Nozzle device

Abstract

An apparatus includes a tube, a body having a first body wall and a second body wall, and a support structure having a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction different from the first direction, a first portion of the tube passes through an opening in the second body wall, the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive a molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.

Description

[0001] Cross-references to related applications

[0002] This application claims priority to U.S. Application No. 62 / 897,082 entitled “NOZZLE APPARATUS”, filed September 6, 2019, and U.S. Application No. 62 / 988,579 entitled “NOZZLE APPARATUS”, filed March 12, 2020, both of which are incorporated herein by reference in their entirety. Technical Field

[0003] This disclosure relates to a nozzle device. The nozzle device can be used to generate a target in an extreme ultraviolet (EUV) light source. Background Technology

[0004] Nozzle devices can be used to generate fluid material flows or jets. For example, nozzle devices can be used to produce targets that are converted into plasma that emits extreme ultraviolet (EUV) light.

[0005] For example, EUV light can be electromagnetic radiation with wavelengths below 100 nanometers (nm) (sometimes also called soft X-rays), and includes light with wavelengths, for example, below 20 nm, between 5 and 20 nm, or between 13 and 14 nm. EUV light can be used in photolithography processes to create minute features in a substrate (e.g., a silicon wafer) by initiating polymerization in a resist layer. Methods for generating EUV light include, but are not limited to, converting a material containing elements whose emission lines are in the EUV range (e.g., xenon, lithium, or tin) into a plasma state. In one such method, commonly known as laser-generated plasma (LPP), the desired plasma can be generated by irradiating a target material with an amplified beam, which may be called a driving laser. The target material may be in the form of material droplets, plates, strips, streams, or clusters. For this process, the plasma is typically generated in a sealed container (e.g., a vacuum chamber) and monitored using various types of metrology equipment. Summary of the Invention

[0006] In one aspect, an apparatus includes: a tube having an internal width and an opening at an end, the internal width being between 0.1 mm and 0.8 mm, and the opening having a width between 1.0 μm and 5.0 μm; an electromechanical actuator in contact with the tube and configured to transmit mechanical motion to the tube, the mechanical motion including at least a first frequency component between 40 kHz and 100 kHz and a second frequency component with a frequency higher than the first frequency component; a body having a first body wall and a second body wall; and a support structure having a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction different from the first direction, a first portion of the tube passes through the opening in the second body wall, the first support portion is configured to be attached to the first body wall, and the second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. The interior of the tube and the interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.

[0007] The implementation may include one or more of the following features. The second support portion may include an end wall defining a support opening, and the second portion of the tube may be configured to pass through the support opening when the first support portion is attached to the first body wall. The support opening may include a chamfered opening, and in these implementations, the outer surface of the second portion of the tube is captured by the chamfered opening when the first support portion is attached to the first body wall. The second support portion may also include an adjustment mechanism configured to control the mechanical coupling between the tube and the second support portion. The first support portion may extend from a first end configured to be attached to the first body wall, and the first support portion may include a plurality of segments extending from the first end. The plurality of segments may include a rigid tip and at least one flexible tip. The adjustment mechanism may pass through the rigid tip, and the adjustment mechanism may be configured to position the second support portion thereby controlling the mechanical coupling between the tube and the second support portion. The opening may be located between each of the plurality of segments. The adjustment mechanism may be in physical contact with the first support portion and the end wall, and the adjustment mechanism may be configured to move the end wall to control the mechanical coupling between the tube and the second support. The end wall may include a first material, and the device may also include a collar of a second material surrounding the support opening, and the second material may be softer than the first material. The first material may include a metal, and the second material may include a polymer. The polymer may be a polyimide resin, polyetheretherketone, polybenzimidazole resin, or polytetrafluoroethylene. The first material may include a metal, and the second material may include an adhesive material. The adhesive material may be a bismaleimide resin or a cyanate-based resin.

[0008] The device may also include a potting compound, and in these implementations, when the first support portion is attached to the first body wall, the first support portion and the end wall define an internal support region containing the potting compound. In some implementations, the potting compound does not completely fill the internal support region. The potting compound may occupy a first portion of the internal support region closer to the body than the end wall, while a second portion of the internal support region closer to the end wall than the body has no potting compound. The potting compound may be an adhesive. The adhesive may be at least one of the following: a bismaleimide-based adhesive, a benzoxazine-based adhesive, a cyanate-based adhesive, a room temperature vulcanizing (RTV) adhesive, or a high-temperature epoxy adhesive. In some implementations, the tube passes through a support opening in the second support portion, and the tube does not make mechanical contact with the second support portion. In these implementations, the second support portion is configured to protect the potting material from the plasma emitted when the target material is in a plasma state.

[0009] The first support portion can be made of a rigid material. The first support portion can include metal. The first support portion can also include a flexible material.

[0010] The support structure can be located between the body and the electromechanical actuator.

[0011] In some implementations, the electromechanical actuator can be surrounded by the first support portion when the first support portion is attached to the first body wall.

[0012] The first support portion can be configured to be attached to the outside of the first body wall.

[0013] The second frequency component can be a harmonic of the first frequency component or a harmonic of another frequency applied to the tube by the electromechanical actuator.

[0014] The first support portion may include one or more openings that extend along one side of the first support portion between a first end and a second end of the first support portion.

[0015] In another aspect, an apparatus includes: a tube; a body having a first body wall and a second body wall; and a support structure having a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction different from the first direction, a first portion of the tube passes through an opening in the second body wall, the first support portion is configured to be attached to the first body wall, and when the first support portion is attached to the first body wall, a second portion of the tube passes through the second support portion.

[0016] On the other hand, an apparatus for an extreme ultraviolet light source includes: a tube having a sidewall extending from a first end to a second end; an actuator mechanically coupled to the outside of the sidewall; a body having a first body wall and a second body wall; and a fitting disposed at an end of the body, the fitting including a channel. A first portion of the sidewall is held in an opening in the second body wall, a second portion of the sidewall is disposed in the channel, the actuator is located between the fitting and the second end of the tube, and approximately half the length of the sidewall is surrounded by the body.

[0017] More than half the length of the sidewalls can be surrounded by the body.

[0018] On the other hand, an apparatus for an extreme ultraviolet light source includes: a tube having a sidewall extending from a first end to a second end; an actuator mechanically coupled to the outside of the sidewall; a body having a first body wall and a second body wall; and a fitting disposed at an end of the body, the fitting including a channel and a collar, wherein a portion of the sidewall is in the channel and the collar is located between the portion of the sidewall and the fitting.

[0019] The implementation may include one or more of the following features. The device may also include a metal wire having a thin layer of polymer material attached to the fitting and surrounding the exterior of the sidewall, and the wire may be configured to reduce tube vibration. The polymer material layer may be formed as a coating on the metal wire. The device may also include a support structure comprising a first support portion and a second support portion, the first support portion being configured to attach to a first body wall, and the tube passing through the second support portion when the first support portion is attached to the first body wall. The second support portion may be configured to protect the polymer layer from the plasma in the EUV light source. In some implementations, the second support portion does not mechanically contact the tube.

[0020] The ring can extend beyond the accessory.

[0021] In another aspect, a support structure for a target material supply system includes: a first support portion; and a second support portion. The first support portion is configured to be attached to a first body wall of the target material supply system, and when the first support portion is attached to the first body wall, a tube of the target material supply system passes through the second support portion.

[0022] The target material supply system can be configured as a vacuum chamber coupled to an extreme ultraviolet light source.

[0023] Implementations of any of the above-described technologies may include EUV light sources, systems, methods, processes, devices, or apparatuses. Details of one or more implementations are set forth in the accompanying drawings and the following description. Other features will become apparent from the description and drawings, as well as from the claims. Attached Figure Description

[0024] Figure 1 This is a block diagram illustrating the implementation of an extreme ultraviolet (EUV) light source.

[0025] Figure 2A This is a side view cross-sectional diagram of the target forming device.

[0026] Figure 2B yes Figure 2A A top-view cross-sectional view of the target forming device.

