A photolithography method using a combination mask

Abstract

The application discloses a photolithography method using a combined diaphragm, which comprises the following steps: designing a required pattern and performing pattern processing to form a pattern bitmap; generating n sets of data files from the pattern bitmap; determining the size of the diaphragm according to actual requirements; dividing the diaphragm into k sub-diaphragm files; and performing photolithography on the n sets of data files and the k sub-diaphragm files one by one, n=k, wherein the corresponding of one set of data file and one sub-diaphragm file is completed before each photolithography. The photolithography is performed on the same diaphragm by using the multiple sets of data files and the corresponding multiple sets of sub-diaphragm files, so that a grating combination with different angles or periods is formed in the sub-diaphragm file formed by one photolithography, thereby reducing the edge sawtooth, reducing the data amount and improving the resolution; and through the method, the diaphragm can be divided arbitrarily, the light and dark proportion can be adjusted, and more visual effects can be generated.

Description

Technical Field

[0001] This invention relates to the field of photolithography, and in particular to a photolithography method employing a combined aperture. Background Technology

[0002] Existing variable field-of-view effect files are generated by increasing resolution and using point sampling, or by using image slicing to represent different angles. For large-format files, increasing resolution multiplies the data volume. Point sampling is limited by resolution, potentially producing jagged edges, and can only use regular point arrangements such as 2x2, 3x3, and 4x4. Image slicing, using BMP images for scaling and other operations, results in a very large data volume. All of these methods have limitations in processing large-format files.

[0003] The preceding description is intended to provide general background information and does not necessarily constitute prior art. Summary of the Invention

[0004] The purpose of this invention is to provide a photolithography method using a combined aperture, which utilizes a nested photolithography method with multiple sets of data files corresponding to multiple sets of sub-aperture files to perform photolithography within the same aperture, thereby reducing the amount of data and improving the resolution.

[0005] This invention provides a photolithography method using a combined aperture, the method comprising the following steps:

[0006] Design the required graphics and process them to form a graphic bitmap;

[0007] Generate n sets of data files from the aforementioned graphic bitmap;

[0008] Determine the aperture size based on actual needs;

[0009] Divide the aperture into k sub-aperture files;

[0010] Photolithography involves photolithographically mapping the n sets of data files to the k sub-aperture files in a one-to-one correspondence, where n = k.

[0011] In one embodiment, the data file includes location coordinates, as well as an orientation angle and period corresponding to the location coordinates.

[0012] In one embodiment, at least one parameter of the orientation angle and period is different between any two sets of data files in the n sets of data files; that is, at least one parameter of the orientation angle and period is different at the same position coordinates in different data files. It can be that the orientation angles are the same but the periods are different; it can also be that the orientation angles are different but the periods are the same; or it can be that both the orientation angles and the periods are different.

[0013] In one embodiment, the orientation angle and / or period are the same within the same data file, or at least the orientation angle and / or period are different.

[0014] In one embodiment, the actual requirement is the resolution applied to photolithography to generate graphic files for the product.

[0015] In one embodiment, the n sets of data files include a first set of data files, a second set of data files, and so on, arranged in a certain pattern, up to the nth set of data files. The kth sub-aperture file is arranged in a certain pattern to form a first sub-aperture file, a second sub-aperture file, and so on, up to the kth sub-aperture file.

[0016] In one embodiment, on the aperture, the sub-aperture files in the k sub-aperture files are nested but not superimposed.

[0017] In one embodiment, the aperture can be divided into k sub-aperture files in any way or in any proportion, wherein the arbitrary way means that the graphics of each sub-aperture file are the same or different, and the arbitrary proportion means that the sizes of each sub-aperture file are the same or different.

[0018] The photolithography method using combined apertures provided by this invention employs multiple sets of data files and nested photolithography of multiple sets of sub-aperture files to perform photolithography within the same aperture. This creates a combination of gratings with different angles or periods within a single photolithographically formed sub-aperture file, thereby reducing edge jaggedness, decreasing data volume, and improving resolution. Furthermore, this method allows for arbitrary aperture division and adjustment of brightness ratios, resulting in a wider range of visual effects. Attached Figure Description

[0019] Figure 1 This is a flowchart illustrating the steps of the photolithography method using a combined aperture in an embodiment of the present invention.

