Electrode implantation site planning method and device, readable storage medium, terminal

Abstract

An electrode implantation site planning method, apparatus, readable storage medium, and terminal are disclosed. The method includes: determining an original image acquired for an electrode implantation target; segmenting the original image to determine a non-implantable region and an implantable region; determining a plurality of first candidate implantation sites within the implantable region based on a first preset electrode distance; for each first candidate implantation site, determining a preliminary matching point based on the first preset electrode distance; and filtering each first candidate implantation site and its preliminary matching point based on a second preset electrode distance to determine the electrode implantation site planning result. Using the above scheme can improve the accuracy and security of the electrode implantation site planning result.

Description

Technical Field

[0001] This invention relates to the field of electrode implantation technology, and in particular to an electrode implantation site planning method and apparatus, a readable storage medium, and a terminal. Background Technology

[0002] Electrode implantation techniques include single-needle electrode implantation and multi-needle electrode implantation (e.g., implanting two or four electrodes at a time). Compared to single-needle electrodes, multi-needle electrodes generally obtain higher quality signals and are currently the commonly used electrode implantation mode in animal experiments. In practical applications, the implantation site (or implantation location) of the electrode is often carefully planned before the procedure. Taking brain electrode implantation as an example, compared to scalp electrodes, neural electrodes implanted in the cerebral cortex can record neurophysiological signals with a higher signal-to-noise ratio, helping researchers to more effectively understand changes in brain activity. However, the cerebral cortex has a large number of blood vessels; if the implantation site is not planned accurately, the electrode may be implanted into a vascular area, causing a risk of bleeding. Therefore, ensuring the accuracy of the planned electrode implantation site is crucial.

[0003] In existing technologies, the planning of implantation sites for multi-needle electrodes mainly relies on manual planning. The implantation site planner visually identifies and selects the implantation sites based on images of the subject captured by a camera, and then relays this information to the implantation operator for electrode implantation. This method, which relies on manual determination of implantation sites, suffers from insufficient accuracy and, for multi-needle electrode implantation, is complex, cumbersome, and inefficient. Summary of the Invention

[0004] The technical problem solved by the embodiments of the present invention is how to improve the accuracy and safety of electrode implantation site planning results.

[0005] To address the aforementioned technical problems, embodiments of the present invention provide an electrode implantation site planning method, comprising the following steps: determining an original image acquired for an electrode implantation object; segmenting the original image to determine a non-implantable region and an implantable region; determining a plurality of first candidate implantation sites within the implantable region based on a first preset electrode distance; for each first candidate implantation site, determining a preliminary matching point for the first candidate implantation site based on the first preset electrode distance; and filtering each first candidate implantation site and its preliminary matching point based on a second preset electrode distance to determine the electrode implantation site planning result.

[0006] Optionally, the electrode is implanted into the cerebral cortex, the non-implantable area is a vascular area, and the implantable area is a non-vascular area.

[0007] Optionally, the implantable region includes one or more closed contours; determining multiple first candidate implantation sites within the implantable region based on a first preset electrode distance includes: determining the circumferential contour of each closed contour included in the implantable region; dividing the circumferential contour into multiple sub-regions of the same size based on the first preset electrode distance; determining whether there is a center point within the closed contour among the center points of each sub-region; if the determination result is yes, then the center point within the closed contour is taken as the first candidate implantation site; if the determination result is no, then the center of the closed contour is taken as the first candidate implantation site.

[0008] Optionally, the sub-region is a square region; the step of dividing the outer contour into multiple sub-regions of the same size based on the first preset electrode distance includes: dividing the outer contour into multiple square regions of the same size with the first preset electrode distance as the side length of the square.

[0009] Optionally, for each first candidate implantation site, based on the first preset electrode distance, a preliminary pairing point for the first candidate implantation site is determined, including: for each first candidate implantation site within the closed contour, a circle is determined with the first candidate implantation site as the center and the first preset electrode distance as the radius; and points that fall on the circumference of the circle among the other first candidate implantation sites within the closed contour (excluding the center of the circle) are selected as the preliminary pairing point of the center of the circle.

