Dual telecentric lithography lens and lithography apparatus

Abstract

This invention discloses a dual telecentric lithography lens and a lithography apparatus. The dual telecentric lithography lens includes an aperture stop and multiple lenses arranged sequentially from the object side to the image side. The multiple lenses located on the side of the aperture stop closer to the object side constitute a front optical system, and the multiple lenses located on the side of the aperture stop closer to the image side constitute a rear optical system. The front and rear optical systems form a dual telecentric optical path. When the curvature spacing and refractive index of the multiple lenses change with the temperature of the dual telecentric lithography lens, the changes in curvature spacing and refractive index are mutually canceled by reasonably matching lenses and spacers made of different materials. This ensures stable optical performance within a temperature range of 20℃ to 60℃, thereby reducing the impact of system temperature on optical performance. The ultraviolet broadband dual telecentric lithography lens has higher transmittance and more stable performance, and can effectively solve the problem of focal plane thermal drift caused by the increase in system temperature due to the increase in light source power.

Description

Technical Field

[0001] This invention relates to the field of optics, and more particularly to a dual telecentric lithography lens and a lithography apparatus. Background Technology

[0002] With the continuous development of the domestic micro-nano fabrication industry, the demand for maskless ultraviolet wide-band dual telecentric lithography lenses is increasing. Compared with traditional lenses, this type of lens does not require film, has higher efficiency, and can be compatible with a wider ultraviolet band, thus meeting the needs of the entire PCB industry.

[0003] However, the design and manufacturing of ultraviolet broadband dual telecentric lithography lenses in China started relatively late and faces several problems. Among these, low system transmittance, poor resistance to ultraviolet attenuation, and strict tolerances are common issues. Furthermore, increasing the incident power of the light source leads to increased system heat, causing focal plane drift and significantly degrading lens performance—a more serious problem. This not only reduces manufacturing efficiency but may also render the system unusable. Summary of the Invention

[0004] The main objective of this invention is to propose a dual telecentric lithography lens and lithography apparatus, which aims to solve the problem of significant performance degradation caused by focal plane thermal drift due to increased system temperature caused by increased light source power in similar lenses.

[0005] To achieve the above objectives, this invention proposes a dual telecentric lithography lens. The dual telecentric lithography lens has an object side and an image side arranged opposite each other along the optical axis. The dual telecentric lithography lens includes an aperture stop and a plurality of lenses arranged sequentially from the object side to the image side. The plurality of lenses located on the side of the aperture stop closer to the object side constitute a front optical system, and the plurality of lenses located on the side of the aperture stop closer to the image side constitute a rear optical system. The front optical system and the rear optical system form a dual telecentric optical path. When the curvature spacing and refractive index of the plurality of lenses change with the temperature of the dual telecentric lithography lens, the focal plane of the dual telecentric lithography lens is always kept in its initial position by setting and matching the curvature radius, thickness, and refractive index of the plurality of lenses.

[0006] Optionally, the focal length of the front optical system is set to 73.8 mm, and the focal length of the rear optical system is set to 211.7 mm.

[0007] Optionally, the conjugate distance of the dual telecentric lithography lens is 550mm, the object-side working distance is 73.66mm, and the exposure working distance is 135mm.

[0008] Optionally, the plurality of lenses includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens, a tenth lens, an eleventh lens, a twelfth lens, and a thirteenth lens arranged sequentially from the object side to the image side;

[0009] The first lens and the second lens constitute the first lens group;

[0010] The third lens, the fourth lens, the fifth lens, the sixth lens, the seventh lens, the eighth lens, the ninth lens, the tenth lens, the eleventh lens, and the twelfth lens constitute the second lens group;

[0011] The thirteenth lens constitutes the third lens group.

[0012] Optionally, both the first lens and the second lens have positive optical power;

[0013] The optical power of the third lens, the seventh lens, the ninth lens, and the tenth lens is negative, while the optical power of the fourth lens, the fifth lens, the sixth lens, the eighth lens, the eleventh lens, and the twelfth lens is positive.

[0014] The optical power of the thirteenth lens is positive.

[0015] Optionally, the radius of curvature of the object side of the first lens is R1, and the radius of curvature of the image side is R2, wherein 481.636mm≤R1≤487.636mm, -115.974mm≤R2≤-109.974mm;

[0016] The object-side radius of curvature of the second lens is R3, and the image-side radius of curvature is R4, wherein 58.953mm≤R3≤64.953mm, 304.8mm≤R4≤310.8mm;

[0017] The object-side radius of curvature of the third lens is R5, and the image-side radius of curvature is R6, wherein -69.467mm≤R5≤-63.467mm, and 41.34mm≤R6≤47.34mm.

