0249] In the manufacturing method of the display substrate provided in an embodiment of the present disclosure, the manufacturing method further includes: forming a pixel definition layer 104 , the pixel definition layer 104 includes a plurality of pixel definition parts 1040 , each of the plurality of pixel definition parts 1040 is located between adjacent first electrodes 1030 .

[0250] In the method for manufacturing a display substrate provided in an embodiment of the present disclosure, the insulating filling layer 104 c and the pixel definition layer 104 are formed from the same film layer using the same patterning process.

[0251] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the first electrode pattern 103 and the connecting electrode pattern 103 a are formed from the same film layer using the same patterning process.

[0252] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a second filling layer 104b, the second filling layer 104b includes at least one second filling portion 104b0, and the second filling portion 104b0 is located between adjacent connecting electrodes 103a0. For example, the second filling portion 104b0 is in contact with adjacent connecting electrodes 103a0 respectively. For example, the second filling layer 104b is an insulating layer. In the manufacturing method of the display substrate provided by an embodiment of the present disclosure, the second filling layer 104b and the first filling layer 104a are formed by the same film layer using the same patterning process.

[0253] The manufacturing method of the display substrate provided by an embodiment of the present disclosure further includes: forming a light-emitting functional layer 105 , wherein the light-emitting functional layer 105 is located between the first electrode pattern 103 and the second electrode 106 , and the light-emitting functional layer 105 is in contact with the first filling layer 104 a .

[0254] In the method for manufacturing a display substrate provided by an embodiment of the present disclosure, the light-emitting functional layer 105 is in contact with a portion of the first filling layer 104 a .

[0255] A method for manufacturing a display substrate provided by an embodiment of the present disclosure includes: forming a first electrode pattern, wherein the first electrode pattern is located in a display area of ​​the display substrate and includes a plurality of first electrodes spaced apart from each other; forming a connecting electrode pattern, wherein the connecting electrode pattern is located in a peripheral area of ​​the display substrate and includes a plurality of connecting electrodes; and forming a second electrode, wherein the second electrode is located in the display area and the peripheral area and is connected to the connecting electrode pattern, and the second electrode is spaced apart from the first electrode pattern; the connecting electrode pattern surrounds the first electrode pattern, and the connecting electrode is in a block shape.

[0256] The manufacturing method of the display substrate provided by an embodiment of the present disclosure includes: forming an insulating film on the base substrate 101, patterning the insulating film to form a first via hole V1 and a second via hole V2 to form a first insulating layer 102; filling the first via hole V1 and the second via hole V2 with conductive materials to form connectors respectively; forming a conductive film on the first insulating layer 102 and the connector, and performing a patterning process on the conductive film once to simultaneously form a first electrode pattern 103, a connecting electrode pattern 103a and a first dummy electrode pattern de1, wherein the connecting electrode pattern 103a includes a plurality of connecting electrodes 103a0; forming a pixel definition film on the first electrode pattern 103, the connecting electrode pattern 103 and the first dummy electrode pattern de1, and performing a patterning process on the pixel definition film once to simultaneously form a pixel definition layer 104, an insulating filling layer 104c and a second filling layer 104b; forming a light-emitting functional layer 105 on the pixel definition layer 104 and the insulating filling layer 104c; and forming a second electrode 106 on the light-emitting functional layer 105. The manufacturing method can be used to form Fig.13A The display substrate is shown.

[0257] A method for manufacturing a display substrate provided by an embodiment of the present disclosure includes: forming an insulating film on a base substrate 101, and patterning the insulating film to form a first via hole V1 and a second via hole V2 to form a first insulating layer 102; filling the first via hole V1 and the second via hole V2 with a conductive material to form connectors respectively; forming a conductive film on the first insulating layer 102 and the connector, and performing a patterning process on the conductive film once to simultaneously form a first electrode pattern 103, a connecting electrode pattern 103a and a first dummy electrode pattern de1, wherein the connecting electrode pattern 103a includes a plurality of connecting electrodes 103a0; forming a pixel definition film on the first electrode pattern 103, the connecting electrode pattern 103 and the first dummy electrode pattern de1, and performing a patterning process on the pixel definition film once to simultaneously form a pixel definition layer 104, at least one insulating filling portion 104c0 and a second filling layer 104b; forming a light-emitting functional layer 105 on the pixel definition layer 104 and the at least one insulating filling portion 104c0; and forming a second electrode 106 on the light-emitting functional layer 105. This method can be used to form Fig.14A The display substrate is shown.

[0258] In a third aspect, in order to reduce the height difference of the second electrode 106 and / or improve etching uniformity, the embodiments of the present disclosure provide a display substrate and a manufacturing method thereof, and a display device.

[0259] Fig.16 A schematic diagram of the area division of a display substrate provided by an embodiment of the present disclosure. Fig.11 Compared with the display substrate shown in FIG. 1 , the display substrate further includes a sensor region R1 , a portion of the first dummy region 121 located between the sensor region R1 and the connection electrode region 12 a is a first dummy sub-region 1211 ; and a second dummy sub-region 1212 is located between the sensor region R1 and the display region 11 . Fig.16 A pad region R2 is also shown. The pad region R2 can be used to connect an external circuit.

