Target material, preparation method thereof, hydrophilic film and product

Abstract

A target material and its preparation method, hydrophilic film and product, wherein the target material comprises the following components: by mass percentage, 38%-48% titanium, 5%-10% copper, 6%-14% manganese, 4%-9% tungsten trioxide, 15%-21% titanium dioxide, 2%-8% silicon dioxide and 7%-13% tin dioxide. The hydrophilic film prepared using the target material described in this application has a more lasting hydrophilic effect. After 300 cycles of mud testing, the film still remains hydrophilic, and the film has excellent acid resistance, and the CASS 12H test can reach level 10. The film prepared using the target material described in this application has a good antibacterial effect, and the antibacterial rate against Escherichia coli and Staphylococcus aureus can reach 99.9%. The equipment and process used in the preparation method of the target material of this application are simple and common, easy to operate, and suitable for large-scale production.

Description

Technical Field

[0001] The present invention relates to powder metallurgy technology, and in particular to a target material and a preparation method thereof, a hydrophilic film prepared thereby, and a product comprising the hydrophilic film. Background Art

[0002] In the prior art, a method for preparing a hydrophilic film is to spray a spray solution formed by inorganic nanoparticles and a surfactant in water onto a substrate using an ultrasonic-assisted spray method and then dry the solution, wherein the inorganic nanoparticles are one of silicon dioxide, titanium dioxide, zinc dioxide, and zirconium dioxide nanoparticles; and the surfactant is a water-soluble anionic or nonionic surfactant.

[0003] However, the above prior art has the following problems:

[0004] 1. The formed hydrophilic film has poor wear resistance and the hydrophilic validity period is usually a few months;

[0005] 2. The use of spraying method to produce the film will cause harm to the body of the spraying workers and the environment;

[0006] 3. The corrosion resistance of the hydrophilic film obtained by this method still needs to be demonstrated, and its scope of use may be limited.

[0007] Therefore, there is an urgent need in the art for a method for preparing a hydrophilic film so as to prepare a large-area hydrophilic film. Summary of the Invention

[0008] The present application provides a target material and a preparation method thereof, a hydrophilic film and a product. By controlling the composition and proportion of the target material, as well as the preparation process parameters, the surface chemical composition and surface geometric structure of the film are regulated, and a large-area hydrophilic film is prepared, thereby improving the utilization rate of raw materials. It has the advantages of a simple preparation process, easy operation, and high film transparency, and therefore has good application prospects.

[0009] In a first aspect, the present application provides a target material, comprising: two or more metals and two or more oxides, wherein the mass percentages of the metals and oxides are (49%-72%): (28%-51%).

[0010] In an exemplary embodiment, the metal is two or more selected from Group IB-VIIB and Group VIII metals; optionally, the metal is two or more selected from Al, Co, Cr, Cu, Fe, Mn, Mo, Ni, Ti, W, Ag, Au, Sn, Zn and Zr; preferably, Ti, Cu and Mn.

[0011] In an exemplary embodiment, the oxide is an oxide of two or more selected from Al, Co, Cu, Fe, Ga, Ge, Hf, Li, Mg, Mn, Mo, Nb, Ni, Sb, Si, Sn, Ta, Te, Ti, V, W, Y, Zn and Zr; preferably, the oxide is tungsten trioxide, titanium dioxide, silicon dioxide and tin dioxide.

[0012] In an exemplary embodiment, the target material comprises the following components: by mass percentage, 38%-48% titanium, 5%-10% copper, 6%-14% manganese, 4%-9% tungsten trioxide, 15%-21% titanium dioxide, 2%-8% silicon dioxide and 7%-13% tin dioxide.

[0013] In an exemplary embodiment, the target material comprises the following components, by mass percentage: 38%-43% titanium, 6%-9% copper, 7%-10% manganese, 5%-9% tungsten trioxide, 17%-21% titanium dioxide, 3%-6% silicon dioxide and 8%-13% tin dioxide.