[0018] The object-side radius of curvature of the fourth lens is R7, and the image-side radius of curvature is R8, wherein 26.041mm≤R7≤32.041mm, -464.775≤R8≤-458.775mm;

[0019] The object-side radius of curvature of the fifth lens is R9, and the image-side radius of curvature is R10, wherein 47.753mm≤R9≤41.753mm, -199.22mm≤R10≤-193.22mm;

[0020] The object-side radius of curvature of the sixth lens is R11, and the image-side radius of curvature is R12, wherein 44.964mm≤R11≤50.964mm, -55.551mm≤R12≤-49.551mm;

[0021] The seventh lens has an object-side radius of curvature of R13 and an image-side radius of curvature of R14, wherein -42.855mm≤R13≤-36.855mm and 20.624mm≤R14≤26.624mm.

[0022] The radius of curvature of the object side of the eighth lens is R15, and the radius of curvature of the image side is R16, wherein 20.915mm≤R15≤26.915mm, -48.706mm≤R16≤-42.706mm;

[0023] The object-side radius of curvature of the ninth lens is R17, and the image-side radius of curvature is R18, wherein -40.954mm≤R17≤-34.954mm, and 61.131mm≤R18≤67.131mm.

[0024] The object-side radius of curvature of the tenth lens is R19, and the image-side radius of curvature is R20, wherein -18.951mm≤R19≤-12.951mm, -404.829mm≤R20≤-398.829mm;

[0025] The object-side radius of curvature of the eleventh lens is R21, and the image-side radius of curvature is R22, wherein -104.801mm≤R21≤-98.801mm, -39.203mm≤R22≤-33.203mm;

[0026] The object-side radius of curvature of the twelfth lens is R23, and the image-side radius of curvature is R24, wherein 986.5mm≤R23≤992.5mm, -115.617mm≤R24≤-109.617mm;

[0027] The object-side radius of curvature of the thirteenth lens is R25, and the image-side radius of curvature is R26, wherein -146.242mm≤R26≤-140.242mm.

[0028] Optionally, the center distance between the object side and the center distance between the image side of the first lens is D1, and the center distance between the image side and the center distance is D2, wherein 8mm≤D1≤10mm and 21.4mm≤D2≤23.4mm;

[0029] The center distance on the object side of the second lens is D3, and the center distance on the image side is D4, where 6.2≤D3≤8.2mm and 40mm≤D4≤42mm;

[0030] The center distance of the object side of the third lens is D5, and the center distance of the image side is D6, wherein 7.4mm≤D5≤9.4mm, -0.9mm≤D6≤1.1mm;

[0031] The center distance of the object side of the fourth lens is D7, and the center distance of the image side is D8, wherein 5.3mm≤D7≤7.3mm, and -0.9mm≤D8≤1.1mm;

[0032] The center distance of the object side of the fifth lens is D9, and the center distance of the image side is D10, wherein 4.4mm≤D9≤6.4mm, -0.9mm≤D10≤1.1mm;

[0033] The center distance of the object side of the sixth lens is D11, and the center distance of the image side is D12, wherein 4.7mm≤D11≤6.7mm, and -0.1mm≤D12≤1.9mm.

[0034] The center distance of the object side of the seventh lens is D13, and the center distance of the image side is D14, wherein 1.2mm≤D13≤3.2mm, -0.4mm≤D14≤1.6mm;

[0035] The center distance of the object side of the eighth lens is D15, and the center distance of the image side is D16, wherein 5.6mm≤D15≤7.6mm, and -0.2mm≤D16≤1.8mm.

[0036] The center distance of the object side of the ninth lens is D17, and the center distance of the image side is D18, wherein 10.1mm≤D17≤12.1mm, and 9.5mm≤D18≤11.5mm.

[0037] The center distance on the object side of the tenth lens is D19, and the center distance on the image side is D20, wherein 3.5mm≤D19≤5.5mm, and 9.6mm≤D20≤11.6mm.

[0038] The center distance of the object side of the eleventh lens is D21, and the center distance of the image side is D22, wherein 11mm≤D21≤13mm, and -0.8mm≤D22≤1.2mm.

[0039] The center distance of the object side of the twelfth lens is D23, and the center distance of the image side is D24, wherein 6.3mm≤D23≤8.3mm, and 136.3mm≤D24≤138.3mm;

[0040] The center distance of the object side of the thirteenth lens is D25, and the center distance of the image side is D26, wherein 11mm≤D25≤13mm, and 2mm≤D26≤4mm.

