Alignment fixture for reactor system

Abstract

An alignment fixture for a reactor system can include a fixture body comprising an inner periphery at least partially defining a shape of an inner space comprising the fixture body, wherein the inner space is configured to receive a base of a reactor system; and / or a measurement protrusion coupled to the fixture body at a first location and protruding from the fixture body toward the inner space. The measurement protrusion can include an indicator between the fixture body and a measurement protrusion end of the measurement protrusion.

Description

Technical Field

[0001] This disclosure generally relates to an alignment fixture for positioning components within a reactor system. Background Technology

[0002] A reaction chamber can be used to deposit various material layers onto a semiconductor substrate. The semiconductor can be placed on a susceptor within the reaction chamber. Both the substrate and the susceptor can be heated to a desired substrate temperature setpoint. In an exemplary substrate processing procedure, one or more reactive gases can be passed through the heated substrate, causing a thin film of material to be deposited on the substrate surface. These layers can then be used to form integrated circuits throughout subsequent deposition, doping, photolithography, etching, and other processes.

[0003] To achieve the desired result on the substrate (e.g., uniform or stable deposition of a film on the substrate), a pedestal and / or the substrate can be positioned within the reaction chamber. For example, the pedestal can be positioned such that a desired space exists between the pedestal and the sidewalls of the reaction chamber (e.g., a uniform space created by a centered pedestal within the reaction chamber). Such positioning prevents uneven processing of the substrate within the reaction chamber and can facilitate achieving the desired result. However, achieving the desired position of the pedestal or other components within the reaction chamber can be difficult, and errors in such positioning can lead to undesirable processing results. Summary of the Invention

[0004] This overview is provided to introduce a set of concepts in a simplified form. These concepts are described in more detail below in the detailed description of exemplary embodiments of this disclosure. This overview is not intended to identify key or essential features of the claimed subject matter, nor is it intended to limit the scope of the claimed subject matter.

[0005] In various embodiments, an alignment fixture for a reactor system is provided. The alignment fixture disclosed herein may include: a fixture body including an inner periphery that at least partially defines the shape of an inner space comprising an inner space of the fixture body, wherein the inner space is configured to receive a base of a reactor system; and / or a measuring protrusion coupled to the fixture body at a first location and projecting from the fixture body toward the inner space. The measuring protrusion may include an indicator between the fixture body and a measuring protrusion end of the measuring protrusion. In various embodiments, the fixture body may further include an outer periphery opposite to the inner periphery, wherein the outer periphery defines the outer shape of the fixture body. In various embodiments, the shape defined at least partially by the inner periphery may be complementary to the shape of the base, wherein the inner space is configured to receive the base therein. In various embodiments, the fixture body may further include a upper surface, wherein the measuring protrusion may be coupled to the upper surface of the fixture body and project toward the inner space.

[0006] In various embodiments, the measuring protrusion may include a first plurality of scale marks disposed between the clamp body and a measuring protrusion end of the measuring protrusion, wherein the first plurality of scale marks includes the indicator. In various embodiments, the alignment clamp may further include a second measuring protrusion projecting from the clamp body toward the inner space at a second location. The second measuring protrusion may include a second indicator between the clamp body and a second measuring protrusion end of the second measuring protrusion. In various embodiments, the first measuring protrusion and the second measuring protrusion may extend toward the center of a shape at least partially defined by the inner periphery. The indicator may be disposed on the first measuring protrusion at a first distance from the inner periphery of the clamp body, and the second indicator may be disposed on the second measuring protrusion at a second distance from the inner periphery of the clamp body. In various embodiments, the first distance and the second distance may be the same.

[0007] In various embodiments, the reactor system may include: a base including an outer edge of a base, wherein the base is configured to receive a substrate thereon; a partition including an internal space defined by an inner wall of the partition, wherein the base may be at least partially disposed within the internal space of the partition, wherein the base and the partition may be disposed relative to each other such that a gap exists between the outer edge of the base and the inner wall of the partition; and an alignment clamp at least partially disposed within the gap between the outer edge of the base and the inner wall of the partition. The alignment clamp may include: a clamp body including an inner periphery that at least partially defines the shape of an internal space including the clamp body, wherein the base is at least partially disposed within the internal space; and / or a measuring protrusion projecting toward the internal space at a first location, wherein the measuring protrusion may include an indicator between the clamp body and a measuring protrusion end of the measuring protrusion. In various embodiments, the inner periphery of the clamp body may be spaced apart from the outer edge of the base such that the inner periphery of the clamp body does not contact the outer edge of the base. In various embodiments, the measuring protrusion may extend above the outer edge of the base.

