Color film substrate, manufacturing method thereof, display panel and display device

Abstract

This application provides a color filter substrate, its manufacturing method, a display panel, and a display device. The color filter substrate includes a first substrate, with black matrices spaced apart on one side of the first substrate. Each black matrix has a first light-transmitting layer covering it on the side away from the first substrate. A color resist block is disposed between the first light-transmitting layers corresponding to two adjacent black matrices. A second light-transmitting layer is disposed on the side of the color resist block away from the first substrate, and the refractive index of the second light-transmitting layer is greater than that of the first light-transmitting layer. The color filter substrate, its manufacturing method, the display panel, and the display device provided by this application have a simple structure, are easy to manufacture, and have low cost. They can effectively improve the light extraction efficiency of the device, improve the display effect, extend the service life, and improve the overall performance of the product.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a color filter substrate and its manufacturing method, a display panel, and a display device. Background Technology

[0002] MLED includes Mini-LED display technology and Micro-LED display technology (mini / micro Light Emitting Diode, collectively referred to as MLED). Currently, the realization of MLED full-color display mainly relies on BMLED (blue micro light emitting diode) combined with QD (quantum dot color conversion layer) technology. Blue light is used as the backlight, and high-energy blue light is used to excite red or green quantum dots to produce corresponding red or green light, thereby realizing color conversion. It has high-quality characteristics such as pure color, wider color gamut, wide viewing angle, ultra-high contrast and fast response speed. However, the light extraction efficiency of the color filter substrate of existing devices is relatively low. Therefore, there is an urgent need for a color filter substrate that can effectively improve the light extraction efficiency. Summary of the Invention

[0003] In view of this, the purpose of this application is to provide a color filter substrate and its manufacturing method, a display panel, and a display device.

[0004] In a first aspect, this application provides a color filter substrate, including a first substrate, a black matrix spaced apart on one side of the first substrate, a first light-transmitting layer covering each black matrix on the side away from the first substrate, a color block between the first light-transmitting layers corresponding to two adjacent black matrices, and a second light-transmitting layer on the side of the color block away from the first substrate, wherein the refractive index of the second light-transmitting layer is greater than the refractive index of the first light-transmitting layer.

[0005] In some embodiments, the angle between the side of the first light-transmitting layer closest to the color resist block and the first substrate is greater than or equal to 35°.

[0006] In some embodiments, a color resist block of a different color is provided on each side of the black matrix. The angle between the side of the first light-transmitting layer near one of the color resist blocks and the first substrate is a first angle, and the angle between the side of the first light-transmitting layer near the other color resist block and the first substrate is a second angle. The first angle and the second angle are different.

[0007] In some embodiments, the angle between the side of the first light-transmitting layer closest to the color resist block and the first substrate is negatively correlated with the light output brightness of the color resist block.

[0008] In some embodiments, the cross-sectional shape formed by the combination of the black matrix and the first light-transmitting layer is trapezoidal or triangular.

[0009] In some embodiments, the width-to-thickness ratio of the cross section is 2:1 to 3:1.

[0010] In some embodiments, the total thickness of the first light-transmitting layer and the black matrix, the thickness of the second light-transmitting layer is 2 μm to 200 μm, the difference between the refractive index of the second light-transmitting layer and the refractive index of the first light-transmitting layer is 0.1 to 0.6, and the ratio of the thickness of the black matrix to the thickness of the first light-transmitting layer is 7:3 to 9:1.

[0011] In some embodiments, a quantum dot color conversion layer is provided between the color resist block and the second light-transmitting layer, a buffer layer is provided on the side of the second light-transmitting layer away from the first substrate, and a filling layer is provided on the side of the buffer layer away from the first substrate.

[0012] In some embodiments, the side of the buffer layer away from the first substrate is on the same plane as the end of the first light-transmitting layer away from the first substrate, and the refractive index of the buffer layer is greater than the refractive index of the first light-transmitting layer and less than the refractive index of the second light-transmitting layer.

[0013] A second aspect of this application provides a display panel, including an array substrate and a color filter substrate as described in the first aspect above, wherein a first substrate in the color filter substrate is disposed away from the array substrate, the array substrate includes a second substrate, and pixel defining structures are provided at intervals on one side of the second substrate, the pixel defining structures being disposed one-to-one with the black matrix, an emissive layer being provided between two adjacent pixel defining structures, and an encapsulation layer being provided on the side of the emissive layer away from the second substrate.

