Display panel and manufacturing method thereof, and display device

Abstract

A display panel and a manufacturing method thereof, and a display device. The display panel comprises a substrate (100), a first blocking portion (200), an encapsulation layer (300), and a touch signal line (400). The first blocking portion (200) is located in a peripheral area (102), and the first blocking portion (200) comprises a first blocking layer (210) and a second blocking layer (220); the encapsulation layer (300) covers the first blocking portion (200); the touch signal line (400) is located on the encapsulation layer (300) and covers part of the first blocking portion (200). The first blocking layer (210) comprises a first sub-blocking portion (211) and a second sub-blocking portion (212); the second sub-blocking portion (212) is located between the first sub-blocking portion (211) and the second blocking layer (220); the maximum size of the second sub-blocking portion (212) is not greater than the minimum size of the first sub-blocking portion (211). The first sub-blocking portion and the second sub-blocking portion having different sizes are formed in the first blocking layer, so that the probability of short circuit between the touch signal lines can be reduced.

Description

Technical Field

[0001] At least one embodiment of the present disclosure relates to a display panel and a manufacturing method thereof, and a display device. Background Art

[0002] The organic light-emitting display device includes a substrate and a plurality of pixels including light-emitting devices formed on the substrate, and an encapsulation layer covering the pixels is provided on the pixels. The encapsulation layer includes an inorganic insulating layer and an organic insulating layer. The organic light-emitting display device includes a display area and a peripheral area surrounding the display area, and a blocking member is provided in the peripheral area to prevent the fluid material forming the organic insulating layer from overflowing the substrate during the process of forming the organic insulating layer in the encapsulation layer. Summary of the invention

[0003] At least one embodiment of the present disclosure provides a display panel and a manufacturing method thereof, and a display device.

[0004] At least one embodiment of the present disclosure provides a display panel, comprising: a substrate, a first barrier located on the substrate, an encapsulation layer, and a plurality of touch signal lines. The substrate comprises a display area and a peripheral area located around the display area; the first barrier is located in the peripheral area, and a first portion of the first barrier located on one side of the display area extends along a first direction parallel to the substrate, the first barrier comprises a first barrier layer, a second barrier located on a side of the first barrier away from the substrate, and a third barrier located on a side of the second barrier away from the first barrier; the second barrier covers a surface of the first barrier away from the substrate and a side of the first barrier, and the third barrier covers a surface of the second barrier away from the substrate and a side of the second barrier; the encapsulation layer is located in the display area and the peripheral area, and covers the first barrier; a plurality of touch signal lines are located on a side of the encapsulation layer away from the substrate, and extend along a second direction intersecting the first direction, and the orthographic projections of the plurality of touch signal lines on the substrate overlap with the orthographic projections of the first portion of the first barrier on the substrate. The first blocking layer includes a first sub-blocking portion and a second sub-blocking portion made of the same material, and the second sub-blocking portion is located between the first sub-blocking portion and the second blocking layer; in the first part of the first blocking portion, along the second direction, the maximum size of the second sub-blocking portion is not greater than the minimum size of the first sub-blocking portion so that the inclination angle of the first slope formed on the surface of the encapsulation layer away from the junction of the first sub-blocking portion and the second sub-blocking portion is approximately 20° to 35°.

[0005] In some examples, the inclination angle of the first slope is about 27° to 33°.

[0006] In some examples, a cross-section of the first barrier layer in the first portion of the first barrier portion cut by a plane perpendicular to the first direction is approximately trapezoidal, and a first angle between a first hypotenuse included in the trapezoid and the base substrate is approximately 20° to 35°.

[0007] In some examples, in the first portion of the first blocking portion, the second blocking layer covers a surface of the first blocking layer away from the substrate and a side of the first blocking layer, and the third blocking layer covers a surface of the second blocking layer away from the first blocking layer and a side of the second blocking layer.

[0008] In some examples, the peripheral area includes a binding area, and the first portion of the first blocking portion is located on a side of the display area close to the binding area.

[0009] In some examples, the plurality of touch signal lines cover a portion of the first slope to form a second slope away from a surface of the first slope.

[0010] In some examples, the first blocking portion is an annular structure surrounding the display area, and in the second portion of the first blocking portion other than the first portion, the maximum dimension of the second sub-blocking portion along a fourth direction intersecting with the extension direction of the second portion is not greater than the minimum dimension of the first sub-blocking portion along the fourth direction so that the encapsulation layer forms a third slope on the surface away from the junction of the first sub-blocking portion and the second sub-blocking portion, and the inclination angle of the third slope is approximately 20° to 35°.

[0011] In some examples, the first sub-blocking portion and the second sub-blocking portion are integrally formed.

[0012] In some examples, in the first portion of the first blocking portion, a center line of an orthographic projection of the second sub-blocking portion on the base substrate along the first direction substantially coincides with a center line of an orthographic projection of the first sub-blocking portion on the base substrate along the first direction.

[0013] In some examples, a center line of an orthographic projection of the second blocking layer on the base substrate along the first direction substantially coincides with a center line of the second sub-blocking portion.

[0014] In some examples, the display panel also includes: a second blocking portion, located in the peripheral area and between the first blocking portion and the display area, the second blocking portion and the first blocking portion have the same extension direction, and along a third direction perpendicular to the base substrate, the size of the first blocking portion is larger than the size of the second blocking portion.

[0015] In some examples, a cross section of the second blocking portion cut by a plane perpendicular to an extension direction of the second blocking portion includes a second hypotenuse, and an absolute value of a difference between a second angle between the second hypotenuse and the base substrate and an inclination angle of the first slope is greater than 0° and less than 20°.

[0016] In some examples, the second barrier portion includes a fourth barrier layer and a fifth barrier layer located on a side of the fourth barrier layer away from the base substrate, the fourth barrier layer is disposed on the same layer as the second barrier layer, and has the same material and thickness, and the fifth barrier layer is disposed on the same layer as the third barrier layer, and has the same material and thickness.

[0017] In some examples, the display panel further comprises: a pixel circuit structure layer located in the display area; a planar layer located on a side of the pixel circuit structure layer away from the base substrate; and a light emitting element located on a side of the planar layer away from the pixel circuit structure layer. The first barrier layer is disposed on the same layer as the planar layer, and has the same thickness and material.

[0018] In some examples, the display panel further includes: a pixel defining layer located on a side of the planar layer away from the pixel circuit structure layer. The second barrier layer is disposed on the same layer as the pixel defining layer, and has the same thickness and material.

[0019] In some examples, along a third direction perpendicular to the base substrate, a ratio of a size of the first sub-blocking portion to a size of the second sub-blocking portion is approximately 0.8 to 1.2.

[0020] In some examples, along the third direction, a dimension of the first barrier layer is about 1.6 to 2.5 microns.

[0021] In some examples, along the third direction, a dimension of the first barrier portion is about 3 to 5 micrometers.

[0022] In some examples, a dimension of the first sub-blocking portion along the second direction is about 25 to 45 micrometers.

[0023] In some examples, along the second direction, a difference between a size of the first sub-blocking portion and a size of the second sub-blocking portion is 20% to 30% of the size of the first sub-blocking portion.

[0024] At least one embodiment of the present disclosure provides a method for manufacturing a display panel, comprising: providing a substrate substrate, the substrate substrate comprising a display area and a peripheral area located around the display area; forming a first blocking portion in the peripheral area of ​​the substrate substrate, wherein a first portion of the first blocking portion extends along a first direction parallel to the substrate substrate, and forming the first portion of the first blocking portion comprises: forming a first blocking layer material on the substrate substrate; using a one-step patterning process to form a first sub-blocking portion and a second sub-blocking portion stacked in a stacked manner on the first blocking layer material, the second sub-blocking portion being located on a side of the first sub-blocking portion away from the substrate substrate, and along a second direction intersecting the first direction, the maximum size of the second sub-blocking portion is not greater than the first sub-blocking portion. The minimum size of the blocking portion; forming a second blocking layer on a side of the second sub-blocking portion away from the base substrate; forming a third blocking layer on a side of the second blocking layer away from the first blocking layer; forming an encapsulation layer located in the display area and the peripheral area on a side of the first blocking portion away from the base substrate, the encapsulation layer covering a first part of the first blocking portion to form a first slope at a boundary between the first sub-blocking portion and the second sub-blocking portion and away from the base substrate, the inclination angle of the first slope being about 20° to 35°; and forming a plurality of touch signal lines extending along the second direction on a surface of the encapsulation layer away from the base substrate, the plurality of touch signal lines covering a portion of the first slope of the encapsulation layer.

[0025] In some examples, forming the first sub-barrier and the second sub-barrier disposed in a stacked manner using a one-step patterning process includes: forming the first sub-barrier and the second sub-barrier using a half-tone mask.

[0026] In some examples, the halftone mask includes a completely light-transmitting area, a partially light-transmitting area, and a non-light-transmitting area. Forming the first sub-blocking portion and the second sub-blocking portion includes: aligning the non-light-transmitting area of ​​the halftone mask with the area of ​​the first blocking layer material where the second sub-blocking portion is to be formed, aligning the partially light-transmitting area of ​​the halftone mask with the area where the first sub-blocking portion is to be formed except for the overlapping portion with the second sub-blocking portion, aligning the completely light-transmitting area of ​​the halftone mask with the area except for the area where the first sub-blocking portion is to be formed, and then exposing the first blocking layer material; developing and curing the first blocking layer material to form the first sub-blocking portion and the second sub-blocking portion.

[0027] At least one embodiment of the present disclosure provides a display device including the above-mentioned display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, but are not intended to limit the present disclosure.

[0029] Figure 1A It is a schematic diagram of a partial planar structure of a display panel;

[0030] Figure 1B For along Figure 1A Schematic diagram of the cross section taken along line AA';

[0031] Figure 2A A schematic diagram of a partial planar structure of a display panel provided according to an example of an embodiment of the present disclosure;

[0032] Figure 2B For along Figure 2A Schematic diagram of the cross-sectional structure cut by line BB';

[0033] Figure 2C A schematic diagram of a partial planar structure of a display panel provided for another example of an embodiment of the present disclosure;

[0034] Figure 2D For along Figure 2C Schematic diagram of the cross-sectional structure cut by the CC' line in FIG.

