Display substrate and display device

Abstract

A display substrate and a display device, wherein the display substrate comprises a base, a light emitting device, a photosensitive device and a shading structure arranged on the base, wherein the shading structure is located around the photosensitive device and is at least configured to block the light emitted by the light emitting device toward the photosensitive device.

Description

Technical Field

[0001] The embodiments of the present disclosure relate to, but are not limited to, the field of display technology, and specifically relate to a display substrate and a display device. Background Art

[0002] LED (Light Emitting Diode) is a semiconductor device that can emit light. By using different semiconductor materials and structures, LED chips have the advantages of simple structure, small size, energy saving, high efficiency, long life, clear light, etc. In recent years, they have gradually replaced traditional lighting fixtures such as incandescent lamps and fluorescent lamps, and are becoming the mainstream product in the new generation lighting market. They are also widely used in optoelectronic systems.

[0003] Organic light-emitting display devices not only have diversified application areas, but some products are gradually developing towards multi-functions, such as optical in-screen fingerprints. Currently, fingerprint recognition technologies mainly include capacitive, optical and ultrasonic. However, due to the limitation of penetration distance, the capacitive type can only be integrated in the cover and cannot be used under the screen; the ultrasonic type is not easy to be integrated into the screen due to material limitations. Only optical and ultrasonic types are suitable for full screens. Optical types are preferred for both full and large screens and screen integration.

[0004] In the optical fingerprint recognition method, the photosensitive device realizes photoelectric conversion by receiving signal light, thereby realizing the function of optical fingerprint. However, in addition to receiving signal light, the photosensitive device also receives other noise light. Summary of the invention

[0005] The following is a summary of the subject matter of the detailed description of the present disclosure. This summary is not intended to limit the scope of the claims.

[0006] In a first aspect, an embodiment of the present disclosure provides a display substrate, comprising a substrate, a light-emitting device, a photosensitive device and a shading structure arranged on the substrate, wherein the shading structure is located on the peripheral side of the photosensitive device, and the shading structure is at least configured to block the light emitted by the light-emitting device toward the photosensitive device.

[0007] In an exemplary embodiment, an orthographic projection of the light shielding structure on the substrate does not overlap with an orthographic projection of the photosensitive device on the substrate.

[0008] In an exemplary embodiment, the light shielding structure is disposed around the periphery of the photosensitive device.

[0009] In an exemplary embodiment, in a direction perpendicular to the substrate, a cross section of a surface of the light shielding structure on a side away from the photosensitive device is in a convergent shape along the direction away from the substrate.

[0010] In an exemplary embodiment, it also includes an active layer arranged on the substrate, a first gate insulating layer arranged on a side of the active layer away from the substrate, and a first gate metal layer arranged on a side of the first gate insulating layer away from the substrate, wherein the first gate metal layer includes the photosensitive device.

[0011] In an exemplary embodiment, it also includes a second gate insulating layer arranged on a side of the first gate metal layer away from the substrate, a first groove is arranged in the second gate insulating layer, the first groove is located on the peripheral side of the photosensitive device, the first groove includes a first side wall and a second side wall, the first side wall is located on a side of the second side wall close to the photosensitive device, and the shading structure is arranged on the surface of the first side wall away from the photosensitive device.

[0012] In an exemplary embodiment, a bottom of the first groove extends to a surface of the first gate insulating layer away from the substrate.

[0013] In an exemplary embodiment, it also includes an interlayer dielectric layer arranged on the side of the second gate insulation layer away from the substrate, a second groove is arranged in the interlayer dielectric layer, the second groove is connected to the first groove, the second groove includes a third side wall and a fourth side wall, the third side wall is located on the side of the fourth side wall close to the photosensitive device, and the shading structure is arranged on the surface of the third side wall away from the photosensitive device.

[0014] In an exemplary embodiment, the third sidewall is connected to the first sidewall, and the light shielding structure on the third sidewall and the light shielding structure on the first sidewall can be integrally formed using the same material.

[0015] In an exemplary embodiment, it also includes an interlayer dielectric layer arranged on a side of the second gate insulating layer away from the substrate and a source-drain electrode layer arranged on a side of the interlayer dielectric layer away from the substrate, and the light shielding structure and the source-drain electrode layer are made of the same material.

