Initial port and apparatus for processing a substrate

Abstract

The present invention relates to an initial port and an apparatus for processing a substrate. An initial port is provided in which a nozzle that supplies a processing liquid to a substrate waits. The initial port includes a discharge cup, a housing that is provided to cover the discharge cup and has a discharge space that discharges fume generated by the processing liquid, and an insert body that is provided between an upper wall of the housing and the discharge cup in the housing. A first discharge passage that guides fume to the discharge space is formed between the insert body and the discharge cup, and a second discharge passage that guides fume to the discharge space is formed between the insert body and the housing.

Description

[0001] Cross-reference to related applications

[0002] This application claims priority and benefit to Korean Patent Application No. 10-2021-0186759, filed with the Korean Intellectual Property Office on December 24, 2021, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present invention relates to an apparatus for processing a substrate, and more particularly to a home port in which a nozzle supplies processing liquid to the substrate, and to an apparatus for processing a substrate including the home port. Background Technology

[0004] Semiconductor processes include processes for cleaning thin films, foreign matter, and particles. These processes are performed by placing a substrate on a rotating head with the patterned sides facing up or down, supplying a processing solution to the substrate while the rotating head is rotating, and then drying the wafer.

[0005] A nozzle for supplying processing fluid to the wafer is mounted on a support member, which is configured to move between a waiting position and a process position via a driver. The waiting position is where the nozzle waits before supplying processing fluid, and the process position is where the nozzle is positioned when the substrate is processed with the processing fluid. Typically, to prevent splashing of the processing fluid, the substrate is processed within a cup-shaped component, and the nozzle waits at an initial port position on one side of the cup-shaped component. When the nozzle moves to the initial port and waits, the processing fluid is sprayed from the nozzle into the initial port to prevent the processing fluid from solidifying within the nozzle. Further, when the nozzle waits for an extended period and then moves to the process position, the processing fluid is first sprayed from the initial port, allowing the processing fluid to be smoothly sprayed onto the wafer.

[0006] Figure 1 The diagram illustrates the general structure of the initial port 900.

[0007] refer to Figure 1The initial port 900 has a drain cup 920 and a housing 940. The drain cup 920 has a receiving space 922 with an upper opening, and a drain port 924 is formed on the bottom of the drain cup 920. The housing 940 is configured to cover the sides and top of the drain cup 920. A drain port 944 is formed on the lower wall of the housing 940. Flue gas generated by the injection of treatment liquid into the receiving space 922 of the drain cup 920 by the nozzle 962, and flue gas generated by the treatment liquid remaining in the drain cup 920, are introduced into the discharge space 942 formed between the drain cup 920 and the housing 940, and are subsequently discharged to the outside of the housing 940 through a discharge line 980 connected to the discharge port 924.

[0008] The gap between the upper end 926 of the discharge cup-shaped member 920 and the upper wall 946 of the housing 940 is configured as a discharge channel P, in which the flue gas in the discharge cup-shaped member 920 flows. Typically, the discharge channel P is as follows: Figure 1 The image shown is narrow. The result is as follows: Figure 2 As shown, when a large amount of flue gas is generated by the processing liquid, the flue gas cannot be smoothly discharged through the discharge channel P, but instead adheres to the outer surface of the nozzle 962, and then becomes a source of contamination for the wafer when the nozzle 962 moves to the process position.

[0009] Furthermore, multiple nozzles 962 can be installed on the support arm 964, from which acidic liquid can be supplied and alkaline liquid can be sprayed. In this case, both acidic and alkaline flue gas are generated simultaneously. The acidic and alkaline flue gas react with each other, thereby producing alkali on the surface of the nozzle 962. Summary of the Invention

[0010] The present invention aims to provide an initial port capable of smoothly discharging fumes generated by a processing liquid and an apparatus for processing a substrate, the apparatus including the initial port.

[0011] The present invention also aims to provide an apparatus for processing a substrate, which prevents the nozzle from being contaminated while the nozzle is waiting at the initial port.

[0012] The problems to be solved by the present invention are not limited to those described above, and those skilled in the art will clearly understand from this specification and the accompanying drawings any problems not mentioned.

[0013] An exemplary embodiment of the present invention provides an apparatus for processing a substrate. According to the exemplary embodiment, the apparatus for processing a substrate includes: a processing unit configured to perform liquid processing on the substrate; an initial port disposed outside the processing unit; and a nozzle unit for supplying processing liquid to the substrate positioned in the processing unit, the nozzle unit having a nozzle configured to be movable between a process position in which the processing unit performs liquid processing on the substrate and a waiting position in the initial port, wherein the initial port has a discharge cup and a housing, the discharge cup having a receiving space for receiving processing liquid ejected from the nozzle, the housing being configured to cover the discharge cup and having a discharge space for discharging fumes generated by the processing liquid, a first discharge channel and a second discharge channel being provided in the initial port, the fumes generated by the processing liquid in the discharge cup flowing through the first discharge channel and the second discharge channel to the discharge space, and the second discharge channel being positioned above the first discharge channel.

[0014] According to an embodiment, the first discharge channel may be located adjacent to the discharge cup-shaped component and positioned above the discharge cup-shaped component.

[0015] According to an embodiment, the housing may have an upper wall in which an inlet is formed, the inlet being positioned above the discharge cup and into which the treatment liquid ejected from the nozzle unit is introduced, and a second discharge channel being positioned adjacent to the upper wall and below the upper wall.

[0016] According to an embodiment, the first emission channel and / or the second emission channel can be configured in a ring shape.

[0017] According to an embodiment, the initial port may further include an insert having a through hole penetrating in the vertical direction. The insert may have a body positioned spaced apart from the inner wall of the housing. The body may be disposed at a position higher than the discharge cup and lower than the upper wall of the housing. A first gap between the body and the discharge cup may be configured as a first discharge channel, and a second gap between the body and the upper wall of the housing may be configured as a second discharge channel.

[0018] According to an embodiment, the housing may include: a lower body covering the side and lower part of the discharge cup-shaped member; and an upper body positioned above the lower body. The insert may also include a support base and a connecting rod connecting the body and the support base. The upper end of the lower body may be positioned higher than the upper end of the discharge cup-shaped member. The bottom of the support base may be supported by the lower body, and the upper body may be supported by the support base. The flue gas discharged through the second discharge channel may be configured to flow into the discharge space through the space between the connecting rods.

[0019] According to an embodiment, the length of the body in the vertical direction can be set to be greater than the first gap and the second gap.

[0020] According to an embodiment, flue gas emitted through a first emission channel and flue gas emitted through a second emission channel can be emitted through the same emission space.

[0021] According to an embodiment, the discharge pipe can be connected to the discharge space, a pressure-reducing component is installed in the discharge pipe, and the discharge path from the first discharge channel to the discharge pipe can be set to be shorter than the discharge path from the second discharge channel to the discharge pipe.