[0041] Optionally, the refractive index of the first lens is n1, where 1.55 ≤ n1 ≤ 1.65;

[0042] The refractive index of the second lens is n2, where 1.55 ≤ n2 ≤ 1.65;

[0043] The refractive index of the third lens is n3, where 1.55 ≤ n3 ≤ 1.65;

[0044] The refractive index of the fourth lens is n4, where 1.45 ≤ n4 ≤ 1.55;

[0045] The refractive index of the fifth lens is n5, where 1.45 ≤ n5 ≤ 1.55;

[0046] The refractive index of the sixth lens is n6, where 1.45 ≤ n6 ≤ 1.55;

[0047] The refractive index of the seventh lens is n7, where 1.53 ≤ n7 ≤ 1.63;

[0048] The refractive index of the eighth lens is n8, where 1.4 ≤ n8 ≤ 1.5;

[0049] The refractive index of the ninth lens is n9, where 1.55 ≤ n9 ≤ 1.65;

[0050] The refractive index of the tenth lens is n10, where 1.45 ≤ n10 ≤ 1.55;

[0051] The refractive index of the eleventh lens is n11, where 1.53 ≤ n11 ≤ 1.63;

[0052] The refractive index of the twelfth lens is n12, where 1.55 ≤ n12 ≤ 1.65;

[0053] The refractive index of the thirteenth lens is n13, where 1.45 ≤ n13 ≤ 1.55.

[0054] Optionally, the rear optical system may also include a protective lens;

[0055] The center distance of the object side surface of the protective lens is D27, where 2mm≤D27≤4mm;

[0056] The refractive index of the protective lens is n14, where 1.40 ≤ n14 ≤ 1.50.

[0057] The present invention also provides a photolithography apparatus, the photolithography apparatus including a dual telecentric photolithography lens, the dual telecentric photolithography lens having an object side and an image side arranged opposite to each other along the optical axis, the dual telecentric photolithography lens including an aperture and a plurality of lenses arranged sequentially from the object side to the image side, the plurality of lenses located on the side of the aperture closer to the object side forming a front optical system, the plurality of lenses located on the side of the aperture closer to the image side forming a rear optical system, the front optical system and the rear optical system forming a dual telecentric optical path, when the curvature spacing and refractive index of the plurality of lenses change with the temperature of the dual telecentric photolithography lens, the focal plane of the dual telecentric photolithography lens is always in the initial position by setting and matching the curvature radius, thickness and refractive index of the plurality of lenses.

[0058] The technical solution provided by this invention provides a dual telecentric lithography lens that produces clear images in the 350nm-450nm wavelength range. The telecentricity of the principal wavelengths on both the object side and image side is controlled within ±0.12°. The effective field of view on the object side reaches φ25.3mm, the numerical aperture on the object side is 0.12, and the theoretical lithographic resolution can reach 5μm. By rationally combining lenses and spacers made of different materials, the curvature interval change and refractive index change are mutually canceled out, ensuring stable optical performance within a temperature range of 20℃ to 60℃. This reduces the impact of system temperature on optical performance. The ultraviolet broadband dual telecentric lithography lens has higher transmittance and more stable performance, effectively solving the problem of focal plane thermal drift caused by increased system temperature due to increased light source power. It provides a more reliable and efficient solution for the micro-nano fabrication industry. Attached Figure Description

[0059] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0060] Figure 1 This is a schematic diagram of an embodiment of the dual telecentric lithography lens provided by the present invention;

[0061] Figure 2 The theoretical MTF curve of the dual telecentric lithography lens at 20℃;

[0062] Figure 3 The theoretical MTF curve of the dual telecentric lithography lens at 40℃;

[0063] Figure 4 The theoretical MTF curve of the dual telecentric lithography lens at 60℃;

[0064] Figure 5 The theoretical absolute distortion curve of the dual telecentric lithography lens is shown.

[0065] Figure 6 The theoretical on-axis chromatic aberration curve of the dual telecentric lithography lens;

[0066] Figure 7 The theoretical off-axis magnification chromatic aberration curve for the dual telecentric lithography lens is given.

[0067] Explanation of icon numbers:

[0068]

[0069] The realization of the objective, functional features and advantages of the present invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0070] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0071] It should be noted that if the embodiments of the present invention involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indicators will also change accordingly.

[0072] Furthermore, if the embodiments of this invention involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the meaning of "and / or" throughout the text includes three parallel solutions; for example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this invention.

[0073] The design and manufacturing of ultraviolet broadband dual telecentric lithography lenses in China started relatively late and faces several challenges. Among these, low system transmittance, poor resistance to ultraviolet attenuation, and stringent tolerances are common issues. Furthermore, increasing the incident power of the light source leads to increased system heat, causing focal plane drift and significantly degrading lens performance – a more serious problem. This not only reduces manufacturing efficiency but may also render the system unusable.

[0074] To address the aforementioned problems, this invention provides a dual telecentric lithography lens. Figure 1 This is a schematic diagram of an embodiment of the dual telecentric lithography lens provided by the present invention; Figure 2 The theoretical MTF curve of the dual telecentric lithography lens at 20℃; Figure 3 The theoretical MTF curve of the dual telecentric lithography lens at 40℃; Figure 4 The theoretical MTF curve of the dual telecentric lithography lens at 60℃; Figure 5 The theoretical absolute distortion curve of the dual telecentric lithography lens is shown. Figure 6 The theoretical on-axis chromatic aberration curve of the dual telecentric lithography lens; Figure 7 The theoretical off-axis magnification chromatic aberration curve for the dual telecentric lithography lens is given.