[0014] A third aspect of this application provides a display device including a display panel as described in the second aspect above.

[0015] A fourth aspect of this application provides a method for manufacturing a color filter substrate as described in the first aspect above, comprising: forming a spaced black matrix on one side of a first substrate using a first patterning process; forming a first light-transmitting layer covering each black matrix on the side away from the first substrate using a second patterning process; forming a color resist block between the first light-transmitting layers corresponding to two adjacent black matrices using a third patterning process; and forming a second light-transmitting layer on the side of the color resist block away from the first substrate using a fourth patterning process.

[0016] As can be seen from the above description, this application provides a color filter substrate and its manufacturing method, a display panel, and a display device. A first substrate serves as a support; black matrices are spaced apart on one side of the first substrate to distinguish pixels; a first light-transmitting layer covers each black matrix on the side away from the first substrate, and a color resist block is provided between the first light-transmitting layers corresponding to two adjacent black matrices for filtering light; a second light-transmitting layer is provided on the side of the color resist block away from the first substrate. The refractive index of the second light-transmitting layer is greater than that of the first light-transmitting layer. When light from the light-emitting layer shines from the second light-transmitting layer onto the first light-transmitting layer, total internal reflection occurs from the denser light layer to the sparser light layer, resulting in a higher reflectivity compared to light directly shining onto the black matrix. Therefore, more light is reflected and emitted from the color resist block, improving the overall light extraction efficiency. Furthermore, the combination of the black matrix and the first light-transmitting layer can define pixels, further avoiding crosstalk between pixels. This color filter substrate, its manufacturing method, display panel, and display device have a simple structure, are easy to manufacture, and have low cost. They can effectively improve the light extraction efficiency of the device, enhance the display effect, extend the service life, and improve the overall performance of the product. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in this application or related technologies, the drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the cross-sectional structure of the first type of color filter panel in the embodiments of this application;

[0019] Figure 2 This is a schematic diagram of the cross-sectional structure of the second type of color filter panel in the embodiments of this application;

[0020] Figure 3 This is a schematic diagram of the cross-sectional structure of the display panel in an embodiment of this application;

[0021] Figure 4 This is a schematic diagram of the cross-sectional structure of the first light-transmitting layer in the embodiments of this application;

[0022] Figure 5 This is a schematic diagram of the cross-sectional structure of the second type of first light-transmitting layer in the embodiments of this application.

[0023] Reference numerals: 1. First substrate; 2. Black matrix; 3. First light-transmitting layer; 4. Color resist block; 5. Second light-transmitting layer; 6. Buffer layer; 7. Filling layer; 8. Quantum dot color conversion layer; 9. Second substrate; 10. Pixel defining structure; 11. Light-emitting layer; 12. Encapsulation layer; 13. First insulating layer; 14. Second insulating layer; 15. Interlayer dielectric layer; 16. Active layer; 17. Gate; 18. Source / drain electrode; 19. First electrode; 20. Second electrode; 21. Planarization layer. Detailed Implementation

[0024] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with specific embodiments and the accompanying drawings.

[0025] It should be noted that, unless otherwise defined, the technical or scientific terms used in the embodiments of this application should have the ordinary meaning understood by one of ordinary skill in the art to which this application pertains. The terms "first," "second," and similar terms used in the embodiments of this application do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as "upper," "lower," "left," and "right" are only used to indicate relative positional relationships; when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0026] MLED includes Mini-LED display technology and Micro-LED display technology (mini / micro Light Emitting Diode, collectively referred to as MLED). Currently, the realization of MLED full-color display mainly relies on BMLED (blue light micro light emitting diode) combined with QD (quantum dot color conversion layer) technology. Blue light is used as the backlight, and high-energy blue light is used to excite red or green quantum dots to produce corresponding red or green light, thereby realizing color conversion. It has high-quality characteristics such as pure color, wider color gamut, wide viewing angle, ultra-high contrast and fast response speed. As the next generation of display devices, it has attracted much attention. However, the light extraction efficiency of the color filter substrate of existing devices is relatively low. Therefore, there is an urgent need for a color filter substrate that can effectively improve the light extraction efficiency.

