A multi-gas high-precision mixing system for semiconductor manufacturing

By designing a high-precision multi-gas mixing system for semiconductor manufacturing, the problem of difficult-to-control gas mixing ratio was solved, and the accuracy and efficiency of gas mixing were improved, meeting the specific reaction and deposition requirements of semiconductor manufacturing.

CN117123075BActive Publication Date: 2026-05-19JIANGSU ULTRAMICRO SEMICON TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
JIANGSU ULTRAMICRO SEMICON TECH CO LTD
Filing Date
2023-09-22
Publication Date
2026-05-19

AI Technical Summary

Technical Problem

Existing gas mixing methods for semiconductor manufacturing make it difficult to achieve precise control of the gas mixing ratio, resulting in unsatisfactory reaction rates, deposition rates, and surface properties, as well as low gas mixing efficiency.

Method used

A high-precision multi-gas mixing system for semiconductor manufacturing was designed, including a support platform, a gas storage tank, a gas diversion and isolation container, a gas volume measurement component, and a gas mixing mechanism. The gas volume measurement component accurately measures the gases, and the gas mixing mechanism achieves efficient mixing.

Benefits of technology

It achieves precise control of gas mixing ratio, improves the accuracy and efficiency of gas mixing, and meets the specific reaction and deposition requirements in semiconductor manufacturing.

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Abstract

The application discloses a kind of multi-gas high-precision mixing system for semiconductor manufacturing, including support table, gas storage tank, gas shunt isolation container, gas volume measurement component, gas mixing container and gas mixing mechanism, gas storage tank is separately provided with several groups and evenly arranged on support table, the upper end of gas storage tank is equipped with gas pipe, gas pipe is equipped with exhaust valve and outer end is connected with gas shunt isolation container, gas shunt isolation container is located in the front side of gas storage tank and is fixed on support table, gas shunt isolation container includes shell, baffle and measuring inner tank, baffle is separately provided with two groups and is distributed in cross shape, two groups of baffle divide outer shell into four groups of sub-cavities, measuring inner tank is separately provided with four groups and is respectively installed in four groups of sub-cavities.The gas mixing system designed in the application can realize the accurate measurement of several gases, guiding and mixing processing, greatly improving the accuracy and efficiency of semiconductor gas mixing.
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Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing technology, specifically to a high-precision multi-gas mixing system for semiconductor manufacturing. Background Technology

[0002] Semiconductors are materials whose conductivity at room temperature is between that of conductors and insulators. Semiconductors are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high-power power conversion, and other fields. For example, diodes are devices made of semiconductors. From both a technological and economic development perspective, the importance of semiconductors is enormous. Most electronic products, such as computers, mobile phones, or digital recorders, have core components that are closely related to semiconductors. Common semiconductor materials include silicon, germanium, and gallium arsenide. Silicon is the most influential of all semiconductor materials in application. Various gases are used in the semiconductor manufacturing process. These gases play different roles in different process steps, and sometimes it is necessary to mix several gases.

[0003] However, existing gas mixing methods for semiconductor manufacturing have the following problems: some processes may have strict requirements on gas mixing ratios, sometimes requiring very precise mixing ratios to achieve specific reaction rates, deposition rates, or surface properties. Existing gas mixing methods sometimes fail to meet these requirements. Furthermore, various gases are typically introduced into the mixing container through different pipelines, and the required level of mixing cannot be achieved in a short time, necessitating further mixing and affecting mixing efficiency. Therefore, it is necessary to design corresponding technical solutions to address these problems. Summary of the Invention

[0004] The purpose of this invention is to provide a high-precision multi-gas mixing system for semiconductor manufacturing, which solves the technical problem that some processes may have strict requirements for gas mixing ratios, sometimes requiring very precise mixing ratios to achieve specific reaction rates, deposition rates or surface properties. Existing gas mixing methods sometimes fail to meet these requirements, and various gases are usually introduced into the mixing container through different pipelines. The degree of mixing between the gases cannot be achieved in a short time, and a certain amount of time is required for further mixing, which affects the gas mixing efficiency.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a high-precision multi-gas mixing system for semiconductor manufacturing, comprising a support platform, gas storage tanks, a gas diversion and isolation container, a gas volume measuring component, a mixing container, and a mixing mechanism. The gas storage tanks are arranged in several groups and evenly distributed on the support platform. A gas delivery pipe is installed at the upper end of each gas storage tank. An exhaust valve is installed on the gas delivery pipe, and its outer end is connected to the gas diversion and isolation container. The gas diversion and isolation container is located in front of the gas storage tanks and fixed to the support platform. The gas diversion and isolation container includes an outer shell, a partition, and a measuring... The inner tank has two sets of partitions arranged in a cross shape, which divide the inner body of the outer shell into four sub-cavities. The measuring inner tank is divided into four sets and installed in the four sub-cavities respectively. The gas volume measuring component is divided into four sets and installed in the four measuring inner tanks respectively. The bottom of the measuring inner tank is connected to the gas mixing container. An exhaust pipe and a control cabinet are installed on the front side of the gas mixing container. The gas mixing container has a gas mixing inner cylinder inside. The gas mixing mechanism is divided into four sets and evenly installed around the gas mixing inner cylinder. The inner end of the gas mixing mechanism extends into the gas mixing inner cylinder.