[0020] Figure 2 This is a diagram showing the relationship between the lithography files required for embodiments of the present invention and the aperture and sub-aperture files;

[0021] Figures 3a to 3d This is a process flow diagram of step S5 in an embodiment of the present invention. Detailed Implementation

[0022] The specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings and examples. The following examples are for illustrative purposes only and are not intended to limit the scope of the invention.

[0023] Please refer to Figure 1 , Figure 2 ,and Figure 3aAs shown in Figure d, the photolithography method using a combined aperture 10 provided in this embodiment of the invention includes the following steps:

[0024] S1: Design the required graphics and process them to form a graphic bitmap;

[0025] S2: Generate n sets of data files from the graphic bitmap;

[0026] S3: Determine the size of aperture 10 based on actual needs;

[0027] S4: Divide the aperture 10 into k sub-aperture files 101;

[0028] S5: Photolithography, performing photolithography to correspond one-to-one with the n sets of data files and the k sub-aperture files 101, where n = k.

[0029] In this embodiment, an apparatus for implementing the photolithography method using the combined aperture 10 is also included. This apparatus comprises an image processing module, a data processing module, a storage module, a control module, a digital micromirror device (DMD), a CCD (charge-coupled device, also known as a CCD image sensor), a stage, an XY two-dimensional module, a light source, and an optical mechanism. The stage is used to place a glass substrate with photoresist. The XY two-dimensional module can move along the X and Y axes, and the stage is mounted on the XY two-dimensional module. The image processing module performs graphic design and processes the design graphic, then transmits the graphic bitmap to the data processing module. The data processing module receives the graphic transmitted from the image processing module, processes the data, and transmits the data to the storage module. The control module controls the movement of the XY two-dimensional module and controls the storage module to send images of the digital micromirror device.

[0030] In step S2, the data processing module generates n sets of data files from the graphic bitmap. The n sets of data files include a first set of data files, a second set of data files, and so on, arranged in a certain order. Here, n is an integer not less than 2.

[0031] In the generated n sets of data files, the orientation angle and period of any two sets of data files are different by at least one parameter; that is, different data files can have the same orientation angle but different periods, or they can have different orientation angles and periods.

[0032] In the generated n sets of data files, each data file includes position coordinates, as well as the orientation angle and period at the corresponding position coordinates. The position coordinates are the coordinates of the pixels within the data file. Within the same data file, the orientation angle and / or period are both the same, or at least one of the orientation angle and / or period is different.

[0033] In step S3, the actual requirement is the resolution applied to the photolithography to generate the graphic file of the product. The data processing module determines the size of the aperture 10 in the required photolithography file 1 based on this resolution, thereby determining the number of apertures 10 in the required photolithography file 1.

[0034] In step S4, the data module generates k sub-aperture files 101 from the aperture 10. The k sub-aperture files are arranged sequentially according to a certain pattern to form the first sub-aperture file, the second sub-aperture file, and so on, up to the kth sub-aperture file. Here, k is an integer not less than 2.

[0035] When generating k sub-aperture files 101, the aperture 10 can be divided into the k sub-aperture files 101 in any way or at any ratio. "Any way" means that the graphics of each sub-aperture file 101 are the same or different; "any ratio" means that the sizes of each sub-aperture file 101 are the same or different. In other words, the shapes of each sub-aperture file 101 can be different or the same; the sizes of each sub-aperture file 101 can be different or the same. Through this method, the aperture 10 can be arbitrarily divided, the brightness ratio adjusted, and more visual effects can be produced.

[0036] In step S5, the control module controls the movement of the XY 2D module, thereby controlling the stage to move to the appropriate position. The control module controls the storage module to upload a sub-aperture file 101 image to the digital micromirror device, then turns on the light source, adjusts the optical mechanism to form a clear image on the CCD, then turns off the light source, the storage module re-uploads the file to the digital micromirror device, and photolithography begins.