[0027] In the process of developing this application, it was discovered that the color filter substrate structure in the related technology includes a first substrate, on which spaced black matrices are provided, and color resist blocks are provided between two adjacent black matrices. The black matrices are set to distinguish pixels, but when the light emitted by the light-emitting layer of the device shines on the side of the black matrices, the reflectivity is low, resulting in less light being extracted from the color resist blocks, thus resulting in low light extraction efficiency. In addition, MLED+QD devices typically have low blue light extraction brightness, followed by red light, and green light extraction brightness is the highest. The imbalance of the three light extraction brightnesses can easily lead to white balance problems. White balance is an indicator that describes the accuracy of white generated after the red, green, and blue primary colors are mixed in the device. Poor white balance will lead to color distortion in the display. Therefore, while improving the light extraction efficiency, it is also necessary to optimize the white balance effect.

[0028] The following describes specific embodiments in conjunction with... Figures 1 to 5 The technical solution of this application will be described in detail below.

[0029] In some embodiments of this application, a color filter substrate is provided, such as... Figures 1 to 2 As shown, the system includes a first substrate 1, with black matrices 2 spaced apart on one side of the first substrate 1. Each black matrix 2 has a first light-transmitting layer 3 covering it on the side away from the first substrate 1. A color blocking block 4 is provided between the first light-transmitting layers 3 corresponding to two adjacent black matrices 2. A second light-transmitting layer 5 is provided on the side of the color blocking block 4 away from the first substrate 1. The refractive index of the second light-transmitting layer 5 is greater than the refractive index of the first light-transmitting layer 3.

[0030] The first substrate 1 is, for example, a glass substrate, and there is no specific limitation. The first substrate 1 serves as a support, and a black matrix 2 is provided on one side of the first substrate 1 to distinguish pixels.

[0031] Each black matrix 2 has a first light-transmitting layer 3 covering the side away from the first substrate 1. A color blocking block 4 is provided between the first light-transmitting layers 3 corresponding to two adjacent black matrices 2. The color blocking block 4 is, for example, a blue color blocking block, a red color blocking block, or a green color blocking block, and there is no specific limitation. The color blocking block 4 is used to filter light and make the color effect of the emitted light better.

[0032] A second light-transmitting layer 5 is provided on the side of the color resist block 4 away from the first substrate 1. The materials of the first light-transmitting layer 3 and the second light-transmitting layer 5 are, for example, negative photoresist, and are not specifically limited. The refractive index of the second light-transmitting layer 5 is greater than the refractive index of the first light-transmitting layer 3, that is, the materials of the first light-transmitting layer 3 and the second light-transmitting layer 5 can be two negative photoresists with different refractive indices; for example... Figure 3As shown, when light from the light-emitting layer 11 shines from the second light-transmitting layer 5 onto the first light-transmitting layer 3, total internal reflection occurs as the light decreases in density. This results in a higher reflectivity compared to light directly shining onto the black matrix 2. Consequently, more light is reflected and emitted from the color resist block 4, improving the overall light extraction efficiency. Furthermore, the combination of the black matrix 2 and the first light-transmitting layer 3 can serve as a pixel delimiter, further preventing crosstalk between pixels. In addition, this method can improve light extraction efficiency without increasing the material of the light-emitting layer 11, resulting in low cost. It also eliminates the need to increase the control voltage, thus avoiding accelerated device aging and extending the lifespan.

[0033] This color filter substrate has a simple structure, is easy to manufacture, and has low cost. It can effectively improve the light output efficiency of devices, enhance display effects, extend service life, and improve the overall performance of products.

[0034] In some embodiments, the angle between the side of the first light-transmitting layer 3 near the color resist block 4 and the first substrate 1 is greater than or equal to 35°, for example, 35°, 40°, 45°, 50°, 55° or 60°.

[0035] like Figure 1 As shown in the figure, A represents the angle between the side of the first light-transmitting layer 3 closest to the color resist block 4 and the first substrate 1. When the angle is too small, the first light-transmitting layer 3 on the side of the black matrix 2 will tilt towards the first substrate 1. This causes light to be reflected away from the first light-transmitting layer 3 when it shines from the second light-transmitting layer 5, reducing the amount of light reaching the color resist block 4 and thus lowering the light extraction efficiency. Furthermore, because the color resist block 4 is located between the first light-transmitting layers 3 corresponding to two adjacent black matrices 2, such as... Figure 2 As shown, as the included angle decreases, the area of ​​the color block 4 between two adjacent black matrices 2 also decreases, reducing the light-emitting area and further reducing the light-emitting efficiency. Therefore, setting the included angle ≥35° can effectively ensure the light-emitting efficiency.