[0075] Please see Figure 1The dual telecentric lithography lens has an object side and an image side arranged opposite each other along the optical axis. The dual telecentric lithography lens includes an aperture stop and a plurality of lenses arranged sequentially from the object side to the image side. The plurality of lenses located on the side of the aperture stop closer to the object side constitute a front optical system, and the plurality of lenses located on the side of the aperture stop closer to the image side constitute a rear optical system. The front optical system and the rear optical system form a dual telecentric optical path. When the curvature spacing and refractive index of the plurality of lenses change with the temperature of the dual telecentric lithography lens, the focal plane of the dual telecentric lithography lens is always in its initial position by setting and matching the curvature radius, thickness and refractive index of the plurality of lenses.

[0076] The technical solution provided by this invention provides a dual telecentric lithography lens that produces clear images in the 350nm-450nm wavelength range. The telecentricity of the principal wavelengths on both the object side and image side is controlled within ±0.12°. The effective field of view on the object side reaches φ25.3mm, the numerical aperture on the object side is 0.12, and the theoretical lithographic resolution can reach 5μm. By rationally combining lenses and spacers made of different materials, the curvature interval change and refractive index change are mutually canceled out, ensuring stable optical performance within a temperature range of 20℃ to 60℃. This reduces the impact of system temperature on optical performance. The ultraviolet broadband dual telecentric lithography lens has higher transmittance and more stable performance, effectively solving the problem of focal plane thermal drift caused by increased system temperature due to increased light source power. It provides a more reliable and efficient solution for the micro-nano fabrication industry.

[0077] It should be noted that the initial position can be understood as any position within a certain numerical range, within which the imaging effect of the dual telecentric lithography lens will not be affected.

[0078] It should be noted that the basic principle of the dual telecentric optical path is that by setting the aperture stop in a special position, the entrance pupil and exit pupil of the optical system are both at infinity, and the principal rays incident on and out of the optical system are parallel to the optical axis. When photolithography is required, ultraviolet lithography can be performed by connecting a corresponding optical engine to the dual telecentric lithography lens.

[0079] The dual telecentric lithography lens provided by this invention improves ultraviolet transmittance while, through a rational optical architecture design, achieving more concentrated lens tolerances, facilitating processing and assembly, thereby effectively improving lens yield and production efficiency, and reducing production cycle and defect rate. More importantly, the optical architecture designed in this patent is based on a thermal-free design, which can increase light source power without compromising exposure quality, and provides more concentrated energy, higher power density per unit exposure, and the ability to maintain high power operation for extended periods, significantly improving PCB exposure efficiency. Compared to the traditional 365nm-405nm band, this lens covers a wider band, is compatible with simultaneous exposure of multiple bands, and can meet more application needs.

[0080] Specifically, the focal length of the front optical system is set to 73.8mm, and the focal length of the rear optical system is set to 211.7mm. Specifically, the conjugate distance of the dual telecentric lithography lens is 550mm, the object-side working distance is 73.66mm, and the exposure working distance is 135mm. The dual telecentric lithography lens is for magnified imaging, with a magnification M=-2.67X, a theoretically limiting lithographic resolution greater than 5μm, a field curvature less than 36μm, and absolute distortion controllable below 2μm. Furthermore, the dual telecentric lithography lens exhibits an axial chromatic aberration of less than 30μm and a transverse chromatic aberration of less than 0.5μm within the 350nm-450nm range.

[0081] Specifically, in this embodiment, the plurality of lenses includes a first lens 1, a second lens 2, a third lens 3, a fourth lens 4, a fifth lens 5, a sixth lens 6, a seventh lens 7, an eighth lens 8, a ninth lens 9, a tenth lens 10, an eleventh lens 11, a twelfth lens 12, and a thirteenth lens 13 arranged sequentially from the object side to the image side; the first lens 1 and the second lens 2 constitute a first lens group; the third lens 3, the fourth lens 4, the fifth lens 5, the sixth lens 6, the seventh lens 7, the eighth lens 8, the ninth lens 9, the tenth lens 10, the eleventh lens 11, and the twelfth lens 12 constitute a second lens group; and the thirteenth lens 13 constitutes a third lens group. It should be noted that none of the plurality of lenses are cemented together.

[0082] More specifically, the optical power of the first lens 1 and the second lens 2 is positive; the optical power of the third lens 3, the seventh lens 7, the ninth lens 9 and the tenth lens 10 is negative; the optical power of the fourth lens 4, the fifth lens 5, the sixth lens 6, the eighth lens 8, the eleventh lens 11 and the twelfth lens 12 is positive; and the optical power of the thirteenth lens 13 is positive.

