Field strength distribution extraction method and apparatus, network device, and storage medium
By combining full-wave simulation and ray tracing methods, the field strength distribution extraction method was optimized, solving the problem of inaccurate channel extraction in micro-aperture scenarios and achieving efficient field strength distribution calculation.
Patent Information
- Application Number
- CN202310240695.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-03-14
- Publication Date
- 2026-01-30
- Estimated Expiration
- 2043-03-14
AI Technical Summary
Existing channel extraction methods are inadequate for handling small aperture scenarios. Ray tracing cannot obtain accurate channel information, while full-wave computation electromagnetic methods have excessive computation time and large storage requirements, resulting in inaccurate channel extraction results or wasted computational resources.
By combining full-wave simulation and ray tracing, the field distribution extraction method is optimized by obtaining the radiation pattern and transmission coefficient of the micro-aperture. The field distribution inside the metal cavity is generated using ray tracing, and the accuracy of the field strength distribution is optimized by combining full-wave simulation.
In scenarios with small apertures, the accuracy of field strength distribution extraction is improved, while reducing computation time and storage resource consumption.
Smart Images

Figure CN116232483B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application belongs to the field of electromagnetic wave and microwave technology, and particularly relates to a field strength distribution extraction method and device, network equipment and a storage medium. BACKGROUND
[0002] A channel is an image metaphor for the path between the sending end and the receiving end in wireless communication, and channel characteristics mainly include time delay, power and field strength distribution. There are two main channel characteristic extraction methods and modeling methods for field distribution at present, one is full-wave electromagnetic calculation method, and the other is ray tracing method. However, with the development of high-frequency communication technology and the increase in complexity of application scene size, the full-wave electromagnetic calculation method is gradually not applicable to the research of channel model because its calculation method is too complex, the calculation time is too long, the required computer storage capacity is large, and errors are prone to occur in the calculation process. The ray tracing method is suitable for indoor electric large scene or outdoor scene, and the field strength and power value are calculated through the interaction (reflection, diffraction and scattering, etc.) of rays with the surface of geometric objects. However, for some specific scenes, such as some small apertures (electrically small size), the ray tracing method cannot obtain accurate channel information because diffraction phenomenon occurs at the small apertures, thereby leading to inaccurate final channel extraction results. SUMMARY
[0003] The embodiments of the present application provide a field strength distribution extraction method, device and storage medium method, which can solve the problems of inaccurate channel extraction results, too long calculation time and too large required computer storage capacity.
[0004] In a first aspect, the embodiments of the present application provide a field strength distribution extraction method, comprising:
[0005] Obtaining scene data, the scene data at least including a first metal cavity and a second metal cavity arranged adjacently, the first metal cavity and the second metal cavity being communicated through a small aperture, the first metal cavity having a first simulated transmitting end and a first simulated receiving end, the second metal cavity having a second simulated transmitting end and a second simulated receiving end, the first simulated receiving end and the second simulated transmitting end being arranged close to the small aperture, and the first simulated receiving end and the second simulated transmitting end being arranged at opposite ends of the small aperture, respectively;
[0006] Obtaining a directional diagram and a transmission coefficient of the small aperture according to a full-wave simulation method;
[0007] Generating a first field distribution of a target point in the first metal cavity according to a ray tracing method;
[0008] generating the second field distribution of the second simulation receiving end according to the ray tracing method and the directional diagram of the micro aperture, or generating the simulation signal source of the second simulation transmitting end according to the field distribution of the first simulation receiving end and the transfer coefficient of the micro aperture, generating the second field distribution of the second simulation receiving end according to the ray tracing method.
[0009] In a possible implementation manner of the first aspect, the generating the second field distribution of the second simulation receiving end according to the ray tracing method and the directional diagram of the micro aperture comprises:
[0010] generating a plurality of second power spectrum lines of the second simulation transmitting end to the second simulation receiving end according to the ray tracing method and the directional diagram of the micro aperture, each of the second power spectrum lines having corresponding angle information, and generating the second field distribution according to the second power spectrum lines and the corresponding angle information.
[0011] In a possible implementation manner of the first aspect, the generating a plurality of second power spectrum lines of the second simulation transmitting end to the second simulation receiving end according to the ray tracing method and the directional diagram of the micro aperture comprises:
[0012] determining that the emission directional diagram of the ray tracing method at the second simulation transmitting end is the directional diagram of the micro aperture, and generating the second power spectrum line of the second simulation transmitting end to the second simulation receiving end according to the ray tracing method.