[0008] In various embodiments, the clamp body may further include an outer periphery opposite to the inner periphery, wherein the outer periphery defines the outer shape of the clamp body, the outer shape of which may be complementary to the shape of the interior space of the plate. In various embodiments, the clamp body may further include an upper surface disposed on the upper plane of the alignment clamp. The measuring protrusion may be coupled to the upper surface of the clamp body and may project toward the interior space, and the base may be disposed below the upper plane.

[0009] In various embodiments, the measuring protrusion may include a first plurality of scale marks disposed between the clamp body and a measuring protrusion end of the measuring protrusion, wherein the first plurality of scale marks includes the indicator. In various embodiments, the alignment clamp may further include a second measuring protrusion projecting from the clamp body toward the inner space at a second location, wherein the second measuring protrusion may include a second indicator between the clamp body and a second measuring protrusion end of the second measuring protrusion. In various embodiments, the first measuring protrusion and the second measuring protrusion may extend toward the center of a shape at least partially defined by the inner periphery. The indicator may be disposed on the first measuring protrusion at a first distance from the inner periphery of the clamp body, and the second indicator may be disposed on the second measuring protrusion at a second distance from the inner periphery of the clamp body. In various embodiments, the first distance and the second distance may be the same.

[0010] In various embodiments, the reactor system may also include a reaction chamber, in which the base, the partition, and the alignment clamp are at least partially disposed.

[0011] In various embodiments, a method may include: disposing an alignment clamp at least partially in a region between an outer edge of a base of a reactor system base and an inner wall of a partition, wherein the base is disposed within an inner space of the alignment clamp defined at least partially by an inner periphery of the alignment clamp, wherein a measuring protrusion projecting from a clamp body of the alignment clamp is disposed above the outer edge of the base; and / or adjusting the position of the base such that the base is positioned relative to the inner periphery of the alignment clamp at a desired location. In various embodiments, the alignment clamp may include a second measuring protrusion projecting from the clamp body. Aligning the base may include positioning the base such that the base is positioned such that the distance along the first measuring protrusion relative to the inner periphery of the alignment clamp is the same as the distance along the second measuring protrusion relative to the inner periphery of the alignment clamp.

[0012] For the purpose of summarizing this disclosure and the advantages achieved over the prior art, certain objectives and advantages of this disclosure have been described in the foregoing. It should be understood, of course, that not all of these objectives or advantages may be achieved according to any particular embodiment of this disclosure. Therefore, by way of example, those skilled in the art will recognize that embodiments disclosed herein may be implemented in a manner that achieves or optimizes one or more advantages taught or indicated herein, without necessarily achieving other objectives or advantages that may be taught or indicated herein.

[0013] All these embodiments are intended to be within the scope of this disclosure. These and other embodiments will be apparent to those skilled in the art from the following detailed description of certain embodiments with reference to the accompanying drawings; this disclosure is not limited to any particular embodiment discussed. Attached Figure Description

[0014] The subject matter of this disclosure is specifically pointed out and explicitly claimed in the concluding section of the specification. However, a more complete understanding of this disclosure is preferably obtained by referring to the detailed description and claims, in conjunction with the accompanying drawings, in which like reference numerals denote like elements.

[0015] Figure 1 A schematic diagram of a reactor system according to various embodiments is shown.

[0016] Figure 2A and 2B A perspective view of the alignment fixture for a reactor system according to various embodiments is shown.

[0017] Figure 3AAn exploded view of the components of a reaction chamber with an alignment fixture according to various embodiments is shown.

[0018] Figure 3B A reactor system with alignment clamps according to various embodiments is shown.

[0019] Figure 4 Methods for positioning a base in a reaction chamber according to various embodiments are shown. Detailed Implementation

[0020] Although certain embodiments and examples are disclosed below, those skilled in the art will understand that this disclosure extends beyond the specific embodiments and / or uses disclosed herein, as well as their obvious modifications and equivalents. Therefore, the scope of this disclosure is not intended to be limited to the specific embodiments described herein.

[0021] The illustrations presented herein are not intended to be actual views of any particular material, device, structure, or apparatus, but are merely for illustrating the manifestations of embodiments of this disclosure.

[0022] As used herein, the term “substrate” can refer to any one or more underlying materials that can be used or on which devices, circuits or films can be formed.