[0083] Specifically, in this embodiment, the object-side radius of curvature of the first lens 1 is R1, and the image-side radius of curvature is R2, wherein 481.636mm≤R1≤487.636mm, -115.974mm≤R2≤-109.974mm; the object-side radius of curvature of the second lens 2 is R3, and the image-side radius of curvature is R4, wherein 58.953mm≤R3≤64.953mm, 304.8mm≤R4≤310.8mm; the object-side radius of curvature of the third lens 3 is R5, and the image-side radius of curvature is R6, wherein -69.467mm≤R5≤-63.467mm, 41.34mm≤R6≤47.34mm; The fourth lens 4 has an object-side radius of curvature of R7 and an image-side radius of curvature of R8, where 26.041mm ≤ R7 ≤ 32.041mm and -464.775mm ≤ R8 ≤ -458.775mm; the fifth lens 5 has an object-side radius of curvature of R9 and an image-side radius of curvature of R10, where 47.753mm ≤ R9 ≤ 41.753mm and -199.22mm ≤ R10 ≤ -193.22mm; the sixth lens 6 has an object-side radius of curvature of R11 and an image-side radius of curvature of R12, where 44.964mm ≤ R11 ≤ 50.964mm and -55.551mm ≤ R12 ≤ -49.551mm; the seventh lens 7... The object-side radius of curvature of the eighth lens 8 is R13, and the image-side radius of curvature is R14, where -42.855mm ≤ R13 ≤ -36.855mm, and 20.624mm ≤ R14 ≤ 26.624mm; the object-side radius of curvature of the eighth lens 8 is R15, and the image-side radius of curvature is R16, where 20.915mm ≤ R15 ≤ 26.915mm, and -48.706mm ≤ R16 ≤ -42.706mm; the object-side radius of curvature of the ninth lens 9 is R17, and the image-side radius of curvature is R18, where -40.954mm ≤ R17 ≤ -34.954mm, and 61.131mm ≤ R18 ≤ 67.131mm; the tenth lens... The object-side radius of curvature of lens 10 is R19, and the image-side radius of curvature is R20, where -18.951mm ≤ R19 ≤ -12.951mm, -404.829mm ≤ R20 ≤ -398.829mm; the object-side radius of curvature of lens 11 is R21, and the image-side radius of curvature is R22, where -104.801mm ≤ R21 ≤ -98.801mm, -39.203mm ≤ R22 ≤ -33.203mm; the object-side radius of curvature of lens 12 is R23, and the image-side radius of curvature is R24, where 986.5mm ≤ R23 ≤ 992.5mm, -115.617mm ≤ R24 ≤ -109mm.The object-side radius of curvature of the thirteenth lens 13 is R25, and the image-side radius of curvature is R26, wherein -146.242mm ≤ R26 ≤ -140.242mm.

[0084] More specifically, R1 = 484.636 mm; R2 = -112.974 mm; R3 = 61.953 mm; R4 = 307.8 mm; R5 = -66.467 mm; R6 = 44.34 mm; R7 = 29.041 mm; R8 = -461.775 mm; R9 = 44.753 mm; R10 = -196.22 mm; R11 = infinity mm; R12 = 47.964 mm; and R13 = -52.55 mm. 1mm; and R14=-39.855mm; and R15=23.624mm; and R16=23.915mm; and R17=-45.706mm; and R18=-37.954mm; and R19=64.131mm; and R20=-15.951mm; and R21=-401.829mm; and R22=-101.801mm; and R23=-36.203mm; and R24=989.5mm; and R25=-112.617mm.

[0085] Specifically, the center distance on the object side of the first lens 1 is D1, and the center distance on the image side is D2, where 8mm ≤ D1 ≤ 10mm, and 21.4mm ≤ D2 ≤ 23.4mm; the center distance on the object side of the second lens 2 is D3, and the center distance on the image side is D4, where 6.2mm ≤ D3 ≤ 8.2mm, and 40mm ≤ D4 ≤ 42mm; the center distance on the object side of the third lens 3 is D5, and the center distance on the image side is D6, where 7.4mm ≤ D5 ≤ 9.4mm, and -0.9mm ≤ D6 ≤ 1.1mm; the center distance on the object side of the fourth lens 4 is D7, and the center distance on the image side is... D8, where 5.3mm≤D7≤7.3mm, -0.9mm≤D8≤1.1mm; the center distance of the object-side surface of the fifth lens 5 is D9, and the center distance of the image-side surface is D10, where 4.4mm≤D9≤6.4mm, -0.9mm≤D10≤1.1mm; the center distance of the object-side surface of the sixth lens 6 is D11, and the center distance of the image-side surface is D12, where 4.7mm≤D11≤6.7mm, -0.1mm≤D12≤1.9mm; the center distance of the object-side surface of the seventh lens 7 is D13, and the center distance of the image-side surface is D14, where 1.2mm≤D13≤3mm. The center distance of the object-side surface of the eighth lens 8 is D15, and the center distance of the image-side surface is D16, where 5.6mm≤D15≤7.6mm, -0.2mm≤D16≤1.8mm; the center distance of the object-side surface of the ninth lens 9 is D17, and the center distance of the image-side surface is D18, where 10.1mm≤D17≤12.1mm, 9.5mm≤D18≤11.5mm; the center distance of the object-side surface of the tenth lens 10 is D19, and the center distance of the image-side surface is D20, where 3.5mm≤D19≤5.5mm, 9.6mm≤D14≤1.6mm. m≤D20≤11.6mm; the center distance of the object side of the eleventh lens 11 is D21, and the center distance of the image side is D22, wherein 11mm≤D21≤13mm, -0.8mm≤D22≤1.2mm; the center distance of the object side of the twelfth lens 12 is D23, and the center distance of the image side is D24, wherein 6.3mm≤D23≤8.3mm, 136.3mm≤D24≤138.3mm; the center distance of the object side of the thirteenth lens 13 is D25, and the center distance of the image side is D26, wherein 11mm≤D25≤13mm, 2mm≤D26≤4mm.