[0027] Figures 3A to 3D , Figure 4 , Figure 5 , Figure 6A , Figure 6B , Figure 6C , Figure 7A , Figure 7B , Figures 8 to 12 , Figure 13A , Figure 13B and Figure 15 Various implementations and / or components of the nozzle assembly are shown.

[0028] Figure 14 This is a block diagram of another EUV light source. Detailed Implementation

[0029] refer to Figure 1 The diagram illustrates a block diagram of an EUV light source 100, including a supply system 110. The supply system 110 emits a target stream 121, such that a target 121p is delivered to a plasma formation position 123 within a vacuum chamber 109. The target 121p comprises a target material, i.e., any material that emits EUV light when in a plasma state. For example, the target material may include water, tin, lithium, and / or xenon. The plasma formation position 123 receives a beam 106. The beam 106 is generated by the light source 105 and delivered to the vacuum chamber 109 via an optical path 107. The interaction between the beam 106 and the target material in the target 121p generates a plasma 196 that emits EUV light.

[0030] The supply system 110 includes a capillary 114 fluidly coupled to a reservoir 112. The capillary 114 is held by a nozzle arrangement 140. The capillary 114 defines an orifice 119 through which material flows to form a target flow 121. The nozzle arrangement 140 is configured to reduce, mitigate, or prevent unintentional vibrations of the capillary 114. Unintentional vibrations can cause directional instabilities in the target flow 121, causing the target to deviate from its intended direction. This instability results in the target not being guided to its intended location for further processing. In situations such as... Figure 1In examples of EUV light sources such as light source 100, pointing instability may cause the target 121p to travel to a position different from the optimal plasma formation position 123, resulting in reduced or no plasma generation, and consequently, reduced or no EUV light generation. Therefore, it is desirable to reduce or eliminate unintentional vibrations of capillary 114.

[0031] Figures 3A to 3D , Figure 4 , Figure 5 , Figure 6A , Figure 6B , Figure 6C , Figure 7A , Figure 7B , Figures 8 to 12 , Figure 13A , Figure 13B and Figure 15 Various implementations of nozzle device 140 and / or components thereof are shown. Before discussing the various implementations of nozzle device 140, an overview of EUV light source 100 and supply system 110 is provided. EUV light source 100 is an example of a system in which nozzle device 140 can be used. However, nozzle device 140 and any of its various implementations can be used in systems other than EUV light sources.

[0032] exist Figure 1 In the example, capillary 114 is mechanically coupled to actuator 193, which is connected to control system 190 via control link 192. Control system 190 may include a function generator, an electronic processor (not shown), and an electronic storage device (not shown) to perform the functions of control system 190. Control link 192 is any type of connection capable of transmitting electronic signals from control system 190 to actuator 193. For example, control link 192 may be a wired and / or wireless connection configured to transmit electronic signals and commands from control system 190 to actuator 193.

[0033] The control system 190 generates a signal that, when applied to the actuator 193 or an element associated with the actuator 193, causes the actuator 193 to move. For example, the actuator 193 may be a piezoelectric ceramic material that changes shape based on an applied voltage. The magnitude and / or polarity of the voltage applied to the actuator 193 is based on the signal from the control system 190. Due to the mechanical coupling between the capillary 114 and the actuator 193, the capillary 114 experiences corresponding motion or vibration when the actuator 193 moves or vibrates. The vibration transmitted by the actuator 193 is typically intentional. More specifically, radial contraction of the actuator causes local contraction of the capillary, and expansion of the actuator causes local expansion of the capillary. This expansion and contraction results in the generation of acoustic waves in the target material located inside the capillary at the frequency of the applied electrical signal.

[0034] The reservoir 112 contains target material under pressure P. The target material is in a molten state and is flowable, and the pressure in the vacuum chamber 109 is lower than pressure P. The molten state may include molten metallic target material. Therefore, the target material flows through the capillary 114 and is emitted into the chamber 109 through the orifice 119. The target material exits the orifice 119 as a target material jet or continuous flow 124. The target material jet breaks down into individual droplets. The breakdown of the jet 124 can be controlled such that by vibrating the capillary 114 and generating acoustic waves within the capillary 114, the individual droplets coalesce into larger droplets that reach the plasma formation location 123 at a desired rate.

[0035] For example, control system 190 can provide signals having at least a first frequency and a second frequency via control link 192, thereby driving actuator 193 to vibrate at the first frequency and the second frequency. The first frequency can be in the megahertz (MHz) range. Vibrating capillary 114 at the first frequency causes jet 124 to break down into relatively small droplets with desired size and velocity. The second frequency is lower than the first frequency. For example, the second frequency can be in the kilohertz (kHz) range. The second frequency is used to regulate the velocity of the droplets in the flow and promote target coalescence. Driving capillary 114 at the second frequency results in the formation of droplet groups. In any given droplet group, the individual droplets travel at different velocities. Droplets with higher velocities can coalesce with droplets with lower velocities to form larger coalesced droplets, which constitute the target stream 121 of the EUV source. These larger droplets are separated from each other by a greater distance compared to uncoalesced droplets. This greater separation helps to mitigate the influence of plasma formed by one target on the trajectory of subsequent targets in the droplet stream. The target in target flow 121 can be approximately spherical with a diameter of about 30 μm.

[0036] By causing the capillary 114 to vibrate in this manner, the final target can be generated at a frequency, for example, between 40 and 300 kHz, and can travel toward the plasma formation location 123 at a speed, for example, between 40 and 120 m / s or up to 500 m / s. The spatial spacing between two adjacent targets in the target stream 121 can be, for example, between 1 and 3 millimeters (mm). 50 to 300 initial droplets (also called Rayleigh droplets) can coalesce to form a single larger target.

[0037] Therefore, capillary 114 is intentionally moved or vibrated, and this intentional movement or vibration is controlled to promote the coalescence of target material and control the rate of target production. Intentional vibration and / or environmental influences may cause other unintentional cantilever vibrations of capillary 114. Nozzle assembly 140 reduces or eliminates unintentional vibrations while allowing intentional vibrations. Before discussing an example of nozzle assembly 140 in more detail, examples of capillary 114 and actuator 193 are discussed.

[0038] Figure 2A This is a side view cross-sectional view of the target forming device 216 in the XZ plane. Figure 2B It is along Figure 2A A top-view cross-sectional view of the target forming device 216 in the YZ plane, taken by line 2B'-2B'.

[0039] The target forming device 216 can be used in EUV light source 100 ( Figure 1 The target forming apparatus 216 includes a capillary 214 mechanically coupled to the actuator 293 via an adhesive 234 (shown as cross-hatched shading). For example, the adhesive 234 may be an epoxy resin, a benzoxazine resin, a benzoxazine-containing resin, a bismaleimide resin, a cyanate ester resin, or a cyanate ester-containing resin. Although... Figure 2A and Figure 2B Examples include adhesive 234, but actuator 293 and capillary 214 can be coupled by direct contact (e.g., interference fit or by using fasteners) without the use of adhesive.

[0040] The capillary 214 includes a sidewall 230 extending along the X direction from a first end 231 to a second end 232. The sidewall 230 is a generally cylindrical three-dimensional object. The sidewall 230 includes an inner surface 233 and an outer surface 239. The inner surface 233 defines an internal region 238. Figure 2B The internal region 238 is in fluid communication with the nozzle 235 at its first end 231. The nozzle 235 narrows along the -X direction to define an orifice 219. In operational use, the internal region 238 is fluidly coupled to a reservoir of target material (such as...). Figure 1 The reservoir 112), and the molten target material flows in the inner region 238 of the capillary 214 and passes through the orifice 219 in the -X direction.

[0041] exist Figure 2A and Figure 2B In the example, actuator 293 is a cylindrical body having an outer actuator surface 295 and an inner actuator surface 236. The inner actuator surface 236 defines an open central region extending along the X direction. The inner actuator surface 236 completely surrounds a portion 237 of the outer surface 239. Figure 2A Part 237 includes any portion of the outer surface 239 surrounded by actuator 293. Part 237 may extend from the first end 231 to the second end 232, or part 237 may extend along the X direction over a length less than the sidewall 230. Figure 2A In the example, portion 237 extends along its entire length in the X direction, less than the sidewall 230. Actuator 293 is mechanically coupled to portion 237 via adhesive 234.

