Shielded processing apparatus and method for electron beam curing of workpieces

Abstract

This invention discloses a shielding processing device and method for electron beam curing of workpieces, comprising a shell, a driving device, a moving shielding assembly, a gas filling device, and an electron beam radiation device. The shell has a first cavity and is provided with an inlet and an outlet communicating with the first cavity. The shell is also movably provided with an inlet gate and an outlet gate. The driving device is located in the shell. The moving shielding assembly includes a turntable and at least two gas baffles. The upper end of the turntable is divided into at least two conveying stations by the gas baffles. Each conveying station can independently connect to the outlet or the inlet as the turntable rotates. The gas filling device is located in the shell and is used to fill the conveying stations with protective gas. The electron beam radiation device is located in the shell and is used to output an electron beam to the conveying station that has been filled with protective gas. The above structure is compact and occupies little space. The gas baffles can not only prevent the protective gas from escaping, saving protective gas, but also prevent radiation leakage.

Description

Technical Field

[0001] This invention relates to the technical field of curing processes, and in particular to a shielding processing device and method for electron beam curing of workpieces. Background Technology

[0002] Electron beam curing processes require shielding to reduce radiation leakage, and a continuous injection of protective gas is necessary during the process. In existing technologies, electron beam curing equipment is generally arranged in a linear fashion, and linear equipment typically has a height difference between the inlet and outlet with a ramp in the middle to reduce radiation leakage from both outlets. This results in a large equipment footprint, a large amount of protective gas consumption, and it is not suitable for workpieces with high heights. The ramp needs to be designed to be very long, resulting in poor versatility and high production costs. Summary of the Invention

[0003] This invention aims to solve at least one of the technical problems existing in the prior art. To this end, this invention proposes a shielding processing device and method for electron beam curing of workpieces, which can solve the problems of large equipment footprint and large gas consumption.

[0004] According to a first aspect of the present invention, a shielding processing apparatus for electron beam curing of a workpiece includes: a housing, a driving device, a moving shielding assembly, a gas filling device, and an electron beam radiation device. The housing has a first cavity, and the housing is provided with an inlet and an outlet communicating with the first cavity. The housing is also movably provided with an inlet gate and an outlet gate, the inlet gate being used to open and close the inlet, and the outlet gate being used to open and close the outlet. The driving device is disposed on the housing. The moving shielding assembly includes a turntable and at least two gas baffles. The turntable is rotatably mounted on the housing and located within the first cavity. The turntable is drively connected to the driving device. The gas baffles are disposed on the upper end of the turntable. The gas baffles are arranged radially around the rotation axis of the turntable. The upper end of the turntable is divided into at least two conveying stations by the gas baffles. Each conveying station can independently connect with the discharge port or the inlet as the turntable rotates. The outer periphery of the turntable cooperates with the inner wall of the first cavity. The upper and outer parts of the gas baffles cooperate with the inner wall of the first cavity. The inflation device is located in the outer shell and is used to inflate the conveying station with protective gas. The electron beam radiation device is located in the outer shell and is used to output an electron beam to the conveying station that has been filled with protective gas. The outer shell, the inlet gate, the outlet gate, and the motion shielding assembly are all provided with shielding layers.

[0005] According to an embodiment of the present invention, a shielding processing device for electron beam curing of workpieces has at least the following beneficial effects: The workpiece is transported via a turntable, which has a small footprint and requires little space. Furthermore, its height can be designed within a wide range, utilizing a large amount of vertical space, making it suitable for workpieces with considerable height. Two conveying stations are formed by setting at least two gas baffles. During operation, the inlet and outlet doors are opened, the workpiece is placed from the inlet into the corresponding conveying station, and the workpiece on the other conveying station is removed from the outlet. Then, the inlet and outlet doors are closed. Electron beam curing is achieved by operating the gas filling device and the electron radiation device. This allows at least two conveying stations to complete feeding, gas filling protection, electron beam curing, and discharging, thus completing the entire electron beam curing process. The gas baffles serve as partitions for the conveying stations and also as baffles to block gas escape, saving protective gas and preventing radiation leakage. The more conveying stations are set up, the more gas baffles are available, and the better the blocking effect on gas and radiation.

