Display device and method for manufacturing the same

Abstract

An embodiment of the present invention discloses a display device and a manufacturing method thereof. In a specific embodiment, the display device includes a display panel and a lens structure array disposed on the light-emitting side of the display panel. The display panel includes a substrate and sub-pixels arranged in an array on the substrate. The lens structure array includes lens structures corresponding to the sub-pixels one by one. The lens structure is a plano-convex lens structure, including a first lens layer, a spacer layer, and a second lens layer stacked. The first lens layer and the second lens layer are organic lens layers respectively, and the spacer layer is an inorganic spacer layer. By designing the lens as a structure of an organic lens layer, an inorganic spacer layer, and an organic lens layer stacked, it becomes possible to lift the arch height of the lens to more than 3 μm to match the pixel size of the display panel while achieving complete close contact between adjacent lenses, thereby obtaining a better display effect.

Description

Technical Field

[0001] The present invention relates to the field of display technologies. More specifically, it relates to a display device and a manufacturing method thereof. Background Art

[0002] Currently, in the optical structure design of 3D displays, most of the lenses (specifically plano-convex lenses) are manufactured using the thermal reflow process. Specifically, restricted by the exposure process, the formed lenses are usually columnar after development, and then the thermal reflow process is used to heat and melt the columnar bodies, and under the action of surface tension, lenses with curved surfaces are formed, such as lenses that are generally hemispherical as a whole. Among them, on the one hand, for 3D displays, adjacent lenses need to be completely in close contact to obtain a better display effect; on the other hand, in order to match the pixel size (Pixel CD) of the current mainstream display panel, the arch height of the lens needs to be increased to more than 3 μm. However, the inventor found that the thickness of the currently used thermal reflow adhesive material is generally only 2 μm, and in addition, the thermal reflow effect will cause the bottom area to expand. Therefore, to ensure that adjacent lenses are in close contact, the arch height of the lens can only be below 1.0 μm, which is very different from the arch height of more than 3 μm of the lens that can match the pixel size. That is, it is difficult to balance the close contact of adjacent lenses and the arch height of more than 3 μm of the lens. Summary of the Invention

[0003] The purpose of the present invention is to provide a display device and a manufacturing method thereof to solve at least one of the problems existing in the prior art.

[0004] To achieve the above purpose, the present invention adopts the following technical solutions:

[0005] In a first aspect of the present invention, a display device is provided, including: a display panel and a lens structure array disposed on the light-emitting side of the display panel, the display panel including a substrate and sub-pixels arranged in an array on the substrate, and the lens structure array including lens structures corresponding to each sub-pixel one by one;

[0006] The lens structure is a plano-convex lens structure, including a first lens layer, a spacer layer, and a second lens layer stacked, the first lens layer and the second lens layer are respectively organic lens layers, and the spacer layer is an inorganic spacer layer.

[0007] Optionally, in the direction perpendicular to the substrate, the maximum distance between the curved surface and the plane of the lens structure is greater than 3 μm.

[0008] Optionally, in the lens structure array, the curved surfaces of adjacent lens structures are in contact.

[0009] Optionally, the refractive index of the first lens layer is the same as that of the second lens layer; and for the red light band, the green light band, and the blue light band, the difference between the refractive index of the spacer layer and the refractive index of the first lens layer is less than a preset threshold value.

[0010] Optionally, the material of the spacer layer is one or any combination of silicon oxynitride, silicon nitride, and silicon oxide.

[0011] Optionally, the thickness of the spacer layer is 0.2 μm - 0.3 μm.

[0012] A second aspect of the present invention provides a manufacturing method of a display device, including:

[0013] Providing a display panel, where the display panel includes a substrate and sub-pixels arranged in an array on the substrate;

[0014] Forming a lens structure array on the light-emitting side of the display panel, where the lens structure array includes lens structures corresponding to each sub-pixel one by one; the lens structure is a plano-convex lens structure, including a first lens layer, a spacer layer, and a second lens layer stacked, the first lens layer and the second lens layer are respectively organic lens layers, and the spacer layer is an inorganic spacer layer.

