Reactor system

Abstract

We provide reactor systems. [Solution] The reactor system may be configured to include a remote plasma unit, a reactor connected to the remote plasma unit, and / or an active species supply system. The reactor may be configured to include a reaction chamber, a diffuser that is in fluid communication with the reaction chamber, and / or a mixer that is connected to the diffuser and is in fluid communication with the diffuser. The mixer may be configured to include a mixing chamber and a mixer fluid channel that is fluidly connected to the mixing chamber and is located upstream of the mixing chamber. The active species supply system may be configured to include an active species supply conduit that fluidly connects the remote plasma unit to the mixer.

Description

Technical Field

[0001] The present disclosure relates to a reactor system and a reactor system including an active species source.

Background Art

[0002] Reactors can be used to deposit various material layers on a substrate. The substrate may be configured to be disposed on a substrate support structure within the reaction chamber of the reactor. Both the substrate and the substrate support structure may be heated to a desired substrate temperature set point. In an exemplary substrate deposition process, one or more reactant gases may be configured to flow to a mixer and / or a diffuser provided to the reaction chamber. One or more reactant gases may pass over the heated substrate, causing the deposition of a thin film of material on the substrate surface.

[0003] The reactor system may be configured to utilize active species (e.g., radicals and / or plasma) in deposition processes, etching processes, and / or the like. Thus, the reactor system may be configured to have components and / or flow paths for providing active species from a source (e.g., a remote plasma unit) to the reaction chamber.

Summary of the Invention

[0004] The summary of the present invention is provided to introduce the selected concepts in a simplified form. The foregoing concepts are described in more detail in the following "Mode for Carrying Out the Invention" of the present disclosure. This summary is not necessarily intended to identify the main features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.

Means for Solving the Problems

[0005] The embodiments described herein provide a reactor system comprising a remote plasma unit, a reactor connected to the remote plasma unit, and / or an active species supply system. The reactor may comprise a reaction chamber, a diffuser fluidly communicating with the reaction chamber, and / or a mixer connected to and fluidly communicating with the diffuser. The mixer may comprise a mixing chamber and a mixer fluid channel fluidly connected to and upstream of the mixing chamber. The mixer may comprise at least one of titanium metal or titanium alloy. The active species supply system may be fluidly connected to the mixer upstream of the mixer fluid channel. The active species supply system may comprise an active species supply conduit fluidly connecting the remote plasma unit to the mixer. The reactor may further comprise a reactor lid which may have a supply opening.

[0006] The active species supply system may further comprise a supply tube that defines a supply tube channel and has a supply tube wall extending between the proximal and distal ends of the supply tube. The supply tube may include a steel alloy (e.g., stainless steel). The supply tube may be positioned through a supply opening in the reactor lid. The active species supply conduit may comprise a supply tube channel. The proximal end of the supply tube may be positioned relative to the mixer and / or coupled to the mixer so that the supply tube channel is in fluid communication with the mixer fluid channel. In various embodiments, the proximal end of the supply tube may comprise a coupling projection that extends radially outward from the supply tube wall and is configured to couple to the mixer. The coupling projection may be fixed to the mixer. The coupling projection may comprise a coupling flange having a flange shape. The mixer may have a coupling recess formed at the inlet of the mixer fluid channel. The coupling recess may have a shape complementary to the flange shape so that at least a portion of the coupling flange is positioned within the coupling recess. In various embodiments, the connecting projection may have a tapered surface that is tapered radially inward toward the proximal end of the supply pipe. The mixer may have a tapered connecting recess at the inlet of the mixer fluid channel. The tapered connecting recess may be complementary to the tapered surface of the connecting projection so that at least a portion of the connecting projection is positioned within the tapered connecting recess. At least a partial seal may be formed between the proximal end of the supply pipe and the mixer via a tight fit.

[0007] The active species supply system may further comprise a connector tube that defines a connector tube channel and has a connector tube wall extending between the proximal and distal ends of the connector tube. The active species supply conduit may comprise the connector tube channel. The connector tube may include a steel alloy (e.g., stainless steel). The distal end of the connector tube may be coupled to the distal end of the supply tube so that the supply tube channel is in fluid communication with the connector tube channel. The proximal end of the connector tube may be connected to a remote plasma unit.

[0008] The active species supply system may further include a connector flange connected to the distal end of the connector tube. The connector flange may extend radially outward from the connector tube wall and may be connected to the reactor lid. The connector flange may be a separate component connected to the distal end of the connector tube, or a monolithic component of the connector tube wall.

[0009] In various embodiments, the feedpipe may include a feedpipe flange projecting radially outward from the feedpipe wall at a flange position between the proximal and distal ends of the feedpipe. The active species feed system may further include a spring connected to and / or positioned around the feedpipe. The spring may have a first end that applies force to the feedpipe flange and a second end that applies force to at least one of a connector flange, a reactor lid, or a reactor collar positioned between the connector flange and the reactor lid. Depending on whether the connector flange or reactor collar is connected to the reactor lid, the spring can apply force to the feedpipe flange, causing greater contact between the proximal end of the feedpipe and the mixer.