[0035] Figure 2E A schematic diagram of a partial planar structure of a display panel provided for another example of an embodiment of the present disclosure;

[0036] Figure 2F A schematic diagram of a partial cross-sectional structure of a display panel provided for another example of an embodiment of the present disclosure;

[0037] Figure 3 A schematic diagram of a partial cross-sectional structure of a display panel provided according to another example of an embodiment of the present disclosure;

[0038] Figure 4A A schematic flow chart of a method for manufacturing a display panel according to an embodiment of the present disclosure;

[0039] Figure 4B and Figure 4C FIG. 4 is a schematic process flow chart of forming a first barrier layer. DETAILED DESCRIPTION

[0040] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0041] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The words "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. The words "include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0042] Figure 1A is a schematic diagram of a partial planar structure of a display panel. Figure 1B For along Figure 1A Schematic diagram of the cross section taken along line AA' in FIG. Figure 1A and Figure 1B As shown, the display panel includes a display area 11 and a peripheral area 12 located around the display area 11 . The peripheral area 12 may surround the display area 11 or may be located at a part of the periphery of the display area 11 . Figure 1A and Figure 1B The plan view and cross-sectional view of a part of the film layer in the peripheral area 12 of the display panel are schematically shown.

[0043] like Figure 1A and Figure 1BAs shown, the peripheral area 12 of the display panel may include a substrate 10 and a buffer layer 13, a first gate insulating layer 14, a second gate insulating layer 15, an interlayer insulating layer 16, a source-drain metal layer 17, a flat layer 18, and a pixel defining layer 19 sequentially located on the substrate 10. The above-mentioned source-drain metal layer 17 corresponds to the source and drain of the thin film transistor (not shown) and the data line of the pixel circuit structure in the display area 11. The flat layer 18 located in the display area 11 is arranged on the thin film transistor, and a light-emitting element (not shown) is also arranged on the side of the flat layer 18 located in the display area 11 away from the substrate 10. The light-emitting element may include a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer. The first electrode located on the side of the light-emitting functional layer close to the substrate 10 can be electrically connected to the drain of the thin film transistor through a via provided in the flat layer 18. A pixel defining layer 19 is arranged on the side of the first electrode away from the substrate 10 to facilitate the formation of the light-emitting functional layer. The light-emitting functional layer may include a light-emitting layer and may also include other functional layers, such as a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer, but is not limited thereto. An encapsulation layer 30 is provided on the side of the light-emitting element away from the substrate 10. The encapsulation layer 30 covers the light-emitting element to prevent the light-emitting element from being corroded by water and oxygen outside, thereby protecting the light-emitting element. The encapsulation layer 30 includes an inorganic layer 31 and an organic layer 32 stacked in sequence. Figure 1B The encapsulation layer 30 is schematically shown to include two inorganic layers 31 and an organic layer 32 located between the two inorganic layers 31 .

[0044] like Figure 1A and Figure 1B As shown, a first barrier 20 and a second barrier 50 located on a side of the first barrier 20 close to the display area 11 are provided in the peripheral area 12, and the two barrier portions can be located on the source-drain metal layer 17 to prevent the organic layer 32 in the encapsulation layer 30 from overflowing the base substrate 10 during the manufacturing process. The two inorganic layers 31 in the encapsulation layer 30 can cover the first barrier 20 and the second barrier 50 to increase the path for water and oxygen to corrode the inside of the display panel, thereby improving the encapsulation effect of the display panel. Figure 1A and Figure 1B Only a portion of the blocking portion in the peripheral area 12 on one side of the display area 11 is shown. When the peripheral area 12 is arranged around the display area 11, the two blocking portions can be arranged as an annular structure around the display area 11 to prevent the material of the organic layer from overflowing to the surroundings.

[0045] like Figure 1A and Figure 1BAs shown, along the Y direction, the first barrier 20 includes a first barrier layer 21, a second barrier layer 22, and a third barrier layer 23 which are stacked in sequence, and the second barrier 50 includes a fourth barrier layer 51 and a fifth barrier layer 52 which are stacked in sequence. The first barrier layer 21 can be formed in the same layer as the flat layer 18 located in the display area 11. For example, the first barrier layer 21 can be a part of the flat layer, that is, the first barrier layer 21 is formed while the flat layer material is patterned to form the flat layer 18. The second barrier layer 22 and the fourth barrier layer 51 can be formed in the same layer as the pixel defining layer 19. For example, the second barrier layer 22 and the fourth barrier layer 51 can be a part of the pixel defining layer 19, that is, the second barrier layer 22 of the first barrier 20 and the fourth barrier layer 51 of the second barrier 50 are formed while the pixel defining layer material is patterned to form the pixel defining layer 19. The third barrier layer 23 and the fifth barrier layer 52 can be formed by patterning the same material layer. Thus, along the Y direction, the height of the first barrier portion 20 is greater than that of the second barrier portion 50 so that the material of the organic layer can be blocked by the first barrier portion after overflowing from the second barrier portion.

[0046] like Figure 1A and Figure 1B As shown, the display panel further includes a touch layer located on the surface of the encapsulation layer 30 away from the base substrate 10. The touch layer formed in the display area 11 is a touch electrode, and the touch layer formed in the peripheral area 12 is a touch signal line 40. The touch signal line 40 is electrically connected to the touch electrode to transmit a signal. The touch signal line 40 extends along the X direction, and a portion of the blocking portion extends along the Y direction. The extension direction of the touch signal line 40 intersects with the extension direction of a portion of the blocking portion. Figure 1A and Figure 1B The touch layer shown can be in direct contact with the encapsulation layer 30 (i.e., an on-cell type), that is, the touch layer is directly patterned on the surface of the encapsulation layer 30. However, it is not limited thereto, and a buffer layer can be provided between the touch layer and the encapsulation layer. Figure 1B The display panel shown omits the use of a substrate for the touch layer, which can reduce costs and improve integration to make the display panel thinner and lighter and easier to fold.

[0047] During the research, the inventors of the present application found that: Figure 1A and Figure 1BAs shown, since the height of the first barrier 20 is relatively large (for example, 3 to 6 microns) along the Y direction perpendicular to the base substrate 10, the encapsulation layer 30 located on the first barrier 20 has a relatively large step difference, which results in that during the patterning of the touch signal line 40 on the surface of the encapsulation layer 30, due to the relatively large step difference H1 at the edge of the first barrier 20, metal material remains in the corner area 24 of the encapsulation layer 30 (i.e., the edge area 24 of the first barrier 20 along the X direction). The metal material remaining in the corner area 24 of the first barrier 20 may cause the adjacent touch signal lines 40 to be electrically connected and form a defect. It should be noted that

[0048] Figure 1B The rectangular shape of some film layers (such as the film layers included in the first barrier 20 and the film layers included in the second barrier 50) in the cross-sectional view shown is only for illustration. In the actual process, during the high-temperature curing process of the second barrier layer and the third barrier layer, these two barrier layers will undergo a certain flow, resulting in the cross-sectional shape of each barrier layer being approximately trapezoidal, and the second barrier layer covers the side surface of the first barrier layer away from the substrate and the side of the first barrier layer, and the third barrier layer covers the side surface of the second barrier layer away from the substrate and the side of the second barrier layer. That is, the cross-sectional shape of the above-mentioned film layer can be a trapezoid, then the encapsulation layer 30 has an inclined surface in the corner area 24, and the angle between the inclined surface and the substrate is in the range of 40° to 45°, thereby, the touch signal line 40 is prone to residual metal material in the corner area 24.

[0049] The embodiments of the present disclosure provide a display panel and a manufacturing method thereof, and a display device. The display panel includes: a substrate, a first blocking portion, an encapsulation layer, and a plurality of touch signal lines. The substrate includes a display area and a peripheral area located around the display area; the first blocking portion is located in the peripheral area, and the first part of the first blocking portion located on one side of the display area extends along a first direction parallel to the substrate substrate, the first blocking portion includes a first blocking layer, a second blocking layer located on a side of the first blocking layer away from the substrate substrate, and a third blocking layer located on a side of the second blocking layer away from the first blocking layer; the second blocking layer covers the surface of the first blocking layer away from the substrate substrate and the side of the first blocking layer, and the third blocking layer covers the surface of the second blocking layer away from the substrate substrate and the side of the second blocking layer. The encapsulation layer is located in the display area and the peripheral area, and covers the first blocking portion; the plurality of touch signal lines are located on the side of the encapsulation layer away from the substrate substrate, and extend along a second direction intersecting the first direction, and the orthographic projections of the plurality of touch signal lines on the substrate substrate overlap with the orthographic projections of the first part of the first blocking portion on the substrate substrate. The first barrier layer includes a first sub-barrier portion and a second sub-barrier portion made of the same material, and the second sub-barrier portion is located between the first sub-barrier portion and the second barrier layer; in the first part of the first barrier portion, along the second direction, the maximum size of the second sub-barrier portion is not greater than the minimum size of the first sub-barrier portion so that the first slope formed on the surface of the encapsulation layer away from the junction of the first sub-barrier portion and the second sub-barrier portion has an inclination angle of about 20° to 35°. The embodiment of the present disclosure forms the first sub-barrier portion and the second sub-barrier portion of different sizes in the first barrier layer, thereby forming a first slope with an inclination angle of about 20° to 35° in the corner area of ​​the encapsulation layer, so as to reduce the slope angle of the touch signal line located at the edge of the first barrier portion, thereby reducing the probability of short circuit between adjacent touch signal lines to improve the yield of the display panel.

[0050] The display panel and its manufacturing method, and the display device provided by the embodiments of the present disclosure are described below with reference to the accompanying drawings.

[0051] Figure 2A is a schematic diagram of a partial planar structure of a display panel provided according to an embodiment of the present disclosure, Figure 2B For along Figure 2A Schematic diagram of the cross-sectional structure cut by line BB' in FIG. Figure 2A and Figure 2B As shown, the display panel includes a base substrate 100, a first barrier 200 located on the base substrate 100, an encapsulation layer 300 located on a side of the first barrier 200 away from the base substrate 100, and a plurality of touch signal lines 400 located on a side of the encapsulation layer 300 away from the base substrate 100. The base substrate 100 includes a display area 101 and a peripheral area 102 located around the display area 101.

[0052] Figure 2BIt is schematically shown that the touch signal line 400 is in contact with a surface of the packaging layer 300 which is away from the base substrate 100 , but the present invention is not limited thereto. A buffer layer (not shown) may be further provided between the touch signal line and the packaging layer.

[0053] For example, the display area 101 is the image display area of ​​the display panel, that is, the light emitting area; the peripheral area 102 is the area where the display panel does not display the image, that is, the non-light emitting area. The peripheral area 102 may surround the display area 101, or may be located at a part of the periphery of the display area 101. FIG. 2 schematically shows a cross-sectional view of a part of the film layer of the peripheral area 102 located at one side of the display area 101.

[0054] For example, the base substrate 100 may be a flexible base substrate 100, such as polyimide (PI), to form a flexible display device. The material of the flexible base substrate 100 is not limited to polyimide.