[0042] Actuator 293 is made of any material capable of causing movement of sidewall 230. Actuator 293 can be an electromechanical actuator. For example, actuator 293 can be a piezoelectric ceramic material, such as lead zirconate titanate (PZT), which changes shape in response to the application of voltage. By changing shape, PZT also causes movement of capillary 214. Actuator 293 causes symmetrical displacement of the wall of capillary 214 through periodic radial contraction and expansion.

[0043] Figures 3A to 3D Nozzle device 340 is shown. Nozzle device 340 is nozzle device 140 ( Figure 1 One implementation of ). Figure 3A This is a side cross-sectional view of the nozzle assembly 340 in the XZ plane. The nozzle assembly 340 includes a body 350 and a support structure 360.

[0044] The body 350 includes a first body wall 352 and a second body wall 354 connected to the first body wall 352. The first body wall 352 extends in the X direction. The second body wall 354 extends in the Y direction. The support structure 360 ​​includes a first support portion 362 and a second support portion 364 connected to the first support portion 362. The first support portion 362 extends from end 367 to end 368 in the X direction. The second body wall 354 defines an opening 355. The second support portion 364 defines an opening 365. The nozzle device 340, the body 350, and the support structure 360 ​​are three-dimensional structures. Figures 3A to 3D In the example, the first body wall 352 and the first support portion 362 are typically cylindrical structures. The second body wall 354 and the second support portion 364 are disc-shaped objects defining corresponding openings 355 and 365.

[0045] Body 350 defines interior 351, which can be fluidly connected to a storage device (e.g., Figure 1The reservoir 112) allows the interior 351 to receive fluid (such as target material) from the reservoir through an end opposite to the end 357. A second body wall 354 supports and provides a seal around the exterior of the capillary 314. This seal is a high-pressure seal that connects the capillary 314 to the second body wall 354 and allows a high-pressure environment to be maintained within the interior 351 of the body 350. For example, the seal may be a compression seal comprising an expandable and compressible material (such as a polymer), and / or the seal may be formed by an adhesive. The nozzle assembly 340 also includes a fitting 494 attached to the end 357 of the first body wall 352. The fitting 494 may be a compression fitting. The fitting 494 may be attached to the end 357 by, for example, an adhesive or by an interference fit. In some implementations, the fitting 494 includes threads and is attached to a corresponding threaded interface of the end 357. The fitting 494 includes a channel 389 extending through the fitting 494. When the nozzle assembly 340 is in an assembled form (such as...), Figure 3A (As shown), capillary 314 passes through channel 389 and openings 355, 365. Second support portion 364 holds capillary 314 near end 331. Figure 3A The nozzle assembly 340 is shown in an assembled state. Figure 3C This is a side view of the body 350 in its unassembled state. Figure 3D This is a side view of the support structure 360 ​​in its unassembled state. In the unassembled state, the main body 350 and the support structure 360 ​​are not attached to each other.

[0046] When the nozzle assembly 340 is assembled, the support structure 360 ​​is attached to the end 357 of the body 350. Specifically, a portion of the inner surface 363 located at the end 368 of the first support portion 362 is attached to the outer surface 356 of the first body wall 352. The first body wall 352 and the first support portion 362 can be attached to each other in, for example, by an interference fit between the inner surface 363 and the outer surface 356; an adhesive that bonds the outer surface 356 and the inner surface 363; a mechanical device such as a fastener; a threaded interface; or any other means that can hold the support structure 360 ​​to the body 350.

[0047] Additionally, when the nozzle assembly 340 is assembled, the capillary 314 passes through openings 355 and 365. The capillary 314 includes a sidewall extending generally along the X direction from end 331 to end 332. The sidewall 330 is typically cylindrical and has an inner diameter 387 and an outer diameter 388. The inner diameter 387 can be, for example, about 0.1 mm, about 0.3 mm, about 0.5 mm, or about 0.8 mm. The outer diameter 388 can be, for example, about 0.25 mm larger than the inner diameter 387. The inner diameter 387 and the outer diameter 388 can vary along the length of the tube 314 (along...). Figure 3AThe X-direction (in the tube) is largely uniform. The inner diameter 387 and outer diameter 388 of tube 314 can taper gradually toward the orifice 319 (e.g., as shown in the image). Figure 2A (As shown in the implementation). The orifice 319 can have a diameter of 1 to 5 micrometers (μm) in the YZ plane, for example, about 1 μm, about 3 μm, or about 5 μm. The capillary 314 includes the orifice 319 at an end 331. The orifice 319 allows target material to flow out of the capillary 314. The capillary 314 passes through an opening 365. Figure 3A In the example shown, the end 332 is relatively close to the opening 355, such that only a small fraction (e.g., less than about 10%) of the length of the capillary along the X-axis extends into the interior 351. In some implementations, the end 332 is flush with the opening 355.

[0048] Figure 3B A second support portion 364 in the YZ plane with capillary 314 is shown. An opening 365 may be off-center or displaced in the YZ plane relative to the center of the end 368. Off-centering of the opening 365 can help provide a more reliable mechanical contact between the capillary 314 and the second support portion 364.

[0049] The body 350 can be made of a rigid material. For example, the body 350 can be made of metal. The support structure 360 ​​can be made of a rigid material. For example, the first support portion 362 and the second support portion 364 can be made of solid metal or rigid polymer material. In some implementations, the first support portion 362 and / or the second support portion 364 are made of a non-rigid or flexible material. A non-rigid or flexible material is a material that bends or buckles in response to an applied force without breaking and returns to its original shape and position after the force is removed.

[0050] The second support portion 364 holds and supports the capillary 314 near its end 331 within the opening 365. The capillary extends a distance 381 from the opening 355 to the opening 365 in the -X direction. Without the support structure 360, the capillary 314 would extend a distance 381 without any support other than that provided by the body 350. Without the support structure 360, the portion of the capillary 314 extending from the opening 355 in the -X direction acts as a cantilever beam with a length 381. In this configuration (without the support structure 360), the capillary 318 deflects in the YZ plane in response to an applied force or environmental vibration. The magnitude of the deflection increases with the distance 381. This deflection causes undesirable vibrations of the capillary 314 in the YZ plane, and these undesirable vibrations can be referred to as undesirable lateral vibrations.

[0051] On the other hand, by holding and supporting the capillary 314 near the end 331, the unsupported length of the capillary 314 is reduced. Therefore, the support structure 360 ​​reduces, mitigates, or prevents unintentional vibration of the capillary 314. Unintentional vibration can be a transverse vibration in the YZ plane caused by a moving object near the capillary 314. For example, unintentional vibration can originate from a moving object near the capillary 314 that is mechanically coupled to the capillary and thus transmits vibration. The moving object can include, for example, a vacuum pump, a fluid line, and / or a fan. Furthermore, vibration caused by the moving object can be combined with intentional vibration (such as that caused by an actuator coupled to the capillary 314, such as...). Figure 2A and Figure 2B The vibrations caused by the actuator 293 are combined and the intentional vibrations are emphasized in an unexpected way. In other words, unintentional vibrations may occur due to environmental factors and / or due to modifications of intentional vibrations. Finally, undesirable vibrations may be caused by energy transfer of intentional vibrations applied to the capillary 314 by the actuator via the nonlinear mechanical response of the system to undesirable lateral vibrations.

[0052] Figure 4 This is a side cross-sectional view of nozzle assembly 440 in the XZ plane. Nozzle assembly 440 is a derivative of nozzle assembly 140. Figure 1 Another implementation of ). Nozzle device 440 is similar to nozzle device 340 ( Figures 3A to 3D The difference is that the nozzle assembly 440 includes an actuator 493. Actuator 493 is similar to actuator 293 ( Figure 2A and Figure 2B Actuator 493 is located between accessory 494 and second support portion 364.