[0016] In an exemplary embodiment, a light shielding layer is further included, which is disposed on the substrate. The light shielding layer is located on a side of the active layer close to the substrate, and at least a portion of the orthographic projection of the light shielding layer on the substrate overlaps with the orthographic projection of the active layer on the substrate.

[0017] In an exemplary embodiment, a focusing structure is further included, which is located on the side of the photosensitive device away from the substrate, and at least a portion of the light-focusing structure's orthographic projection on the substrate overlaps with the orthographic projection of the photosensitive device on the substrate. The focusing structure is configured to focus light incident from the side of the light-focusing structure away from the substrate, and the focused light is at least partially directed toward the photosensitive device.

[0018] In an exemplary embodiment, the focusing structure includes a first material layer and a second material layer, the first material layer is located on a side of the second material layer close to the substrate, the refractive index of the first material layer is greater than the refractive index of the second material layer, and a concave-convex structure is provided on the surface of the first material layer away from the substrate, and the interface between the concave-convex structure and the second material layer is configured to gather light incident from the side of the concave-convex structure away from the substrate, and the gathered light is at least partially directed toward the photosensitive device.

[0019] In an exemplary embodiment, it also includes a first flat layer and a second flat layer located on a side of the photosensitive device away from the substrate, the first flat layer is located on a side of the second flat layer close to the substrate, the first flat layer and the first material layer are integrally formed using the same material, and the second flat layer and the second material layer are integrally formed using the same material.

[0020] A display device, characterized by comprising the above-mentioned display substrate.

[0021] Other aspects will be apparent upon reading and understanding the drawings and detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The accompanying drawings are used to provide an understanding of the technical solution of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the technical solution of the present application and do not constitute a limitation on the technical solution of the present application.

[0023] Figure 1 A schematic diagram of a display substrate provided for an exemplary embodiment of the present disclosure;

[0024] Figure 2 A schematic diagram showing an exemplary embodiment of the present disclosure after a first groove and a second groove pattern are formed on a substrate;

[0025] Figure 3 for Figure 2 Top view at point a in the middle;

[0026] Figure 4 This is a schematic diagram showing an exemplary embodiment of the present disclosure after a light shielding structure pattern is formed on a substrate;

[0027] Figure 5 for Figure 4 Top view at point a in the middle;

[0028] Figure 6 This is a schematic diagram showing an exemplary embodiment of the present disclosure after a first planar layer pattern is formed on a substrate;

[0029] Figure 7 for Figure 6 Top view at point a in the middle;

[0030] Figure 8 This is a schematic diagram showing an exemplary embodiment of the present disclosure after a light-condensing structure pattern is formed on a substrate;

[0031] Fig. 9 for Figure 8 Top view at point a in the middle. DETAILED DESCRIPTION

[0032] The embodiments of the present disclosure will be described in detail below in conjunction with the accompanying drawings. Note that the embodiments can be implemented in a plurality of different forms. A person of ordinary skill in the art can easily understand the fact that the methods and contents can be transformed into various forms without departing from the purpose and scope of the present disclosure. Therefore, the present disclosure should not be interpreted as being limited to the contents described in the following embodiments. In the absence of conflict, the embodiments in the present disclosure and the features in the embodiments can be arbitrarily combined with each other.

[0033] In this specification, for the sake of convenience, the words and phrases indicating the orientation or positional relationship, such as "middle", "upper", "lower", "front", "back", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., are used to illustrate the positional relationship of the constituent elements with reference to the drawings. This is only for the convenience of describing this specification and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation of the present disclosure. The positional relationship of the constituent elements is appropriately changed according to the direction in which each constituent element is described. Therefore, it is not limited to the words and phrases described in the specification, and can be appropriately replaced according to the situation.

[0034] In this specification, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate, or the internal communication of two elements. For ordinary technicians in this field, the meanings of the above terms in this disclosure can be understood according to the circumstances.

[0035] The term "about" in the present disclosure refers to a numerical value that is not strictly limited to allow for process and measurement errors.

[0036] In the optical method, the photosensitive device realizes photoelectric conversion by receiving signal light, thereby realizing the function of optical fingerprint recognition. However, in addition to receiving signal light, the photosensitive device also receives other noise light (i.e., light other than signal light), such as noise light outside the display substrate, or lateral light in the display area and reflected light in the display area. Therefore, it is necessary to increase the ratio of signal light to noise light to improve the signal-to-noise ratio. In the embodiment of the present disclosure, a light-shielding structure pattern is prepared by utilizing the metal film layer of the backplane (BP) process segment to enhance the signal-to-noise ratio.