[0260] Fig.17A A schematic cross-sectional view of a display substrate provided in accordance with an embodiment of the present disclosure. Fig.17A Can Fig.18 A schematic cross-sectional view of a display substrate at MN is shown in FIG. Fig.17AAs shown, the display substrate 300a includes: a first electrode pattern 103, a connecting electrode pattern 103a, and a first dummy electrode pattern de1. The first electrode pattern 103 is located in the display area 11 of the display substrate, and includes a plurality of first electrodes 1030 spaced apart from each other. The first electrode is configured to receive a pixel driving signal. The connecting electrode pattern 103a is located in the connecting electrode area 12a of the display substrate, and includes a plurality of connecting electrodes 103a0. At least two of the plurality of connecting electrodes 103a0 are in a block shape spaced apart from each other. The first dummy electrode pattern de1 is located in the first dummy area 121 of the display substrate, and includes a plurality of first dummy electrodes de10. The provision of the first dummy electrode pattern de1 can help improve etching uniformity.

[0261] like Fig.16 and Fig.17A As shown, the connection electrode area 12a surrounds the display area 11, and the first dummy area 121 is located between the connection electrode area 12a and the display area 11. The connection electrode pattern 103a surrounds the first electrode pattern 103, and the first dummy electrode pattern de1 surrounds the first electrode pattern 103. The first dummy electrode pattern de1 is located between the connection electrode pattern 103a and the first electrode pattern 103. For example, the connection electrode pattern 103a is ring-shaped.

[0262] For example, Fig.17A As shown, the display substrate provided by an embodiment of the present disclosure further includes a second electrode 106, and the second electrode 106 is connected to the connection electrode 103a0; the peripheral area 12 of the display substrate surrounds the display area 11, and the peripheral area 12 includes a connection electrode area 12a and a first dummy area 121; the second electrode 106 is located in the display area 11 and the peripheral area 12, and the second electrode 106 is spaced apart from the first electrode pattern 103. The second electrode is configured to receive a first power signal.

[0263] For example, Fig.17A As shown, at least one of the pattern density of the connection electrode pattern 103 a and the pattern density of the first dummy electrode pattern de1 is the same as the pattern density of the first electrode pattern 103 .

[0264] For example, Fig.17A As shown, the display substrate provided by an embodiment of the present disclosure further includes a sensor electrode pattern 103b, which is located in the sensor region R1 of the display substrate and includes a plurality of sensor electrodes 103b0. The sensor electrode 103b0 is configured to receive a detection drive signal. For example, the pattern density of the sensor electrode pattern 103b is the same as the pattern density of the first electrode pattern 103.

[0265] For example, Fig.17AAs shown, the display substrate provided by an embodiment of the present disclosure further includes a second dummy electrode pattern de2, which is located in a second dummy area 122 of the display substrate and includes a plurality of second dummy electrodes de20; the second dummy area 122 is located on a side of the connecting electrode area 12a away from the display area 11. For example, the pattern density of the second dummy electrode pattern de2 is the same as the pattern density of the first electrode pattern 103. In the display substrate provided by an embodiment of the present disclosure, the pattern density of the first electrode pattern 103, the pattern density of the connecting electrode pattern 103a, the pattern density of the sensor electrode pattern 103b, the pattern density of the first dummy electrode pattern de1, and the pattern density of the second dummy electrode pattern de2 are all the same.

[0266] For example, Fig.17A As shown, a first filling layer 104a is provided in the first dummy sub-region 1211, and the first filling layer 104a includes a plurality of first dummy electrodes de10 and an insulating filling layer 104c; the first electrode pattern 103 includes an edge first electrode 103e adjacent to the connecting electrode 103a0, and the insulating filling layer 104c is in contact with the connecting electrode 103a0 and the edge first electrode 103e respectively. Fig.17A As shown, the second electrode 106 is in contact with the insulating filling layer 104c. Fig.17A As shown, the edge first electrode 103e and the plurality of first dummy electrodes de10 are insulated from each other.

[0267] For example, Fig.17A As shown, the display substrate further includes a pixel definition layer 104 , and the pixel definition layer 104 includes a plurality of pixel definition portions 1040 , each of the plurality of pixel definition portions 1040 is located between adjacent first electrodes 1030 .

[0268] For example, Fig.17A As shown, the insulating filling layer 104 c and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0269] For example, Fig.17A As shown, the first electrode pattern 103, the connecting electrode pattern 103a, the sensor electrode pattern 103b, the first dummy electrode pattern de1 and the second dummy electrode pattern de2 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0270] For example, Fig.17A As shown, the display substrate further includes a second filling layer 104b, the second filling layer 104b includes at least one second filling portion 104b0, and the second filling portion 104b0 is located between adjacent connecting electrodes 103a0. For example, the second filling layer 104b is an insulating layer. Fig.17AAs shown, the second filling portions 104b0 are in contact with adjacent connection electrodes 103a0 respectively.

[0271] For example, Fig.17A As shown, the second filling layer 104b and the first filling layer 104a are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes.

[0272] For example, Fig.17A As shown, the display substrate further includes a third filling layer 1043, the third filling layer 1043 includes a plurality of third filling portions 10430, and the third filling portions 10430 are located between adjacent sensor electrodes 103b0, adjacent sensor electrodes 103b0 and at least one of the first dummy electrodes. Fig.17A The following description will be given by taking the case where the third filling portion 10430 is located between adjacent sensor electrodes 103b0 as an example.