[0053] In operation, actuator 493 is controlled to intentionally vibrate capillary 314. For example, actuator 493 can be controlled to apply a sine wave, square wave, sawtooth wave, and / or any other time-varying wave to capillary 314 to cause it to vibrate. Actuator 493 can be controlled to vibrate capillary 314 based on a time-varying signal, which is a combination of one or more time-varying signals. For example, actuator 493 can be controlled to vibrate capillary 314 based on a pulse wave with a frequency of 50 kHz, or a sine wave with a frequency of 50 kHz, and a pulse wave (or square wave) with a frequency of 500 kHz. In the implementation where actuator 493 applies a sine wave to capillary 314, the fundamental frequency of the sine wave is, for example, 40 kHz to 100 kHz.

[0054] In the implementation where the actuator 493 applies a time-varying signal that is not a sinusoidal wave, the applied signal imparts vibration with multiple frequency components, including a fundamental frequency and harmonics of that fundamental frequency. The harmonics of the fundamental frequency appear at integer multiples of the fundamental frequency. For example, an applied pulse wave with a fundamental frequency of 100 kHz has harmonics at 200 kHz, 300 kHz, 400 kHz, etc. In the example provided above where tube 314 vibrates based on a combination of a 50 kHz sine wave and a 500 kHz pulse wave, the intentional vibration includes a 50 kHz fundamental frequency component and also includes frequency components at 500 kHz, 1 MHz, 1.5 MHz, etc.

[0055] In addition to these intentional vibrations, other unintentional vibrations may also occur due to environmental factors and / or unintentional vibrations of the actuator 493. Unintentional vibrations are reduced by keeping the capillary 314 near the end 331.

[0056] Figure 5 This is a side cross-sectional view of the nozzle assembly 540 in the XY plane. The nozzle assembly 540 includes a body 350 and a support structure 560. The support structure 560 can be made of a rigid material, such as a metal, a rigid polymer, or a ceramic material. The nozzle assembly 540 is similar to the nozzle assembly 440. Figure 4 The difference is that the support structure 560 includes a second support portion 564 with an opening 565, the opening 565 having a chamfered or beveled edge 565' extending at an angle from the inside 561 of the second support portion 564 to the tip 566.

[0057] The second support portion 564 extends in the YZ plane and connects to the end 567 of the first support portion 562. A tip 566 holds a portion of the capillary 314 near the end 331. The chamfered edge 565' and the second support portion 564 are oriented such that the chamfered edge 565' extends toward the end 331, and the tip 566 is located between the end 331 and the inner side 561. Therefore, the tip 566 holds the capillary 314 near the end 331 and reduces unwanted vibrations.

[0058] Figure 6A This is a side sectional view of the nozzle assembly 640 in the XY plane. The nozzle assembly 640 includes a body 350 and a support structure 660. When the nozzle assembly 640 is assembled (e.g. Figure 6A As shown, capillary 314 extends through opening 355 and opening 665 in support structure 660.

[0059] Nozzle device 640 is similar to nozzle device 540 ( Figure 5 ) and nozzle device 440 ( Figure 4The difference is that the support structure 660 of the nozzle device 640 includes a first support portion 662 and a second support portion 664, which have different features compared with the first support portion 462 and the second support portion 464 of the support structure 460 and the first support portion 562 and the second support portion 564 of the support structure 560. Figure 6B The perspective view indicated by lines 6B-6B' shows the support structure 660 in the YZ plane. Figure 6C A perspective view of the support structure 660 is shown.

[0060] A first support portion 662 extends from end 667 to end 668 in the X direction. The first support portion 662 includes three flexible tips 676a, 676b, and 676c and a rigid tip 679. 676a, 676b, 676c, and the rigid tip 679 are collectively referred to as a segment. Each of the flexible tips 676a, 676b, and 676c and the rigid tip 679 extends from end 667 to end 668 in the X direction. Each of the flexible tips 676a, 676b, and 676c and the rigid tip 679 are spaced apart from each other around end 667 to define four corresponding openings 672a, 672b, 672c, and 672d. The openings 672a, 672b, 672c, and 672d extend through the outer surface of the first support portion 662. Figures 6A to 6C The support structure 660 shown includes three flexible tips 676a, 676b, and 676c. However, in other implementations, the first support portion 662 may include more or fewer than three flexible tips.

[0061] The rigid tip 679 is made of a rigid material. For example, the rigid tip 679 and the base 691 may be made of solid metal or a rigid polymer material. The flexible tips 676a, 676b, and 676c are made of a flexible material that bends or buckles in response to an applied force without breaking and returns to its original shape and position after the force is removed.

[0062] The second support portion 664 includes an adjustment mechanism 669 (shown in gray shading) and a contact portion 671 defining an opening 665. The second support portion 664 connects to the first support portion 662 at an end 667 and extends in the YZ plane. The adjustment mechanism 669 passes through the rigid tip 679 of the first support portion 662 in the Z direction and contacts the contact portion 671. The adjustment mechanism 669 may be, for example, a positioning screw or an adjusting screw.

[0063] The contact portion 671 and the second support portion 664 can be made of a durable material, such as a metal. In some implementations, the second support portion 664 and the contact portion 671 are made of a non-rigid material such as a polymer. The adjustment mechanism 669 can be set during the manufacture of the nozzle assembly 640, for example, as a final step in the manufacturing process. In other implementations, the adjustment mechanism 669 is configured to be adjusted both on-site and after the manufacturing process is completed.

[0064] The adjusting mechanism 669 is movable in the -Z and Z directions. Moving the adjusting mechanism 669 in the Z direction allows the contact portion 671 to physically contact the capillary 314. As the adjusting mechanism 669 moves in the Z direction, it also moves the second support portion 664 in the Z direction. As the adjusting mechanism 669 moves in the Z direction, the flexible tip 676 bends at its end 667 and moves in the Z direction, thereby allowing the contact portion 671 to move into physical contact with the capillary 314. After physical contact is established, continuing to move the adjusting mechanism 669 in the Z direction improves the mechanical coupling between the capillary 314 and the contact portion 671. Improved mechanical contact enhances the ability of the second support portion 664 to hold the capillary 314 in place and thus reduce the vibration of the capillary 314.

[0065] Figure 7A This is a side cross-sectional view of nozzle assembly 740. Nozzle assembly 740 is a derivative of nozzle assembly 140. Figure 1 Another implementation of ). Nozzle device 740 is similar to nozzle device 540 ( Figure 5 The difference is that the nozzle device 740 includes a collar 770 (shown in diagonal shading), as described below.

[0066] The nozzle assembly 740 includes a body 350 and a support structure 760. The support structure 760 includes a first support portion 762 extending in the X direction from an end 768 to an end 767. The first support portion 762 is generally cylindrical. The support structure 760 also includes a second support portion 764 connected to the first support portion 762 at the end 767. The second support portion 764 extends in the YZ plane. Figure 7B A perspective view indicated by lines 7B-7B' shows the support structure 760 in the YZ plane. A second support portion 764 defines an opening 765. When the nozzle assembly 740 is assembled (such as...), Figure 7A and Figure 7B (As shown), the capillary passes through openings 355 and 765.

[0067] The second support portion 764 has a circular cross-section in the YZ plane. The second support portion 764 includes a collar 770 and an outer portion 773. The collar 770 is an annular or disc-shaped object surrounding an opening 765 and in physical contact with a capillary 314. The collar 770 holds the capillary 314 near its end 331. The outer portion 773 is attached to the collar 770 such that the outer portion 773 and the collar 770 form a single piece (and together constitute the second support portion 764). For example, the collar 770 may be press-fitted into the outer portion 773 or attached to the outer portion 773 by adhesive or mechanical fasteners. The outer portion 773 is attached to the end 767 of the first support portion 762.