[0006] The gas volume measurement assembly includes a column, a top plate, a floating plate, a limiting plate, a driver, and a measuring mechanism. The column is vertically inserted into the inner measuring tank and has a guide groove longitudinally formed on its surface. The guide groove has several locking teeth machined inside. The top plate is fixed to the top of the column and has a cable connected to it. The floating plate and the limiting plate are movably fitted onto the column. The limiting plate is located above the floating plate. The driver is installed inside the limiting plate and built into the guide groove. The cable is connected to the measuring mechanism.

[0007] The measuring mechanism includes a current detector, a connecting rod, a conductive head, and a resistance wire. The lower end of the cable is connected to the conductive head, the conductive head is fixed on the connecting rod, the connecting rod is fixed on the limiting plate, the conductive head is in contact with the resistance wire, the resistance wire is vertically arranged on one side of the guide groove and its upper end is connected to the current detector, and the current detector is mounted on the top plate.

[0008] In a preferred embodiment of the present invention, the gas mixing inner cylinder has a cylindrical structure and a plurality of slots are evenly provided on the outer wall, and a flexible connecting strip is provided inside the slot.

[0009] In a preferred embodiment of the present invention, the gas mixing mechanism includes a drive motor, a rotating disk, a toggle block, a reset spring, and a fan blade. The drive motor is installed inside the gas mixing container and its power output end is connected to the rotating disk. The toggle block is divided into three groups and evenly installed around the rotating disk. The fan blade is rotatably disposed in the inlet and sealed with a flexible connecting strip. One end of the reset spring is connected to the fan blade and the other end is connected to the gas mixing inner cylinder.

[0010] In a preferred embodiment of the present invention, the actuating block has an arc-shaped structure and one end is thinner than the other end, and the actuating block is used in conjunction with the outer end of the fan blade.

[0011] In a preferred embodiment of the present invention, the four sets of fan blades are arranged in an upper and lower stacked manner, and the edges of the fan blades have an arc-shaped structure.

[0012] In a preferred embodiment of the present invention, the driver includes a motor fixed to the inside of the limiting plate and a drive gear mounted on the power output end of the motor, the drive gear being engaged with a locking gear.

[0013] In a preferred embodiment of the present invention, the floating disk has a circular structure and is made of lightweight material, and the diameter of the floating disk is the same as the inner diameter of the measuring inner tank.

[0014] In a preferred embodiment of the present invention, two sets of pressure sensors are symmetrically arranged on the limiting plate, with the detection end of the pressure sensor facing downwards, and the diameter of the limiting plate is the same as the inner diameter of the measuring inner tank.

[0015] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0016] 1. This invention designs a mixing system for efficient mixing of multiple gases used in semiconductor manufacturing. The gas mixing system includes a support platform, a gas storage tank, a gas diversion and isolation container, a gas volume measuring component, a mixing container, and a mixing mechanism. When several gases need to be mixed, the operator can open the valve on the gas storage tank and deliver the gas to the gas diversion and isolation container. The gas volume is accurately measured by the gas volume measuring component in each measuring tank inside the gas diversion and isolation container. After measurement, each gas is introduced into the mixing container below, and the mixing mechanism performs efficient mixing of the gases.

[0017] 2. The gas mixing system designed in this invention can achieve separate and precise measurement and guidance of several gases, as well as mixing and processing, which greatly improves the accuracy and efficiency of semiconductor gas mixing. Attached Figure Description

[0018] Figure 1 This is an overall structural diagram of the present invention;

[0019] Figure 2 This is a cross-sectional view of the gas diversion and isolation container described in this invention;

[0020] Figure 3 This is a structural diagram of the gas volume measurement component described in this invention;

[0021] Figure 4 This is a partial structural diagram of the present invention (A section).

[0022] Figure 5 This is a structural diagram of the gas mixing mechanism described in this invention.