[0023] As used herein, the term "atomic layer deposition" (ALD) can refer to a vapor-phase deposition process in which deposition cycles, preferably multiple consecutive deposition cycles, are performed in a process chamber. During each cycle, a precursor is chemisorbed onto the deposition surface (e.g., the substrate surface or the surface of a previously deposited underlayer, such as material from a previous ALD cycle), thereby forming a monolayer or sub-monolayer that is not readily reacting with additional precursors (i.e., a self-limiting reaction). Subsequently, if necessary, a reactant (e.g., another precursor or reactive gas) may be introduced into the process chamber to convert the chemisorbed precursor into the desired material on the deposition surface. This reactant is capable of further reacting with the precursor. Furthermore, a purging step may be used during each cycle to remove excess precursor and / or excess reactant and / or reaction byproducts from the process chamber after the conversion of the chemisorbed precursor. Furthermore, when performed using alternating pulses of precursor composition, reactive gas, and purge gas (e.g., inert carrier gas), the term "atomic layer deposition" is also intended to include, as used herein, the processes specified by related terms such as chemical vapor deposition, atomic layer epitaxy (ALE), molecular beam epitaxy (MBE), gas source MBE, or organometallic MBE and chemical beam epitaxy.

[0024] As used herein, the term “chemical vapor deposition (CVD)” can refer to any process in which a substrate is exposed to one or more volatile precursors that react and / or decompose on the substrate surface to produce the desired deposition.

[0025] As used herein, the terms “membrane” and “thin film” can refer to any continuous or discontinuous structure and material deposited by the methods disclosed herein. For example, “membrane” and “thin film” can comprise 2D materials, nanorods, nanotubes, or nanoparticles, or even partial or complete molecular layers or partial or complete atomic layers or atomic and / or molecular clusters. “Membrane” and “thin film” can include materials or layers with pinholes, but are still at least partially continuous.

[0026] As used herein, the term "gas" may include vaporized solids and / or liquids, and may consist of a single gas or a mixture of gases.

[0027] Reactor systems for ALD, CVD, etc., can be used in a variety of applications, including depositing and etching materials onto substrate surfaces. In various embodiments, references are made to... Figure 1 The reactor system 50 may include a reaction chamber 4, a base 6 for holding a substrate 30 during processing, a gas distribution system 8 (e.g., a spray head) for distributing one or more reactants to the surface of the substrate 30, one or more reactant sources 10, 12 and / or carrier gas and / or purge gas sources 14 fluidly coupled to the reaction chamber 4 via lines 16-20, and valves or controllers 22-26. In various embodiments, the base (e.g., base 6) may include and / or be coupled to a temperature control device (e.g., a heater or cooling device). Reactant gases or other materials from reactant sources 10, 12 may be applied to the substrate 30 in the reaction chamber 4. Purge gas from purge gas source 14 may flow to and through the reaction chamber 4 to remove any excess reactants or other unwanted materials from the reaction chamber 4. The system 50 may also include a vacuum source 28 fluidly coupled to the reaction chamber 4, which may be configured to extract reactants, purge gas, and / or other materials from the reaction chamber 4.

[0028] In various embodiments, to obtain the desired results from the processes within the reaction chamber (e.g., material deposition or etching on a substrate), a base (e.g., base 6) may be positioned at a location within the reaction chamber. For example, to achieve uniform material deposition on and throughout the substrate, the base may be positioned at the center of the reaction chamber such that the sides of the base are uniformly spaced from the inner sidewalls of the reaction chamber. If this spacing between the base and the inner sidewalls of the reaction chamber is non-uniform, a portion of the substrate may be subjected to a greater amount of reactant gases within the reaction chamber than another portion, resulting in non-uniform material deposition (i.e., undesirable results).

[0029] To help achieve the desired position of the base within the reaction chamber, alignment fixtures can be used. (Reference) Figure 2A and Figure 2BAlignment fixture 100 is depicted according to various embodiments. The alignment fixture may include a fixture body having an inner periphery, an outer periphery, an upper surface, and a lower surface. For example, alignment fixture 100 may include an inner periphery 112, an outer periphery 114 opposite to the inner periphery 112, an upper surface 116, and / or a lower surface 118 opposite to the upper surface 116. The fixture body 110 of alignment fixture 100 may be disposed between the inner periphery 112 and the outer periphery 114, and between the upper surface 116 and the lower surface 118.

[0030] The inner periphery of the alignment fixture may at least partially define its shape. The shape at least partially defined by the inner periphery of the alignment fixture may include an inner space of the alignment fixture. The inner space of the alignment fixture may be configured to receive a base in a reaction chamber. That is, the inner periphery of the alignment fixture may be configured to at least partially surround or enclose a base in a reaction chamber in response to the alignment fixture being disposed therein. For example, the inner space 120 defined by the inner periphery 112 of the alignment fixture 100 may be configured to receive a base in a reaction chamber.