[0068] The outer portion 773 and the first support portion 762 are made of the same material. For example, the outer portion 773 and the first support portion 762 may be made of a robust, rigid metallic material. The collar 770 is made of a material softer than that of the outer portion 773. For example, in an implementation where the outer portion 773 is made of a solid metallic material, the collar 770 may be made of a polymeric material, such as polytetrafluoroethylene or polyimide, or the collar 770 may be made of or include an adhesive, such as bismaleimide resin or cyanate ester-based resin. In some implementations, the collar 770 is made of a solid polymer and is attached to the outer portion 773 by an adhesive.

[0069] Because the collar 770 is made of a softer material than the outer portion 773, the collar 770 is less likely to damage (e.g., scratch or break) the capillary 314. Furthermore, because the collar 770 is made of a relatively soft material, it can be more firmly coupled to the capillary 314, thereby enhancing the ability of the second support portion 764 to prevent unintentional lateral (YZ) vibrations in the capillary 314.

[0070] Figure 8 This is a side cross-sectional view of nozzle assembly 840. Nozzle assembly 840 is a derivative of nozzle assembly 140. Figure 1 Another implementation of ). Nozzle device 840 is similar to nozzle device 540 ( Figure 5 The nozzle assembly 840 includes a body 350 and a support structure 560, both of which have been discussed above. However, the nozzle assembly 840 also includes a potting compound 874 within the support structure 560. The potting compound 874 is located in an enclosed space 877 defined by the inner side 563 of the first support portion 562, the second support portion 564, the end portion 357, the second body wall 354, and the fitting 494. The potting compound 874 provides additional mechanical support to the capillary 314 and further dampens unintentional vibrations of the capillary 314.

[0071] The potting compound 874 can be any material capable of supporting the capillary 314 during operation of the nozzle device 840. For example, the potting compound 874 can be an adhesive, such as a bismaleimide-based adhesive, a benzoxazine-based adhesive, a cyanate-based adhesive, a room temperature vulcanizing (RTV) adhesive, or a high-temperature epoxy adhesive.

[0072] The potting compound 874 can be arranged in the space 877 in any manner that allows the potting compound to provide mechanical support for the capillary 314. The potting compound 874 can occupy any portion of the space 877. For example, the potting compound 874 can be in physical contact with the inner side 561 and the capillary 314 and occupy at least approximately one-third of the total volume of the space 877. The potting compound can occupy more than one-third of the total volume of the space 877. For example, in some implementations, the potting compound 874 occupies the entire space 877. In implementations where the potting compound 874 occupies less than the entire space 877, the potting compound 874 can be arranged in any portion of the space 877. For example, in some implementations, the potting compound 874 fills a portion of the space 877 adjacent to the body 350, and is absent in the portion of the space 877 adjacent to the second support portion 564. This arrangement of the potting compound 874 helps ensure that the potting compound 874 does not interfere with the flow of material through the orifice at the end 331.

[0073] In implementations including the potting compound 878, the second support portion 564 is not necessarily in mechanical contact with the tube 314. For example, the tube 314 and the second support portion 564 can be arranged such that the tube 314 does not contact the second support portion 564. The potting compound 874 supports the tube 314, and the second support portion 564 can be configured not to provide support for the tube 314 or not to be the sole source of support for the tube 314. In these implementations, the second support portion 564 protects the potting compound 874 from potential direct exposure to plasma 196 ( Figure 1 The effects of light emitted (e.g., EUV light and / or other short-wavelength light) on damage.

[0074] Figure 9 This is a side cross-sectional view of nozzle assembly 940. Nozzle assembly 940 is a derivative of nozzle assembly 140. Figure 1 Another implementation of the nozzle device 940. The nozzle device 940 includes a body 350 and a fitting 494, which is attached to an end 357 of the body 350. The nozzle device 940 also includes a capillary 314. The capillary 314 extends through the body 350 and the fitting 494. An actuator 493 is mechanically coupled to the capillary 314 between the fitting 494 and the end 331.

[0075] Capillary tube 314 extends unsupported from fitting 494 to end 331 a distance 981. (Regarding...) Figure 3A , Figure 4 , Figure 5 , Figure 6A , Figure 7A and Figure 8 In the implementation discussed, a larger portion of the capillary 314 is surrounded by the body 350. In other words, a larger portion of the capillary 314 is within the interior 351. For example, in the nozzle device 940, at least half of the capillary 314 may be surrounded by the body 350. In this implementation, the distance 981 is less than half the distance from end 331 to end 332. The total extent of the capillary 314 from end 331 to end 332 remains unchanged. Therefore, the capillary 314 has the same acoustic resonance and responds to the intended vibration to control the discharge of material from the orifice 319.

[0076] However, since more capillaries 314 are surrounded by the body 350, the unsupported portion of the capillaries 314 is significantly reduced, and therefore the capillaries are less susceptible to unintentional vibrations, and the nozzle structure 940 can be used without support structures such as support structures 360, 460, 560, 660, 760 and 860.

[0077] Figure 10 This is a side cross-sectional view of nozzle assembly 1040. Nozzle assembly 1040 is a derivative of nozzle assembly 140. Figure 1 Another implementation of ). The nozzle device 1040 includes a body 350, a fitting 494, and a support ring 1078. When the nozzle device 1040 is assembled (such as... Figure 10 (As shown), capillary tube 314 passes through opening 355 and fitting 494. Capillary tube 314 extends 1081 meters from collar 1078 and fitting 494 to end 331.

[0078] A support collar 1078 is attached to fitting 494 and surrounds capillary tube 314. The support collar 1078 is rigidly attached to fitting 494 and capillary tube 314 by means of, for example, adhesive. Alternatively, mechanical fasteners such as nuts, compression fittings, or brackets can be used to clamp the collar 1078 to capillary tube 314.

[0079] The distance 1081 is less than the distance between fittings 494. In other words, the collar 1078 is closer to end 331 than fitting 494, closer to actuator 493 than fitting 494, and extends beyond fitting 494 in the -X direction. The support collar 1078 provides additional support for capillary 314, allowing unintentional lateral vibrations to be reduced or eliminated without the use of support structures such as support structures 360, 460, 560, 660, 760, and 860. Furthermore, the additional support provided by the collar 1078 allows distance 1081 to be greater than distance 981. For example, distance 1081 can be greater than half the total distance between end 331 and end 332, and in these implementations, less than half of capillary 314 is surrounded by body 350. In some implementations of nozzle device 1040, capillary 314 is arranged such that a large portion of tube 314 is surrounded by body 350, for example, as with regard to Figure 9 The discussion continues. Regardless of the specific arrangement of the capillary 314, the support ring 1078 provides additional support for the capillary 314, thereby reducing or eliminating unintentional vibrations.

[0080] Also refer to Figure 11 In some implementations, the nozzle device 1040 includes a metal wire having a thin layer 1183 of polymer material, which is connected to the fitting 494 and surrounds the capillary 314. The wire 1183 provides mechanical damping and further reduces unintentional lateral vibrations of the capillary 314. The wire 1183 can be, for example, copper wire coated with a polymer material, such as polytetrafluoroethylene. It is thought that this wire 1183 provides a path to dissipate high-frequency vibrations applied to the actuator 493 (e.g., harmonics of a 50 kHz square wave modulated signal applied to the actuator 493), and by dissipating high-frequency vibrations, undesirable lateral vibrations in the capillary 314 are reduced.

[0081] In some implementations, the nozzle device 1040 also includes similar Figure 4 The support structure 362 shown is a support structure. In these implementations, the purpose of this support structure in the nozzle device 1040 is to protect the polymer material deposited on the line 1183 from being detached from the target material plasma 196. Figure 1 Damage to emitted light (e.g., EUV and / or other short-wavelength light).

[0082] Figure 12 This is a side cross-sectional view of nozzle assembly 1240. Nozzle assembly 1240 is a derivative of nozzle assembly 140. Figure 1Another implementation of the nozzle device 1240 includes a body 350 and a support structure 1260. The support structure 1260 provides support for the capillary 314 and reduces or eliminates unintentional lateral vibrations. The support structure 1260 includes a first support portion 1262 and a second support portion 1264 connected to an end 1267 of the first support portion 1262. The second support portion 1264 defines an opening 1265.

