Method for manufacturing polar anisotropic magnet, method for manufacturing magnet assembly, polar anisotropic magnet, magnet assembly, and composite magnet assembly

Abstract

The present invention relates to a manufacturing method of a polar anisotropic magnet 1N, 1S having four surfaces SF1, SF2, SF3, SF4, characterized by: a magnetic field forming step S20 of simultaneously applying a magnetic field of a first direction to an effective surface VSF (SF1) among the four surfaces and applying a magnetic field of a second direction to the remaining three surfaces (SF2, SF3, SF4), and forming a magnetic field; and a quadrilateral magnetization step S40 of magnetizing after applying a magnetic field of the first direction to the effective surface VSF (SF1) and applying a magnetic field of the second direction to the remaining three surfaces (SF2, SF3, SF4). The manufacturing method of the polar anisotropic magnet of the present invention has higher design freedom and higher economy than ever before.

Description

Technical Field

[0001] This invention relates to a method for manufacturing anisotropic magnets, a method for manufacturing magnet assemblies, anisotropic magnets, magnet assemblies, and composite magnet assemblies. Background Technology

[0002] As is well known, magnet assemblies composed of so-called Halbach arrays can generate magnetic flux with high flux density. However, realizing a Halbach array is fraught with difficulties because it requires bonding strongly magnetized magnets together under conditions of significant attraction and repulsion, making mass production seem a long way off at present.

[0003] As an alternative technology capable of achieving the same level of magnetic flux density as the Halbach array and with the potential for mass production, Patent Document 1 is known. Figure 3 The structure of the magnet assembly described in Patent Document 1 (hereinafter referred to as the magnet assembly described in Patent Document 1).

[0004] Figure 30 This is a cross-sectional view illustrating the magnet assembly 900 described in Patent Document 1. Arrows drawn inside the magnet assembly 900 indicate the magnetization direction. (Example) Figure 30 As shown, the magnet assembly 900 comprises a cylindrical magnet assembly 900EX located on the outer periphery and a magnet assembly 900IN located on the inner periphery. The magnetization direction of the outer periphery magnet assembly 900EX is an anisotropic arrangement of polarities inclined at an angle θHEX relative to the normal NL of the magnet assembly 900EX. The angle θHEX is an angle greater than 45 degrees and close to 90 degrees; in other words, the magnetization direction of this magnet casting is a shallow "horizontal anisotropic arrangement" formed by the tangent to the outer periphery surface (not shown). On the other hand, the magnetization direction of the inner periphery magnet assembly 900IN is an anisotropic arrangement of polarities inclined at an angle θHIN relative to the same normal NL. The angle θHIN is an angle greater than or equal to 0 degrees and less than 45 degrees; in other words, the magnetization direction of this magnet assembly is a deep "vertical anisotropic arrangement" formed by the tangent to the inner periphery surface (not shown).

[0005] The magnet assembly 900 is obtained by separately manufacturing an outer peripheral magnet assembly 900EX (also known as a cylindrical body 900EX) and an inner peripheral magnet assembly 900IN (also known as a cylindrical body 900IN), and then inserting these cylindrical bodies into each other as a single unit.

[0006] Since the manufacturing methods of the outer peripheral magnet assembly 900EX and the inner peripheral magnet assembly 900IN are basically the same, the description here will focus on the manufacturing of the outer peripheral cylindrical body 900EX. Figure 31 This diagram illustrates a conventional manufacturing method for the magnet assembly 900EX. Figure 31 In the text, (1) represents the mold frame 810 and the magnetic source 820S and 820N used in the magnetic field forming process; (2) represents the magnet base material M1; (3) represents the magnetization process; and (4) represents the magnet assembly 900EX that is taken out after the magnetization process is completed.

[0007] The manufacturing methods for traditional magnet components are roughly as follows.

[0008] First, prepare the powder material for the magnet, mold frame 810, etc. The inner side of the mold frame 810 is cylindrical, conforming to the shape of the final magnet assembly 900EX.

[0009] Next, a magnetic field forming process is performed. After powder material is fed into the inner side 810a of the mold frame 810, a specified magnetic field is applied from the outer side of the mold frame 810 using magnetic sources 820S and 820N, causing the molecules in the powder material to be oriented along the magnetic field lines while forming (see reference). Figure 31 (1)). Magnet matrix M1 is obtained in this way (refer to (1)). Figure 31 (2)). After that, after the necessary intermediate processes (sintering heat treatment process, surface treatment process, etc.), a magnetization process is carried out by applying a specified magnetic field using a magnetic source 830S, 830N (magnetizing yoke, etc.) (see reference). Figure 31 (3)). In this way, the magnet assembly 900EX can be obtained (see reference). Figure 31 (4)).

[0010] [Preliminary Technology Documents]

[0011] Patent Document 1: Japanese Patent Application Publication No. 2010-142082

[0012] However, according to conventional methods for manufacturing magnet components, as described below, there are problems such as high costs and low production rates (e.g., low yield) that prevent economic efficiency from being improved, as well as numerous design constraints.

[0013] For example, in the magnetic field forming process, the mold frame 810 must be re-prepared according to the shape of the final magnet assembly whenever the product specifications change, thus the mold frame cost inevitably increases the overall cost (i.e., the mold frame cost problem).

[0014] When the radial wall thickness of the outer peripheral magnet assembly 900EX is designed to be thin with a small size, breakage sometimes occurs during the sintering heat treatment process after the magnetic field forming process, which reduces the yield (i.e., loss problem).

[0015] To prevent the aforementioned losses, the thickness of the outer peripheral magnet assembly 900EX must be designed to be thicker than the thickness required to achieve the specified performance (this necessitates increasing the design margin). Consequently, the design margin for the radial wall thickness of the inner diameter magnet assembly 900IN is reduced. This results in the inability to achieve the expected ratio between the thickness of the horizontal polarity anisotropic arrangement and the thickness of the vertical radial anisotropic arrangement, thus failing to obtain the desired magnetic properties.

[0016] When changing parameters such as radial thickness and outer diameter of magnet components through model changes, it can lead to problems such as reduced yield and inability to ensure necessary magnetic properties.

[0017] like Figure 32 As shown in (a), when designed to sufficiently ensure the radial thickness of the magnet assembly (referring to thickness T1), near where the magnetic field lines are released to the outside, the orientation direction of the powder after the magnetic field forming process can be ensured at a corresponding angle relative to the outer peripheral surface (which can be set to an angle relatively close to the normal NL). The orientation direction of the powder becomes the magnetization direction after the magnetization process, thus ultimately forming a highly anisotropic magnet assembly with the target magnetic properties. However, as Figure 32 As shown in (b), when designing to reduce the radial thickness (refer to thickness T2), the orientation of the powder can only be ensured at a shallow angle relative to the outer peripheral surface (an angle of approximately 90 degrees relative to the normal NL). As a result, it is impossible to radiate magnetic field lines to the outside with the desired strength, and ultimately the required magnetic properties of the product cannot be ensured.

[0018] In other words, prioritizing the thinning of the magnet assembly will deprive the design freedom of the orientation direction (magnetization direction), while prioritizing the orientation direction (magnetization direction) will deprive the design freedom of the magnet assembly's thickness.

[0019] Furthermore, in the past, in order to obtain anisotropic magnets (e.g., those constituting part of the outer peripheral magnet assembly) Figure 30 (The polarity of the anisotropic magnet enclosed by the dashed line C) is also a subject of much discussion regarding mass production.

[0020] When assembly is required in a magnetized state, magnets 905 and 906, after being magnetized in a roughly horizontal direction, are brought together with their same magnetic poles facing each other and are joined together under the condition of generating a large repulsive force. Therefore, it is difficult to mass-produce them (the same applies to the anisotropic polarity of magnets 907 and 908 within the dashed line D).

[0021] Incidentally, if the base materials used in the previous magnetization processes before becoming magnet 905 or magnet 906 are "assumed to be base materials 905' and 906' (illustrations omitted)," then there will be no repulsive force between base materials 905' and 906', making them easy to bond. However, considering that the magnetization method in the subsequent magnetization process has not yet been established, this will make mass production difficult. Figure 30 The dashed lines D and C indicate anisotropic magnets.

[0022] Therefore, the present invention was made in view of the above circumstances, and its object is to provide a method for manufacturing a polar anisotropic magnet and a method for manufacturing a magnet assembly that offer higher design freedom and greater economic efficiency than before. A further object of the present invention is to provide a polar anisotropic magnet, a magnet assembly, and a composite magnet assembly. Summary of the Invention

[0023] [1] The present invention relates to a method for manufacturing anisotropic magnets, for manufacturing four faces that, when viewed in section, face four directions respectively, characterized in that it comprises, in sequence: a powder material preparation step for preparing powder material for magnets; a magnetic field forming step in which, when the face among the four faces that should generate magnetic flux is designated as the effective face, the powder material is sequentially fed into the inner side of the mold frame from the outside of the mold frame corresponding to the desired shape of the anisotropic magnet, while applying a magnetic field in a first direction to the imaginary effective face and applying a magnetic field in a second direction to the remaining three faces respectively, thereby forming a magnet base material according to the shape of the mold frame; and a four-directional magnetization step in which the first magnetic field is applied to the effective face of the magnet material and the second magnetic field is applied to the remaining three faces in a manner that surrounds the magnet material obtained based on the magnet base material, thereby magnetizing the magnet material.

[0024] [6] The polar anisotropic magnet of the present invention has four faces facing four directions respectively when viewed in cross-section. The feature is that when the face that should generate magnetic flux is designated as the effective face among the four faces, a magnetic pole is arranged on the effective face, and another magnetic pole is arranged on the other three faces among the four faces besides the effective face. When viewed in cross-section, the interior of the polar anisotropic magnet is formed continuously without joint marks.

[0025] [8] The magnet assembly of the present invention is characterized in that it comprises: a plurality of the above-mentioned anisotropic magnets, which are arranged in such a manner that one magnetic pole and the other magnetic pole appear alternately and then joined together to form the magnet assembly.

[0026]

[13] The present invention relates to a method for manufacturing a magnet assembly, for manufacturing a cylindrical magnet assembly, characterized in that it comprises, in sequence: a powder material preparation step for preparing a powder material for magnets; a magnetic field forming step for forming a magnet base material having a first main surface and a second main surface located opposite to the first main surface, wherein, in the magnetic field forming step, the powder material is fed into the inner side of a mold frame corresponding to the shape of the magnet base material, and a parallel magnetic field in a single direction is applied from the outer side of the mold frame corresponding to the first main surface to the side corresponding to the second main surface to form the magnet base material; and a cutting step, wherein, when assembling the magnet assembly, the surface that should become the outer diameter surface of the magnet assembly is defined as "specified outer diameter surface". When defining the inner diameter surface as "specified inner diameter surface", the cutting line of the specified outer diameter surface is set to be inclined at an angle θ1 relative to the first main surface, and the magnet base material is cut along the cutting line of the specified outer diameter surface. The cutting line of the specified inner diameter surface is set to be inclined at an angle θ2 relative to the first main surface, and the magnet base material is cut along the cutting line of the specified inner diameter surface, thereby cutting at least a magnet base material part with the specified outer diameter surface and the specified inner diameter surface as the outer surface; the assembly process is to assemble multiple magnet base material parts into a magnet base material assembly; and the magnetization process is to apply a specified magnetic field from the outside of the magnet base material assembly to a specified position to magnetize the magnet base material assembly.