[0031] like Figure 2A and Figure 2B As depicted, the alignment clamp 100 and / or inner periphery 112 include or define a circular shape including an inner space 120, but the alignment clamp, the inner space, and / or the shape at least partially defined by the inner periphery of the alignment clamp may include any suitable shape. For example, the alignment clamp and / or the inner periphery of the alignment clamp may include or at least partially define a hexagon, octagon, rectangle, a portion of a shape, or any other suitable shape. For example, the alignment clamp and / or its inner periphery may include or define a semicircle or a quarter circle (e.g., half or a quarter of the alignment clamp 100). In embodiments where the inner periphery of the alignment clamp includes or defines a portion of a shape, such as a semicircle (i.e., the inner space of the alignment clamp is not completely surrounded by the clamp body), the shape at least partially defined by the inner periphery of the alignment clamp is referred to as the full shape (e.g., a circle), and the inner space of the alignment clamp may be included therein.

[0032] In various embodiments, the shape of the base configured to be received within the inner space of the alignment jig can be complementary to the shape defined at least partially by the inner periphery of the alignment jig. See also... Figure 3A The base 210 may include an outer edge 212 that defines the shape of the base 210. The circular shape of the base 210 may be complementary to the circular shape of the inner space 120 defined by the inner periphery 112.

[0033] In various embodiments, the alignment fixture may include one or more measuring protrusions (e.g., Figure 2A and Figure 2BThe measuring protrusion 150 may extend or protrude from the clamp body toward the inner space of the alignment clamp. The measuring protrusion may extend from the clamp body and cross the inner periphery of the alignment clamp toward and / or into the inner space. For example, the measuring protrusion 150 may protrude from the clamp body 110 across the inner periphery 112 toward and / or into the inner space 120. In various embodiments, the measuring protrusion may extend from the clamp body toward the center of a shape at least partially defined by the inner periphery of the clamp body. For example, the measuring protrusion 150 may extend from the clamp body 110 toward the center of a circle defined by the inner periphery 112 (or the center of the inner space 120).

[0034] In various embodiments, the measuring protrusion may be coupled to and / or integral with the clamp body. The measuring protrusion may be coupled to the upper surface, lower surface, and / or inner periphery of the clamp body (e.g., the upper surface 116, lower surface 118, and / or inner periphery 112 of the clamp body 110). In various embodiments, the upper surface of the alignment clamp may be disposed on an upper plane, and the lower surface of the alignment clamp may be disposed on a lower plane. The measuring protrusion of the alignment clamp may be coupled to the upper surface and does not extend inward across the upper plane.

[0035] The measuring protrusion of the alignment fixture can include any suitable shape. For example, the measuring protrusion can include an ellipse, rectangle, square, or any other polygonal shape, wherein the measuring protrusion end of the shape is the portion of the measuring protrusion furthest from the inner periphery of the fixture body and furthest into the inner space of the alignment fixture. For example, measuring protrusion 150 can include a rectangular shape having a first side 151, a second side 152, a protrusion body 155 therebetween, and a measuring protrusion end 153. In various embodiments, the measuring protrusion body can be a solid in which there are no gaps or no gaps through which there are passages.

[0036] In various embodiments, the measuring protrusion may include a protrusion cavity extending through a portion of the protrusion body. The protrusion cavity may be at least partially enclosed within the protrusion body. For example, the protrusion cavity 157 may be completely enclosed within the protrusion body 155. As another example, the protrusion cavity may be partially enclosed by the protrusion body such that a portion of the protrusion cavity is in fluid communication with the internal space of the alignment fixture. For example, at least a portion of the measuring protrusion end may be spaced apart by the protrusion cavity (e.g., such that the measuring protrusion may be forked). In embodiments where the measuring protrusion includes a protrusion cavity, the measuring protrusion may include a plurality of tips (e.g., a first tip and a second tip). For example, measuring protrusion 150 may include a first tip and a second tip, the first tip including a first side 151 and the second tip including a second side 152.

[0037] In various embodiments, the alignment fixture may include a plurality of measuring protrusions. For example, the plurality of measuring protrusions may be coupled to a fixture body and disposed along the inner periphery of the fixture body. The plurality of measuring protrusions may be equidistantly spaced along at least a portion of the alignment fixture. In various embodiments, two alignment fixtures (i.e., two or more) may be separated from each other by approximately 30, 45, 60, 90, 120, 135, 160, and / or 180 degrees. Figure 2A and Figure 2B As shown, the measuring protrusion is separated from the center of the shape defined by the inner periphery 112 by approximately 90 degrees. In this context, "approximately" means positive or negative five degrees.

[0038] In various embodiments, the measuring protrusion may include an indicator disposed on the protrusion body between the clamp body and the end of the measuring protrusion. The indicator may be disposed on the upper surface of the measuring protrusion. The measuring protrusion may include multiple indicators. For example, the multiple indicators may include scale marks spanning a scale length between the clamp body and the end of the measuring protrusion. The scale marks may be equidistant from each other along the scale length. In various embodiments, the measuring protrusion may include multiple sets of multiple indicators, for example, a set of multiple indicators adjacent to each side (and / or each tip). For example, measuring protrusion 150 may include multiple indicators 160. Each measuring protrusion 150 may include multiple indicators 160 adjacent to a first side 151 and / or a second side 152. In various embodiments, the indicator or multiple indicators may be disposed on one side of the measuring protrusion adjacent to the protrusion gap.

