Apparatus for processing a substrate
By combining batch and single-processing methods, the substrate processing apparatus solves the problems of pattern tilting and watermarking during substrate processing, achieving efficient and uniform substrate processing, especially for substrates with high aspect ratio patterns.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SYSTEM ENGINEERING MEGA SOLUTION CO LTD
- Filing Date
- 2021-11-30
- Publication Date
- 2026-06-09
AI Technical Summary
Existing technologies have problems such as pattern tilting, watermarks, and uneven processing quality during substrate processing, especially when processing substrates with high aspect ratio patterns. Both batch processing and single processing methods have their shortcomings.
A substrate processing apparatus is designed that combines batch and single processing methods. Through the coordinated work of the first and second processing units, batch cleaning of multiple substrates and single drying of a single substrate are achieved. The attitude change component and transfer unit are used to optimize the attitude and position transfer of the substrate.
It improves the yield and uniformity of substrate processing quality, reduces the risk of pattern tilt and watermarks, and can effectively process substrates with high aspect ratio patterns.
Smart Images
Figure CN114582751B_ABST