[0022] According to an embodiment, the emission space may include a first emission space and a second emission space. The housing may also include an inner housing and an outer housing. The inner housing is configured to cover the discharge cup-shaped member and has a first emission space from the discharge cup-shaped member. The outer housing is configured to cover the inner housing and has a second emission space from the inner housing. Flue gas flowing through the first emission channel may be connected to the first emission space, and the second emission channel may be connected to the second emission space.

[0023] According to an embodiment, the initial port may further include an insert having a through hole penetrating in the vertical direction. The insert may have a body that is positioned above the discharge cup and below the upper wall of the outer casing. A first gap between the body and the discharge cup may be configured as the first discharge channel, and a second gap between the body and the upper wall of the outer casing may be configured as the second discharge channel.

[0024] According to an embodiment, the upper end of the inner shell can be positioned above the upper end of the discharge cup-shaped member, and the lower end of the body can be supported by the upper end of the inner shell.

[0025] According to an embodiment, a first discharge pipe can be connected to a first discharge space, a second discharge pipe can be connected to a second discharge space, the first discharge pipe and the second discharge pipe can be connected to an integrated discharge pipe, and a pressure reducing component can be installed in the integrated discharge pipe.

[0026] According to an embodiment, the nozzle unit may include a base block and a plurality of nozzle components connected to the base block and having nozzles. The plurality of nozzle components may be connected to the base block in a row in one direction, and when the nozzle unit is positioned at a waiting position in each of the housing and the discharge cup, the longitudinal direction of the inlet through which the treatment liquid ejected from the nozzle passes may be set parallel to the direction in which the nozzles are arranged.

[0027] Another exemplary embodiment of the present invention provides an initial port in which a processing liquid is supplied to a nozzle waiting on a substrate. The initial port includes: a discharge cup having a receiving space for receiving the processing liquid ejected from the nozzle; a housing configured to cover the discharge cup and having a discharge space for discharging fumes generated by the processing liquid; and an insert disposed between an upper wall of the housing and the discharge cup within the housing, wherein a first discharge channel for guiding fumes to the discharge space is formed between the insert and the discharge cup, a second discharge channel for guiding fumes to the discharge space is formed between the insert and the housing, the second discharge channel being disposed at a position higher than the first discharge channel, and the processing liquid ejected from the nozzle unit is introduced into the discharge cup through an inlet formed on the upper wall and a through hole formed in the insert.

[0028] According to an embodiment, each of the first and second discharge channels can be configured in an annular shape, the housing can be connected to the discharge space at a position below the upper end of the discharge cup-shaped member, and the discharge pipe can be connected to the discharge space, with the pressure-reducing member installed in the discharge pipe.

[0029] According to an embodiment, the first emission channel and the second emission channel can be configured to guide the flue gas to the same emission space.

[0030] According to an embodiment, the discharge pipe can be connected to the discharge space, a pressure-reducing component is installed in the discharge pipe, and the discharge path from the first discharge channel to the discharge pipe can be set to be shorter than the discharge path from the second discharge channel to the discharge pipe.

[0031] According to an embodiment, the housing may include: a lower body covering the side and lower part of the discharge cup-shaped member; and an upper body positioned above the lower body. The insert may also include a support base and a connecting rod connecting the body and the support base. The upper end of the lower body may be positioned higher than the upper end of the discharge cup-shaped member. The bottom of the support base may be supported by the lower body, and the upper body may be supported by the support base. The flue gas discharged through the second discharge channel may be configured to flow into the discharge space through the space between the connecting rods.

[0032] Furthermore, another exemplary embodiment of the present invention provides an apparatus for processing a substrate, the apparatus comprising: a processing unit configured to perform liquid processing on the substrate; an initial port disposed outside the processing unit; and a nozzle unit supplying processing liquid to the substrate positioned in the processing unit, the nozzle unit having a nozzle configured to be movable between a process position in which the processing unit performs liquid processing on the substrate and a waiting position in the initial port, wherein the initial port includes: a discharge cup having a receiving space for receiving the processing liquid ejected from the nozzle; and a housing configured to... The enclosure includes a discharge cup-shaped component and a discharge space for discharging fumes generated by the treatment liquid; an insert disposed between the upper wall of the housing and the discharge cup-shaped component within the housing; a first discharge channel for guiding fumes to the discharge space formed between the insert and the discharge cup-shaped component; a second discharge channel for guiding fumes to the discharge space formed between the insert and the housing; the second discharge channel being disposed at a position higher than the first discharge channel; and a discharge pipe connected to the discharge space; a pressure-reducing member installed in the discharge pipe; and the discharge path from the first discharge channel to the discharge pipe being configured to be shorter than the discharge path from the second discharge channel to the discharge pipe.

[0033] According to an exemplary embodiment of the present invention, when the nozzle is waiting in the initial port, the flue gas generated by the treatment liquid can be smoothly discharged from the initial port, thereby preventing the nozzle from being contaminated by the flue gas.

[0034] The effects of the present invention are not limited to those described above, and those skilled in the art will clearly understand from this specification and the accompanying drawings the effects not mentioned. Attached Figure Description

[0035] Figure 1 The diagram illustrates the structure of a typical initial port.

[0036] Figure 2 To illustrate, the smoke from Figure 1 A diagram illustrating the initial port drainage status.

[0037] Figure 3 A plan view of an apparatus for processing a substrate according to an exemplary embodiment of the present invention is shown schematically.

[0038] Figure 4 To illustrate Figure 2 A view of an exemplary embodiment of a liquid handling chamber.

[0039] Figure 5 The illustration is schematically shown as an embodiment of a nozzle unit according to an exemplary embodiment of the present invention.

[0040] Figure 6 To illustrate Figure 4 A cross-sectional view of an exemplary implementation of the initial port.

[0041] Figure 7 for Figure 6 An exploded 3D view of the initial port.

[0042] Figure 8 To show the flue gas from Figure 6 A diagram illustrating the initial port drainage status.

[0043] Figure 9 To illustrate Figure 6 The illustration shows a modified embodiment of the initial port.

[0044] Figure 10 To illustrate Figure 6 A cross-sectional view of another exemplary implementation of the initial port.

[0045] Figure 11 for Figure 10 An exploded 3D view of the initial port.

[0046] Figure 12 and Figure 13 Each of them is shown schematically. Figure 10 The illustration shows a modified embodiment of the initial port.

[0047] Figure 14 To show the flue gas from Figure 10 A diagram illustrating the initial port drainage status.