[0039] The indicator or multiple indicators may comprise any suitable design, location, and / or arrangement on or within the measuring protrusion. For example, the indicator or multiple indicators may comprise a line on the protrusion body of the measuring protrusion or a notch or recess in the protrusion body of the measuring protrusion. For example, each of the multiple indicators 160 may be substantially perpendicular to one side of the measuring protrusion 150 (e.g., a first side 151 and / or a second side 152), to the axis of the measuring protrusion 150 extending into the inner space 120, and / or across the axis of the measuring protrusion 150, which extends toward the center of a shape at least partially defined by the inner periphery 112 (as used herein, "substantially" means at a positive or negative 10 degrees to the vertical direction). In various embodiments, the measuring unit may be positioned adjacent to one or more indicators (e.g., millimeters, centimeters, inches, etc.).

[0040] In various embodiments, the base of the reactor system may be disposed on and / or within a partition, and / or connected to a partition (e.g., as shown in the figure). Figure 3A and Figure 3BAs shown, a base 210 may be disposed on and / or within a partition 200, and / or connected to a partition. The partition (e.g., partition 200) may include various inner walls and / or inner surfaces. In various embodiments, the partition (e.g., partition 200) may include a first inner surface (e.g., first inner surface 226) and a first inner wall (e.g., first inner wall 224). A lower region (e.g., lower region 222) or gap may exist between the outer edge of the base (e.g., outer edge 212) and the first inner wall (e.g., first inner wall 224). The lower region may have a lower region base plate, which may be a surface of the partition. The partition (e.g., partition 200) may also include a second inner surface (e.g., second inner surface 236) and a second inner wall (e.g., second inner wall 234). There may be an upper region (e.g., upper region 232) or a gap between the outer edge of the base (e.g., outer edge 212 of the base) and the second inner wall of the partition (e.g., second inner wall 234 of the partition). The width of the upper region (the distance between the second inner wall of the partition and the outer edge of the base) includes the length of the lower region (the distance between the first inner wall of the partition and the outer edge of the base).

[0041] In various embodiments, the alignment clamp may be disposed on or within a partition of the reactor system and / or coupled to the partition. The alignment clamp may be disposed or coupled such that it is at least partially located in the region between the inner wall of the partition (e.g., a first or second inner wall) and the outer edge of the base. For example, as... Figure 3A and Figure 3B As shown, the alignment clamp 100 may be disposed on or in the partition 200 and / or coupled to the partition, such that the alignment clamp 100 is at least partially located in the upper region 232 (and / or lower region 222) between the inner wall of the partition 200 (e.g., the second inner wall 234) and the outer edge 212 of the base. In various embodiments, the outer periphery of the clamp body may be configured to be adjacent to, adjacent to, and / or abutment against the inner wall of the partition. For example, as Figure 3A and Figure 3B As shown, the outer periphery 114 of the alignment clamp 100 may be configured to be adjacent to, adjacent to, and / or abutment to the second inner wall 234 of the partition 200.

[0042] In various embodiments, the alignment fixture may include a thickness (the distance between the inner and outer peripheries of the fixture body) smaller than the area of ​​the partition between its inner wall and outer edge. For example, as Figure 3A and Figure 3BAs depicted, the thickness of the alignment clamp 100 between its inner periphery 112 and outer periphery 114 can be smaller or thinner than the thickness of the upper region 232 of the partition 200. Therefore, the alignment clamp can be disposed in or on the partition and / or connected to the partition, wherein the base is at least partially within the inner space of the alignment clamp and does not contact the alignment clamp (e.g., the inner periphery of the alignment clamp). That is, for example, in response to the alignment clamp 100 being disposed in or on the partition 200 or connected to the partition, a gap may exist between the inner periphery 112 of the alignment clamp 100 and the outer edge 212 of the base.

[0043] In various embodiments, the alignment fixture may include a fixture positioning member, and / or the partition may include a plate positioning member configured to position the alignment fixture in a desired location within or on the partition. The fixture positioning member can be any suitable device with any suitable design or construction that may complement the plate positioning member. The fixture positioning member may cooperate with the plate positioning member to position the alignment fixture in a desired location within or on the partition. For example, the alignment fixture 100 may include one or more fixture positioning members 108, which may be a recess in the fixture body 110 extending through a lower surface 118 across at least a portion of the thickness of the fixture body 110. The fixture positioning member 108 may have a shape complementary to the shape of the plate positioning member 208 of the partition 200. The plate positioning member 208 of the partition 200 may include protrusions from the inner wall (e.g., the first inner wall 224 and / or the second inner wall 234) and / or the inner surface (e.g., the first inner surface 226 and / or the second inner surface 236) of the partition 200. Therefore, the plate positioning member 208 can be received within the clamp positioning member 108, thereby positioning the alignment clamp 100 in and / or on the partition 200 and at a desired position relative to the partition.