[0010] The reactor system may further include a gas source. The mixing chamber may further include a gas inlet, and the gas source is fluidly connected to the mixing chamber via the gas inlet.

[0011] The inner surfaces of the mixer, supply pipe, and / or connector pipe may include a coating containing aluminum oxide.

[0012] In various embodiments, the reactor system may include a mixer and / or a feed pipe having a feed pipe channel defined and a feed pipe wall extending between the proximal and distal ends of the feed pipe. The mixer may include a mixing chamber, a mixer fluid channel fluid-connected to and upstream of the mixing chamber, and / or a mixer fluid channel inlet including a coupling recess. The proximal end of the feed pipe may be at least partially located within the coupling recess of the mixer fluid channel inlet. The mixer may be a monolithic component including the mixing chamber and the mixer fluid channel. The mixer fluid channel may be configured as an elbow joint between the feed pipe and the mixing chamber. The proximal end of the feed pipe may include a coupling projection extending radially outward from the feed pipe wall. The coupling projection may have a shape complementary to the shape of the coupling recess.

[0013] In various embodiments, the reactor system may comprise a remote plasma unit, a reactor connected to the remote plasma unit, a reactor with a mixer, and / or an active species supply system fluidly connected between the remote plasma unit and the mixer. The active species supply system may comprise a supply pipe connected to the mixer. The active species supply system may be located through the reactor lid. The active species supply system may further comprise a spring connected to and / or around the supply pipe, which applies force to the supply pipe to cause greater contact between the supply pipe and the mixer. The active species supply system may further comprise a connector pipe fluidly connected between the supply pipe and the remote plasma unit. The supply pipe may extend along a different axis from the connector pipe.

[0014] For the purpose of outlining the advantages achieved by this disclosure and the prior art, specific purposes and advantages of this disclosure are described herein. Naturally, it can be understood that each particular embodiment does not necessarily have to achieve all of the aforementioned purposes or advantages. Therefore, it can be recognized by those skilled in the art that this disclosure may be embodied or implemented in a manner that achieves or optimizes one or a group of advantages taught or suggested herein, without necessarily achieving other purposes or advantages that may be taught or suggested herein.

[0015] All embodiments of this disclosure are intended to be within the scope of this disclosure. These embodiments and other embodiments may be readily apparent to those skilled in the art from the following “Modes for Carrying Out the Invention” of certain embodiments with reference to the accompanying drawings, but this disclosure is not limited to any particular embodiments considered.

[0016] This specification specifically points out what is considered to be an embodiment of the present disclosure and concludes with the explicitly claimed claims, while the advantages of the embodiments of the present disclosure may be more readily apparent from the description of a particular embodiment of the present disclosure when read in conjunction with the accompanying drawings. Elements that are numbered similarly throughout the drawings are intended to be the same. [Brief explanation of the drawing]

[0017] [Figure 1A] This is a schematic diagram of an example of a reactor in various embodiments. [Figure 1B] This is a cross-sectional view of the reactor in Figure 1A in various embodiments. [Figure 2A] This is a perspective view illustrating the reactor system in an embodiment of the present disclosure. [Figure 2B] This is a cross-sectional view of parts of the reactor system shown in Figure 2A in various embodiments. [Figure 2C] These are cross-sectional views of some reactor systems in various embodiments. [Figure 2D]It is a partial cross-sectional view of a reactor system in various embodiments. [Figure 3] It is a cross-sectional view of a supply pipe, a mixer, and a diffuser of the reactor system of FIGS. 2A and 2B in various embodiments. [Figure 4] It is a cross-sectional perspective view of the mixer of FIGS. 2B and 3 in various embodiments. [Figure 5] It is a cross-sectional view of a supply pipe, a mixer, and a diffuser of a reactor system in various embodiments. [Figure 6] It is a cross-sectional perspective view of the supply pipe and the mixer of FIG. 5 in various embodiments. [Figure 7] It is a cross-sectional perspective view of a supply pipe and a mixer in various embodiments.

Mode for Carrying Out the Invention

[0018] It should be noted that the components in the drawings are shown prioritizing simplicity and clarity, and are not necessarily drawn to scale. For example, the dimensions of some of the components in the figure may be exaggerated relative to other components to help improve the understanding of the illustrated embodiments of the present disclosure.

[0019] The descriptions of the examples of the methods, structures, devices, and systems provided below are merely illustrative and are intended only to describe, and the following description is not intended to limit the present disclosure or the scope of the claims. Further, the description of a plurality of examples having the described configurations is not intended to exclude other examples having additional configurations or other examples incorporating different combinations of the described configurations. For example, various embodiments are described as exemplary embodiments and may also be described in the dependent claims. Unless otherwise stated, the examples or their components may be combined or applied separately to each other. The method may be configured to include the disclosed steps in any suitable order and / or in a desired order or combination.

