A focusing and measuring method and device of a laser engraving machine and a storage medium

Abstract

The application provides a focusing and measuring method, device and storage medium of a laser engraving machine, the method comprising the following steps: presetting parameters of a laser generator and a photosensitive component, calculating a distance between the laser generator and a first to-be-measured point of a to-be-measured material according to the parameters; adjusting the distance between the laser generator and the to-be-measured material, so that a second to-be-measured point of the to-be-measured material exists relative to the laser generator; presetting a pixel plane at the first to-be-measured point, which is perpendicular to a straight line between the photosensitive component and the to-be-measured material; a projection point of the second to-be-measured point of the to-be-measured material exists on the pixel plane; calculating a distance between the projection point and the first to-be-measured point, and calculating a proportion coefficient according to the distance. The focusing method of the laser engraving machine provided by the application enables a user to realize the function of automatic focusing of a laser head.

Description

Technical Field

[0001] This application relates to the field of laser engraving machines, and in particular to a focusing and measuring method, apparatus, and storage medium for a laser engraving machine. Background Technology

[0002] A laser engraving machine is an advanced device that uses lasers to engrave materials. Unlike mechanical engraving machines and other traditional manual engraving methods, laser engraving machines use the thermal energy of lasers to engrave materials. The laser inside the laser engraving machine is its core component. Generally speaking, laser engraving machines have a wider range of applications, higher engraving precision, and faster engraving speed. Because of these advantages, laser engraving machines have gradually replaced traditional engraving equipment and methods.

[0003] In traditional laser engraving machines, the varying thickness of the material being engraved causes the laser focus to fail to accurately target the material surface each time, affecting the engraving result. The common solution to this focusing problem is manual focusing before engraving, i.e., manually adjusting the laser system or the laser focus height to ensure the laser focus is on the material surface before engraving. Currently, common manual focus adjustment methods on the market typically use a focusing column for manual focusing, which is cumbersome and lacks precision. Furthermore, manual adjustment can result in glare from laser reflections, posing a certain risk. The process is complex and safety is questionable. Summary of the Invention

[0004] This application provides a focusing method, apparatus, device, and storage medium for a laser engraving machine, which realizes the automatic focusing function of the laser head of the laser engraving machine under a specific algorithm.

[0005] The first aspect of this application provides a focusing calibration method for a laser engraving machine, comprising:

[0006] S01, preset the parameters of the laser generator and the photosensitive component, and calculate the distance between the laser generator and the first test point of the material under test based on the parameters;

[0007] S02, adjust the distance between the laser generator and the material to be tested so that the material to be tested has a second test point relative to the laser generator;

[0008] S03, a pixel surface is preset at the first test point, which is perpendicular to the straight line between the photosensitive component and the first test point of the test material; a projection point is present on the pixel surface at the second test point of the test material.

[0009] S04, calculate the distance between the projection point and the first test point, and calculate the scaling factor based on the distance.

[0010] A second aspect of this application provides a focusing measurement method for a laser engraving machine, comprising:

[0011] S01, read the scaling factor Ki;

[0012] S02, measure the pixel distance between the projection point and the first test point, and mark it as s';

[0013] S03, calculate the physical distance between the projection point and the first test point based on the proportional coefficient Ki and s', and mark it as s;

[0014] S04, calculate the distance between the laser generator and the second test point, and mark it as BE'.

[0015] A third aspect of this application provides a laser engraving machine, comprising:

[0016] A photosensitive element used to measure the pixel distance of the material under test;

[0017] A laser generator, mounted on one side of the photosensitive component, is used to generate a laser beam towards the material under test;

[0018] The processor is used to preset the parameters of the laser generator and the photosensitive component, and calculate the distance between the laser generator and the first test point of the material under test based on the parameters;

[0019] The distance between the laser generator and the first test point of the material under test is marked as BF, and the distance between the photosensitive component and the first test point of the material under test is marked as AF; wherein the location of the laser generator is B, the location of the photosensitive component is A, and the first test point of the material under test is F;

[0020] Adjust the distance between the laser generator and the material under test so that the material under test has a second test point relative to the laser generator;

[0021] The second test point of the material under test is marked as E; the distance between the laser generator and the second test point is marked as BE.