[0273] For example, Fig.17A As shown, the third filling layer 1043 and the pixel definition layer 104 are located in the same layer and can be formed by the same film layer using the same patterning process to save manufacturing processes. Fig.17A As shown, the pixel definition layer 104, the insulating filling layer 104c, the second filling layer 104b, and the third filling layer 1043 are located in the same layer.

[0274] For example, Fig.17A As shown, the display substrate further includes a light-emitting functional layer 105, which is located between the first electrode pattern 103 and the second electrode 106, and the light-emitting functional layer 105 is in contact with the first filling layer 104a. For example, the light-emitting functional layer 105 is in contact with a portion of the first filling layer 104a. Fig.17A As shown, the light-emitting functional layer 105 extends to the first dummy sub-region 1211. The light-emitting functional layer 105 covers the entire display region 11, the sensor region R1, the second dummy sub-region 1212 and part of the first dummy sub-region 1211 to prevent the light-emitting functional layer 105 from being evaporated to the connecting electrode region 122 to cause a short circuit between the first electrode and the second electrode. Fig.17A As shown, the second electrode 106 extends from the display area 11 to the second dummy area 122 of the peripheral area 12 to facilitate the connection between the second electrode 106 and the connecting electrode 103 a 0 .

[0275] For example, Fig.17A As shown, the light emitting functional layer 105 is in contact with the sensor electrode pattern 103b. Fig.17A As shown, the light emitting function layer 105 is not in contact with the first dummy electrode de10 located in the second dummy sub-region 1212 , but the present invention is not limited thereto.

[0276] like Fig.17AAs shown, a second insulating layer IS is further provided on the base substrate 101, and a conductive pattern 109 is provided on the second insulating layer IS, and the conductive pattern 109 includes a first conductive portion 1091, a second conductive portion 1092 and a third conductive portion 1093. The second insulating layer IS includes a third via hole V11, a fourth via hole V21 and a fifth via hole V31. Conductive materials are respectively filled in the third via hole V11, the fourth via hole V21 and the fifth via hole V31 to form a connector. The first electrode 1030 is connected to the connector in the fourth via hole V21 through the first conductive portion 1091. The connecting electrode 103a0 is connected to the connector in the third via hole V11 through the second conductive portion 1092. The sensor electrode 103b0 is connected to the connector in the fifth via hole V31 through the third conductive portion 1093. It should be noted that other structures are provided between the base substrate 101 and the second insulating layer IS, Fig.17A The other structures are not shown.

[0277] like Fig.17A As shown, the display substrate further includes an encapsulation layer 107. The encapsulation layer 107 is configured to encapsulate the light emitting element to prevent water and oxygen from invading. Fig.17A As shown, the encapsulation layer 107 covers the second electrode 106 and the second dummy electrode pattern de2. Fig.17A As shown, the encapsulation layer 107 may cover the entire substrate 101 and the structures thereon.

[0278] Fig. 17B A schematic cross-sectional view of a display substrate provided in accordance with an embodiment of the present disclosure. Fig. 17B The display substrate 300aa shown is Fig.17A Compared with the display substrate 300a shown in FIG. 1 , the difference is that a groove G is provided in the first insulating layer 102 of the display substrate 300aa. Fig. 17B As shown, the size of the groove G in the first insulating layer 102 located in the display area 11 in the direction perpendicular to the base substrate 101 is equal to the size of the groove G in the first insulating layer 102 located in the peripheral area 12 in the direction perpendicular to the base substrate 101. For example, the sizes of all the grooves G in the first insulating layer 102 in the direction perpendicular to the base substrate 101 are equal. Fig. 17B As shown, the groove G in the first insulating layer 102 located in the second dummy area 122, the groove G in the first insulating layer 102 located in the connecting dummy area 12a, the groove G in the first insulating layer 102 located in the first dummy area 121 (including the first dummy sub-area 1211 and the second dummy sub-area 1212), the groove G in the first insulating layer 102 located in the sensor area R1, and the groove G in the first insulating layer 102 located in the display area 11 are all equal in size in the direction perpendicular to the base substrate 101.

[0279] Fig.18This is a top view of a structure formed by patterning a conductive film in a display substrate provided by an embodiment of the present disclosure. Other structures in the display substrate are not shown, and can be referred to Fig.17A or Fig. 17B .and Fig.12 Compared with the structure shown, Fig.18 Sensor electrode 103b0 is shown. Fig.18 As shown, the shape of the sensor electrode 103b0, the shape of the first electrode 1030, the shape of the connecting electrode 103a0, the shape of the first dummy electrode de10 and the shape of the second dummy electrode de20 are the same, but are not limited thereto. Fig.18 As shown, the pattern density of the sensor electrode pattern 103b, the pattern density of the first electrode pattern 103, the pattern density of the connection electrode pattern 103a, the pattern density of the first dummy electrode pattern de1, and the pattern density of the second dummy electrode pattern de2 are the same. That is, the pattern density of the plurality of sensor electrodes 103b0, the pattern density of the plurality of first electrodes 1030, the pattern density of the plurality of connection electrodes 103a0, the pattern density of the plurality of first dummy electrodes de10, and the pattern density of the plurality of second dummy electrodes de20 are the same.

[0280] For example, Fig.18 As shown, the first dummy electrode de10 is in a block shape. The first dummy electrode de10 in a block shape can also refer to Fig.12 .