[0036] In some embodiments, such as Figure 2 and Figure 3 As shown, a color resist block 4 of a different color is provided on each side of the black matrix 2. The angle between the side of the first light-transmitting layer 3 near one of the color resist blocks 4 and the first substrate 1 is a first angle, and the angle between the side of the first light-transmitting layer 3 near the other color resist block 4 and the first substrate 1 is a second angle. The first angle and the second angle are different.

[0037] like Figure 2As shown, color block B is a blue color block, color block R is a red color block, and color block G is a green color block. A color block 4 of a different color is provided on each side of the black matrix 2. The angle between the side of the first light-transmitting layer 3 closest to one of the color blocks 4 and the first substrate 1 is the first angle, i.e., A1 in the figure. The angle between the side of the first light-transmitting layer 3 closest to the other color block 4 and the first substrate 1 is the second angle, i.e., A2 in the figure. The first angle and the second angle are different, i.e., A1 and A2 are not equal. As mentioned above, the size of the angle will change the light emission efficiency of the color block 4. By setting different angles for different colored color blocks 4, the light emission brightness of the color block 4 can be changed, which provides a basis for improving the white balance effect.

[0038] In some embodiments, the angle between the side of the first light-transmitting layer 3 near the color resist block 4 and the first substrate 1 is negatively correlated with the light output brightness of the color resist block 4.

[0039] As mentioned above, setting different angles can change the emitted light brightness of color resist 4. Generally, blue light has the lowest emitted light brightness and requires the highest gain ratio. Figure 2 As shown, the angle should be set to the maximum to improve the light output efficiency of the blue color block and increase the display brightness; while the green light has the highest light output brightness, so the angle should be set to the minimum to minimize the light output gain ratio, thereby improving poor white balance. This improves the overall light output efficiency while optimizing the white balance, greatly enhancing the display effect; the light output brightness ratio of the red, green, and blue color blocks can be 3:6:1 to achieve the best white balance effect.

[0040] The method of improving white balance by changing the angle does not increase the amount of light-emitting material used, and is less costly than setting different thicknesses of light-emitting layers 11 for different color resist blocks 4. Furthermore, because changing the angle will change the angle of reflected light after the second light-transmitting layer 5 illuminates the first light-transmitting layer 3, and will also change the light-emitting area of ​​the color resist block 4, only the angle needs to be finely adjusted to greatly improve the light output brightness. The process is easier to operate. Moreover, the change of the angle has a synchronous effect on the change of reflected light angle and the change of light-emitting area. Therefore, compared with the method of adjusting the light output by only changing the area ratio of different color resist blocks 4 in related technologies, this solution has a smaller adjustment of the area ratio, ensuring pixel density.

[0041] In some embodiments, such as Figure 1 and Figure 2 As shown, the cross-sectional shape formed by the combination of the black matrix 2 and the first light-transmitting layer 3 is trapezoidal or triangular.

[0042] The cross-sectional shape formed by the combination of the black matrix 2 and the first light-transmitting layer 3 can be, for example, an isosceles trapezoid, an isosceles trapezoid, an isosceles triangle, or an isosceles triangle, etc., without any specific limitation. Ideally, the side of the first light-transmitting layer 3 is a plane. However, due to the influence of actual processes, the side of the first light-transmitting layer 3 can be a curved surface. That is, the cross-sectional shape formed by the combination of the black matrix 2 and the first light-transmitting layer 3 can be a trapezoidal or triangular shape, without any specific limitation.

[0043] Setting the cross-sectional shape to a trapezoidal shape, compared to setting it to a triangle, simplifies the process and reduces the thickness of the cross-section. This allows for thinner subsequent filling layer 7 and buffer layer 6, improving light transmittance and ensuring optimal light output.

[0044] Setting the cross-sectional shape to a triangle results in a larger reflective area on the sides of the Black Matrix 2 compared to setting it to a trapezoid, leading to better total internal reflection and a stronger light output gain.

[0045] In some embodiments, the width-to-thickness ratio of the cross section is 2:1 to 3:1.

[0046] like Figure 1 As shown, the width of the cross section is D, and the thickness of the cross section is H. The ratio of D to H is set to 2:1 to 3:1, including 2:1, 2.5:1, or 3:1, etc. When the ratio is small, it means that the cross section thickness is too large. The subsequent filling layer 7 and buffer layer 6 will be correspondingly thicker, which will reduce the light transmittance of the device and thus reduce the light output effect. When the ratio is large, it means that the angle between the side of the first light-transmitting layer 3 and the first substrate 1 is too small, which will reduce the gain effect and also reduce the light output effect.