[0037] The embodiment of the present disclosure provides a display substrate, including a substrate, a light emitting device, a photosensitive device and a light shielding structure arranged on the substrate, wherein the light shielding structure is located around the photosensitive device and configured to shield the light emitted by the light emitting device toward the photosensitive device. The light shielding structure may use an existing film layer of the display substrate, or a new film layer.

[0038] In an exemplary embodiment, a metal film layer of a BP process can be used. For example, a source-drain layer SD is used to prepare a light-shielding structure pattern. The light emitted by the light-emitting device is reflected by the finger to the photosensitive device (i.e., signal light), thereby performing fingerprint recognition; the display substrate of the disclosed embodiment utilizes the light-blocking effect of the light-shielding structure to prevent the photosensitive device from receiving the light directly emitted by the light-emitting device and the external ambient light, thereby reducing noise light and enhancing the signal-to-noise ratio.

[0039] Figure 1 Schematic diagram of a display substrate provided in an embodiment of the present disclosure. The display substrate may include a plurality of photosensitive devices and a plurality of light shielding structures. Figure 1 Only one photosensitive device and one light shielding structure are shown in FIG. Figure 1As shown, the display substrate may include: a substrate 10, a first buffer layer 11 arranged on the substrate 10, a light shielding layer 12 arranged on a side of the first buffer layer 11 away from the substrate 10, a second buffer layer 13 arranged on a side of the light shielding layer 12 away from the substrate 10 and covering the light shielding layer 12, an active layer 14 arranged on a side of the second buffer layer 13 away from the substrate 10, a first gate insulating layer 15 arranged on a side of the active layer 14 away from the substrate 10 and covering the active layer 14, and a first gate metal layer arranged on a side of the first gate insulating layer 15 away from the substrate 10; the first gate metal layer may include a first gate electrode 16, a second gate electrode 17 and a photosensitive device 18; a second gate insulating layer 19 arranged on a side of the first gate metal layer away from the substrate 10 and covering the first gate electrode 16, the second gate electrode 17 and the photosensitive device 18, and a second gate metal layer arranged on a side of the second gate insulating layer 19 away from the substrate 10; the second gate metal layer may include a third gate electrode 20, and the third gate electrode 20 is disposed on a positive projection of the substrate 10 The shadow overlaps with the positive projection of the second gate electrode 17 on the substrate 10 to form a capacitor; an interlayer dielectric layer 21 arranged on the side of the third gate electrode 20 away from the substrate 10 and covering the third gate electrode 20, and a first source-drain electrode layer arranged on the side of the interlayer dielectric layer 21 away from the substrate 10; the first source-drain electrode layer may include a source electrode 22 and a drain electrode 23, a first flat layer 24 arranged on the side of the first source-drain electrode layer away from the substrate 10 and covering the source electrode 22 and the drain electrode 23, and a second source-drain electrode layer arranged on the side of the first flat layer 24 away from the substrate 10; the second source-drain electrode layer may include a connecting electrode 25, a second flat layer 26 arranged on the side of the second source-drain electrode layer away from the substrate 10 and covering the connecting electrode 25, an anode 27 arranged on the side of the second flat layer 26 away from the substrate 10, a pixel definition layer 28 arranged on the side of the anode 27 away from the substrate 10, a pixel opening exposing the anode 27 is arranged in the pixel definition layer 28, and a light-emitting layer ( Figure 1 ), a cathode ( Figure 1 ), an encapsulation layer ( Figure 1 ), a support layer 29 disposed on the side of the pixel definition layer 28 away from the substrate 10, and a cover plate disposed on the side of the support layer 29 away from the substrate 10. Among them, a first via hole is provided in the interlayer dielectric layer 21, the first via hole extends to the active layer 14, and the drain electrode 23 is connected to the active layer 14 through the first via hole; a second via hole is provided in the first flat layer 24, the second via hole extends to the drain electrode 23, and the connecting electrode 25 is connected to the drain electrode 23 through the second via hole; a third via hole is provided in the second flat layer 26, the third via hole extends to the connecting electrode 25, and the anode 27 is connected to the connecting electrode 25 through the third via hole.