[0023] In the diagram: 1. Support platform; 2. Gas storage tank; 3. Gas mixing container; 4. Gas delivery pipe; 5. Exhaust valve; 6. Outer shell; 7. Partition plate; 8. Measuring inner tank; 9. Sub-cavity; 10. Exhaust pipe; 11. Control cabinet; 12. Gas mixing inner cylinder; 13. Column; 14. Top plate; 15. Floating plate; 16. Limiting plate; 17. Driver; 18. Guide groove; 19. Clamping teeth; 20. Cable; 21. Current detector; 22. Connecting rod; 23. Conductive head; 24. Resistance wire; 25. Socket; 26. Flexible connecting strip; 27. Drive motor; 28. Rotating disk; 29. ​​Actuating block; 30. Reset spring; 31. Fan blade; 32. Motor; 33. Drive gear; 34. Pressure sensor. Detailed Implementation

[0024] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0025] Please see Figure 1-5 This invention provides a technical solution: a high-precision multi-gas mixing system for semiconductor manufacturing, comprising a support platform 1, gas storage tanks 2, a gas diversion and isolation container, a gas volume measurement component, a mixing container 3, and a mixing mechanism. The gas storage tanks 2 are arranged in several groups and evenly distributed on the support platform 1. A gas delivery pipe 4 is installed at the upper end of each gas storage tank 2. An exhaust valve 5 is installed on the gas delivery pipe 4, and its outer end is connected to the gas diversion and isolation container. The gas diversion and isolation container is located in front of the gas storage tanks 2 and fixed to the support platform 1. The gas diversion and isolation container includes an outer shell 6, a partition 7, and a measuring inner tank 8. The partition 7 is divided into two groups and arranged in a cross shape. The two groups of partition 7 divide the interior of the outer shell 6 into four groups of sub-cavities 9. The measuring inner tank 8 is divided into four groups and installed in the four groups of sub-cavities 9 respectively. The gas volume measuring component is divided into four groups and installed in the four groups of measuring inner tanks 8 respectively. The bottom of the measuring inner tank 8 is connected to the gas mixing container 3. The front side of the gas mixing container 3 is equipped with an exhaust pipe 10 and a control cabinet 11. The gas mixing container 3 is equipped with a gas mixing inner cylinder 12. The gas mixing mechanism is divided into four groups and evenly installed on the periphery of the gas mixing inner cylinder 12. The inner end of the gas mixing mechanism extends into the gas mixing inner cylinder 12.

[0026] Note: The volume of gas contained inside the inner tank 8 is measured by subtracting the volume of the internal structural components from the internal volume of the inner tank 8. The change in current of the gas volume measuring component and the current detector 21 corresponds to the change in volume below the floating disk 15. The specific corresponding values ​​are obtained and summarized from multiple experiments.

[0027] The gas volume measurement assembly includes a column 13, a top plate 14, a floating plate 15, a limiting plate 16, a driver 17, and a measuring mechanism. The column 13 is vertically inserted into the inner measuring tank 8 and has a guide groove 18 longitudinally formed on its surface. Several locking teeth 19 are machined inside the guide groove 18. The top plate 14 is fixed to the top of the column 13 and is connected to a cable 20. The floating plate 15 and the limiting plate 16 are both movably fitted onto the column 13, with the limiting plate 16 located above the floating plate 15. The driver 17 is installed inside the limiting plate 16 and is built into the guide groove 18. The cable 20 is connected to the measuring mechanism. When it is necessary to quantitatively introduce gas into the inner measuring tank 8, the cable 20 is used... The conductive head 23 is energized, and the current is transmitted through the resistance wire 24 to the current detector 21, which displays the current. The motor 32 drives the drive gear 33 to rotate. During the rotation, the drive gear 33 moves along the retaining teeth 19, which can achieve the purpose of adjusting the height of the limiting plate 16. During the height adjustment of the limiting plate 16, the contact area between the conductive head 23 and the resistance wire 24 changes, thereby causing the current to change. The current corresponds to the volume of space below the limiting plate 16, thereby measuring the volume of introduced gas. When the volume of introduced gas reaches the set value, the motor 32 stops operating, thereby achieving the purpose of quantitatively introducing gas.

[0028] The measuring mechanism includes a current detector 21, a connecting rod 22, a conductive head 23, and a resistance wire 24. The lower end of the cable 20 is connected to the conductive head 23. The conductive head 23 is fixed on the connecting rod 22, which is fixed on the limiting plate 16. The conductive head 23 is in contact with the resistance wire 24. The resistance wire 24 is vertically arranged on one side of the guide groove 18 and its upper end is connected to the current detector 21. The current detector 21 is mounted on the top plate 14.