[0047] In some embodiments, the total thickness of the first light-transmitting layer 3 and the black matrix 2 is less than or equal to 10 μm, the thickness of the second light-transmitting layer 5 is 2 μm to 200 μm, the difference between the refractive index of the second light-transmitting layer 5 and the refractive index of the first light-transmitting layer 3 is 0.1 to 0.6, and the thickness ratio of the black matrix 2 to the thickness of the first light-transmitting layer 3 is 7:3 to 9:1.

[0048] The total thickness of the first light-transmitting layer 3 and the black matrix 2 is set to ≤10μm, such as 1μm, 5μm or 10μm, to avoid the subsequent setting of a thicker filling layer 7 and buffer layer 6, and to ensure light transmittance.

[0049] The thickness ratio of the black matrix 2 to the thickness of the first light-transmitting layer 3 is set to 7:3 to 9:1, such as 7:3, 7:2, 7:1, 8:1 or 9:1, etc. This avoids a thickness ratio that is too small, resulting in a small proportion of the black matrix 2, poor pixel definition, and light leakage. At the same time, it avoids a thickness ratio that is too large, resulting in the first light-transmitting layer 3 not being able to cover the black matrix 2, thus degrading the light output gain.

[0050] The thickness of the second light-transmitting layer 5 is set to 2μm to 200μm, such as 2μm, 10μm, 50μm, 100μm or 200μm, to avoid the thickness being too small, resulting in a small total reflection area and poor light output gain, while avoiding the thickness being too large, resulting in low overall light transmittance of the device and poor light output.

[0051] The difference between the refractive index of the second light-transmitting layer 5 and the refractive index of the first light-transmitting layer 3 is set to be 0.1 to 0.6, for example, 0.1, 0.2, 0.3, 0.4, 0.5 or 0.6. The refractive index of the second light-transmitting layer 5 is, for example, 1.6 to 1.9, including 1.6, 1.7, 1.8 or 1.9. The refractive index of the first light-transmitting layer 3 is, for example, 1.3 to 1.6, including 1.3, 1.4, 1.5 or 1.6. When the refractive index difference is too small, the total internal reflection effect is not good. When the refractive index difference is too large, it is difficult to achieve due to material limitations.

[0052] In some embodiments, such as Figure 2 and Figure 3 As shown, a quantum dot color conversion layer 8 is provided between the color resist block 4 and the second light-transmitting layer 5, a buffer layer 6 is provided on the side of the second light-transmitting layer 5 away from the first substrate 1, and a filling layer 7 is provided on the side of the buffer layer 6 away from the first substrate 1.

[0053] Quantum dot conversion layer materials are semiconductor nanocrystals with dimensions ranging from 2 nm to 20 nm, composed of elements such as CdSe and ZnSe. Figure 3 As shown, when the device uses a blue BMLED light-emitting layer as the backlight, a red quantum dot color conversion layer R-QD and a green quantum dot color conversion layer G-QD can be set. Blue light excites red or green quantum dots to produce corresponding red or green light, thereby achieving color conversion; or the device uses a blue BMLED light-emitting layer and a green GMLED light-emitting layer as the backlight, and only a red quantum dot color conversion layer R-QD is set for color conversion. The specific method is not limited.

[0054] The second light-transmitting layer 5 has a buffer layer 6 (Barrier) on the side away from the first substrate 1, and a filling layer 7 (Filler) on the side away from the first substrate 1. The filling layer 7 and the buffer layer 6 are made of materials such as acrylic resin or epoxy resin. The buffer layer 6 is mainly used to remove air and ensure light extraction, and the filling layer 7 is mainly used for leveling to keep the color filter substrate flat.

[0055] In some embodiments, such as Figure 2 and Figure 3 As shown, the side of the buffer layer 6 away from the first substrate 1 and the end of the first light-transmitting layer 3 away from the first substrate 1 are on the same plane. The refractive index of the buffer layer 6 is greater than the refractive index of the first light-transmitting layer 3 and less than the refractive index of the second light-transmitting layer 5.

[0056] The side of the buffer layer 6 away from the first substrate 1 is on the same plane as the end of the first light-transmitting layer 3 away from the first substrate 1. This is to ensure that the color filter substrate remains flat. Ideally, the same plane means that the side of the buffer layer 6 away from the first substrate 1 and the end of the first light-transmitting layer 3 away from the first substrate 1 are at the same height. In actual processes, due to limitations in process level, there are allowable step differences, which are not specifically limited.