[0013] In a possible implementation manner of the first aspect, the generating the second field distribution according to the second power spectrum lines and the corresponding angle information comprises:
[0014] the second simulation transmitting end to the second simulation receiving end has N paths, and the second power spectrum lines have N, wherein a power expression of one of the second power spectrum lines is corresponding field strength N field strengths the second field distribution is generated by vector superposition, wherein ω is an angular frequency, T2 is a period, τ2 is a time delay corresponding to the power, n is an integer greater than or equal to 0, and 0≤(τ2-nT2)≤T2.
[0015] In a possible implementation manner of the first aspect, the generating the simulation signal source of the second simulation transmitting end according to the field distribution of the first simulation receiving end and the transfer coefficient of the micro aperture, and generating the second field distribution of the second simulation receiving end according to the ray tracing method comprises:
[0016] The field distribution of the first analog receiving end is superimposed with the transmission coefficient of the micro aperture to form an analog signal source of the second analog transmitting end, and the analog signal source is used as a directional diagram of the ray tracing method at the second analog transmitting end to generate a second field distribution of the second analog receiving end.
[0017] In a possible implementation of the first aspect, the first field distribution of the target point in the first metal cavity is generated according to the ray tracing method, including:
[0018] A plurality of first power spectrum lines of the first analog transmitting end transmitting to the target point are generated according to the ray tracing method, each of the first power spectrum lines has corresponding angle information, and the first field distribution is generated according to the first power spectrum lines and the corresponding angle information.
[0019] In a possible implementation of the first aspect, the number of the second analog receiving ends is a plurality, and the number of the second field distributions is also a plurality.
[0020] In a second aspect, an embodiment of the present application provides a device for extracting field intensity distribution, including:
[0021] A scene acquisition unit is configured to acquire scene data including a micro aperture;
[0022] A full-wave simulation unit is configured to perform full-wave simulation on the micro aperture and obtain a directional diagram of the micro aperture;
[0023] A ray tracing unit is configured to generate a first field distribution of a target point in the first metal cavity and a second field distribution of the second analog receiving end.
[0024] In a third aspect, an embodiment of the present application provides a network device, including at least one processor, a memory, and a computer program stored in the memory and executable on the at least one processor, wherein the processor implements the steps in any of the method embodiments described above when executing the computer program.
[0025] In a fourth aspect, an embodiment of the present application provides a computer readable storage medium, which stores a computer program, and the computer program is executable on a processor to implement the steps in any of the method embodiments described above.
[0026] In a fifth aspect, an embodiment of the present application provides a computer program product, which, when executed on a terminal device, causes the terminal device to perform the field intensity distribution extraction method in any of the first aspect.
[0027] It can be understood that the beneficial effects of the second aspect to the fifth aspect described above can be referred to the related description in the first aspect, which will not be repeated here.
[0028] The beneficial effects of the embodiments of the present application compared with the prior art are: the present application is applied to a field distribution extraction method, scene data at least includes a first metal cavity and a second metal cavity arranged adjacent to each other, the first metal cavity has a first simulation transmitting end, the second metal cavity has a second simulation receiving end, and the two ends of a micro aperture connecting the first metal cavity and the second metal cavity are respectively the first simulation receiving end and the second simulation transmitting end. The first simulation transmitting end has a signal source, which is transmitted to the first simulation receiving end, the second simulation transmitting end and the second simulation receiving end in turn. The field distribution in the first metal cavity can be obtained by ray tracing method, and then the directivity diagram and the transmission coefficient at the micro aperture are obtained according to the full-wave simulation method, and the accuracy of the field distribution extraction result can be optimized by combining the ray tracing method and the full-wave simulation method, and at the same time, the computer memory and the calculation time are not occupied too much. BRIEF DESCRIPTION OF DRAWINGS
[0029] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creating laborious work.