[0029] Further improvements, such as Figure 5 As shown: The gas mixing inner cylinder 12 has a cylindrical structure and several sets of inlets 25 are evenly opened on the outer wall. A flexible connecting strip 26 is provided inside the inlet 25 to seal the inside of the inlet 25.

[0030] Further improvements, such as Figure 5As shown: The gas mixing mechanism includes a drive motor 27, a rotating disk 28, a toggle block 29, a reset spring 30, and a fan blade 31. The drive motor 27 is installed inside the gas mixing container 3 and its power output end is connected to the rotating disk 28. The toggle block 29 is divided into three groups and evenly installed around the rotating disk 28. The fan blade 31 is rotatably installed in the inlet 25 and sealed with the flexible connecting strip 26. One end of the reset spring 30 is connected to the fan blade 31 and the other end is connected to the gas mixing inner cylinder 12. The drive motor 27 drives the rotating disk 28 to rotate. During the rotation of the rotating disk 28, the toggle block 29 rotates synchronously and acts on the outer end of the fan blade 31, so that the fan blade 31 can swing. Each time the fan blade 31 swings, it can float through the reset spring 30, so that the blade 31 swings repeatedly and drives the internal gas disturbance, achieving faster gas mixing.

[0031] Further improvements, such as Figure 5 As shown: The actuating block 29 has an arc-shaped structure and one end is thinner than the other end. The actuating block 29 is matched with the outer end of the fan blade 31. When the actuating block 29 is applied to the outer end of the fan blade 31, the fan blade 31 can be driven to swing.

[0032] Further improvements, such as Figure 5 As shown: the four sets of fan blades 31 are arranged in an upper and lower layer, and the edges of the fan blades 31 have an arc-shaped structure to avoid collisions during the movement of the fan blades 31.

[0033] Further improvements, such as Figure 4 As shown: The driver 17 includes a motor 32 fixed inside the limiting plate 16 and a drive gear 33 installed at the power output end of the motor 32. The drive gear 33 meshes with the retaining teeth 19. The motor 32 drives the drive gear 33 to rotate. During the rotation, the drive gear 33 moves along the retaining teeth 19, which can achieve the purpose of adjusting the height of the limiting plate 16.

[0034] Further improvements, such as Figure 3 As shown: The floating disk 15 has a circular structure and is made of lightweight material. The diameter of the floating disk 15 is the same as the inner diameter of the measuring inner tank 8. As gas is introduced, the floating disk 15 floats upward along the column 13.

[0035] Specifically, two sets of pressure sensors 34 are symmetrically arranged on the limiting plate 16. The detection end of the pressure sensor 34 faces downward. The diameter of the limiting plate 16 is the same as the inner diameter of the measuring inner tank 8. The pressure sensor 35 can determine whether the floating plate 15 below is in contact with the limiting plate 16.

[0036] In use: When it is necessary to quantitatively introduce gas into the measuring inner tank 8, the present invention uses cable 20 to energize the conductive head 23. The conductive head 23 passes through the resistance wire 24 and the current detector 21 to display the current. The motor 32 drives the drive gear 33 to rotate. During the rotation, the drive gear 33 moves along the retaining teeth 19, which can achieve the purpose of adjusting the height of the limiting plate 16. During the height adjustment of the limiting plate 16, the contact area between the conductive head 23 and the resistance wire 24 changes, thereby changing the current. The current corresponds to the space volume below the limiting plate 16. At this time, the gas storage tank 2 is opened to introduce gas. The gas enters the corresponding measuring inner tank 8 through the gas delivery pipe 4. During the process, the floating disk 15 moves upward. When the volume of introduced gas reaches the set value, the floating disk 15 contacts the pressure sensor 34 and transmits the signal to the control cabinet 11. The control cabinet 11 controls the motor 32 to stop operating, thereby achieving the purpose of quantitative gas introduction. After quantitative introduction, the gas is introduced into the mixing inner cylinder 12 below. The drive motor 27 drives the rotating disk 28 to rotate. During the rotation of the rotating disk 28, the actuating block 29 rotates synchronously and acts on the outer end of the fan blade 31, so that the fan blade 31 can swing. Each time the fan blade 31 swings, it can float through the reset spring 30, so that the blade 31 swings repeatedly to drive the internal gas disturbance, achieving the purpose of faster gas mixing.

[0037] In the description of this invention, it should be understood that the terms "coaxial," "bottom," "one end," "top," "middle," "other end," "upper," "side," "top," "inner," "front," "center," "both ends," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0038] Furthermore, the terms "first," "second," "third," and "fourth" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first," "second," "third," or "fourth" may explicitly or implicitly include at least one of those features.