[0010] Optionally, the step of screening each first candidate implantation site and its preliminary matching point based on the second preset electrode distance to determine the electrode implantation site planning result includes: determining sites from each first candidate implantation site with a number of preliminary matching points greater than or equal to a first preset number as second candidate implantation sites; selecting the first preset number of points from the preliminary matching points of the second candidate implantation sites as actual matching points of the second candidate implantation sites, wherein each second candidate implantation site and its actual matching point constitute a group of planned sites; and screening the obtained multiple groups of planned sites based on the second preset electrode distance to determine the electrode implantation site planning result.

[0011] Optionally, based on the second preset electrode distance, the obtained multiple sets of planned sites are screened to determine the electrode implantation site planning result, including: determining the implantation order of the obtained multiple sets of planned sites; for each pair of planned sites with adjacent implantation order, determining the distance between each pair of planned sites in the current group and the previous group; determining whether the minimum distance among the obtained multiple distances is greater than or equal to the second preset electrode distance; if the determination result is not, then the current group of planned sites is discarded; if the number of the selected multiple sets of planned sites is greater than or equal to the second preset number, then each selected set of planned sites is taken as the electrode implantation site planning result.

[0012] Optionally, the method further includes: if the number of selected multiple planning sites is less than the second preset number, then through one or more rounds of erosion treatment, the area of ​​the implantable region is increased until the number of selected multiple planning sites is greater than or equal to the second preset number.

[0013] Optionally, the re-etching process is selected from: etching by reducing the filter size; and / or etching by reducing the number of iterations.

[0014] Optionally, after determining the implantable area and before determining the electrode implantation site planning results, the method further includes: performing preliminary etching treatment on the implantable area.

[0015] Optionally, determining the original image acquired for the electrode implantation object includes: acquiring an image of the electrode implantation object using a preset light source and an image sensor to obtain the original image; the preset light source is selected from: a white light source, a green light source, and a strobe light source obtained based on the white light source and the green light source.

[0016] This invention also provides an electrode implantation site planning device, comprising: an original image determination module for determining an original image acquired for an electrode implantation object; an image segmentation module for segmenting the original image to determine a non-implantation region and an implantable region; a candidate implantation site determination module for determining a plurality of first candidate implantation sites within the implantable region based on a first preset electrode distance; a preliminary pairing point determination module for determining a preliminary pairing point for each first candidate implantation site based on the first preset electrode distance; and a planning result determination module for filtering each first candidate implantation site and its preliminary pairing point based on a second preset electrode distance to determine the electrode implantation site planning result.

[0017] This invention also provides a readable storage medium storing a computer program thereon, which, when run by a processor, executes the steps of the electrode implantation site planning method described above.

[0018] This invention also provides a terminal, including a memory and a processor, wherein the memory stores a computer program that can run on the processor, and the processor executes the steps of the above-described electrode implantation site planning method when running the computer program.

[0019] Compared with the prior art, the technical solution of the embodiments of the present invention has the following beneficial effects:

[0020] In this embodiment of the invention, image segmentation is performed on the original image to determine non-implantable and implantable regions. Then, based on a first preset electrode distance (i.e., the safe distance between electrodes within the same group), multiple first candidate implantation sites are determined within the implantable region. Based on the first preset electrode distance, preliminary matching points (i.e., other first candidate implantation sites whose distance from the first candidate implantation site meets the safe electrode distance within the group) are determined for each first candidate implantation site. Then, based on a second preset electrode distance (i.e., the safe distance between electrodes in adjacent groups), each obtained first candidate implantation site and its preliminary matching point are screened to select multiple planned sites that meet the safe electrode distance requirements between groups, thereby determining the electrode implantation site planning result. Using the technical solution provided by this embodiment of the invention, electrode implantation sites can be planned automatically and efficiently, and relatively accurate electrode implantation site planning results can be obtained.

[0021] Furthermore, based on the second preset electrode distance, the obtained multiple sets of planned sites are screened to determine the electrode implantation site planning results. This includes: determining the implantation order of the obtained multiple sets of planned sites; for each pair of planned sites with adjacent implantation orders, determining the distance between each pair of planned sites in the current group and the previous group; determining whether the minimum distance among the obtained multiple distances is greater than or equal to the second preset electrode distance; if the determination result is not, then the current group of planned sites is discarded; if the number of selected multiple sets of planned sites is greater than or equal to the second preset number, then each selected set of planned sites is taken as the electrode implantation site planning result. Thus, several sets of planned sites that satisfy both the intra-group electrode safety distance and the inter-group electrode safety distance can be accurately screened.