[0014] In an exemplary embodiment, the target material comprises the following components: by mass percentage, 41% titanium, 8% copper, 9% manganese, 8% tungsten trioxide, 21% titanium dioxide, 5% silicon dioxide, and 8% tin dioxide.

[0015] In an exemplary embodiment, the target material comprises the following components: by mass percentage, 42% titanium, 6% copper, 7% manganese, 7% tungsten trioxide, 19% titanium dioxide, 6% silicon dioxide, and 13% tin dioxide.

[0016] In an exemplary embodiment, the target material comprises the following components: by mass percentage, 40% titanium, 9% copper, 10% manganese, 5% tungsten trioxide, 21% titanium dioxide, 4% silicon dioxide, and 11% tin dioxide.

[0017] In an exemplary embodiment, the target material comprises the following components: by mass percentage, 43% titanium, 7% copper, 8% manganese, 9% tungsten trioxide, 18% titanium dioxide, 3% silicon dioxide, and 12% tin dioxide.

[0018] In an exemplary embodiment, the target material comprises the following components: by mass percentage, 38% titanium, 9% copper, 9% manganese, 8% tungsten trioxide, 17% titanium dioxide, 6% silicon dioxide, and 13% tin dioxide.

[0019] A second aspect of the present application provides a method for preparing a target material, the method comprising the following steps:

[0020] 1) Preparation of pre-alloy

[0021] Two or more metal raw materials are smelted to prepare a pre-alloy, and the pre-alloy is refined to obtain the pre-alloyed powder; preferably, titanium, copper, and manganese are smelted to prepare a pre-alloy, and the pre-alloy is refined to obtain the pre-alloyed powder;

[0022] 2) Mixing of raw materials

[0023] Mixing the pre-alloyed powder with two or more oxides; preferably, mixing the pre-alloyed powder with tungsten trioxide, titanium dioxide, silicon dioxide, and tin dioxide;

[0024] 3) Add binder

[0025] Adding a binder to the mixture obtained in step 2) and mixing;

[0026] 4) Sintering

[0027] The mixture obtained in step 3) is pressed into shape and sintered to obtain the target material.

[0028] In an exemplary embodiment, step 1) includes: preparing the pre-alloy by a smelting method, and obtaining the pre-alloy powder by a gas atomization method;

[0029] Preferably, the pre-alloy is prepared by vacuum suspension melting, and the pre-alloy powder is obtained by inert gas atomization;

[0030] More preferably, the pre-alloy is prepared by cold crucible induction melting, and argon gas atomization is used to obtain the pre-alloy powder.

[0031] In an exemplary embodiment, step 1) includes: using a cold crucible induction melting method to prepare Ti-Cu-Mn pre-alloy from raw metals Ti, Cu and Mn, and using argon gas atomization to obtain the Ti-Cu-Mn pre-alloy powder.

[0032] In an exemplary embodiment, the particle size of the pre-alloyed powder is ≤100 μm.

[0033] In an exemplary embodiment, in steps 2)-3), the mixing method can be selected from one or more of manual grinding, mechanical stirring and mechanical ball milling; preferably, mechanical ball milling.

[0034] In an exemplary embodiment, in step 2), the mixing time is 20-40 min; preferably, the mixing time is 30 min.

[0035] In an exemplary embodiment, in step 3), the mixing time is 60-120 min; preferably, the mixing time is 90 min.

[0036] In an exemplary embodiment, in step 3), the binder is selected from one or more of butadiene rubber, paraffin, polyethylene glycol, and styrene-butadiene-styrene; preferably, the binder is paraffin.

[0037] In an exemplary embodiment, the amount of the binder added and the mass percentage of the mixture obtained in step 2) are 0.4% to 0.8%; preferably, the amount of the binder added and the mass percentage of the mixture obtained in step 2) are 0.5% to 0.7%.