[0055] like Figure 2A and Figure 2B As shown, the first barrier 200 is located in the peripheral region 102 , and the first barrier 200 includes a first barrier layer 210 and a second barrier layer 220 which are stacked, and the second barrier layer 220 is located on a side of the first barrier layer 210 away from the base substrate 100 . Figure 2B It is schematically shown that the second barrier layer 220 covers the surface of the first barrier layer 210 away from the base substrate 100 and the side of the first barrier layer 210, and the third barrier layer 230 covers the surface of the second barrier layer 220 away from the first barrier layer 210 and the side of the second barrier layer 220. The embodiment of the present disclosure is described by taking the first barrier layer 210 as the film layer closest to the base substrate 100 in the first barrier part 200 as an example. The embodiment of the present disclosure is not limited thereto, and the first barrier layer, the second barrier layer and the third barrier layer can be stacked in a direction perpendicular to the base substrate, and in the first part of the first barrier part, the maximum size of the second barrier layer along the second direction is not greater than the minimum size of the second sub-barrier part along the second direction, and the maximum size of the third barrier layer along the second direction is not greater than the minimum size of the second barrier layer along the second direction.

[0056] Figure 2A and Figure 2B The first blocking portion 200 in the peripheral area 102 on one side of the display area 101 is schematically shown, that is, the first portion 201 of the first blocking portion 200 is shown, and the first portion 201 of the first blocking portion 200 extends along a first direction (ie, Z direction) parallel to the base substrate 100.

[0057] In some examples, such as Figure 2AAs shown, the peripheral area 102 includes a binding area 1021, and the first portion 201 of the first blocking portion 200 is located on a side of the display area 101 close to the binding area 1021, that is, the first portion 201 of the first blocking portion 200 is located between the display area 101 and the binding area 1021. The touch signal line 400 is located on a side of the display area 101 close to the binding area 1021, so that the first blocking portion 200 located in the area where the touch signal line 400 is located overlaps with the touch signal line 400.

[0058] For example, the binding area 1021 may include a circuit structure (not shown) to connect with signal lines such as the touch signal line 400 .

[0059] like Figure 2A and Figure 2B As shown, the first barrier layer 210 includes a first sub-blocking portion 211 and a second sub-blocking portion 212 which are made of the same material and are stacked, and the second sub-blocking portion 212 is located between the first sub-blocking portion 211 and the second barrier layer 220. In the first portion 201 of the first barrier portion 210, along a second direction intersecting the first direction (i.e., the extending direction of the touch signal line 400 mentioned later, such as the X direction), the maximum size of the second sub-blocking portion 212 is not greater than the minimum size of the first sub-blocking portion 211.

[0060] Figure 2B In the example shown, along the second direction, the maximum dimension of the second sub-blocking portion 212 is smaller than the minimum dimension of the first sub-blocking portion 211 to form a step structure.

[0061] It should be noted that Figure 2B The schematic diagram shows that the shape of the cross section of the first sub-blocking portion 211 and the second sub-blocking portion 212 cut by the XY plane is a standard trapezoid as an example. Then, along the X direction, the long side of the second sub-blocking portion 212 is smaller than the short side of the first sub-blocking portion 211 to form a step structure. For example, the orthographic projection of the second sub-blocking portion 212 on the base substrate 100 completely falls within the orthographic projection of the first sub-blocking portion 211 on the base substrate 100, and in the second direction, the two side edges of the orthographic projection of the first sub-blocking portion 211 on the base substrate 100 are located outside the two side edges of the second sub-blocking portion 212 on the base substrate 100. In the actual process, during the high-temperature curing process of the two sub-blocking portions, the two sub-blocking portions will undergo a certain flow, resulting in the cross-sectional shape of the two sub-blocking portions being approximately trapezoidal (for example, the included angle is rounded).

[0062] like Figure 2A and Figure 2BAs shown, the encapsulation layer 300 is located in the display area 101 and the peripheral area 102, and covers the first barrier 200. The encapsulation layer 300 covers the surface of the first barrier 200 away from the substrate 100 and the side of the first barrier 200. Since the maximum size of the second sub-barrier 212 is smaller than the minimum size of the first sub-barrier 211 along the second direction, a step structure is formed. Therefore, the encapsulation layer 300 forms a first slope 311 at the junction of the first sub-barrier 211 and the second sub-barrier 212 and away from the substrate 100, and the inclination angle of the first slope 311 is 20° to 35°. That is, the inclination angle of the first slope 311 formed on the surface of the encapsulation layer 300 away from the junction of the first sub-barrier 211 and the second sub-barrier 212 is about 20° to 35°. The encapsulation layer 300 has a first slope 311 with an inclination angle of 20° to 35° in a corner region 240 corresponding to a junction between the first sub-blocking portion 211 and the second sub-blocking portion 212 .

[0063] For example, the first slope 311 may have an inclination angle of about 25° to 35°. For example, the first slope 311 formed on the surface of the encapsulation layer 300 away from the junction of the first sub-blocking portion 211 and the second sub-blocking portion 212 may have an inclination angle of about 27° to 33°. For example, the first slope 311 may have an inclination angle of about 30°.

[0064] Figure 2B The example shown schematically shows that the cross section of the encapsulation layer cut by the XY plane includes a hypotenuse, and the inclination angle of the first slope is the angle between the hypotenuse of the encapsulation layer and the substrate.

[0065] For example, the embodiment of the present disclosure takes the example that the first barrier layer includes two sub-blocking portions that are stacked and have different sizes, but is not limited to this. The first barrier layer may also include more sub-blocking portions that are stacked and have different sizes to form more steps, so that the angle between the slope formed by the position of the encapsulation layer corresponding to the first barrier layer and the substrate is smaller.

[0066] For example, Figure 2B As shown, the peripheral area 102 of the display panel may include a base substrate 100 and a buffer layer 103, a first gate insulating layer 104, a second gate insulating layer 105, an interlayer insulating layer 106, a source-drain metal layer 107, a planar layer 108, and a pixel defining layer 109 sequentially located on the base substrate 100. For example, at least one of the planar layer 108 and the pixel defining layer 109 may be formed of an organic material.

[0067] The source-drain metal layer 107 corresponds to the source and drain of the thin film transistor (not shown) and the data line included in the pixel circuit structure layer in the display area 101. The flat layer 108 located in the display area 101 is arranged on the thin film transistor, and a light-emitting element (not shown) is also arranged on the side of the flat layer 108 located in the display area 101 away from the base substrate 100. The light-emitting element includes, for example, an organic light-emitting diode, but is not limited thereto.

[0068] For example, the light-emitting element may include a light-emitting layer and a first electrode and a second electrode located on both sides of the light-emitting layer. The first electrode located on the side of the light-emitting layer close to the base substrate 100 may be electrically connected to the drain of the thin film transistor through a via provided in the planar layer 108. A pixel defining layer 109 is provided on the side of the first electrode away from the base substrate 100 to facilitate the formation of the light-emitting layer. An encapsulation layer 300 is provided on the side of the light-emitting element away from the base substrate 100. For example, the encapsulation layer 300 may be a planar thin film. The encapsulation layer is used to cover the light-emitting element to prevent the light-emitting element from being corroded by water and oxygen in the outside, thereby protecting the light-emitting element. Figure 2B The encapsulation layer 300 is schematically shown to include a first inorganic layer 310, an organic layer 320, and a second inorganic layer 330 which are stacked in sequence, but is not limited thereto and can be arranged as needed. The material of the inorganic layer in the encapsulation layer includes, for example, silicon nitride, silicon oxide, or silicon oxynitride. The inorganic material has high density, so that water, oxygen, etc. can be prevented from invading the light-emitting element and affecting the performance of the light-emitting element. The material of the organic layer includes, for example, a polymer resin (such as polyimide, polyacrylate, etc.), and the organic layer has the functions of planarization and stress relief.

[0069] For example, Figure 2A and Figure 2B As shown, the first barrier 200 and the second barrier 500 provided in the peripheral area 102 may be located on the source-drain metal layer 107, and are used to prevent the organic layer 320 in the encapsulation layer 300 from overflowing the base substrate 100 during the manufacturing process. The two inorganic layers in the encapsulation layer 300 may cover the first barrier 200 and the second barrier 500 to increase the path for water and oxygen to corrode the inside of the display panel, thereby improving the encapsulation effect of the display panel. Figure 2A and Figure 2B Only a portion of the blocking portion in the peripheral area 102 located on one side of the display area 101 is shown. When the peripheral area 102 is arranged around the display area 101, both blocking portions can be arranged as an annular structure surrounding the display area 101 to prevent the material of the organic layer from overflowing to the surroundings.

[0070] like Figure 2A and Figure 2BAs shown, a plurality of touch signal lines 400 are also arranged on the surface of the side of the encapsulation layer 300 located in the peripheral area 102 away from the base substrate 100. The touch signal lines 400 can contact the surface of the encapsulation layer 300 and extend along the second direction. An insulating layer can also be arranged between the touch signal line 400 and the encapsulation layer 300, which is not limited in the embodiment of the present disclosure. The touch signal line 400 is arranged to cross the portion of the first blocking portion 200 extending along the first direction. The portion of the first blocking portion extending along the first direction refers to the portion overlapping with the touch signal line, and the first direction is the direction intersecting with the extension direction of the touch signal line.

[0071] For example, a touch electrode (not shown) is further disposed on a surface of the encapsulation layer 300 located in the display area 101 and away from the base substrate 100 , and the touch signal line 400 is electrically connected to the touch electrode to transmit a signal.

[0072] For example, the touch electrode may include a metal grid, and the metal grid includes a plurality of first touch electrodes and a plurality of second touch electrodes. The plurality of first touch electrodes and the plurality of second touch electrodes may form a capacitor at the overlapping position. When a finger touches, the coupling of the capacitor near the touch point is affected, thereby changing the capacitance of the capacitor near the touch point. Thus, the touch position can be determined by using the change in capacitance. The embodiments of the present disclosure are not limited to this. For example, the touch layer may include a mutual capacitance touch structure, and may also include a self-capacitance touch structure. In addition, the touch layer may also be made of materials such as nano silver wires.

[0073] For example, one of the first touch electrode and the second touch electrode may be patterned on the surface of the encapsulation layer.