[0006] According to some embodiments of the present invention, the outer shell is uniformly provided with at least three processing stations along the circumference of the turntable axis. The processing stations are located in the first cavity. The three processing stations are sequentially a feeding station, an electron beam radiation initiation station, and a discharging station. The feeding station is connected to the inlet, and the discharging station is connected to the outlet. Three gas baffles are provided. The turntable is divided into three conveying stations by the gas baffles. The turntable rotatably rotates the conveying station to the processing station. The gas filling device is used to fill the electron beam radiation initiation station with protective gas. The electron beam radiation device is used to input an electron beam to the electron beam radiation initiation station and the discharging station.

[0007] According to some embodiments of the present invention, at least four gas baffles are provided to divide the turntable into four conveying stations. Each processing station is further provided with an electron beam radiation termination station, which is located between the electron beam radiation initiation station and the discharge station. The four processing stations are evenly arranged circumferentially along the axis of the turntable.

[0008] According to some embodiments of the present invention, the gas baffle is provided with a one-way valve, the flow direction of the one-way valve is along the direction from the discharge station to the feed station, and the one-way valve is set at an angle of 45° to 80° on the gas baffle.

[0009] According to some embodiments of the present invention, the turntable has a stationary state and a rotating state, the outer shell is further provided with gas baffles, and the gas baffles are located in the first cavity. The number of gas baffles is the same as the number of gas baffles. In the stationary state, the gas baffles and the gas baffles are arranged opposite to each other to separate the first cavity.

[0010] According to some embodiments of the present invention, the outer casing is provided with guide rails that slide in conjunction with the inlet door and the outlet door. When the inlet door and the outlet door are closed, the side of the inlet door extends beyond the side of the inlet port, and the side of the outlet door extends beyond the side of the outlet port.

[0011] According to some embodiments of the present invention, the inflation device includes a first diversion cavity disposed on the outer shell, and the outer shell is further provided with a first inflation port and a second inflation port. The first inflation port is connected to the electron beam radiation initiation station, and the second inflation port is connected to the feeding station. The first diversion cavity is used to connect to an air source, and the first diversion cavity can be selectively connected to the first inflation port or the second inflation port.

[0012] According to some embodiments of the present invention, the electron beam radiation device includes an electron accelerator and a second shunt cavity. The housing is further provided with a first outlet and a second outlet. The first outlet is located on a gas baffle between the electron beam radiation initiation station and the discharge station. The second outlet is located on a gas baffle between the feed station and the electron beam radiation initiation station. The second shunt cavity is connected to the electron accelerator and can be selectively connected to either the first outlet or the second outlet.

[0013] According to some embodiments of the present invention, the widths of both the first outlet and the second outlet are less than 1 cm.

[0014] According to a second aspect of the present invention, a shielding processing method for electron beam curing of a workpiece includes a processing method using the shielding processing apparatus described above for electron beam curing of a workpiece, comprising: Step 1: starting a gas filling device to fill the electron beam radiation starting station with protective gas; Step 2: opening the inlet gate and the outlet gate, placing the workpiece into the inlet station, and sending the workpiece out of the outlet station; Step 3: closing the inlet gate and the outlet gate, the driving device driving the turntable to rotate, and starting the electron beam radiation device to output an electron beam to the conveying station that has been filled with protective gas; Step 4: the number of gas baffles is N, the turntable rotates 360 / N degrees and then stops, and the electron beam radiation device stops radiating; Step 5: repeating Step 2 above.

[0015] According to an embodiment of the present invention, a shielding processing method for electron beam curing of workpieces has at least the following advantages: it can utilize the rotation characteristics of the turntable to cycle through steps two to four above to complete the processing, resulting in high space utilization, less gas waste, and reduced production costs.

[0016] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0017] The above or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0018] Figure 1 This is a general schematic diagram of some embodiments of the present invention;

[0019] Figure 2 for Figure 1 A sectional view;

[0020] Figure 3 for Figure 1 A cross-sectional view from another direction;

[0021] Figure 4 These are schematic diagrams illustrating some embodiments of the present invention.