[0015] Optionally, forming a lens structure array on the light-emitting side of the display panel includes:

[0016] Forming a first lens layer array on the light-emitting side of the display panel, where the first lens layer array includes first lens layers corresponding to each sub-pixel one by one;

[0017] Forming a spacer layer covering the first lens layer array;

[0018] Forming a second lens layer corresponding to each first lens layer on the spacer layer to obtain a lens structure array.

[0019] Optionally, forming a first lens layer array on the light-emitting side of the display panel includes:

[0020] Coating a first organic material layer on the light-emitting side of the display panel, patterning the first organic material layer, and performing a thermal reflow process or a dry etching process on the patterned first organic material layer to obtain a first lens layer array, where the first lens layer is a plano-convex lens layer.

[0021] Optionally, forming a spacer layer covering the first lens layer array includes: forming a spacer layer covering the first lens layer array by using a deposition process.

[0022] Optionally, the formation of the spacer layer covering the first lens layer array by means of a deposition process further includes: by adjusting the process parameters of the deposition process, such that for the red light band, the green light band, and the blue light band, the refractive index difference between the spacer layer and the first lens layer is less than a preset threshold value.

[0023] Optionally, in the direction perpendicular to the substrate, the maximum distance between the curved surface and the plane of the lens structure is greater than 3 μm.

[0024] Optionally, the material of the spacer layer is one or any combination of silicon oxynitride, silicon nitride, and silicon oxide.

[0025] Optionally, the thickness of the spacer layer is 0.2 μm - 0.3 μm.

[0026] Optionally, the material of the spacer layer is one or any combination of silicon oxynitride, silicon nitride, and silicon oxide.

[0027] Optionally, the formation of the second lens layer corresponding to each first lens layer on the spacer layer includes:

[0028] Coating a second organic material layer on the spacer layer, patterning the second organic material layer, and performing a thermal reflow process on the patterned second organic material layer to obtain the second lens layer corresponding to each first lens layer.

[0029] Optionally, the organic material of the second organic material layer is the same as that of the first organic material layer.

[0030] Optionally, in the lens structure array, the second lens layers of adjacent lens structures are in contact with each other.

[0031] The beneficial effects of the present invention are as follows:

[0032] In the technical solution of the present invention, by designing the lens as a structure of stacked organic lens layers, inorganic spacer layers, and organic lens layers, it becomes possible to achieve a more excellent display effect by raising the arch height of the lens to more than 3 μm to match the pixel size of the display panel while achieving complete close contact between adjacent lenses. Description of the Drawings

[0033] The following further describes in detail the specific embodiments of the present invention with reference to the drawings.

[0034] Figure 1 Showing a cross-sectional schematic diagram of an OLED display device provided by an embodiment of the present invention.

[0035] Figure 2 Showing a comparison diagram of the N / K curves of silicon oxynitride and the lens layer material.

[0036] Figures 3 - 9 The cross-sectional schematic diagrams corresponding to each stage in the manufacturing process of the OLED display device provided by the embodiments of the present invention are shown. Specific embodiments

[0037] In the present invention, the terms "on...", "formed on...", and "disposed on..." may mean that one layer is directly formed or disposed on another layer, or may mean that one layer is indirectly formed or disposed on another layer, that is, there are other layers between the two layers.

[0038] It should be noted that although terms such as "first", "second", etc. may be used herein to describe various components, members, elements, regions, layers, and / or parts, these components, members, elements, regions, layers, and / or parts should not be limited by these terms. Instead, these terms are used to distinguish one component, member, element, region, layer, and / or part from another. Thus, for example, the first component, the first member, the first element, the first region, the first layer, and / or the first part discussed below may be referred to as the second component, the second member, the second element, the second region, the second layer, and / or the second part without departing from the teachings of the present invention.