[0057] The refractive index of the buffer layer 6 is, for example, 1.4, but is not specifically limited. The refractive index of the buffer layer 6 is greater than that of the first light-transmitting layer 3 and less than that of the second light-transmitting layer 5. This allows total internal reflection when light shines from the buffer layer 6 onto the first light-transmitting layer 3, without affecting the light passing through the second light-transmitting layer 5 from the buffer layer 6. The refractive index of the filling layer 7 can be consistent with that of the buffer layer 6, but is not specifically limited.

[0058] In some embodiments of this application, a display panel is provided, such as... Figure 3 As shown, the array substrate includes an array substrate and a color filter substrate as described in any of the above embodiments. The first substrate 1 in the color filter substrate is disposed away from the array substrate. The array substrate includes a second substrate 9. Pixel defining structures 10 are provided at intervals on one side of the second substrate 9. The pixel defining structures 10 are disposed in a one-to-one correspondence with the black matrix 2. A light-emitting layer 11 is provided between two adjacent pixel defining structures 10. An encapsulation layer 12 is provided on the side of the light-emitting layer 11 away from the second substrate 9.

[0059] like Figure 3 As shown, the color filter substrate and the array substrate are arranged opposite to each other and assembled together by a cell assembly process. The array substrate includes a second substrate 9, which is, for example, a flexible substrate (PI) formed by coating polyimide onto a glass substrate. The second substrate 9 has pixel defining structures 10 for distinguishing pixel emission. A light-emitting layer 11 is provided between two adjacent pixel defining structures 10. The light-emitting layer 11 is used for emitting light. The light-emitting layer 11 is, for example, a blue light-emitting layer, but the specific type is not limited. The light-emitting layer 11 may include a host material and a dopant material doped in the host material. The doping ratio of the guest material of the light-emitting layer 11 is 1% to 20%. Within this doping ratio range, on the one hand, the host material of the light-emitting layer 11 can effectively transfer exciton energy to the guest material of the light-emitting layer 11 to excite the guest material of the light-emitting layer 11 to emit light. On the other hand, the host material of the light-emitting layer 11 "dilutes" the guest material of the light-emitting layer 11, which effectively improves the fluorescence quenching caused by the collision between molecules of the guest material of the light-emitting layer 11 and the collision between energies, thereby improving the luminous efficiency and device lifetime. An encapsulation layer 12 (TFE) is provided on the side of the light-emitting layer 11 away from the second substrate 9 to isolate moisture.

[0060] In some embodiments, an active layer 16 is provided on the second substrate 9. A first insulating layer 13 is provided on the side of the active layer 16 away from the second substrate 9. A gate 17 is provided on the side of the first insulating layer 13 away from the second substrate 9. A second insulating layer 14 is provided on the side of the gate 17 away from the second substrate 9. An interlayer dielectric layer 15 is provided on the side of the second insulating layer 14 away from the second substrate 9. A source / drain electrode 18 is provided on the side of the interlayer dielectric layer 15 away from the second substrate 9. The source / drain electrode 18 passes through the interlayer dielectric layer 15, the second insulating layer 14, and the first insulating layer 13 and is connected to the active layer 16. A planarization layer 21 is provided on the side of the source / drain electrode 18 away from the second substrate 9. A first electrode 19 is provided on the side of the planarization layer 21 away from the second substrate 9. The first electrode 19 is connected to the source / drain electrode 18 through a via. A light-emitting layer 11 is provided on the side of the first electrode 19 away from the second substrate 9. A second electrode 20 is provided on the side of the light-emitting layer 11 away from the second substrate 9.

[0061] The gate 17 can be a metal gate layer or an amorphous material conductive gate layer, etc.; the first insulating layer 13 (GateInsulator, GI) and the second insulating layer 14 can be made of silicon oxide, silicon nitride, or silicon oxynitride, etc. The insulating layer can prevent short circuits; the active layer 16 includes an active region or a channel region, and the material is IGZO, etc.; the inter-layer dielectric layer 15 (ILD) can be made of silicon nitride, etc.; the source and drain electrodes 18 (SD) can be made of various metal materials, such as Mo, Al, Ti, Au, Cu, Hf, or Ta, as long as the material has high conductivity and can be used as an electrode; the two ends of the active layer 16 are electrically connected to a source and drain electrode 18, one of which is the drain and the other is the source; the first electrode 19 is, for example, an anode, and the second electrode 20 is, for example, a cathode, used to form a light-emitting circuit.