[0074] Figure 2A and Figure 2B The touch electrodes and touch signal lines 400 in the illustrated embodiment are, for example, in direct contact with the surface of the encapsulation layer 300 (i.e., an on cell type), that is, the touch signal lines 400 are directly patterned on the surface of the encapsulation layer 300. Compared with a display panel with an external touch layer, the display panel provided by the embodiment of the present disclosure omits the use of a substrate for the touch layer, which can reduce costs and improve integration to make the display panel thinner and easier to fold. Of course, compared with a display panel with an external touch layer, when an insulating layer is provided between the touch electrodes and the touch signal lines and the encapsulation layer, costs can also be reduced, and integration can be improved to make the display panel thinner and easier to fold.

[0075] like Figure 2A and Figure 2BAs shown, the orthographic projections of the plurality of touch signal lines 400 on the substrate 100 overlap with the orthographic projections of the first portion 201 of the first blocking portion 200 extending along the first direction on the substrate 100. The touch signal line 400 covers the step formed by the first sub-blocking portion 211 and the second sub-blocking portion 212, that is, the touch signal line 400 covers part of the first slope 311 formed by the encapsulation layer 300 at the junction of the first sub-blocking portion 211 and the second sub-blocking portion 212 to form a second slope 401 on the surface of the touch signal line 400 away from the first slope 311. For example, the inclination angle of the second slope 401 can be substantially equal to the inclination angle of the first slope 311. The first slope and the second slope (and the third slope mentioned later) here are not necessarily an inclined plane, and may be a concave or convex surface with a certain curvature, etc., as long as the film layer at the corner of the junction of the first sub-blocking portion and the second sub-blocking portion can form a smooth surface.

[0076] The embodiment of the present disclosure forms at least one step structure in the first barrier layer closest to the substrate in the first barrier portion, so that the encapsulation layer can form a first slope with an inclination angle of about 20° to 35° at the position corresponding to the first barrier layer. Figure 1A and 1B The first barrier layer without a step structure shown in the figure, the portion of the touch signal line patterned on the encapsulation layer covering the edge area of ​​the first barrier portion (where the slope of the encapsulation layer is located) is more gentle, thereby reducing the probability of residual metal being formed during the process of making the touch signal line to improve the yield. Here, "about 20° to 35°" means that the numerical range can be 95% of the minimum value (20°) to 105% of the maximum value (35°), and the "about" before the subsequent numerical ranges all means that the numerical range can be 95% of the minimum value to 105% of the maximum value.

[0077] In some examples, the first sub-blocking portion 211 and the second sub-blocking portion 212 are integrally formed, that is, the first sub-blocking portion 211 and the second sub-blocking portion 212 are an integral structure formed by patterning the first barrier layer material in one step to save process. Of course, the embodiments of the present disclosure are not limited thereto, and the first barrier layer material can also be patterned to form two independent structures.

[0078] In some examples, along a third direction (Y direction) perpendicular to the base substrate 100 , a size of the first barrier layer 210 may be approximately 1.6 to 2.5 micrometers.

[0079] In some examples, along the third direction, a ratio of the size of the first sub-blocking portion 211 to the size of the second sub-blocking portion 212 may be approximately 0.8 to 1.2.

[0080] For example, along the third direction, the size of the first sub-blocking portion 211 is the same as the size of the second sub-blocking portion 212 .

[0081] In some examples, along the second direction, the size of the first sub-blocking portion 211 along the second direction is about 25 to 45 microns. The difference between the size of the first sub-blocking portion 211 and the size of the second sub-blocking portion 212 may be 20% to 30% of the size of the first sub-blocking portion 211. Since the size of the first barrier layer along the X direction cannot be too large, the difference between the size of the first sub-blocking portion and the size of the second sub-blocking portion is designed to be 20% to 30% of the size of the first sub-blocking portion 211 to prevent the first barrier layer from affecting its surrounding structures.

[0082] For example, along the second direction, the size of the first sub-blocking portion 211 may be 40 micrometers, and the difference between the size of the first sub-blocking portion 211 and the size of the second sub-blocking portion 212 is 5-10 micrometers.

[0083] For example, in Figure 2B The dimension of the first barrier layer 210 in the direction perpendicular to the base substrate 100 is designed to be Figure 1B The first barrier layer 21 in the display panel shown in the figure has the same size along the direction perpendicular to the base substrate 10 and is Figure 2B The size of the second sub-blocking portion 212 along the second direction is designed to be Figure 1B When the dimensions of the first blocking layer 21 in the display panel shown in the figure are the same along the second direction, the angle of the first slope 311 of the encapsulation layer 300 corresponding to the first blocking layer 210 can be adjusted by adjusting the dimension relationship between the first sub-blocking portion 211 and the second sub-blocking portion 212 in the first blocking layer 210 along the second direction and the third direction, thereby preventing the touch signal line 400 located on the first slope 311 from short-circuiting due to residual metal material.

[0084] In addition, compared to directly Figure 1B The size of the first barrier layer 21 along the second direction is designed to be Figure 2B The size of the first sub-blocking portion 211 along the second direction is such that Figure 1B In the scheme where the first barrier layer 21 and the second barrier layer 22 form a step structure, in the embodiment of the present disclosure, the first barrier layer is designed to include a first sub-blocking portion and a second sub-blocking portion of different sizes so that the first barrier layer itself forms a step structure, which can make the inclination angle of the slope on the packaging layer smaller, and is more conducive to improving the yield of the touch signal line.

[0085] For example, in Figure 1BWhen the cross-sectional shape of the first barrier layer 21 is a trapezoid, the encapsulation layer 30 corresponding to the first barrier layer 21 may also form a slope, but the angle between the slope and the base substrate 10 is relatively large, for example, greater than 40°, which may cause residual metal to exist in the touch signal line formed on the slope and cause defects. In the embodiment of the present disclosure, by forming two sub-barriers of different sizes in the first barrier layer, the angle of the slope of the encapsulation layer can be made smaller, and the slope of the encapsulation layer can be made gentler, thereby reducing the residual metal material of the touch signal line patterned on the slope.

[0086] like Figure 2B As shown, in an example of the embodiment of the present disclosure, in the first part 201 of the first barrier 200, the second barrier layer 220 covers the surface of the first barrier 210 away from the base substrate 100 and the side of the first barrier 210. However, it is not limited to this. For example, the maximum size of the second barrier 220 along the second direction may not be greater than the minimum size of the second sub-barrier 212 along the second direction. The cross-sectional shape of the second barrier 220 and the second sub-barrier 212 may be a trapezoid, and the long side of the second barrier is not greater than the short side of the second sub-barrier. For example, when the maximum size of the second barrier is equal to the minimum size of the second sub-barrier, the surface of the second barrier facing the second sub-barrier completely overlaps with the surface of the second sub-barrier facing the second barrier.

[0087] For example, along the second direction, the maximum size of the second barrier layer 220 may be smaller than the minimum size of the second sub-barrier portion 212 to form a step structure. The embodiment of the present disclosure can increase the number of steps in the first barrier portion to make the slope of the encapsulation layer formed at the edge of the first barrier portion more gentle, so as to further prevent the touch signal line from short-circuiting.

[0088] In some examples, such as Figure 2B As shown, the center line of the orthographic projection of the second sub-blocking portion 212 on the base substrate 100 along the first direction roughly coincides with the center line of the orthographic projection of the first sub-blocking portion 211 on the base substrate 100 along the first direction. That is, along the second direction, the orthographic projection of the second sub-blocking portion 212 on the first sub-blocking portion 211 is located in the middle of the first sub-blocking portion 211. For example, the cross-sectional shape of the first barrier layer 210 is roughly "convex". Thus, both sides of the first barrier layer along the second direction can form a step structure, effectively preventing the touch signal lines located on both sides of the first barrier layer from being defective.

[0089] In some examples, such as Figure 2B As shown, a center line of an orthographic projection of the second blocking layer 220 on the base substrate 100 along the first direction substantially coincides with a center line of an orthographic projection of the second sub-blocking portion 212 on the base substrate 100 along the first direction.

[0090] For example, when the size of the second blocking layer 220 along the second direction is smaller than the size of the second sub-blocking portion 212 along the second direction, along the second direction, the orthographic projection of the second blocking layer 220 on the second sub-blocking portion 212 is located in the middle of the second sub-blocking portion 212 so that steps can be formed on both sides of the second blocking layer 220 and the second sub-blocking portion 212 along the second direction, thereby further preventing defects in the touch signal line covering the first blocking portion.

[0091] In some examples, such as Figure 2B As shown, the first barrier 200 further includes a third barrier 230 located on a side of the second barrier 220 away from the first barrier 210. In an example of the embodiment of the present disclosure, in the first portion 201 of the first barrier 200, the third barrier 230 covers the surface of the second barrier 220 away from the base substrate 100 and the side of the second barrier 220. The embodiment of the present disclosure is not limited thereto, for example, the maximum dimension of the third barrier 230 along the second direction may not be greater than the minimum dimension of the second barrier 220 along the second direction.

[0092] For example, the cross-sectional shape of the second barrier layer 220 and the third barrier layer 230 may be a trapezoid, and the long side of the third barrier layer is not greater than the short side of the second barrier layer. For example, when the maximum dimension of the third barrier layer is equal to the minimum dimension of the second barrier layer, the surface of the third barrier layer facing the second barrier layer completely overlaps with the surface of the second barrier layer facing the third barrier layer.

[0093] For example, along the second direction, the maximum dimension of the third barrier layer 230 may be smaller than the minimum dimension of the second barrier layer 220 to form a step structure. The disclosed embodiment can increase the number of steps in the first barrier so that the encapsulation layer formed at the edge of the first barrier is smoother, thereby further preventing the metal residues in the patterned touch signal lines from causing short circuits.

[0094] In some examples, such as Figure 2B As shown, along the third direction, the size of the first barrier 200 is about 3 to 6 microns. Figure 2B As shown, along the third direction, the size of the first barrier 200 is about 4.5 to 5 microns. Figure 2B As shown, along the third direction, the size of the first barrier portion 200 is about 4 microns.

[0095] Relative to Figure 1B In the display panel shown in FIG. 1 , the dimension of the first barrier portion in the display panel provided by the embodiment of the present disclosure along the direction perpendicular to the base substrate remains unchanged (i.e., the step difference H2 of the touch signal line 400 at the edge of the first barrier portion 200 in the display panel provided by the embodiment of the present disclosure is equal to the step difference H3 of the touch signal line 400 at the edge of the first barrier portion 200). Figure 1BThe step difference H1 of the touch signal line 40 located at the edge of the first blocking part 20 shown in the figure is equal), and at least two sub-blocking parts of different sizes can be formed in the first blocking layer to form a step structure, thereby reducing the inclination angle of the slope of the packaging layer located at the edge of the first blocking part, thereby improving the yield of the touch signal line.