[0020] As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. When recited in a list of components, expressions such as "at least one" apply to the entire list of components and not necessarily to individual components of the list, unless otherwise specified.

[0021] As used in this disclosure, the terms "comprising," "including," "having," and / or "containing" identify the presence of the stated composition, integer, step, process, member, component, and / or group thereof, but do not preclude the presence or addition of one or more other compositions, integers, steps, processes, members, components, and / or groups thereof. In this disclosure, any defined meaning does not necessarily exclude the ordinary and customary meaning in some embodiments.

[0022] The term "substrate" as used in this disclosure can refer to any underlying material or material that can be used to form a device, circuit, or film, or any underlying material or material on which a device, circuit, or film can be formed. The substrate may include a bulk material such as silicon (e.g., single crystal silicon), other Group IV materials such as germanium, compound semiconductor materials such as III-V or II-VI semiconductors, and may include one or more layers that overlap or are beneath the bulk material.

[0023] In some examples, “film” refers to a layer extending perpendicular to the thickness direction. In some examples, “layer” refers to a material of a certain thickness formed on a surface, and may be a synonym for film or a non-film structure. A film or layer may consist of a single film or layer having specific properties, or multiple films or layers, and the boundaries between adjacent films or layers may be clear or not, and may be determined or not based on physical, chemical, and / or any other characteristics, formation process or sequence, and / or function or purpose of adjacent films or layers. Layers or films may be continuous or not. Furthermore, a single film or layer may be formed using one or more deposition cycles and / or one or more deposition and processing cycles.

[0024] As used herein, the term “cyclical deposition process” or “cyclic deposition process” may refer to a deposition process in which a deposition cycle, typically a series of consecutive deposition cycles, is carried out within a process chamber. A cyclical deposition process may include, for example, periodic chemical deposition (CCVD) and atomic layer deposition (ALD) processes. A cyclical deposition process may include a plasma enhancement step. A cyclical deposition process may include one or more cycles that involve plasma activation of any combination of precursors, reactants, and / or inert gases.

[0025] In this disclosure, any two numbers of variables can constitute a viable range of those variables, any range shown may include or exclude endpoints, and all ranges and ratios disclosed herein may be combined. In addition, in some examples, any value of a variable shown (whether shown with “approximately” or not) may refer to an exact value or an approximate value, may include an equality, or may refer to a mean, median, representative value, or majority, etc. Unless otherwise specifically stated, and a singular reference to a component may also include cases where there are multiple components. When referring to a component of a system discussed herein, the term “connection” refers, as necessary, to a direct or indirect connection with other intervening elements. Unless otherwise indicated, terms such as “first,” “second,” etc., and / or “primary,” “secondary,” etc., are used herein solely for identification purposes and are not intended to impose any sequential, positional, or hierarchical requirements on the items referred to by these terms. Furthermore, for example, a reference to a “second” component does not require or exclude the presence of, for example, a “first” component or a lesser numbered component, and / or, for example, a “third” component or a more numbered component. Furthermore, for example, a reference to a first and a second component does not mean that there are no intervening components, but rather that intervening items may be present as described above.

[0026] Figures 1A and 1B show gas-phase reactor systems according to various embodiments. The reactor system may include a reactor 150, which includes a reaction chamber 110, a susceptor 120, a diffuser 130, a mixer 140, and a reaction chamber exhaust conduit 104. The diffuser 130 may include a diffuser space 134 through which a fluid can flow. The diffuser 130 may include a diffuser inlet 132, which includes a diffuser inlet surface 135. The diffuser inlet surface 135 may include one or more connecting openings 139 located therein, which are configured to accept fasteners (e.g., screws, bolts, nails, and / or similar) and to connect to other components of the reactor system 100 (e.g., the mixer 140). The reaction chamber 110 may include an inlet 116 that fluidly connects the reaction chamber 110 to the diffuser space 134 and an outlet 118 that fluidly connects the reaction chamber 110 to the reaction chamber exhaust conduit 104. The reactor system 100 may additionally include various gas sources (e.g., gas source 92), such as a purge and reactant gas source, and / or one or more exhaust and / or vacuum sources.

[0027] The reactor 150 may be used to deposit material onto the surface of a substrate, etch the material from the substrate surface, clean the substrate surface, treat the substrate surface, deposit material onto a surface in a reaction chamber, clean the surface in the reaction chamber, etch the surface in the reaction chamber, and / or treat the surface in the reaction chamber 110. The reactor 150 may be a standalone reactor or part of a cluster tool. Furthermore, the reactor 150 may be dedicated to a deposition, etching, cleaning, or treatment process, or may be used in multiple processes, for example, in any combination of deposition, etching, cleaning, and treatment processes. As an example, the reactor 150 may include a reactor typically used in chemical vapor deposition (CVD) processes such as atomic layer deposition (ALD) processes.