[0281] For example, Fig.18 As shown, the second dummy electrode de20 is in a block shape. The second dummy electrode de20 in a block shape can also refer to Fig.12 .

[0282] For example, Fig.18 As shown, the sensor electrode 103b0, the first electrode 1030, the connecting electrode 103a0, the first dummy electrode de10 and the second dummy electrode de20 are all in block shape.

[0283] Fig.19 A top view of a structure formed by patterning a pixel definition film in a display substrate provided by an embodiment of the present disclosure. Fig.15 Compared to the structure shown, Fig.19 The third filling portion 10430 and the hollow region HR3 are shown. The hollow region HR3 is configured to expose the sensor electrode 103b0 ( Fig.19 Not shown, see Fig.17A and Fig. 17B ).

[0284] Fig. 20 A cross-sectional view of a display substrate provided according to an embodiment of the present disclosure. Fig. 20 The display substrate 300b shown is Fig.17AThe difference of the display substrate 300a shown is that the portion of the insulating filling layer 104c located in the second dummy sub-region 1212 includes a hollow region HR22. The hollow region HR22 is configured to expose the first dummy electrode de10 located in the second dummy sub-region 1212. The light emitting function layer 105 contacts the first dummy electrode de10 located in the second dummy sub-region 1212. Fig.17A and Fig. 20 As shown, the light emitting function layer 105 is not in contact with the first dummy electrode de10 located in the first dummy sub-region 1211 .

[0285] At least one embodiment of the present disclosure further provides a display device, including any display substrate in the third aspect. The display device includes a micro OLED display device, but is not limited thereto. The display substrate provided in the third aspect has a sensor area R1 more than the display substrate provided in the second aspect, and the rest can refer to the description of the second aspect.

[0286] At least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, comprising: forming a first electrode pattern, the first electrode pattern being located in a display area of ​​the display substrate and comprising a plurality of first electrodes spaced apart from each other, the first electrode being configured to receive a pixel driving signal; forming a connecting electrode pattern, the connecting electrode pattern being located in a peripheral area of ​​the display substrate and comprising a plurality of connecting electrodes; forming a second electrode, the second electrode being located in the display area and the peripheral area and connected to the connecting electrode pattern, the second electrode being spaced apart from the first electrode pattern, the second electrode being configured to receive a first power supply signal; forming a light-emitting functional layer, the light-emitting functional layer being located between the first electrode pattern and the second electrode; and forming a first dummy electrode pattern, the first dummy electrode pattern comprising a plurality of first dummy electrodes; the connecting electrode pattern surrounds the first electrode pattern, the first dummy electrode pattern being located between the connecting electrode pattern and the first electrode pattern, and at least two of the plurality of first dummy electrodes being in a block shape spaced apart from each other.

[0287] At least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, comprising: forming a first electrode pattern 103, the first electrode pattern 103 is located in a display area 11 of the display substrate and includes a plurality of first electrodes 1030 spaced apart from each other; forming a connecting electrode pattern 103a, the connecting electrode pattern 103a is located in a connecting electrode area 12a of the display substrate and includes a plurality of connecting electrodes 103a0; forming a second electrode 106, the second electrode 106 is located in the display area 11 and the peripheral area 12, the second electrode 106 is connected to the connecting electrode pattern 103a, and the second electrode 106 and the first electrode pattern 103 are spaced apart from each other; and forming a first dummy electrode pattern de1, the first dummy electrode pattern de1 is located in a first dummy area 121 of the display substrate and includes a plurality of first dummy electrodes de10; the connecting electrode pattern 103a surrounds the first electrode pattern 103, and the first dummy electrode pattern is located between the connecting electrode pattern and the first electrode pattern. The first dummy electrode pattern de1 surrounds the first electrode pattern 103.

[0288] For example, the connection electrode region 12 a surrounds the display region 11 , and the first dummy region 121 is located between the connection electrode region 12 a and the display region 11 .

[0289] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, wherein the pattern density of the first electrode pattern 103 , the pattern density of the connecting electrode pattern 103 a , and the pattern density of the first dummy electrode pattern de1 are the same.

[0290] For example, at least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, which also includes forming a second dummy electrode pattern de2, wherein the second dummy electrode pattern de2 is located in a second dummy area 122 of the display substrate and includes a plurality of second dummy electrodes de20; the second dummy area 122 is located on a side of the connecting electrode area 12a away from the display area 11, and the pattern density of the second dummy electrode pattern de2 is the same as the pattern density of the first electrode pattern 103.

[0291] For example, at least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, which also includes forming a sensor electrode pattern 103b, wherein the sensor electrode pattern 103b is located in the sensor area R1 of the display substrate and includes a plurality of sensor electrodes 103b0; the pattern density of the sensor electrode pattern 103b is the same as the pattern density of the first electrode pattern 103.

[0292] For example, at least one embodiment of the present disclosure also provides a method for manufacturing a display substrate, wherein the second dummy sub-region 1212 is located between the sensor region R1 and the display region 11; the portion of the first dummy region 121 located between the sensor region R1 and the connecting electrode region 12a is the first dummy sub-region 1211; a first filling layer 104a is formed in the first dummy sub-region 1211, the first filling layer 104a includes a plurality of first dummy electrodes de10 and an insulating filling layer 104c, the first electrode pattern 103 includes an edge first electrode 103e adjacent to the connecting electrode 103a0, and the insulating filling layer 104c is in contact with the connecting electrode 103a0 and the edge first electrode 103e, respectively.