[0022] Furthermore, if the number of selected planning sites is less than the second preset number, the second preset electrode distance is reduced. Then, based on the reduced second preset electrode distance, the resulting planning sites are screened to determine the electrode implantation site planning result. Alternatively, if the number of selected planning sites is less than the second preset number, the implantable region undergoes one or more rounds of re-etching to increase its area until the number of selected planning sites is greater than or equal to the second preset number. It is understood that if the number of selected planning sites is insufficient, it may be due to an excessively large second preset electrode distance or an excessively small implantable region. Therefore, by reducing the second preset electrode distance or increasing the implantable region area, an electrode implantation site planning result that meets the quantity requirements can be obtained. Attached Figure Description

[0023] Figure 1 This is a flowchart of an electrode implantation site planning method according to an embodiment of the present invention;

[0024] Figure 2 yes Figure 1 A flowchart of a specific implementation of step S13;

[0025] Figure 3 This is a schematic diagram illustrating a scenario in an implantable region where a first candidate implantation site and its preliminary matching point are determined.

[0026] Figure 4 yes Figure 1 A flowchart of a specific implementation of step S15;

[0027] Figure 5 This is a schematic diagram of the structure of an electrode implantation site planning device according to an embodiment of the present invention. Detailed Implementation

[0028] As mentioned in the background section, in electrode implantation technology, if the implantation site is not planned accurately, the electrode may be implanted into a blood vessel, causing a risk of bleeding. Therefore, ensuring the accuracy of the planned electrode implantation site is crucial.

[0029] In existing technologies, the planning methods for multi-needle electrode implantation sites mainly rely on manual planning. Specifically, the implantation process usually requires at least two people, including an implantation site planner and an implantation operator. The implantation site planner determines the implantable area based on images of the subject captured by a camera, using human visual identification or computer vision methods. Then, the planner manually selects multiple consecutive sets of equidistant points (each set of equidistant points corresponds to multiple electrodes implanted in a single session) as the planned electrode implantation sites and provides feedback to the implantation operator for electrode implantation.

[0030] However, in practice, because implantation site planners often struggle to determine the conversion between image pixels and actual physical distances, and implantation operators also find it difficult to ascertain whether the planned spacing of the implantation sites meets the requirements, discrepancies may arise between the planned implantation sites and the actual required locations during implantation. This can potentially damage blood vessels. Furthermore, for multi-needle electrode implantation, not only the electrode implantation sequence but also the distance between each group of equidistant points must be considered. Relying on manual planning makes the process complex, cumbersome, inaccurate, and inefficient.

[0031] To address the aforementioned technical problems, embodiments of the present invention provide an electrode implantation site planning method, specifically comprising: determining an original image acquired for an electrode implantation object; segmenting the original image to determine a non-implantable region and an implantable region; determining a plurality of first candidate implantation sites within the implantable region based on a first preset electrode distance; for each first candidate implantation site, determining a preliminary matching point for the first candidate implantation site based on the first preset electrode distance; and filtering each first candidate implantation site and its preliminary matching point based on a second preset electrode distance to determine the electrode implantation site planning result.

[0032] Therefore, in this embodiment of the invention, based on a first preset electrode distance (i.e., the safe distance between electrodes within the same group), multiple first candidate implantation sites and their preliminary matching points are determined within the implantable area. The preliminary matching points are each of the first candidate implantation sites whose distance from the first candidate implantation site satisfies the safe distance between electrodes within the group. Then, based on a second preset electrode distance (i.e., the safe distance between electrodes between adjacent groups), the obtained first candidate implantation sites and their preliminary matching points are screened, thereby selecting multiple planned sites that meet the safe distance requirements between electrodes within groups, and thus determining the electrode implantation site planning result. The electrode implantation site planning scheme provided by this embodiment of the invention, by integrating the safe distances between electrodes within the same group and the safe distances between electrodes in different groups, can not only automatically and efficiently plan electrode implantation sites, but also obtain relatively accurate and reliable electrode implantation site planning results.