[0027]

[22] The magnet assembly of the present invention is characterized in that it comprises: a magnet block having a generally planar outer diameter surface and an inner diameter surface, and being magnetized at a predetermined angle and parallel in a single direction relative to the outer diameter surface and the inner diameter surface, wherein a plurality of the magnet blocks are joined together via surfaces other than the outer diameter surface and the inner diameter surface.

[0028]

[23] The composite magnet assembly of the present invention is characterized in that it comprises: a magnet assembly of the first aspect according to claim 8, wherein the angle of each of the magnet blocks relative to the magnetization direction of the outer diameter surface and the inner diameter surface is a first angle; and a magnet assembly of the second aspect according to claim 8, wherein the angle of each of the magnet blocks relative to the magnetization direction of the outer diameter surface and the inner diameter surface is a second angle, wherein the magnet assembly of the first aspect is disposed on one side that should become the effective H magnetic flux surface of the composite magnet assembly, the magnet assembly of the second aspect is disposed on one side that should become the effective V magnetic flux surface of the composite magnet assembly, and the magnet assembly of the first aspect and the magnet assembly of the second aspect are joined together to form the composite magnet assembly.

[0029]

[21] The present invention relates to another form of a method for manufacturing anisotropic magnets, for manufacturing anisotropic magnets having four faces in cross-sectional view, characterized in that it comprises, in sequence: a powder material preparation step for preparing powder material for magnets; a magnetic field forming step for forming a magnet base material having a first main face and a second main face located opposite to the first main face, wherein the powder material is fed into the inside of a mold frame corresponding to the shape of the magnet base material, and a parallel magnetic field in a single direction is applied from the outside of the mold frame corresponding to the first main face to the side corresponding to the second main face to form the magnet base material; a cutting step, wherein when assembling the anisotropic magnet into a magnet assembly, when defining the face that should be the outer diameter face of the magnet assembly as a "prescribed outer diameter face" and the face that should be the inner diameter face as a "prescribed inner diameter face", the cutting line of the prescribed outer diameter face is set to be inclined at an angle θ1 relative to the first main face and then cut along the cutting line of the prescribed outer diameter face, and the cutting line of the prescribed inner diameter face is set to be inclined at an angle θ2 relative to the first main face and then cut along the cutting line of the prescribed outer diameter face. The magnet base material is cut with a cutting line on the specified inner diameter surface, thereby cutting at least a magnet base material component with the specified outer diameter surface and the specified inner diameter surface as its outer surface; in the sub-assembly process, a magnet base material sub-assembly having four surfaces is assembled by combining at least four of the magnet base material components. When the surface among the four surfaces that should concentrate the magnetic flux is designated as the effective surface, on one side of the effective surface of the magnet base material sub-assembly, the cutting process is performed with the angles θ1 and θ2 respectively set within the range of more than 45 degrees and less than 90 degrees. The process involves assembling the magnetic mother material subassembly by placing the horizontal magnetic mother material component and the vertical magnetic mother material component, which has been cut in the cutting process with angles θ1 and θ2 respectively within the range of 0 degrees and less than 45 degrees, on the opposite side of the side that becomes the effective surface; and a four-sided magnetization process, which applies a magnetic field in a first direction to the effective surface of the magnetic mother material subassembly in a manner that surrounds the magnetic mother material subassembly; and applying a magnetic field in a second direction to the remaining three surfaces to magnetize the magnetic mother material subassembly.

[0030] Invention Effects

[0031] The above-described structure of the present invention provides a method for manufacturing a polar anisotropic magnet with higher design freedom and greater economic efficiency than before, as well as a method for manufacturing a magnet assembly. Attached Figure Description

[0032] Figure 1 This is an example cross-sectional view used to illustrate the magnet assembly 100.

[0033] Figure 2It is a cross-sectional view showing the pre-magnetized material 5 before it is magnetized and becomes anisotropic magnets 1N and 1S.

[0034] Figure 3 This is an example diagram used to illustrate anisotropic magnets 1N and 1S.

[0035] Figure 4 This is another example diagram used to illustrate anisotropic magnets 1N and 1S.

[0036] Figure 5 This is a flowchart illustrating the manufacturing method of the anisotropic magnet according to Embodiment 1.

[0037] Figure 6 It is a schematic cross-sectional view showing the situation when the magnetic field forming process S20 is carried out.

[0038] Figure 7 This is a schematic diagram of the magnet base material M1 taken out after the magnetic field forming process S20 has been performed.

[0039] Figure 8 This is a schematic diagram of the magnet material M2 that was removed after processing step S32.

[0040] Figure 9 This is a schematic diagram of the magnet material M2' taken out after the surface treatment process S33 has been performed.

[0041] Figure 10 This is a schematic cross-sectional view showing the situation when the four-sided magnetization process S40 is performed.

[0042] Figure 11 This is a diagram illustrating the magnet assembly 100 in Embodiment 1.

[0043] Figure 12 This is a diagram used to illustrate the motor 510, generator 520, and actuator 530 involved in the application example.

[0044] Figure 13 This is a diagram illustrating a variation of the implementation method of the square magnetization process S40.

[0045] Figure 14 This is a diagram used to illustrate the magnet assemblies 110 and 120 involved in the modified examples.

[0046] Figure 15 This is a diagram illustrating a modified example of a cylindrical, double-layered magnet unit 400.

[0047] Figure 16 This is a diagram of a linear, double-layered magnet unit 420 involved in a variation example.

[0048] Figure 17This is a flowchart illustrating the manufacturing method of the magnet assembly according to Embodiment 2.

[0049] Figure 18 This is a diagram used to illustrate the magnetic field forming process SS20.

[0050] Figure 19 This is a diagram used to illustrate the cutting process SS40.

[0051] Figure 20 This is a diagram used to illustrate assembly process SS60.

[0052] Figure 21 This is a diagram used to illustrate the magnetization process SS70.

[0053] Figure 22 This is a cross-sectional view used to illustrate the cutting process SS40 involved in Embodiment 3.

[0054] Figure 23 This is a cross-sectional view used to illustrate the assembly process SS60 involved in Embodiment 3.

[0055] Figure 24 This is a cross-sectional view of the magnet assembly 100IN after the magnetization process SS70 involved in Embodiment 3 has been implemented.

[0056] Figure 25 This is a flowchart illustrating the manufacturing method of the magnet assembly and the manufacturing method of the polarity anisotropic magnet involved in Embodiment 5.

[0057] Figure 26 This is a diagram used to illustrate the sub-assembly process SS80.

[0058] Figure 27 This is a diagram used to illustrate the SS85 square magnetization process.

[0059] Figure 28 This is a schematic diagram of the linear motor structure 550 involved in a modified example to illustrate the application example.

[0060] Figure 29 This is a diagram used to illustrate the detailed structure of the linear motor 550.

[0061] Figure 30 This is a cross-sectional view used to illustrate the magnet assembly 900 described in Patent Document 1.

[0062] Figure 31 This diagram illustrates a conventional manufacturing method for the magnet assembly 900EX.

[0063] Figure 32 This is a schematic diagram illustrating the orientation of powder materials in a magnetic field forming process based on conventional manufacturing methods. Detailed Implementation

[0064] Hereinafter, embodiments of the present invention, including a method for manufacturing anisotropic magnets, a method for manufacturing magnet assemblies, anisotropic magnets, magnet assemblies, and composite magnet assemblies, will be described with reference to the accompanying drawings. The drawings are merely illustrative and do not necessarily strictly reflect actual dimensions, proportions, etc. Figures 17-32 In the diagram, the dashed or solid lines drawn inside the magnet mother material 10, magnet mother material parts 20, 30, etc., indicate the orientation direction of the molecules (easy magnetization axis), and the solid lines with arrows drawn inside the magnet assembly or anisotropic magnet indicate the magnetization direction.

[0065] A. Manufacturing method of polar anisotropic magnets based on tetragonal magnetization

[0066] First, a manufacturing method based on tetragonal magnetization is disclosed for the elements constituting the magnet assembly, namely, anisotropic magnets.

[0067]

Implementation Method 1

[0068] 1. Anisotropic magnets 1N and 1S and magnet assembly 100

[0069] Before describing the manufacturing method of anisotropic magnets, an example of anisotropic magnets 1N and 1S and magnet assembly 100 (sometimes called composite magnet assembly) to be manufactured will be given.

[0070] (1) Magnet assembly 100

[0071] Figure 1 This is an example cross-sectional view used to illustrate the magnet assembly 100. Figure 1 In the diagram, the arrow B inside the anisotropic magnets 1N and 1S indicates the magnetization direction. Figure 1 The magnet assembly 100 shown is capable of functioning with that in Patent Document 1. Figure 3 The magnetic properties are substantially the same as those of the magnet assembly 900 described in the previous embodiment. In the method for manufacturing a polarity-anisotropic magnet according to Embodiment 1, the magnet is... Figure 1 The units enclosed by the dashed lines are used to manufacture polar anisotropic magnets 1N and 1S.

[0072] (2) Premagnetized materials based on linear molecular orientation (easy magnetization axis) 5

[0073] Figure 2 Is with Figure 1 The diagram, enclosed by the dashed line, shows a cross-sectional view of the pre-magnetized material 5 before it is magnetized with anisotropic magnets 1N and 1S. The thick solid lines drawn inside the pre-magnetized material 5 represent molecular orientations (easy magnetization axes).

[0074] like Figure 2As shown, when the interior of the pre-magnetized material 5 is divided into four regions, the molecular orientations (easy magnetization axes) within each region are straight lines and parallel to each other. Here, let θout be the angle between the molecular orientation (easy magnetization axis) of the outer diameter region and the tangent TL of the central portion of the outer peripheral surface of the pre-magnetized material 5, and let θin be the angle between the molecular orientation (easy magnetization axis) of the inner diameter region and the normal NL of the central portion of the outer peripheral surface of the pre-magnetized material 5.

[0075] As one embodiment, a soft magnetic body 6 in the shape of a segmented ring can also be disposed on the inner diameter side of the pre-magnetized material 5. In this case, by setting θin to a value exceeding 0 degrees, the thickness of the soft magnet 6 can be reduced. By appropriately changing the value of θout, the shape of the magnetic flux density of the magnetic field lines output from the central portion of the outer peripheral surface, represented by the normal NL, can be altered.

[0076] By magnetizing and using appropriate methods Figure 2 The pre-magnetized material 5 corresponding to the method shown can be configured as follows: Figure 3 The anisotropic magnets 1N and 1S are shown.