[0062] In some embodiments of this application, a display device is provided, including a display panel as described in any of the above embodiments.

[0063] The effect produced by this display device is the same as that produced by the aforementioned color filter substrate, and will not be described in detail here.

[0064] Those skilled in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of this application (including the claims) is limited to these examples; within the framework of this application, the technical features of the above embodiments or different embodiments can also be combined, the steps can be implemented in any order, and there are many other variations of different aspects of the embodiments of this application as described above, which are not provided in the details for the sake of brevity.

[0065] In the embodiments of this application, "film" and "layer" can be interchanged. For example, sometimes "conductive layer" can be replaced with "conductive film". Similarly, sometimes "insulating film" can be replaced with "insulating layer". The scale of the drawings in the embodiments of this application can be used as a reference in actual processes, but is not limited thereto. For example, the aspect ratio of the channel, the thickness and spacing of each film layer can be adjusted according to actual needs. The number of pixels in the display panel and the number of sub-pixels in each pixel are not limited to the quantities shown in the figures. The drawings described in the embodiments of this application are only structural schematic diagrams, and one method in the embodiments of this application is not limited to the shapes or values ​​shown in the drawings.

[0066] In the embodiments of this application, triangles, rectangles, trapezoids, pentagons, or hexagons are not strictly defined, but can be approximate triangles, rectangles, trapezoids, pentagons, or hexagons, etc., and may have some small deformations due to tolerances, and may have chamfers, curved edges, and other deformations.

[0067] Furthermore, given that details have been set forth to describe exemplary embodiments of this application, it will be apparent to those skilled in the art that embodiments of this application may be practiced without these details or with variations thereof. Therefore, these descriptions should be considered illustrative rather than restrictive.

[0068] In some embodiments of this application, a method for manufacturing a color filter substrate as described in any of the above embodiments is provided, comprising: forming a spaced black matrix 2 on one side of a first substrate 1 by a first patterning process; forming a first light-transmitting layer 3 covering each black matrix 2 on the side away from the first substrate 1 by a second patterning process; forming a color resist block 4 between the first light-transmitting layers 3 corresponding to two adjacent black matrices 2 by a third patterning process; and forming a second light-transmitting layer 5 on the side of the color resist block 4 away from the first substrate 1 by a fourth patterning process.

[0069] In some embodiments, the formation of a first light-transmitting layer 3 covering each black matrix 2 on the side away from the first substrate 1 using the second patterning process includes spin-coating photoresist, exposure using a mask, development, and finally photobleaching. This adds a photobleaching process compared to conventional patterning processes. Without the photobleaching process, the effect would be... Figure 4 As shown, the top surface of the first translucent layer 3 is arc-shaped. After photobleaching, the effect will be as follows: Figure 3 and Figure 5As shown, the top surface of the first light-transmitting layer 3 is flatter, making the cross-sectional shape of the first light-transmitting layer 3 and the black matrix 2 trapezoidal. After photobleaching, the light transmittance can be improved to ensure the light output effect. According to experimental tests, the light transmittance of the first light-transmitting layer 3 without photobleaching is 34.83%, and the light transmittance after photobleaching is 81.14%.

[0070] In some embodiments, the method for manufacturing the color filter substrate further includes: forming a buffer layer 6 on the side of the second light-transmitting layer 5 away from the first substrate 1, and forming a filling layer 7 on the side of the buffer layer 6 away from the first substrate 1.

[0071] The "patterning process" described in this application includes, for metallic, inorganic, or transparent conductive materials, processes such as photoresist coating, mask exposure, development, etching, and photoresist stripping; for organic materials, it includes processes such as organic material coating, mask exposure, and development. Deposition can be performed using any one or more of sputtering, evaporation, and chemical vapor deposition; coating can be performed using any one or more of spraying, spin coating, and inkjet printing; and etching can be performed using any one or more of dry and wet etching, without limitation.

[0072] Those skilled in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of this application (including the claims) is limited to these examples; within the framework of this application, the technical features of the above embodiments or different embodiments can also be combined, the steps can be implemented in any order, and there are many other variations of different aspects of the embodiments of this application as described above, which are not provided in the details for the sake of brevity.

