Apparatus and method for manufacturing glass fine particle deposition body

Abstract

The present disclosure relates to a glass fine particle deposit manufacturing apparatus that is a glass fine particle deposit manufacturing apparatus that manufactures a glass fine particle deposit by depositing glass fine particles generated using a siloxane as a raw material, and includes a reaction vessel composed of a metal that does not have corrosion resistance against a corrosive substance.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to a glass particle deposition body manufacturing apparatus and a glass particle deposition body manufacturing method. This application claims priority based on Japanese Application No. 2021-208160 filed on December 22, 2021, and all the recitations described in the Japanese application are incorporated by reference. BACKGROUND

[0002] A glass particle deposition body manufacturing method in which glass particles are deposited on a starting material is described in Patent Literature 1.

[0003] PRIOR ART DOCUMENTS

[0004] PATENT LITERATURE

[0005] Patent Literature 1: Japanese Patent Application Publication No. 2004-99353 SUMMARY

[0006] One embodiment of the glass particle deposition body manufacturing apparatus according to the present disclosure is a glass particle deposition body manufacturing apparatus that manufactures a glass particle deposition body by depositing glass particles generated from a siloxane,

[0007] The reaction vessel is configured of a metal that does not have corrosion resistance against a corrosive substance.

[0008] One embodiment of the glass particle deposition body manufacturing method according to the present disclosure is a glass particle deposition body manufacturing method that manufactures a glass particle deposition body by depositing glass particles generated from a siloxane,

[0009] The glass particles are generated by causing the siloxane to undergo an oxidation reaction by a burner in the reaction vessel configured of a metal that does not have corrosion resistance against a corrosive substance. BRIEF DESCRIPTION OF DRAWINGS

[0010] [ Figure 1 ] Figure 1 is a view that schematically illustrates a glass particle deposition body manufacturing apparatus according to a first embodiment.

[0011] [ Figure 2 ] Figure 2 is a view that schematically illustrates a glass particle deposition body manufacturing apparatus according to a second embodiment.

[0012] [ Figure 3 ] Figure 3 is a view that schematically illustrates Figure 2 a perspective view of the reaction vessel illustrated in FIG. 8.

[0013] [ Figure 4 ] Figure 4is a schematic view showing the positional relationship of the middle portion of the reaction vessel, the exhaust pipe, and the outer vessel.

[0014] [ Figure 5 ] Figure 5 is a schematic view for explaining thermal expansion in the reaction vessel. DETAILED DESCRIPTION

[0015] [Problem to be Solved by the Invention]

[0016] In the manufacturing method described in Patent Literature 1, silicon tetrachloride is used as a glass raw material gas. In the case where silicon tetrachloride is used as a glass raw material gas, chlorine, which is a corrosive gas, is generated as a byproduct in a generation reaction of glass fine particles. In addition, chlorine reacts with moisture contained in external air added for cooling or removal of remaining glass fine particles, and hydrochloric acid is generated. Therefore, as described in Patent Literature 1, the material of the existing reaction vessel is limited to glass, nickel, nickel alloy, or the like, which has corrosion resistance against these corrosive substances.

[0017] However, when nickel, nickel alloy, or the like is used, there is a problem in that the reaction vessel becomes expensive. In addition, the reaction vessel also needs heat resistance and rigidity against thermal expansion, but since the above-described materials are difficult to process into a complex structure, it is difficult to satisfy the heat resistance and the rigidity by improvement of the structure, resulting in a large size of the reaction vessel. From such a background, it is desired to expand the selection items of the material of the reaction vessel.

[0018] An object of the present disclosure is to expand the selection items of the material of the reaction vessel used in the production of a glass fine particle deposition body, and to not cause a corrosion problem caused by a corrosive substance.

[0019] [Effects of the Invention]

[0020] According to the present disclosure, it is possible to expand the selection items of the material of the reaction vessel used in the production of a glass fine particle deposition body, and to not cause a corrosion problem caused by a corrosive substance.

[0021] [Explanation of Embodiments of the Invention]

[0022] First, an embodiment of the present disclosure is exemplified and explained.

[0023] One embodiment of the present disclosure relates to a glass fine particle deposition body manufacturing apparatus that manufactures a glass fine particle deposition body by depositing glass fine particles generated using siloxane as a raw material,

[0024] The reaction vessel is composed of a metal that does not have corrosion resistance against corrosive substances.

[0025] According to this configuration, it is possible to expand the selection of materials for the reaction vessel used in the production of the glass particle deposition body, and it is possible to avoid corrosion problems caused by corrosive substances.