[0040] The principle of fingerprint recognition by the display substrate of this embodiment is as follows: when performing fingerprint recognition, the user's finger will press on the cover plate, and the light emitted by the light-emitting layer will irradiate the cover plate. Since the valley of the finger is not actually in contact with the cover plate, the critical angles for total reflection of the light at the valley and ridge of the fingerprint are different, and the light intensity received by the photosensitive device 18 is different, thereby generating electrical signals of different intensities, so that the valley and ridge of the fingerprint can be determined and a fingerprint pattern can be generated.

[0041] In the display substrate of this embodiment, the active layer 14, the first gate electrode 16, the second gate electrode 17, the source electrode 22 and the drain electrode 23 constitute a thin film transistor, which is electrically connected to the anode 27. The thin film transistor can form a driving circuit of the display substrate of this embodiment.

[0042] In an exemplary embodiment, the thin film transistor may be a top gate structure, but is not limited thereto. In some embodiments, the thin film transistor may be a bottom gate structure.

[0043] In the display substrate of this embodiment, the anode 27, the light-emitting layer, the cathode and the encapsulation layer form a light-emitting device of the display substrate.

[0044] In an exemplary embodiment, the substrate 10 may be a flexible substrate, and the material of the flexible substrate may be polyimide (PI), polyethylene terephthalate (PET), or a surface-treated polymer soft film.

[0045] In an exemplary embodiment, the first buffer layer 11 and the second buffer layer 13 may both be made of silicon nitride SiNx or silicon oxide SiOx, and may be a single layer or a multi-layer structure of silicon nitride / silicon oxide.

[0046] In an exemplary embodiment, the light-shielding layer 12 is located on the side of the active layer 14 close to the substrate 10 , and at least part of the orthographic projection of the light-shielding layer 12 on the substrate 10 overlaps with the orthographic projection of the active layer 14 on the substrate 10 , and the light-shielding layer 12 shields the active layer 14 from external light or internal light.

[0047] In an exemplary embodiment, the active layer 14 includes a semiconductor. For example, the semiconductor may include polycrystalline silicon, single crystal silicon, amorphous silicon, or a non-silicon-based material such as an oxide semiconductor.

[0048] In an exemplary embodiment, the first gate insulating layer 15, the second gate insulating layer 19 and the interlayer dielectric layer 21 may all be made of inorganic insulating materials, such as any one or more of silicon oxide (SiOx), silicon nitride (SiNx) and silicon oxynitride (SiON), which may be a single layer, multiple layers or a composite layer.

[0049] In an exemplary embodiment, the first gate metal layer, the second gate metal layer, the first source-drain electrode layer and the second source-drain electrode layer can all be made of metal materials, such as any one or more of copper (Cu), aluminum (Al), titanium (Ti), molybdenum (Mo), chromium (Cr) and tungsten (W), or alloy materials of the above metals, such as aluminum-neodymium alloy (AlNd) or molybdenum-niobium alloy (MoNb), and can be a single-layer structure or a multi-layer composite structure, such as MoNb / Cu / MoNb, etc.

[0050] In an exemplary embodiment, both the first planarization layer 24 and the second planarization layer 26 may be made of an organic insulating material, such as resin.

[0051] The display substrate of this embodiment also includes a shading structure 30, which is located on the peripheral side of the photosensitive device 18. The shading structure 30 is at least configured to block the light emitted by the light-emitting device toward the photosensitive device 18, so as to prevent the photosensitive device 18 from receiving the light directly emitted by the light-emitting device and the external ambient light, especially the lateral light of the light-emitting device and the reflected light of the light-emitting device, thereby reducing the noise light, improving the signal-to-noise ratio of the photosensitive device 18, and further improving the intensity of the light reflected from the finger, which is more conducive to fingerprint recognition.

[0052] In an exemplary embodiment, the orthographic projection of the shading structure 30 on the substrate 10 does not overlap with the orthographic projection of the photosensitive device 18 on the substrate 10 , thereby preventing the finger reflected light from being blocked by the shading structure 30 and affecting the photosensitive device 18 from receiving the finger reflected light.

[0053] In an exemplary embodiment, the light shielding structure 30 has a ring-shaped cross section in a direction parallel to the substrate 10 , and is disposed around the photosensitive device 18 to ensure that the light shielding structure 30 can completely shield the light emitted by the light-emitting devices around the photosensitive device 18 .