[0033] To make the above-mentioned objectives, features and beneficial effects of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0034] Reference Figure 1 , Figure 1 This is a flowchart of an electrode implantation site planning method according to an embodiment of the present invention. The method may include steps S11 to S15:

[0035] Step S11: Determine the original image acquired for the electrode implantation subject;

[0036] Step S12: Perform image segmentation on the original image to determine the non-implantable region and the implantable region;

[0037] Step S13: Based on the first preset electrode distance, determine a plurality of first candidate implantation sites within the implantable area;

[0038] Step S14: For each first candidate implantation site, determine the preliminary matching point of the first candidate implantation site based on the first preset electrode distance;

[0039] Step S15: Based on the second preset electrode distance, screen each first candidate implantation site and its preliminary matching point to determine the electrode implantation site planning result.

[0040] In a specific implementation of step S11, the electrode implantation object may include a body part of a human or animal body that can obtain neurophysiological signals by implanting an electrode, such as the cerebral cortex, nerve reflex sites of the face / neck / lower legs, etc.

[0041] In some non-limiting embodiments, the electrode implantation target may be the cerebral cortex, the non-implantable area may be a vascular area, and the implantable area may be a non-vascular area.

[0042] Furthermore, the original image can be obtained by acquiring images of the electrode implantation object using a preset light source and image sensor (e.g., a camera). The preset light source can be selected from: a white light source, a green light source, or a stroboscopic light source based on a white light source and a green light source (also referred to as a white-green stroboscopic light source).

[0043] In this embodiment of the invention, using a white light source, a green light source, or a white-green strobe light source as the light source for acquiring the original image helps to obtain a clearer image, and the contrast between the vascular region and the non-vascular region in the acquired original image will be stronger, thereby facilitating more efficient and accurate subsequent image segmentation processing to determine the non-implantable region and the implantable region.

[0044] In the specific implementation of step S12, the image segmentation method is the process of dividing an image into several specific regions with unique properties and extracting the target of interest. This embodiment of the invention does not limit the image segmentation method used; it can be any existing conventional method, such as threshold-based segmentation methods, region-based segmentation methods, edge-based segmentation methods, and segmentation methods based on specific theories.

[0045] Furthermore, after determining the implantable area and before determining the electrode implantation site planning results, the method described in this embodiment of the invention may further include: performing preliminary corrosion treatment on the implantable area.

[0046] Taking the implantable region as a non-vascular region and the non-implantable region as a vascular region as an example, the purpose of the preliminary erosion process is to reduce the area of ​​the non-vascular region, and correspondingly, the area of ​​the vascular region can be expanded. Thus, by expanding the area of ​​the vascular region obtained from image segmentation to a certain extent (the expanded vascular region is entirely a non-implantable region, where no implantation site exists), the area of ​​the non-vascular region is sacrificed, thereby helping to improve the safety and reliability of the subsequently determined implantation site planning results.

[0047] In a specific implementation of step S13, the first preset electrode distance can be a safe distance between every two adjacent electrodes within the same group. This safe distance can be used to indicate the minimum allowable distance between every two adjacent electrodes within the same group. It is understood that if the distance between a pair of adjacent electrodes within the same group is smaller than this safe distance, it may result in the acquisition of inaccurate and effective signals, and / or may increase the complexity and risk of electrode implantation.

[0048] The first preset electrode distance can be determined based on industry-specific (primarily medical) standards related to electrode implantation. In different application scenarios, for example, depending on the object (or site) of electrode implantation, the value of the first preset electrode distance may vary. In practice, a user interface can be provided to the electrode implantation operator, allowing them to input or select an appropriate value as the first preset electrode distance as needed.

[0049] In this embodiment of the invention, the implanted electrodes are divided into "groups," with a single implantation corresponding to one group and multiple implantations corresponding to multiple groups. Each group may contain one or more electrodes, and each electrode has its own implantation site (or implantation location). If each group contains multiple electrodes, the multiple electrodes in that group may be implanted simultaneously in a single implantation.

[0050] Reference Figure 2 , Figure 2 yes Figure 1 A flowchart of a specific implementation of step S13. In this specific implementation, the implantable region includes one or more closed contours. Determining multiple first candidate implantation sites within the implantable region based on a first preset electrode distance in step S13 may include steps S21 to S23, and step S24 or step S25.

[0051] In step S21, for each closed contour contained in the implantable region, the circumscribed contour of the closed contour is determined.