[0086] In one specific embodiment, D1 = 9 mm; D2 = 22.4 mm; D3 = 7.2 mm; D4 = 41 mm; D5 = 8.4 mm; D6 = 0.1 mm; D7 = 6.3 mm; D8 = 0.1 mm; D9 = 5.4 mm; D10 = 0.1 mm; D11 = 0.1 mm; D12 = 5.7 mm; D13 = 0.9 mm; and D D14 = 2.2mm; D15 = 0.6mm; D16 = 6.6mm; D17 = 0.8mm; D18 = 11.1mm; D19 = 10.5mm; D20 = 4.5mm; D21 = 10.6mm; D22 = 12mm; D23 = 0.2mm; D24 = 7.3mm; D25 = 137.3mm; D26 = 12mm.

[0087] Specifically, the refractive index of the first lens 1 is n1, where 1.55 ≤ n1 ≤ 1.65; the refractive index of the second lens 2 is n2, where 1.55 ≤ n2 ≤ 1.65; the refractive index of the third lens 3 is n3, where 1.55 ≤ n3 ≤ 1.65; the refractive index of the fourth lens 4 is n4, where 1.45 ≤ n4 ≤ 1.55; the refractive index of the fifth lens 5 is n5, where 1.45 ≤ n5 ≤ 1.55; the refractive index of the sixth lens 6 is n6, where 1.45 ≤ n6 ≤ 1.55; and the refractive index of the seventh lens 7 is n7, where 1.55 ≤ n1 ≤ 1.65. The refractive index of the eighth lens 8 is n8, where 1.4 ≤ n8 ≤ 1.5; the refractive index of the ninth lens 9 is n9, where 1.55 ≤ n9 ≤ 1.65; the refractive index of the tenth lens 10 is n10, where 1.45 ≤ n10 ≤ 1.55; the refractive index of the eleventh lens 11 is n11, where 1.53 ≤ n11 ≤ 1.63; the refractive index of the twelfth lens 12 is n12, where 1.55 ≤ n12 ≤ 1.65; the refractive index of the thirteenth lens 13 is n13, where 1.45 ≤ n13 ≤ 1.55.

[0088] In one specific embodiment, n1=1.6; and n2=1.6; and n3=1.6; and n4=1.5; and n5=1.5; and n6=1.5; and n7=1.58; and n8=1.45; and n9=1.6; and n10=1.5; and n11=1.58; and n12=1.6; and n13=1.5.

[0089] Furthermore, the rear optical system also includes a protective lens 14, the image side of which has a radius of curvature of -143.242 mm; the object side of which has a center distance of D27, wherein 2 mm ≤ D27 ≤ 4 mm; and the refractive index of which is n14, wherein 1.40 ≤ n14 ≤ 1.50.

[0090] The lens materials used are Chengdu Guangming brand F4GTI, H-FK61, and QF50GTI, respectively, as well as Corning HPFS7980. These materials exhibit excellent i-line transmittance, ensuring good light transmission of the dual telecentric lithography lens and meeting lithography specifications. The dual telecentric lithography lens has a minimum theoretical transmittance of over 76% at a wavelength of 355nm. The high transmittance materials and relatively few lenses ensure high transmittance, meeting design requirements.

[0091] Specifically, the image side can be understood as the lens facing the exposure surface, and the object side can be understood as the lens facing the DMD projection chip surface. It can be understood that the light carrying the information of the photographed object can pass through the first lens 1, the second lens 2, the third lens 3, the fourth lens 4, the fifth lens 5, the aperture, the sixth lens 6, the seventh lens 7, the eighth lens 8, the ninth lens 9, the tenth lens 10, the eleventh lens 11, the twelfth lens 12, the thirteenth lens 13, and the protective lens 14 in sequence and finally form an image exposed on the imaging surface.