[0039] In the present invention, unless otherwise specified, the term "co-layered setting" means that two layers, components, members, elements, or parts can be formed by the same manufacturing process (such as a patterning process, etc.), and generally, these two layers, components, members, elements, or parts are formed of the same material. For example, the co-layered setting of two or more functional layers means that these co-layered functional layers can be formed using the same material layer and the same manufacturing process, thereby simplifying the manufacturing process of the display substrate.

[0040] In the present invention, unless otherwise specified, the expression "patterning process" generally includes steps such as coating of photoresist, exposure, development, etching, stripping of photoresist, etc. The expression "one patterning process" means a process of forming a patterned layer, component, member, etc. using one mask.

[0041] Currently, in the optical structure design of 3D displays, most of the lenses (specifically plano-convex lenses) are fabricated using the thermal reflow process. Specifically, due to the limitations of the exposure process, the formed lenses (Lens) usually appear as columnar bodies after development. Then, the thermal reflow process is used to heat and melt the columnar bodies, and under the action of surface tension, lenses with curved surfaces are formed, obtaining lenses that are, for example, hemispherical as a whole. Among them, on the one hand, for 3D displays, adjacent lenses need to be completely in close contact to achieve better display effects; on the other hand, in order to match the pixel size (Pixel CD) of the current mainstream display panel, the arch height of the lenses needs to be increased to more than 3μm. However, the inventors found that the thickness of the currently used thermal reflow adhesive material is generally only 2μm, and in addition, the thermal reflow effect will cause the bottom area to expand. Therefore, to ensure close contact between adjacent lenses, the lens arch height can only be below 1.0μm, which is very different from the lens arch height of more than 3μm that can match the pixel size. That is, it is difficult to balance the close contact between adjacent lenses and the lens arch height of more than 3μm. Further, the inventors found that if the thermal reflow adhesive material is coated twice and secondary thermal reflow is performed in order to increase the arch height of the lenses, the secondary thermal reflow will cause the lenses formed by the first thermal reflow to continue to melt thermally, resulting in mutual dissolution of the adhesive materials, and actually having no obvious effect on increasing the lens arch height.

[0042] In view of this, an embodiment of the present invention provides an OLED display device, as Figure 1 shown, the OLED display device includes a display panel 100 and a lens structure array disposed on the light-emitting side of the display panel 100.

[0043] Among them,

[0044] The display panel 100 includes a substrate 101 and sub-pixels arranged in an array on the substrate 101.

[0045] In a specific example, the display panel 100 includes a substrate 101 and a barrier layer, a buffer layer, a driving circuit layer (or a thin film transistor layer), a planarization layer, a light-emitting device layer, a packaging layer 106, and a color filter layer 107 formed in sequence on the substrate 101. The following briefly introduces each film layer of the display panel 100 and its manufacturing method. Among them, it should be noted that Figure 1 only shows the part of these film layers that is convenient for reflecting the sub-pixels. Figure 1

[0046] For the substrate 101, it can be made of materials such as glass and quartz.

[0047] ​For the barrier layer and the buffer layer, for example, the barrier layer and the buffer layer can be formed over the entire surface of the substrate. For example, the barrier layer can be made of an inorganic insulating material such as silicon oxide, silicon nitride, or silicon oxynitride, and the buffer layer can also be made of an inorganic insulating material such as silicon oxide, silicon nitride, or silicon oxynitride. The barrier layer helps to block water and oxygen from entering the subsequently formed film layer from the bottom. The buffer layer is beneficial to the quality of subsequent material deposition.