[0026] Specifically, as the material of the reaction vessel, instead of using a material such as existing glass, nickel, or nickel alloy that has corrosion resistance, a metal that does not have corrosion resistance is used, thereby expanding the selection of materials for the reaction vessel. In addition, the corrosion problem caused by using a metal that does not have corrosion resistance is solved by using siloxane as the glass raw material. Siloxane does not produce corrosive substances such as chlorine or hydrochloric acid as byproducts in the generation reaction of glass particles. Therefore, even if a metal that does not have corrosion resistance is used, the corrosion problem as in the past does not occur. Note that the "metal that does not have corrosion resistance" refers to a metal that is corroded by corrosive substances such as chlorine or hydrochloric acid, and is a metal that is significantly easily corroded compared to nickel or nickel alloy, regardless of the degree of corrosion.

[0027] In the glass particle deposition body production apparatus,

[0028] As the metal, stainless steel, or one or more of iron and aluminum is preferably included.

[0029] According to this configuration, since a metal such as inexpensive stainless steel, or iron, or aluminum is used instead of a high-priced metal such as nickel, it is possible to reduce the manufacturing cost of the reaction vessel. In addition, since the workability of the reaction vessel is improved, as a result, it is possible to improve the structure of the reaction vessel to improve the heat resistance and rigidity, or to downsize the reaction vessel.

[0030] In the glass particle deposition body production apparatus,

[0031] The metal that constitutes the inner surface of the reaction vessel is preferably mirror finished.

[0032] According to this configuration, cleaning of the inside of the reaction vessel becomes easy. Specifically, it is easy to remove powdery silica or the like adhered to the inside of the reaction vessel when producing the glass particle deposition body.

[0033] In the glass particle deposition body production apparatus,

[0034] The Vickers hardness of the metal that constitutes the inner surface of the reaction vessel is preferably 125 Hv or more.

[0035] According to this configuration, it is easy to mirror finish the inner surface of the reaction vessel. In addition, the surface after mirror finishing is difficult to be damaged even by deterioration over the years, and thus it is possible to maintain the effect of mirror finishing for a long time.

[0036] In the glass particle deposition body production apparatus,

[0037] The corrosive substance can be chlorine and hydrochloric acid.

[0038] Silicones do not generate chlorine and hydrochloric acid as byproducts in the generation reaction of glass fine particles. Therefore, as a material of a reaction vessel, a metal having no corrosion resistance against chlorine and hydrochloric acid can be preferably used.

[0039] In the glass fine particle deposit manufacturing apparatus, it is preferable that

[0040] The reaction vessel is divided into at least two or more parts in the axial direction of the glass fine particle deposit, i.e., the up-and-down direction, when the glass fine particle deposit is manufactured,

[0041] The two or more parts have a structure in which the parts are not fixed to each other and at least one part allows deformation caused by thermal expansion when the part thermally expands.

[0042] In the case where silicones are used as a raw material as described in the present disclosure, the temperature inside the reaction vessel is likely to be higher compared to the case where silicon tetrachloride is used as a raw material, and the reaction vessel is likely to thermally expand. However, by adopting the above-described configuration, even if the reaction vessel thermally expands due to heat emitted from the glass fine particle deposit or the like, the reaction vessel is a structure that allows deformation, i.e., the parts of the reaction vessel are not fixed to each other and have gaps, and thus it is possible to suppress the occurrence of a case where the reaction vessel is damaged due to thermal expansion. Note that, in the present disclosure, since the selection items for the material of the reaction vessel are expanded, it is easy to make the reaction vessel have the above-described divided structure.

[0043] In the glass fine particle deposit manufacturing apparatus, it is preferable that

[0044] As the two or more parts, there are included: a reaction vessel upper part, a reaction vessel middle part located below the reaction vessel upper part, and a reaction vessel lower part located below the reaction vessel middle part,

[0045] The reaction vessel middle part is open at both ends in the up-and-down direction,

[0046] The reaction vessel upper part covers the upper end opening of the reaction vessel in a manner that a gap is present between the upper end of the reaction vessel middle part and the reaction vessel upper part in the up-and-down direction,

[0047] The reaction vessel lower part is configured in a manner that covers the lower end opening of the reaction vessel and supports the reaction vessel middle part.