[0083] When the nozzle device 1240 is assembled (e.g.) Figure 12 As shown, the support structure 1260 is attached to the body 350, and the capillary 314 passes through the opening 355 and the opening 1265. The capillary 314 is also mechanically coupled to the actuator 493. The actuator 493 is located between the second support portion 1264 and the end 331. Therefore, the second support portion 1264 is relatively far away from the end 331 and the orifice 319, and the second support portion 1264 is at another location not at the end 331 and in relation to... Figure 3A , Figure 4 , Figure 5 , Figure 6A Figure 7 and Figure 8 The illustrated implementation holds the capillary 314 at a position further away from the end 331. The arrangement of the second support portion 1264 relative to the orifice 319 reduces connections and objects near the orifice 319 and helps ensure that the orifice 319 remains free of debris and interference during operation. Furthermore, more space can be used to position the second support portion 1264 in a manner such as... Figure 12 The configuration shown is coupled to capillary 314.

[0084] The support structure 1260 may be made of a flexible material, such as a solid polymer material. The capillary 314 may be coupled to the second support portion 1264 at the opening 1265 by an adhesive, such as glue. Additionally or alternatively, the support structure 1260 may be connected to the fitting 494 by a threaded connection or by adhesive. Furthermore, in some implementations, a collar structure (such as collar 770 of FIG. 7) or a clamping mechanism is located between the opening 1265 and the capillary 314, and the collar structure or clamping mechanism holds the capillary 314.

[0085] Figure 13A This is a side cross-sectional view of nozzle assembly 1340. Nozzle assembly 1340 is a derivative of nozzle assembly 140. Figure 1 Another implementation of the nozzle device 1340 includes a body 1350, a fitting 1394, and an actuator 1393. The body 1350 includes a first body wall 1352 defining an opening 1355 and a second body wall 1354. The fitting 1394 defines a channel 1389 through the fitting 1394.

[0086] When assembled (e.g.) Figure 13AAs shown, the nozzle assembly 1340 includes a capillary 1314 that passes through an opening 1355 and a channel 1389 and is mechanically coupled to an actuator 1393. When mounted in the nozzle assembly 1240, the capillary 1314 extends from end 1331 to end 1332 in the X direction. Figure 13B The end portion 1331 of the capillary 318 in the YZ plane is shown. The capillary 1314 includes a sidewall 1330 having an outer diameter 1388 and an inner diameter 1387. Figure 13B The outer diameter 1388 is larger than the outer diameter 388 of the sidewall 330 of the capillary 314 (see Figure 3). Specifically, it can be 50% to 500% larger than the outer diameter 388 of the sidewall 330. For example, the outer diameter 1388 can be between about 1.5 mm and about 5.0 mm. Compared to the capillary 314, the sidewall 1330 can be about 50%, 100%, 200%, or 500% larger than the wall thickness along most of the capillary 318. The radial thickness of the sidewall 1330 is the distance between the outer portion and the inner portion of the sidewall 1330. Figure 13B The radial thickness of the sidewall 1330 of the capillary 1314 can be, for example, between about 0.35 mm and about 2.0 mm. (In...) Figure 13A In the example shown, capillary 1314 has an orifice 319, which is the same as the orifice that is part of capillary 1314. However, capillary 1314 may have an orifice that is smaller or larger in the Z direction.

[0087] Increasing the diameter of the sidewall 1330 results in the capillary 1314 being stiffer and more robust than the capillary 1314. Consequently, the capillary 1314 experiences less unintentional lateral vibration than the capillary 1314.

[0088] Any of the nozzle assemblies discussed above can be used with an EUV light source. (Reference) Figure 14 The implementation of the LPP EUV light source 1400 is shown. Any of the nozzle assemblies discussed above can be used as part of the supply system 1425 in the light source 1400.

[0089] The LPP EUV light source 1400 is formed by irradiating a target mixture 1414 with a magnified beam 1410 at a plasma formation location 1405, the magnified beam 1410 traveling along a beam path toward the target mixture 1414. (Regarding...) Figure 1 The target materials discussed and about Figure 1The target in the discussed flow 121 may be or includes a target mixture 1414. The plasma formation location 1405 is within the interior 1407 of the vacuum chamber 1430. When the magnified beam 1410 strikes the target mixture 1414, the target material within the target mixture 1414 is converted into a plasma state having an emission line in the EUV range. The resulting plasma possesses certain characteristics depending on the composition of the target material within the target mixture 1414. These characteristics may include: the wavelength of the EUV light generated by the plasma, and the type and quantity of debris released from the plasma.

[0090] The light source 1400 also includes a supply system 1425, which delivers, controls, and guides a target mixture 1414 in the form of droplets, liquid streams, solid particles or clusters, solid particles contained in droplets, or solid particles contained in liquid streams. The target mixture 1414 includes target material, such as water, tin, lithium, xenon, or any material that has an emission line in the EUV range when converted to a plasma state. For example, elemental tin can be used as pure tin (Sn); as tin compounds, such as SnBr4, SnBr2, SnH4; as tin alloys, such as tin-gallium alloys, tin-indium alloys, tin-indium-gallium alloys, or any combination of these alloys. The target mixture 1414 may also include impurities, such as non-target particles. Thus, in the absence of impurities, the target mixture 1414 consists only of target material. The target mixture 1414 is delivered by the supply system 1425 to the interior 1407 of the chamber 1430 and the plasma formation location 1405.

[0091] The light source 1400 includes a driving laser system 1415 that generates an amplified beam 1410 due to population inversion within one or more gain media of the laser system 1415. The light source 1400 includes a beam transport system between the laser system 1415 and a plasma formation location 1405. The beam transport system includes a beam delivery system 1420 and a focusing assembly 1422. The beam delivery system 1420 receives the amplified beam 1410 from the laser system 1415, and redirects and modulates the amplified beam 1410 as needed, and outputs the amplified beam 1410 to the focusing assembly 1422. The focusing assembly 1422 receives the amplified beam 1410 and focuses the beam 1410 onto the plasma formation location 1405.

[0092] In some implementations, laser system 1415 may include one or more optical amplifiers, lasers, and / or lamps to provide one or more master pulses and, in some cases, one or more pre-pulses. Each optical amplifier includes a gain medium capable of optically amplifying a desired wavelength at high gain, an excitation source, and internal optics. The optical amplifier may or may not have a laser mirror or other feedback device forming a laser cavity. Thus, even without a laser cavity, laser system 1415 will generate an amplified beam 1410 due to population inversion in the gain medium of the laser amplifier. Furthermore, if a laser cavity is present to provide sufficient feedback to laser system 1415, laser system 1415 can generate an amplified beam 1410 as a coherent laser beam. The term "amplified beam" encompasses one or more of the following: light from laser system 1415 that is amplified but not necessarily coherently oscillating, and light from laser system 1415 that is amplified and is also coherently oscillating.

[0093] The optical amplifier in laser system 1415 may include a fill gas (including CO2) as a gain medium and may amplify light at a gain of greater than or equal to 800 times in the wavelength range of about 9100 to about 11000 nm, and particularly about 10600 nm. Suitable amplifiers and lasers for laser system 1415 may include pulsed laser devices, such as pulsed gas discharge CO2 laser devices that generate radiation at about 9300 nm or about 10600 nm, for example, using DC or RF excitation, which operate at relatively high power (e.g., 10 kW or higher) and high pulse repetition rate (e.g., 40 kHz or higher). The pulse repetition rate may, for example, be 50 kHz. The optical amplifier in laser system 1415 may also include a cooling system, such as water, which may be used when laser system 1415 operates at higher power.

[0094] The light source 1400 includes a focusing mirror 1435 having an aperture 1440 to allow the amplified beam 1410 to pass through and reach the plasma formation location 1405. The focusing mirror 1435 may be, for example, an elliptical mirror having a primary focal point at the plasma formation location 1405 and a secondary focal point at an intermediate location 1445 (also referred to as the intermediate focal point), from which EUV light can be output from the light source 1400 and input to, for example, an integrated circuit lithography tool (not shown). The light source 1400 may also include a hollow conical shroud 1450 (e.g., an air cone) with open ends, tapering from the focusing mirror 1435 toward the plasma formation location 1405 to reduce the amount of plasma-generating debris entering the focusing assembly 1422 and / or the beam delivery system 1420, while allowing the amplified beam 1410 to reach the plasma formation location 1405. For this purpose, an airflow directed toward the plasma formation location 1405 may be provided within the shroud.