[0048] For the driving circuit layer, a patterning process can be used to form an active layer on the buffer layer; a gate insulating layer can be formed on the active layer by means of deposition or the like; a gate electrode can be formed on the gate insulating layer by a patterning process; an interlayer dielectric layer can be formed on the gate electrode by means of deposition or the like; then, the interlayer dielectric layer is etched to form a via hole exposing the active layer. After the via hole in the interlayer dielectric layer is formed, a source electrode, a drain electrode, and a signal line electrically connected to one of the source electrode or the drain electrode are formed. Among them, the active layer can be made of materials such as polysilicon and metal oxides, the gate insulating layer can be made of an inorganic insulating material such as silicon oxide, silicon nitride, or silicon oxynitride, and the interlayer dielectric layer can be made of an inorganic insulating material such as silicon oxide, silicon nitride, or silicon oxynitride. The gate electrode material includes metals or alloy materials such as aluminum, titanium, and cobalt. During fabrication, first, a layer of gate electrode material layer is formed by means of sputtering or evaporation, and then a patterning process is performed on the gate electrode material layer to form a patterned gate electrode. Those skilled in the art can understand that the above thin film transistor takes the top gate structure as an example, but the present invention is not limited thereto, and the bottom gate structure is also included within the scope of the present invention.

[0049] For the planarization layer, a layer of planarization layer material, such as an organic material, with a thickness of about 1 μm - 3 μm, can be deposited to cover the driving circuit layer, and then, using a patterning process, it is patterned to form an opening at the position corresponding to the other one of the above source electrode and drain electrode (the source electrode in the figure).

[0050] For the light-emitting device layer, first, the anode layer metal of the OLED can be deposited in the openings of the planarization layer and patterned to form the anode 102 (the anode 102 is connected to the source electrode). Exemplarily, the material of the anode 102 includes metal oxides such as ITO and IZO, or metals such as Ag, Al, and Mo, or their alloys. Then, the pixel definition layer 103 surrounding the anode 102 can be formed by a patterning process. Specifically, a layer of pixel definition layer material is deposited, for example, with a thickness of about 1 μm - 2 μm, and the pixel definition layer 103 is formed by a patterning process. Exemplarily, the material of the pixel definition layer 103 can include organic insulating materials such as negative photoresist, polyimide, and epoxy resin. Then, the light-emitting layer 104 covering the anode 102, the pixel definition layer 103, and the exposed planarization layer is formed by printing or evaporation, etc., where the material of the light-emitting layer is an organic material; finally, the cathode 105 is formed. For example, the cathode 105 is formed over the entire surface. The material of the cathode 105 can include metals such as Mg, Ca, Li, or Al, or their alloys, or metal oxides such as IZO and ZTO, or organic materials with conductive properties such as PEDOT / PSS (poly(3,4-ethylenedioxythiophene) / polystyrene sulfonate). Among them, the anodes corresponding to the respective sub-pixels are isolated from each other, while the cathodes corresponding to the respective sub-pixels are connected to each other. An auxiliary light-emitting layer that helps the light-emitting layer 104 emit light can also be formed between the anode 102 and the light-emitting layer 104 and between the light-emitting layer 104 and the cathode 105, for example, including one or more of an electron transport layer, an electron injection layer, a hole transport layer, and a hole injection layer. The auxiliary light-emitting layer is, for example, an organic material layer.

[0051] For the encapsulation layer 106, after the light-emitting device layer is formed, the encapsulation layer 106 can be formed. For example, the encapsulation layer 106 can include a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer. For example, the first inorganic encapsulation layer and the second inorganic encapsulation layer are formed by deposition or the like. The organic encapsulation layer is formed by inkjet printing. For example, the first inorganic encapsulation layer and the second inorganic encapsulation layer can be formed of inorganic materials such as silicon nitride, silicon oxide, and silicon oxynitride, and the organic encapsulation layer can be formed of organic materials such as polyimide (PI) and epoxy resin. Thus, the first inorganic encapsulation layer, the organic encapsulation layer, and the second inorganic encapsulation layer form a composite encapsulation layer, which can provide multiple protections for the functional structures in the display area and has a better encapsulation effect.