[0293] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, in which the second electrode 106 is in contact with the insulating filling layer 104 c .

[0294] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, in which the edge first electrode 103e and the plurality of first dummy electrodes de10 are insulated from each other.

[0295] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, the method further comprising forming a pixel definition layer 104 , the pixel definition layer 104 comprising a plurality of pixel definition portions 1040 , each of the plurality of pixel definition portions 1040 being located between adjacent first electrodes 1030 .

[0296] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, in which the insulating filling layer 104 c and the pixel definition layer 104 are formed from the same film layer using the same patterning process.

[0297] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, in which the first electrode pattern 103 and the connecting electrode pattern 103 a are formed from the same film layer using the same patterning process.

[0298] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, further comprising forming a second filling layer 104b, the second filling layer 104b comprising at least one second filling portion 104b0, the second filling portion 104b0 being located between adjacent connecting electrodes 103a0. For example, the second filling portion 104b0 is in contact with adjacent connecting electrodes 103a0, respectively. For example, the second filling layer 104b is an insulating layer. For example, the second filling layer 104b and the first filling layer 104a are formed by the same film layer using the same patterning process.

[0299] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, further comprising forming a third filling layer 1043, the third filling layer 1043 comprising a plurality of third filling portions 10430, the third filling portions 10430 being located between at least one of adjacent sensor electrodes 103b0, adjacent third dummy electrodes, and adjacent sensor electrodes 103b0 and third dummy electrodes. For example, the third filling layer 1043 and the pixel definition layer 104 are formed from the same film layer using the same patterning process.

[0300] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, wherein the light-emitting functional layer 105 contacts the first filling layer 104a. For example, the light-emitting functional layer 105 contacts a portion of the first filling layer 104a. For example, the light-emitting functional layer 105 contacts the sensor electrode pattern 103b.

[0301] For example, at least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, in which the light-emitting functional layer 105 is in contact with the first dummy electrode de10 located in the second dummy sub-region.

[0302] The manufacturing method of the display substrate provided by an embodiment of the present disclosure includes: forming an insulating film on a base substrate 101, patterning the insulating film to form a first via hole V1, a second via hole V2 and a third via hole V3 to form a first insulating layer 102; filling the first via hole V1, the second via hole V2 and the third via hole V3 with a conductive material to form connectors respectively; forming a conductive film on the first insulating layer 102 and the connector, and performing a patterning process on the conductive film once to simultaneously form a first electrode pattern 103, a connecting electrode pattern 103a, a first dummy electrode pattern de1, a second dummy electrode pattern de2 and a sensor electrode pattern 103b, wherein the connecting electrode pattern 103a includes a plurality of connecting electrodes 103a0, and the sensor electrode pattern 103b includes a plurality of connecting electrodes 103a1 and a plurality of connecting electrodes 103a2. 103b includes a plurality of sensor electrodes 103b0, the first dummy electrode pattern de1 includes a plurality of first dummy electrodes de10, and the second dummy electrode pattern de2 includes a plurality of second dummy electrodes de20; a pixel definition film is formed on the first electrode pattern 103, the connecting electrode pattern 103a, the first dummy electrode pattern de1 and the sensor electrode pattern 103b, and the pixel definition film is subjected to a patterning process to simultaneously form a pixel definition layer 104, an insulating filling layer 104c, a second filling layer 104b and a third filling layer 1043; a light-emitting function layer 105 is formed on the pixel definition layer 104, the insulating filling layer 104c and the third filling layer 1043; and a second electrode 106 is formed on the light-emitting function layer 105. The manufacturing method can be used to form Fig.17A and Fig.18 The display substrate is shown.

[0303] For example, in the embodiments of the present disclosure, the pattern density of the A pattern refers to the density of multiple A's included in the pattern, for example, it may refer to the number of A's per unit area, but is not limited thereto. For example, the pattern density of the first electrode pattern 103 may refer to the density of multiple first electrodes 1030 in the first electrode pattern 103, and other related contents may refer to this.

[0304] For example, in the embodiments of the present disclosure, Figure 5A As shown, the first connection member cn1 is located in the first via hole V1, and the second connection member cn2 is located in the second via hole V2. Reference numerals are not given in the remaining figures.

[0305] For example, in the embodiments of the present disclosure, Fig. 9 , Fig.12 and Fig.18 As shown, the connection electrode pattern is ring-shaped.

[0306] For example, in the embodiment of the present disclosure, the substrate 101 may include a silicon wafer, but is not limited thereto.

[0307] For example, in an embodiment of the present disclosure, at least one of the first insulating layer and the second insulating layer includes at least one of silicon oxide, silicon nitride, and silicon oxynitride.

[0308] For example, in an embodiment of the present disclosure, the sensor electrode may be configured to measure at least one parameter of temperature, brightness, etc. For example, the configuration of the sensor electrode may be the same as the configuration of the sub-pixel of the display area.

[0309] For example, in the embodiment of the present disclosure, the block-shaped element is a pattern, and there is no hollow area therein. For example, in the embodiment of the present disclosure, the first electrode pattern 103 is not block-shaped because there is a hollow area between different first electrodes 1030 included therein, and the first electrode 1030 is block-shaped because there is no hollow area therein.