[0096] In some examples, such as Figure 2A and Figure 2B As shown, the display panel further includes a second blocking portion 500. The second blocking portion 500 is located in the peripheral area 102 and between the first blocking portion 200 and the display area 101. The second blocking portion 500 and the first blocking portion 200 extend in the same direction. Figure 2A In the peripheral area 102 shown, the second blocking portion 500 extends along the first direction.

[0097] In some examples, such as Figure 2B As shown, the surface of the second barrier 500 facing the substrate 100 and the surface of the first barrier 200 facing the substrate 100 are on the same plane parallel to the substrate 100. That is, the surface of the second barrier 500 facing the substrate 100 is flush with the surface of the first barrier 200 facing the substrate 100.

[0098] In some examples, such as Figure 2B As shown, along the third direction, the size of the first barrier 200 is greater than that of the second barrier 500 so that the material of the organic layer in the encapsulation layer can be blocked by the first barrier after overflowing from the second barrier.

[0099] For example, along the third direction, the size of the first blocking portion 200 is about 2 microns larger than the size of the second blocking portion 500. The height of the second blocking portion is not high, and basically does not cause the touch signal line on the second blocking portion to have a large step difference, so the touch signal line on the second blocking portion is not prone to failure. Of course, in order to avoid failure of the touch signal line on the second blocking portion, a step structure can also be formed in the second blocking portion.

[0100] For example, a cross section of the second blocking portion 500 cut by a plane perpendicular to the extension direction of the second blocking portion 500 includes a second hypotenuse 501, and the absolute value of the difference between the second angle between the second hypotenuse 501 and the base substrate 100 and the inclination angle of the first slope 311 is greater than 0° and less than 20°.

[0101] exist Figure 1B In the display panel shown, when the cross-sectional shapes of the first blocking portion and the second blocking portion are both trapezoidal, the angles between the hypotenuses of the two portions and the base substrate are equal. Figure 2BIn the example shown, since the thickness of the second blocking portion is relatively low, it will not have a significant impact on the touch signal line formed thereon, so the second blocking portion is not adjusted during the formation process, and the angle of the bevel after forming is the same as Figure 1B The angles of the second blocking portions shown are the same, both greater than 40°. However, since the first blocking portion adjusts the size relationship between the first sub-blocking portion and the second sub-blocking portion to form a step structure during the process of forming the first blocking portion, the inclination angle of the first slope of the encapsulation layer formed on the first blocking portion in this example is significantly smaller than the inclination angle of the slope of the encapsulation layer formed on the second blocking portion. As a result, metal residue is not likely to appear during the process of patterning the touch signal line located on the first blocking portion.

[0102] For example, when the peripheral area 102 is disposed around the display area 101 , the second barrier 500 may be disposed as a ring structure surrounding the display area 101 .

[0103] For example, the distance between the first barrier 200 and the second barrier 500 along the second direction may be about 1.5-2.5 microns, and the size of the first sub-barrier 211 of the first barrier layer 210 along the X direction cannot be too large to prevent contact with the second barrier 500 .

[0104] In some examples, such as Figure 2B As shown, the second barrier portion 500 includes a fourth barrier layer 510 and a fifth barrier layer 520 located on a side of the fourth barrier layer 510 away from the base substrate 100 .

[0105] For example, Figure 2B As shown, in an example of the embodiment of the present disclosure, the cross-sections of the fourth barrier layer 510 and the fifth barrier layer 520 are both trapezoidal, and the fifth barrier layer 520 can cover the surface of the fourth barrier layer 510 away from the base substrate 100 and the side of the fourth barrier layer 510, and the embodiment of the present disclosure is not limited to this. For example, along the second direction, the maximum size of the fifth barrier layer 520 may not be greater than the minimum size of the fourth barrier layer 510.

[0106] For example, in the embodiment of the present disclosure, the fourth barrier layer 510 is taken as an example as the film layer in the second barrier portion 500 that is closest to the base substrate 100 . A step structure may also be formed in the fourth barrier layer 510 .

[0107] For example, along the second direction, the size of the fifth barrier layer 520 can be smaller than the size of the fourth barrier layer 510 to form a step structure. The embodiments of the present disclosure are not limited to this. The size of the fifth barrier layer along the second direction can also be the same as the size of the fourth barrier layer along the second direction to facilitate manufacturing.

[0108] In some examples, the fourth barrier layer 510 is disposed in the same layer as the second barrier layer 220, and the materials and thicknesses of the two are the same, that is, the material of the fourth barrier layer 510 is the same as the material of the second barrier layer 220, and the thickness of the fourth barrier layer 510 is the same as the thickness of the second barrier layer 220. The fifth barrier layer 520 is disposed in the same layer as the third barrier layer 230, and the materials and thicknesses of the two are the same, that is, the material of the fifth barrier layer 520 is the same as the material of the third barrier layer 230, and the thickness of the fifth barrier layer 520 is the same as the thickness of the third barrier layer 230. That is, the fourth barrier layer 510 and the second barrier layer 220 can be two film layers formed by the same material in the same step of patterning process, and the fifth barrier layer 520 and the third barrier layer 230 can also be two film layers formed by the same material in the same step of patterning process to save process. Here and in the following, "same layer" refers to the relationship between multiple film layers formed by the same material after the same step (for example, one-step patterning process). Here, "same layer" does not always mean that the thickness of multiple film layers is the same or the height of multiple film layers in the cross-sectional view is the same.

[0109] For example, the first barrier layer 210 is provided at the same layer as the planar layer 108, and the thickness and material of the first barrier layer 210 are the same. The thickness of the first barrier layer 210 is the same as that of the planar layer 108, and the material of the first barrier layer 210 is the same as that of the planar layer 108. The first barrier layer 210 can be formed at the same layer as the planar layer 108, for example, it can be a part of the planar layer 108, that is, the first barrier layer 210 is formed while the planar layer material is patterned to form the planar layer 108. Since the formed planar layer is used to planarize the pixel circuit structure layer (such as a film layer such as a thin film transistor) to form a light-emitting element on the planar layer, the thickness of the planar layer is relatively thick, for example, 1.6 to 2.5 microns. Therefore, the thickness of the first barrier layer is relatively thick.

[0110] For example, the second barrier layer 220 and the fourth barrier layer 510 can be formed in the same layer as the pixel defining layer 109, and the materials and thicknesses of the three are the same. For example, it can be a part of the pixel defining layer 109, that is, the second barrier layer 220 of the first barrier 200 and the fourth barrier layer 510 of the second barrier 500 are formed while the pixel defining layer material is patterned to form the pixel defining layer 109.

[0111] Figure 2C A schematic diagram of a partial planar structure of a display panel provided for another example of an embodiment of the present disclosure, Figure 2D For along Figure 2C Schematic diagram of the cross-sectional structure cut by the CC' line in FIG. Figure 2CAs shown, the peripheral area 102 is arranged around the display area 101, and the first blocking portion 200 can be arranged as a ring-shaped structure surrounding the display area 101. The first blocking portion 200 includes a first portion 201 and a second portion 202, and the second portion 202 is the portion of the first blocking portion 200 other than the first portion 201, that is, the first portion 201 and the second portion 202 constitute the ring-shaped first blocking portion 200. In the embodiment of the present disclosure, taking the display area 101 as a quadrilateral as an example, the first portion 201 of the first blocking portion 200 is a blocking portion located on one side of the display area 101, and the second portion 202 of the first blocking portion 200 is a blocking portion surrounding the other three sides of the display area 101.

[0112] For example, Figure 2C and Figure 2D As shown, the second sub-blocking portion 212 extends along a fourth direction ( Figure 2C Taking the sub-portion of the second portion 202 extending along the X direction as an example, the direction intersecting with the extension direction of the sub-portion may be the Z direction) as an example, the maximum dimension of the sub-portion is smaller than the minimum dimension of the first sub-blocking portion 211 along the fourth direction so that the surface of the encapsulation layer away from the junction of the first sub-blocking portion 211 and the second sub-blocking portion 212 forms a third slope 312. The inclination angle of the third slope 312 is Figure 2B The first slopes 311 shown are substantially the same, ie, the size relationship between the first sub-blocking portion 211 and the second sub-blocking portion 212 in the first portion 201 of the first blocking portion 200 is the same as the size relationship between the first sub-blocking portion 211 and the second sub-blocking portion 212 in the second portion 202 .

[0113] For example, the inclination angle of the third slope 312 is about 20° to 35°. For example, the inclination angle of the third slope is about 27° to 33°. For example, the inclination angle of the third slope 312 is about 30°.

[0114] For example, the fourth direction is perpendicular to the extending direction of the second portion 202 .

[0115] For example, the film layer 4000 for forming the touch signal line covers a portion of the third slope 312 formed at the junction of the first sub-blocking portion 211 and the second sub-blocking portion 212 of the encapsulation layer 300 to form a fourth slope 402 on the surface of the film layer 4000 away from the third slope 312 .

[0116] After the third slope is formed on the surface of the packaging layer away from the junction of the first sub-blocking portion and the second sub-blocking portion due to the different sizes of the first sub-blocking portion and the second sub-blocking portion in the second part of the first blocking portion, it is not easy for residual metal to appear at the third slope position in the film layer deposited on the packaging layer for forming the touch signal line during the process of patterning the touch signal line. Figure 2DThe film layer 4000 shown on the packaging layer is a film layer for forming touch signal lines. After the touch signal lines are patterned, the film layer will be removed.

[0117] Of course, the disclosed embodiments are not limited thereto, and the size relationship between the first sub-blocking portion and the second sub-blocking portion in the second portion of the first blocking portion may also be different from the size relationship between the first sub-blocking portion and the second sub-blocking portion in the first portion of the first blocking portion. For example, in the second portion of the first blocking portion, the surface of the first sub-blocking portion facing the second sub-blocking portion completely overlaps with the surface of the second sub-blocking portion facing the first sub-blocking portion to facilitate manufacturing.

[0118] For example, a touch electrode 420 is further disposed on a side of the encapsulation layer 300 located in the display area 101 away from the base substrate 100 , and the touch signal line 400 is electrically connected to the touch electrode 420 to transmit a signal.

[0119] For example, the touch electrode 420 includes a plurality of first touch electrodes 421 and a plurality of second touch electrodes 422, and the first touch electrodes 421 and the second touch electrodes 422 are cross-insulated. The plurality of first touch electrodes 421 extend along the X direction and are arranged along the Z direction; the plurality of second touch electrodes 422 extend along the Z direction and are arranged along the X direction. The plurality of first touch electrodes 421 and the plurality of second touch electrodes 422 are connected to the lead terminal area through a plurality of touch signal lines 400, and the detection of the touch operation and the detection of the position where the touch operation occurs can be realized by applying detection electrical signals to the plurality of touch signal lines 400. For example, the first touch electrode 421 is connected to the touch signal line 400 on both sides of the X direction to realize bilateral driving. Of course, the embodiments of the present disclosure are not limited thereto, and the first touch electrode can also be connected to the touch signal line on only one side to realize unilateral driving.