[0052] It is understood that the shape of the closed contour included within the implantable region can be selected from various regular or irregular shapes. The shape of the circumscribed contour determined by the closed contour can be a circumscribed rectangle. The method for determining the circumscribed rectangle can be a conventional method, for example, at least three appropriate endpoints can be selected on the edge line of the closed contour to determine the circumscribed rectangle. The shape of the circumscribed contour can also be other suitable shapes, such as circles, ellipses, rhombuses, trapezoids, pentagons, hexagons, etc. The embodiments of the present invention do not limit this.

[0053] In step S22, based on the first preset electrode distance, the outer contour is divided into regions to obtain multiple sub-regions of the same size.

[0054] As a non-limiting embodiment, the sub-region can be a square region, or a circular region, a triangular region, or other regular polygonal regions.

[0055] Further, step S22 may specifically include: dividing the outer contour into regions with the first preset electrode distance as the side length of the square to obtain multiple square regions of the same size.

[0056] In step S23, it is determined whether there is a center point in each sub-region that falls within the closed contour.

[0057] If the judgment result is yes, that is, if there is a center point in each sub-region that falls within the closed contour, then continue to execute step S24; if the judgment result is no, that is, if there is no center point in each sub-region that falls within the closed contour, then continue to execute step S25.

[0058] In step S24, the center point that falls within the closed contour is taken as the first candidate implantation site.

[0059] In step S25, the center of the closed contour is used as the first candidate implantation site.

[0060] The center of the closed contour can be, for example, the centroid of the shape formed by the closed contour.

[0061] Continue to refer to Figure 1In a specific implementation of step S14, the implantable region includes one or more closed contours. The preliminary matching point of the first candidate implantation site can be any of the first candidate implantation sites that belong to the same closed contour as the first candidate implantation site and whose distance from the first candidate implantation site meets the group electrode safety distance.

[0062] The intra-group electrode safety distance refers to the safety distance between any two adjacent electrodes within the same group. For a detailed explanation of this safety distance, please refer to the description of the first preset electrode distance in step S13 above; it will not be repeated here.

[0063] Specifically, in step S14, for each first candidate implantation site, based on the first preset electrode distance, a preliminary pairing point for the first candidate implantation site is determined. This may include: for each first candidate implantation site within the closed contour, a circle is determined with the first candidate implantation site as the center and the first preset electrode distance as the radius; and points that fall on the circumference of the circle among the other first candidate implantation sites within the closed contour (excluding the center of the circle) are selected as the preliminary pairing points of the center of the circle.

[0064] It should be noted that, in this embodiment of the invention, during the process of determining the preliminary pairing point for each first candidate implantation site, selection is made only from other first candidate implantation sites located within the same closed contour as the first candidate implantation site (center), without considering first candidate implantation sites located within other closed contours (i.e., pairing selection is performed separately within their respective closed contours). This avoids pairing selection across closed contours, which could lead to inoperability or operational complexity issues during subsequent electrode implantation, thus improving the reliability of the final planning result.

[0065] In a specific implementation of step S15, the second preset electrode distance can be a safe distance between electrodes in two adjacent implantation groups. This safe distance can be used to indicate the minimum allowable distance between any two electrodes in each of the two adjacent groups. It is understood that if the distance between two adjacent implantation groups is smaller than this safe distance, it may also lead to the inability to obtain accurate and effective signals, and / or may increase the complexity and risk of electrode implantation.

[0066] For details regarding the specific meaning, determination method, and numerical settings of the second preset electrode distance, please refer to the relevant content on the first preset electrode distance in step S13 above, which will not be repeated here.

[0067] Reference Figure 3 , Figure 3 This is a schematic diagram of a scenario in which the first candidate implantation site and its preliminary matching point are determined in the implantable area according to an embodiment of the present invention.

[0068] The implantable region 30 contains multiple closed contours 31, and, without limitation, a circumscribed rectangle 32 is defined for each closed contour 31. Figure 3 Only the outer contour 32 of one of the closed contours 31 is shown schematically; based on the first preset electrode distance a, the outer contour 32 is divided into multiple square regions 33 of the same size; the center point of each square region 33 that falls within the closed contour 31 is taken as the first candidate implantation site A (for ease of understanding, Figure 3 Only the center points that fall within the closed contour 31 are shown; center points that do not fall within the closed contour 31 are not shown.