[0030] Figure 1 is a schematic diagram of a channel extraction scene provided by an embodiment of the present application;
[0031] Figure 2 is a flowchart of a field strength distribution extraction method provided by an embodiment of the present application;
[0032] Figure 3 is Figure 1 the field strength distribution simulation diagrams of the scenes in obtained by full-wave simulation and the method provided by the present application respectively;
[0033] Figure 4 is a structural schematic diagram of a field strength distribution extraction device provided by an embodiment of the present application;
[0034] Figure 5 is a structural schematic diagram of a network device provided by an embodiment of the present application. DETAILED DESCRIPTION
[0035] In the following description, specific details such as specific system structures, techniques, etc. are presented in order to thoroughly understand the embodiments of the present application. However, it should be clear to those skilled in the art that the present application can also be implemented in other embodiments without these specific details. In other cases, detailed descriptions of well-known systems, devices, circuits and methods are omitted to avoid unnecessary details that hinder the description of the present application.
[0036] It will be understood that the term “includes,” “including,” “has,” “having” and the like, when used in the specification and appended claims, specify the presence of stated features, integers, steps, operations, elements, and / or components but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.
[0037] It will also be understood that the term “and / or,” when used in the specification and appended claims, means “one or the other,” or “both,” and / or any combination thereof.
[0038] As used in the specification and appended claims, the term “if’ can be interpreted as meaning “when,” or “once,” or “in response to a determination,” or “in response to a detection” depending on the context. Similarly, the phrase “if determined” or “if detected [the recited condition or event]” can be interpreted as meaning “once determined” or “in response to a determination,” or “once detected [the recited condition or event]” or “in response to a detection [the recited condition or event],” depending on the context.
[0039] In addition, the terms “first,” “second,” “third,” etc. as used in the description and the appended claims are used only to distinguish different elements, and are not meant to imply or suggest relative importance.
[0040] Reference throughout this specification to “one embodiment” or “an embodiment” or “some embodiments” means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the application. Thus, appearances of the phrases “in one embodiment,” “in some embodiments,” “in other embodiments,” “in additional embodiments,” and so on, in various places throughout this specification are not necessarily all referring to the same embodiment, unless otherwise specified. The terms “including,” “containing,” “comprising,” and similar terms are meant to be open-ended, unless otherwise noted, so that other components, elements, and / or steps are optionally included within the described embodiments.
[0041] Channel is a figurative description of the path between the transmitter and receiver in wireless communication. For radio waves, it is transmitted from the transmitter to the receiver without a tangible connection, and its propagation path may also not be only one. In order to describe the work between the transmitter and the receiver, we can imagine that there is an invisible road between them. The connecting path is called channel.
[0042] The propagation of the radio wave in the wireless channel is not a single path, but a combination of many reflected waves from many paths. Since the distance of the radio wave through each path is different, the reflected waves from each path arrive at different times, that is, the time delay of each signal is different. When the sending end sends an extremely narrow pulse signal, the signal received by the mobile station is composed of many pulses with different time delays, which is called time delay spread.
[0043] The channel characteristics mainly include time delay, power and field strength distribution. The commonly used channel characteristic extraction method and modeling method for field strength distribution at present are mainly ray tracing method and full-wave simulation method.
[0044] The full-wave simulation method refers to the simulation performed by a numerical algorithm developed based on Maxwell's equations, such as FDTD, MLFMA, FIT, MOM and other algorithms, which are all based on Maxwell's equations. The algorithm result of the full-wave simulation method is accurate, but since the full-wave simulation method considers all characteristic dimensions of the application scene, as the complexity of the application scene size gradually increases, the calculation amount of the full-wave simulation method gradually increases, and even reaches an uncomputable degree.
[0045] The ray tracing method is an electromagnetic field prediction algorithm based on geometric optics and consistent diffraction theory. The ray tracing method simplifies the propagation path between the transmitting end and the receiving end into multiple straight-line propagation paths, and the signals transmitted through each path to the receiving end have different time delays, powers and field strengths. When the characteristic dimensions of the scene are all electrically large dimensions, the propagation path of the electromagnetic wave can be equivalent to straight-line propagation, and when the characteristic dimensions of the scene are electrically small dimensions, the propagation path of the electromagnetic wave cannot be equivalent to straight-line propagation, and the wave characteristics of the electromagnetic wave need to be considered, and diffraction occurs at electrically small dimensions, that is, the electromagnetic wave passes through a small aperture (electrically small dimension) and continues to propagate forward. Therefore, a new channel extraction method needs to be proposed.
[0046] The electrically large dimension can be a dimension greater than 0.5λ. The electrically small dimension is a dimension much smaller than the working wavelength, such as a dimension less than 0.05λ. λ is the working wavelength.