[0048] Figure 15 To illustrate Figure 6 An exploded perspective view of another exemplary embodiment of the initial port. Detailed Implementation

[0049] In the following description, exemplary embodiments of the invention will be described in more detail with reference to the accompanying drawings. Various modifications to the exemplary embodiments of the invention are possible, and the scope of the invention should not be construed as limited to the embodiments described below. Exemplary embodiments are provided to describe the invention more completely to those skilled in the art. Therefore, the shapes of the elements in the figures are exaggerated for emphasis and clarity.

[0050] Figure 3 A plan view of an apparatus for processing a substrate according to an exemplary embodiment of the present invention is shown schematically.

[0051] refer to Figure 3The substrate processing apparatus includes an indexing module 10, a processing module 20, and a controller 30. According to an exemplary embodiment, the indexing module 10 and the processing module 20 may be arranged in one direction. Hereinafter, the direction in which the indexing module 10 and the processing module 20 are arranged will be referred to as a first direction 92, a direction perpendicular to the first direction 92 when viewed from above will be referred to as a second direction 94, and a direction perpendicular to both the first direction 92 and the second direction 94 will be referred to as a third direction 96.

[0052] The indexing module 10 transfers the substrate W from the container 80 storing the substrate W to the processing module 20, and stores the processed substrate W in the container 80. The longitudinal direction of the indexing module 10 is set to a second direction 94. The indexing module 10 has a loading port 12 and an index frame 14. The loading port 12 is positioned on the opposite side of the processing module 20 based on the index frame 14. The container 80 storing the substrate W is placed in the loading port 12. Multiple loading ports 12 can be provided, and the multiple loading ports 12 can be arranged along the second direction 94.

[0053] Sealed containers such as front-opening unified pods (FOUPs) can be used as container 80. Container 80 can be placed on loading port 12 by means of a conveying device (not shown) such as an overhead conveyor, overhead transport vehicle, or automated guided vehicle, or by a worker.

[0054] An indexing robot 120 is disposed within an indexing frame 14. A guide rail 140, with its longitudinal direction set as a second direction 14, can be disposed within the indexing frame 14, and the indexing robot 120 can be configured to be movable on the guide rail 140. The indexing robot 120 may include a hand 122 in which a substrate W is placed, and the hand 122 can be configured to be movable forward and backward, rotatable about a third direction 96 as an axis, and movable along the third direction 96. A plurality of hands 122 can be configured to be spaced apart from each other in the vertical direction, and the hands 122 can move forward and backward independently of each other.

[0055] The processing module 20 includes a buffer unit 200, a transfer chamber 300, and a processing chamber 400. The buffer unit 200 provides space for the substrate W loaded into and unloaded from the processing module 20 to temporarily reside. The processing chamber 400 performs a process of supplying liquid to the substrate W and treating the substrate W with liquid. The transfer chamber 300 transfers the substrate W between the buffer unit 200 and the liquid processing chamber 400.

[0056] The longitudinal direction of the transfer chamber 300 can be set to a first direction 92. A buffer unit 200 can be arranged between the index module 10 and the transfer chamber 300. Multiple liquid processing chambers 400 can be provided, and these liquid processing chambers are arranged on the side of the transfer chamber 300. The liquid processing chambers 400 and the transfer chamber 300 can be arranged along a second direction 94. The buffer unit 200 can be positioned at one end of the transfer chamber 300.

[0057] According to the embodiment, liquid processing chambers 400 are respectively arranged on both sides of the transfer chamber 300. The liquid processing chambers 400 can be arranged in an A×B array (each of A and B is a natural number of 1 or greater than 1) on both sides of the transfer chamber 300 in a first direction 92 and a third direction 96 respectively.

[0058] The transfer chamber 300 includes a transfer robot 320. A guide rail 340, with its longitudinal direction set as a first direction 92, can be disposed in the transfer chamber 300, and the transfer robot 320 can be configured to be movable on the guide rail 340. The transfer robot 320 may include a hand 322 on which a base plate W is placed, and the hand 322 can be configured to be movable forward and backward, rotatable about a third direction 96, and movable along the third direction 96. A plurality of hands 322 can be configured to be spaced apart from each other in the vertical direction, and the hands 322 can move forward and backward independently of each other.

[0059] The buffer unit 200 includes a plurality of buffers 220 on which the substrate W is placed. The buffers 220 may be arranged to be spaced apart from each other along a third direction 96. The front and rear of the buffer unit 200 are open. The front is the face facing the index module 10, and the rear is the face facing the transfer chamber 300. The indexing robot 120 can access the buffer unit 200 through the front, and the transfer robot 320 can access the buffer unit 200 through the rear.

[0060] Figure 4 To illustrate Figure 3 An illustration of an exemplary embodiment of the liquid handling chamber 400. (Refer to...) Figure 4 The liquid processing chamber 400 includes a processing unit 401, a nozzle unit 460, and an initial port 490. The processing unit 401 has a housing 410, a cup-shaped member 420, a support unit 440, and a lifting unit 480.

[0061] The housing 410 is configured in a generally rectangular parallelepiped shape. The cup-shaped member 420, the nozzle unit 460, and the initial port 490 are arranged inside the housing 410.

[0062] The cup-shaped member 420 has a processing space with an upper opening, within which liquid is processed on the substrate W. A support unit 440 supports the substrate W within the processing space. A liquid supply unit 460 supplies liquid to the substrate W supported on the support unit 440. Various types of liquids can be provided, and these liquids are supplied sequentially to the substrate W. A lifting unit 480 adjusts the relative height between the cup-shaped member 420 and the support unit 440.

[0063] According to an embodiment, the cup-shaped member 420 has a plurality of recovery tanks 422, 424, and 426. Each of the recovery tanks 422, 424, and 426 has a recovery space for recovering liquid used to process the substrate. Each of the recovery tanks 422, 424, and 426 is arranged in an annular shape covering the support unit 440. During a liquid processing process, the processing liquid splashed out by the rotation of the substrate W is introduced into the recovery space through the inlets 422a, 424a, and 426a of the respective recovery tanks 422, 424, and 426. According to an embodiment, the cup-shaped member 420 has a first recovery tank 422, a second recovery tank 424, and a third recovery tank 426. The first recovery tank 422 is arranged to cover the support unit 440, the second recovery tank 424 is arranged to cover the first recovery tank 422, and the third recovery tank 426 is arranged to cover the second recovery tank 424. The second inlet 424a for introducing liquid into the second recovery tank 424 may be positioned above the first inlet 422a for introducing liquid into the first recovery tank 422, and the third inlet 426a for introducing liquid into the third recovery tank 426 may be positioned above the second inlet 424a.