[0077] (3) Anisotropic magnets with linear magnetization directions 1N and 1S

[0078] Figure 3 This is an example diagram used to illustrate anisotropic magnets 1N and 1S. Among them, Figure 3 (a) and Figure 3 (b) Anisotropic magnets 1N and 1S are shown respectively. Figure 3 In the diagram, the arrow B inside the anisotropic magnets 1N and 1S indicates the magnetization direction.

[0079] like Figure 3 As shown in (a), the anisotropic magnet 1N has four faces SF1, SF2, SF3, and SF4 in cross-section. These four faces SF1, SF2, SF3, and SF4 face four directions (thick arrows).

[0080] The "four faces" here refers to approximately four faces. The outline of each face in sectional view can be straight or curved. Multiple straight lines or curves can also be partially bent. For example, a straight line or curve that is continuous and bends within 90 degrees is also treated as approximately one face.

[0081] Figure 2 and Figure 3The shape shown is the "desired shape of an anisotropic magnet" that should be manufactured. The "desired shape of an anisotropic magnet" is a so-called arc shape, an example of which is the shape of a divided ring that divides a circular ring N into equal parts when viewed in section (N is a natural number greater than or equal to 2). In the case where the anisotropic magnets 1N and 1S are used, for example, as cylindrical rotors, the first surface SF1 is the outer circumferential surface and the second surface SF2 is the inner circumferential surface.

[0082] Here, the surface from which magnetic flux should be concentrated is defined as the "effective surface VSF". In the polar anisotropic magnets 1N and 1S according to Embodiment 1, magnetic flux is concentrated from near the center of the effective surface VSF (first surface SF1) outward.

[0083] When this anisotropic magnet is used, for example, as the rotor of an electric motor or other electrical machinery, the effective surface VSF is located on the side facing the stator. When the effective surface VSF is set on the outer peripheral surface (first surface SF1), the anisotropic magnet can be suitable for use as an inner rotor. When the effective surface VSF is set on the inner peripheral surface (second surface SF2), the anisotropic magnet is suitable for use as an outer rotor.

[0084] exist Figure 3 In the polar anisotropic magnet 1N shown in (a), the first surface SF1 becomes the effective surface VSF. The effective surface VSF (first surface SF1) is provided with an N pole (one magnetic pole), and the other surfaces SF2, SF3 and SF4 are provided with an S pole (another magnetic pole). Figure 3 (b) The polar anisotropic magnet 1S shown is magnetized in the opposite direction to the polar anisotropic magnet 1N. An S pole (one magnetic pole) is arranged on the effective surface VSF (first surface SF1), and an N pole (another magnetic pole) is arranged on the other surfaces SF2, SF3 and SF4.

[0085] Figure 3 The anisotropic magnets 1N and 1S shown are objects of this embodiment.

[0086] (4) Other polar anisotropic magnets 1N and 1S based on the curved magnetization direction

[0087] Figure 4 This is another example diagram used to illustrate anisotropic magnets 1N and 1S. Figure 3 The image shows polar anisotropic magnets 1N and 1S based on linear magnetization directions. As a component of... Figure 3 Magnets with similar polarity to the anisotropic magnets 1N and 1S shown, and which exhibit approximately the same magnetic properties, can also be considered. Figure 4The other polarity anisotropic magnets 1N and 1S shown are curves when tracing the internal magnetization direction. The other polarity anisotropic magnets 1N and 1S are also the objects of this embodiment. Figure 4 The descriptions of other polarity anisotropic magnets 1N and 1S involving the four surfaces (SF1, SF2, SF3, SF4) and the effective surface VSF, etc., refer to the above. Figure 3 Explanation of the polarity anisotropic magnets 1N and 1S shown.

[0088] Detailed descriptions of the anisotropic magnets 1N and 1S and the magnet assembly 100 will be provided later.

[0089] 2. Method for manufacturing anisotropic magnets according to Embodiment 1

[0090] Figure 5 This is a flowchart illustrating the manufacturing method of the anisotropic magnet according to Embodiment 1. Figure 6 It is a schematic cross-sectional view showing the implementation of the magnetic field forming process S20. Figure 7 This is a schematic diagram of the magnet base material M1 taken out after the magnetic field forming process S20 has been performed. Figure 8 This is a schematic diagram of the magnet material M2 that was removed after processing step S32. Figure 8 The double-dotted line in the figure represents the outline of the shape of the magnet base material M1. Figure 9 This is a schematic diagram of the magnet material M2' taken out after the surface treatment process S33 has been performed. Figure 10 This is a schematic cross-sectional view showing the situation when the four-sided magnetization process S40 is performed.

[0091] like Figure 5 As shown, the manufacturing method of the polar anisotropic magnet involved in Embodiment 1 includes at least the following steps in sequence: powder material preparation step S10, magnetic field forming step S20, and tetragonal magnetization step S40. In Embodiment 1, an intermediate step S30 (e.g., sintering heat treatment step S31) is further included between the magnetic field forming step S20 and the tetragonal magnetization step S40.

[0092] (1) Powder material preparation process S10

[0093] Powder material preparation step S10 is a step for preparing powder material PD for magnets. The preparation of powder material for magnets can be carried out using conventional methods. For example, assuming neodymium magnets are used, raw materials such as neodymium, iron, and boron can be dissolved, solidified, and then coarsely and finely pulverized using a pulverizer or grinder to prepare the powder material PD for magnets.

[0094] (2) Magnetic field forming process S20

[0095] In the magnetic field forming process S20, while applying a magnetic field in a first direction from the outside of the mold frame 710, which corresponds to the desired shape of the anisotropic magnet, to the hypothetical effective surface VSF' (the term "hypothetical" is used because a prototype of the anisotropic magnet has not yet been formed), a magnetic field in a second direction is applied to the other three surfaces respectively. At the same time, powder material PD is sequentially added to the inside of the mold frame 710 to form a magnet base material M1 (refer to the shape of the mold frame 710). Figure 5 and Figure 6 ).

[0096] As a specific structure, such as Figure 6 As shown, a mold frame 710 corresponding to the "desired shape of the anisotropic magnet" is prepared. On the outer side of this mold frame 710, a first magnetic source 721 is arranged with its first magnetic pole facing the imaginary effective surface VSF'. Second magnetic sources 722b, 722a, and 722c are arranged with their second magnetic poles facing the other three surfaces (bottom surface, right side, and left side in the figure), respectively. Figure 6 The example shown illustrates that the first magnetic pole is the N pole and the second magnetic pole is the S pole.

[0097] In this configuration, a magnetic field in the first direction is applied to the imaginary effective surface VSF' through the first magnetic source 721, while a magnetic field in the second direction is applied to the other three surfaces through the second magnetic source 722. At the same time, powder material PD is sequentially injected into the inner side of the mold frame 710 to form a magnet mother material M1 that conforms to the shape of the mold frame 710.

[0098] The binder is premixed before the powder material PD is fed into the mold frame 710. When the powder material PD is fed into the inside of the mold frame 710, which is subjected to a specified magnetic field, the orientation of each molecule of the powder material PD is aligned with the direction of the magnetic field, and the powder is stacked. At this time, pressure is applied from the outside of the mold frame 710.

[0099] By implementing the magnetic field forming process S20 in this way, the following can be obtained: Figure 7 The magnet base material M1 is shown. Figure 7 The solid lines in the magnet matrix M1 shown represent the orientation of the molecules (molecular orientation).

[0100] The widths of the first magnetic source 721 and the second magnetic source 722, and the relative positions of the first magnetic pole (peak portion) of the first magnetic source 721 and the second magnetic pole (peak portion) of the second magnetic source 722 with respect to the module frame 710, can be appropriately modified according to the design intent. The output (strength of the applied magnetic field) of each surface of the first magnetic source 721 and the second magnetic source 722 can also be set to an appropriate magnitude (magnetic field strength) according to the design intent. In this case, the molecular alignment direction (molecular orientation / easy magnetization axis / magnet alignment) can be easily and appropriately changed by adjusting the strength of each magnetic field line of the second magnetic sources 722b, 722a, and 722c. Furthermore, the magnetic flux density form of the magnetic field lines output from the effective surface VSF of the anisotropic magnets 1N and 1S can also be appropriately modified by design.

[0101] Here, "first direction" and "second direction" refer to directions toward the inside or outside of the mold frame 710, with the first and second directions being opposite. Figure 6 In the example, "first direction" is the direction of magnetic field lines from the first magnetic pole of the first magnetic source 721 toward the inside of the mold frame 710, and "second direction" is the direction of magnetic field lines from the inside of the mold frame 710 toward the second magnetic pole of the second magnetic source 722. "First direction" and "second direction" are not limited to the directions relative to the mold frame 710 as described above, but can also be defined as the directions relative to the magnetic materials M2 and M2'.

[0102] By aligning the inner circumferential surface SF2 with the first magnetic source 721 and the outer circumferential surface SF1 with the second magnetic source 722b, it is also possible to fabricate an anisotropic magnet with an effective surface VSF on the inner circumferential surface SF2. This modification is also applied to the tetragonal magnetization process S40 described later. Figure 10 wait).

[0103] (3) Intermediate process S30

[0104] Intermediate process S30 is an intermediate processing step performed to feed the magnet base material M1 obtained in the magnetic field forming process S20 into the tetragonal magnetization process S40 described later (see reference). Figure 5 ).

[0105] In Embodiment 1, the magnet base material M1 obtained through the magnetic field forming process S20 (refer to...) is subjected to... Figure 7 The sintering heat treatment process S31 involves sintering heat treatment. During the sintering heat treatment process S31, the binder contained in the magnet base material M1 vaporizes and splashes due to heat, thus increasing the purity of the magnetic material. Although there may be slight magnetization inside the magnet base material M1 after magnetic field forming, this can be demagnetized by performing the sintering heat treatment process S31.

[0106] In Embodiment 1, immediately following the sintering heat treatment step S31, a processing step S32 is performed to process the sintered heat-treated magnet base material M1 into the "desired shape of anisotropic magnet" and form the magnet material M2 (see [reference]). Figure 8 Then, a surface treatment process S33 is performed on the magnet material M2 to form the magnet material M2', which involves applying a surface treatment for rust prevention (e.g., nickel plating, bright chromate treatment, electrophoretic coating, etc.). Figure 9 (The symbol 7 in the figure represents the surface treatment layer), and finally, the inspection process S34 is carried out to check the finished product status of the magnet material M2'.

[0107] When the inner shape of the mold frame 710 is "the desired shape of the polarity anisotropic magnet", sometimes the processing step S32 or the surface treatment step S33 can be omitted.

[0108] (4) Four-sided magnetization process S40

[0109] The four-sided magnetization process S40 magnetizes the magnet materials M2 and M2' by applying a first-direction magnetic field to the effective surface VSF (SF1) of the magnet materials M2 and M2' in a manner that surrounds the magnet materials M2 and M2' obtained based on the magnet parent material, and applying a second-direction magnetic field to the remaining three surfaces (SF2, SF3, SF4). (Refer to...) Figure 5 and Figure 10 ).