[0069] After determining a number of first candidate implantation sites A, for each first candidate implantation site A within the closed contour 31, a circle C is determined with A as the center and the first preset electrode distance a as the radius; then, points that fall on the circumference of the circle C among the other first candidate implantation sites within the closed contour 31, excluding the center A, are selected as the preliminary pairing points of the center A.

[0070] It should be noted that, Figure 3 The image only schematically illustrates the implantable region 30, including the closed contour 31 and several first candidate implantation sites A therein, and does not constitute a limitation on the shape and size of the implantable region, or the number, position, and shape of the closed contour, first candidate implantation sites, etc. in actual applications.

[0071] Reference Figure 4 , Figure 4 yes Figure 1 A flowchart of a specific implementation of step S15. In step S15, based on the second preset electrode distance, multiple sets of planned sites are screened to determine the electrode implantation site planning result, which may include steps S41 to S43.

[0072] In step S41, from each of the first candidate implantation sites, sites with a preliminary number of matching points greater than or equal to a first preset number are determined as second candidate implantation sites.

[0073] In step S42, the first preset number of points are selected from the preliminary matching points of the second candidate implantation sites as the actual matching points of the second candidate implantation sites, wherein each second candidate implantation site and its actual matching point constitute a set of planned sites.

[0074] The first preset quantity can be the number of electrodes required in each group of electrodes in actual application minus 1. The value of the first preset quantity can be different in different application scenarios. For example, for different scenarios such as three-pin electrodes, four-pin electrodes, and five-pin electrodes, the values ​​of the first preset quantity are 2, 3, and 4, respectively.

[0075] In step S43, based on the second preset electrode distance, the obtained multiple sets of planned sites are screened to determine the electrode implantation site planning results.

[0076] It is understandable that the multiple sets of planned sites obtained in step S42 have met the intra-group electrode safety distance requirements. Therefore, further, through the screening in step S43, several sets of planned sites that can also meet the inter-group electrode safety distance requirements can be screened out.

[0077] Specifically, step S43 may include the following steps: determining the implantation order of the multiple groups of planned sites; for each pair of planned sites with adjacent implantation orders, determining the distance between each pair of planned sites in the current group and the previous group; determining whether the minimum distance among the multiple distances obtained is greater than or equal to the second preset electrode distance; if the minimum distance among the multiple distances obtained is less than the second preset electrode distance, then discarding the current group of planned sites.

[0078] This allows for the precise selection of multiple planned sites that meet both intra-group and inter-group electrode safety distance requirements. The number of selected planned sites may or may not meet the requirements (e.g., greater than or equal to the second preset number), which can be categorized into the following two scenarios.

[0079] Scenario 1: If the number of selected planning sites is greater than or equal to the second preset number, then each selected planning site will be used as the electrode implantation site planning result.

[0080] Scenario 2: If the number of selected planning sites is less than the second preset number, then at least two of the following methods can be used for further processing:

[0081] Method 1: Reduce the distance of the second preset electrode, and then, based on the reduced distance of the second preset electrode, filter the multiple sets of planned sites to determine the electrode implantation site planning results;

[0082] Method 2: Increase the area of ​​the implantable region through one or more rounds of re-erosion treatment until the number of selected planning sites is greater than or equal to the second preset number.

[0083] In specific implementations, the re-erosion process is selected from: re-erosion process by reducing the filter size; and / or re-erosion process by reducing the number of iterations.

[0084] In this embodiment of the invention, it is understood that if the number of selected planning sites is insufficient, it may be because the second preset electrode distance is set too large or the implantable area is too small. Based on this, by reducing the second preset electrode distance or expanding the implantable area, the electrode implantation site planning result that meets the quantity requirements can be obtained.

[0085] Reference Figure 5 , Figure 5 This is a schematic diagram of an electrode implantation site planning device according to an embodiment of the present invention. The device may include:

[0086] The original image determination module 51 is used to determine the original image acquired for the electrode implantation object;

[0087] Image segmentation module 52 is used to segment the original image to determine non-implantable regions and implantable regions;

[0088] The candidate implantation site determination module 53 is used to determine a plurality of first candidate implantation sites in the implantable area based on a first preset electrode distance;

[0089] The preliminary matching point determination module 54 is used to determine the preliminary matching point of each first candidate implantation site based on the first preset electrode distance.