[0064] The support unit 440 includes a support plate 442 and a drive shaft 444. The upper surface of the support plate 442 can be configured to be substantially circular and have a larger diameter than the substrate W. A support pin 442a supporting the rear of the substrate W can be located at the center of the support plate 442, and the support pin 442a is configured such that its upper end protrudes from the support plate 442, thereby spaced the substrate W from the support plate 442 by a predetermined distance. A chuck pin 442b is located at the edge of the support plate 442. The chuck pin 442b is configured to protrude upward from the support plate 442 and support the side of the substrate W, preventing the substrate W from separating from the support unit 440. The drive shaft 444 is driven by a driver 446 and is connected to the bottom center of the substrate W, rotating the support plate 442 about its central axis.

[0065] The lifting unit 480 moves the cup-shaped member 420 in the vertical direction. The relative height between the cup-shaped member 420 and the substrate W changes due to the vertical movement of the cup-shaped member 420. As a result, since the recovery tanks 422, 424, and 426 for the recycled processing liquid change according to the type of liquid supplied by the substrate W, the liquid can be separated and recycled. Unlike the above description, the cup-shaped member 420 can be fixedly mounted, and the lifting unit 480 can move the support unit 440 in the vertical direction.

[0066] Figure 5 An illustration of an exemplary embodiment of the nozzle unit is shown schematically. The nozzle unit 460 can supply processing liquid to the substrate.

[0067] Reference Figure 5 The nozzle unit 460 includes a base block 462, a plurality of nozzle members 464, a drive shaft 468, and a driver 469. The base block 462 has a generally cuboid shape. The plurality of nozzle members 464 are fixedly connected to the base block 462. According to an embodiment, a first nozzle member 464a, a second nozzle member 464b, and a third nozzle member 464c may be mounted on the base block 462. The first nozzle member 464a, the second nozzle member 464b, and the third nozzle member 464c supply different treatment liquids. According to an embodiment, the first nozzle member 464a, the second nozzle member 464b, and the third nozzle member 464c may spray liquids with similar properties. For example, the first nozzle member 464a, the second nozzle member 464b, and the third nozzle member 464c may spray liquids containing acid components. Optionally, the first nozzle member 464a and the second nozzle member 464b may spray liquids containing acid components, and the third nozzle member 464c may spray water. For example, the first nozzle member 464a can spray sulfuric acid, the second nozzle member 464b can spray hydrofluoric acid, and the third nozzle member 464c can spray water. Optionally, the first nozzle member 464a, the second nozzle member 464b, and the third nozzle member 464c can spray liquids with different properties. For example, the first nozzle member 464a can spray a liquid with an acidic component, the second nozzle member 464b can spray a liquid with an alkaline component, and the third nozzle member 464c can spray water.

[0068] The first nozzle member 464a, the second nozzle member 464b, and the third nozzle member 464c can be configured to have the same shape. The structure of the first nozzle member 464a will be described below.

[0069] The first nozzle component 464a has a support arm 466 and a nozzle 467. The support arm 466 has a horizontal rod unit 466a and a vertical rod unit 466b. The horizontal rod unit 466a extends horizontally from the front of the base block 462 to the ground. The vertical rod unit 466b extends downward from the end of the horizontal rod unit 466a. The connection between the vertical rod unit 466b and the horizontal rod unit 466a can be configured as a rounded shape. The nozzle 467 is mounted on the lower end of the vertical rod unit 466b. A treatment fluid supply pipe 465 is connected to the rear of the base block 462. A valve 465a is installed in the treatment fluid supply pipe 465. A flow path (not shown) is formed in the support arm 466, through which treatment fluid is supplied via the treatment fluid supply pipe 465. The base block 462 is supported by a drive shaft 468, and a driver 469 is coupled to the drive shaft 468. The actuator 469 moves vertically via the drive shaft 468, and further, rotates the drive shaft 468 about a central axis. The nozzle 467 moves between a process position and a waiting position via the rotation of the drive shaft 468. In the process position, the nozzle 467 sprays processing liquid onto a substrate supported on a support unit to perform liquid treatment on the substrate. When no liquid treatment is being performed on the substrate, the nozzle 467 waits in the waiting position.

[0070] With nozzle 467 positioned in the waiting position, an automatic dispensing operation and a pre-dispensing operation are performed. The automatic dispensing operation involves spraying the processing liquid at predetermined time intervals when nozzle 467 has been waiting in the waiting position for a long time. The automatic dispensing operation prevents the processing liquid from solidifying in the nozzle unit 460. The pre-dispensing operation involves pre-spraying the processing liquid at the waiting position before spraying it from nozzle 467 onto the substrate. When the processing liquid is sprayed onto the substrate via the pre-dispensing operation, the processing liquid is sprayed smoothly.

[0071] The initial port 490 is located outside the cup-shaped member 420. When viewed from above, the waiting position of the nozzle 467 overlaps with the initial port 490. Figure 6 To illustrate Figure 4 A cross-sectional view of an exemplary implementation of the initial port, and Figure 7 for Figure 6 An exploded 3D view of the initial port.

[0072] refer to Figure 6 and Figure 7The initial port 490 has a discharge cup 1200 and a housing 1400. The discharge cup 1200 has an upper open receiving space 1202. The upper region of the discharge cup 1200 can be arranged over a wider range than the lower region. When viewed from above, the upper region of the discharge cup 1200 is longer in one direction. When the nozzle unit 460 is positioned in the waiting position, the longitudinal direction of the discharge cup 1200 is arranged parallel to the arrangement direction of the nozzle member 464.

[0073] A discharge port 1204 may be formed on the bottom of the receiving space 1202, and a discharge pipe 1206 may be connected to the discharge port 1204. An on / off valve 1206a is installed in the discharge pipe 1206. The treatment fluid sprayed from the nozzle 467 is contained in the receiving space 1202 of the discharge cup 1200 during automatic or pre-dispensing, and then discharged to the outside of the discharge cup 1200 through the discharge pipe 1206.

[0074] The housing 1400 is positioned to cover the discharge cup 1200. According to an embodiment, the housing 1400 is configured to completely cover the upper, lower, and sides of the discharge cup 1200. A discharge port 1402 is formed on the lower wall 1426 of the housing 1400, and a discharge pipe 1404 is connected to the discharge port 1402. A pressure-reducing member 1406 and a valve 1404a are installed in the discharge pipe 1404. A pump can be used as the pressure-reducing member 1406. As a result, a negative pressure is provided in the housing 1400 to discharge the atmosphere inside the housing 1400.

[0075] The housing 1400 includes a lower body 1420, an upper body 1440, and an insert 1460.