[0110] As a specific structure, such as Figure 10 As shown, firstly, a first magnetic source 731 for magnetization is arranged such that its first magnetic pole faces the effective surface VSF (first surface SF1) in a manner that surrounds the magnetic materials M2 and M2' obtained based on the magnet parent material M1. Secondly magnetic sources 732b, 732a, and 732c for magnetization are arranged such that their second magnetic poles face the other three surfaces (second surface SF2, third surface SF3, and fourth surface SF4), respectively. The first magnetic source 731 and the second magnetic sources 732b, 732a, and 732c for magnetization can be components referred to as magnetizing yokes.

[0111] Then, the first magnetic source 731 for magnetization and the second magnetic sources 732a, 732b, and 732c for magnetization are operated to apply a magnetic field in a first direction to the effective surface VSF (first surface SF1) and a magnetic field in a second direction to the remaining three surfaces (second surface SF2, third surface SF3, and fourth surface SF3) to magnetize the magnet material M2.

[0112] Regarding the method of applying the electric field, conventional methods may be appropriately adopted. The descriptions of the first magnetic pole, second magnetic pole, first direction, and second direction are referenced from the description in the magnetic field forming process S20.

[0113] By performing the four-sided magnetization process S40 in this way, it is possible to obtain Figure 2 or Figure 3 The polarity of the anisotropic magnet shown is 1N or 2N.

[0114] Furthermore, the widths of the first magnetic source 731 and the second magnetic source 732 for magnetization, as well as the positions of the first magnetic pole (peak portion) of the first magnetic source 731 and the second magnetic pole (peak portion) of the second magnetic source 732 for magnetization, can be appropriately modified according to the design intent. The output (strength of the applied magnetic field) of each surface's first magnetic source 731 and second magnetic source 732 can also be set to an appropriate magnitude (magnetic field strength) according to the design intent.

[0115] By making such adjustments appropriately, the thickness of the portion of the polar anisotropic arrangement that forms a horizontal system and the thickness of the portion of the radial anisotropic arrangement that forms a vertical system when the polar anisotropic magnets 1N and 1S are completed can be arbitrarily set, and the density of the imaginary lines representing the magnetization direction can also be appropriately changed.

[0116] In the above description and the accompanying drawings, as an example, an example of manufacturing an anisotropic magnet 1N is given. When manufacturing an anisotropic magnet 1S, by changing the polarity by using the first magnetic pole as the S pole and the second magnetic pole as the N pole, the same process as described above can be performed by reversing the directions of the first and second directions.

[0117] 3. The polarity anisotropic magnets 1N and 1S involved in Implementation Method 1

[0118] Next, return Figure 4 The structure of the polar anisotropic magnets 1N and 1S obtained by the above-described method for manufacturing polar anisotropic magnets is further explained.

[0119] Anisotropic magnets 1N and 1S have four faces (first face SF1, second face SF2, third face SF3, and fourth face SF4) that face four directions (thick arrows) in cross-section. When the face among SF1, SF2, SF3, and SF4 that should concentrate magnetic flux is designated as the effective face VSF(SF1), a magnetic pole is placed on the effective face VSF(SF1), and another magnetic pole is placed on the other three faces. When one magnetic pole is the N pole, the other magnetic pole is the S pole. Conversely, when one magnetic pole is the S pole, the other magnetic pole is the N pole.

[0120] In Embodiment 1, the anisotropic magnets 1N and 1S are shown in cross-section as segmented rings that divide the ring N into equal parts (N is a natural number greater than or equal to 2). In this case, when the anisotropic magnets 1N and 1S are used, for example, as cylindrical rotors, the first surface SF1 is the outer circumferential surface and the second surface SF2 is the inner circumferential surface.

[0121] like Figure 2 and Figure 3 As shown, for example, the magnetization direction from near the upper side of the third surface SF3 to near the center of the first surface SF1 is relatively horizontal, so it can be said to be a horizontal anisotropic arrangement. For example, the magnetization direction from near the lower side of the third surface SF3 and near the second surface SF2 is relatively vertical, so it can be said to be a vertical radial anisotropic arrangement.

[0122] When the cross-section of the anisotropic magnets 1N and 1S is observed, there are no traces of bonding inside, and their interiors are formed continuously. Therefore, the anisotropic magnets 1N and 1S are continuous individual components.

[0123] 4. The effects of the manufacturing method of the polar anisotropic magnet, the polar anisotropic magnet, and the magnet assembly involved in Embodiment 1.

[0124] In the method for manufacturing a polar anisotropic magnet according to Embodiment 1, a magnetic source (first magnetic source 721 or first magnetic source 731 for magnetization) is configured such that the first magnetic pole faces the effective surface VSF (including the imaginary effective surface VSF') (SF1), and a magnetic source (second magnetic source 722 or second magnetic source 732 for magnetization) is configured such that the second magnetic pole faces the other three surfaces SF2, SF3, and SF4 excluding the effective surface VSF (SF1). Based on this, a magnetic field in a first direction is applied to the effective surface VSF, and a magnetic field in a second direction is applied to the other three surfaces.

[0125] Therefore, the method for manufacturing polar anisotropic magnets according to Embodiment 1 can simultaneously manufacture polar anisotropic magnets 1N and 1S that have both horizontally arranged polar anisotropic portions and vertically arranged radially anisotropic portions inside, which can significantly improve mass production efficiency compared to conventional manufacturing methods of magnet assemblies with Halbach arrangements and similar magnet assemblies.

[0126] By appropriately changing the positions of the magnetic sources (first magnetic source 721, second magnetic source 722, first magnetic source 731 for magnetization, and second magnetic source 732 for magnetization) configured on each of the four faces SF1, SF2, SF3, and SF4, and the output (intensity of the applied magnetic field) of each magnetic source, the thickness of the polarity-anisotropic arrangement portion in the horizontal system and the polarity-anisotropic arrangement portion in the vertical system can be appropriately changed. That is, it is not subject to the design constraints of balancing the radial wall thickness of the outer circumferential cylindrical body 900EX and the wall thickness of the inner circumferential cylindrical body 900IN, as required by the manufacturing method of the magnet assembly 900 described in Patent Document 1.

[0127] According to the manufacturing method of the polar anisotropic magnet in Embodiment 1, mass production capability can be improved, and the design freedom of the thickness of the horizontal polar anisotropic arrangement and the thickness of the vertical radial anisotropic arrangement can also be increased. In other words, it is a manufacturing method of polar anisotropic magnet with higher design freedom and higher economy than before.

[0128] Although obtaining the magnet assembly 100 according to Embodiment 1 requires the joining of anisotropic magnets 1N and 1S with different magnetization directions, in this case, for example, the S pole appearing on the first surface SF1 of the anisotropic magnet 1N and the N pole appearing on the fourth surface SF4 of the anisotropic magnet 1S attract each other, thus making it easy to arrange and join multiple anisotropic magnets. This also helps to improve mass production efficiency.

[0129] 5. Magnet assembly 100 according to Embodiment 1

[0130] Figure 11 This is a diagram illustrating the magnet assembly 100 according to Embodiment 1. Wherein, Figure 11 (a) is a cross-sectional view of the magnet assembly 100. Figure 11 (b) is a perspective view of the magnet assembly 100.

[0131] like Figure 11 As shown, the magnet assembly 100 has a structure in which anisotropic magnets are arranged and joined together in such a way that one magnetic pole and another magnetic pole appear alternately on the outside. Specifically, the structure of the magnet assembly 100 is such that anisotropic magnets 1N and 1S are arranged alternately in sequence along a predetermined direction, and two adjacent anisotropic magnets are magnetized to opposite directions.

[0132] In other words, the magnet assembly 100 is formed by arranging anisotropic magnets 1N and 1S along the circumferential direction centered on axis AX, and its shape is roughly cylindrical.

[0133] Here, polar anisotropic magnets 1N and 1S, which are divided into 8 equal parts (N=8) to form a segmented ring shape, are joined and bonded together in such a way that their third surface SF3 and fourth surface SF4 are in contact with each other, and their first surface SF1 (effective surface VSF) are on the same plane (i.e. there is no drop at the joint).

[0134]

Application Example

[0135] Figure 12 This diagram illustrates an application example of the anisotropic magnets and magnet assemblies involved in each embodiment, specifically a motor 510, a generator 520, and an actuator 530. The anisotropic magnets 1N and 1S obtained in Embodiment 1, and the magnet assembly 100 constructed using them, can be applied to various product fields. For example, it can be constructed as a motor having a rotor including the magnet assembly 100 (see...). Figure 12 (a)); A generator having a rotor including a magnet assembly 100 (see reference) Figure 12 (b) An actuator having a rotor including a magnet assembly 100 Figure 12 (c) etc.

[0136] The present invention has been described above based on the first embodiment, but the present invention is not limited to the form described in the first embodiment. It can be implemented in various ways without departing from the concept, and for example, the following modifications are possible.

[0137] (1) In the magnetic field forming process S20 and / or the tetragonal magnetization process S40 of Embodiment 1, the width of the side of the first magnetic source 721 or the first magnetic source 731 for magnetization where the first magnetic pole is disposed is approximately equal to the width of the effective surface VSF (including the imaginary effective surface), but the present invention is not limited thereto.

[0138] Figure 13 This is a diagram illustrating a variation of the implementation method of the square magnetization process S40. For example... Figure 13 As shown, in the square magnetization process S40, the width W1 of the side of the first magnetic source 731 for magnetization with the first magnetic pole can also be set to be smaller than the width W2 of the effective surface VSF. In other words, the magnetic field application surface of the first magnetic source 731 for magnetization opposite to the effective surface VSF can be set to overlap only a part of the effective surface VSF.

[0139] In this way, it is possible to adjust the density of the magnetic flux density distribution and the strength of the magnetic field lines generated outside the effective surface VSF.

[0140] Although Figure 13The above description mentions a variation of the implementation method of the four-sided magnetization process S40, but the same process can also be performed in the magnetic field forming process S20. That is, in the magnetic field forming process S20, the width of the side of the first magnetic source 721 with the first magnetic pole can be set to be smaller than the width of the hypothetical effective surface VSF'.

[0141] (2) In the method for manufacturing a polar anisotropic magnet according to Embodiment 1, a segmented ring-shaped polar anisotropic magnet as part of a cylindrical magnet assembly 100 is described, and a method for manufacturing a polar anisotropic magnet capable of generating high-density magnetic flux on the outer side of the outer periphery of the cylinder when they are assembled to form the magnet assembly 100 is described. However, the present invention is not limited thereto. For example, in the magnetic field forming step S20 and the tetragonal magnetization step S40, the second surface SF2 may be set as the effective surface VSF, and the other three surfaces besides the effective surface VSF may be set as the first surface SF1, the third surface SF3, and the fourth surface SF4. At the same time, by changing the polarity of each magnetic source for magnetization and the setting of the magnetic field to be applied, the lines of the molecular alignment direction or the lines of the magnetization direction are concentrated on the inner periphery of the arc-shaped polar anisotropic magnet, thereby manufacturing a polar anisotropic magnet capable of generating high magnetic flux on the inner side of the inner periphery of the cylinder. Such a polar anisotropic magnet may be suitable for use as an outer rotor, for example.