[0054] In an exemplary embodiment, in a direction perpendicular to the substrate 10, a cross-section of a surface of the light shading structure 30 on a side away from the photosensitive device 18 is gathered along the direction away from the substrate 10, so that a certain inclination angle is formed between the surface of the light shading structure 30 on a side away from the photosensitive device 18 and the surface of the substrate 10, thereby improving the light blocking effect of the light shading structure 30.

[0055] In an exemplary embodiment, a first groove is provided in the second gate insulating layer 19, and the first groove is located at the peripheral side of the photosensitive device 18. In an exemplary embodiment, the first groove is provided around the photosensitive device 18. The first groove includes a first side wall 31a and a second side wall 31b opposite to each other, the first side wall 31a is located on a side of the second side wall 31b close to the photosensitive device 18, and a light shielding structure 30 is provided on a surface of the first side wall 31a away from the photosensitive device 18.

[0056] In an exemplary embodiment, the shading structure 30 can be made of metal materials, such as any one or more of copper (Cu), aluminum (Al), titanium (Ti), molybdenum (Mo), chromium (Cr) and tungsten (W), or alloy materials of the above metals, such as aluminum-neodymium alloy (AlNd) or molybdenum-niobium alloy (MoNb). It can be a single-layer structure, or a multi-layer composite structure, such as MoNb / Cu / MoNb, etc.

[0057] In an exemplary embodiment, the bottom of the first groove may extend to the surface of the first gate insulating layer 15 away from the substrate 10, exposing the first gate insulating layer 15. The bottom of the light shielding structure 30 on the first sidewall 31a extends to the surface of the first gate insulating layer 15 away from the substrate 10, which can completely wrap the side of the photosensitive device 18, thereby improving the light shielding effect of the light shielding structure 30.

[0058] In some embodiments, the bottom of the first groove may be located in the second gate insulating layer, and the bottom of the light shielding structure 30 on the first side wall 31a extends into the second gate insulating layer; or, the bottom of the first groove may extend into the first gate insulating layer, and the bottom of the light shielding structure 30 on the first side wall 31a extends into the first gate insulating layer; or, the bottom of the first groove may extend to the second buffer layer 13, and the bottom of the light shielding structure 30 on the first side wall 31a extends into the second buffer layer 13. This disclosure will not be repeated here.

[0059] The display substrate of the embodiment of the present disclosure can be prepared by using the metal film layer of the backplane (BP) process section to prepare the light shielding structure pattern. In an exemplary embodiment, the light shielding structure 30 of the embodiment of the present disclosure and the first source and drain electrode layer are prepared by the same material and the same preparation process. That is, the light shielding structure 30 and the source electrode 22 and the drain electrode 23 are prepared by the same material and the same preparation process. The preparation process of the display substrate is simplified and the production cost is reduced.

[0060] In an exemplary embodiment, a second groove is provided in the interlayer dielectric layer 21, the second groove is connected to the first groove, and at least a portion of the orthographic projection of the second groove on the substrate overlaps with the orthographic projection of the first groove on the substrate. The second groove includes a third side wall 32a and a fourth side wall 32b, the third side wall 32a is located on the side of the fourth side wall 32b close to the photosensitive device 18, and a light shielding structure 30 is provided on the surface of the third side wall 32a away from the photosensitive device 18.

[0061] In an exemplary embodiment, the third side wall 32a is connected to the first side wall 31a, and the light shielding structure 30 on the third side wall 32a and the light shielding structure 30 on the first side wall 31a can be integrally formed using the same material. The first groove and the second groove can be made using the same etching process.

[0062] In an exemplary embodiment, the display substrate of the disclosed embodiment further includes a light-gathering structure, which is located on the side of the photosensitive device 18 away from the substrate 10, and at least part of the orthographic projection of the light-gathering structure on the substrate 10 overlaps with the orthographic projection of the photosensitive device 18 on the substrate 10. The light-gathering structure is configured to gather light incident from the side of the light-gathering structure away from the substrate 10, and at least part of the gathered light is directed toward the photosensitive device 18. The light emitted by the light-emitting device enters the light-gathering structure after being reflected by the finger, and the light-gathering structure gathers the light and then enters the photosensitive device 19. The display substrate of the disclosed embodiment gathers light using the light-gathering structure, which can enhance the intensity of light incident on the photosensitive device 19, improve the sensitivity of fingerprint detection, and improve the contrast of fingerprint images.