[0076] The lower body 1420 covers the lower and sides of the discharge cup 1200. The lower body 1420 has a sidewall 1422 and a lower wall 1424. When viewed from the top, the sidewall 1422 of the lower body 1420 may be configured to be larger than the size of the discharge cup 1200 and configured to have a similar shape to the discharge cup 1200. A separation space provided between the discharge cup 1200 and the lower body 1420 serves as a discharge space 1428. A discharge port 1402 may be formed on the lower wall 1424 of the lower body 1420. Flue gas generated by the treatment liquid remaining in the receiving space 1202 of the discharge cup 1200 flows into the discharge space 1428 through the first discharge passage 1620 described below, and then is discharged into the discharge pipe 1404. The upper end of the sidewall 1422 in the lower body 1420 is positioned higher than the upper end of the discharge cup 1200.

[0077] The upper body 1440 is positioned above the lower body 1420. The upper body 1440 has sidewalls 1442 and an upper wall 1444. When viewed from above, the sidewalls 1442 of the upper body 1440 have dimensions and shapes corresponding to the sidewalls 1422 of the lower body 1420. An inlet 1444a is formed on the upper wall 1444 of the upper body 1440. The treatment liquid ejected from the nozzle unit 460 is introduced into the receiving space 1202 of the discharge cup 1200 through the inlet 1444a.

[0078] An insert 1460 is positioned above the discharge cup 1200. The insert 1460 provides a first discharge channel 1620 and a second discharge channel 1640 within the housing 1400. The insert 1460 is positioned between the upper wall 1444 of the upper body 1440 and the upper end of the discharge cup 1200. The insert 1460 is vertically spaced from the upper wall 1444 of the upper body 1440. The insert 1460 is also vertically spaced from the upper end of the discharge cup 1200. A first gap between the lower end of the insert 1460 and the upper end of the discharge cup 1200 serves as the first discharge channel 1620, and a second gap between the upper end of the insert 1460 and the upper wall 1444 of the upper body 1440 serves as the second discharge channel 1640. The first gap is annular. Further, the second gap is annular. The first and second gaps may be of the same size.

[0079] The first gap and the second gap can be set with different dimensions. The dimensions of the first gap and the second gap are set to be different from each other to change each of the amount of flue gas emitted through the first emission channel and the amount of flue gas emitted through the second emission channel.

[0080] The insert 1460 has a support base 1470 and a body 1480. The support base 1470 has an annular shape. When viewed from above, the support base 1470 has dimensions and shape corresponding to the sidewall 1422 of the lower body 1420. The support base 1470 is positioned between the sidewall 1442 of the upper body 1440 and the sidewall 1422 of the lower body 1420. For example, the support base 1470 is disposed on the upper end of the sidewall 1422 of the lower body 1420, and the sidewall 1442 of the upper body 1440 is disposed on the upper end of the support base 1470.

[0081] The length of the body 1480 in the vertical direction is set to be longer than the first gap and the second gap. The body 1480 has a side wall 1482, an upper wall 1484, and a lower wall 1486. ​​The side wall 1482 of the body 1480 has an annular shape. The side wall 1482 of the body 1480 can be configured as a non-perforated blocking surface. When viewed from the top, the side wall 1480 of the body 1482 can have a size and shape corresponding to the discharge cup 1200.

[0082] Multiple holes 1486a are formed on the lower wall 1486 of the body 1480. The holes 1486a can be provided in the same number as the nozzles 467 provided in the nozzle unit 460. When viewed from above, with the nozzle unit 460 positioned in the waiting position, each hole 1486a is positioned overlapping with each nozzle 467. An opening 1484a is formed on the upper wall 1484 of the body 1480.

[0083] The size and shape of the opening 1484a formed on the upper wall 1484 of the body 1480 can be set within the size and shape of the inlet 1444a formed on the upper wall 1444 of the upper body 1440. Furthermore, when viewed from above, the opening 1484a formed on the upper wall 1484 of the body 1480 is positioned to overlap with the inlet 1444a formed on the upper wall 1444 of the upper body 1440. The opening 1484a formed on the upper wall 1484 of the body 1480 and the hole 1486a in the lower wall 1486 of the body 1480 serve as a through-hole through which the treatment liquid ejected from the nozzle 467 passes.

[0084] The main body 1480 is supported on a support base 1470 by connecting rods 1490. According to an embodiment, the support base 1470 is positioned at the same height as the lower wall 1420 of the main body 1480. A plurality of connecting rods 1490 are arranged along the circumference of the support base 1470. The connecting rods 1490 are positioned spaced apart from each other. A separation space 1492 between adjacent connecting rods 1490 is configured as a channel in which flue gas discharged through the second exhaust channel 1640 flows toward the exhaust pipe 1404.

[0085] In the above structure, the first discharge channel 1620 is positioned at a lower height than the second discharge channel 1640. The first discharge channel 1620 is positioned closer to the discharge cup 1200 than the second discharge channel 1640. Further, the second discharge channel 1640 is positioned closer to the upper wall of the upper body 1440 than the first discharge channel 1620. The discharge path from the first discharge channel 1620 to the discharge pipe 1404 is configured to be shorter than the discharge path from the second discharge channel 1640 to the discharge pipe 1404.

[0086] Figure 8 It shows from Figure 6 The initial port exhaust state of flue gas.

[0087] When nozzle unit 460 is positioned in the waiting position, treatment fluid is ejected from nozzle 467 during pre-dispensing or automatic dispensing operations. The ejection end of nozzle 467 is positioned above the initial port 490. The ejection end 467a of nozzle 467 can be positioned near the upper wall 1444 of upper body 1440. Figure 8 The image shows the treatment fluid being sprayed simultaneously from all nozzles 467. However, unlike this, the treatment fluid can be sprayed only from a selected nozzle 467 among a plurality of nozzles 467.

[0088] The treatment liquid drips downwards through an inlet 1444a formed on the upper wall 1444 of the upper body 1440, an opening 1484a formed on the upper wall 1484 of the body 1480, and a hole 1486a formed on the lower wall 1486 of the body 1480, and is contained in a receiving space 1202 of the discharge cup 1200. The treatment liquid contained in the receiving space 1202 is discharged to the outside of the receiving space 1202 through a discharge pipe 1206. When the treatment liquid contains acidic or alkaline components, flue gas is generated from the treatment liquid if it remains in the receiving space 1202. The flue gas flows upwards in the receiving space 1202, and most of the flue gas is introduced through a first discharge channel 1620 into a discharge space 1428 formed between the discharge cup 1200 and the lower body 1420. Thereafter, the flue gas is discharged to the outside through a discharge pipe 1404 connected to the lower body 1420.

[0089] Some flue gas is not discharged into the first discharge channel 1620, but flows upward through the body 1480. The flue gas flows through the second discharge channel 1640 into the channel between the discharge cup 1200 and the upper body 1440. Thereafter, the flue gas flows through the space 1492 formed between the support base 1470 and the body 1480 into the discharge space 1428 provided between the discharge cup 1200 and the lower body 1420, and is then discharged to the outside through the discharge pipe 1404.