[0095] The light source 1400 may also include a main controller 1455, which is connected to a droplet position detection feedback system 1456, a laser control system 1457, and a beam control system 1458. The light source 1400 may include one or more targets or droplet imagers 1460, which provide an output indicating the droplet position, for example, relative to the plasma formation position 1405, and provide this output to the droplet position detection feedback system 1456. The droplet position detection feedback system 1456 can, for example, calculate the droplet position and trajectory, and thereby calculate the droplet position error by means of droplet-by-droplet or averaging. The droplet position detection feedback system 1456 thus provides the droplet position error as input to the main controller 1455. The main controller 1455 can therefore provide laser position, direction and timing correction signals to the laser control system 1457, for example, which can be used to control the laser timing circuit and / or the beam control system 1458 to control the position of the amplified beam and the shaping of the beam delivery system 1420 to change the position and / or focal length of the beam within the chamber 1430.

[0096] The supply system 1425 includes a target material delivery control system 1426, which is operable in response to a signal from a main controller 1455, for example, to modify the release point of droplets released by the target material supply device 1427 to correct errors in the droplets reaching the desired plasma formation position 1405. The target material supply device 1427 includes a target forming device employing an adhesive such as adhesive 234.

[0097] Additionally, the light source 1400 may include light source detectors 1465 and 1470, which measure one or more EUV light parameters, including but not limited to pulse energy, energy distribution as a function of wavelength, energy within a specific wavelength band, energy outside a specific wavelength band, and the angular distribution of EUV intensity and / or average power. Light source detector 1465 generates a feedback signal for use by the main controller 1455. The feedback signal may, for example, indicate errors in parameters such as the timing and focusing of the laser pulse, to intercept droplets at the correct position and time for efficient and effective EUV light production.

[0098] The light source 1400 may also include a guide laser 1475, which can be used to align various portions of the light source 1400 or to help direct the amplified beam 1410 toward the plasma formation position 1405. Regarding the guide laser 1475, the light source 1400 includes a measurement system 1424, which is placed within a focusing assembly 1422 to sample a portion of the light from the guide laser 1475 and the amplified beam 1410. In other implementations, the measurement system 1424 is placed within a beam delivery system 1420. The measurement system 1424 may include optical elements for sampling or redirecting a subset of the light, such optical elements being made of any material capable of handling the power of the guide laser beam and the amplified beam 1410. A beam analysis system is formed by the measurement system 1424 and a master controller 1455, as the master controller 1455 analyzes the sampled light from the guide laser 1475 and uses this information to adjust the components within the focusing assembly 1422 via a beam control system 1458.

[0099] Therefore, in summary, the light source 1400 generates an amplified beam 1410, which is guided along a beam path to irradiate the target mixture 1414 at the plasma formation location 1405, thereby converting the target material within the mixture 1414 into a plasma that emits light in the EUV range. The amplified beam 1410 operates at a specific wavelength (also referred to as the driving laser wavelength) determined based on the design and characteristics of the laser system 1415. Alternatively, the amplified beam 1410 may be a laser beam when the target material provides sufficient feedback to the laser system 1415 to generate coherent laser light, or when the driving laser system 1415 includes optical feedback suitable for forming a laser cavity.

[0100] Figure 15 This is a perspective view of support structure 1560. Support structure 1560 is a branch of support structure 360. Figure 3A , Figure 3B and Figure 3D ) and supporting structure 560 ( Figure 5The support structure 1560 includes a first support portion 1562 and a second support portion 1564 connected to the first support portion 1562. The first support portion 1562 includes four tips 1576a, 1576b, 1576c, and 1576d. Each of the tips 1576a, 1576b, 1576c, and 1576d extends from end 1567 to end 1568 in the X direction. The tips 1576a, 1576b, 1576c, and 1576d are spaced apart from each other around end 1567 to define four respective openings 1572a, 1572b, 1572c, and 1572d in the first support portion 1562. The openings 1572a, 1572b, 1572c, and 1572d are on one side of the first support portion 1562 and extend in the X direction between ends 1567 and 1568. The openings 1572a, 1572b, 1572c, and 1572d may have the same or different dimensions. The pointed tips 1576a, 1576b, 1576c, and 1576d may be made of rigid or flexible materials. The pointed tips 1576a, 1576b, 1576c, and 1576d may have the same or different lengths in the circumferential direction. Furthermore, the first support portion 1562 may include more or fewer than four pointed tips 1576a, 1576b, 1576c, and 1576d. Additionally, the first support portion 1562 may be a continuous sidewall that does not include any pointed tips or openings.

[0101] In order to assemble the nozzle device including the support structure 1560, the support structure 1560 is attached to the end 357 of the body 350. Figure 3A and Figure 3C This forms a nozzle assembly. Specifically, a portion of the inner surface 1563 of the end 1568 can be attached to the outer surface 356 of the first body wall 352 by, for example, an interference fit between the inner surface 1563 and the outer surface 356; an adhesive that bonds the outer surface 356 and the inner surface 1563; a mechanical device such as a fastener; a threaded interface; or any other means that can hold the support structure 1560 to the body 350. When the nozzle assembly is assembled, the capillary 314 passes through the openings 355 and 1565 such that the second support portion 1564 holds and supports the capillary 314 near the end 331 of the capillary 314 in the opening 1565.

[0102] The openings 1572a, 1572b, 1572c, and 1572d of the first support portion 1562 allow for partial views of the internal areas within the support structure 1560. For example, the openings 1572a, 1572b, 1572c, and 1572d allow the support structure 1560 to be attached to and aligned with the end 357 and capillary 314 in a relatively direct and easy manner. Furthermore, the openings 1572a, 1572b, 1572c, and 1572d allow for visual inspection of the support structure 1560 and its components. For example, the placement of the metal wire 1183 can be observed through the openings 1572a, 1572b, 1572c, and 1572d, and the operator can easily inspect it to determine whether the wire 1183 should be repositioned or adjusted.

[0103] Other aspects of the invention are set forth in the following numbered clauses.

[0104] 1. An apparatus comprising:

[0105] A tube, comprising an internal width and an opening at an end, wherein the internal width is between 0.1 mm and 0.8 mm, and the opening has a width between 1.0 μm and 5.0 μm;

[0106] An electromechanical actuator, in contact with the tube and configured to transmit mechanical motion into the tube, wherein the mechanical motion comprises at least a first frequency component between 40 kHz and 100 kHz and a second frequency component with a frequency higher than the first frequency component.

[0107] The body includes: a first body wall and a second body wall, wherein the first body wall extends in a first direction, the second body wall extends in a second direction different from the first direction, and a first portion of the tube passes through an opening in the second body wall, wherein the interior of the tube and the interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state; and

[0108] The support structure includes a first support portion and a second support portion, wherein the first support portion is configured to be attached to the first body wall, and the second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall.

[0109] 2. The apparatus according to Clause 1, wherein the second support portion is an end wall defining a support opening, and the second portion of the tube is configured to pass through the support opening when the first support portion is attached to the first body wall.

[0110] 3. The apparatus according to Clause 2, wherein the support opening includes a chamfered opening, and when the first support portion is attached to the first body wall, the outer surface of the second portion of the tube is captured by the chamfered opening.

[0111] 4. The apparatus according to Clause 2, wherein the second support portion further includes an adjustment mechanism configured to control the mechanical coupling between the tube and the second support portion.

[0112] 5. The apparatus according to Clause 4, wherein the first support portion extends from a first end configured to be attached to the first body wall, and the first support portion includes a plurality of segments extending from the first end, the plurality of segments including a rigid tip and at least one flexible tip.