[0310] For example, in an embodiment of the present disclosure, the display area includes a plurality of light-emitting elements, the plurality of light-emitting elements can emit light to display an image, and the peripheral area does not emit light.

[0311] Fig.21Schematic diagram of a conductive film formed in a method for manufacturing a display substrate provided in an embodiment of the present disclosure. The conductive film 0103 can cover the entire surface of the base substrate, and form a first electrode pattern and an element located on the same layer as the first electrode pattern through a patterning process. The element located on the same layer as the first electrode pattern includes at least one of a connecting electrode pattern, a first dummy electrode pattern, a second dummy electrode pattern, and a sensor electrode pattern. In an embodiment of the present disclosure, the conductive film is directly formed on the first insulating layer 102, and the structure formed by the conductive film through patterning is in contact with the first insulating layer 102. The structure formed by the conductive film through patterning includes at least one of a first electrode, a connecting electrode, a first dummy electrode, a second dummy electrode, and a sensor electrode.

[0312] Fig. 22 Schematic diagram of a pixel definition film formed in a method for manufacturing a display substrate provided in an embodiment of the present disclosure. The pixel definition film 0104 can cover the entire surface of the base substrate, and form a pixel definition layer and an element located on the same layer as the pixel definition layer through a patterning process. The element located on the same layer as the pixel definition layer includes at least one of a first filling layer, an insulating filling layer, a second filling layer, and a third filling layer.

[0313] In the embodiment of the present disclosure, the groove in the first insulating layer 102 located in the display area 11 may be referred to as a first groove G1 , and the groove in the first insulating layer 102 located in the peripheral area 12 may be referred to as a second groove G2 .

[0314] In the embodiments of the present disclosure, 7A to 8B As shown, a portion of the first insulating layer 102 overlapping the plurality of conductive filling parts 103 d 1 in a direction perpendicular to the base substrate 101 is not provided with a via hole.

[0315] In the embodiments of the present disclosure, FIG. 13A to FIG. 14B , FIG. 17A to FIG. 17B as well as Fig. 20 As shown, a portion of the first insulating layer 102 overlapping with the plurality of first dummy electrodes de10 in a direction perpendicular to the base substrate 101 is not provided with a via hole.

[0316] In the embodiments of the present disclosure, FIG. 13A to FIG. 14B , FIG. 17A to FIG. 17B as well as Fig. 20 As shown, a portion of the first insulating layer 102 overlapping with the plurality of second dummy electrodes de20 in a direction perpendicular to the base substrate 101 is not provided with a via hole.

[0317] In the embodiments of the present disclosure, FIG. 8A to FIG. 8B , FIG. 13A to FIG. 14B , FIG. 17A to FIG. 17B as well as Fig. 20As shown, a portion of the first insulating layer 102 overlapping with the plurality of connection electrodes 103 a 0 in a direction perpendicular to the base substrate 101 is provided with a via hole V1 .

[0318] In the embodiments of the present disclosure, FIG. 8A to FIG. 8B , FIG. 13A to FIG. 14B , FIG. 17A to FIG. 17B as well as Fig. 20 As shown, a portion of the first insulating layer 102 overlapping with the plurality of first electrodes 1030 in a direction perpendicular to the base substrate 101 is provided with a via hole V2 .

[0319] In the embodiments of the present disclosure, FIG. 17A to FIG. 17B as well as Fig. 20 As shown, a portion of the first insulating layer 102 overlapping with the plurality of sensor electrodes 1030 in a direction perpendicular to the base substrate 101 is provided with a via hole V3 .

[0320] In the embodiments of the present disclosure, FIG. 8A to FIG. 8B , FIG. 13A to FIG. 13B ,as well as FIG. 17A to FIG. 17B As shown, the conductive filling part 103d1 is floating, the first dummy electrode de10 is floating, and the second dummy electrode de20 is floating. For example, floating means not receiving a pixel driving signal. In some embodiments, the floating structure does not directly receive the first power signal. In some embodiments, the floating structure may indirectly receive the first power signal.

[0321] In an embodiment of the present disclosure, the first electrode is configured to receive a pixel driving signal, the second electrode is configured to receive a first power supply signal, and the sensor electrode is configured to receive a detection driving signal. The pixel driving signal includes, for example, at least one of a second power supply signal VDD, a data signal, a gate signal, a light emitting control signal EM, and a reset control signal RE.

[0322] In an embodiment of the present disclosure, a silicon wafer includes a silicon-based substrate and a circuit structure located on the silicon-based substrate, and the circuit structure includes a pixel circuit, a detection circuit, and the like.