[0142] (3) Although the magnet assembly 100 involved in Embodiment 1 is generally cylindrical, the present invention is not limited thereto. For example, as Figure 14 As shown in (a), it can also be configured as a linear magnet assembly 110 or an arc-shaped magnet assembly 120. Figure 14 This is a diagram used to illustrate the modified magnet assemblies 110 and 120.

[0143] (4) Although the manufacturing method of the polar anisotropic magnet, the polar anisotropic magnets 1N and 1S, and the magnet assembly 100 involved in Embodiment 1 are similar to those in Patent Document 1... Figure 3 The described magnet assembly 900 corresponds to this invention, but the invention is not limited thereto. For example, the method for manufacturing a polar anisotropic magnet according to Embodiment 1 can also be applied to magnet assemblies based on Halbach arrangements, or to polar anisotropic magnets in magnet assemblies based on Halbach arrangements.

[0144] (5) The manufacturing method of the polar anisotropic magnet and the polar anisotropic magnets 1N and 1S involved in this invention can also be applied to magnet units with a double-layer structure based on the opposite magnetic field.

[0145] Figure 15This is a diagram of a cylindrical, double-layered magnet unit 400. The cylindrical, double-layered magnet unit 400 includes an outer peripheral magnet assembly 400EX and an inner peripheral magnet assembly 400IN. The anisotropic magnets 1N, 1N', 1S, and 1S' constituting the magnet assemblies 400EX and 400IN can also be obtained by the manufacturing method of the anisotropic magnets of the present invention, and the anisotropic magnets 1N, 1N', 1S, and 1S' of the present invention can be applied to the magnet assemblies 400EX and 400IN.

[0146] Figure 16 This diagram illustrates a linear double-layer magnet unit 420. The linear double-layer magnet unit 420 includes an upper (for clarity, "upper" and "lower" are used to distinguish them) magnet assembly 420U, a lower magnet assembly 420L, and a magnet assembly 430 disposed between them. The anisotropic magnets 2N, 2N', 2S, and 2S' constituting the magnet assemblies 420U and 420L can also be obtained by the manufacturing method of the anisotropic magnets of the present invention, and the anisotropic magnets 2n, 2n', 2s, and 2s' of the present invention can also be applied to the magnet assemblies 420U and 420L.

[0147] (6) In Embodiment 1 and its variations, a polar anisotropic magnet with four sides (four faces) in the cross-sectional view was described, but the present invention is not limited thereto. For example, Embodiment 1 is not limited to four faces, and can also be applied to polar anisotropic magnets with three or five or more faces. For example, in magnet base material M1 and magnet material M2 with three triangular faces in the cross-sectional view, and magnet base material M1 and magnet material M2 with six hexagonal faces in the cross-sectional view, a magnetic field in a first direction can be applied to one face, and a magnetic field in a second direction can be applied to the remaining faces respectively. In this way, a polar anisotropic magnet with one magnetic pole (e.g., N pole) on one face and another magnetic pole (e.g., S pole) on the remaining faces can be obtained.

[0148] B. Manufacturing method for producing magnet components using parallel magnetic fields and cutting techniques

[0149] Next, a method for manufacturing a magnet assembly based on parallel magnetic fields and cutting technology will be disclosed.

[0150]

Implementation Method Two

[0151] 1. Method for manufacturing the magnet assembly according to Embodiment 2

[0152] Figure 17 This is a flowchart illustrating a method for manufacturing a magnet assembly according to Embodiment 2. As Embodiment 2, the method for manufacturing the outer peripheral magnet assembly 100EX will be described below.

[0153] The second embodiment involves a method for manufacturing a cylindrical magnet assembly.

[0154] like Figure 17 As shown, the manufacturing method of the magnet assembly according to Embodiment 2 includes at least the following steps in sequence: powder material preparation step SS10, magnetic field forming step SS20, cutting step SS40, assembly step SS60, and magnetization step SS70. In Embodiment 2, a sintering heat treatment step SS30 is further included between the magnetic field forming step SS20 and the cutting step SS40. A surface treatment step SS50 is further included between the cutting step SS40 and the assembly step SS60. Note that in... Figure 17 On the right side, for reference, the material components input and output during the specified process are shown.

[0155] (1) Powder material preparation process SS10

[0156] Powder material preparation step SS10 is the process of preparing powder material PD for magnets. The preparation of powder material for magnets can employ conventional methods. For example, for neodymium magnets, raw materials such as neodymium, iron, and boron can be dissolved, solidified, and then coarsely and finely pulverized using a pulverizer or grinder to prepare the powder material PD for magnets.

[0157] (2) Magnetic field forming process SS20

[0158] Figure 18 This is a diagram illustrating the magnetic field forming process SS20. Among them, Figure 18 (a) is a three-dimensional diagram of the magnetic field formation. Figure 18 (b) is a perspective view of the magnet base material 10. Figure 18 (c) is cut using the imaginary plane PL1 Figure 18 (b) is a cross-sectional view of the magnet base material 10. Figure 18 (d) is to Figure 18 (b) is a cross-sectional view of the magnet base material 10 after being cut by the imaginary plane PL2.

[0159] The magnetic field forming process SS20 is a process for forming a "magnetic matrix 10" having a first main surface 11 and a second main surface 12 opposite to the first main surface 11 (see reference). Figure 18(b)). In the figure, symbol 13a refers to side A, 13b refers to side B, 13c refers to side C, and 13d refers to side D. In the magnetic field forming process SS20, powder material PD (not shown) prepared in the powder material preparation process SS10 is put into the inside of the mold frame 890 corresponding to the shape of the magnet base material 10, and a parallel magnetic field in a single direction is applied from the outside of the mold frame 890 on the side corresponding to the first main surface 11 (upper side in the figure) to the side corresponding to the second main surface 12 (lower side in the figure).

[0160] As a specific structure, for example, on the outside of the mold frame 890, the first magnetic source is arranged with its N pole facing the side that becomes the first main surface 11 when it becomes the magnet base material 10 after molding (the upper side of the mold frame 890 in the figure), and the second magnetic source is arranged with its S pole facing the side that becomes the second main surface 12 when it becomes the magnet base material 10 after molding (the lower side of the mold frame 890 in the figure). Based on this, the first and second magnetic sources are operated to apply a magnetic field across the entire first main surface 11 and second main surface 12 in a manner that is perpendicular to the first main surface 11 and the second main surface 12, with parallel magnetic lines of force and the same magnetic flux density (see reference). Figure 18 (a)). Although the diagram illustrates a magnetic field from top to bottom, the direction of the magnetic field can also be the opposite.

[0161] When a magnetic field as described above is applied inside the mold frame 890, the molecules of the powder material PD orient themselves along the direction of the magnetic field in a manner consistent with the direction of the magnetic field, and are integrally formed into a magnet base material 10 with a shape corresponding to the shape of the mold frame 890 (see reference). Figure 18 (b)). The first principal surface 11 is approximately planar. The second principal surface 12 is also approximately planar and approximately parallel to the first principal surface. However, it is not limited to this. Inside the magnet matrix 10, such as Figure 18 (c) and Figure 18 As shown by the dashed line in (d), the molecules are uniformly oriented in a direction perpendicular to the first principal surface 11 and the second principal surface 12. Once the molecular orientation is adjusted, the molecules are strongly magnetized along this orientation by performing the magnetization process SS70, which will be described later. In this specification, the orientation (molecular orientation direction) of each powder in the powder material PD, which is thus aligned by performing the magnetic field forming process SS20, is sometimes referred to as the "easy magnetization axis".

[0162] (3) Sintering heat treatment process SS30

[0163] The sintering heat treatment process SS30 performs sintering heat treatment on the magnet base material 10 obtained through the magnetic field forming process SS20. During the sintering heat treatment process SS30, the binder contained in the magnet base material 10 vaporizes and splashes due to heat, thus improving the purity of the magnetic material. Although there may be slight magnetization inside the magnet base material M1 after magnetic field forming, this can be demagnetized by performing sintering heat treatment.

[0164] (4) Cutting process SS40

[0165] (4-1) Cut out 20mm of magnet base material.

[0166] Figure 19 This is a diagram used to illustrate the cutting process SS40. Among them, Figure 19 (a) is a right-side view of the magnet base material 10 before cutting, viewed from a direction perpendicular to side C 13c. The solid line (imaginary line) that cuts into the cross-section of the magnet base material 10 is the cutting line along which the cutting is performed, i.e., the marking line. When cutting along the cutting line, the outline (outer surface) of the magnet base material 20, described later, appears on the outside. Figure 19 (b) is a perspective view of the magnet base material 20 obtained after the cutting process S40.

[0167] The cutting process SS40 is a process of cutting the magnet base material 10, which will be described later, by cutting along the cutting line described above.

[0168] The cutting process SS40 is performed using wire EDM. During wire EDM, it is preferable to cut while cooling. The processing method introduced in the cutting process SS40 is not limited to wire EDM; for example, it can be waterjet cutting or machining. In this way, unlike conventional magnet assembly manufacturing methods where new molds are developed for each specification change, specification changes can be made using only conventional magnet manufacturing equipment.

[0169] (4-2) Set the cutting line

[0170] Here, the surface that should become the outer diameter surface of the magnet assembly when assembled is defined as "specified outer diameter surface 20EX", and the surface that should become the inner diameter surface is defined as "specified inner diameter surface 20IN". The same symbol

'

[0171] In the second embodiment, cutting is performed with the specified outer diameter surface 20EX and / or the specified inner diameter surface 20IN cut in the cutting process as planes. By making the specified outer diameter surface 20EX and the specified inner diameter surface 20IN planes, the cutting operation becomes simpler compared to the case where they are formed as curved surfaces, ensuring both high precision and increased productivity.

[0172] In the second implementation method, the outer diameter surface 20EX and the inner diameter surface 20IN are specified to be parallel to each other.

[0173] like Figure 19 As shown in (A), the cutting line 20EX' of the specified outer diameter surface is set at an inclination angle θ1 relative to the first main surface 11. The cutting line 20IN' of the specified inner diameter surface is set at an inclination angle θ2 relative to the first main surface 11. In Embodiment 2, since the specified outer diameter surface and the specified inner diameter surface are parallel, θ1=θ2 is satisfied.

[0174] Although the cutting line is set here using the first main surface 11 as a reference, it is actually possible to set the cutting line using either the first main surface 11 or the second main surface 12 as a reference. In this specification, it is also possible to implement an embodiment in which the "first main surface 11" is replaced with the "second main surface 12", and such an implementation is also included within the technical scope of this invention.

[0175] (4-3) Cutting line parameters

[0176] In the cutting process SS40 of Embodiment 2, the angles θ1 and θ2 relative to the first main surface 11 are set to a range of more than 45 degrees and less than 90 degrees. Under this setting, the magnet base material 10 is cut along the cutting line 20EX' of the specified outer diameter surface and the cutting line 20IN' of the specified inner diameter surface.