[0113] 6. The device according to Clause 5, wherein the adjusting mechanism passes through the rigid tip and is configured to position the second support portion thereby controlling the mechanical coupling between the tube and the second support portion.

[0114] 7. The apparatus according to Clause 5, wherein the opening is located between each of the plurality of segments.

[0115] 8. The apparatus according to Clause 4, wherein the adjusting mechanism is in physical contact with the first support portion and the end wall, and the adjusting mechanism moves the end wall to control the mechanical coupling between the tube and the second support portion.

[0116] 9. The device according to Clause 2, wherein the end wall comprises a first material, and the device further comprises a collar of a second material surrounding the support opening, wherein the second material is softer than the first material.

[0117] 10. The apparatus according to Clause 9, wherein the first material comprises a metal and the second material comprises a polymer.

[0118] 11. The apparatus according to Clause 10, wherein the polymer comprises a polyimide resin, a polyetheretherketone, a polybenzimidazole resin, or polytetrafluoroethylene.

[0119] 12. The apparatus according to Clause 11, wherein the first material comprises a metal and the second material comprises an adhesive material.

[0120] 13. The apparatus according to Clause 12, wherein the adhesive material comprises bismaleimide resin or cyanate ester-based resin.

[0121] 14. The apparatus according to Clause 2 further includes a potting compound, and wherein, when the first support portion is attached to the first body wall, the first support portion and the end wall define an internal support region containing the potting compound.

[0122] 15. The apparatus according to Clause 14, wherein the tube passes through the support opening in the second support portion, and the second support portion does not mechanically contact the tube.

[0123] 16. The apparatus of claim 15, wherein the second support portion is configured to protect the potting compound from EUV light emitted from the plasma, the plasma being formed from the target material.

[0124] 17. The apparatus according to Clause 14, wherein the potting compound does not completely fill the internal support region.

[0125] 18. The apparatus of claim 17, wherein the potting compound occupies a first portion of the internal support region that is closer to the body than to the end wall, and a second portion of the internal support region that is closer to the end wall than to the body does not include any potting compound.

[0126] 19. The apparatus according to Clause 18, wherein the potting compound comprises an adhesive.

[0127] 20. The apparatus according to Clause 19, wherein the adhesive comprises at least one of the following: a bismaleimide-based adhesive, a benzoxazine-based adhesive, a cyanate-based adhesive, a room temperature vulcanizing (RTV) adhesive, or a high-temperature epoxy adhesive.

[0128] 21. The device according to Clause 1, wherein the first support portion comprises a rigid material.

[0129] 22. The device according to Clause 1, wherein the first support portion comprises metal.

[0130] 23. The device according to Clause 1, wherein the first support portion comprises a flexible material.

[0131] 24. The apparatus according to Clause 1, wherein the support structure is located between the body and the electromechanical actuator.

[0132] 25. The apparatus according to Clause 1, wherein the electromechanical actuator is surrounded by the first support portion when the first support portion is attached to the first body wall.

[0133] 26. The apparatus according to Clause 1, wherein the first support portion is configured to be attached to the exterior of the first body wall.

[0134] 27. The apparatus according to Clause 1, wherein the second frequency component is a harmonic of the first frequency component or a harmonic of another frequency applied to the tube by the electromechanical actuator.

[0135] 28. The apparatus according to Clause 1, wherein the first support portion includes one or more openings extending along one side of the first support portion between a first end of the first support portion and a second end of the first support portion.

[0136] 29. An apparatus comprising:

[0137] Tube;

[0138] The body includes: a first body wall and a second body wall, wherein the first body wall extends in a first direction, the second body wall extends in a second direction different from the first direction, and a first portion of the tube passes through an opening in the second body wall; and

[0139] The support structure includes a first support portion and a second support portion, wherein the first support portion is configured to be attached to the first body wall, and when the first support portion is attached to the first body wall, a second portion of the tube passes through the second support portion.

[0140] 30. An apparatus for an extreme ultraviolet light source, the apparatus comprising:

[0141] The tube includes a sidewall having a length extending from a first end to a second end;

[0142] The actuator is mechanically coupled to the outside of the sidewall;

[0143] The body includes: a first body wall and a second body wall; and

[0144] An accessory, disposed at an end of the body, the accessory including a channel, wherein a first portion of a sidewall is held in an opening in a second body wall, a second portion of the sidewall is disposed in the channel, an actuator is located between the accessory and the second end of the tube, and approximately half the length of the sidewall is surrounded by the body.

[0145] 31. The device according to clause 30, wherein more than half of the length of the sidewall is surrounded by the body.

[0146] 32. An apparatus for an extreme ultraviolet (EUV) light source, the apparatus comprising:

[0147] The tube includes a sidewall extending from the first end to the second end;

[0148] The actuator is mechanically coupled to the outside of the sidewall;

[0149] The body includes: a first body wall and a second body wall; and

[0150] An accessory, disposed at an end of the body, the accessory including a channel and a collar, wherein a portion of a sidewall is in the channel and the collar is located between the portion of the sidewall and the accessory.

[0151] 33. The device according to Clause 32 further includes a metal wire having a polymer material layer attached to the fitting and surrounding the exterior of the sidewall, the wire being configured to reduce vibration of the tube.

[0152] 34. The apparatus according to Clause 33, wherein the polymer material layer forms a coating on the metal wire.

[0153] 35. The apparatus according to Clause 33 further includes a support structure comprising: a first support portion and a second support portion, wherein the first support portion is configured to be attached to the first body wall, and the tube passes through the second support portion when the first support portion is attached to the first body wall.

[0154] 36. The apparatus according to Clause 35, wherein the second support portion is configured to protect the polymer layer from the plasma in the EUV light source.

[0155] 37. The device according to Clause 36, wherein the second support portion does not mechanically contact the tube.

[0156] 38. The device according to Clause 32, wherein the collar extends beyond the fitting.

[0157] 39. A support structure for a target material supply system, the support structure comprising: a first support portion; and a second support portion, wherein...

[0158] The first support portion is configured to be attached to the first body wall of the target material supply system, and when the first support portion is attached to the first body wall, the pipe of the target material supply system passes through the second support portion.

[0159] 40. The support structure according to Clause 39, wherein the target material supply system is configured to be coupled to a vacuum chamber of an extreme ultraviolet light source.

[0160] The above-described implementation and other implementations are within the scope of the claims.

Claims

1. An apparatus for an extreme ultraviolet light source, the apparatus comprising: The tube includes a sidewall having a length extending from a first end to a second end; The actuator is mechanically coupled to the outside of the sidewall; The body includes: a first body wall and a second body wall; as well as An accessory, disposed at an end of the body, the accessory including a channel, wherein a first portion of a sidewall is held in an opening in a second body wall, a second portion of the sidewall is disposed in the channel, an actuator is located between the accessory and the second end of the tube, and half the length of the sidewall is surrounded by the body.

2. The device of claim 1, wherein more than half of the length of the sidewall is surrounded by the body.

3. An apparatus for an extreme ultraviolet (EUV) light source, the apparatus comprising: The tube includes a sidewall extending from the first end to the second end; The actuator is mechanically coupled to the outside of the sidewall; The body includes: a first body wall and a second body wall; as well as An accessory, disposed at an end of the body, the accessory including a channel and a collar, wherein a portion of a sidewall is in the channel and the collar is located between the portion of the sidewall and the accessory.

4. The device of claim 3 further includes a metal wire having a polymer material layer attached to the fitting and surrounding the exterior of the sidewall, the metal wire being configured to reduce vibration of the tube.

5. The apparatus according to claim 4, further comprising a support structure, the support structure comprising: A first support portion and a second support portion, wherein the first support portion is configured to be attached to the first body wall, and the tube passes through the second support portion when the first support portion is attached to the first body wall.

6. The apparatus of claim 5, wherein the second support portion is configured to protect the polymer material layer from the plasma in the EUV light source.

7. The apparatus of claim 6, wherein the second support portion does not mechanically contact the tube.

8. The device of claim 3, wherein the collar extends beyond the fitting.

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