[0038] In an exemplary embodiment, step 4) comprises: high-speed pressing and sintering the mixture obtained in step 3);

[0039] Optionally, the high-speed pressing rate is 2-7 m / s;

[0040] Optionally, the sintering temperature is 1030° C.-1280° C., and the sintering time is 1-5 hours; preferably, the sintering temperature is 1200° C., and the sintering time is 3 hours.

[0041] The third aspect of the present application provides a target material prepared according to the above-mentioned target material preparation method.

[0042] A fourth aspect of the present application provides a hydrophilic film having a thickness of 0.1 to 0.5 μm and formed by magnetron sputtering using the target material.

[0043] A fifth aspect of the present application provides a product coated with the hydrophilic film.

[0044] In an exemplary embodiment, the article comprises a substrate and the hydrophilic film located on the surface of the substrate; optionally, the substrate may be a plastic substrate or a metal substrate;

[0045] Preferably, the product can be a kitchen and bathroom hardware product;

[0046] More preferably, the product may be a faucet, shower room glass, pendant, bathroom cabinet glass, sink, shower or floor drain.

[0047] Compared with the existing technology, this application has the following technical effects:

[0048] 1. Compared with the hydrophilic coatings currently available on the market prepared by spraying methods, the hydrophilic coating prepared using the target material of this application has a more lasting hydrophilic effect. After 300 cycles of mud testing, the film still maintains its hydrophilicity.

[0049] 2. The film prepared using the target material of the present application has excellent alkali resistance, and the CASS 12H test can reach level 10.

[0050] 3. The film prepared by the target material of the present application has a good antibacterial effect, and the antibacterial rate against Escherichia coli and Staphylococcus aureus can reach 99.9%.

[0051] 4. The equipment and process used in the target material preparation method in this application are simple and common, easy to operate, and suitable for large-scale production.

[0052] Other features and advantages of the present application will be described in the following description, and in part will become apparent from the description, or will be understood by practicing the present application. Other advantages of the present application can be realized and obtained by the solutions described in the description. DETAILED DESCRIPTION

[0053] To make the purpose, technical solutions and advantages of this application more clear, the embodiments of the present invention will be described in detail below. It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of this application can be combined with each other in any way.

[0054] Example 1,

[0055] The target material components, calculated by mass percentage, include:

[0056] Titanium 41%, copper 8%, manganese 9%, tungsten trioxide 8%, titanium dioxide 21%, silicon dioxide 5%, tin dioxide 8%.

[0057] The method for preparing the target material comprises the following steps:

[0058] 1) The raw materials Ti, Cu and Mn are melted by vacuum suspension at 6×10- 4 Pa vacuum, preparing a Ti-Cu-Mn pre-alloy at 1100° C.; atomizing the Ti-Cu-Mn pre-alloy with argon gas using a gas atomization method to obtain a pre-alloy powder with a particle size of less than 100 μm;

[0059] 2) mixing the Ti-Cu-Mn pre-alloy with WO3, TiO2, SiO2, and SnO2 by mechanical ball milling for 30 minutes;

[0060] 3) adding paraffin wax and mechanically ball milling for 90 minutes; wherein the mass percentage of the paraffin wax added to the mixture in step 2) is 0.7%;

[0061] 4) The mixture is compacted by high-speed pressing at a rate of 5 m / s; and the compact is sintered at a temperature of 1200° C. for 3 hours to obtain the target material.

[0062] Example 2,

[0063] The target material components, calculated by mass percentage, include:

[0064] Titanium 42%, copper 6%, manganese 7%, tungsten trioxide 7%, titanium dioxide 19%, silicon dioxide 6%, tin dioxide 13%. The target material is prepared in the same manner as in Example 1.

[0065] Example 3.

[0066] The target material components, calculated by mass percentage, include:

[0067] Titanium 40%, copper 9%, manganese 10%, tungsten trioxide 5%, titanium dioxide 21%, silicon dioxide 4%, tin dioxide 11%. The target material is prepared in the same manner as in Example 1.

[0068] Example 4.