[0044] The height of the alignment fixture (the distance between the upper and lower surfaces) allows the measuring protrusion projecting above the base to not contact the base. For example, the height of the alignment fixture 100 (the distance between the upper surface 116 and the lower surface 118) allows the measuring protrusion 150 to not contact the base 210 in response to the lower surface 118 resting on the surface of the partition 200 (e.g., the first inner surface 226 and / or the second inner surface 236). That is, the measuring protrusion 150 can be positioned above the base 210 such that there is a gap between the lower surface 156 of the measuring protrusion 150 and the top surface of the base 210 (the surface of the base 210 configured to support the substrate).

[0045] As discussed herein, the shape of the base can be complementary to the inner space of the alignment jig (and / or the shape at least partially defined by the inner periphery). Thus, for example, the base 210 can be disposed within the inner space 120 of the alignment jig 100. In various embodiments, the inner space of the alignment jig (or the shape at least partially defined by the inner periphery) can include the same shape as the base, but with a larger proportion, so that the base can be disposed within the inner space. In various embodiments, the base of the reaction system can be disposed within the inner space of the alignment jig such that the shape of the base (defined by the outer edge of the base) is concentric with the shape at least partially defined by the inner periphery of the alignment jig. Therefore, in response to the base being positioned concentrically with the shape at least partially defined by the inner periphery of the alignment jig, the space between the outer edge of the base and the inner periphery of the alignment jig can be substantially equal along the inner periphery of the alignment jig and / or the outer edge of the base (as used herein, "substantially" means a difference of ±5% or 10%).

[0046] The desired position of the base within the partition allows the space between the outer edge of the base and the inner wall of the partition (e.g., a first or second inner wall) to be substantially consistent or equal along the inner wall of the partition and / or the outer edge of the base. This positioning of the base allows for processes that achieve the desired results to be performed within a reaction chamber (e.g., a reaction chamber enclosed by partition 200 and a cover 250 that can be coupled to partition 200). For example, a centrally located base allows for uniform heat distribution to the base and / or the substrate disposed on the substrate, uniform exposure of the substrate to reactant gases (e.g., to achieve uniform material deposition and / or etching), uniform, constant, or regulated airflow, and circulation with the reaction chamber, etc.

[0047] Therefore, the alignment fixture can be configured to help center the base (and / or, for example, a heater attached to the base) within the internal space of the partition plate. The internal space can be a space defined by the inner walls and / or surfaces of the partition plate (e.g., the space in the partition 200 defined by the first inner wall 224 and the first inner surface 226, the second inner wall 234 and / or the second inner surface 236). See also... Figure 4In method 400, to center the base 210 within the plate interior space of the partition 200, the alignment clamp 100 may be disposed in or on the partition 200 and / or attached to the partition. In various embodiments, the alignment clamp may be at least partially disposed within a region of the partition (e.g., upper region 232 and / or lower region 222) (step 402). As discussed herein, the alignment clamp 100 may be disposed in / on or attached to the partition 200 such that the outer periphery 114 of the alignment clamp 100 may be adjacent, adjacent to, and / or abutment against the inner wall of the partition 200 (e.g., second inner wall 234). In various embodiments, the shape of the alignment clamp defined by the outer periphery may be complementary to the shape defined by the inner wall of the partition. Thus, the outer periphery of the alignment clamp may contact this inner wall of the partition such that the alignment clamp is positioned in a desired location (e.g., such that the shape defined at least partially by the inner periphery of the alignment clamp is concentric with the plate interior space of the partition). For example, the outer periphery 114 of the alignment fixture 100 may be disposed against the second inner wall 234 of the partition 200, such that the internal space of the plate defined by the second inner wall 234 is concentric with the internal space 120 of the alignment fixture 100.

[0048] In response to the alignment fixture being disposed in or on the partition and / or connected to the partition, the base 210 may be disposed in the inner space 120 of the alignment fixture 100 (step 404). The result of step 402 is that the base 210 may be disposed in the inner space 120 of the alignment fixture 100 (because the base 210 is already disposed in or connected to the partition 200), or, after the alignment fixture 100 is disposed in or on the partition 200, the base 210 may be disposed in the inner space 120 of the alignment fixture 100.