[0022] Figure label:

[0023] 100 racks;

[0024] 200 outer casing, 211 feeding station, 212 second pre-charging station, 213 first pre-charging station, 214 electron beam radiation start station, 215 electron beam radiation end station, 216 discharge station, 220 inlet, 230 outlet, 240 inlet door, 250 outlet door, 260 gas baffle, 270 guide rail;

[0025] Drive unit 300;

[0026] Motion shielding assembly 400, turntable 410, gas baffle 420, one-way valve 421;

[0027] Inflation device 500, first diversion cavity 510, first inflation port 520, second inflation port 530;

[0028] Electron beam radiation device 600, first outlet 610, electron accelerator 620, second shunt cavity 630, second outlet 640. Detailed Implementation

[0029] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0030] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "axial," "radial," and "circumferential," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. Furthermore, features defined with "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0031] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0032] According to a first aspect of the present invention, a shielding processing apparatus for electron beam curing of a workpiece includes a housing 200, a driving device 300, a motion shielding assembly 400, an inflation device 500, and an electron beam radiation device 600. The housing 200 has a first cavity, and the housing 200 is provided with an inlet 220 and an outlet 230 communicating with the first cavity. The housing 200 is also movably provided with an inlet gate 240 and an outlet gate 250, the inlet gate 240 being used for opening and closing. The inlet 220 and outlet gate 250 are used to open and close the outlet 230. The drive unit 300 is located in the housing 200. The motion shielding assembly 400 includes a turntable 410 and at least two gas baffles 420. The turntable 410 is rotatably mounted in the housing 200 and is located in the first cavity. The turntable 410 is connected to the drive unit 300. The gas baffles 420 are located on the upper end of the turntable 410 and are centered on the rotation axis of the turntable 410. Arranged radially, the upper end of the turntable 410 is divided into at least two conveying stations by a gas baffle 420. Each conveying station can independently connect with the discharge port 230 or the inlet port 220 as the turntable 410 rotates. The outer periphery of the turntable 410 cooperates with the inner wall of the first cavity, and the upper and outer parts of the gas baffle 420 cooperate with the inner wall of the first cavity. An inflation device 500 is provided on the outer shell 200. The inflation device 500 is used to inflate the gas inlet port 230 and the inlet port 220. The conveying station is filled with protective gas. The electron beam radiation device 600 is installed in the housing 200. The electron beam radiation device 600 is used to output electron beams to the conveying station that has been filled with protective gas. It also outputs electron beams to the conveying station that is not connected to the discharge port 230 and the inlet port 220. The housing 200, the inlet door 240, the discharge door 250 and the motion shielding assembly 400 are all provided with shielding layers. The shielding layer can be a lead plate, which is embedded in it or lead is attached to its surface. Workpieces are transported via a turntable 410, which occupies a small area and space, and has a wide design range for its height, making it suitable for taller workpieces. Gas baffles 420 are used to form conveying stations. During operation, the inlet gate 240 and outlet gate 250 are opened, allowing workpieces to be placed from the inlet 220 into the corresponding conveying station, and workpieces from another conveying station to be removed from the outlet 230. The inlet gate 240 and outlet gate 250 are then closed. Electron beam curing is achieved by operating the gas filling device 500 and the electron radiation device. At least two conveying stations can complete the entire electron beam curing process, including feeding, gas filling protection, electron beam curing, and discharging. The gas baffles 420 serve as both partitions for the conveying stations and baffles to block the escape of protective gas, conserving protective gas, and also preventing radiation leakage. The more stations are set up, the more gas baffles 420 are needed, resulting in better blocking of gas and radiation.

[0033] Specifically, such as Figures 1 to 3As shown, six gas baffles 420 evenly divide the first cavity into six parts. During use, the turntable 410 rotates intermittently by 60 degrees, so that the gas baffles 420 and the conveying stations divided by the turntable 410 rotate intermittently. The first cavity can be sequentially divided into the feeding station 211, the second pre-charging station 212, the first pre-charging station 213, the electron beam radiation initiation station 214, the electron beam radiation termination station 215, and the discharge station 216. During operation, the inflation device 500 continuously supplies protective gas to the second pre-charging station 212, the first pre-charging station 213, and the electron beam radiation initiation station 214. The working process is as follows: the turntable 410 stops rotating, and at this time the inlet gate 240 and the outlet gate 250 are open. At this time, the electron beam radiation device 600 is in a no-beam state, and there is no electron beam in the first cavity. The electron beam is used to place the workpiece into the conveyor station on the turntable 410 through the open inlet 220. At this time, it corresponds to the feeding station 211. At the same time, the processed workpiece is taken out from the conveyor station (discharge station 216) corresponding to the outlet 230 and sent to the subsequent processing line. At this time, the feeding and discharging of the workpiece are completed. The inlet gate 240 and the outlet gate 250 will be closed, and the inflation is basically completed. The turntable 410 rotates, and the conveyor station rotates to the next station. During the rotation, the conveyor station (which has been filled with gas) that rotates from the electron beam start station to the electron beam end station is fed with electron beam by the electron beam radiation device 600, so that the workpiece there is electron beam solidified. When the turntable 410 stops rotating, the electron beam radiation device 600 stops, and the conveyor station rotates and repeats the above steps to complete the entire processing process.