[0052] For the color film layer 107, its black matrix 1071, and multiple filter layers 1072 defined by the black matrix 1071 and corresponding one by one to the anodes 102 arranged in an array. For example, for the light-emitting layer corresponding to the anode 102, white light is emitted, and the filter layer 1072 in the color film layer 107 is used to form colored light from the incident white light. The filter layer 1072 in the color film layer 107 generally includes a red light filter layer, a green light filter layer, and a blue light filter layer. When white light is incident on the color film layer 107, RGB monochromatic light is formed through RGB filtering, realizing the color display function of the OLED display panel. In practical applications, in order to avoid interference between adjacent filter layers 1072, that is, to avoid interference between different monochromatic lights, a black matrix (Black Matrix, BM) 1071 is provided between adjacent filter layers 1072 in the color film layer 107. Intuitively, the projection area of a filter layer 1072 in the direction perpendicular to the substrate 101 is a sub-pixel area of the display panel 100.

[0053] In addition, for the display panel 100, other necessary functional film layers can also be formed, such as storage capacitors, etc. These film layers can be formed by conventional methods and will not be elaborated here.

[0054] The following introduces the structure of the lens structure array.

[0055] As Figure 1 shown, the lens structure array includes lens structures 200 corresponding one by one to the sub-pixels of the display panel 100. The lens structure 200 is a plano-convex lens structure, including a first lens layer 201, a spacer layer 202, and a second lens layer 203 arranged in a stacked manner. The first lens layer 201 and the second lens layer 203 are respectively organic lens layers, and the spacer layer 202 is an inorganic spacer layer.

[0056] Thus, in the OLED display device provided in this embodiment, by designing the lens structure 200 that is a lens as a whole into a first lens layer 201 made of an organic material, a spacer layer 202 made of an inorganic material, and a second lens layer 203 made of an organic material arranged in a stacked manner, it becomes possible to lift the arch height of the lens structure 200 that is a lens as a whole to more than 3 μm to match the pixel size of the display panel 100 while achieving complete close contact between adjacent lens structures 200 to obtain a better display effect.

[0057] In a possible implementation manner, in the direction perpendicular to the substrate 101, the maximum distance between the curved surface and the plane of the lens structure 200 is greater than 3 μm, that is, the arch height of the plano-convex lens formed by the first lens layer 201, the spacer layer 202, and the second lens layer 203 is greater than 3 μm. In this way, the matching between the lens and the pixel size of the display panel 100 can be achieved.

[0058] In a specific example, the curved surface of the lens structure 200 is a part of a spherical surface, an ellipsoidal surface or a conical surface. For example, Figure 1 as shown, one side of the lens structure 200 close to the display panel 100 is a plane, and the side away from the display panel 100 is a curved surface convex in the direction away from the display panel 100. For example, Figure 1 as shown, the curved surface can be a hemispherical curved surface. In addition, as Figure 1 shown, in the lens structure 200, the first lens layer 201 is a plano-convex lens layer such as a hemispherical lens layer, and the spacer layer 202 and the second lens layer 203 formed successively on the first lens layer 201 are respectively film layers with a substantially uniform thickness. In this way, the lens structure 200 forms a plano-convex lens structure such as a hemispherical lens structure.

[0059] In a possible implementation, in the lens structure array, the curved surfaces of adjacent lens structures 200 are in contact, that is, the adjacent lens structures 200 are in complete close contact, so as to obtain a better display effect. It can be understood that for the lens structure 200 as a plano-convex lens structure, as Figure 1 shown, the contact of the curved surfaces of adjacent lens structures 200 means the contact of the second lens layers 203 of adjacent lens structures 200.

[0060] In a possible implementation, the refractive index of the first lens layer 201 is the same as that of the second lens layer 203; and for the red light band, the green light band and the blue light band, the difference between the refractive index of the spacer layer 202 and the refractive index of the first lens layer 201 is less than a preset threshold.