[0022] A pixel surface is pre-defined at point F, and the pixel surface is perpendicular to AF.

[0023] The position of the projection point of the second test point of the material under test on the pixel surface is marked as e;

[0024] Calculate the distance between e and F, and calculate the scaling factor Ki based on the distance.

[0025] The fourth aspect of this application provides a laser engraving machine, comprising:

[0026] A photosensitive element used to measure the pixel distance of the material under test;

[0027] A laser generator, mounted on one side of the photosensitive component, is used to generate a laser beam towards the material under test;

[0028] The processor is used to preset the parameters of the laser generator and the photosensitive component, and calculate the distance between the laser generator and the first test point of the material under test based on the parameters;

[0029] The distance between the laser generator and the first test point of the material under test is marked as BF, and the distance between the photosensitive component and the first test point of the material under test is marked as AF; wherein the location of the laser generator is B, the location of the photosensitive component is A, and the first test point of the material under test is F;

[0030] Adjust the distance between the laser generator and the material under test so that the material under test has a second test point relative to the laser generator;

[0031] The second test point of the material to be tested is marked as E;

[0032] A pixel surface is pre-defined at point F, and the pixel surface is perpendicular to AF.

[0033] The position of the projection point of the second test point of the material under test on the pixel surface is marked as e;

[0034] Calculate the distance between e and F, and calculate the scaling factor Ki based on the distance.

[0035] The processor is used to read the BF and the scaling factor Ki;

[0036] The aforementioned s' was measured;

[0037] The physical distance between e and F is calculated based on the proportionality coefficient Ki and s', and denoted as s;

[0038] The distance between the laser generator and the second test point is calculated and marked as BE'.

[0039] The fifth aspect of this application provides a computer storage medium including instructions that, when executed on a computer, cause the computer to perform the steps of the focus calibration method for a laser engraving machine as described in any of the preceding aspects.

[0040] Compared to existing technologies, the focusing and measurement method, device, and storage medium of the laser engraving machine provided in this application achieve automatic focusing of the laser head under a specific algorithm by setting up a photosensitive component, a laser generator, and a processor, allowing users to use the laser engraving machine more smoothly and safely. Attached Figure Description

[0041] Figure 1 A schematic flowchart illustrating the focusing calibration method for a laser engraving machine provided in this application embodiment;

[0042] Figure 2 A schematic diagram showing the placement of the laser generator and photosensitive component according to an embodiment of this application;

[0043] Figure 3 for Figure 1 The flowchart of method S01 is shown below;

[0044] Figure 4 for Figure 1 The flowchart of method S02 is shown below;

[0045] Figure 5 for Figure 1 The diagram shows the steps and methods of S04.

[0046] Figure 6 for Figure 5 The diagram shows the steps and methods of S042.

[0047] Figure 7 for Figure 5 The diagram shows the steps and methods of S043.

[0048] Figure 8 This is a schematic diagram of the focusing measurement method for a laser engraving machine.

[0049] Figure 9 This is a virtual structural diagram of one embodiment of the laser engraving machine;

[0050] Figure 10 This is a virtual structural diagram of another embodiment of the laser engraving machine;

[0051] Figure 11 This is a schematic diagram of the server structure provided in an embodiment of this application. Detailed Implementation

[0052] The technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments.

[0053] Please refer to the following: Figure 1 and Figure 2 , Figure 1 This is a schematic flowchart of the focusing calibration method for a laser engraving machine provided in an embodiment of this application. Figure 2 This is a schematic diagram showing the placement of the laser generator and photosensitive component in an embodiment of this application.

[0054] A focusing calibration method for a laser engraving machine includes the following steps:

[0055] S01, preset the parameters of the laser generator and the photosensitive component, and calculate the distance between the laser generator and the first test point of the material under test based on the parameters;

[0056] S02, adjust the distance between the laser generator and the material to be tested so that the material to be tested has a second test point relative to the laser generator;

[0057] S03, a pixel surface is preset at the first test point, which is perpendicular to the straight line between the photosensitive component and the test material; a projection point is present on the pixel surface at the second test point of the test material;

[0058] S04, calculate the distance between the projection point and the first test point, and calculate the scaling factor based on the distance.