[0092] Figure 2 The theoretical MTF curve of the dual telecentric lithography lens at 20°C is shown. Figure 3 The theoretical MTF curve of the dual telecentric lithography lens at 40°C is shown. Figure 4 The theoretical MTF curve of the dual telecentric lithography lens at 60°C is shown. Figure 5 The theoretical absolute distortion curve of the dual telecentric lithography lens is shown. Figure 6 Display the theoretical on-axis chromatic aberration curve of the dual telecentric lithography lens; Figure 7 The theoretical off-axis magnification chromatic aberration curve of the dual telecentric lithography lens is displayed.

[0093] As can be seen from the above figures, the spherical aberration, field curvature, and distortion of the dual telecentric lithography lens system in this embodiment can be well corrected, which can meet the design requirements.

[0094] The present invention also provides a lithography apparatus, which includes the above-mentioned dual telecentric lithography lens. Since the lithography apparatus includes the dual telecentric lithography lens, the specific structure of the dual telecentric lithography lens is as described in the above embodiments. Since the dual telecentric lithography lens of the lithography apparatus adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0095] The above description is merely a preferred embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural transformations made using the contents of the present invention's specification and drawings under the inventive concept of the present invention, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present invention.

Claims

1. A dual-telecentric lithography lens, characterized in that, The dual telecentric lithography lens has an object side and an image side arranged opposite each other along the optical axis. The dual telecentric lithography lens includes an aperture stop and a plurality of lenses arranged sequentially from the object side to the image side. The plurality of lenses located on the side of the aperture stop closer to the object side constitute a front optical system, and the plurality of lenses located on the side of the aperture stop closer to the image side constitute a rear optical system. The front optical system and the rear optical system form a dual telecentric optical path. When the curvature spacing and refractive index of the plurality of lenses change with the temperature of the dual telecentric lithography lens, the focal plane of the dual telecentric lithography lens is always in its initial position by setting and matching the curvature radius, thickness and refractive index of the plurality of lenses. The plurality of lenses include a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens, a tenth lens, an eleventh lens, a twelfth lens, and a thirteenth lens arranged sequentially from the object side to the image side; The first lens and the second lens constitute the first lens group; The third lens, the fourth lens, the fifth lens, the sixth lens, the seventh lens, the eighth lens, the ninth lens, the tenth lens, the eleventh lens, and the twelfth lens constitute the second lens group; The thirteenth lens constitutes the third lens group; Both the first lens and the second lens have positive optical power; The optical power of the third lens, the seventh lens, the ninth lens, and the tenth lens is negative, while the optical power of the fourth lens, the fifth lens, the sixth lens, the eighth lens, the eleventh lens, and the twelfth lens is positive. The optical power of the thirteenth lens is positive.

2. The dual telecentric lithography lens as described in claim 1, characterized in that, The focal length of the front optical system is set to 73.8 mm, and the focal length of the rear optical system is set to 211.7 mm.

3. The dual telecentric lithography lens as described in claim 2, characterized in that, The conjugate distance of the dual telecentric lithography lens is 550mm, the object-side working distance is 73.66mm, and the exposure working distance is 135mm.

4. The dual telecentric lithography lens as described in claim 1, characterized in that, The object-side radius of curvature of the first lens is R1, and the image-side radius of curvature is R2, wherein 481.636mm≤R1≤487.636mm, -115.974mm≤R2≤-109.974mm; The object-side radius of curvature of the second lens is R3, and the image-side radius of curvature is R4, wherein 58.953mm≤R3≤64.953mm, 304.8mm≤R4≤310.8mm; The object-side radius of curvature of the third lens is R5, and the image-side radius of curvature is R6, wherein -69.467mm≤R5≤-63.467mm, and 41.34mm≤R6≤47.34mm. The object-side radius of curvature of the fourth lens is R7, and the image-side radius of curvature is R8, wherein 26.041mm≤R7≤32.041mm, -464.775≤R8≤-458.775mm; The object-side radius of curvature of the fifth lens is R9, and the image-side radius of curvature is R10, wherein 47.753mm≤R9≤41.753mm, -199.22mm≤R10≤-193.22mm; The object-side radius of curvature of the sixth lens is R11, and the image-side radius of curvature is R12, wherein 44.964mm≤R11≤50.964mm, -55.551mm≤R12≤-49.551mm; The seventh lens has an object-side radius of curvature of R13 and an image-side radius of curvature of R14, wherein -42.855mm≤R13≤-36.855mm and 20.624mm≤R14≤26.624mm. The radius of curvature of the object side of the eighth lens is R15, and the radius of curvature of the image side is R16, wherein 20.915mm≤R15≤26.915mm, -48.706mm≤R16≤-42.706mm; The object-side radius of curvature of the ninth lens is R17, and the image-side radius of curvature is R18, wherein -40.954mm≤R17≤-34.954mm, and 61.131mm≤R18≤67.131mm. The object-side radius of curvature of the tenth lens is R19, and the image-side radius of curvature is R20, wherein -18.951mm≤R19≤-12.951mm, -404.829mm≤R20≤-398.829mm; The object-side radius of curvature of the eleventh lens is R21, and the image-side radius of curvature is R22, wherein -104.801mm≤R21≤-98.801mm, -39.203mm≤R22≤-33.203mm; The object-side radius of curvature of the twelfth lens is R23, and the image-side radius of curvature is R24, wherein 986.5mm≤R23≤992.5mm, -115.617mm≤R24≤-109.617mm; The object-side radius of curvature of the thirteenth lens is R25, and the image-side radius of curvature is R26, where R25 = -112.617 mm, and -146.242 mm ≤ R26 ≤ -140.242 mm.