[0061] Ideally, the refractive indices of the first lens layer 201, the spacer layer 202, and the second lens layer 203 of the lens structure 200 are exactly the same to completely eliminate the cross-sectional effect of the lens structure 200 and optimize the display effect. However, in practice, both the first lens layer 201 and the second lens layer 203 are made of organic materials, and the same refractive index can be achieved through consistent materials. Since the spacer layer 202 is made of inorganic materials to play the role of spacing when preparing the first lens layer 201 and the second lens layer 203, it is difficult to achieve the same refractive index as the first lens layer 201 and the second lens layer 203. Therefore, in this implementation, the cross-sectional effect of the lens structure 200 is avoided as much as possible by limiting the refractive index difference between the spacer layer 202 and the first lens layer 201. For the specific limiting method, the refractive index of the spacer layer 202 can be adjusted by selecting the material of the spacer layer 202 and setting the manufacturing process parameters, etc., to make it as close as possible to the refractive index of the first lens layer 201. In addition, since the display panel 200 emits red, green, and blue light, the refractive index of the spacer layer 202 only needs to be close to the refractive index of the first lens layer 201 in the red light band (red light wavelength range 590nm - 660nm), the green light band (green light wavelength range 500nm - 570nm), and the blue light band (blue light wavelength range 310nm - 340nm). Whether it is close in other bands has little impact on the display effect.

[0062] Further, the preset threshold is 0.02, that is, for the red light band, the green light band, and the blue light band, the refractive index difference between the spacer layer 202 and the first lens layer 201 is less than 0.02.

[0063] In a possible implementation, the material of the spacer layer 202 is silicon oxynitride (SiON x ), silicon nitride (SiN x ), silicon dioxide (SiO2), or any combination thereof. Among them, taking the material of the spacer layer 202 as silicon oxynitride (SiON x ) as an example, the refractive index of silicon oxynitride (SiON x ) is relatively close to the refractive index of the organic material of the first lens layer 201, and both silicon oxynitride (SiON x ) and the organic material of the first lens layer 201 have the trend of high refractive index in the low band and low refractive index in the high band. Further, the refractive index of silicon oxynitride (SiON x ) of the spacer layer 202 can be made closer to the organic material of the first lens layer 201 by adjusting the gas flow parameters of the process such as Plasma Enhanced Chemical Vapor Deposition (PECVD) used for depositing silicon oxynitride (SiON x ), such asFigure 2 As shown, their refractive indices N in the wavelength band of 380 nm - 880 nm are almost the same, and the difference can be less than 0.01. Additionally, their extinction coefficients K in the wavelength band of 380 nm - 880 nm are respectively less than 0.0001, that is, their transmittances are both very high, which can meet the requirements for lens materials.

[0064] In a possible implementation, the thickness of the spacer layer 202 is 0.2 μm - 0.3 μm. On the one hand, although the refractive index of the spacer layer 202 is very close to that of the first lens layer 201 and the second lens layer 203, it cannot be exactly the same. Therefore, if the spacer layer 202 is too thick, it is not conducive to eliminating the cross-section effect. On the other hand, if the spacer layer 202 is too thin, it cannot effectively play the role of spacing during the preparation of the first lens layer 201 and the second lens layer 203 and cannot play a supporting role. In summary, in this implementation, the thickness of the spacer layer 202 is set to 0.2 μm - 0.3 μm to balance the elimination of the cross-section effect and the effective spacing and supporting functions.

[0065] In a specific example, the first lens layer 201 is a plano-convex lens layer such as a hemispherical lens layer. In the direction perpendicular to the substrate 101, the maximum distance (i.e., the arch height) between its curved surface and the plane is about 1.9 μm, the diameter of its plane is about 3.8 μm, the thickness of the spacer layer 202 formed on the first lens layer 201 is 0.2 μm - 0.3 μm, the thickness of the second lens layer 203 is 1.2 μm - 1.3 μm, and in the direction perpendicular to the substrate 101, the maximum distance (i.e., the arch height) between the curved surface and the plane of the lens structure 200 is about 3.5 μm, and the curved surfaces of adjacent lens structures 200 can be made to abut (i.e., the second lens layers 203 of adjacent lens structures 200 abut).

[0066] It can be understood that based on the inventive concept of the lens structure provided by this embodiment with alternating organic lens layers and inorganic spacer layers, if necessary, it is not limited to the three-layer (first lens layer, spacer layer, and second lens layer) lens structure provided by this embodiment, but can be a four-layer, five-layer or even more-layer structure. Theoretically, the arch height of the lens structure can be increased to any height under the condition of controlling the bottom (plane) size of the lens structure.