[0049] The measuring protrusion of the alignment fixture can extend into the inner space of the alignment fixture, extending above the base. Therefore, the outer edge of the base can pass beneath the measuring protrusion, intersecting the plane defined by the first and second surfaces of the measuring protrusion. For example, the outer edge 212 of the base can intersect the plane defined by the first side 151 and the second side 152 of the measuring protrusion 150. Therefore, the position of the outer edge of the base (a portion of which is close to the measuring protrusion and / or the outer edge of the base passing beneath the measuring protrusion) relative to the measuring protrusion and / or the indicator disposed thereon can be seen and determined. In response to a difference between the position of the outer edge of the base relative to the first measuring protrusion and / or the position of the indicator disposed on the first measuring protrusion and the position of the outer edge of the base relative to the second measuring protrusion and / or the indicator disposed on the second measuring protrusion, it can be determined that the base is eccentric. In response, the position of the base can be adjusted (step 406). For example, a first position of the base outer edge 212 relative to a plurality of indicators 160 on the first measuring protrusion 150 can be determined (e.g., by observing the base outer edge 212 from one side of the first measuring protrusion 150 and / or through the protrusion gap 157). A second position of the base outer edge 212 relative to a plurality of indicators 160 on the second measuring protrusion 150 can be determined. The determined position may include one of the plurality of indicators 160 on which the base outer edge 212 of the two measuring protrusions 150 is located or is closest (e.g., when the base outer edge 212 passes under each of the measuring protrusions 150). If the determined first position differs from the determined second position, the base 210 can be adjusted within the partition 200 and the inner space 120 to make the first and second positions substantially equal. For example, if a portion of the outer edge 212 of the base passes below the first of the measuring protrusions 150 and near the fourth of the plurality of indicators 160, and if a portion of the outer edge 212 of the base passes below the second of the measuring protrusions 150 and near the fifth of the plurality of indicators 160, then the base 210 may not be centered within the plate interior space of the partition 200. Therefore, the base 210 can be adjusted within the interior space 120 of the alignment fixture 100 (e.g., such that a portion of the outer edge 212 of the base passes below each measuring protrusion 150 near or at the same distance from the same indicator, etc.).

[0050] Benefits and other advantages have been described herein with respect to specific embodiments. Furthermore, the connecting lines included in the various figures are intended to represent exemplary functional relationships and / or physical connections between various elements. It should be noted that many alternative or additional functional relationships or physical connections may exist in actual systems. However, benefits, advantages, solutions to problems, and any elements that may cause any benefit, advantage, or solution to occur or become more apparent should not be construed as key, necessary, or essential features or elements of this disclosure. Therefore, the scope of this disclosure is not limited to anything other than the appended claims, wherein references to a singular element are not intended to mean “one and only one,” but rather “one or more” unless expressly stated so. Furthermore, when phrases such as “at least one of A, B, or C” are used in the claims, it is intended that such phrases be interpreted as meaning that A may exist alone in one embodiment, B may exist alone in one embodiment, C may exist alone in one embodiment, or any combination of elements A, B, and C may exist in a single embodiment; for example, A and B, A and C, B and C, or A and B and C.

[0051] This document provides systems, methods, and apparatuses. In the detailed description herein, references to "an embodiment," "embodiment," "exemplary embodiment," etc., indicate that the described embodiment may include a particular feature, structure, or characteristic, but each embodiment may not necessarily include that particular feature, structure, or characteristic. Furthermore, such phrases do not necessarily refer to the same embodiment. Moreover, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is believed that other embodiments, whether explicitly described or not, affect such feature, structure, or characteristic within the knowledge of those skilled in the art. After reading the description, those skilled in the art will understand how this disclosure can be implemented in alternative embodiments.

[0052] Furthermore, no element, component, or method step in this disclosure is intended to be exclusive to the public, whether or not it is expressly recited in the claims. Unless an element is expressly recited using the phrase “means for…”, the elements of the claims herein should not be interpreted in accordance with 35 U.S.SC 112(f). As used herein, “connection” can mean physical, mechanical, fluid, and / or electrical connection, as indicated by the appropriate context. As used herein, the terms “comprising,” “including,” or any other variation thereof are intended to cover non-exclusive inclusions, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements but may include other elements not expressly listed or inherent to the process, method, article, or apparatus.