[0034] It is understandable that at least two conveyor stations are sufficient to complete the above processing. Two gas baffles 420 can be set to separate the two conveyor stations. The workpiece feeding and discharging are consistent with the above scheme. During operation, the inlet gate 240 and the outlet gate 250 are opened first, and the workpiece is put into the conveyor station through the inlet port 220. The workpiece processed on the other conveyor station is removed through the outlet port 230. Then, the inlet gate 240 and the outlet gate 250 are closed, and the gas charging device 500 supplies protective gas to the conveyor station connected to the inlet port 220 to ensure that the protective gas concentration meets the requirements. The gas baffle 420 on the turntable 410 effectively prevents the gas from moving to the conveyor station corresponding to the outlet port 230 because the gas baffle 420 and the upper end of the turntable 410 are sealed. The gas baffle 420 cooperates with the outer shell 200 with a gap of no more than 1mm, which can effectively block gas and electron radiation. After the gas is filled, the turntable 410 rotates, and the drive device 300 can be a drive motor, which drives the turntable 410 through the transmission component to make it rotate. The specific drive method is existing technology and will not be described in detail here. At the same time as the turntable 410 rotates, the electron beam radiation device 600 is turned on to perform electron beam curing on the workpiece in the conveying station filled with protective gas. The oxygen concentration in the conveying station filled with protective gas drops to below 400ppm, and the surface can be cured by electron beam. The turntable 410 stops after rotating 180 degrees. At this time, the electron beam radiation device 600 stops, and the curing is completed. After the turntable 410 stops, the above feeding and discharging process is repeated. At least two conveying stations can complete feeding, gas protection, electron beam curing, and discharging, thus completing the entire electron beam curing process. The gas baffle 420 serves as both a partition for the conveying station and a baffle to block gas movement and escape, saving protective gas and preventing radiation leakage. The more stations there are, the more gas baffles 420 there are, and the better the blocking effect on gas and radiation.

[0035] In some embodiments of the present invention, such as Figures 1 to 3As shown, in addition to the six conveying stations, the outer shell 200 can also be uniformly provided with three processing stations along the circumference of the turntable 410 axis. The processing stations are located in the first cavity. The three processing stations are, in order, the feeding station 211, the electron beam radiation initiation station 214, and the discharge station 216. The feeding station 211 is connected to the inlet 220, and the discharge station 216 is connected to the outlet 230. There are three gas baffles 420. The turntable 410 is divided into three conveying stations by the gas baffles 420. The turntable 410 rotates the conveying station to the processing station. The gas filling device 500 is used to fill the electron beam radiation initiation station 214 with protective gas, and the electron beam radiation device 600 is used to input the electron beam into the electron beam radiation initiation station 214 and the discharge station 216. The above structure can improve production efficiency compared to two conveying stations. By setting up the electron beam radiation initiation station 214, protective gas can be introduced at the time of feeding, reducing the gas intake time and accelerating the processing efficiency.

[0036] Specifically, three gas baffles 420 evenly divide the first cavity into three parts. During use, the turntable 410 rotates intermittently so that after the gas baffles 420 and the turntable 410 have rotated to their respective conveying stations, the gas can be delivered to the three corresponding processing stations. The feeding station 211 is connected to the inlet 220 for feeding the workpiece, and the discharging station 216 is connected to the outlet 230 for discharging the workpiece. The middle station is the electron beam radiation initiation station 214. During use, the conveying stations rotate sequentially to the corresponding processing stations. For example, at the beginning, the turntable 410 stops, the conveying station corresponds to the processing station, the inlet gate 240 and the outlet gate 250 open, and the workpiece is fed and discharged. At this time, the inflation device 500 pressurizes the gas at the electron beam radiation initiation station. Protective gas is introduced into the conveying station 214. After the workpiece loading and unloading are completed, the inlet gate 240 and the outlet gate 250 are closed, and the gas filling is basically completed. The turntable 410 rotates, and the conveying station rotates to the next station. The conveying station moving from the electron beam radiation starting station 214 to the outlet station 216 is fed with an electron beam by the electron beam radiation device 600, so that the workpiece is electron beam solidified. The turntable 410 rotates 120 degrees and then stops, and the electron beam radiation device 600 stops. The conveying station rotates and repeats the above actions to achieve processing and production. The production efficiency is relatively high. Compared with two conveying stations, by setting the electron beam radiation starting station 214, protective gas can be continuously filled in when the workpiece is loaded and unloaded, reducing the gas filling time and speeding up the processing efficiency.