[0028] The reaction chamber 110 may be a cross-flow reaction chamber. During operation, the gas enters the reaction chamber 110 via the diffuser 130 and flows horizontally through the reaction chamber 110 to the reaction chamber exhaust conduit 104.

[0029] In relation to Figures 2A and 2B, the reactor system 200 comprises a reactor 250 and a remote plasma unit (RPU) 270 connected to the reactor 250. The RPU 270 may be positioned at any suitable location relative to the reactor 250, such as above or on top of the reactor 250. The RPU 270 may be supported and / or separated from the reactor 250, for example, via support legs 274. The RPU 270 may generate excited or active species (e.g., ions, radicals, and / or homogenes) which may be configured to flow into the reactor 250 to process a substrate (e.g., film deposition or etching). The RPU 270 may have an outlet 272 through which the active species flow from the RPU 270 toward the reactor 250.

[0030] The reactor 250 may include a mixer 400 (similar to mixer 140 in Figures 1A and 1B). The mixer 400 may be configured to accept one or more fluids (e.g., gases) into it and / or to facilitate combinations or mixing of such fluids. The gases may be configured to flow into the diffuser 130 and into the reaction chamber 110. Referring further to Figures 3 and 4, the mixer 400 may comprise a mixing chamber 410 and a mixer fluid channel 420. The mixer fluid channel 420 may be fluid-connected to the mixing chamber 410 and located upstream of the mixing chamber 410. The active species may be configured to flow from the RPU 270 into the mixer 400 through a mixer inlet 402 (which may be configured as an inlet to the mixer fluid channel 420). The mixer fluid channel 420 may include any suitable shape. For example, the mixer fluid channel 420 may be shaped to change the direction of the flow of active species from the RPU 270 to the mixing chamber 410. The mixer fluid channel 420 may have an L-shape (elbow joint) and may be configured to receive active species from above (i.e., active species substantially flowing from the RPU 270 in the direction of gravity) and direct the active species laterally to the mixing chamber 410.

[0031] The mixer 400 may include one or more gas inlets 413 located through the wall of the mixing chamber 410. The gas inlets 413 may be fluidly connected to a gas source (e.g., gas source 92) which can be configured to supply the mixer 400 with a reaction gas, precursor gas, etching gas, carrier gas, purge gas, or any other desired gas. The gas inlets 413 facilitate the flow of each gas into the mixing chamber 410. Multiple gases may be flowed into the mixing chamber 410 through the gas inlets 413 to facilitate the mixing of multiple gases.

[0032] The mixer 400 may include a mixer outlet surface 430. The mixer outlet surface 430 may be able to define at least partially the outlet of the mixing chamber 410, and the gas may be configured to flow through that outlet into the diffuser 130. The mixer 400 may be coupled to the diffuser 130 by the mixer outlet surface 430 which is located in close proximity to or adjacent to the diffuser inlet surface 135 of the diffuser 130. The mixer outlet surface 430 may have one or more connecting openings 439 located therein, which may be configured to receive fasteners. The connecting opening 439 of the mixer 400 may be arranged in a complementary arrangement or pattern to the arrangement or pattern of the connecting opening 139 of the diffuser 130, so that fasteners may be placed in the connecting opening 139 of the diffuser 130 in order to connect the mixer 400 and the diffuser 130 through the distal surface of the mixer (for example, the distal surface 640 of the mixer 600 shown in Figure 6) and the connecting opening 439.

[0033] In various embodiments, the reactor system may include an active species supply system that can fluidly connect the reactor mixer and the RPU. For example, reactor system 200 may include an active species supply system 300 connected between the RPU 270 and the mixer 400. The active species supply system 300 may include an active species supply conduit 305 extending through the active species supply system 300 (for example, through multiple components of the active species supply system 300), through which the active species flow, fluidly connecting the RPU 270 and the mixer 400. The active species supply system 300 may be located upstream of the mixer 400 and downstream of the RPU 270.

[0034] The active species supply system 300 may include a supply pipe 310. The supply pipe 310 may include a supply pipe wall 312 that at least partially defines a supply pipe channel 314. The active species supply conduit 305 may include a supply pipe channel 314, and active species from the RPU 270 may be configured to flow through the supply pipe channel 314. The supply pipe 310 may include a proximal supply pipe end 316 and a distal supply pipe end 318, and may extend between them. The proximal supply pipe end 316 may be located close to and / or adjacent to the mixer 400, and may be positioned relative to and / or connected to the mixer 400. At least a partial seal may be formed between the proximal supply pipe end 316 and the mixer 400. An O-ring can be placed between the proximal end 316 of the supply pipe and the mixer 400 to form a seal, or the seal may be made by a press fit (e.g., without an O-ring). At least a partial seal may be formed by the material of the supply pipe 310 in contact with the material of the mixer 400 (e.g., by metal-to-metal contact).