[0063] In an exemplary embodiment, the light-concentrating structure includes a first material layer 33a and a second material layer 33b, wherein the first material layer 33a is located on the side of the second material layer 33b close to the substrate 10, the refractive index of the first material layer 33a is greater than the refractive index of the second material layer 33b, and a concave-convex structure 34 is provided on the surface of the first material layer 33a away from the substrate 10, and at least part of the orthographic projection of the concave-convex structure 34 on the substrate 10 overlaps with the orthographic projection of the photosensitive device 18 on the substrate 10. The concave-convex structure 34 has a convex lens function to enable the light-concentrating structure to gather the large-angle light reflected by the finger. The interface between the concave-convex structure 34 and the second material layer 33b is configured to gather the light incident from the side of the concave-convex structure 34 away from the substrate 10, and at least part of the gathered light is directed toward the photosensitive device 18.

[0064] In an exemplary embodiment, the first material layer 33a and the first flat layer 24 can be integrally formed with the same material, that is, the first material layer 33a and the first flat layer 24 can be made of the same material through the same preparation process, thereby simplifying the preparation process and reducing production costs.

[0065] In an exemplary embodiment, the second material layer 33b and the second flat layer 26 can be integrally formed with the same material, that is, the second material layer 33b and the second flat layer 26 can be made of the same material through the same preparation process, thereby simplifying the preparation process and reducing production costs.

[0066] The embodiment of the present invention further provides a display device, comprising any of the above-mentioned display substrates. The display device includes a mobile phone, a tablet computer, a smart wearable product (such as a smart watch, a bracelet, etc.), a personal digital assistant (PDA), a car computer, etc. The embodiment of the present application does not impose any special restrictions on the specific form of the above-mentioned foldable display device.

[0067] The following is an exemplary description of the preparation process of the light-shielding structure. The "patterning process" mentioned in the present disclosure includes processes such as coating photoresist, mask exposure, development, etching, and stripping photoresist for metal materials, inorganic materials, or transparent conductive materials, and includes processes such as coating organic materials, mask exposure, and development for organic materials. Deposition can be any one or more of sputtering, evaporation, and chemical vapor deposition, coating can be any one or more of spraying, spin coating, and inkjet printing, and etching can be any one or more of dry etching and wet etching, which are not limited in the present disclosure. "Thin film" refers to a layer of thin film made of a certain material on a substrate by deposition, coating, or other processes. If the "thin film" does not require a patterning process during the entire production process, the "thin film" can also be called a "layer". If the "thin film" requires a patterning process during the entire production process, it is called a "thin film" before the patterning process and a "layer" after the patterning process. The "layer" after the patterning process contains at least one "pattern". The "A and B are arranged in the same layer" mentioned in the present disclosure means that A and B are formed simultaneously through the same patterning process, and the "thickness" of the film layer is the size of the film layer in the direction perpendicular to the driving backplane. In the exemplary embodiments of the present disclosure, "the orthographic projection of A includes the orthographic projection of B" means that the boundary of the orthographic projection of B falls within the boundary range of the orthographic projection of A, or the boundary of the orthographic projection of A overlaps with the boundary of the orthographic projection of B.

[0068] Figures 2 to 9 FIG. 1 is a schematic diagram of a process for preparing a light shielding structure in a display substrate. In an exemplary embodiment, the process for preparing a light shielding structure in a display substrate may include the following operations.