[0047] Figure 2 A flowchart of the field strength distribution extraction method provided by the present application is shown, which can be applied to a scene with a small aperture as an example but not limitation. The small aperture is electrically small.
[0048] The field strength distribution extraction method provided by the present application includes the following steps:
[0049] S101: Obtain scene data. Please refer to Figure 1The scene data at least includes a first metal cavity and a second metal cavity arranged adjacently, and the first metal cavity and the second metal cavity are communicated through a micro aperture. The first metal cavity has a first analog transmitting end (TX1) and a first analog receiving end (RX1), and the second metal cavity has a second analog transmitting end (TX2) and a second analog receiving end (RX2). A signal source can be located at the first analog transmitting end. The first analog receiving end and the second analog transmitting end are arranged close to the micro aperture, and the first analog receiving end and the second analog transmitting end are arranged at opposite ends of the micro aperture, respectively. It can also be understood that the signal source is transmitted from the first analog transmitting end to the first analog receiving end, the second analog transmitting end and the second analog receiving end in sequence.
[0050] In the embodiment, the size of the first metal cavity and the second metal cavity is greater than λ, such as the length, the width and the depth of the first metal cavity and the second metal cavity are greater than λ, and the size of the micro aperture is less than λ.
[0051] In a possible implementation, the scene data includes the first metal cavity and the second metal cavity, and the first metal cavity and the second metal cavity have a metal wall therebetween, and the metal wall has a micro aperture.
[0052] In a possible implementation, the scene data includes the first metal cavity, the second metal cavity and the third metal cavity, the first metal cavity and the second metal cavity have a metal wall therebetween, and the second metal cavity and the third metal cavity have a metal wall therebetween, and each metal wall has a micro aperture. In other implementations, the scene data can further include a fourth metal cavity, a fifth metal cavity and the like, which are not limited herein.
[0053] S102: Obtain the directional pattern and the transmission coefficient of the micro aperture according to the full-wave simulation method.
[0054] The micro aperture is located on the metal wall, and the metal wall has a certain thickness. The micro aperture can be equivalent to a waveguide for full-wave simulation. When the cross section of the micro aperture is circular, the micro aperture can be equivalent to a circular waveguide for full-wave simulation. When the cross section of the micro aperture is square, the micro aperture can be equivalent to a square waveguide for full-wave simulation. The full-wave simulation method can directly calculate the directional pattern at both ends of the micro aperture and the transmission coefficient of the micro aperture.
[0055] It should be noted that, due to the small size of the micro aperture, the micro aperture can be regarded as a symmetrical structure. One end of the micro aperture close to the first metal cavity is a first end, and one end of the micro aperture close to the second metal cavity is a second end. The directional pattern of the micro aperture at the first end and the second end is the same.
[0056] S103: Generate the first field distribution of the target point in the first metal cavity according to the ray tracing method.
[0057] In a possible implementation, the first plurality of power spectrum lines from the first simulation transmitting end to the target points are generated according to a ray tracing method, each of the first plurality of power spectrum lines has corresponding angle information, and the first field distribution is generated according to the first plurality of power spectrum lines and the corresponding angle information.
[0058] In the calculation of the field distribution in the first metal cavity, the space in the first metal cavity can be equivalent to the field distribution of a plurality of points, each point is referred to as a target point, and the field distribution of each target point is generated, and then the field distribution in the first metal cavity is generated. The first simulation transmitting end has M propagation paths to each target point, and M is a positive integer.
[0059] The first simulation transmitting end is assumed to have a unit transmitting source (the directivity diagram is omnidirectional transmission, and the energy of each direction is the same), the ray tracing method simulates M straight-line propagation paths from the first simulation transmitting end to the target points, and when the signal reaches the target point through each straight-line propagation path, a time delay relative to the transmission time is generated, and a power change is also generated. When the electromagnetic wave reaches the target point through each straight-line propagation path, a corresponding time delay (time delay) and a power change value are generated, and each power change value forms a first power spectrum line. Since each propagation path has angle information, each power change value corresponds to angle information, that is, each first power spectrum line has corresponding angle information. The first field distribution is generated according to the first plurality of power spectrum lines and the corresponding angle information. Each target point corresponds to a first field distribution that can be generated, and when the number of target points is sufficient, the field distribution in the first metal cavity can be obtained.