[0059] Please see Figure 3 , Figure 3 for Figure 1 The flowchart of method S01 is shown.

[0060] The distance between the laser generator and the material under test is marked as BF, and the distance between the photosensitive component and the material under test is marked as AF; wherein the location of the laser generator is marked as B, the location of the photosensitive component is marked as A, and the first test point of the material under test is marked as F;

[0061] S011, the distance between the laser generator and the photosensitive component is preset and marked as AB;

[0062] S012, the angle between the photosensitive element and the AB line is preset to be β;

[0063] S013, the line between the laser generator and the first test point is preset to be perpendicular to AB;

[0064] S014, Calculate the distance between the laser generator and the first test point using trigonometric functions. The calculation method is: AB* =BF.

[0065] Please see Figure 4 , Figure 4 for Figure 1 The flowchart of method S02 is shown.

[0066] The second test point of the material under test is marked as E; the distance between the laser generator and the second test point is marked as BE.

[0067] S021, move the laser generator and / or the material under test;

[0068] S022, the BE is perpendicular to the AB.

[0069] In this embodiment, it can be understood that the direction of movement of the material to be tested is vertical, that is, it moves in the direction of the extension line FE of BF or the straight line of BF.

[0070] Please see Figure 5 , Figure 5 for Figure 1 The diagram shows the steps and methods of S04.

[0071] The projection point is marked as point e;

[0072] S041, calculate the physical distance between e and F, and label it as s;

[0073] S042, calculate the pixel distance between e and F, and label it as s';

[0074] S043, calculate the proportionality coefficient between s and s', denoted as Ki.

[0075] Please see Figure 6 , Figure 6 for Figure 5 The diagram shows the steps and methods of S042.

[0076] S0421. Calculate the angle α between AE and AB based on trigonometric relationships; the calculation formula is:

[0077] tanα = BE / AB, obtain the value of tanα, and calculate the size of the included angle α using inverse trigonometric functions;

[0078] S0422. Calculate the distance between the photosensitive element and the first test point, and mark it as AF;

[0079] The calculation formula is: AF² = AB² + BE²;

[0080] S0423. In the right triangle AFe, calculate the physical distance between eF;

[0081] The calculation formula is:

[0082] tan(α-β) = eF / AF, which gives the physical distance between eF, denoted as s.

[0083] Please see Figure 7 , Figure 7 for Figure 5 The diagram shows the steps and methods of S043.

[0084] S0431, Determine the pixel distance between the eFs based on the parameters of the photosensitive element;

[0085] S0432, Read the pixel distance between the eF and mark it as s'.

[0086] It is understood that the pixel distance between the eFs can be directly read from the parameters of the photosensitive element without calculation.

[0087] Please see Figure 8 , Figure 8 This is a schematic diagram of the focusing measurement method for a laser engraving machine.

[0088] A focusing measurement method for a laser engraving machine includes the following steps:

[0089] S01, read the scaling factor Ki;

[0090] S02, measure the pixel distance between the projection point and the first test point, and mark it as s';

[0091] S03, calculate the physical distance between the projection point and the first test point based on the proportional coefficient Ki and s', and mark it as s;

[0092] S04, calculate the distance between the laser generator and the second test point, and mark it as BE'.

[0093] In this embodiment, it is understood that the laser engraving machine needs to be calibrated and debugged before it leaves the factory. At this time, the distance BE is known. However, after the laser engraving machine is delivered to the user, the user calculates the distance BE' between the laser generator and the second test point based on the proportional coefficient Ki and the BF stored in the processing device. The distance BE' is equal to the distance BE, that is, the distance BE' is the calibration distance of the laser engraving machine.

[0094] Please see Figure 9 , Figure 9 This is a virtual structural diagram of one embodiment of the laser engraving machine;

[0095] The laser engraving machine 20 includes a photosensitive element 201, a laser generator 202, and a processor 203.

[0096] Photosensitive element 201 is used to measure the pixel distance of the material under test;

[0097] A laser generator 202 is mounted on one side of the photosensitive element and is used to generate a laser beam to the material under test.