[0090] Furthermore, even when the treatment liquid is sprayed from nozzle 467, flue gas will still be generated by the treatment liquid. In this case, depending on the location of flue gas generation, the generated flue gas is introduced into the emission space 1428 through the first emission channel 1620 or the second emission channel 1640.

[0091] according to Figure 6In an exemplary embodiment, most of the flue gas generated by the treatment liquid is discharged through a first discharge channel 1620, which is separated from the nozzle 467 by a certain distance. Therefore, the flue gas reaches the nozzle 467, minimizing the large amount of flue gas adhering to the outer surface of the nozzle 467. Further, the small amount of flue gas not discharged through the first discharge channel 1620 is discharged through a second discharge channel 1640. Thus, the flue gas is discharged outside the initial port 490, minimizing contamination of the nozzle 467 and peripheral equipment.

[0092] Furthermore, since the lower wall 1486 with the hole 1486a is provided to the body 1480, as a result, more flue gas may be emitted through the first emission channel 1620 compared to the case where the lower wall 1486 is not provided to the body 1480.

[0093] Furthermore, according to Figure 6 In one exemplary embodiment, flue gas flowing into the first exhaust channel 1620 and flue gas flowing into the second exhaust channel 1640 are introduced into the same exhaust space 1428. In this case, because the first exhaust channel 1620 is positioned closer to the exhaust pipe 1404 than the second exhaust channel 1640, a higher negative pressure is provided to the first exhaust channel 1620 compared to the second exhaust channel 1640. As a result, a larger amount of flue gas can be discharged by using the first exhaust channel 1620.

[0094] In the above embodiment, a discharge pipe 1404 is shown connected to the lower body 1420. However, unlike this, as... Figure 9 As shown, multiple discharge pipes 1405a and 1405b can be connected to the lower body 1420 of the initial port 490, and discharge pipes 1405a and 1405b can be connected to an integrated discharge pipe 1405 in which a pressure-reducing component (pump) 1406 is installed. In this case, a greater negative pressure can be provided between the discharge cup 1200 and the housing 1400.

[0095] Figure 10 To illustrate Figure 6 A cross-sectional view of another exemplary embodiment of the initial port, and Figure 11 for Figure 10 An exploded 3D view of the initial port.

[0096] refer to Figure 10 The initial port 490a has a discharge cup-shaped member 2200, an inner housing 2400, an outer housing 2600, and an insert 2800. The discharge cup-shaped member 2200 may have... Figure 6 The discharge cup-shaped component 1200 has a similar structure.

[0097] The inner housing 2400 is positioned to cover the discharge cup 2200. The inner housing 2400 is configured to cover the lower and side portions of the discharge cup 2200. A discharge port 2402 is formed on the lower wall of the inner housing 2400, and a first discharge pipe 2404 is connected to the discharge port 2402. A negative pressure is provided in the inner housing 2400 through the first discharge pipe 2404 to discharge the atmosphere within the inner housing 2400. A separation space is provided between the outer wall of the discharge cup 2200 and the side wall of the inner housing 2400. The separation space is configured as a first discharge space 2428. Flue gas generated from the treatment liquid remaining in the receiving space 2202 of the discharge cup 2200 is introduced into the first discharge space 2428 and then discharged to the outside of the inner housing 2400 through the first discharge pipe 2404. The upper end of the side wall 2440 in the inner housing 2400 is positioned higher than the upper end of the discharge cup 2200. According to an embodiment, the inner housing 2400 can be configured to be consistent with... Figure 6 The initial port 490 has a similar structure to the lower body 1420 of the housing 1400.

[0098] The insert 2800 is positioned above the inner housing 2400. The insert 2800 has a body 2802. The body 2802 is disposed on the inner housing 2400. The body 2802 has a side wall 2820, an upper wall 2840, and a lower wall 2860. The side wall 2802 of the body 2802 has an annular shape. The side wall of the body 2802 can be configured as a non-perforated blocking surface. When viewed from the top, the side wall 2820 of the body 2802 can have a size and shape corresponding to the inner housing 2400. A plurality of holes 2860a are formed on the lower wall 2860 of the body 2802. The holes 2860a can be provided in the same number as the number of nozzles 467 provided in the nozzle unit 460. When viewed from the top, with the nozzle unit 460 positioned in the waiting position, each hole 2860a is provided at a position overlapping with each nozzle 467. An opening 2840a is formed on the upper wall 2840 of the body 2802. The opening 2840a formed on the upper wall 2840 of the body 2802 and the hole 2860a in the lower wall 2860 of the body 2802 serve as through holes through which the treatment liquid sprayed from the nozzle 467 passes.

[0099] An outer casing 2600 is provided to cover the inner casing 2400 and the insert 2800. The outer casing 2600 is configured to completely cover the upper, lower, and side portions of the inner casing 2400 and the insert 2800. A discharge port 2402 is formed on the lower wall 2602 of the outer casing 2600, and a second discharge pipe 2604 is connected to the discharge port 2402. As a result, a negative pressure is provided in the outer casing 2600 to discharge from the interior of the outer casing 2600. An inlet 2640a is formed on the upper wall 2640 of the outer casing 2600. Separation spaces are provided between the inner casing 2400 and the outer casing 2600, and between the discharge cup 2200 and the outer casing 2600. The separation spaces are configured as a second discharge space 2628. The flue gas generated by the treatment liquid remaining in the containment space 2202 of the discharge cup 2200 is introduced into the second discharge space 2628 through the second channel, and then discharged to the outside of the outer casing 2600 through the second discharge pipe 2604.

[0100] The insert 2800 provides a first discharge channel 2920 and a second discharge channel 2940. The insert 2800 is positioned between the upper end of the discharge cup 2200 and the upper wall of the housing 2600. The insert 2800 is vertically spaced from the upper wall of the housing 2600. Further, the insert 2800 is positioned vertically spaced from the upper end of the discharge cup 2200. A first gap formed between the lower end of the insert 2800 and the upper end of the discharge cup 2200 serves as the first discharge channel 2920. A second gap formed between the upper end of the insert 2800 and the upper wall 2640 of the housing 2600 serves as the second discharge channel 2940. The first gap is annular. Further, the second gap is annular. The first and second gaps may be of the same size.

[0101] In the above structure, the first exhaust channel 2920 is positioned at a lower height than the second exhaust channel 2940. The first exhaust channel 2920 is positioned closer to the exhaust cup 2200 than the second exhaust channel 2940. Further, the second exhaust channel 2940 is positioned closer to the upper wall of the outer casing 2600 than the first exhaust channel 2920.