[0069] The target material components, calculated by mass percentage, include:

[0070] Titanium 43%, copper 7%, manganese 8%, tungsten trioxide 9%, titanium dioxide 18%, silicon dioxide 3%, tin dioxide 12%. The target material is prepared in the same manner as in Example 1.

[0071] Example 5.

[0072] The target material components, calculated by mass percentage, include:

[0073] Titanium 38%, copper 9%, manganese 9%, tungsten trioxide 8%, titanium dioxide 17%, silicon dioxide 6%, tin dioxide 13%. The target material is prepared in the same manner as in Example 1.

[0074] Comparative Example 1.

[0075] The target material components, calculated by mass percentage, include:

[0076] Titanium 42%, copper 15%, manganese 6%, tungsten trioxide 7%, titanium dioxide 10%, silicon dioxide 5%, tin dioxide 15%. The target material is prepared in the same manner as in Example 1.

[0077] Comparative Example 2.

[0078] The target material components, calculated by mass percentage, include:

[0079] Titanium 38%, copper 5%, manganese 6%, tungsten trioxide 7%, titanium dioxide 25%, silicon dioxide 2%, tin dioxide 17%. The target material is prepared in the same manner as in Example 1.

[0080] Comparative Example 3.

[0081] The target material comprises, by mass percentage, 40% titanium, 8% copper, 8% manganese, 15% tungsten trioxide, 15% titanium dioxide, 6% silicon dioxide, and 8% tin dioxide. The target material is prepared in the same manner as in Example 1.

[0082] Experimental Example 1.

[0083] Products containing hydrophilic thin films were prepared using the target materials in Examples 1-5 and Comparative Examples 1-3 of the present application, and the following performance tests were performed on these products. The test results are shown in Table 1.

[0084] Initial contact angle / degree test: measured by OCA40Micro contact angle tester made in Germany;

[0085] Copper Accelerated Acetic Acid Salt Spray Test (CASS): Tested in accordance with the relevant standards of GB / T10125, requiring samples to meet the standard of Level 10 after 12 hours of testing;

[0086] Acetic acid salt spray test (AASS): The test is carried out in accordance with the relevant standards of GB / T10125, and the samples are required to meet the standard of level 10 after 48 hours of testing;

[0087] Water quality degradation test: Place the sample in a constant temperature water bath filled with (80±1)℃ distilled water. Soak for 24h±10min and observe whether there is any blistering, discoloration, peeling, corrosion or other adverse phenomena on the surface of the sample.

[0088] Anti-scratch test: Use mud as the scratch medium, where the flow rate of the mud is (3-3.5) ml / min. Use the mud to rub for 2500 cycles, and there should be no exposed electroplating layer on the surface.

[0089] According to Table 1, compared with Comparative Examples 1-3, the performance of the products containing hydrophilic films prepared from the targets in Examples 1-5 of the present application is better than that of Comparative Examples 1-3, and can solve the technical problems described in this application and achieve the technical effects of this application.

[0090] Table 1: Performance test results of Examples 1-5 and Comparative Examples 1-3

[0091]

[0092]

[0093] This application describes multiple embodiments, but the description is illustrative rather than restrictive, and it is obvious to a person skilled in the art that there may be more embodiments and implementations within the scope of the embodiments described in this application.

Claims

1. A target material, comprising the following components: by mass percentage, 38%-48% titanium, 5%-10% copper, 6%-14% manganese, 4%-9% tungsten trioxide, 15%-21% titanium dioxide, 2%-8% silicon dioxide and 7%-13% tin dioxide.

2. The target material according to claim 1, wherein The target material comprises the following components: by mass percentage, 38%-43% titanium, 6%-9% copper, 7%-10% manganese, 5%-9% tungsten trioxide, 17%-21% titanium dioxide, 3%-6% silicon dioxide and 8%-13% tin dioxide.