[0098] The processor 203 is used to preset the parameters of the laser generator and the photosensitive component, and calculate the distance between the laser generator and the first test point of the material under test according to the parameters;

[0099] The distance between the laser generator and the material under test is marked as BF, and the distance between the photosensitive component and the material under test is marked as AF; wherein the location of the laser generator is B, the location of the photosensitive component is A, and the first test point of the material under test is F;

[0100] Adjust the distance between the laser generator and the material under test so that the material under test has a second test point relative to the laser generator;

[0101] The second test point of the material under test is marked as E; the distance between the laser generator and the second test point is marked as BE.

[0102] A pixel surface is pre-defined at point F, and the pixel surface is perpendicular to AF.

[0103] The position of the projection point of the second test point of the material under test on the pixel surface is marked as e;

[0104] Calculate the distance between e and F, and calculate the scaling factor Ki based on the distance.

[0105] It should be noted that the notation symbols such as BF, AF, B, A, F, BE, e F, Ki, β, α, etc., appearing in this invention are only for the purpose of explaining the technical solution more concisely and clearly, and do not constitute the sole limitation of this technical solution. Examples are illustrated below:

[0106] "The distance between the laser generator and the material under test is marked as BF, and the distance between the photosensitive component and the material under test is marked as AF; wherein the location of the laser generator is marked as B, the location of the photosensitive component is marked as A, and the first test point of the material under test is marked as F;

[0107] The distance between the laser generator and the photosensitive element is preset and marked as AB;

[0108] The angle between the photosensitive element and the AB line is preset to be β;

[0109] The line between the laser generator and the first test point is pre-defined to be perpendicular to AB.

[0110] The distance between the laser generator and the first test point is calculated using trigonometric functions. The calculation method is as follows:

[0111] AB* =BF.

[0112] A new set of terminology can be used:

[0113] The distance between the laser generator and the material under test is marked as yz, and the distance between the photosensitive component and the material under test is marked as xz; wherein the location of the laser generator is marked as y, the location of the photosensitive component is marked as x, and the first test point of the material under test is marked as z;

[0114] The distance between the laser generator and the photosensitive element is preset and denoted as xy;

[0115] The angle between the photosensitive element and the xy line is preset to be α;

[0116] The line between the laser generator and the first test point is pre-defined to be perpendicular to the xy-axis.

[0117] The distance between the laser generator and the first test point is calculated using trigonometric functions. The calculation method is as follows:

[0118] xy* =xz.

[0119] Similarly, similar replacements can be made for markers appearing elsewhere.

[0120] Please see Figure 10 , Figure 10 This is a virtual structural diagram of another embodiment of the laser engraving machine;

[0121] The laser engraving machine 30 includes a photosensitive element 301, a laser generator 302, and a processor 303.

[0122] Photosensitive element 301 is used to measure the pixel distance of the material under test;

[0123] A laser generator 302 is mounted on one side of the photosensitive element and is used to generate a laser beam to the material under test.

[0124] The processor 303 is used to preset the parameters of the laser generator and the photosensitive component, and calculate the distance between the laser generator and the first test point of the material under test according to the parameters;

[0125] The distance between the laser generator and the material under test is marked as BF, and the distance between the photosensitive component and the material under test is marked as AF; wherein the location of the laser generator is B, the location of the photosensitive component is A, and the first test point of the material under test is F;

[0126] Adjust the distance between the laser generator and the material under test so that the material under test has a second test point relative to the laser generator;

[0127] The second test point of the material to be tested is marked as E;

[0128] A pixel surface is pre-defined at point F, and the pixel surface is perpendicular to AF.

[0129] The position of the projection point of the second test point of the material under test on the pixel surface is marked as e;

[0130] Calculate the distance between e and F, and calculate the scaling factor Ki based on the distance.

[0131] The processor is used to read the BF and the scaling factor Ki;

[0132] The aforementioned s' was measured;

[0133] The physical distance between e and F is calculated based on the proportionality coefficient Ki and s', and denoted as s;

[0134] The distance between the laser generator and the second test point is calculated and marked as BE'.