[0102] According to the embodiments, such as Figure 10 As shown, the first discharge pipe 2404 and the second discharge pipe 2604 can be connected to the integrated discharge pipe 2504, and the pump 2506 and the valve 2504a can be installed in the integrated discharge pipe 2504. In this case, the same negative pressure can be provided to both the inner housing 2400 and the outer housing 2600. Optionally, as Figure 12As shown, valves 2404a and 2604a are respectively installed in the first discharge pipe 2404 and the second discharge pipe 2604, and the opening rates of valves 2404a and 2604a are adjusted to provide different negative pressures to the inner housing 2400 and the outer housing 2600. Optionally, as Figure 13 As shown, pumps 2506a and 2506b are installed in the first discharge pipe 2404 and the second discharge pipe 2604, respectively, to regulate the negative pressure supplied to the inner housing 2400 and the outer housing 2600, respectively.

[0103] Figure 14 It shows the smoke from Figure 10 The initial port discharge status.

[0104] During pre-dispensing or automatic dispensing operations, the treatment fluid is sprayed from nozzle 467. Figure 14 The diagram shows the treatment fluid being sprayed simultaneously from all nozzles 467. However, unlike this, the treatment fluid may be sprayed only from a selected nozzle 467 among a plurality of nozzles 467. The treatment fluid drips downward through an inlet 2640a formed on the upper wall 2640 of the housing 2600, an opening 2840a formed on the upper wall 2840 of the body 2802, and a hole 2860a formed on the lower wall 2860 of the body 2802, and is contained in a receiving space 2202 of the discharge cup 2200. The treatment fluid contained in the receiving space 2202 is discharged to the outside of the receiving space 2202 through a discharge pipe 2206. When the treatment fluid contains acidic or alkaline components, flue gas is generated from the treatment fluid if the treatment fluid remains in the receiving space 2202. The flue gas flows upward in the receiving space 2202, and most of the flue gas is introduced through the first discharge passage 2920 into the first discharge space 2428 disposed between the discharge cup-shaped member 2200 and the inner housing 2400. Thereafter, the flue gas is discharged to the outside through the first discharge pipe 2404 connected to the inner housing 2400. Some flue gas is not discharged into the first discharge passage 2920, but flows upward through the insert 2800. The flue gas is introduced through the second discharge passage 2940 into the second discharge space 2628 formed between the discharge cup-shaped member 2200 and the outer housing 2600. Thereafter, the flue gas is discharged to the outside of the outer housing 2600 through the second discharge pipe 2604 connected to the outer housing 2600.

[0105] exist Figure 6 The text describes a nozzle unit 460 comprising a plurality of nozzles 467, and a treatment fluid being supplied to the initial port 490a from all or selected nozzles 467. However, unlike this, as... Figure 15As shown, the nozzle unit 460 includes only one nozzle 467, and the initial port 490b can be configured to correspond in shape to the nozzle. In this case, when viewed from above, the initial port 490b can be configured to be circular.

[0106] In the above embodiments, the substrate processing apparatus was described as an apparatus for cleaning a substrate. However, the spirit of the invention can also be applied to apparatuses performing different types of processes, including an initial port in which a nozzle for liquid processing of the substrate awaits. For example, the initial port of the invention can be provided to an apparatus including a nozzle for supplying photoresist or developer.

[0107] The foregoing detailed description illustrates the present invention. Furthermore, the foregoing has shown and described exemplary embodiments of the invention, and the invention can be used in various other combinations, modifications, and environments. That is, modifications or alterations can be made to the foregoing within the scope of the inventive concept disclosed herein, the scope equivalent to the scope of this disclosure, and / or the scope of technology or knowledge in the art. The foregoing exemplary embodiments describe the optimal state for carrying out the technical spirit of the invention, and various changes are possible in specific fields and uses of the invention. Therefore, the foregoing detailed description of the invention is not intended to limit the invention to the disclosed embodiments. Furthermore, the appended claims should also be interpreted to include other embodiments.

Claims

1. An apparatus for processing a substrate, the apparatus comprising: A processing unit configured to perform liquid processing on a substrate; An initial port is located outside the processing unit; as well as A nozzle unit supplies processing liquid to a substrate positioned within the processing unit, and the nozzle unit has a nozzle configured to be movable between a process position in which the processing unit performs liquid processing on the substrate and a waiting position in the initial port. The initial port has the following characteristics: A discharge cup-shaped member, the discharge cup-shaped member having a receiving space for accommodating the treatment liquid ejected from the nozzle, and A housing, configured to cover the discharge cup-shaped member, has an exhaust space for discharging fumes generated by the treatment liquid and an upper wall having an inlet formed therein, the inlet being located above the discharge cup-shaped member and through which the treatment liquid sprayed from the nozzle unit is introduced. A first discharge channel and a second discharge channel are provided in the initial port. The flue gas generated by the treatment liquid in the discharge cup flows into the discharge space through the first discharge channel and the second discharge channel, and the second discharge channel is positioned above the first discharge channel; and An insert having a through hole penetrating in the vertical direction. The housing includes: The lower body covers the sides and bottom of the discharge cup-shaped member, and The upper body is positioned above the lower body. The insert includes: The body, which is positioned spaced apart from the inner wall of the housing, Support base, and A connecting rod, which connects the body and the support base. The main body is positioned above the discharge cup-shaped member and below the upper wall of the housing. The first gap between the body and the discharge cup-shaped member is configured as the first discharge channel, and The second gap between the body and the upper wall of the housing is configured as the second discharge channel. The upper end of the lower body is positioned higher than the upper end of the discharge cup-shaped component. The bottom of the support base is supported by the lower body. The upper body is supported by the support base, and The flue gas emitted through the second emission channel is configured to flow into the emission space through the space between the connecting rods.

2. The apparatus according to claim 1, wherein, The first discharge channel is located near the discharge cup-shaped member and above the discharge cup-shaped member.

3. The apparatus according to claim 2, wherein, The second discharge channel is located near the upper wall and below the upper wall.

4. The apparatus according to claim 3, wherein, The first emission channel and / or the second emission channel are configured in a ring shape.

5. The apparatus according to claim 1, wherein, The length of the body in the vertical direction is set to be greater than the first gap and the second gap.

6. The apparatus according to claim 1, wherein, The flue gas emitted through the first emission channel and the flue gas emitted through the second emission channel are emitted through the same emission space.

7. The apparatus according to claim 6, wherein, The discharge pipe is connected to the discharge space, and the pressure-reducing component is installed in the discharge pipe. The discharge path from the first discharge channel to the discharge pipe is configured to be shorter than the discharge path from the second discharge channel to the discharge pipe.

8. The apparatus according to any one of claims 1 to 4, wherein, The nozzle unit includes a base block, and Multiple nozzle components, which are connected to the base block and have nozzles. The plurality of nozzle components are connected to the base block in a row in one direction, and When the nozzle unit is positioned at a waiting position in each of the housing and the discharge cup, the longitudinal direction of the inlet through which the treatment liquid ejected from the nozzle passes is set parallel to the direction in which the nozzle is arranged.

