Irradiation module and apparatus for processing a substrate having the same

By designing the support unit, liquid supply unit, and purge gas system of the substrate processing equipment, the problems of inaccurate pattern correction and decreased irradiator durability during photolithography were solved, achieving precise etching and improved equipment durability.

CN116344383BActive Publication Date: 2026-07-03SYSTEM ENGINEERING MEGA SOLUTION CO LTD
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Patent Information

Application Number
CN202211447131.5
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Priority Date
2021-11-18
Filing Date
2022-11-18
Publication Date
2026-07-03
Estimated Expiration
2042-11-18

AI Technical Summary

Technical Problem

In the existing technology, the pattern correction on the mask during the photolithography process is inaccurate, the anchor pattern etching is inaccurate, and the irradiator is susceptible to the influence of particles and droplets, resulting in a decrease in durability.

Method used

A substrate processing device has been designed, comprising a support unit, a liquid supply unit, a laser unit, and a cover component, combined with a purge gas supply, for precise etching and reduction of the effects of particles and droplets, thereby improving the durability of the device.

Benefits of technology

It achieves precise etching of substrates and high equipment durability, reduces the impact of particles and droplets on the etching process, and improves the accuracy of pattern correction.

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Abstract

The present invention provides a substrate processing apparatus. The substrate processing apparatus includes: a support unit configured to support and rotate a substrate in a processing space; a liquid supply unit configured to supply liquid to the substrate supported on the support unit; a housing having a mounting space; a laser unit configured to include a laser irradiation unit positioned in the mounting space for irradiating a laser, and an irradiation end having an end positioned to protrude from the housing and irradiating the laser irradiated from the laser irradiation unit onto the substrate supported on the support unit; and a cover having an internal space and positioned such that the protruding end of the irradiation end from the housing is positioned in the internal space, wherein an opening is formed at the bottom end of the cover so that, when viewed from above, the opening coincides with the laser irradiated from the irradiation end.
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