[0037] The first set of data files corresponds to the first sub-aperture file 101, the second set of data files corresponds to the second sub-aperture file 101, and so on, with the nth set of data files corresponding to the kth sub-aperture file 101. The storage module uploads the first sub-aperture file 101 to the digital micromirror device for photolithography of the first set of data files. After each photolithography cycle, the storage module uploads a new sub-aperture file 101 to the digital micromirror device. By using a nested photolithography method where multiple sets of data files correspond to multiple sets of sub-aperture files 101, photolithography is performed within the same aperture 10. This creates a grating combination with different angles or periods within the photolithographically formed aperture 10, thereby reducing edge jaggedness, decreasing data volume, and improving resolution.

[0038] The following is a detailed explanation of the photolithography process, taking the example of each sub-aperture file 101 having the same shape and size.

[0039] The first case, such as Figure 2 As shown in the figure, the required photolithography file 1 (represented by a large solid box in the figure) can be divided into 4 apertures 10 (represented by small solid boxes in the figure). Assume that one aperture 10 is divided into 4 sub-aperture files 101 (represented by a triangle formed by dashed and solid lines in the figure). The 4 sub-aperture files 101 are the first sub-aperture file 101, the second sub-aperture file 101, the third sub-aperture file 101, and the fourth sub-aperture file 101. The bitmap generates 4 sets of data files, and the period values ​​in each set of data files are the same. Assume that the orientation angle of all pixels in the first set of data files is 0 degrees, the orientation angle of all pixels in the second set of data files is 90 degrees, the orientation angle of all pixels in the third set of data files is 45 degrees, and the orientation angle of all pixels in the fourth set of data files is -45 degrees. During photolithography, the correspondence is performed according to the above relationship, such as... Figures 3a to 3d ,in, Figure 3a This is the first inlay photolithography. Figure 3b This is the second inlay photolithography. Figure 3c This is the third inlay lithography. Figure 3d This is the fourth step of the lithography process. Thus, after the first set of data files is lithographically completed, the orientation angle of all pixels in the first sub-aperture file 101 within all apertures 10 of the file to be lithographically processed is 0 degrees. Similarly, the orientation angle of all pixels in the fourth sub-aperture file 101 within all apertures 10 of the file to be lithographically processed is -45 degrees. After all lithography is completed, the four sub-aperture files 101 on the lithographically processed aperture 10 are nested but not superimposed. Using this method is equivalent to performing four 150dpi data files on the same aperture 10 using four sets of sub-aperture files 101, undergoing four lithography processes. This effect is equivalent to performing point-sampling lithography at four angles on a 300dpi data file, with the 300dpi data file having four times the data volume of the 150dpi file.

[0040] The second scenario differs from the first in that the orientation angles of the pixels within the same data file are different. Specifically, assuming the orientation angles at different positions in the first set of data files are 0 degrees, 90 degrees, 45 degrees, and -45 degrees respectively, during photolithography, the orientation angles are determined according to this correspondence. Thus, after the first set of data files is completed using the first photolithography, the orientation angles of the first sub-aperture file 101 at different positions are 0 degrees, 90 degrees, 45 degrees, and -45 degrees. The second photolithography is performed in the same manner, assuming the orientation angles at different positions in the second set of data files are 45 degrees, -45 degrees, 90 degrees, and 0 degrees respectively. During photolithography, the orientation angles are determined according to this correspondence, and the second sub-aperture file 101 is embedded to one side of the first sub-aperture file 101 and adjacent to it. Alternatively, it may not be adjacent to the first sub-aperture file 101; the specific arrangement depends on the pattern of the sub-aperture files 101 during generation. Thus, after the second lithography completes the first set of data files, the orientation angles of the second sub-aperture file 101 at different positions include 45 degrees, -45 degrees, 90 degrees, and 0 degrees. Assuming that the orientation angles of the third set of data files at different positions are 90 degrees, 0 degrees, -45 degrees, and 45 degrees respectively, and the orientation angles of the fourth set of data files at different positions are -45 degrees, 45 degrees, 0 degrees, and 90 degrees respectively, after completing all the lithography, the four sub-aperture files 101 are nested but not superimposed on the lithographic aperture 10.

[0041] In this embodiment, the period values ​​are the same in each set of data files; in other implementations, the period values ​​may be different.

[0042] In this embodiment, all sub-aperture files 101 have the same area, and all have the same brightness after photolithography.