[0323] Fig.23A schematic diagram of the circuit principle of a silicon-based organic light-emitting display panel provided for some embodiments of the present disclosure. The silicon-based organic light-emitting display panel includes a plurality of light-emitting elements L located in a display area 11 and a pixel circuit 110 coupled to each light-emitting element L in a one-to-one correspondence, and the pixel circuit 110 includes a driving transistor. The pixel circuit 110 is configured to provide a pixel driving signal. In addition, the silicon-based organic light-emitting display panel may also include a plurality of voltage control circuits 120 located in a peripheral area 12 of the silicon-based organic light-emitting display panel. For example, at least two pixel circuits 110 in a row share a voltage control circuit 120, and the first pole of the driving transistor in a row of pixel circuits 110 is coupled to the shared voltage control circuit 120, and the second pole of each driving transistor is coupled to the corresponding light-emitting element L. The voltage control circuit 120 is configured to output an initialization signal Vinit to the first pole of the driving transistor in response to a reset control signal RE to control the corresponding light-emitting element L to reset; and to output a second power supply signal VDD to the first pole of the driving transistor in response to a light-emitting control signal EM to drive the light-emitting element L to emit light. By sharing the voltage control circuit 120, the structure of each pixel circuit in the display area 101 can be simplified, and the occupied area of ​​the pixel circuit in the display area 11 can be reduced, so that more pixel circuits and light-emitting elements can be set in the display area 11 to realize a high PPI organic light-emitting display panel. In addition, the voltage control circuit 120 outputs the initialization signal Vinit to the first electrode of the driving transistor under the control of the reset control signal RE, and controls the corresponding light-emitting element to reset, so as to avoid the influence of the voltage loaded on the light-emitting element during the previous frame of light emission on the next frame of light emission, thereby improving the afterimage phenomenon. For example, the first electrode of the driving transistor is one of the source or the drain, and the second electrode of the driving transistor is the other of the source or the drain. In the embodiments of the present disclosure, the light-emitting element may include an organic light-emitting diode, but is not limited to this.

[0324] For example, the silicon-based organic light-emitting display panel may also include a plurality of pixel units PX located in the display area 11, each pixel unit PX includes a plurality of sub-pixels; each sub-pixel includes a light-emitting element L and a pixel circuit 110. Further, the pixel unit PX may include three sub-pixels of different colors. The three sub-pixels may be a red sub-pixel, a green sub-pixel, and a blue sub-pixel. Of course, the pixel unit PX may also include four, five or more sub-pixels, which needs to be designed and determined according to the actual application environment and is not limited here.

[0325] For example, the pixel circuits 110 in at least two adjacent sub-pixels in the same row may share a voltage control circuit 120. Fig.23As shown, all pixel circuits 110 in the same row can share a voltage control circuit 120. Alternatively, the pixel circuits 110 in two, three or more adjacent sub-pixels in the same row can share a voltage control circuit 120, which is not limited here. In this way, the occupied area of ​​the pixel circuits in the display area A can be reduced by sharing the voltage control circuit 120.

[0326] As shown in FIG26 , the two electrodes of the light emitting element L may be a first electrode 1030 and a second electrode 106. For example, the first electrode 1030 is an anode of the light emitting element L, and the second electrode 106 is a cathode of the light emitting element L. The first electrode 1030 is connected to the pixel circuit 110, and the second electrode 106 may be input with a first power signal VSS. The first power signal VSS may be transmitted to the second electrode 106 via a connecting line and a connecting electrode 103a0.

[0327] In the embodiments of the present disclosure, element A surrounds element B, which may mean that element A is located on at least one side of element B, and element A surrounds at least a portion of element B. Element B is not limited to a closed shape.

[0328] In the embodiments of the present disclosure, the components located in the same layer may be formed by the same film layer through the same patterning process. For example, the components located in the same layer may be located on the surface of the same component away from the substrate.

[0329] It should be noted that, for the sake of clarity, in the drawings used to describe the embodiments of the present disclosure, the thickness of the layer or region is exaggerated. It is understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "under" another element, the element may be "directly" "on" or "under" the other element, or there may be an intermediate element.

[0330] In the embodiments of the present disclosure, the patterning or patterning process may include only the photolithography process, or include the photolithography process and the etching step, or may include other processes such as printing and inkjetting for forming a predetermined pattern. The photolithography process refers to a process including film formation, exposure, and development, and a pattern is formed using a photoresist, a mask, an exposure machine, etc. The corresponding patterning process can be selected according to the structure formed in the embodiments of the present disclosure.

[0331] In the absence of conflict, features in the same embodiment and different embodiments of the present disclosure may be combined with each other.

[0332] The above is only a specific embodiment of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person skilled in the art who is familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present disclosure, which should be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

1. A display substrate, comprising: substrate substrate; A first insulating layer, located on the substrate; A first electrode pattern, located in a display area of ​​the display substrate, the first electrode pattern comprising a plurality of first electrodes spaced apart from each other, the first electrodes being configured to receive a pixel driving signal; A connecting electrode pattern, located in a peripheral area of ​​the display substrate, the connecting electrode pattern surrounds the first electrode pattern; a second electrode, located in the display area and the peripheral area and connected to the connection electrode pattern, the second electrode and the first electrode pattern being spaced apart from each other, and the second electrode being configured to receive a first power signal; A light-emitting functional layer is located between the first electrode pattern and the second electrode; as well as a first filling layer, located between the connecting electrode pattern and the first electrode pattern, Wherein, the first filling layer and the light-emitting functional layer are different layers; The first electrode pattern and the connecting electrode pattern are located on a side of the first insulating layer away from the base substrate and are respectively in contact with the first insulating layer. A portion of the first insulating layer located between the first electrode pattern and the connecting electrode pattern has a groove, and the first filling layer is at least partially located in the groove.