[0060] Optionally, the first field distribution is generated according to the first plurality of power spectrum lines and the corresponding angle information, and the method comprises the following steps.
[0061] The first simulation transmitting end has M transmission paths to the target points, and M first power spectrum lines are generated at the corresponding target points. The expression of the power of one of the first power spectrum lines is According to the above expression, the corresponding field strength can be obtained when the power P1 is known. The power P1 is a scalar, and the field strength is a vector. The absolute value of the field strength can be obtained from the power P1, and the direction of the field strength is the angle information corresponding to the power P1. Specifically, it is known from the propagation characteristics of electromagnetic waves that the field strength of each point varies with the period and is not a fixed value, so the phase of the point also needs to be calculated. The following is the change relationship of the field strength with time t, and the field strength Wherein, ω is the angular frequency, T1 is the period, τ1 is the time delay corresponding to the power, n is an integer greater than or equal to 0, and 0≤(τ1-nT1)≤T1, ω=2πf, f is the working frequency. At the same time t, M field strengths generated by M propagation paths The vector superposition generates the first field distribution described above. A plurality of target points are set, and the steps described above are performed for each target point. In this way, the first field distribution of each target point in the first metal cavity can be obtained.
[0062] S104: generating a second field distribution of the second simulation receiving end according to the ray tracing method and the directional diagram of the micro aperture, or generating a simulation signal source of the second simulation transmitting end according to the field distribution of the first simulation receiving end and the transmission coefficient of the micro aperture, and generating the second field distribution of the second simulation receiving end according to the ray tracing method.
[0063] S1041: generating a second field distribution of the second simulation receiving end according to the ray tracing method and the directional diagram of the micro aperture. Specifically, a plurality of second power spectrum lines from the second simulation transmitting end to the second simulation receiving end are generated according to the ray tracing method and the directional diagram of the micro aperture, each second power spectrum line has corresponding angle information, and the second field distribution is generated according to the second power spectrum line and the corresponding angle information.
[0064] Optionally, it is determined that the directional diagram of the ray tracing method at the second simulation transmitting end is the directional diagram of the micro aperture, and the second power spectrum line from the second simulation transmitting end to the second simulation receiving end is generated according to the ray tracing method. When the ray tracing method is used, the directional diagrams at both ends of the ray, i.e., the directional diagrams of the second simulation transmitting end and the second simulation receiving end. The directional diagram of the second simulation transmitting end is the directional diagram of the second end of the micro aperture, and the directional diagram of the second simulation receiving end is an omnidirectional directional diagram (equal power in each direction).
[0065] The ray tracing method simulates N straight-line propagation paths from the second simulation transmitting end to the second simulation receiving end. When the signal reaches the second simulation receiving end through each straight-line propagation path, a time delay relative to the transmission time is generated, and a power change is also generated. When the electromagnetic wave reaches the second simulation receiving end through each straight-line propagation path, it has a corresponding time delay (time delay) and power change value, and the power change values of each propagation path form a second power spectrum line. Since each propagation path has angle information, each power change value corresponds to an angle information, that is, each second power spectrum line has corresponding angle information. The second field distribution is generated according to the second power spectrum line and the corresponding angle information. Each second simulation receiving end can generate a second field distribution, and when the number of second simulation receiving ends is sufficient, the field distribution in the second metal cavity can be obtained.
[0066] Optionally, generating a second field distribution according to the second power spectrum line and the corresponding angle information thereof comprises:
[0067] If the second simulation transmitting end has N transmission paths to the target point, N first power spectrum lines are generated at the corresponding target point. The expression of the power of one of the second power spectrum lines is According to the above expression, the corresponding field strength can be calculated when the power P2 is known. The power P2 is a scalar, and the field strength is a vector. The absolute value of the field strength can be calculated from the power P2, and the direction of the field strength is the angle information corresponding to the power P2. Specifically, according to the propagation characteristics of electromagnetic waves, the field strength of each point varies with the period and is not a fixed value, so the phase of the point also needs to be calculated. The following is the change relationship of the field strength with time t, and the field strength where ω is the angular frequency, T2 is the period, τ2 is the time delay corresponding to the power, n is an integer greater than or equal to 0, and 0≤(τ2-nT2)≤T2, ω=2πf, f is the operating frequency. At the same time t, N field strengths generated by N transmission paths are superimposed to generate the above-mentioned second field distribution. Multiple second simulation transmitting ends are set, and the above steps are performed for each second simulation transmitting end. In this way, the second field distribution of each point in the second metal cavity can be obtained.