[0043] In other embodiments, the areas of each sub-aperture file 101 are different, and after photolithography, the brightness varies, resulting in variations in brightness.

[0044] In the accompanying drawings, the dimensions and relative dimensions of layers and regions are exaggerated for clarity. It should be understood that when an element, such as a layer, region, or substrate, is referred to as "formed on," "disposed on," or "located on" another element, the element may be directly disposed on said other element, or there may be intermediate elements present. Conversely, when an element is referred to as "directly formed on" or "directly disposed on" another element, there are no intermediate elements.

[0045] In this document, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linkage" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to mechanical connections or electrical connections; they can refer to direct connections or indirect connections through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art will understand the specific meaning of these terms based on the specific circumstances.

[0046] In this document, the terms "upper," "lower," "front," "back," "left," "right," "top," "bottom," "inner," "outer," "vertical," and "horizontal," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only used for the clarity of expressing the technical solution and for the convenience of description, and therefore should not be construed as limiting the present invention.

[0047] In this article, the sequential adjectives "first," "second," etc., used to describe elements are merely to distinguish elements with similar attributes and do not imply that the elements described in this way must follow a given order, or be subject to time, space, hierarchy, or other restrictions.

[0048] In this document, unless otherwise stated, “multiple” or “several” means two or more.

[0049] Those skilled in the art will understand that all or part of the steps of the above method embodiments can be implemented by hardware related to program instructions. The aforementioned program can be stored in a computer-readable storage medium, and when executed, the program performs the steps of the above method embodiments. The aforementioned storage medium includes various media capable of storing program code, such as ROM, RAM, magnetic disks, or optical disks.

[0050] In this document, the terms “including,” “comprising,” or any other variations thereof are intended to cover non-exclusive inclusion, which includes not only the elements listed but also other elements not expressly listed.

[0051] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A photolithography method employing a combined aperture, characterized in that, This method uses multiple sets of data files and nested photolithography with multiple sets of sub-aperture files to perform photolithography within the same aperture, so that a combination of gratings with different angles or periods is formed within the sub-aperture file formed by photolithography. The method includes the following steps: Design the required graphics and process them to form a graphic bitmap; Generate n sets of data files from the aforementioned graphic bitmap; Determine the aperture size based on actual needs; Divide the aperture into k sub-aperture files; Photolithography involves photolithographically mapping the n sets of data files to the k sub-aperture files in a one-to-one correspondence, where n=k.

2. The photolithography method using a combined aperture as described in claim 1, characterized in that, The data file includes location coordinates, as well as the orientation angle and period corresponding to the location coordinates.

3. The photolithography method using a combined aperture as described in claim 2, characterized in that, The orientation angle and period of any two sets of data files are different by at least one parameter; that is, the orientation angle and period at the same position coordinates in different data files are different by at least one parameter.

4. The photolithography method using a combined aperture as described in claim 3, characterized in that, The orientation angles of any two sets of data files in the n sets of data files are the same, but the periods are different; or the orientation angles are different, but the periods are the same; or the orientation angles and periods are both different.

5. The photolithography method using a combined aperture as described in claim 2 or 3, characterized in that, Within the same data file, the orientation angle and / or period are all the same, or at least one of the orientation angle and / or period is different.

6. The photolithography method using a combined aperture as described in claim 1, characterized in that, The actual requirement is the resolution used in photolithography to generate graphic files for products.

7. The photolithography method using a combined aperture as described in claim 1, characterized in that, The n sets of data files include a first set of data files, a second set of data files, and so on, arranged in a certain pattern. The k sub-aperture files are arranged in a certain pattern to form a first sub-aperture file, a second sub-aperture file, and so on, up to the kth sub-aperture file.

8. The photolithography method using a combined aperture as described in claim 7, characterized in that, On the aperture, the sub-aperture files in the k sub-aperture files are nested but not superimposed.

9. The photolithography method using a combined aperture as described in claim 1, characterized in that, The aperture is divided into k sub-aperture files in any way or at any ratio, wherein the arbitrary way means that the graphics of each sub-aperture file are the same or different, and the arbitrary ratio means that the sizes of each sub-aperture file are the same or different.

Images