[0067] Another embodiment of the present invention provides a manufacturing method for an OLED display device, and this manufacturing method can manufacture the OLED display device provided by the above embodiment.

[0068] This manufacturing method includes the following steps:

[0069] First, manufacture the display panel 100 to obtain as Figure 3The structure shown. Among them, the display panel 100 includes a substrate 101 and sub-pixels arranged in an array on the substrate 101. Regarding the specific manufacturing process of each film layer in the display panel 100, reference can be made to the brief introduction part of each film layer and its manufacturing method of the display panel 100 in the foregoing embodiments, which will not be elaborated here.

[0070] Then, a first organic material layer 201`` is coated on the light-emitting side of the display panel 100 to obtain a structure as Figure 4 shown.

[0071] Then, the first organic material layer 201`` is patterned, such as by exposure and development, to form a first organic material pattern 201` arranged in an array corresponding to each sub-pixel one by one, obtaining a structure as Figure 5 shown.

[0072] Then, a thermal reflow process or a dry etching process is performed on the first organic material pattern 201` arranged in an array to obtain a first lens layer array. Among them, the first lens layer array includes a first lens layer 201 corresponding to each sub-pixel one by one. The first lens layer 201 is a plano-convex lens layer such as a hemisphere. For example, its arch height is about 1.9 μm and the diameter of the plane is about 3.8 μm, obtaining a structure as Figure 6 shown.

[0073] Then, a spacer layer 202 covering the first lens layer array is formed by using a deposition process of 2 μm - 0.3 μm to obtain a structure as Figure 7 shown. Among them, the thickness of the spacer layer 202 is 0., and the material is, for example, silicon oxynitride (SiON x ). When forming the spacer layer 202 by using, for example, the Plasma Enhanced Chemical Vapor Deposition (PECVD) process, the refractive index of the silicon oxynitride (SiON x ) of the spacer layer 202 can be made closer to the organic material of the first lens layer 201 by adjusting the gas flow rate of the PECVD. In addition, process parameters such as the power and pressure of the PECVD should also be adjusted. For example, a PECVD process with a large pressure and a small power is adopted to avoid damaging the first lens layer 201.

[0074] Then, a second organic material layer 203`` is coated on the spacer layer 202 to obtain a structure as Figure 8 shown, where, for example, the second organic material layer 203`` uses the same organic material as the first organic material layer 201`` to ensure the same refractive index.

[0075] Then, the second organic material layer 203`` is patterned, such as by exposure and development, to form a second organic material pattern 203` arranged in an array corresponding one by one to each first lens layer 201, obtaining a structure as shown in Figure 9 the figure.

[0076] Finally, a thermal reflow process is performed on the second organic material pattern 203` arranged in an array to obtain a second lens layer 203 corresponding one by one to each first lens layer 201, obtaining a structure as shown in Figure 1 the figure, forming a lens structure 200 with an array arrangement and an arch height of approximately 3.5 μm. Among them, the second lens layers 203 of adjacent lens structures 200 can be made to abut, thereby achieving complete close contact between adjacent lens structures 200.

[0077] In summary, the manufacturing method provided in this embodiment manufactures the lens structure 200 by first manufacturing the organic first lens layer 201, then depositing the inorganic spacer layer 202, and finally manufacturing the organic second lens layer 203 on the inorganic spacer layer 202. It can achieve complete close contact between adjacent lens structures 200 while raising the arch height of the lens structure 200 to more than 3 μm. Moreover, by selecting the inorganic material of the spacer layer 202 and adjusting the deposition process parameters, the fitting of the organic layer and the inorganic layer can be achieved, and the cross-section effect can be basically eliminated.

[0078] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, rather than limitations on the implementation manners of the present invention. For those of ordinary skill in the art, other different forms of changes or variations can be made based on the above description. It is impossible to list all the implementation manners here. Any obvious changes or variations derived from the technical solutions of the present invention still fall within the protection scope of the present invention.