[0068] S1042: generating a simulation signal source of the second simulation transmitting end according to the field distribution of the first simulation receiving end and the transmission coefficient of the micro aperture, and generating a second field distribution of the second simulation receiving end according to the ray tracing method.
[0069] The field distribution of the first simulation receiving end and the transmission coefficient of the micro aperture are superimposed to form a simulation signal source of the second simulation transmitting end. The simulation signal source is used as a directional diagram of the ray tracing method at the second simulation transmitting end, and a second field distribution of the second simulation receiving end is generated.
[0070] When the field distribution of the first analog receiving end is known, the field distribution at the second analog transmitting end can be formed by superimposing the transmission coefficient of the micro aperture. The field distribution at the second analog transmitting end is used as the analog signal source to transmit electromagnetic waves to the second analog receiving end. When the ray tracing method is used to form the second field distribution, the ray emitting end of the ray tracing method is the second analog transmitting end, the ray receiving end of the ray tracing method is the second analog receiving end, the directional diagram of the second analog transmitting end is generated from the field distribution at the second analog transmitting end, and the directional diagram of the second analog receiving end is an omnidirectional directional diagram (the power in each direction is the same). When the electromagnetic wave reaches the second analog receiving end through each straight-line propagation path, it has a corresponding time delay (time delay) and power change value, and the power change values of the propagation paths form the second power spectrum line. According to the second power spectrum line and the corresponding angle information, the second field distribution of the second analog receiving end can be obtained, which is the same as the content of S1041 and will not be repeated here.
[0071] The field distribution of the first analog receiving end can be obtained by the following method: generating the first field distribution of the first analog receiving end according to the ray tracing method and the directional diagram of the micro aperture. During the propagation of electromagnetic waves from the first analog transmitting end to the first analog receiving end, there are multiple propagation paths, which can be equivalent to rays. When the ray tracing method is used, the directional diagram of the first analog receiving end is an omnidirectional directional diagram, and the directional diagram of the first analog receiving end is the directional diagram of the micro aperture. Thus, multiple power spectrum lines can be obtained, each of which has angle information. According to the power spectrum line and the corresponding angle information, the field distribution of the first analog receiving end can be obtained, which is the same as the content of S1041 and will not be repeated here.
[0072] In a possible implementation, the number of second analog receiving ends is multiple, and the second field distribution corresponding to each second analog receiving end can be generated according to the field strength distribution extraction method described above. Therefore, the number of second field distributions is multiple. When the number of second analog receiving ends is large enough, the field distribution in the second metal cavity can be generated.
[0073] It should be noted that the field distribution in the micro aperture can be directly obtained according to the full-wave simulation method.
[0074] It should be understood that the size of the serial number of each step in the above embodiments does not mean the order of execution, and the execution order of each process should be determined according to its function and inherent logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.
[0075] In order to verify the feasibility of the present application, a transceiving antenna is arranged at the first analog transmitting end and the second analog receiving end, and the configuration parameters of the transceiving antenna are as follows: the carrier frequency is 60 GHz, the effective bandwidth is 4 GHz, the antenna type is an omnidirectional antenna, and the initial power is 0 dBm. Figure 3The middle left top and left bottom graphs are field strength distribution graphs generated by using full-wave simulation method, Figure 3 The middle left top and left bottom graphs show that under the condition of the same scene and signal source configuration, a standing wave distribution is formed in the second metal cavity on the other side of the micro aperture. Figure 3 The middle right top and right bottom graphs are field strength distribution graphs generated by using the field strength distribution extraction method proposed in the present application. The electric field distribution also presents a clear standing wave distribution characteristic, and the electric field distribution is close to the full-wave simulation result, indicating that the proposed scheme can accurately extract the field strength value under such a scene. Therefore, the proposed method to a certain extent realizes the extraction of the field strength distribution under the scene containing the micro aperture.
[0076] Corresponding to the field strength distribution extraction method described in the above embodiments, Figure 4 The structure block diagram of the field strength distribution extraction device provided by the embodiments of the present application is shown. For ease of illustration, only the parts related to the embodiments of the present application are shown.