[0120] The plurality of first touch electrodes 421 and the plurality of second touch electrodes 422 may form a capacitor at the overlapping position. When a finger touches, the coupling of the capacitor near the touch point is affected, thereby changing the capacitance of the capacitor near the touch point. Thus, the touch position may be determined by using the change in capacitance. The disclosed embodiments are not limited thereto. For example, the touch layer may include a mutual capacitance touch structure or a self capacitance touch structure. In addition, the touch layer may also be made of materials such as nano silver wires.

[0121] For example, one of the first touch electrode and the second touch electrode may be patterned on the surface of the encapsulation layer.

[0122] Figure 2CIn the illustrated embodiment, the touch electrodes and the touch signal lines can be in direct contact with the surface of the encapsulation layer (i.e., an on-cell type), i.e., the touch signal lines are directly patterned on the encapsulation layer; or an insulating layer can be provided between the touch electrodes and the touch signal lines and the encapsulation layer. Compared with a display panel with an external touch layer, the display panel provided by the embodiment of the present disclosure eliminates the use of a substrate for the touch layer, which can reduce costs and improve integration to make the display panel thinner and easier to fold.

[0123] For example, Figure 2E A schematic diagram of the cross-sectional structure of a display panel provided as another example in the embodiments of the present disclosure. Figure 2E The display panel in the example shown is Figure 2B The difference of the display panel shown is that the cross section of the first barrier layer 210 in the first part of the first barrier 200 cut by a plane perpendicular to the first direction is approximately trapezoidal. The first angle between the first hypotenuse 203 included in the trapezoid and the base substrate 100 is about 20° to 35°. That is, in the first part of the first barrier, along the second direction, the maximum size of the second sub-barrier is equal to the minimum size of the first sub-barrier, so that the cross section of the first barrier is trapezoidal.

[0124] In this example, when the first sub-blocking portion and the second sub-blocking portion are formed, the maximum size of the second sub-blocking portion is smaller than the minimum size of the first sub-blocking portion, but the materials of the two sub-blocking portions will flow to a certain extent during the high-temperature curing process, so that the cross-sectional shape of the two sub-blocking portions is trapezoidal, and the maximum size of the second sub-blocking portion is equal to the minimum size of the first sub-blocking portion.

[0125] exist Figure 1B When the cross-sectional shape of the first barrier layer 21 is a trapezoid, the angle between the hypotenuse of the trapezoid and the base substrate 10 is relatively large, for example, greater than 40°, which may cause residual metal to exist in the touch signal line formed on the first barrier layer and cause defects. Figure 1B The first blocking part shown, in this example, includes a first oblique edge of the first blocking layer including a first sub-blocking part and a second sub-blocking part, and the first angle between the base substrate is about 20° to 35°, which can make the angle of the slope of the encapsulation layer smaller and the slope of the encapsulation layer smoother, thereby reducing the residual metal material of the touch signal line patterned on the slope.

[0126] For example, the first angle between the first oblique edge 203 and the base substrate 100 is about 25° to 35°. For example, the first angle between the first oblique edge 203 and the base substrate 100 is about 30°.

[0127] For example, Figure 2EIt is schematically shown that in the first part 201 of the first barrier 200, the second barrier layer 220 covers the surface of the first barrier 210 away from the base substrate 100 and the side of the first barrier 210, and the third barrier 230 covers the surface of the second barrier 220 away from the base substrate 100 and the side of the second barrier 220. However, it is not limited to this. For example, the maximum size of the second barrier 220 along the second direction may not be greater than the minimum size of the second sub-barrier 212 along the second direction, and the maximum size of the third barrier 230 along the second direction may not be greater than the minimum size of the second barrier 220 along the second direction. For example, the maximum size of the second barrier 220 along the second direction is equal to the minimum size of the second sub-barrier 212 along the second direction, and the maximum size of the third barrier 230 along the second direction is equal to the minimum size of the second barrier 220 along the second direction. The embodiments of the present disclosure are not limited to this.

[0128] For example, Figure 2E Schematically shown, the fifth barrier layer 520 covers the surface of the fourth barrier layer 510 away from the substrate 100 and the side of the fourth barrier layer 510. The embodiment of the present disclosure is not limited thereto. For example, along the second direction, the maximum size of the fifth barrier layer 520 is not greater than the minimum size of the fourth barrier layer 510. For example, the maximum size of the fifth barrier layer 520 may be equal to the minimum size of the fourth barrier layer 510.

[0129] For example, a cross section of the second blocking portion 500 cut by a plane perpendicular to the extension direction of the second blocking portion 500 includes a second oblique side 501, and the absolute value of the difference between the second angle between the second oblique side 501 and the base substrate 100 and the inclination angle of the first slope 311 is greater than 0° and less than 20°. In other words, the absolute value of the difference between the second angle between the second oblique side 501 and the base substrate 100 and the first angle between the first oblique side 203 and the base substrate 100 is greater than 0° and less than 20°.

[0130] exist Figure 1B In the display panel shown, when the cross-sectional shapes of the first blocking portion and the second blocking portion are both trapezoidal, the angles between the hypotenuses of the two portions and the base substrate are equal. Figure 2E In the example shown, since the thickness of the second blocking portion is relatively low, it will not have a significant impact on the touch signal line formed thereon, so the second blocking portion is not adjusted during the formation process, and the angle of the bevel after forming is the same as Figure 1BThe angles of the second blocking portions shown are the same, both greater than 40°. However, since the first blocking portion adjusts the size relationship between the first sub-blocking portion and the second sub-blocking portion during the formation of the first blocking portion (the size of the second sub-blocking portion is smaller than the size of the first sub-blocking portion), the inclination angle of the first oblique side of the cross section of the first blocking portion in this example is significantly smaller than the inclination angle of the second oblique side of the cross section of the second blocking portion. As a result, metal residue is not likely to appear during the process of patterning the touch signal line located on the first blocking portion.

[0131] Figure 2F A schematic diagram of the cross-sectional structure of a display panel provided as another example in the embodiments of the present disclosure. Figure 2E The display panel in the example shown is Figure 2B The difference of the display panel shown is that in the first part of the first barrier 200, the cross-sectional shapes of the second barrier layer 220 and the third barrier layer 230 are not standard trapezoidal, but the cross-sectional shapes of the two barrier layers are approximately trapezoidal. That is, when the second barrier layer and the third barrier layer are formed, the two layers of material will flow to a certain extent during the high-temperature curing process, so that the cross-sectional shapes of the two barrier layers are rounded.

[0132] In this example, when the first sub-blocking portion and the second sub-blocking portion are formed, the maximum size of the second sub-blocking portion is smaller than the minimum size of the first sub-blocking portion, but the materials of the two sub-blocking portions will flow to a certain extent during the high-temperature curing process, so that the cross-sectional shape of the two sub-blocking portions is a rounded trapezoid; or the maximum size of the second sub-blocking portion is equal to the minimum size of the first sub-blocking portion, and there is no obvious boundary between the two.

[0133] exist Figure 1B When the second barrier layer in the structure shown covers the surface of the first barrier layer away from the substrate and the side of the first barrier layer, and the third barrier layer covers the surface of the second barrier layer away from the first barrier layer and the side of the second barrier layer, compared with the structure, in the embodiment of the present disclosure, by forming two sub-blocking parts of different sizes in the first barrier layer, the slope angles of the second barrier layer and the third barrier layer formed on the first barrier layer can be made smaller, so that the inclination angle of the first slope formed on the surface of the encapsulation layer formed on the third barrier layer away from the junction of the first sub-blocking part and the second sub-blocking part is about 20°~35°, thereby reducing the slope angle of the touch signal line located at the edge of the first barrier part, thereby reducing the probability of short circuit between adjacent touch signal lines to improve the yield of the display panel.

[0134] like Figure 2FAs shown, the encapsulation layer 300 covering the first barrier 200 includes a flat portion E1 and a slope portion E2, and the slope portion E2 includes a first slope 311. The thickness of the encapsulation layer 300 covering the first barrier 200 is h (the thickness does not include the thickness of the flat portion outside the first barrier). When the first slope of the encapsulation layer 300 is an arc surface, the embodiment of the present disclosure takes the slope of the line 313 connecting the point O at half the height of the encapsulation layer 300 and the end point P of the slope portion E2 of the encapsulation layer 300 away from the flat portion E1 as an example of the slope of the first slope 311, and the angle between the line 313 and the plane where the base substrate 100 is located is the inclination angle of the first slope 311.

[0135] Figure 3 is a schematic diagram of a partial cross-sectional structure of a display panel provided according to another example of an embodiment of the present disclosure, Figure 3 The encapsulation layer and the touch electrode structures are not shown in the partial display area 101 of the display panel. Figure 3 Part of the structure is omitted between the dotted lines in the display area 101. And, Figure 3 The peripheral area of ​​the display panel in Figure 2E The structure shown is taken as an example, but is not limited thereto. Figure 2B The structure shown or Figure 2F The structure shown. Figure 3 The partial display area 101 schematically shows the pixel circuit structure layer 130, the planar layer 108 and the light emitting element 120. Figure 3 As shown, Figure 2B The display panel shown is different in that the display panel in this example includes a first source-drain metal layer 107 and a second source-drain metal layer 110 (double SD structure). The first barrier 200 and the second barrier 500 may be formed on the second source-drain metal layer 110 .

[0136] For example, the two source and drain metal layers are made of the same material, and can both be titanium-aluminum-titanium structures. Designing two source and drain metal layers (double SD structure) can help improve the brightness uniformity of the display panel and reduce the power consumption of the driver IC.

[0137] For example, Figure 3 As shown, the display panel includes a first flat layer 1081 located on the side of the second source-drain metal layer 110 away from the first source-drain metal layer 107 and a second flat layer 1082 located between the two source-drain metal layers, and the two source-drain metal layers are electrically connected in the display area 101. The two source-drain metal layers here are used as data signal routing lines, and the design of electrically connecting two data signal routing lines located in different layers can reduce the spacing between the routing lines.

[0138] For example, Figure 3As shown, a first electrode 121 of a light-emitting element is further disposed on the side of the pixel defining layer 109 located in the display area 101 facing the base substrate 100 , and the first electrode 121 is electrically connected to the second source-drain metal layer 110 .