[0035] In various embodiments, the proximal end of the supply pipe may include a connecting projection extending radially outward from the supply pipe wall. The connecting projection of the supply pipe may be configured to facilitate coupling of the supply pipe to the mixer. For example, as shown in Figures 2B, 3, and 4, the proximal end 316 of the supply pipe may include a connecting projection 317 extending radially from the supply pipe wall 312. The connecting projection 317 may be configured to connect to the mixer 400 or to form at least a partial seal with the mixer 400. In various embodiments, the connecting projection 317 may be coupled to the mixer 400 via fasteners 449 (i.e., the connecting projection 317 may be fixed to the mixer 400). In various embodiments, the connecting projection 317 may be positioned and / or pressed against the mixer 400 (e.g., against the inlet surface 406 of the mixer 400).

[0036] The connecting projection 317 may be a connecting flange having a connecting flange shape. The mixer 400 may have a connecting recess 404 located within the mixer inlet surface 406. The connecting recess 404 may have a shape complementary to the connecting flange shape of the connecting projection 317, such that at least a portion of the connecting flange is located within the connecting recess 404. Depending on the location of the connecting projection 317 within the connecting recess 404, the upper surface of the connecting projection 317 may be coplanar with the mixer inlet surface 406. The connecting projection 317 may have a chamfered or tapered (i.e., rounded or angled) corner 319. The chamfered corner 319 may be configured to facilitate insertion of the connecting projection 317 into the connecting recess 404 in order to achieve the desired alignment and / or positioning.

[0037] Referring to Figures 5 and 6, mixer 600 is shown as another example of a mixer used in a reactor. Mixer 600 may have components similar to those of mixer 400, or may have components similar to those of mixer 400. Therefore, the description of mixer 400 and its components can be applied to mixer 600 and its components. Mixer 600 may comprise a mixing chamber 610, a mixer fluid channel 620, a mixer inlet 602, and a gas inlet 613. The feed pipe 510 may be similar to that of feed pipe 310, or may have components similar to those of feed pipe 310. Therefore, the description of feed pipe 310 and its components can be applied to feed pipe 510 and its components. The feed pipe 510 may comprise a feed pipe wall 512 that at least partially defines the feed pipe channel 514 and extends between the proximal end 516 and the distal end of the feed pipe. The proximal end 516 of the supply pipe may include a connecting projection 517 having a tapered surface 519 (e.g., a curved surface or a ball surface). The tapered surface 519 may be tapered radially inward toward the proximal end 516 of the supply pipe (i.e., the radius of the tapered surface 519 is closer to the proximal end 516 of the supply pipe and forms a frustoconical shape). The mixer 600 may include a mixer inlet 602 which may be configured to include a tapered connecting recess 606. The tapered connecting recess 606 may be complementary to the tapered surface 519 of the connecting projection 517 (e.g., shape, length, angle, etc.) such that at least a portion of the connecting projection 517 is positioned within the tapered connecting recess 606, and / or the tapered surface 519 and the tapered connecting recess 606 align and / or contact each other, forming at least a partial seal between them. An O-ring can be positioned between the tapered surface 519 and the tapered connecting recess 606 to form a seal, or the seal may be made by a press fit (e.g., without an O-ring). The tapered surface 519 and / or the tapered connecting recess 606 may be configured to accommodate contact and / or coupling between the proximal end of the supply pipe 516 and the mixer 600 from various angles (e.g., whether the supply pipe 500 is aligned with the mixer fluid channel 620 and / or the mixer inlet 602, or aligned from there at a certain angle).In other words, the tapered surface 519 and / or tapered connecting recess 606 may be configured to facilitate contact and / or coupling between the proximal end 516 of the supply pipe and the mixer 600, even when the supply pipe 500 is angled (for example, approaching the mixer 600 from an angle other than the desired angle).

[0038] Referring to Figure 7, mixer 700 is another example of a mixer used in a reactor. Mixer 700 is similar to mixer 400 and mixer 600 and may have similar components. Therefore, the descriptions of mixer 400 and mixer 600, as well as their components, can be applied to mixer 700 and its components. Mixer 700 may comprise a mixing chamber 710, a mixer fluid channel 720, a mixer inlet 702, and a gas inlet 713. Feed pipe 810 is similar to feed pipe 310 and feed pipe 510 and may have similar components. Therefore, the descriptions of feed pipe 310 and feed pipe 510, as well as their components, can be applied to feed pipe 810 and its components. Feed pipe 810 may comprise a feed pipe wall 812 that at least partially defines a feed pipe channel 814 and extends between the proximal feed pipe end 816 and the distal feed pipe end. The proximal end 816 of the supply pipe may be provided with a connecting projection 817. The connecting projection 817 may extend radially from the supply pipe wall 812. The connecting projection 817 may be coupled to the mixer 700 or configured to form at least a partial seal with the mixer 700.

[0039] In various embodiments, the connecting projection 817 may be coupled to the mixer 700 via fasteners 749 (i.e., the connecting projection 817 may be fixed to the mixer 700). In various embodiments, the connecting projection 817 may be positioned and / or pressed against the mixer 700 (for example, against the inlet surface of the mixer 700) without fasteners.