[0037] Reference Figures 1 to 3In some embodiments of the present invention, four gas baffles 420 may be provided to divide the turntable 410 into four conveying stations. Each processing station also includes an electron beam radiation termination station 215, located between the electron beam radiation initiation station 214 and the discharge station 216. The four processing stations are evenly arranged circumferentially along the axis of the turntable 410. Adding the electron beam radiation termination station 215 reduces the amount of radiation emitted from the workpiece, thus reducing radiation leakage.

[0038] Specifically, four gas baffles 420 evenly divide the first cavity into four parts, and an electron beam radiation termination station 215 is added. During use, the turntable 410 rotates intermittently so that after the gas baffles 420 and the turntable 410 have rotated to their respective conveying stations, the gas can be delivered to the four corresponding processing stations. The operation process is as follows: the feeding and discharging process is the same as described above. The inflation device 500 continuously feeds protective gas into the electron beam radiation initiation station 214. After feeding and discharging are completed, the inlet gate 240 and the outlet gate 250 are closed, and inflation is basically completed. The turntable 410 rotates, and the conveying... The conveying station rotates to the next station. The conveying station from the electron beam radiation start station 214 to the electron beam radiation end station 215 is fed with an electron beam by the electron beam radiation device 600, so that the workpiece is electron beam cured. When the turntable 410 stops rotating, the electron beam radiation device 600 stops. The conveying station rotates and repeats the above actions to realize the processing and production. Compared with three stations, by setting the electron beam radiation end station 215, the workpiece after electron beam curing can be buffered at the electron beam radiation end station 215 and not discharged directly, which can reduce radiation leakage.

[0039] It should be noted that the number of processing stations is not limited to the above embodiment; other embodiments can also be used. For example, five gas baffles 420 evenly divide the first cavity into five parts. During use, the turntable 410 rotates intermittently so that after the gas baffles 420 and the turntable 410 have rotated to their respective conveying stations, the gas can be delivered to the five corresponding processing stations. The feeding station 211 is connected to the inlet 220 for feeding the workpiece, and the discharging station 216 is connected to the outlet 230 for discharging the workpiece. In the middle are, in sequence, the first pre-charging station 213, the electron beam radiation start station 214, and the electron beam radiation end station 215. During use, the conveying stations rotate sequentially to the corresponding processing stations. For example, at the beginning, the turntable 410 stops, and the conveying station corresponds to the processing station. The inlet gate 240 and... When the discharge gate 250 is opened, the workpiece is fed and discharged. At this time, the gas filling device 500 sends protective gas to the conveying station in the electron beam radiation starting station 214 and the first pre-filling station 213. After the feeding and discharging are completed, the feed gate 240 and the discharge gate 250 are closed, and the gas filling is basically completed. The turntable 410 rotates, and the conveying station rotates to the next station. The conveying station from the electron beam starting station to the electron beam ending station is fed with an electron beam by the electron beam radiation device 600, so that the workpiece is electron beam solidified. When the turntable 410 stops rotating, the electron beam radiation device 600 stops. The conveying station rotates and repeats the above actions to achieve processing and production. The production efficiency is relatively high. Compared with four stations, by setting the first pre-filling station 213, the protective gas can be filled in in advance, reducing the gas intake time and speeding up the processing efficiency.

[0040] Reference Figure 3 In some embodiments of the present invention, a one-way valve 421 is provided on the gas baffle 420. The flow direction of the one-way valve 421 is along the direction from the discharge station 216 to the feed station 211. The angle at which the one-way valve 421 is set on the gas baffle 420 is 45°–80°. This facilitates inflation, reduces gas overflow, and reduces radiation emission.