3. The target material according to claim 2, wherein The target material comprises the following components: by mass percentage, titanium 41%, copper 8%, manganese 9%, tungsten trioxide 8%, titanium dioxide 21%, silicon dioxide 5%, and tin dioxide 8%; or The target material comprises the following components: by mass percentage, titanium 42%, copper 6%, manganese 7%, tungsten trioxide 7%, titanium dioxide 19%, silicon dioxide 6%, and tin dioxide 13%; or The target material comprises the following components: by mass percentage, titanium 40%, copper 9%, manganese 10%, tungsten trioxide 5%, titanium dioxide 21%, silicon dioxide 4%, and tin dioxide 11%; or The target material comprises the following components: by mass percentage, titanium 43%, copper 7%, manganese 8%, tungsten trioxide 9%, titanium dioxide 18%, silicon dioxide 3%, and tin dioxide 12%; or The target material comprises the following components: by mass percentage, 38% titanium, 9% copper, 9% manganese, 8% tungsten trioxide, 17% titanium dioxide, 6% silicon dioxide, and 13% tin dioxide.

4. A method for preparing the target material according to any one of claims 1 to 3, the method comprising the following steps: 1) Preparation of pre-alloy Smelting titanium, copper and manganese to prepare a pre-alloy, and refining the pre-alloy to obtain the pre-alloy powder; 2) Mixing of raw materials mixing the pre-alloyed powder with tungsten trioxide, titanium dioxide, silicon dioxide and tin dioxide; 3) Add binder Adding a binder to the mixture obtained in step 2) and mixing; 4) Sintering The mixture obtained in step 3) is pressed into shape and sintered to obtain the target material.

5. The preparation method according to claim 4, wherein Step 1) comprises: preparing the pre-alloy by a smelting method, and obtaining the pre-alloy powder by a gas atomization method; and / or The particle size of the pre-alloyed powder is ≤100 μm.

6. The preparation method according to claim 5, wherein Step 1) comprises: preparing the pre-alloy by a vacuum suspension melting method, and obtaining the pre-alloy powder by an inert gas atomization method.

7. The preparation method according to claim 6, wherein Step 1) comprises: preparing the pre-alloy by cold crucible induction melting, and obtaining the pre-alloy powder by argon gas atomization.

8. The preparation method according to any one of claims 4 to 7, wherein In steps 2)-3), the mixing method is selected from one or more of manual grinding, mechanical stirring and mechanical ball milling.

9. The preparation method according to claim 8, wherein The mixing method is mechanical ball milling.

10. The preparation method according to claim 8, wherein In step 2), the mixing time is 20-40 min; In step 3), the mixing time is 60-120 min.

11. The preparation method according to claim 10, wherein In step 2), the mixing time is 30 min; In step 3), the mixing time is 90 min.

12. The preparation method according to any one of claims 4 to 7, wherein In step 3), the binder is selected from one or more of butadiene rubber, paraffin, polyethylene glycol, and styrene-butadiene-styrene; and / or The mass percentage of the added amount of the binder to the mixture obtained in step 2) is 0.4% to 0.8%.

13. The preparation method according to claim 12, wherein In step 3), the binder is paraffin; The mass percentage of the added amount of the binder to the mixture obtained in step 2) is 0.5% to 0.7%.

14. The preparation method according to any one of claims 4 to 7, wherein Step 4) comprises: high-speed pressing and sintering the mixture obtained in step 3).

15. The preparation method according to claim 14, wherein The speed of high-speed pressing is 2-7m / s; The sintering temperature is 1030°C-1280°C, and the sintering time is 1-5h.

16. The preparation method according to claim 15, wherein The sintering temperature is 1200℃ and the sintering time is 3h. 17 . A hydrophilic thin film formed by magnetron sputtering using the target material according to claim 1 .

18. An article coated with the hydrophilic film according to claim 17, the article comprising a substrate and the hydrophilic film located on the surface of the substrate.

19. The article of claim 18, wherein The products are kitchen and bathroom hardware products.

20. The article of claim 19, wherein The product is a faucet, shower room glass, pendant, bathroom cabinet glass, sink, shower, floor drain or cabinet.

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