[0040] The connecting projection 817 may be a connecting flange having a connecting flange shape. The connecting flange may have dimensions in the first direction that are larger than those in the second direction. For example, the dimensions of the connecting projection 817 in the first direction may be larger than those in the second direction (e.g., perpendicular to the first direction) and may be configured to allow space for a connecting opening and to accommodate a fastener 749 therein.

[0041] The mixer 700 may include a connecting recess 704 located within the mixer inlet surface 706. The connecting recess 704 may have a shape complementary to the coupling flange shape of the connecting projection 817, such that at least a portion of the coupling flange is positioned within the connecting recess 704. The connecting recess 704 may have chamfered or tapered (i.e., rounded or angled) side surfaces 719. The chamfered side surfaces may be configured to facilitate insertion of the connecting projection 817 into the connecting recess 704 to achieve the desired alignment and / or positioning. A seal may be positioned between the proximal end 816 of the supply pipe and the mixer 700 to form a seal, or the seal may be configured to be made by a press fit (e.g., without O-rings and / or fasteners).

[0042] Referring back to Figures 2A, 2B, and 4, the reactor 250 may include a reactor lid 253. The reactor lid 253 may be connected to other components of the reactor 250 (e.g., the reactor wall system) via fasteners 203. The reactor lid 253 may be configured to enclose the internal components of the reactor 250. A supply opening 255 is located through the reactor lid 253, and a portion of the active species supply system 300 may be located within and through the active species supply system 300. For example, a supply pipe 310 may be located through the reactor lid 253 and configured to fluidly connect the RPU 270 to the internal components of the reactor 250 (e.g., the mixer 400 and / or diffuser 130).

[0043] In various embodiments, with further reference to Figures 2C and 2D, the reactor 250 may comprise a reactor collar 260 connected to the reactor lid 253. The reactor collar 260 may also be an intermediate flange to facilitate the connection of various other components of the reactor system. The reactor collar 260 may be connected to the reactor lid 253 via fasteners 203 and / or fasteners that pass through an opening 269 and enter a complementary connecting opening 259 in the reactor lid 253. The reactor collar 260 may comprise a collar supply opening 265 that aligns with and / or fluidizes the supply opening 255 of the reactor lid 253. Thus, active species may flow through the reactor collar 260 via the collar supply opening 265 and through the supply opening 255 (e.g., in a supply pipe 310) through the reactor collar 253. The seal 282 may be located within a collar supply opening 265 (e.g., an O-ring seal) configured to contact the supply pipe 310 around its periphery or outer surface and to form a seal (or at least a partial seal). The seal 282 may be configured to facilitate the alignment of the supply pipe 310 within the collar supply opening 265 and / or to form a seal to prevent or reduce leakage of active species from the RPU 270.

[0044] In various embodiments, the active species supply system 300 may include a connector tube 320. The connector tube 320 may include a connector tube wall 322 that at least partially defines a connector tube channel 324. The active species supply conduit 305 may also include a connector tube channel 324, and active species from the RPU 270 may flow through the connector tube channel 324. The connector tube 320 may include a connector tube proximal end 326 and a connector tube distal end 328, extending between them. The connector tube proximal end 326 may be positioned close to and / or adjacent to the RPU 270, or relative to and / or coupled to the RPU 270. There may be at least a partial seal between the connector tube proximal end 326 and the RPU 270. The distal end 328 of the connector tube may be positioned close to and / or adjacent to the distal end 318 of the supply tube, and connected to and / or connected to the distal end 318 of the supply tube. It may be configured to form at least a partial seal between the distal end 328 of the connector tube and the distal end 318 of the supply tube. An O-ring may be positioned between the distal end 328 of the connector tube and the distal end 318 of the supply tube to form a seal, or the seal may be configured to be formed by a crimp fit (e.g., without an O-ring). The at least partial seal may be formed by the material of the connector tube 320 in contact with the material of the supply tube 310 (e.g., by metal-to-metal contact).

[0045] The connector tube 320 may include any suitable shape or configuration. Based on the placement of the RPU 270 relative to the reactor 250, the connector tube 320 may be angled or curved to connect and fluidize the outlet 272 of the RPU 270 to the supply opening 255 of the reactor lid 253 and / or the distal end 318 of the supply tube 310. The connector tube 320 may extend along a different axis from the supply tube 310. In various embodiments, the connector tube 320 may have a linear shape between the RPU 270 and the distal end 318 of the supply tube 310.