[0139] Another embodiment of the present disclosure provides a method for manufacturing a display panel. Figure 4A A schematic flow chart of a method for manufacturing a display panel provided in an embodiment of the present disclosure, Figure 4B and Figure 4C FIG. 4 is a schematic process flow chart for forming a first barrier layer. Figure 4A As shown, the method for manufacturing the display panel includes the following steps.

[0140] S201: Provide a substrate.

[0141] For example, the manufacturing method provided by the embodiment of the present disclosure can form Figure 3 The display panel shown. Figure 3 As shown, the base substrate 100 includes a display area 101 and a peripheral area 102 located around the display area 101 .

[0142] For example, the base substrate 100 may be a flexible base substrate, such as polyimide (PI), to form a flexible display device. The material of the flexible base substrate 100 is not limited to polyimide.

[0143] S202: forming a first blocking portion in a peripheral region of the base substrate.

[0144] For example, Figure 3 As shown, before forming the first blocking portion 200, a buffer layer 103, a first gate insulating layer 104, a second gate insulating layer 105, an interlayer insulating layer 106, a first source-drain metal layer 107, a second planarizing layer 1082, a second source-drain metal layer 110, a first planarizing layer 1081 and a pixel defining layer 109 and other film layers may be formed in sequence on the base substrate 100.

[0145] For example, a portion of the first barrier portion 200 formed in the peripheral region 102 is parallel to the first direction (perpendicular to the first direction) of the base substrate 100. Figure 3 The X direction shown extends in the figure.

[0146] like Figure 4B As shown, forming the first barrier portion 200 includes: forming a first barrier layer material 3100 on the base substrate 100 . Figure 4B Only the base substrate 100 and the first barrier layer material 3100 are shown, and the film layer therebetween is not shown.

[0147] For example, the first barrier layer material 3100 may include an organic material, such as a material including one or a combination of polyimide, polyamide, polycarbonate, epoxy resin, etc., or a photoresist material, etc.

[0148] like Figure 4C As shown, the first barrier layer material is subjected to a one-step patterning process to form a first sub-barrier portion 211 and a second sub-barrier portion 212 stacked to form a film layer (first barrier layer 210 ) on the side of the first barrier portion 200 closest to the base substrate 100 .

[0149] like Figure 4C As shown, in some examples, forming the first sub-blocking portion 211 and the second sub-blocking portion 212 in a stacked arrangement using a one-step patterning process includes: forming the first sub-blocking portion 211 and the second sub-blocking portion 212 using a half-tone mask 600. In addition, the formed second sub-blocking portion 212 is located on a side of the first sub-blocking portion 211 away from the base substrate 100, and along a second direction (X direction) intersecting the first direction, the maximum size of the second sub-blocking portion 212 is smaller than the minimum size of the first sub-blocking portion 211, thereby forming a step structure. Figure 4C It is schematically shown that the cross-sectional shapes of the first sub-blocking portion and the second sub-blocking portion are rectangular. In the actual process, the cross-sectional shapes of the two portions may both be trapezoidal.

[0150] like Figure 4CAs shown, in some examples, the halftone mask 600 includes a completely light-transmitting area 610, a partially light-transmitting area 620, and a non-light-transmitting area 630. Forming the first sub-blocking portion 211 and the second sub-blocking portion 212 includes: aligning the non-light-transmitting area 630 of the halftone mask 600 with the area of ​​the first blocking layer material where the second sub-blocking portion 212 is to be formed, aligning the partially light-transmitting area 620 of the halftone mask 600 with the area of ​​the first sub-blocking portion 211 to be formed except the overlapping portion with the second sub-blocking portion 212, aligning the completely light-transmitting area 610 of the halftone mask 600 with the area except the area where the first sub-blocking portion 211 is to be formed, and then exposing the first blocking layer material using the laser 700. That is, a fully exposed area is formed at a position where the first barrier layer 210 is not needed, a partially exposed area is formed at a position where the first barrier layer 210 with a relatively thin thickness is formed (i.e., the position of the first sub-barrier 211 except for the overlapping portion with the second sub-barrier 212), and no exposure is performed at a position where the first barrier layer 210 with a relatively thick thickness is formed (i.e., the second sub-barrier 212). Then, the first barrier layer material 3100 is developed and cured to form the first sub-barrier 211 and the second sub-barrier 212. This example is described by taking the first barrier layer material as a material including a positive photoresist as an example, but this example is not limited thereto. For example, a material including a negative photoresist may also be used. When the first barrier layer material is a material including a negative photoresist, the positions of the fully light-transmitting area and the non-light-transmitting area of ​​the half-tone mask are interchanged.

[0151] For example, when the size relationship between the first sub-blocking portion and the second sub-blocking portion in the first part and the second part of the first blocking portion in the embodiment of the present disclosure is the same, the above method of forming the first sub-blocking portion and the second sub-blocking portion using a half-tone mask is applicable to each position of the first blocking portion. When the size relationship between the first sub-blocking portion and the second sub-blocking portion in the second part of the first blocking portion in the embodiment of the present disclosure is different from the size relationship between the first sub-blocking portion and the second sub-blocking portion in the first part, for example, when the surface of the first sub-blocking portion facing the second sub-blocking portion completely overlaps with the surface of the second sub-blocking portion facing the first sub-blocking portion, the above method of forming the first sub-blocking portion and the second sub-blocking portion using a half-tone mask is only applicable to the first part of the first blocking portion.

[0152] For example, Figure 4CAs shown, the first sub-blocking portion 211 and the second sub-blocking portion 212 are an integrated structure formed by one-step patterning of the first barrier layer material 3100, thereby saving process. The area where the first sub-blocking portion 211 overlaps with the second sub-blocking portion 212 is an area where the thickness of the first barrier layer 210 is relatively large, and the area where only the first sub-blocking portion 211 is provided is an area where the thickness of the first barrier layer 210 is relatively small, so that the first barrier layer is a film layer with two different thicknesses. The embodiment of the present disclosure schematically shows that the first barrier layer only includes two different thicknesses, but is not limited thereto, and may also include more different thicknesses to form more step structures.

[0153] For example, the first blocking layer 210 may be formed in the same layer as the first planar layer 1081, for example, it may be a part of the first planar layer 1081, that is, the first blocking layer 210 is formed while the first planar layer material is patterned to form the first planar layer 1081. When forming the first planar layer, the position where the first planar layer is to be formed may be directly opposite to the non-light-transmitting area of ​​the half-tone mask so that the thickness of the formed planar layer is the same as the larger thickness of the first blocking layer (the sum of the thickness of the first sub-blocking portion and the second sub-blocking portion), and the embodiments of the present disclosure are not limited thereto, and the position where the first planar layer is to be formed may be directly opposite to the partial light-transmitting area of ​​the half-tone mask so that the thickness of the formed planar layer is the same as the thickness of the first sub-blocking portion.

[0154] like Figure 3 As shown, after forming the first barrier layer 210, forming the first barrier 200 further includes: forming a second barrier 220 on the side of the second sub-barrier 212 away from the substrate 100. For example, when the second barrier is patterned and formed, and along the second direction, the maximum size of the second barrier may not be greater than the minimum size of the second sub-barrier. In the actual process, the material of the formed second barrier may flow to a certain extent during the high-temperature curing process, so that the cross-sectional shape of the second barrier may be trapezoidal, and the second barrier covers the surface of the first barrier away from the substrate and the side of the first barrier. Of course, the embodiment of the present disclosure is not limited to this. When the size of the second barrier parallel to the substrate is small, the maximum size of the second barrier may not be greater than the minimum size of the second sub-barrier. For example, when the maximum size of the second barrier is equal to the minimum size of the second sub-barrier, the surface of the second barrier facing the second sub-barrier completely overlaps with the surface of the second sub-barrier facing the second barrier. For example, along the second direction, the maximum size of the second barrier may be smaller than the minimum size of the second sub-barrier to form a step structure.

[0155] For example, Figure 3As shown, the second barrier layer 220 can be formed at the same layer as the pixel defining layer 109 , for example, can be a part of the pixel defining layer 109 , that is, the second barrier layer 220 of the first barrier part 200 is formed while the pixel defining layer material is patterned to form the pixel defining layer 109 .

[0156] For example, Figure 3 As shown, forming the first barrier 200 further includes: forming a third barrier 230 on a side of the second barrier 220 away from the first barrier 210. For example, the material of the third barrier 230 may be an organic layer, which plays a role in supporting subsequent film layers.

[0157] For example, when the third barrier layer is patterned and formed, and along the second direction, the maximum size of the third barrier layer may not be greater than the minimum size of the second barrier layer. In the actual process, the material of the formed third barrier layer will undergo a certain flow during the high-temperature curing process, so that the cross-sectional shape of the third barrier layer may be trapezoidal, and the third barrier layer covers the surface of the second barrier layer away from the substrate and the side of the second barrier layer. Of course, the embodiments of the present disclosure are not limited to this. When the size of the third barrier layer parallel to the substrate is small, the maximum size of the third barrier layer may not be greater than the minimum size of the second barrier layer.

[0158] For example, Figure 3 As shown, the second blocking portion 500 may be formed at the same time as the first blocking portion 200. The second blocking portion 500 is formed in the peripheral area 102 and is located on the side of the first blocking portion 200 close to the display area 101. The second blocking portion 500 and the first blocking portion 200 extend in the same direction.

[0159] For example, Figure 3 As shown, forming the second barrier 500 includes sequentially forming a fourth barrier layer 510 and a fifth barrier layer 520 on the base substrate 100 .

[0160] For example, the fourth blocking layer 510 can be formed on the same layer as the second blocking layer 220 and the pixel defining layer 109. For example, it can be a part of the pixel defining layer 109, that is, the second blocking layer 220 of the first blocking part 200 and the fourth blocking layer 510 of the second blocking part 500 are formed while the pixel defining layer material is patterned to form the pixel defining layer 109.

[0161] For example, the fifth barrier layer 520 and the third barrier layer 230 may be formed of the same material and patterned using the same mask to save process.

[0162] S203: forming an encapsulation layer located in the display area and the peripheral area on a side of the first barrier away from the base substrate.

[0163] For example, Figure 3As shown, the encapsulation layer 300 covers the first blocking portion 200 to form a first slope 311 at the interface of the first sub-blocking portion 211 and the second sub-blocking portion 212 and away from the surface of the substrate. In the embodiment of the present disclosure, by forming at least one step structure in the first blocking layer closest to the substrate in the first blocking portion, the encapsulation layer can form a slope at a position corresponding to the first blocking layer.