5. The dual telecentric lithography lens as described in claim 1, characterized in that, The center distance between the object side and the center distance between the image side of the first lens is D1, and the center distance between the image side and the center distance is D2, wherein 8mm≤D1≤10mm and 21.4mm≤D2≤23.4mm; The center distance on the object side of the second lens is D3, and the center distance on the image side is D4, where 6.2≤D3≤8.2mm and 40mm≤D4≤42mm; The center distance of the object side of the third lens is D5, and the center distance of the image side is D6, wherein 7.4mm≤D5≤9.4mm, -0.9mm≤D6≤1.1mm; The center distance of the object side of the fourth lens is D7, and the center distance of the image side is D8, wherein 5.3mm≤D7≤7.3mm, and -0.9mm≤D8≤1.1mm; The center distance of the object side of the fifth lens is D9, and the center distance of the image side is D10, wherein 4.4mm≤D9≤6.4mm, -0.9mm≤D10≤1.1mm; The center distance of the object side of the sixth lens is D11, and the center distance of the image side is D12, wherein 4.7mm≤D11≤6.7mm, and -0.1mm≤D12≤1.9mm. The center distance of the object side of the seventh lens is D13, and the center distance of the image side is D14, wherein 1.2mm≤D13≤3.2mm, -0.4mm≤D14≤1.6mm; The center distance of the object side of the eighth lens is D15, and the center distance of the image side is D16, wherein 5.6mm≤D15≤7.6mm, and -0.2mm≤D16≤1.8mm. The center distance of the object side of the ninth lens is D17, and the center distance of the image side is D18, wherein 10.1mm≤D17≤12.1mm, and 9.5mm≤D18≤11.5mm. The center distance on the object side of the tenth lens is D19, and the center distance on the image side is D20, wherein 3.5mm≤D19≤5.5mm, and 9.6mm≤D20≤11.6mm. The center distance of the object side of the eleventh lens is D21, and the center distance of the image side is D22, wherein 11mm≤D21≤13mm, and -0.8mm≤D22≤1.2mm. The center distance of the object side of the twelfth lens is D23, and the center distance of the image side is D24, wherein 6.3mm≤D23≤8.3mm, and 136.3mm≤D24≤138.3mm; The center distance of the object side of the thirteenth lens is D25, and the center distance of the image side is D26, wherein 11mm≤D25≤13mm, and 2mm≤D26≤4mm.

6. The dual telecentric lithography lens as described in claim 1, characterized in that, The refractive index of the first lens is n1, where 1.55 ≤ n1 ≤ 1.65; The refractive index of the second lens is n2, where 1.55 ≤ n2 ≤ 1.65; The refractive index of the third lens is n3, where 1.55 ≤ n3 ≤ 1.65; The refractive index of the fourth lens is n4, where 1.45 ≤ n4 ≤ 1.55; The refractive index of the fifth lens is n5, where 1.45 ≤ n5 ≤ 1.55; The refractive index of the sixth lens is n6, where 1.45 ≤ n6 ≤ 1.55; The refractive index of the seventh lens is n7, where 1.53 ≤ n7 ≤ 1.63; The refractive index of the eighth lens is n8, where 1.4 ≤ n8 ≤ 1.5; The refractive index of the ninth lens is n9, where 1.55 ≤ n9 ≤ 1.65; The refractive index of the tenth lens is n10, where 1.45 ≤ n10 ≤ 1.55; The refractive index of the eleventh lens is n11, where 1.53 ≤ n11 ≤ 1.63; The refractive index of the twelfth lens is n12, where 1.55 ≤ n12 ≤ 1.65; The refractive index of the thirteenth lens is n13, where 1.45 ≤ n13 ≤ 1.

55.

7. The dual telecentric lithography lens as described in claim 1, characterized in that, The rear optical system also includes a protective lens; The center distance of the object side surface of the protective lens is D27, where 2mm≤D27≤4mm; The refractive index of the protective lens is n14, where 1.40 ≤ n14 ≤ 1.

50.

8. A photolithography apparatus, characterized in that, Including the dual telecentric lithography lens as described in any one of claims 1 to 7.

Images