Claims

1. A display device, characterized in that, Comprising: A display panel and a lens structure array disposed on the light-emitting side of the display panel. The display panel includes a substrate and sub-pixels arranged in an array on the substrate. The lens structure array includes lens structures corresponding to each sub-pixel one by one. The lens structure is a plano-convex lens structure, including a first lens layer, a spacer layer, and a second lens layer stacked. The first lens layer and the second lens layer are respectively organic lens layers, the spacer layer is an inorganic spacer layer. The first lens layer is prepared based on a thermal reflow process or a dry etching process, and the second lens layer is prepared based on a thermal reflow process. In the direction perpendicular to the substrate, the maximum distance between the curved surface and the plane of the lens structure is greater than 3 μm. In the lens structure array, the curved surfaces of adjacent lens structures are in contact.

2. The display device according to claim 1, wherein The refractive indices of the first lens layer and the second lens layer are the same; and for the red light band, the green light band, and the blue light band, the refractive index difference between the spacer layer and the refractive index of the first lens layer is less than a preset threshold.

3. The display device according to claim 2, wherein The material of the spacer layer is one or any combination of silicon oxynitride, silicon nitride, and silicon oxide.

4. The display device according to claim 1, characterized in that, The thickness of the spacer layer is 0.2 μm - 0.3 μm.

5. A manufacturing method of a display device, characterized in that, Comprising: Providing a display panel, the display panel includes a substrate and sub-pixels arranged in an array on the substrate. Forming a lens structure array on the light-emitting side of the display panel. The lens structure array includes lens structures corresponding to each sub-pixel one by one. The lens structure is a plano-convex lens structure, including a first lens layer, a spacer layer, and a second lens layer stacked. The first lens layer and the second lens layer are respectively organic lens layers, the spacer layer is an inorganic spacer layer. The first lens layer is prepared based on a thermal reflow process or a dry etching process, and the second lens layer is prepared based on a thermal reflow process. In the direction perpendicular to the substrate, the maximum distance between the curved surface and the plane of the lens structure is greater than 3 μm. In the lens structure array, the curved surfaces of adjacent lens structures are in contact.

6. The method according to claim 5, wherein Forming a lens structure array on the light-emitting side of the display panel includes: Forming a first lens layer array on the light-emitting side of the display panel. The first lens layer array includes first lens layers corresponding to each sub-pixel one by one. Forming a spacer layer covering the first lens layer array. Forming second lens layers corresponding to each first lens layer on the spacer layer to obtain a lens structure array.

7. The method according to claim 6, wherein The forming a first lens layer array on the light-emitting side of the display panel includes: Coating a first organic material layer on the light-emitting side of the display panel, patterning the first organic material layer, and performing a thermal reflow process or a dry etching process on the patterned first organic material layer to obtain a first lens layer array, where the first lens layer is a plano-convex lens layer.

8. The method according to claim 6, wherein The forming a spacer layer covering the first lens layer array includes: forming a spacer layer covering the first lens layer array by a deposition process.

9. The method according to claim 8, characterized in that, The formation of the spacer layer covering the first lens layer array by using a deposition process further includes: by adjusting the process parameters of the deposition process, for the red light band, the green light band, and the blue light band, the refractive index difference between the spacer layer and the first lens layer is less than a preset threshold value.

10. The method according to claim 9, characterized in that The material of the spacer layer is one or any combination of silicon oxynitride, silicon nitride, and silicon oxide.

11. The method according to claim 5, characterized in that, The thickness of the spacer layer is 0.2 μm - 0.3 μm.

12. The method according to claim 7, wherein The formation of the second lens layer corresponding to each first lens layer on the spacer layer includes: Coating a second organic material layer on the spacer layer, patterning the second organic material layer, and performing a thermal reflux process on the patterned second organic material layer to obtain the second lens layer corresponding to each first lens layer.

13. The method according to claim 12, wherein The organic material of the second organic material layer is the same as that of the first organic material layer.

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