2. The display substrate according to claim 1, wherein: The first electrode pattern includes an edge first electrode close to the connection electrode pattern, and the first filling layer is in contact with the connection electrode pattern and the edge first electrode respectively.

3. The display substrate according to claim 1, wherein: The connecting electrode pattern is ring-shaped.

4. The display substrate according to claim 1, wherein: The second electrode contacts the first filling layer.

5. The display substrate according to claim 1, wherein: The first filling layer includes an insulating layer.

6. The display substrate according to claim 2, wherein: The first filling layer includes at least one conductive filling part and at least one insulating filling part, the first edge electrode contacts the insulating filling part, and the first edge electrode and the conductive filling part are spaced apart from each other.

7. The display substrate according to claim 6, wherein: The first filling layer includes a plurality of conductive filling parts and a plurality of insulating filling parts, and the plurality of conductive filling parts and the plurality of insulating filling parts are alternately arranged.

8. The display substrate according to claim 7, wherein: At least two of a pattern density of the plurality of conductive filling parts, a pattern density of the connection electrode patterns, and a pattern density of the first electrode patterns are the same.

9. The display substrate according to any one of claims 1 to 5, further comprising a pixel definition layer, wherein: The pixel definition layer includes a plurality of pixel definition parts, and the pixel definition parts are located between adjacent first electrodes.

10. The display substrate according to claim 9, wherein: The first filling layer or at least one insulating filling portion in the first filling layer is located in the same layer as the pixel definition layer.

11. The display substrate according to any one of claims 1 to 5, wherein: The first electrode pattern and the connecting electrode pattern are located in the same layer.

12. The display substrate according to any one of claims 1 to 5, further comprising a second filling layer, wherein: The second filling layer includes at least one second filling portion, the connection electrode pattern includes a plurality of connection electrodes, and the second filling portion is located between adjacent connection electrodes.

13. The display substrate according to claim 12, wherein: The second filling layer includes an insulating layer.

14. The display substrate according to claim 12, wherein: The second filling layer and the first filling layer are located on the same layer.

15. The display substrate according to any one of claims 1 to 5, wherein: The light-emitting functional layer contacts the first filling layer.

16. The display substrate according to claim 15, wherein: The light-emitting functional layer contacts a portion of the first filling layer.

17. The display substrate according to any one of claims 1 to 5, wherein: The first electrode is an anode of the light-emitting element, and the second electrode is a cathode of the light-emitting element.

18. The display substrate according to any one of claims 1 to 5, wherein: The substrate includes a silicon wafer.

19. A display device comprising the display substrate according to any one of claims 1 to 18.

20. A method for manufacturing a display substrate, comprising: forming a first insulating layer on the base substrate; forming a first electrode pattern, wherein the first electrode pattern is located in a display area of ​​the display substrate, the first electrode pattern comprises a plurality of first electrodes spaced apart from each other, and the first electrodes are configured to receive a pixel driving signal; forming a connection electrode pattern, wherein the connection electrode pattern is located in a peripheral area of ​​the display substrate and surrounds the first electrode pattern; forming a second electrode, the second electrode being located in the display area and the peripheral area, the second electrode being connected to the connection electrode pattern, the second electrode being spaced apart from the first electrode pattern, and the second electrode being configured to receive a first power signal; forming a light-emitting functional layer, wherein the light-emitting functional layer is located between the first electrode pattern and the second electrode; as well as forming a first filling layer, wherein the first filling layer is located between the connecting electrode pattern and the first electrode pattern, Among them, the first filling layer and the light-emitting functional layer are different layers, the first electrode pattern and the connecting electrode pattern are located on the side of the first insulating layer away from the base substrate and are respectively in contact with the first insulating layer, and the portion of the first insulating layer located between the first electrode pattern and the connecting electrode pattern has a groove, and the first filling layer is at least partially located in the groove.

21. The method for manufacturing a display substrate according to claim 20, wherein: The first electrode pattern includes an edge first electrode close to the connection electrode pattern, and the first filling layer is in contact with the connection electrode pattern and the edge first electrode respectively.

22. The method for manufacturing a display substrate according to claim 20, wherein: The second electrode contacts the first filling layer.

23. The method for manufacturing a display substrate according to any one of claims 20 to 22, further comprising forming a pixel definition layer, wherein: The pixel definition layer includes a plurality of pixel definition parts, and the first electrode pattern includes a plurality of first electrodes spaced apart from each other; The pixel definition portion is located between adjacent first electrodes.

24. The method for manufacturing a display substrate according to claim 23, wherein: The pixel definition layer and the first filling layer are formed by adopting the same patterning process, and the first electrode pattern and the connecting electrode pattern are formed by adopting the same patterning process.

25. The method for manufacturing a display substrate according to claim 24, wherein: Forming the first filling layer includes forming at least one conductive filling portion and forming at least one insulating filling portion, The first electrode pattern, the connecting electrode pattern and the at least one conductive filling portion are formed by the same patterning process; and The pixel definition layer and the at least one insulating filling portion are formed by adopting the same patterning process.

26. The method for manufacturing a display substrate according to claim 25, further comprising forming a second filling layer, wherein: The second filling layer includes at least one second filling portion, the connecting electrode pattern includes a plurality of connecting electrodes, and the second filling portion is located between adjacent connecting electrodes; The second filling layer is formed in the same patterning process of forming the pixel definition layer and the at least one insulating filling portion.

Images