[0069] (1) Forming a first groove and a second groove pattern. In an exemplary embodiment, forming the first groove and the second groove pattern includes: sequentially forming a first buffer layer 11 on a substrate 10, forming a light shielding layer 12 on a side of the first buffer layer 11 away from the substrate 10, forming a second buffer layer 13 on a side of the light shielding layer 12 away from the substrate 10, forming an active layer 14 on a side of the second buffer layer 13 away from the substrate 10, forming a first gate insulating layer 15 on a side of the active layer 14 away from the substrate 10, and forming a first gate metal layer on a side of the first gate insulating layer 15 away from the substrate 10; the first gate metal layer may include a first gate electrode 16, a second gate electrode 17 and a photosensitive device 18; forming a second gate metal layer on a side of the first gate metal layer away from the substrate 10 A second gate insulating layer 19 is formed on the side of the second gate insulating layer 19 away from the substrate 10; the second gate metal layer may include a third gate electrode 20, and the orthographic projection of the third gate electrode 20 on the substrate 10 overlaps with the orthographic projection of the second gate electrode 17 on the substrate 10 to form a capacitor; an interlayer dielectric layer 21 is formed on the side of the third gate electrode 20 away from the substrate 10; through the same etching process, a second groove is formed in the interlayer dielectric layer 21, and a first groove is formed in the second gate insulating layer 19, and the second groove is connected to the first groove, and the bottom of the first groove can extend to the surface of the first gate insulating layer 15 away from the substrate 10, exposing the first gate insulating layer 15. The first groove and the second groove are both arranged around the photosensitive device 18. The first groove includes a first side wall 31a and a second side wall 31b, and the first side wall 31a is located on the side of the second side wall 31b close to the photosensitive device 18. The second groove includes a third side wall 32a and a fourth side wall 32b. The third side wall 32a is located on the side of the fourth side wall 32b close to the photosensitive device 18. The first side wall 31a is connected to the third side wall 32a. Figure 2 and Figure 3 As shown. Among them, Figure 3 for Figure 2 Top view at point a in the middle.

[0070] (2) Forming a light-shielding structure pattern. In an exemplary embodiment, forming a light-shielding structure pattern includes: depositing a metal film on a side of an interlayer dielectric layer 21 away from the substrate 10 on which the aforementioned pattern is formed, patterning the metal film through a patterning process, and forming a first source-drain electrode layer on the interlayer dielectric layer 21; the first source-drain electrode layer may include a source electrode 22, a drain electrode 23, and a light-shielding structure 30, the light-shielding structure 30 is disposed on a surface of a side of a first side wall 31a of the first groove away from the photosensitive device 18, and the light-shielding structure 30 is disposed on a surface of a side of a third side wall 32a of the second groove away from the photosensitive device 18, and the light-shielding structure 30 on the third side wall 32a and the light-shielding structure 30 on the first side wall 31a may be integrally formed using the same material, such as Figure 4 and Figure 5 As shown. Among them, Figure 5 for Figure 4 Top view at point a in the middle.

[0071] (3) Forming a first planar layer pattern. In an exemplary embodiment, forming the first planar layer pattern includes: depositing a first material film covering the first source-drain electrode layer on the side of the interlayer dielectric layer 21 away from the substrate 10 on the substrate 10 on which the aforementioned pattern is formed, patterning the first material film through a patterning process to form a first planar layer 24 and a first material layer 33a, wherein at least a portion of the first material layer 33a has an orthographic projection on the substrate 10 that overlaps with the orthographic projection of the photosensitive device 18 on the substrate 10; and then forming a concave-convex structure 34 on the surface of the first material layer 33a on the side away from the substrate 10, such as Figure 6 and Figure 7 As shown. Among them, Figure 7 for Figure 6 Top view at point a in the middle.

[0072] (4) Forming a light-concentrating structure pattern. In an exemplary embodiment, forming a light-concentrating structure pattern includes: depositing a second material film on the side of the first flat layer 24 and the first material layer 33a away from the substrate 10 on the substrate 10 on which the aforementioned pattern is formed, patterning the second material film through a patterning process to form a second flat layer 26 and a second material layer 33b, wherein at least a portion of the orthographic projection of the second material layer 33b on the substrate 10 overlaps with the orthographic projection of the photosensitive device 18 on the substrate 10 and the orthographic projection of the first material layer 33a on the substrate 10; and the refractive index of the first material layer 33a is greater than the refractive index of the second material layer 33b, such as Figure 8 and Fig. 9 As shown. Among them, Figure 8 for Fig. 9 Top view at point a in the middle.

[0073] In an exemplary embodiment, the first material layer 33a forms a light-collecting structure at the portion where the orthographic projection of the substrate 10 and the orthographic projection of the second material layer 33b overlap on the substrate 10. The concave-convex structure 34 of the first material layer 33a has a convex lens function, so that the light-collecting structure gathers the light reflected from the finger at a large angle. The interface between the concave-convex structure 34 and the second material layer 33b is configured to gather the light incident from the side of the concave-convex structure 34 away from the substrate 10, and the gathered light is at least partially directed toward the photosensitive device 18.

[0074] The drawings in this disclosure only relate to the structures involved in this disclosure, and other structures can refer to the general design. In the absence of conflict, the embodiments of this disclosure, that is, the features in the embodiments, can be combined with each other to obtain new embodiments.

