Optical device and optical communication apparatus

By employing a buffer layer structure consisting of a thick film and a thin film in the optical modulator, the DC drift problem caused by temperature rise is solved, thereby improving the stability and lifespan of the optical modulator and reducing light scattering loss.

CN115903286BActive Publication Date: 2026-07-17FUJITSU OPTICAL COMPONENTS LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
FUJITSU OPTICAL COMPONENTS LTD
Filing Date
2022-07-06
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing optical modulators are prone to DC drift when the temperature rises, causing the bias voltage to change over time and affecting the normal control of the optical modulator.

Method used

A buffer layer structure consisting of a thick film portion and a thin film portion is adopted. The thick film portion covers the rib portion of the optical waveguide, and the thin film portion covers the plate portion of the optical waveguide. A thickness difference is set between the electrode and the optical waveguide to reduce the light scattering loss and the influence of the buffer layer resistance value.

Benefits of technology

It effectively prevents DC drift, improves the lifespan of the optical modulator and its stability under high temperature conditions, and reduces light scattering loss.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present application relates to optical devices and optical communication apparatuses. An optical device includes a rib waveguide as a thin film lithium niobate (LN) crystal, a buffer layer laminated on the rib waveguide, and an electrode for applying a voltage to the rib waveguide. The buffer layer includes a thick film portion laminated on a rib of the rib waveguide and a thin film portion laminated on a plate of the rib waveguide, wherein the plate is located on both sides of the rib, and a thickness of the thin film portion is less than a thickness of the thick film portion.
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