[0046] The active species supply system 300 may include a connector flange 330. The connector flange 330 may be connected to the distal end 328 of the connector tube. The connector flange 330 may extend radially outward from the connector tube wall 322 (i.e., the connector flange 330 may have a larger radius and / or other similar dimensions than the corresponding dimensions of the connector tube 320). The connector flange 330 may be a separate component from the connector tube 320 connected to the distal end 328 of the connector tube, or the connector flange 330 may be a monolithic component of the connector tube wall 322. The connector flange 330 may be positioned relative to the reactor lid 253 (or a recess 257 in the reactor lid 253 having a complementary shape to the connector flange 330). The connector flange 330 may be configured to facilitate coupling and / or engagement between the supply tube 310 and the connector tube 320. The connector flange 330 may be connected to the reactor lid 253 in any suitable manner by fasteners 339 (such as screws, bolts, and / or similar), adhesives, tamper-evident fits, magnets, and / or similar) that pass through the connector flange 330 and enter into complementary connecting openings 259 of the reactor lid 253.

[0047] The supply pipe 310 may include a supply pipe flange 313 projecting radially outward from the supply pipe wall 312. The supply pipe flange 313 may be located between the proximal end 316 and the distal end 318 of the supply pipe (e.g., the more proximal distal end 318). The active species supply system 300 may include a spring 309 (e.g., a compression spring, a wave spring, and / or similar) connected to and / or positioned around the supply pipe 310. The spring 309 may have a first end connected to and engaged with the supply pipe flange 313 and / or applying force to the supply pipe flange 313 (e.g., on the surface of the supply pipe flange 313 facing upward and / or upstream). As illustrated in Figure 2B, the spring 309 may have a second end opposite the first end that connects to, engages with, and / or applies force to the connector flange 330 (i.e., the second end of the spring 309 may be positioned opposite the connector flange 330). As the connector flange 330 connects to the reactor lid 253, the spring 309 can stretch between the supply pipe flange 313 and the connector flange 330 and be compressed between them. As shown in Figure 2C, the second end of the spring 309 may be configured to connect to, engage with, and / or apply force to the reactor collar 260. The reactor collar 260 can compress the spring 309 and connect to the reactor lid 253, thus holding the spring 309 and the supply pipe 310 in place. Since such connection may be made before connecting the connector flange 330 and / or connector tube 320 to the reactor 250, the connector flange 330 and connector tube 320 may be connected to the reactor 250 without resistance and / or movement from the spring 309, the supply tube 310, or other nearby components. As the reactor collar 260 is connected to the reactor lid 253, the spring 309 may be extended between the supply tube flange 313 and the reactor collar 260 and compressed between them.

[0048] The spring 309 may have a bias toward the extended position, and therefore, when compressed between the supply pipe flange 313 and the connector flange 330 and / or reactor collar 260, the spring 309 may be configured to apply force to the connector flange 330 and / or reactor collar 260 (e.g., upstream) and to the supply pipe flange 313 (e.g., downward and / or downstream toward the mixer 400). The force from the spring 309 toward the supply pipe flange 313 may cause greater contact between the supply pipe proximal end 316 and the mixer 400 (e.g., in the coupling recess of the mixer). For example, referring further to Figures 5 and 6, the spring of the active species supply system 300 may be configured to press the supply pipe 510 against the mixer 600 (e.g., press the supply pipe proximal end 316 with the tapered surface 519 against the tapered coupling recess 606), creating greater contact between them than would be possible without the spring force. This may be configured to facilitate the formation of at least a partial seal between the supply pipe and the mixer as disclosed herein (for example, with or without connection via one or more fasteners).

[0049] The components of the reactor system, including the reactor, the active species supply system, and the mixer, may include any suitable material. For example, the mixer may include titanium metal, titanium alloys, and / or steel alloys (e.g., stainless steel). The components of the active species supply system may include steel alloys (e.g., stainless steel). In various embodiments, the mixer, supply pipes, and / or connector pipes may include a coating containing aluminum oxide (e.g., along the active species supply conduit 305 in Figure 3, e.g., coating 311). The aforementioned coatings can reduce or prevent radical rearrangement, thereby extending the lifetime of the active species flowing from the RPU 270 to the diffuser 130, making a larger quantity of active species available for the desired processing within the reactor.

[0050] The embodiments described herein are merely illustrative examples of embodiments of the disclosure, and the scope of the disclosure as defined by the appended claims and their legal equivalents is not limited by these embodiments. Any equivalent examples are intended to fall within the scope of the disclosure. Furthermore, various modifications of the disclosure, such as alternative useful combinations of components described other than those illustrated or described herein, will be readily apparent to those skilled in the art from the description. Such modifications and embodiments are also intended to be included within the scope of the appended claims.

Claims

1. Remote plasma unit and A reactor connected to the aforementioned remote plasma unit, Reaction chamber and A diffuser that is in fluid communication with the reaction chamber, A reactor having a mixer coupled to the diffuser and in fluid communication with the diffuser, the mixer comprising a mixing chamber and a mixer fluid channel fluidly coupled to the mixing chamber and located upstream of the mixing chamber, A reactor system comprising: an active species supply system fluidly connected to the mixer upstream of the mixer fluid channel, the active species supply system comprising an active species supply conduit for fluidly connecting the remote plasma unit to the mixer.