[0177] In other words, in the cutting process SS40 of Embodiment 2, the cutting line 20EX' of the outer diameter surface is set within a range (θ3) that is greater than 0 degrees and less than 45 degrees relative to the easy magnetization axis (the direction of the dotted line), and the cutting line 20IN' of the inner diameter surface is set within a range (θ4) that is greater than 0 degrees and less than 45 degrees relative to the easy magnetization axis. Under this setting, the magnet base material 10 is cut along the cutting line 20EX' of the outer diameter surface and the cutting line 20IN' of the inner diameter surface (see reference). Figure 19 (a)).

[0178] By setting θ1, θ2, θ3, and θ4 in this way, it is possible to manufacture a magnetic assembly (the outer peripheral magnetic assembly) with anisotropic polarity arrangement in a horizontal system.

[0179] (4-4) Cut out 20mm of magnet base material.

[0180] Next, after determining the cutting lines as described above, the magnet mother material 10 is cut along the cutting line 20EX' of the specified outer diameter surface, and the magnet mother material 10 is cut along the cutting line 20IN' of the specified inner diameter surface, thereby cutting out a magnet mother material part 20 with at least the specified outer diameter surface 20EX and the specified inner diameter surface 20IN as its outer surface (see reference). Figure 19 (b)).

[0181] like Figure 19 As shown in (b), the magnet mother material 20 cut by the cutting process SS40 has, in addition to the specified outer diameter surface 20EX and the specified inner diameter surface 20IN, mating side surfaces 21 and 24 on its outer surface, which will be joined together in the subsequent assembly process SS60. In the second embodiment, the mating side surface 21 is the portion that is the same as the first main surface 11 of the magnet mother material 10 before the cutting process SS40. The mating side surface 24 is a newly formed surface created by cutting with a separate cutting line. The magnet mother material 20 has a surface 22 on one end and a surface 23 on the other end in the longitudinal direction. Figure 19 The example shown is of cutting out multiple magnet mother material parts 20-1, 20-2, 20-3, and 20-4, but the case of cutting out an odd number is also included in the implementation of the cutting process SS40 here.

[0182] (5) Surface treatment process SS50

[0183] The surface treatment process is a process of applying a rust-proof surface treatment (such as nickel plating, gloss chromate treatment, electrophoretic coating, electrostatic coating, etc.) to the magnet block 20.

[0184] (6) Assembly process SS60

[0185] Figure 20 This is a diagram used to illustrate assembly process SS60. Among them, Figure 20 (a) is a diagram of the four magnet mother material parts 20 assembled together. Figure 20 (b) is a perspective view showing the magnet base material assembly 40EX. For reference, Figure 20 (b) The range indicated by the dashed line SA is as follows Figure 20 As shown in (a).

[0186] Assembly process SS60 is the process of combining multiple magnet mother parts 20 together to form a magnet mother assembly 40EX. Specifically, multiple magnet mother parts 20 obtained through cutting process SS40 are prepared (see...). Figure 19 (b) The mating sides 21 and 24 of the magnet mother material 20 are joined and bonded together. At this time, adjacent specified outer diameter surfaces 20EX and adjacent specified inner diameter surfaces 20IN are joined together without gaps (or at an angle). In this way, multiple magnet blocks 20 can be combined to form continuous outer and inner peripheral surfaces.

[0187] As an example, Figure 19 (b) shows the assembly of the four magnet base pieces 20 (see reference). Figure 20 (a)).

[0188] Starting from the left, first place the face 22 of one end side near the magnet and place the magnet base material 20-1. Next, place the magnet base material 20-2 adjacent to it on its right, swapping the lengthwise side of one end side with the other end side, so that the face 23 of the other end side is near the magnet. At this time, the mating side 24 of the magnet base material 20-1 is mated with the mating side 24 of the magnet base material 20-2. Next, adjacent to it on its right, place the magnet base material 20-3 near the face 22 of one end side. At this time, the mating side 21 of the magnet base material 20-2 is mated with the mating side 21 of the magnet base material 20-3. Next, adjacent to it on its right, swap the lengthwise side of one end side with the other end side, so that the face 23 of the other end side is near the magnet and place the magnet base material 20-4. At this time, the mating side 24 of the magnet base material 20-3 is mated with the mating side 24 of the magnet base material 20-4.

[0189] The four magnet mother parts 20-1 to 20-4 can be assembled as described above. By repeating this assembly, a result can be obtained. Figure 20 (b) shows the magnet mother material assembly 40EX.

[0190] (7) Magnetization process SS70

[0191] Figure 21 This is a diagram used to illustrate the magnetization process SS70. Figure 21 (a) is a cross-sectional view showing the configuration of the magnetic sources 840N and 840S during magnetization. Figure 21 (b) is a cross-sectional view of the magnet assembly 100EX after the magnetization process has been performed.

[0192] The magnetization process SS70 is a process of magnetizing the magnet base material assembly 40EX by applying a specified magnetic field at a specified position from the outside of the magnet base material assembly 40EX.

[0193] For example, such as Figure 21 As shown in (a), four magnetic sources 840N and 840S, each composed of a yoke, are arranged at equal angles along the outer diameter surface (more precisely, the circumferential surface centered on the central axis) of the magnet mother material assembly 40EX, with alternating polarities. The pole arrangement of the magnetic sources 840N and 840S gradually approaches the joint portion of the mating surfaces 21 and 24 as they advance radially outward from the central axis. Figure 23 (a) The positions are represented by P1 and P2 in the diagram.

[0194] Furthermore, at specified time points and with specified output, the magnetic source 840N and 840S are activated to apply a magnetic field to the magnet mother material assembly 40EX. In this way, the interior of the magnet mother material assembly 40EX can be magnetized according to the orientation direction (easy magnetization axis) of the molecules formed in the magnetic field forming process SS20. Ultimately, it becomes as... Figure 21(b) The magnetized magnet assembly 100EX in the direction (magnetization direction) shown.

[0195] By performing at least the above magnetic field forming process SS20, cutting process SS40, assembly process SS60 and magnetization process SS70, the magnet assembly 100EX can be obtained.

[0196] 2. Magnet assembly 100EX

[0197] Next, the magnet assembly 100EX obtained by the manufacturing method of the magnet assembly according to Embodiment 2 will be described.

[0198] Magnet assembly 100EX Figure 21 As shown in (b), the device comprises: a plurality (N) of magnet blocks 50 having an outer diameter surface and an inner diameter surface that are substantially planar, and magnetized at a predetermined angle (θ3, θ4) relative to the outer diameter surface and the inner diameter surface and parallel in a single direction, the magnet blocks 50 being located via surfaces other than the outer diameter surface and the inner diameter surface. Figure 20 (a) The two sides 21 and 24 are joined together.

[0199] Specifically, the magnet assembly 100EX is formed by joining N magnet blocks 50 together, and its outer and inner diameter sides are N-sided cylindrical. Figure 21 (b) shows an example of magnet assembly 100EX where nps (number of like poles) = 2, npNS (number of unlike poles) = 2, ns (set value and a natural number greater than or equal to 1), ns = 4, and N = 2·2·4 = 16.

[0200] Alternatively, a cylindricalization process (not shown) can be performed between assembly process SS60 and magnetization process SS70. This cylindricalization process involves cutting the corners of the outer diameter surface of the approximately N-sided cylindrical magnet mother material assembly 40EX, or attaching a protective film or the like to the outer surface, to cylindricalize the entire assembly. In this case, the magnet assembly 100EX also becomes cylindrical accordingly.

[0201] In the above description, the magnet assembly 100EX is described as a cylindrical shape with a generally flat outer diameter surface and a generally N-sided shape. However, after the cylindricalization process, the magnet assembly whose final shape has a curved outer diameter surface or is generally cylindrical in shape is also referred to as a generally flat, generally N-sided shape and is included in one embodiment of this invention.

[0202] 3. Effects of the manufacturing method of the magnet assembly in Implementation Method 2

[0203] The manufacturing method of the magnet assembly according to Embodiment 2 is as follows: a parallel magnetic field in a single direction is applied from the side corresponding to the first main surface 11 to the side corresponding to the second main surface 12 to form a magnet mother material 10. Then, the cutting line 20EX' of the specified outer diameter surface is set to an inclination angle θ1 relative to the first main surface 11 to cut the magnet mother material 10, and the cutting line 20IN' of the specified inner diameter surface is set to an inclination angle θ2 relative to the first main surface 11 to cut the magnet mother material 10, thereby cutting out the magnet mother material parts 20. Based on this, the magnet mother material blocks 20 are assembled to form a magnet mother material assembly 40EX and magnetized to obtain the magnet assembly 100EX.

[0204] In other words, once the magnet mother material 10 with a single molecular orientation (easy magnetization axis) is obtained, the design and model of the magnet assembly can be modified in the cutting process SS40 by changing the cutting angle, cutting shape, etc. That is, by appropriately changing the setting method of the cutting line, the magnetization direction, thickness, shape, etc. can be appropriately changed. Therefore, the manufacturing method of the magnet assembly of the present invention has a high degree of design freedom.

[0205] From another perspective, by generalizing and standardizing the powder material preparation process SS10, the magnetic field forming process SS20, and the sintering heat treatment process SS30, and by simply changing the setting method of the cutting line in the cutting process SS40, it is possible to manufacture the outer peripheral magnet assembly 100EX and the inner peripheral magnet assembly 100IN respectively. Therefore, large-scale process changes are not required for each product type.

[0206] Furthermore, unlike in the past, it eliminates the need for preparing dedicated molds for each product variation, and the cutting process SS40 itself can be performed on conventional magnet manufacturing equipment. In particular, the manufacturing method of Embodiment 2 is also useful when utilizing equipment for constructing sintered magnets based on so-called monopole manufacturing. Because the design is easier and more flexible, it helps to reduce development costs and shorten development time, and is also useful during the development and prototyping stage. Therefore, the manufacturing method of the magnet assembly of the present invention is more economical than previous methods.

[0207] Furthermore, even when the radial thickness of the magnet assembly 100EX to be assembled is relatively thin, the angle and shape of the cut can be appropriately changed, and the magnetization direction can be freely controlled even for thinner magnet assemblies. For example, magnet assemblies with a thickness T2 of about 1 mm to 2 mm, which are difficult to achieve using conventional manufacturing methods, can also be achieved according to the manufacturing method of this embodiment (see [reference]). Figure 32 Therefore, there is more design freedom in this respect than before.

[0208] Because sintering heat treatment is not performed on thin parts as in the past, no breakage occurs during the sintering heat treatment process. Therefore, the yield is higher than before, resulting in very high economic efficiency.

[0209] Since the components processed in the assembly process SS60 are unmagnetized magnet mother parts 20, they can be assembled without attraction or repulsion. This eliminates the problem of poor jointing caused by attraction and repulsion between adjacent magnets in the previous Halbach arrangement assembly, making the jointing operation very easy and highly suitable for mass production.

[0210] Therefore, according to Embodiment 2, there is a method for manufacturing a magnet assembly that provides greater design freedom and is more economical than before.