[0041] Specifically, the one-way valve 421 allows the injected gas to flow in one direction. The specific valve body type is not limited. After setting the one-way valve 421, as long as protective gas is input into the electron beam radiation starting station 214, the gas can be injected into the station in the direction of the feed port 220 through the one-way valve 421. The gas concentration at the feed port 220 is reduced to a low level, so that less overflow is possible. The overflow can be prevented by adjusting the inflation speed of the inflation device 500. The one-way valve 421 can be set at 45° on the gas baffle 420, so that the electron beam is reflected in the valve body channel. After several reflections, the radiation dose is close to the background value, which can reduce the radiation emitted from the one-way valve 421. For example, when an electron beam is irradiated at the electron beam radiation initiation station 214, the shortest ray propagation path is from the one-way gas valve openings of the two gas baffles 420 to the inlet 220 and outlet 230. Since the one-way gas valves are installed at an angle, even the shortest propagation path requires 6 reflections. For an application scenario with an electron accelerator 620 configured with a voltage of 300kV, the radiation dose after 6 reflections is close to the background value.

[0042] It should be noted that the gas filling device 500 and the electron beam radiation device 600 are not limited to the above embodiments. Other embodiments can also be adopted. For example, the gas filling device 500 can fill the first pre-filling station 213 with protective gas, and the electron beam radiation device 600 can deliver an electron beam to the first pre-filling station 213 and the electron beam radiation starting station 214. Since it is necessary to deal with the scenario of configuring an electron accelerator 620 with a voltage of more than 300kV, by changing the position of the electron radiation device and the gas filling device 500, the X-rays will need to be reflected 8 times, which can ensure that the radiation dose near the entrance and exit is the background value. However, since the radiation curing position is shortened by one workpiece space from the entrance, the amount of nitrogen needs to be increased.

[0043] Reference Figures 1 to 3 In some embodiments of the present invention, the turntable 410 has a stationary state and a rotating state. The housing 200 is also provided with gas baffles 260, and the gas baffles 260 are located in the first cavity. The number of gas baffles 260 is the same as the number of gas baffles 420. In the stationary state, the gas baffles 260 and the gas baffles 420 are arranged opposite to each other to separate the first cavity. This reduces gaps, reduces gas overflow and radiation leakage, and the gas baffles 260 can be machined separately, which facilitates processing.

[0044] Specifically, the gas baffle 260 is located on the top wall inside the housing 200. The gas baffle 260 and the gas baffle 420 have the same shape and can cooperate with each other. The gas baffle 260 and the gas baffle 420 can be precision machined so that the gap between them does not exceed 1mm. This allows the gas baffle 420 to rotate without interfering with the gas baffle 260, while reducing the gap, reducing gas overflow and radiation leakage. Furthermore, the gas baffle 260 can be machined separately, which is convenient for processing.

[0045] It should be noted that the gas baffle 260 is not limited to the above embodiment, and it can also adopt other embodiments. For example, the gas baffle 260 can also be set as one piece, and cooperate with each gas baffle 420.

[0046] Reference Figures 1 to 2 In some embodiments of the present invention, the outer casing 200 is provided with guide rails 270 that slide in conjunction with the inlet gate 240 and the outlet gate 250. When the inlet gate 240 and the outlet gate 250 are closed, the side of the inlet gate 240 extends beyond the side of the inlet port 220, and the side of the outlet gate 250 extends beyond the side of the outlet port 230. This is to reduce gas and radiation leakage.

[0047] Specifically, the gap between the inlet gate 240 and the outlet gate 250 and the side wall of the outer casing 200 is less than mm to reduce gas and radiation leakage. When closed, both sides of the inlet gate 240 and the outlet gate 250 extend beyond the corresponding inlet port 220 and the corresponding outlet port 230, and the side of the inlet gate 240 extends beyond the side of the inlet port 220 by more than 50 mm. Similarly, the side of the outlet port 230 extends beyond the outlet side by more than 50 mm to reduce gas and radiation leakage.

[0048] It should be noted that the opening and closing methods of the inlet gate 240 and the outlet gate 250 are not limited to the above embodiments. Other embodiments can also be adopted. For example, the inlet gate 240 and the outlet gate 250 can also be hinged to the outer shell 200, and the corresponding inlet port 220 and outlet port 230 can be opened and closed by flipping.

[0049] It is understandable that proximity switches can be installed at the inlet 220 and outlet 230. When the inlet gate 240 and outlet gate 250 are opened and closed, the proximity switches can sense and detect their status to control subsequent steps. If the gate is not closed properly, it can be detected in time.