[0077] Please refer to Figure 4 The device includes a scene acquisition unit, a full-wave simulation unit, a ray tracing unit, and a convolution unit. The scene acquisition unit is used to acquire scene data containing a micro aperture, such as the scene data in Figure 1 The scene data can include the structure size of the first metal cavity, the second metal cavity, and the micro aperture. The full-wave simulation unit is used to perform full-wave simulation on the micro aperture to obtain the directional diagram and transmission coefficient of the micro aperture. The ray tracing unit uses the ray tracing method to generate the first field distribution of the target point in the first metal cavity and the second field distribution of the second simulation receiving end.
[0078] It should be noted that the information interaction, execution process, etc. between the above-mentioned devices / units, since based on the same concept as the method embodiments of the present application, the specific functions and the technical effects brought about can be referred to the method embodiments part, and will not be repeated here.
[0079] Those skilled in the art can clearly understand that, for the convenience and brevity of description, only the division of the above functional units and modules is exemplified, and in actual application, the above functions can be completed by different functional units and modules according to needs, that is, the internal structure of the apparatus is divided into different functional units or modules to complete all or part of the above described functions. Each functional unit or module in the embodiment can be integrated in one processing unit, or each unit can be physically present separately, or two or more units can be integrated in one unit. The integrated unit can be realized in the form of hardware or in the form of a software functional unit. In addition, the specific name of each functional unit or module is only for convenient distinction, and does not limit the protection scope of the present application. The specific working process of the unit or module in the system can refer to the corresponding process in the foregoing method embodiments, and will not be repeated here.
[0080] The embodiments of the present application further provide a network device, which comprises at least one processor, a memory, and a computer program stored in the memory and executable on the at least one processor, wherein the processor implements the steps in any of the method embodiments described above when executing the computer program.
[0081] The embodiments of the present application further provide a computer readable storage medium, which stores a computer program, wherein the computer program is executable on a processor to implement the steps in any of the method embodiments described above.
[0082] The embodiments of the present application provide a computer program product, which, when running on a mobile terminal, enables the mobile terminal to implement the steps in any of the method embodiments described above.
[0083] The integrated unit, if implemented in the form of a software function unit and sold or used as an independent product, can be stored in a computer readable storage medium. Based on such understanding, the present application can implement all or part of the processes in the above-mentioned embodiment methods through a computer program to instruct relevant hardware to complete, and the computer program can be stored in a computer readable storage medium. When the computer program is executed by a processor, the steps of each method embodiment described above can be implemented. The computer program includes computer program code, which can be in the form of source code, object code, executable files or some intermediate forms. The computer readable medium can at least include any entity or device capable of carrying the computer program code to the photographing device / network device, a recording medium, a computer memory, a read-only memory (ROM), a random access memory (RAM), an electrical carrier signal, a telecommunications signal and a software distribution medium. For example, a U disk, a mobile hard disk, a magnetic disk or an optical disk, etc. In some jurisdictions, according to legislation and patent practice, the computer readable medium can not be an electrical carrier signal and a telecommunications signal.
[0084] In the above embodiments, the description of each embodiment has its own focus, and the parts not described or recorded in detail in a certain embodiment can be referred to the relevant description of other embodiments.
[0085] Those skilled in the art can appreciate that the units and algorithm steps of the examples described in combination with the embodiments disclosed herein can be implemented in electronic hardware or a combination of computer software and electronic hardware. Whether the functions are implemented in hardware or software depends on the specific application and design constraints of the technical solution. Professional technicians can use different methods to implement the described functions for each specific application, but such implementation should not be considered beyond the scope of the present application.
[0086] In the embodiments provided by the present application, it should be understood that the disclosed apparatus / network device and method can be implemented in other ways. For example, the above-described apparatus / network device embodiments are merely schematic, for example, the division of the modules or units is only a logical function division, and actual implementation can have another division manner, for example, a plurality of units or components can be combined or integrated into another system, or some features can be ignored or not executed. In addition, the coupling or direct coupling or communication connection between the displayed or discussed each other can be indirect coupling or communication connection through some interfaces, devices or units, and can be electrical, mechanical or other forms.
[0087] The units described as separate components may or may not be physically separate, and the components displayed as units may or may not be physical units, that is, may be located in one place, or may also be distributed to multiple network units. Part or all of the units can be selected to achieve the purpose of the embodiment scheme according to actual needs.