[0211] In addition, as in the past Figure 32 As shown, it is generally believed that the orientation direction of molecules (easy magnetization axis) is affected by variations in the configuration of the magnetic source, the output magnitude of the magnetic source, and the output method. Due to these variations, individual differences in the magnetization direction can easily occur in each product, leading to inconsistent quality. However, according to the manufacturing method of the magnet assembly in Embodiment 2, since a parallel magnetic field is applied in a single direction, the same orientation direction (easy magnetization axis) of molecules is formed internally, thus suppressing deviations and helping to maintain high quality.

[0212]

Implementation Method 3

[0213] Figure 22 This is a cross-sectional view showing the cutting process SS40 of Embodiment 3. Among them, Figure 22 (a) is a right-side view of the magnet base material 10 before cutting, viewed from a direction perpendicular to side C 13c. Figure 19 (b) is a cross-sectional view of the magnet base material 30 obtained after the cutting process SS40 was performed. Figure 23 This is a cross-sectional view used to illustrate the assembly process SS60 in Embodiment 3. Figure 23 (a) is a diagram of the four magnet base parts 30 assembled together. Figure 23 (b) is a 3D view showing the 40-inch magnet base material assembly. Figure 24 This is a cross-sectional view of the magnet assembly 100IN after the magnetization process SS70 of Embodiment 3 has been performed. In the figure, the symbol 30EX refers to the specified outer diameter surface, and 30IN refers to the specified inner diameter surface.

[0214] For structural elements whose basic structure and features are the same as those in Embodiment 2, the symbols used in Embodiment 2 are referenced and their descriptions are omitted here.

[0215] The manufacturing method of magnet assembly 100IN in Embodiment 3 has basically the same structure as the manufacturing method of magnet assembly 100EX in Embodiment 2, but the setting of the cutting angle, shape, etc. in the cutting process SS40 is different from that in the manufacturing method of magnet assembly 100EX in Embodiment 2.

[0216] That is, such as Figure 22 As shown in (a), in the cutting process SS40, the angle θ1 of the cutting line 30EX' of the outer diameter surface relative to the first main surface 11 and the angle θ2 of the cutting line 30IN' of the inner diameter surface relative to the first main surface 11 are respectively set within the range of 0 degrees or more and less than 45 degrees. Under this setting, the magnet mother material 10 is cut along the cutting line 30EX' of the predetermined outer diameter surface and the cutting line 30IN' of the predetermined inner diameter surface.

[0217] In other words, the cutting line 30EX' of the specified outer diameter surface and the cutting line 30IN' of the specified inner diameter surface are respectively set within a range of more than 45 degrees and less than 90 degrees relative to the easy magnetization axis (the direction of the dotted line). Under such settings, the magnet base material 10 is cut along the cutting line 30EX' of the specified outer diameter surface and the cutting line 30IN' of the specified inner diameter surface.

[0218] Magnet matrix 30 obtained after performing the SS40 cutting process. Figure 22 As shown in (b). Afterwards, following the same assembly process SS60 as in Embodiment 2, the following result can be obtained: Figure 23 (b) shows the magnet mother material assembly 40IN. Figure 23 (a) corresponds to Figure 20 (a), and Figure 23 (b) corresponds to Figure 20 (b). Then, after performing the magnetization process SS70, the following can be obtained: Figure 24 The magnet assembly shown is 100IN.

[0219] In the manufacturing method of the magnet assembly 100IN according to Embodiment 3, since the angle of the cutting line is set as described above, it is possible to manufacture a magnet assembly (the magnet assembly 100IN on the inner circumferential side) with a polarity anisotropic arrangement in a direction perpendicular to the outer diameter surface, where the magnetization direction is closer to that perpendicular to the outer diameter surface. According to the manufacturing method of the magnet assembly 100IN according to Embodiment 3, it can also be configured such that the magnetization direction is 90 degrees relative to the outer diameter surface (the magnetization direction is consistent with the radial direction).

[0220] Since the manufacturing method of magnet assembly 100IN in embodiment three has a structure that is basically the same as the manufacturing method of magnet assembly 100EX in embodiment two, except for the setting of the cutting angle, shape, etc. in the cutting process SS40, it has the corresponding effects of the manufacturing method of magnet assembly 100EX in embodiment two.

[0221]

Implementation Method Four

[0222] By combining the magnet assembly 100EX obtained according to Embodiment 2 and the magnet assembly 100IN obtained according to Embodiment 3, a composite magnet assembly 100 similar to the magnet assembly 900 described in Patent Document 1 can be obtained (see...). Figure 30 ).

[0223] Composite magnet assembly 100 Figure 30 As shown, it consists of N magnet blocks 50 and 60 (refer to...) Figure 21 (b) and Figure 24 The components are joined together, and their outer and inner circumferences are formed into an N-sided cylindrical shape by the magnet assembly.

[0224] When nps = 2: nps is a number with the same polarity, npNS = 2: npNS is a number with different polarities, and ns is a set number (a natural number greater than 1), N is a natural number that satisfies the relationship N = nps·npNS·ns.

[0225] (1) The composite magnet assembly 100 includes: a first-type magnet assembly 100EX, which is obtained in Embodiment 2 where the angle between the magnetization direction of each magnet block 50 and the outer and inner diameter surfaces is a first angle (close to 0 degrees); and a second-type magnet assembly 100IN, which is obtained in Embodiment 3 where the angle between the magnetization direction and the outer and inner diameter surfaces of each magnet block 60 is a second angle (close to 90 degrees), which is different from the first angle. Furthermore, the first-type magnet assembly 100EX of the composite magnet assembly 100 is disposed on one side of the composite magnet assembly 100 that should be the effective H-flux surface 100H, and the second-type magnet assembly 100IN is disposed on one side of the composite magnet assembly that should be the effective V-flux surface 100V, and they are joined together (see reference). Figure 30 ).

[0226] Here, "effective H flux plane" refers to the outer surface of the composite magnet assembly 100, that is, the surface directly below which the magnetization direction inside is approximately horizontal (H) relative to the outer surface. "Effective V flux plane" refers to the outer surface of the composite magnet assembly 100, and the surface directly below which the magnetization direction inside is approximately perpendicular (V) to the outer surface.

[0227] exist Figure 30 The example shows a cylindrical composite magnet assembly 100 with its outer peripheral side surface set as an effective H-flux surface 100H and its inner peripheral side surface set as an effective V-flux surface 100V. This composite magnet assembly 100 is suitable for use as an inner rotor.

[0228] Here, "first angle (θ10)" refers to the angle θ10 formed between the tangent at the position of the magnetic pole on the outer peripheral surface (outer diameter surface) of the magnet assembly 100EX and the magnetization direction of the adjacent magnet block located directly below the position of the magnetic pole.

[0229] exist Figure 21 In (b), for example, the magnetic pole N appears on the outer peripheral surface of the joint between the magnet blocks 50-4 and 50-5, but the position of the magnetic pole N is illustrated as θ10, which corresponds to the first angle.

[0230] Similarly, "second angle (θ20)" refers to the angle θ20 formed between the tangent at the magnetic pole position on the outer peripheral surface (outer diameter surface) of the magnet assembly 100IN and the magnetization direction of the adjacent magnet block located directly below that magnetic pole position. Figure 24 In the diagram, for example, magnetic pole N appears on the outer peripheral surface of the joint between magnet block 60-5 and magnet block 60-6, and θ20 at the position of magnetic pole N corresponds to the second angle.

[0231] The above explanation is based on the outer circumferential surface (outer diameter surface), but the same definition applies when the inner circumferential surface (outer diameter surface) is used as the reference.

[0232] (2) The composite magnet assembly 100 described in the above example is a type of component in which the outer peripheral surface is set as the effective H-flux surface 100H, but Embodiment 4 is not limited to this. For example, another type of composite magnet assembly (illustration omitted) can be constructed by setting the first angle θ10 to an angle close to 90 degrees and the second angle θ20 to an angle close to 0 degrees, and setting the inner peripheral surface as the effective H-flux surface. The composite magnet assembly is suitable for use as an outer rotor.

[0233]

Implementation Method Five

[0234] Figure 25 This is a flowchart illustrating the manufacturing method of the magnet assembly and the manufacturing method of the polarity anisotropic magnet involved in Embodiment 5. Figure 26 This is a diagram used to illustrate the sub-assembly process SS80. Figure 27 This is a diagram used to illustrate the SS85 square magnetization process. Figure 27 The components indicated by symbols 45 and 3 are in a magnetized state. For structural elements with the same basic structure and features as those in embodiments one to four, the symbols in embodiments one to four are marked, and their descriptions are cited while the descriptions in embodiment five are omitted.

[0235] The manufacturing method of the magnet assembly in Embodiment 5 differs from that in Embodiment 3 in the scope and method of the assembly and magnetization processes performed after the cutting process.

[0236] like Figure 25 As shown, the manufacturing method of the magnet assembly according to Embodiment 5 includes at least the following steps in sequence: powder material preparation step SS10, magnetic field forming step SS20, cutting step SS40, sub-assembly step SS80, and tetragonal magnetization step SS85. In Embodiment 5, a magnet assembly step SS90 is also included after the tetragonal magnetization step SS85. Alternatively, a surface treatment step SS50 may be performed between the cutting step SS40 and the sub-assembly step SS80, or between the sub-assembly step SS80 and the tetragonal magnetization step SS85.

[0237] The powder material preparation process SS10, the magnetic field forming process SS20, and the cutting process SS40 are the same as those processes in Implementation Method 3.

[0238] Sub-assembly step SS80 is a process of assembling a four-sided magnet mother material sub-assembly 45 by combining at least four magnet mother material parts 20 and 30. In Embodiment 5, the assembly step SS60 described in Embodiment 3 is constituted by this sub-assembly step SS80.

[0239] like Figure 26 As shown, in the sub-assembly process SS80, on the side of the effective surface VSF of the magnet mother material sub-assembly 45, which is "the surface that should generate magnetic flux among the four surfaces (in cross-sectional view) constituting the magnet mother material sub-assembly 45", a horizontal magnet mother material 20 is arranged, which is cut within a set range of angles θ1 and θ2 in the cutting process SS40, which are both greater than 45 degrees and less than 90 degrees. On the side opposite to the effective surface VSF, a vertical magnet mother material 30 is arranged, which is cut within a set range of angles θ1 and θ2 in the cutting process SS40, which are both greater than 0 degrees and less than 45 degrees. Based on this, they are combined and bonded to obtain the magnet mother material sub-assembly 45.

[0240] At this stage, since the magnet mother materials 20 and 30 are not yet magnetized, they do not generate repulsive or attractive forces towards each other. Therefore, it is easy to perform operations such as combining and bonding the magnet mother materials 20 and 30 to each other.