9. An apparatus for processing a substrate, the apparatus comprising: A processing unit configured to perform liquid processing on a substrate; An initial port is located outside the processing unit; as well as A nozzle unit supplies processing liquid to a substrate positioned within the processing unit, and the nozzle unit has a nozzle configured to be movable between a process position in which the processing unit performs liquid processing on the substrate and a waiting position in the initial port. The initial port has the following characteristics: A discharge cup-shaped member, the discharge cup-shaped member having a receiving space for accommodating the treatment liquid ejected from the nozzle, and A housing, configured to cover the discharge cup-shaped member, has an exhaust space for discharging fumes generated by the treatment liquid and an upper wall having an inlet formed therein, the inlet being located above the discharge cup-shaped member and through which the treatment liquid sprayed from the nozzle unit is introduced. A first discharge channel and a second discharge channel are provided in the initial port. The flue gas generated by the treatment liquid in the discharge cup flows into the discharge space through the first discharge channel and the second discharge channel, and the second discharge channel is positioned above the first discharge channel; and An insert having a through hole penetrating in the vertical direction. The emission space includes a first emission space and a second emission space, and The housing further includes: An inner housing, configured to cover the discharge cup-shaped member, and having a first discharge space from the discharge cup-shaped member, and An outer casing, configured to cover the inner casing, and having a second discharge space from the inner casing. The flue gas flowing through the first emission channel is connected to the first emission space, and The second emission channel is connected to the second emission space. The insert has a body. The main body is positioned above the discharge cup-shaped component and below the upper wall of the outer casing. The first gap between the body and the discharge cup-shaped member is configured as the first discharge channel, and The second gap between the main body and the upper wall of the outer shell is configured as the second discharge channel; The upper end of the inner shell is positioned above the upper end of the discharge cup-shaped component, and The lower end of the main body is supported by the upper end of the inner shell.

10. The apparatus according to claim 9, wherein, The first discharge pipe is connected to the first discharge space. The second discharge pipe is connected to the second discharge space. The first and second discharge pipes are connected to an integrated discharge pipe, and The pressure-reducing component is installed in the integrated discharge pipe.

11. An initial port in which a nozzle waiting for supplying processing liquid to a substrate is provided, the initial port comprising: A discharge cup-shaped member having a receiving space for receiving the treatment liquid ejected from the nozzle; A housing, the housing being configured to cover the discharge cup-shaped member, having an exhaust space for discharging fumes generated by the treatment liquid and having an upper wall in which an inlet is formed, the inlet being located above the discharge cup-shaped member and into which the treatment liquid sprayed from the nozzle is introduced; as well as An inserter is disposed between the upper wall of the housing and the discharge cup-shaped member within the housing. A first emission channel for guiding flue gas into the emission space is formed between the insert and the discharge cup-shaped member. A second emission channel that guides the flue gas into the emission space is formed between the insert and the housing. The second exhaust channel is positioned higher than the first exhaust channel, and The treatment liquid sprayed from the nozzle is introduced into the discharge cup through the inlet formed on the upper wall and the through hole formed in the insert; The housing includes: The lower body covers the sides and bottom of the discharge cup-shaped member, and The upper body is positioned above the lower body. The insert has a through hole extending vertically and includes: The body, which is positioned spaced apart from the inner wall of the housing, Support base, and A connecting rod, which connects the body and the support base. The main body is positioned above the discharge cup-shaped member and below the upper wall of the housing. The first gap between the body and the discharge cup-shaped member is configured as the first discharge channel, and The second gap between the body and the upper wall of the housing is configured as the second discharge channel. The upper end of the lower body is positioned higher than the upper end of the discharge cup-shaped component. The bottom of the support base is supported by the lower body. The upper body is supported by the support base, and The flue gas emitted through the second emission channel is configured to flow into the emission space through the space between the connecting rods.

12. The initial port according to claim 11, wherein, Each of the first and second emission channels is configured in a ring shape. The housing is connected to the discharge space at a position below the upper end of the discharge cup-shaped member, and The discharge pipe is connected to the discharge space, and the pressure-reducing component is installed in the discharge pipe.

13. The initial port according to claim 11 or 12, wherein, The first emission channel and the second emission channel are configured to guide the flue gas to the same emission space.

14. The initial port according to claim 13, wherein, The discharge pipe is connected to the discharge space, and the pressure-reducing component is installed in the discharge pipe. The discharge path from the first discharge channel to the discharge pipe is configured to be shorter than the discharge path from the second discharge channel to the discharge pipe.

15. An apparatus for processing a substrate, the apparatus comprising: A processing unit configured to perform liquid processing on a substrate; An initial port is located outside the processing unit; as well as A nozzle unit supplies processing liquid to a substrate positioned within the processing unit, and the nozzle unit has a nozzle configured to be movable between a process position in which the processing unit performs liquid processing on the substrate and a waiting position in the initial port. The initial port includes: A discharge cup-shaped component is provided, the discharge cup-shaped component having a receiving space to accommodate the treatment liquid ejected from the nozzle. A housing, configured to cover the discharge cup-shaped member, having an exhaust space for discharging fumes generated by the treatment liquid and an upper wall having an inlet formed therein, the inlet being located above the discharge cup-shaped member and through which the treatment liquid ejected from the nozzle unit is introduced. An inserter is disposed between the upper wall of the housing and the discharge cup-shaped member within the housing. A first emission channel that guides the flue gas into the emission space is formed between the insert and the discharge cup. A second emission channel that guides the flue gas into the emission space is formed between the insert and the housing. The second exhaust channel is positioned higher than the first exhaust channel, and The discharge pipe is connected to the discharge space, and the pressure-reducing component is installed in the discharge pipe. The discharge path from the first discharge channel to the discharge pipe is configured to be shorter than the discharge path from the second discharge channel to the discharge pipe; The housing includes: The lower body covers the sides and bottom of the discharge cup-shaped member, and The upper body is positioned above the lower body. The insert has a through hole penetrating in the vertical direction and includes: The body, which is positioned spaced apart from the inner wall of the housing, Support base, and A connecting rod, which connects the body and the support base. The main body is positioned above the discharge cup-shaped member and below the upper wall of the housing. The first gap between the body and the discharge cup-shaped member is configured as the first discharge channel, and The second gap between the body and the upper wall of the housing is configured as the second discharge channel. The upper end of the lower body is positioned higher than the upper end of the discharge cup-shaped component. The bottom of the support base is supported by the lower body. The upper body is supported by the support base, and The flue gas emitted through the second emission channel is configured to flow into the emission space through the space between the connecting rods.

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