[0075] Those skilled in the art should understand that the technical solutions of the present disclosure may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present disclosure, and all should be included in the scope of the claims of the present disclosure.

Claims

1. A display substrate, characterized in that: It includes a substrate, a light-emitting device, a photosensor and a shading structure arranged on the substrate, a first groove is arranged on the peripheral side of the photosensitive device, the first groove includes a first side wall and a second side wall, the first side wall is located on the side of the second side wall close to the photosensitive device, the shading structure is arranged on the first side wall, and the shading structure is at least configured to block the light emitted by the light-emitting device toward the photosensitive device.

2. The display substrate according to claim 1, characterized in that: The orthographic projection of the light shielding structure on the substrate does not overlap with the orthographic projection of the photosensitive device on the substrate.

3. The display substrate according to claim 1, characterized in that: The light shielding structure is arranged around the four sides of the photosensitive device.

4. The display substrate according to claim 1, characterized in that: In a direction perpendicular to the substrate, a cross section of a surface of the light-shielding structure on one side away from the photosensitive device is in a convergent shape along the direction away from the substrate.

5. The display substrate according to claim 1, characterized in that: It also includes an active layer arranged on the substrate, a first gate insulating layer arranged on a side of the active layer away from the substrate, and a first gate metal layer arranged on a side of the first gate insulating layer away from the substrate, wherein the first gate metal layer includes the photosensitive device.

6. The display substrate according to claim 5, characterized in that: The invention also includes a second gate insulating layer which is arranged on a side of the first gate metal layer away from the substrate, and the first groove is arranged in the second gate insulating layer.

7. The display substrate according to claim 6, characterized in that: The bottom of the first groove extends to a surface of the first gate insulating layer away from the substrate.

8. The display substrate according to claim 6, characterized in that: It also includes an interlayer dielectric layer arranged on the side of the second gate insulation layer away from the substrate, a second groove is arranged in the interlayer dielectric layer, the second groove is connected to the first groove, the second groove includes a third side wall and a fourth side wall, the third side wall is located on the side of the fourth side wall close to the photosensitive device, and the shading structure is arranged on the surface of the third side wall away from the photosensitive device.

9. The display substrate according to claim 8, characterized in that: The third side wall is connected to the first side wall, and the light-shielding structure on the third side wall and the light-shielding structure on the first side wall are integrally formed by using the same material.

10. The display substrate according to claim 6, characterized in that: It also includes an interlayer dielectric layer arranged on a side of the second gate insulating layer away from the substrate and a source-drain electrode layer arranged on a side of the interlayer dielectric layer away from the substrate. The light shielding structure and the source-drain electrode layer are made of the same material.

11. The display substrate according to claim 5, characterized in that: It also includes a light shielding layer arranged on the substrate, the light shielding layer is located on the side of the active layer close to the substrate, and at least part of the orthographic projection of the light shielding layer on the substrate overlaps with the orthographic projection of the active layer on the substrate.

12. The display substrate according to any one of claims 1 to 11, characterized in that: It also includes a focusing structure, which is located on the side of the photosensitive device away from the substrate, and at least part of the orthographic projection of the focusing structure on the substrate overlaps with the orthographic projection of the photosensitive device on the substrate. The focusing structure is configured to gather light incident from the side of the focusing structure away from the substrate, and the gathered light is at least partially directed toward the photosensitive device.

13. The display substrate according to claim 12, characterized in that: The focusing structure includes a first material layer and a second material layer, the first material layer is located on the side of the second material layer close to the substrate, the refractive index of the first material layer is greater than the refractive index of the second material layer, and a concave-convex structure is provided on the surface of the first material layer away from the substrate, and the interface between the concave-convex structure and the second material layer is configured to gather light incident from the side of the concave-convex structure away from the substrate, and the gathered light is at least partially directed toward the photosensitive device.

14. The display substrate according to claim 13, characterized in that: It also includes a first flat layer and a second flat layer located on the side of the photosensitive device away from the substrate, the first flat layer is located on the side of the second flat layer close to the substrate, the first flat layer and the first material layer are integrally formed using the same material, and the second flat layer and the second material layer are integrally formed using the same material.

15. A display device, characterized in that: The display substrate comprises any one of claims 1 to 14.

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