[0088] The above embodiments are only used to illustrate the technical solutions of the present application, but not limit them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the technical solutions recorded in the foregoing embodiments can still be modified, or some technical features can be replaced by equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application, and should be included in the protection scope of the present application.
Claims
1. A field strength distribution extraction method characterized by, The method comprises: acquiring scene data, the scene data comprising at least a first metal cavity and a second metal cavity arranged adjacently, the first metal cavity and the second metal cavity being communicated through a micro aperture, the first metal cavity having a first analog transmitting end and a first analog receiving end, the second metal cavity having a second analog transmitting end and a second analog receiving end, the first analog receiving end and the second analog transmitting end being arranged close to the micro aperture, and the first analog receiving end and the second analog transmitting end being arranged at opposite ends of the micro aperture, respectively; acquiring a directional diagram and a transmission coefficient of the micro aperture according to a full-wave simulation method; generating a first field distribution of a target point in the first metal cavity according to a ray tracing method; generating a second field distribution of the second analog receiving end according to the ray tracing method and the directional diagram of the micro aperture, or generating an analog signal source of the second analog transmitting end according to a field distribution of the first analog receiving end and the transmission coefficient of the micro aperture, and generating a second field distribution of the second analog receiving end according to the ray tracing method; the generating of the second field distribution of the second analog receiving end according to the ray tracing method and the directional diagram of the micro aperture comprises: generating a plurality of second power spectrum lines from the second analog transmitting end to the second analog receiving end according to the ray tracing method and the directional diagram of the micro aperture, each of the second power spectrum lines having corresponding angle information, and generating the second field distribution according to the second power spectrum lines and the corresponding angle information; the generating of the plurality of second power spectrum lines from the second analog transmitting end to the second analog receiving end according to the ray tracing method and the directional diagram of the micro aperture comprises: determining that a transmitting directional diagram of the ray tracing method at the second analog transmitting end is the directional diagram of the micro aperture, and generating the second power spectrum lines from the second analog transmitting end to the second analog receiving end according to the ray tracing method; the generating of the second field distribution according to the second power spectrum lines and the corresponding angle information comprises: The second analog transmitting end to the second analog receiving end has N paths, and the second power spectrum has N, wherein the power expression of one of the second power spectrum is , corresponding field strength , N field strengths Vector superposition generates the second field distribution, wherein, ω is the angular frequency, T 2 is the period, τ 2 is the time delay corresponding to the power, n is an integer greater than or equal to 0, and ; the generating of the analog signal source of the second analog transmitting end according to the field distribution of the first analog receiving end and the transmission coefficient of the micro aperture, and the generating of the second field distribution of the second analog receiving end according to the ray tracing method comprises: superimposing the field distribution of the first analog receiving end and the transmission coefficient of the micro aperture to form the analog signal source of the second analog transmitting end, and taking the analog signal source as a directional diagram of the ray tracing method at the second analog transmitting end to generate the second field distribution of the second analog receiving end.
2. The field strength distribution extraction method of claim 1, wherein, the generating of the first field distribution of the target point in the first metal cavity according to the ray tracing method comprises: generating a plurality of first power spectrum lines from the first analog transmitting end to the target point according to the ray tracing method, each of the first power spectrum lines having corresponding angle information, and generating the first field distribution according to the first power spectrum lines and the corresponding angle information.
3. The field intensity distribution extraction method according to any one of claims 1-2, wherein the number of the second analog receiving ends is a plurality, and the number of the second field distributions is also a plurality.
4. An apparatus for field strength distribution extraction using the field strength distribution extraction method according to any one of claims 1 to 3, characterized by The method comprises: A scene acquisition unit is configured to acquire scene data including a micro aperture; A full-wave simulation unit is configured to perform full-wave simulation on the micro aperture and obtain a directional diagram and a transmission coefficient of the micro aperture; A ray tracing unit is configured to generate a first field distribution of a target point in the first metal cavity and a second field distribution of the second analog receiving end.
5. A network device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein, The processor executes the computer program to implement the method of any one of claims 1 to 3.
6. A computer-readable storage medium storing a computer program, the computer program comprising instructions that, when executed by a computer, cause the computer to perform the method of any one of claims 1 to 5. The computer program is executed by the processor to implement the method of any one of claims 1 to 3.
Citation Information
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