[0241] like Figure 27 As shown, in the four-sided magnetization process SS85, a first-direction magnetic field is applied to the effective surface VSF of the magnet mother material sub-assembly 45 in a manner that surrounds it, and a second-direction magnetic field is applied to the other three surfaces to magnetize the magnet mother material sub-assembly 45. Figure 27In the example, a positive magnetic field generated by a first magnetic source 731 for magnetization is applied to the first surface SF1 of the effective surface VSF, which is the magnet mother material sub-assembly 45. Negative magnetic fields generated by second magnetic sources 732b, 732a, and 732a for magnetization are applied to the remaining second surface SF2, third surface SF3, and fourth surface SF4, respectively, thereby obtaining a polar anisotropic magnet 3N that emits positive magnetic field lines from the effective surface VSF.

[0242] By appropriately changing the polarity of the first and second directions, which are the directions in which the magnetic field is applied, it is possible to obtain a polar anisotropic magnet 3S that has the opposite polarity to the magnetic field lines emitted from the effective surface VSF of the polar anisotropic magnet.

[0243] The detailed description of the tetrahedral magnetization process SS85 other than those described above is the same as that of the tetrahedral magnetization process S40 in Embodiment 1, so the description of the tetrahedral magnetization process S40 in Embodiment 1 is used and omitted here. For reference, the magnetization process described in Embodiment 3 is constituted by this tetrahedral magnetization process SS85 in Embodiment 5.

[0244] The above process yields an anisotropic magnet 3 (the above is the manufacturing method of the anisotropic magnet in Embodiment 5).

[0245] Magnet assembly process SS90 is a process of assembling magnet assemblies by combining anisotropic magnets 3N and 3S obtained in the tetragonal magnetization process SS85. For example, anisotropic magnets 3N and 3S with opposite polarities emanating magnetic field lines from the effective surface VSF are bonded together on their sides. In this case, since the magnetic poles of adjacent anisotropic magnets 3N and 3S are opposite (N pole and S pole), they attract each other during bonding, making assembly very easy. After the above process, a magnet assembly can be obtained. Figure 25 The cylindrical (ring-shaped) magnet assembly 100' shown below (manufacturing method of magnet assembly according to embodiment five).

[0246] The manufacturing method for the magnet assembly and the manufacturing method for the polar anisotropic magnet according to Embodiment 5 is a manufacturing method that combines the magnet master material parts 20 and 30 obtained by parallel magnetic field and cutting technology in Embodiments 2 to 4 with the magnetization based on tetragonal magnetization technology in Embodiment 1. Therefore, it is possible to simultaneously obtain the advantages of parallel magnetic field and cutting technology in Embodiments 2 to 4 (no mold frame required, high design freedom, etc.) and the advantages of tetragonal magnetization in Embodiment 1 (while overcoming the design constraints of thickness, obtaining polar anisotropic magnets with horizontal and vertical polar anisotropic arrangements respectively on the basis of mass production).

[0247]

Application Example

[0248] The magnet assembly 100EX obtained in Embodiment 2, the magnet assembly 100IN obtained in Embodiment 3, and the composite magnet assembly 100 of Embodiment 4 constructed using them can be applied to various product fields. For example, it can be configured as an electric motor having a rotor including the composite magnet assembly 100 (see...). Figure 12 (a) A generator having a rotor including a composite magnet assembly 100) (Refer to) Figure 12 (b) An actuator having a rotor comprising a composite magnet assembly 100 Figure 12 (c) etc.

[0249] The composite magnet assembly 100 is preferably used as a rotating rotor, but it can also be used as a stationary stator. In this case, the term "rotor" can be replaced with "stator" in this specification, and the structure in this case is also included within the scope of the invention.

[0250] The present invention has been described above based on the embodiments described above, but the present invention is not limited to the embodiments described above. It can be implemented in various ways without departing from the concept, for example, the following modifications can be made.

[0251] (1) The above description describes the magnet assemblies 100EX and 100IN obtained in Embodiments 2 and 3 as being in a cylindrical shape, but the present invention is not limited thereto. It can also be applied to linear magnet assemblies (illustrations omitted).

[0252] For example, based on setting the lengths of the cutting line 20EX' of the specified outer diameter surface and the cutting line 20IN' of the specified inner diameter surface to be equal in embodiments two and three, a linear magnet assembly can be constructed by arranging the surfaces that should become the effective H-flux surfaces of the composite magnet assembly between adjacent magnet blocks in a manner that is approximately the same plane.

[0253] In this case, the structure can be implemented in the same way as in embodiments two to four, except that it is not cylindrical. By combining the linear first-form magnet assembly and the second-form magnet assembly, for example, it is possible to obtain... Figure 29 (a) shows the linear composite magnet assembly 130.

[0254] (2) By using the linear composite magnet assembly 130, a linear motor structure 550 including the composite magnet assembly 130 can also be constructed (see reference). Figure 28 , Figure 29 (b) and Figure 29 (c)). In this case, the rotor (rotor) in this specification can be replaced by a mover (mover) for application.

[0255] Figure 28This is a schematic diagram of the linear motor structure 550 used to illustrate application examples and variations. Figure 29 This is a diagram illustrating the detailed structure of the linear motor 550. Among them, Figure 29 (b) Cutting along a plane parallel to the length axis. Figure 28 The sectional view of the linear motor structure shown at angle 550. Figure 29 (c) is along Figure 29 (b) Cross-sectional view of AA wire cutting. In the figure, symbol 552 is the track, 553 is the moving body, 553a is the coil part of the moving body, 70 and 80 are magnet blocks, 130EX is the magnet assembly on the outer diameter side, 130IN is the magnet assembly on the inner diameter side, and 130 is the composite magnet assembly.

[0256] [Symbol Explanation]

[0257] 1N, 1N', 1S, 1S', 2N, 2N', 2S, 2S', 3, 3N, 3S… Anisotropic magnets; 5… Premagnetized material; 6… Soft magnet; 10… Magnet matrix; 11… First principal surface; 12… Second principal surface; 13a… Side A; 13b… Side B; 13c… Side C; 13d… Side D; 20, 30… Magnet matrix components; 20EX, 30EX… Specified outer diameter surfaces; 20EX', 30EX'… Cutting lines of specified outer diameter surfaces; 20 IN, 30IN… specifies the inner diameter surface; 20IN', 30IN'… specifies the cutting line of the inner diameter surface; 21, 24… mating side surface; 22… one end side surface; 23… the other end side surface; 40EX, 40IN… magnet mother material assembly; 45… magnet mother material sub-assembly; 50, 60, 70, 80… magnet block; 100, 100', 100EX, 100IN, 110, 120, 130EX, 130IN, 400EX, 400IN, 420L… 420U, 430, 900, 900EX, 900IN… Magnet assemblies; 100H… Effective H flux plane; 100V… Effective V flux plane; 130… Composite magnet assemblies; 400… Cylindrical double-layer magnet units; 420… Linear double-layer magnet units; 510… Motors; 520… Generators; 530… Actuators; 550… Linear motor structures; 552… Guide rails; 553… Moving bodies; 553a… Coil sections of moving bodies; 710 …Mold frame; 721…First magnetic source; 722, 722a, 722b, 722c…Second magnetic source; 731…First magnetic source for magnetization; 732, 732a, 732b, 732c…Second magnetic source for magnetization; 890, 810…Mold frame; 810a…Inner side of mold frame; 820N, 820S, 830N, 830S, 840N, 840S…Magnetic source; 905, 906, 907, 908…Magnets; 905', 906'…Main material.

Claims

1. A method for manufacturing an anisotropic magnet, used to manufacture a magnet having four faces that, when viewed in cross-section, face four directions respectively, characterized in that... In order, they include: Powder material preparation process, used to prepare powder materials for magnets; In the magnetic field forming process, when the surface that should generate magnetic flux in a concentrated manner among the four surfaces is designated as the effective surface, a magnetic field in a first direction is applied to the imaginary effective surface from the outside of the mold frame corresponding to the desired shape of the anisotropic magnet, while a magnetic field in a second direction is applied to the other three surfaces respectively. At the same time, the powder material is sequentially fed into the inside of the mold frame to form a magnet master material that conforms to the shape of the mold frame. as well as The four-sided magnetization process magnetizes the magnet material by applying a magnetic field in a first direction to the effective surface of the magnet material and a magnetic field in a second direction to the remaining three surfaces, in a manner that surrounds the magnet material obtained based on the magnet matrix.

2. The method for manufacturing anisotropic magnets according to claim 1, characterized in that: In the magnetic field forming process, a first magnetic source is configured with its first magnetic pole facing the imaginary effective surface, and a second magnetic source is configured with its second magnetic pole facing each of the other three surfaces (excluding the effective surface). Simultaneously, a magnetic field in the first direction is applied to the imaginary effective surface, and a magnetic field in the second direction is applied to the other three surfaces. In the four-sided magnetization process, a first magnetic source for magnetization is configured with the first magnetic pole facing the effective surface, and a second magnetic source for magnetization is configured with the second magnetic pole facing each of the other three surfaces. Then, after the first and second magnetic sources for magnetization are activated, a magnetic field in the first direction is applied to the effective surface, and a magnetic field in the second direction is applied to the other three surfaces.

3. The method for manufacturing anisotropic magnets according to claim 1 or 2, characterized in that: Between the magnetic field forming process and the square magnetization process, a sintering heat treatment process is further included to perform sintering heat treatment on the magnet base material obtained by the magnetic field forming process.

4. The method for manufacturing anisotropic magnets according to claim 1 or 2, characterized in that: The desired shape of the polar anisotropic magnet is a segmented ring shape that divides the ring N into equal parts when viewed in section, where N is a natural number greater than or equal to 2.

5. The method for manufacturing anisotropic magnets according to claim 2, characterized in that: In the magnetic field forming process, the width of the side of the first magnetic source where the first magnetic pole is disposed is set to be narrower than the width of the hypothetical effective surface, and / or, In the quadrangular magnetization process, the width of the side of the first magnetic source for magnetization where the first magnetic pole is disposed is set to be narrower than the width of the effective surface.

6. A polarity anisotropic magnet, having four faces that, when viewed in cross-section, face four directions respectively, characterized in that: When the surface that should generate magnetic flux is designated as the effective surface among the four surfaces, a magnetic pole is arranged on the effective surface, and another magnetic pole is arranged on the other three surfaces. When viewed in cross-section, the interior of the polar anisotropic magnet is formed continuously without any joint marks.

7. The polar anisotropic magnet according to claim 6, characterized in that: When viewed in section, it presents a segmented ring shape that divides the circular ring into N equal parts, where N is a natural number greater than or equal to 2.

8. A magnet assembly, characterized in that, include: The polar anisotropic magnets as described in claims 6 or 7, The magnet assembly is formed by arranging the anisotropic magnets in a manner that alternates between the one magnetic pole and the other magnetic pole, and then joining them together.

9. The magnet assembly according to claim 8, characterized in that: The anisotropic magnets are arranged circumferentially and are roughly cylindrical in shape.

10. An electric motor, characterized in that, include: The rotor includes the magnet assembly as described in claim 9.

11. A generator, characterized in that, include: The rotor includes the magnet assembly as described in claim 9.

12. An actuator, characterized in that, include: The rotor includes the magnet assembly as described in claim 9.

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