[0050] Reference Figure 4In some embodiments of the present invention, the inflation device 500 includes a first diversion cavity 510, which is disposed on the outer shell 200. The outer shell 200 is also provided with a first inflation port 520 and a second inflation port 530. The first inflation port 520 is connected to the electron beam radiation initiation station 214, and the second inflation port 530 is connected to the first feeding station 211. The first diversion cavity 510 is used to connect to a gas source, and the first diversion cavity 510 can be selectively connected to the first inflation port 520 or the second inflation port 530, and can selectively inflate two processing stations according to the radiation intensity, which has strong versatility.

[0051] Specifically, the first diversion cavity 510 can be a box with a cavity, located on the outer shell 200, with an inlet connected to an external air source, and connected to the first air inlet 520 and the second air inlet 530. A valve can be installed at the connection between the first air inlet 520 and the second air inlet 530. The valve is electrically connected to the control system of the device. The valve controls the connection between the first air inlet 520 and the second air inlet 530 and the first diversion cavity 510. It can selectively fill the electron beam radiation starting station 214 or the feeding station 211 with air, or fill air simultaneously. It can be adjusted according to the radiation intensity requirements and has strong versatility.

[0052] Reference Figure 4 In some embodiments of the present invention, the electron beam radiation device 600 includes an electron accelerator 620 and a second shunt cavity 630. The housing 200 is also provided with a first outlet 610 and a second outlet 640. The first outlet 610 is located on a gas baffle 260 between the electron beam radiation initiation station 214 and the discharge station 216. The second outlet 640 is located on a gas baffle 260 between the feed station 211 and the electron beam radiation initiation station 214. The second shunt cavity 630 is connected to the electron accelerator 620 and can be selectively connected to the first outlet 610 or the second outlet 640.

[0053] Specifically, the second shunt cavity 630 may be provided with an electron shunt channel to guide electrons. Electrons accelerated by the electron accelerator 620 can be distributed to the first outlet 610 and the second outlet 640 through the channel in the second shunt cavity 630. The channel in the second shunt cavity 630 can be opened and closed. By control, electron beams can be selectively output to the first outlet 610 or the second outlet 640. The electron beams can be selected according to the intensity of radiation and output to two processing stations, which is highly versatile.

[0054] In some embodiments of the present invention, the widths of the first outlet 610 and the second outlet 640 are both less than 1 cm. The narrow range of the electron beam emitted is small, and after multiple reflections, the radiation can be reduced more quickly, thus reducing the occurrence of leakage.

[0055] According to a second aspect of the present invention, a shielding processing method for electron beam curing of a workpiece includes a processing method using the aforementioned shielding processing apparatus for electron beam curing of a workpiece, comprising: Step 1: starting the gas filling device 500 to fill the electron beam radiation starting station 214 with protective gas; Step 2: opening the inlet gate 240 and the outlet gate 250, placing the workpiece into the inlet station 211, and sending the workpiece out of the outlet station 216; Step 3: closing the inlet gate 240 and the outlet gate 250, driving the turntable 410 to rotate using the drive device 300, and starting the electron beam radiation device 600 to output an electron beam to the conveying station that has been filled with protective gas; Step 4: the number of gas baffles 420 is N, the turntable 410 rotates 360 / N degrees and then stops, and the electron beam radiation device 600 stops radiating; Step 5: repeating Step 2 above. By using the above method, the rotational characteristics of the turntable 410 can be utilized to cycle through Steps 2 to 4 to complete the processing, resulting in high space utilization, less gas waste, and reduced production costs.