Claims

1. A reactor system, comprising: A base, the base including a top surface and an outer edge of the base, wherein the top surface of the base is configured to receive a substrate thereon; A partition, the partition including an internal space defined by an inner wall of the partition, wherein the base is at least partially disposed in the internal space of the partition, the partition including a partition positioning member; The base and the partition are disposed relative to each other such that a gap exists between the outer edge of the base and the inner wall of the partition. as well as An alignment clamp is disposed on a partition and at least partially disposed within the gap between the outer edge of the base and the inner wall of the partition, wherein the alignment clamp is physically separate from the partition, and wherein the alignment clamp comprises: A clamp body, the clamp body including an upper surface, a lower surface and an inner periphery, the inner periphery at least partially defining the shape of an inner space including the clamp body, wherein the base is at least partially disposed within the inner space; A measuring protrusion, the measuring protrusion projecting from the clamp body toward the inner space at a first position, wherein the measuring protrusion includes an indicator between the clamp body and the measuring protrusion end of the measuring protrusion, wherein the measuring protrusion is coupled to the upper surface of the clamp body and projects toward the inner space, wherein the top surface of the base is disposed below the upper surface; and A clamp positioning component is recessed into the lower surface of the clamp body, and a plate positioning component is configured to be received within the clamp positioning component. The measuring protrusion includes a first plurality of scale marks disposed between the clamp body and the measuring protrusion end of the measuring protrusion, wherein the first plurality of scale marks includes an indicator.

2. The reactor system according to claim 1, wherein the inner periphery of the clamp body is spaced apart from the outer edge of the base, such that the inner periphery of the clamp body does not contact the outer edge of the base.

3. The reactor system of claim 1, wherein the measuring protrusion extends above the outer edge of the base.

4. The reactor system of claim 1, wherein the clamp body further includes an outer periphery opposite to the inner periphery, wherein the outer periphery defines the outer shape of the clamp body, and the outer shape of the clamp body is complementary to the shape of the interior space of the plate.

5. The reactor system of claim 1, wherein the upper surface is disposed on the upper plane of the alignment fixture, and wherein the base is disposed below the upper plane.

6. The reactor system of claim 1, wherein the alignment fixture further comprises a second measuring protrusion projecting from the fixture body toward the inner space at a second position, wherein the second measuring protrusion includes a second indicator between the fixture body and a second measuring protrusion end of the second measuring protrusion.

7. The reactor system of claim 6, wherein the measuring protrusion and the second measuring protrusion extend toward the center of a shape at least partially defined by the inner periphery, and wherein the indicator is disposed on the measuring protrusion at a first distance from the inner periphery of the clamp body, and wherein the second indicator is disposed on the second measuring protrusion at a second distance from the inner periphery of the clamp body.

8. The reactor system of claim 7, wherein the first distance and the second distance are the same.

9. The reactor system of claim 1, further comprising a reaction chamber, wherein the base, the partition and the alignment clamp are at least partially disposed in the reaction chamber.

10. The reactor system according to claim 1, wherein, The alignment fixture also includes a protrusion gap that passes through a portion of the measuring protrusion.

11. An alignment fixture for a reactor system, comprising: A clamp body, the clamp body including an upper surface, a lower surface and an inner periphery, the inner periphery at least partially defining the shape of an inner space including the clamp body, wherein the inner space is configured as a base for receiving a reactor system; as well as A first measuring protrusion is coupled to the clamp body at a first position and protrudes from the clamp body toward the inner space and across the inner periphery of the clamp body, wherein the first measuring protrusion includes an indicator between the clamp body and a measuring protrusion end of the first measuring protrusion, wherein the first measuring protrusion is coupled to an upper surface of the clamp body and protrudes toward the inner space, the upper surface being disposed on an upper plane of the clamp body, and wherein, in response to the inner space receiving a base of the reactor system, a top surface of the base is disposed below the upper plane; A second measuring protrusion, disposed between 30 and 160 degrees from the center of the shape relative to the center of the shape, protrudes from the clamp body toward the inner space at a second position, wherein the second measuring protrusion includes a second indicator between the clamp body and the second measuring protrusion end of the second measuring protrusion; and A first clamp positioning component is recessed into the lower surface of the clamp body. The first clamp positioning component is configured to receive a plate positioning component therein. The first measuring protrusion includes a first plurality of scale marks disposed between the clamp body and the measuring protrusion end of the first measuring protrusion. The first plurality of scale marks includes an indicator.

12. The alignment fixture of claim 11, wherein the fixture body further includes an outer periphery opposite to the inner periphery, wherein the outer periphery defines the outer shape of the fixture body.

13. The alignment fixture of claim 11, wherein the shape defined at least in part by the inner periphery is complementary to the shape of the base, the inner space being configured to receive the base therein.

14. The alignment fixture of claim 11, wherein the first measuring protrusion and the second measuring protrusion extend toward the center of a shape at least partially defined by the inner periphery, and wherein the indicator is disposed on the first measuring protrusion at a first distance from the inner periphery of the fixture body, and wherein the second indicator is disposed on the second measuring protrusion at a second distance from the inner periphery of the fixture body.

15. The alignment fixture of claim 14, wherein the first distance and the second distance are the same.

16. The alignment fixture according to claim 11 further includes a second fixture positioning component, the second fixture positioning component being recessed into the lower surface of the fixture body, and the second fixture positioning component being circumferentially spaced from the first fixture positioning component.

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