[0135] Figure 11 This is a schematic diagram of the server structure of this application. The server can be integrated within a laser engraving machine. In this embodiment, the server 500 includes at least one processor 501, at least one network interface 504 or other user interface 503, a memory 505, and at least one communication bus 502. The server 500 may optionally include the user interface 503, including a display, keyboard, or clicking device. The memory 505 may include high-speed RAM or non-volatile memory, such as at least one disk drive. The memory 505 stores execution instructions, used to store the scaling factor Ki and the BF. When the server 500 is running, the processor 501 communicates with the memory 505, and the processor 501 calls the instructions stored in the memory 505 to execute the focusing method of the laser engraving machine. An operating system 506 contains various programs for implementing various basic business operations and handling tasks based on the hardware.

[0136] The server provided in this application embodiment can execute the technical solution of the above-described embodiment of the laser engraving machine focus calibration and focus measurement method. Its implementation principle and technical effect are similar, and will not be repeated here.

[0137] This application also provides a computer storage medium including instructions that, when executed on a computer, cause the computer to perform the steps of the focus calibration method for a laser engraving machine as described in any of the above aspects.

[0138] Compared to existing technologies, the focusing and measurement method, device, and storage medium of the laser engraving machine provided in this application achieve the function of automatic laser head focusing by setting up a photosensitive element, a laser generator, and a processor under a specific algorithm, allowing users to use the laser engraving machine more smoothly and safely.

[0139] The above-described embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A focusing calibration method for a laser engraving machine, characterized in that, include: The parameters of the laser generator and the photosensitive component are preset, and the distance between the laser generator and the first test point of the material under test is calculated based on the parameters. Adjust the distance between the laser generator and the material under test so that the material under test has a second test point relative to the laser generator; A pixel surface is preset at the first test point, which is perpendicular to the straight line between the photosensitive component and the first test point of the material to be tested; a projection point is present on the pixel surface at the second test point of the material to be tested. Calculate the distance between the projection point and the first test point, and calculate the scaling factor based on the distance; The steps of calculating the distance between the laser generator and the first test point of the material under test based on the preset parameters of the laser generator and the photosensitive component include: The distance between the laser generator and the first test point of the material under test is marked as BF, and the distance between the photosensitive component and the first test point of the material under test is marked as AF; wherein the location of the laser generator is marked as B, the location of the photosensitive component is marked as A, and the first test point of the material under test is marked as F; The distance between the laser generator and the photosensitive element is preset and marked as AB; The angle between the line between the photosensitive component and the first test point and the line containing AB is preset to be β; The line between the laser generator and the first test point is pre-defined to be perpendicular to the line containing AB. The distance between the laser generator and the first test point is calculated using trigonometric functions. The calculation method is as follows: AB* =BF; The step of adjusting the distance between the laser generator and the material under test, so that the material under test has a second test point relative to the laser generator, includes: The second test point of the material under test is marked as E; the distance between the laser generator and the second test point is marked as BE. Move the material to be tested; BE is perpendicular to AB; The step of calculating the distance between the projection point and the first test point, and calculating the scaling factor based on the distance, includes: The projection point is marked as point e; Calculate the physical distance between e and F, and label it as s; Calculate the pixel distance between e and F, and label it as s'; Calculate the proportionality coefficient between s and s', and denote it as Ki; The step of calculating the physical distance between e and F, denoted as s, includes: Calculate the angle α between AE and AB using trigonometric relationships; the formula is: tanα = BE / AB, obtain the value of tanα, and calculate the size of the included angle α using inverse trigonometric functions; Calculate the distance between the photosensitive element and the first test point, and mark it as AF; In right triangle AFe, calculate the physical distance between e and F; the formula is: tan(α-β) = eF / AF, which gives the physical distance between eF, denoted as s; The step of calculating the pixel distance between e and F, denoted as s', includes: The pixel distance between the eFs is determined based on the parameters of the photosensitive element; Read the pixel distance between the eF and mark it as s'.

2. A laser engraving machine, characterized in that, include: A photosensitive element used to measure the pixel distance of the material under test; A laser generator, mounted on one side of the photosensitive component, is used to generate a laser beam towards the material under test; A processor for performing the method as described in claim 1.

3. A computer storage medium comprising instructions that, when executed on a computer, cause the computer to perform the method of claim 1.

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