2. The reactor further comprises a reactor lid, and the reactor lid has a supply opening. The reactor system according to claim 1, wherein the active species supply system further comprises a supply tube having a supply tube wall that extends between the proximal and distal ends of the supply tube, the active species supply conduit comprises the supply tube channel, the supply tube is positioned through the supply opening of the reactor lid, and the proximal end of the supply tube is positioned relative to the mixer such that the supply tube channel is in fluid communication with the mixer fluid channel.

3. The reactor system according to claim 2, wherein the active species supply system defines a connector tube channel and further comprises a connector tube including a connector tube wall extending between the proximal end and distal end of the connector tube, the active species supply conduit comprises the connector tube channel, the distal end of the connector tube is coupled to the distal end of the supply tube such that the supply tube channel is in fluid communication with the connector tube channel, and the proximal end of the connector tube is coupled to the remote plasma unit.

4. The reactor system according to claim 3, further comprising a connector flange coupled to the distal end of the connector tube, wherein the active species supply system further comprises a connector flange extending radially outward from the wall of the connector tube and coupled to the reactor lid.

5. The connector flange is A separate component coupled to the distal end of the connector tube, or The reactor system according to claim 4, wherein one of the monolithic components of the connector pipe wall is...

6. The supply pipe is provided with a supply pipe flange that protrudes radially outward from the supply pipe wall at a flange position between the proximal end and the distal end of the supply pipe. The reactor system according to claim 4, wherein the active species supply system further comprises a spring disposed around the supply pipe, the spring having a first end that applies force to the supply pipe flange and a second end that applies force to at least one of the connector flange, the reactor lid, or the reactor collar disposed between the connector flange and the reactor lid.

7. The reactor system according to claim 6, wherein the spring applies force to the supply pipe flange in response to the connector flange or the reactor collar being connected to the reactor lid, causing greater contact between the proximal end of the supply pipe and the mixer.

8. The reactor system according to claim 2, wherein the proximal end of the supply pipe is provided with a connecting projection that extends radially outward from the wall of the supply pipe and is configured to connect to the mixer.

9. The reactor system according to claim 8, wherein the coupling projection is fixed to the mixer.

10. The reactor system according to claim 8, wherein the connecting projection comprises a connecting flange having a flange shape, the mixer comprises a connecting recess at the inlet of the mixer fluid channel, and the connecting recess has a shape complementary to the flange shape such that at least a portion of the connecting flange is positioned within the connecting recess.

11. The reactor system according to claim 8, wherein the connecting projection has a tapered surface formed in a tapered shape radially inward toward the proximal end of the supply pipe, the mixer has a tapered connecting recess at the inlet of the mixer fluid channel, and the tapered connecting recess is complementary to the tapered surface of the connecting projection such that at least a portion of the connecting projection is positioned within the tapered connecting recess.

12. Equipped with additional gas sources, The reactor system according to claim 1, wherein the mixing chamber further comprises a gas inlet, and the gas source is fluidly connected to the mixing chamber via the gas inlet.

13. The reactor system according to claim 3, wherein the mixer comprises at least one of titanium metal and titanium alloy, and the supply pipe and the connector pipe comprises stainless steel.

14. The reactor system according to claim 13, wherein the inner surface of at least one of the mixer, the supply pipe, or the connector pipe is provided with a coating containing aluminum oxide.

15. The reactor system according to claim 2, wherein at least a partial seal is formed between the proximal end of the supply pipe and the mixer via an interlocking fit.

16. It is a mixer, Mixing chamber and A mixer fluid channel is fluid-connected to the mixing chamber and is located upstream of the mixing chamber, A mixer fluid channel inlet including a connecting recess, A mixer is a monolithic component comprising the mixing chamber and the mixer fluid channel, A reactor system comprising: a supply tube that defines a supply tube channel and has a supply tube wall extending between the proximal end and the distal end of the supply tube, wherein the proximal end of the supply tube is at least partially located within the connecting recess of the mixer fluid channel inlet.

17. The reactor system according to claim 16, wherein the mixer fluid channel is an elbow joint between the supply pipe and the mixing chamber, the proximal end of the supply pipe is provided with a connecting projection extending radially outward from the wall of the supply pipe, and the connecting projection has a shape complementary to the shape of the connecting recess.

18. Remote plasma unit and A reactor connected to the remote plasma unit, comprising a reactor equipped with a mixer, A reactor system comprising: an active species supply system fluidly connected between the remote plasma unit and the mixer, the active species supply system comprising a supply pipe connected to the mixer and arranged through the reactor lid.

19. The reactor system according to claim 18, wherein the active species supply system further comprises a spring disposed around the supply pipe, which applies force to the supply pipe to cause greater contact between the supply pipe and the mixer.

20. The reactor system according to claim 18, wherein the active species supply system further comprises a connector tube fluidly connected between the supply tube and the remote plasma unit, and the supply tube extends along an axis different from that of the connector tube.

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