[0056] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0057] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A shielded processing apparatus for electron beam solidification of a workpiece, characterized by, The utility model relates to a kind of electron beam irradiation device, including: Shell (200) with first cavity, and the shell (200) is equipped with with first cavity communication inlet (220) and outlet (230), the shell (200) is also movably equipped with inlet door (240) and outlet door (250), the inlet door (240) is used to open and close the inlet (220), the outlet door (250) is used to open and close the outlet (230); Drive device (300) is arranged in the shell (200); Movement shielding assembly (400) includes carousel (410) and at least four gas baffles (420), the carousel (410) is rotatably installed in the shell (200), and the carousel (410) is located in the first cavity, the carousel (410) is drivingly connected with the drive device (300), the gas baffle (420) is arranged on the upper end of the carousel (410), and the gas baffle (420) is arranged in radial pattern with the rotation axis of carousel (410) as center, the upper end of the carousel (410) is separated into at least four conveying stations by the gas baffle (420), each conveying station can be independently connected with the outlet (230) or the inlet (220) following the rotation of the carousel (410), the outer periphery of the carousel (410) is matched with the inner side wall of the first cavity, the upper part and the outer side part of the gas baffle (420) are matched with the inner side wall of the first cavity, the shell (200) is uniformly provided with at least four processing stations along the circumferential direction of the axis of the carousel (410), the processing station is located in the first cavity, and the four processing stations are in turn feeding station (211), electron beam irradiation starting station (214), electron beam irradiation end station (215) and discharge station (216), the feeding station (211) is connected with the inlet (220), and the discharge station (216) is connected with the outlet (230); Aeration device (500) is arranged in the shell (200), and the aeration device (500) is used to fill protective gas into the conveying station at the electron beam irradiation starting station (214); Electron beam irradiation device (600) is arranged in the shell (200), and the electron beam irradiation device (600) is used to output electron beam to the conveying station filled with protective gas at the electron beam irradiation starting station (214) and the discharge station (216); The shell (200), the inlet door (240), the outlet door (250) and the movement shielding assembly (400) are all provided with shielding layer; The gas baffle (420) is provided with one-way valve (421), the flow direction of the one-way valve (421) is in the direction from the discharge station (216) to the feeding station (211), and the one-way valve (421) is arranged at an angle of 45°-80° on the gas baffle (420).

2. A shielded workpiece processing apparatus for electron beam solidification of a workpiece as defined in claim 1, wherein, The rotating disc (410) has a static state and a rotating state, the shell (200) is further provided with gas blocks (260), and the gas blocks (260) are located in the first cavities, the number of the gas blocks (260) is same as that of the gas baffles (420), and in the static state, the gas blocks (260) are oppositely arranged with the gas baffles (420) to separate the first cavities.

3. A shielded workpiece processing apparatus for electron beam solidification of a workpiece as defined in claim 1, wherein, The shell (200) is provided with guide rails (270) which slide in cooperation with the inlet door (240) and the outlet door (250), and in the closed state, the side edge of the inlet door (240) exceeds the side edge of the inlet port (220), and the side edge of the outlet door (250) exceeds the side edge of the outlet port (230).

4. A shielded workpiece processing apparatus for electron beam solidification of a workpiece as defined in claim 2, wherein, The inflating device (500) comprises first shunt cavities (510) which are arranged on the shell (200), and the shell (200) is further provided with a first inflating port (520) and a second inflating port (530), the first inflating port (520) is communicated with the electron beam radiation starting station (214), the second inflating port (530) is communicated with the feeding station (211), the first shunt cavities (510) are connected with a gas source, and the first shunt cavities (510) are selectively communicated with the first inflating port (520) or the second inflating port (530).

5. A shielded workpiece processing apparatus for electron beam solidification of a workpiece as defined in claim 4, wherein, The electron beam radiation device (600) comprises an electron accelerator (620) and second shunt cavities (630), and the shell (200) is further provided with a first outlet (610) and a second outlet (640), the first outlet (610) is located on the gas block (260) between the electron beam radiation starting station (214) and the outlet station (216), the second outlet (640) is located on the gas block (260) between the feeding station (211) and the electron beam radiation starting station (214), the second shunt cavities (630) are communicated with the electron accelerator (620), and the second shunt cavities (630) are selectively communicated with the first outlet (610) or the second outlet (640).

6. A shielded workpiece processing apparatus for electron beam solidification of a workpiece as defined in claim 5, wherein, The width of the first outlet (610) and the second outlet (640) is less than 1cm.

7. A method of processing using a shielded processing apparatus for electron beam solidification of a workpiece according to any one of claims 2 to 6, characterized in that, The method comprises the following steps: Step one: starting the inflating device (500) to fill the electron beam radiation starting station (214) with protective gas; Step two: opening the inlet door (240) and the outlet door (250), putting the workpiece into the feeding station (211), and sending out the workpiece in the outlet station (216); Step three: closing the inlet door (240) and the outlet door (250), driving the rotating disc (410) to rotate by the driving device (300), and starting the electron beam radiation device (600) to output electron beam to the conveying station which has been filled with protective gas. Step four: the number of the gas baffle (420) is N, the rotating disc (410) rotates 360 / N degrees and stops, and the electron beam radiation device (600) stops radiating; Step five: repeat the above step two.

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