[0090] The planning result determination module 55 is used to screen each first candidate implantation site and its preliminary matching point based on the second preset electrode distance, and determine the electrode implantation site planning result.

[0091] For details regarding the principle, implementation, and beneficial effects of this electrode implantation site planning device, please refer to the preceding text. Figures 1 to 4 The description of the electrode implantation site planning method shown is not repeated here.

[0092] This invention also provides a readable storage medium, such as a computer-readable storage medium, on which a computer program is stored, the computer program being executed by a processor. Figures 1 to 4 The steps of the electrode implantation site planning method are shown. The computer-readable storage medium may include non-volatile or non-transitory memory, and may also include optical discs, hard disk drives, solid-state drives, etc.

[0093] Specifically, in this embodiment of the invention, the processor can be a central processing unit (CPU), or it can be other general-purpose processors, digital signal processors (DSPs), application-specific integrated circuits (ASICs), field-programmable gate arrays (FPGAs), or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components, etc. The general-purpose processor can be a microprocessor or any conventional processor.

[0094] It should also be understood that the memory in the embodiments of this application can be volatile memory or non-volatile memory, or may include both volatile and non-volatile memory. The non-volatile memory can be read-only memory (ROM), programmable read-only memory (PROM), erasable programmable read-only memory (EPROM), electrically erasable programmable read-only memory (EEPROM), or flash memory. The volatile memory can be random access memory (RAM), which is used as an external cache. By way of example, but not limitation, many forms of random access memory (RAM) are available, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data rate SDRAM (DDR SDRAM), enhanced synchronous DRAM (ESDRAM), synchronous linked DRAM (SLDRAM), and direct rambus RAM (DR RAM).

[0095] This invention also provides a terminal, including a memory and a processor. The memory stores a computer program that can run on the processor, and when the processor runs the computer program, it performs the above-described... Figures 1 to 4The steps of the electrode implantation site planning method are shown. The terminal may include, but are not limited to, mobile phones, computers, tablets, and other terminal devices, and may also be servers, cloud platforms, etc.

[0096] It should be understood that the term "and / or" in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. Additionally, the character " / " in this article indicates that the preceding and following related objects have an "or" relationship.

[0097] In the embodiments of this application, "multiple" refers to two or more.

[0098] The descriptions of "first," "second," etc., appearing in the embodiments of this application are for illustrative purposes and to distinguish the objects being described. They have no order and do not indicate any special limitation on the number of devices in the embodiments of this application, nor do they constitute any limitation on the embodiments of this application.

[0099] It should be noted that the sequence number of each step in this embodiment does not represent a limitation on the execution order of each step.

[0100] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A method for planning electrode implantation sites, characterized in that, include: Determine the original images acquired for the electrode implantation target; The original image is segmented to determine the non-implantable region and the implantable region; Based on a first preset electrode distance, a plurality of first candidate implantation sites are determined within the implantable area, wherein the first preset electrode distance is the safe distance between every two adjacent electrodes in the same group; For each first candidate implantation site, a preliminary matching point is determined based on the first preset electrode distance; Based on the second preset electrode distance, each first candidate implantation site and its preliminary matching point are screened to determine the electrode implantation site planning result. The second preset electrode distance is the safe distance between electrodes of two groups with adjacent implantation sequences.

2. The method according to claim 1, characterized in that, The electrode is implanted into the cerebral cortex, the non-implantable area is the vascular area, and the implantable area is the non-vascular area.

3. The method according to claim 1 or 2, characterized in that, The implantable region includes one or more closed contours; The determination of multiple first candidate implantation sites within the implantable area based on a first preset electrode distance includes: For each closed contour contained in the implantable region, determine the circumscribed contour of the closed contour; Based on the first preset electrode distance, the outer contour is divided into regions to obtain multiple sub-regions of the same size; Determine whether any of the center points of each sub-region fall within the closed contour. If the judgment result is yes, then the center point falling within the closed contour is taken as the first candidate implantation site; If the result is negative, the center of the closed contour is taken as the first candidate implantation site.