[0164] For example, Figure 3 As shown, forming the encapsulation layer 300 may include sequentially forming a first inorganic layer 310 , an organic layer 320 , and a second inorganic layer 330 , but the embodiment of the present disclosure is not limited thereto, as long as the organic layer and the inorganic layer are alternately formed.

[0165] For example, the material of the inorganic layer in the encapsulation layer 300 includes silicon nitride, silicon oxide or silicon oxynitride, etc. The inorganic material has high density, so it can prevent water, oxygen, etc. from invading and affecting the performance of the light-emitting element. The material of the organic layer includes, for example, a polymer resin, such as polyimide, polyacrylate, etc., and the organic layer has the functions of planarization and stress relief.

[0166] S204: forming a plurality of touch signal lines on a surface of the packaging layer away from the base substrate.

[0167] For example, after forming the encapsulation layer, a touch layer material may be directly formed on the surface of the encapsulation layer, and then the touch layer material may be patterned to form touch electrodes in the display area and touch signal lines in the peripheral area. That is, the touch signal lines are directly patterned on the surface of the encapsulation layer.

[0168] For example, Figure 3 As shown, the plurality of touch signal lines 400 extend along a direction intersecting the X direction, and thus, the plurality of touch signal lines 400 cover a portion of the first blocking portion 200 extending along the first direction. The touch signal lines 400 cover the first sub-blocking portion 211 and the second sub-blocking portion 212, that is, the touch signal lines 400 cover the first slope 311 with an inclination angle of about 20° to 35° formed by the encapsulation layer 300 at the junction of the first sub-blocking portion 211 and the second sub-blocking portion 212.

[0169] The embodiment of the present disclosure forms at least one step structure in the first barrier layer closest to the substrate in the first barrier portion, so that the encapsulation layer can form a slope with an inclination angle of about 20° to 35° at the position corresponding to the first barrier layer. Figure 1A and 1B The first barrier layer shown has no step structure, and the touch signal line directly patterned on the packaging layer covers the edge area of ​​the first barrier portion (where the slope of the packaging layer is located) more gently, thereby reducing the probability of residual metal forming during the process of making the touch signal line to improve the yield.

[0170] Another embodiment of the present disclosure provides a display device, including a display panel provided by any of the above examples. In the display device provided by the embodiment of the present disclosure, by forming at least one step structure in the first barrier layer closest to the base substrate in the first barrier portion, the encapsulation layer can form a slope at a position corresponding to the first barrier layer, thereby reducing the probability of residual metal being formed during the manufacturing process of the touch signal line to improve the yield.

[0171] There are a few points to note:

[0172] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can refer to the general design.

[0173] (2) In the absence of conflict, features in the same embodiment or in different embodiments of the present disclosure may be combined with each other.

[0174] The above description is merely an exemplary embodiment of the present disclosure and is not intended to limit the protection scope of the present disclosure. The protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display panel, comprising: A substrate, comprising a display area and a peripheral area located around the display area; a first barrier portion, located in the peripheral area, and a first portion of the first barrier portion located on one side of the display area extends along a first direction parallel to the base substrate, the first barrier portion comprises a first barrier layer, a second barrier layer located on a side of the first barrier layer away from the base substrate, and a third barrier layer located on a side of the second barrier layer away from the first barrier layer; the second barrier layer covers a surface of the first barrier layer away from the base substrate and a side of the first barrier layer, and the third barrier layer covers a surface of the second barrier layer away from the base substrate and a side of the second barrier layer; an encapsulation layer, located in the display area and the peripheral area, and covering the first blocking portion; A plurality of touch signal lines are located on a side of the encapsulation layer away from the base substrate and extend along a second direction intersecting the first direction, wherein the orthographic projections of the plurality of touch signal lines on the base substrate overlap with the orthographic projection of the first portion of the first blocking portion on the base substrate; Wherein, the first barrier layer comprises a first sub-barrier portion and a second sub-barrier portion made of the same material, and the second sub-barrier portion is located between the first sub-barrier portion and the second barrier layer; In the first part of the first blocking portion, along the second direction, the maximum dimension of the second sub-blocking portion is not greater than the minimum dimension of the first sub-blocking portion so that the inclination angle of the first slope formed on the surface of the encapsulation layer away from the junction of the first sub-blocking portion and the second sub-blocking portion is about 20° to 35°; Along a third direction perpendicular to the base substrate, a ratio of the size of the first sub-blocking portion to that of the second sub-blocking portion is approximately 0.8 to 1.2, and along the second direction, a difference between the size of the first sub-blocking portion and the size of the second sub-blocking portion is 20% to 30% of the size of the first sub-blocking portion.

2. The display panel according to claim 1, wherein: The inclination angle of the first slope is about 27° to 33°.

3. The display panel according to claim 1, wherein: A cross section of the first barrier layer in the first portion of the first barrier portion cut by a plane perpendicular to the first direction is substantially trapezoidal, and a first angle between a first hypotenuse included in the trapezoid and the base substrate is approximately 20° to 35°.

4. The display panel according to claim 1, wherein: The peripheral area includes a binding area, and the first portion of the first blocking portion is located on a side of the display area close to the binding area.

5. The display panel according to claim 1, wherein: The plurality of touch signal lines cover a portion of the first slope to form a second slope on a surface away from the first slope.

6. The display panel according to claim 5, wherein: The first blocking portion is an annular structure surrounding the display area, and in the second part of the first blocking portion other than the first part, the maximum dimension of the second sub-blocking portion along a fourth direction intersecting with the extension direction of the second part is not greater than the minimum dimension of the first sub-blocking portion along the fourth direction, so that the encapsulation layer forms a third slope on the surface away from the junction of the first sub-blocking portion and the second sub-blocking portion, and the inclination angle of the third slope is approximately 20° to 35°.

7. The display panel according to claim 1, wherein: The first sub-blocking portion and the second sub-blocking portion are integrally formed.

8. The display panel according to claim 1, wherein: In the first portion of the first blocking portion, a center line of an orthographic projection of the second sub-blocking portion on the base substrate along the first direction substantially coincides with a center line of an orthographic projection of the first sub-blocking portion on the base substrate along the first direction.

9. The display panel according to claim 8, wherein: A center line of an orthographic projection of the second blocking layer on the base substrate along the first direction substantially coincides with a center line of the second sub-blocking portion.

10. The display panel according to any one of claims 1 to 9, further comprising: The second blocking portion is located in the peripheral area and between the first blocking portion and the display area. The second blocking portion and the first blocking portion have the same extension direction, and along a third direction perpendicular to the base substrate, the size of the first blocking portion is larger than that of the second blocking portion.

11. The display panel according to claim 10, wherein: A cross section of the second blocking portion cut by a plane perpendicular to the extension direction of the second blocking portion includes a second oblique side, and an absolute value of a difference between a second angle between the second oblique side and the base substrate and an inclination angle of the first slope is greater than 0° and less than 20°.

12. The display panel according to claim 10, wherein: The second blocking portion includes a fourth blocking layer and a fifth blocking layer located on a side of the fourth blocking layer away from the base substrate. The fourth blocking layer is arranged on the same layer as the second blocking layer, and has the same material and thickness. The fifth blocking layer is arranged on the same layer as the third blocking layer, and has the same material and thickness.

13. The display panel according to claim 12, further comprising: A pixel circuit structure layer located in the display area; A flat layer located on a side of the pixel circuit structure layer away from the base substrate; as well as a light emitting element located on a side of the planar layer away from the pixel circuit structure layer, The first barrier layer and the planar layer are arranged in the same layer, and have the same thickness and material.

14. The display panel according to claim 13, further comprising: a pixel defining layer located on a side of the planar layer away from the pixel circuit structure layer, The second blocking layer is disposed on the same layer as the pixel defining layer, and has the same thickness and material.

15. The display panel according to claim 1, wherein: Along the third direction, a size of the first barrier layer is about 1.6-2.5 microns.

16. The display panel according to claim 1, wherein: Along the third direction, a size of the first barrier portion is about 3 to 5 micrometers.

17. The display panel according to any one of claims 1 to 9, wherein: A dimension of the first sub-blocking portion along the second direction is about 25 to 45 micrometers.

18. A method for manufacturing a display panel, comprising: Providing a base substrate, the base substrate comprising a display area and a peripheral area located around the display area; A first barrier is formed in the peripheral area of ​​the substrate, wherein the first part of the first barrier extends along a first direction parallel to the substrate, and the first part of the first barrier comprises: forming a first barrier material on the substrate; using a one-step patterning process to form a first sub-barrier and a second sub-barrier in a stacked arrangement on the first barrier material, wherein the second sub-barrier is located at a side of the first sub-barrier away from the substrate, and along a second direction intersecting the first direction, the maximum size of the second sub-barrier is not greater than the minimum size of the first sub-barrier; forming a second barrier layer on a side of the second sub-barrier away from the substrate; and forming a third barrier layer on a side of the second barrier away from the first barrier; forming an encapsulation layer located in the display area and the peripheral area on a side of the first blocking portion away from the base substrate, the encapsulation layer covering a first portion of the first blocking portion to form a first slope at a junction of the first sub-blocking portion and the second sub-blocking portion and away from the base substrate, wherein the inclination angle of the first slope is about 20° to 35°; and A plurality of touch signal lines extending along the second direction are formed on a surface of the packaging layer away from the base substrate, wherein the plurality of touch signal lines cover a portion of the first slope of the packaging layer; Among them, along the third direction perpendicular to the base substrate, the ratio of the size of the first sub-blocking part to the size of the second sub-blocking part is about 0.8-1.2, and along the second direction, the difference between the size of the first sub-blocking part and the size of the second sub-blocking part is 20%-30% of the size of the first sub-blocking part.

19. The method according to claim 18, wherein: Forming the first sub-barrier and the second sub-barrier in a stacked manner by using a one-step patterning process includes: forming the first sub-barrier and the second sub-barrier by using a half-tone mask.

20. The method according to claim 19, wherein: The half-tone mask includes a completely light-transmitting area, a partially light-transmitting area, and a non-light-transmitting area, and forming the first sub-blocking portion and the second sub-blocking portion includes: Align the non-light-transmitting area of ​​the half-tone mask with the area of ​​the first blocking layer material where the second sub-blocking portion is to be formed, oppose the partially light-transmitting area of ​​the half-tone mask with the area of ​​the first sub-blocking portion to be formed except the overlapping portion with the second sub-blocking portion, and oppose the completely light-transmitting area of ​​the half-tone mask with the area except the area where the first sub-blocking portion is to be formed, and then expose the first blocking layer material; The first barrier layer material is developed and cured to form the first sub-barrier portion and the second sub-barrier portion.

21. A display device comprising the display panel according to any one of claims 1 to 17.

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