[0073] Additionally, to simplify the description and discussion, and to avoid obscuring the embodiments of this application, well-known power / ground connections to other components may or may not be shown in the provided drawings. Furthermore, the apparatus may be illustrated in block diagram form to avoid obscuring the embodiments of this application, and this also takes into account the fact that the details of implementation of these block diagram apparatuses are highly dependent on the platform on which the embodiments of this application will be implemented (i.e., these details should be fully understood by those skilled in the art). While specific details have been set forth to describe exemplary embodiments of this application, it will be apparent to those skilled in the art that the embodiments of this application may be implemented without these specific details or with variations thereof. Therefore, these descriptions should be considered illustrative rather than restrictive.

[0074] Although this application has been described in conjunction with specific embodiments thereof, many substitutions, modifications, and variations of these embodiments will be apparent to those skilled in the art from the foregoing description. The embodiments of this application are intended to cover all such substitutions, modifications, and variations falling within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the embodiments of this application should be included within the protection scope of this application.

Claims

1. A color filter substrate, characterized in that, include: A first substrate has black matrices spaced apart on one side. Each black matrix has a first light-transmitting layer covering it on the side away from the first substrate. A color resist block is provided between the first light-transmitting layers corresponding to two adjacent black matrices. A second light-transmitting layer is provided on the side of the color resist block away from the first substrate. The refractive index of the second light-transmitting layer is greater than that of the first light-transmitting layer. A color resist block of a different color is provided on each side of the black matrix. The angle between the side of the first light-transmitting layer closer to one of the color resist blocks and the first substrate is a first angle. The angle between the side of the first light-transmitting layer closer to the other color resist block and the first substrate is a second angle. The first angle and the second angle are different.

2. The color filter substrate according to claim 1, characterized in that, The angle between the side of the first light-transmitting layer closest to the color resist block and the first substrate is greater than or equal to 35°.

3. The color filter substrate according to claim 2, characterized in that, The angle between the side of the first light-transmitting layer closest to the color resist block and the first substrate is negatively correlated with the light output brightness of the color resist block.

4. The color filter substrate according to claim 1, characterized in that, The cross-sectional shape formed by the combination of the black matrix and the first light-transmitting layer is trapezoidal or triangular.

5. The color filter substrate according to claim 4, characterized in that, The width-to-thickness ratio of the cross section is 2:1 to 3:

1.

6. The color filter substrate according to claim 1, characterized in that, The total thickness of the first light-transmitting layer and the black matrix is ​​less than or equal to 10 μm, the thickness of the second light-transmitting layer is 2 μm to 200 μm, the difference between the refractive index of the second light-transmitting layer and the refractive index of the first light-transmitting layer is 0.1 to 0.6, and the ratio of the thickness of the black matrix to the thickness of the first light-transmitting layer is 7:3 to 9:

1.

7. The color filter substrate according to claim 1, characterized in that, A quantum dot color conversion layer is provided between the color resist block and the second light-transmitting layer. A buffer layer is provided on the side of the second light-transmitting layer away from the first substrate, and a filling layer is provided on the side of the buffer layer away from the first substrate.

8. The color filter substrate according to claim 7, characterized in that, The side of the buffer layer away from the first substrate is on the same plane as the end of the first light-transmitting layer away from the first substrate. The refractive index of the buffer layer is greater than that of the first light-transmitting layer and less than that of the second light-transmitting layer.

9. A display panel, characterized in that, The invention includes an array substrate disposed opposite to each other and a color filter substrate as described in any one of claims 1-8. The first substrate in the color filter substrate is disposed away from the array substrate. The array substrate includes a second substrate. Pixel delimiting structures are provided at intervals on one side of the second substrate. The pixel delimiting structures are disposed in a one-to-one correspondence with the black matrix. A light-emitting layer is provided between two adjacent pixel delimiting structures. An encapsulation layer is provided on the side of the light-emitting layer away from the second substrate.

10. A display device, characterized in that, Includes the display panel as described in claim 9.

11. A method for manufacturing a color filter substrate according to any one of claims 1-8, characterized in that, include: A first patterning process is used to form a spaced black matrix on one side of a first substrate. A second patterning process is used to form a first light-transmitting layer covering each black matrix on the side away from the first substrate. A third patterning process is used to form a color resist block between the first light-transmitting layers corresponding to two adjacent black matrices. A fourth patterning process is used to form a second light-transmitting layer on the side of the color resist block away from the first substrate.

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