[0039] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "setting," "connection," "fixing," "screw connection," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal connection of two components or the interaction between two components. Unless otherwise explicitly limited, those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0040] Finally, it should be noted that the above descriptions are merely preferred embodiments of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A high-precision multi-gas mixing system for semiconductor manufacturing, characterized in that: The system includes a support platform (1), a gas storage tank (2), a gas diversion isolation container, a gas volume measuring component, a gas mixing container (3), and a gas mixing mechanism. The gas storage tank (2) is divided into several groups and evenly arranged on the support platform (1). A gas supply pipe (4) is installed at the upper end of the gas storage tank (2). An exhaust valve (5) is installed on the gas supply pipe (4) and its outer end is connected to the gas diversion isolation container. The gas diversion isolation container is located in front of the gas storage tank (2) and fixed on the support platform (1). The gas diversion isolation container includes an outer shell (6), partitions (7), and a measuring inner tank (8). The partitions (7) are divided into two groups and arranged in a cross shape. The partition (7) divides the interior of the outer shell (6) into four sub-cavities (9). The measuring inner tank (8) is divided into four groups and installed in the four sub-cavities (9). The gas volume measuring component is divided into four groups and installed in the four measuring inner tanks (8). The bottom of the measuring inner tank (8) is connected to the gas mixing container (3). The front side of the gas mixing container (3) is equipped with an exhaust pipe (10) and a control cabinet (11). The gas mixing container (3) is provided with a gas mixing inner cylinder (12). The gas mixing mechanism is divided into four groups and evenly installed around the gas mixing inner cylinder (12). The inner end of the gas mixing mechanism extends into the gas mixing inner cylinder (12). The gas volume measurement assembly includes a column (13), a top plate (14), a floating plate (15), a limiting plate (16), a driver (17), and a measuring mechanism. The column (13) is vertically inserted into the inner measuring tank (8) and has a guide groove (18) longitudinally opened on its surface. The guide groove (18) has several teeth (19) machined inside. The top plate (14) is fixed to the top of the column (13) and has a cable (20) connected to it. The floating plate (15) and the limiting plate (16) are movably fitted on the column (13). The limiting plate (16) is located above the floating plate (15). The driver (17) is installed inside the limiting plate (16) and built into the guide groove (18). The cable (20) is connected to the measuring mechanism. The measuring mechanism includes a current detector (21), a connecting rod (22), a conductive head (23), and a resistance wire (24). The lower end of the cable (20) is connected to the conductive head (23). The conductive head (23) is fixed on the connecting rod (22). The connecting rod (22) is fixed on the limiting plate (16). The conductive head (23) is in contact with the resistance wire (24). The resistance wire (24) is vertically arranged on one side of the guide groove (18) and its upper end is connected to the current detector (21). The current detector (21) is installed on the top plate (14). The gas mixing mechanism includes a drive motor (27), a rotating disk (28), a toggle block (29), a reset spring (30), and a fan blade (31). The drive motor (27) is installed inside the gas mixing container (3) and The power output end is connected to the rotating disk (28). The actuating block (29) is divided into three groups and evenly installed on the periphery of the rotating disk (28). The fan blade (31) is rotatably set in the socket (25) and sealed with the flexible connecting strip (26). One end of the reset spring (30) is connected to the fan blade (31) and the other end is connected to the mixing inner cylinder (12). The actuating block (29) has an arc-shaped structure and one end is thinner than the other end. The actuating block (29) is used in conjunction with the outer end of the fan blade (31). The four groups of fan blades (31) are arranged in an upper and lower stacked manner. The edge of the fan blade (31) has an arc-shaped structure. The mixing inner cylinder (12) has a cylindrical structure and several sets of sockets (25) are evenly opened on the outer wall. The flexible connecting strip (26) is provided in the socket (25).

2. The high-precision multi-gas mixing system for semiconductor manufacturing according to claim 1, characterized in that: The driver (17) includes a motor (32) fixed inside the limiting disk (16) and a drive gear (33) installed at the power output end of the motor (32), the drive gear (33) meshing with the locking teeth (19).

3. The high-precision multi-gas mixing system for semiconductor manufacturing according to claim 1, characterized in that: The floating disk (15) has a circular structure and is made of lightweight material. The diameter of the floating disk (15) is the same as the inner diameter of the measuring inner tank (8).

4. The high-precision multi-gas mixing system for semiconductor manufacturing according to claim 3, characterized in that: Two sets of pressure sensors (34) are symmetrically arranged on the limiting plate (16). The detection end of the pressure sensor (34) faces downward. The diameter of the limiting plate (16) is the same as the inner diameter of the measuring inner tank (8).