4. The method according to claim 3, characterized in that, The sub-region is a square region; Based on the first preset electrode distance, the outer contour is divided into multiple sub-regions of the same size, including: Using the distance between the first preset electrodes as the side length of a square, the outer contour is divided into regions to obtain multiple square regions of the same size.

5. The method according to claim 1, characterized in that, The implantable region includes one or more closed contours; For each first candidate implantation site, determining the preliminary pairing point for that first candidate implantation site based on the first preset electrode distance includes: For each first candidate implantation site within the closed contour, a circle is defined with the first candidate implantation site as the center and the first preset electrode distance as the radius. Points that fall on the circumference of the circle among the other first candidate implantation sites within the closed contour (excluding the center of the circle) are selected as the initial pairing points of the center of the circle.

6. The method according to claim 1, characterized in that, The process of screening each first candidate implantation site and its preliminary matching point based on the second preset electrode distance to determine the electrode implantation site planning results includes: From each of the first candidate implantation sites, determine sites with a preliminary number of matching points greater than or equal to a first preset number, and use them as second candidate implantation sites; From the preliminary matching points of the second candidate implantation sites, select the first preset number of points as the actual matching points of the second candidate implantation sites, wherein each second candidate implantation site and its actual matching point constitute a group of planned sites; Based on the second preset electrode distance, the obtained multiple sets of planned sites are screened to determine the electrode implantation site planning results.

7. The method according to claim 6, characterized in that, Based on the second preset electrode distance, the obtained multiple sets of planned sites are screened to determine the electrode implantation site planning results, including: Determine the implantation sequence of the multiple planned sites obtained; For every two groups of planned sites with adjacent implantation sequences, determine the distance between each two sites in the current planned site group and the previous planned site group; Determine whether the minimum distance among the multiple distances obtained is greater than or equal to the second preset electrode distance; If the judgment result is negative, then the current group planning site is discarded; If the number of selected planning sites is greater than or equal to the second preset number, then each selected planning site will be used as the electrode implantation site planning result.

8. The method according to claim 7, characterized in that, Also includes: If the number of selected planning sites is less than the second preset number, the second preset electrode distance is reduced. Then, based on the reduced second preset electrode distance, the obtained planning sites are screened to determine the electrode implantation site planning result.

9. The method according to claim 8, characterized in that, Also includes: If the number of selected planning sites is less than the second preset number, the area of ​​the implantable region is increased through one or more rounds of re-erosion processing until the number of selected planning sites is greater than or equal to the second preset number.

10. The method according to claim 9, characterized in that, The re-etching treatment is selected from: Re-etching is performed by reducing the filter size; and / or, Re-erosion is performed by reducing the number of iterations.

11. The method according to claim 1, characterized in that, After determining the implantable region and before determining the electrode implantation site planning results, the process also includes: The implantable area is subjected to preliminary corrosion treatment.

12. The method according to claim 1, characterized in that, The determination of the original images acquired for the electrode implantation subject includes: Using a preset light source and image sensor, images are acquired on the electrode implantation object to obtain the original image; The preset light source is selected from: white light source, green light source, and strobe light source obtained based on white light source and green light source.

13. An electrode implantation site planning device, characterized in that, include: The original image determination module is used to determine the original images acquired for the electrode implantation object; An image segmentation module is used to segment the original image to determine non-implantable regions and implantable regions; The candidate implantation site determination module is used to determine a plurality of first candidate implantation sites in the implantable area based on a first preset electrode distance, wherein the first preset electrode distance is the safe distance between every two adjacent electrodes in the same group; The preliminary matching point determination module is used to determine the preliminary matching point of each first candidate implantation site based on the first preset electrode distance. The planning result determination module is used to screen each first candidate implantation site and its preliminary matching point based on the second preset electrode distance, and determine the electrode implantation site planning result. The second preset electrode distance is the safe distance between electrodes of two groups with adjacent implantation sequences.

14. A readable storage medium having a computer program stored thereon, characterized in that, The computer program, when run by a processor, performs the steps of the electrode implantation site planning method according to any one of claims 1 to 12.

15. A terminal comprising a memory and a processor, wherein the memory stores a computer program capable of running on the processor, characterized in that, When the processor runs the computer program, it performs the steps of the electrode implantation site planning method according to any one of claims 1 to 12.

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