[0048] According to this configuration, the middle portion of the reaction vessel is not fixed to the upper portion of the reaction vessel and the lower portion of the reaction vessel, but is supported by the lower portion of the reaction vessel in a movable state, and thus deformation of the middle portion of the reaction vessel due to thermal expansion is allowed. For example, even if the middle portion of the reaction vessel thermally expands in the vertical direction due to heat emitted from the glass particle deposition body or the like, deformation due to thermal expansion is allowed by the gap between the upper portion of the reaction vessel and the upper end of the middle portion of the reaction vessel. As a result, it is possible to suppress the occurrence of a case where the reaction vessel is broken due to thermal expansion. Note that, in the present disclosure, since the selection of the material for the reaction vessel is expanded, it is easy to make the reaction vessel into the divided structure as described above.

[0049] One embodiment of the present disclosure relates to a method for manufacturing a glass particle deposition body, the method for manufacturing a glass particle deposition body manufacturing the glass particle deposition body by depositing glass particles generated from a siloxane,

[0050] The process includes generating glass particles by causing the siloxane to undergo an oxidation reaction by a burner in a reaction vessel made of a metal that does not have corrosion resistance against a corrosive substance.

[0051] According to this configuration, it is possible to expand the selection of the material for the reaction vessel used in the manufacture of the glass particle deposition body, and it is possible to prevent corrosion problems caused by corrosive substances.

[0052] Specifically, as the material for the reaction vessel, a material that does not have corrosion resistance, instead of a material such as existing glass, nickel, or a nickel alloy that has corrosion resistance, is used, and thus the selection of the material for the reaction vessel is expanded. In addition, the corrosion problem caused by using a material that does not have corrosion resistance is solved by using a siloxane as a glass raw material. The siloxane does not generate a corrosive substance such as chlorine or hydrochloric acid as a byproduct in the reaction of generating glass particles. Therefore, even if a material that does not have corrosion resistance is used, the corrosion problem as in the past does not occur.

[0053] [Detailed description of embodiments of the present disclosure]

[0054] Hereinafter, examples of embodiments of a manufacturing apparatus and a manufacturing method of a glass particle deposition body according to the present disclosure will be described with reference to the drawings. The sizes of the components shown in each of the drawings are sometimes different from the actual sizes of the components for the sake of convenience of explanation. In addition, the same reference numerals are assigned to the same or equivalent configuration elements or components shown in each of the drawings, and redundant explanations are appropriately omitted.

[0055] (Manufacturing apparatus of glass particle deposition body: first embodiment)

[0056] First, a siloxane is used as a glass raw material. Figure 1A manufacturing apparatus 1 of a glass particle deposition body M according to a first embodiment of the present disclosure will be described. Figure 1 is a view schematically showing a manufacturing apparatus 1 of a glass particle deposition body M according to the first embodiment. The manufacturing apparatus 1 includes a lift-rotating device 2, a support device 7, a raw material container 11, a gasification section 14, a burner 16, a reaction container 20, an outer container 30, and a control section 40.

[0057] The reaction container 20 is a container in which the glass particle deposition body M is formed. The reaction container 20 includes a reaction container composed of a metal that does not have corrosion resistance against a corrosive substance. In other words, the reaction container 20 includes a metal that corrodes when exposed to a corrosive substance. The corrosive substance refers to, for example, a strongly acidic or strongly basic substance. Specific examples of the corrosive substance are chlorine and hydrochloric acid. As the metal that does not have corrosion resistance against a corrosive substance, for example, a metal including one or more of stainless steel, iron, and aluminum can be listed. Note that the "metal including one or more of iron and aluminum" refers to a metal of iron or aluminum alone, or an alloy including iron or aluminum and another metal.

[0058] It is preferable that the inner face of the reaction container 20 be composed of a metal that does not have corrosion resistance against a corrosive substance and be mirror finished. Note that the mirror finish refers to mirror finishing of the surface of the metal, and the degree thereof is not limited. In addition, the Vickers hardness of the above-mentioned metal that composes the inner face of the reaction container 20 is preferably 125 Hv or higher, and more preferably 150 Hv or higher. The Vickers hardness of the metal can be measured, for example, by the method described in JIS Z 2244-1:2020. Note that the entire reaction container 20 can also be composed of a metal that does not have corrosion resistance against a corrosive substance.

[0059] An exhaust pipe 8a is installed on the side face of the reaction container 20. In addition, a burner hole (not shown) into which the burner 16 is inserted is provided at the side face of the reaction container 20, for example, at a position opposite to the exhaust pipe 8a.

[0060] The lift-rotating device 2 is a device that causes the glass particle deposition body M to perform a lifting action and a rotating action via the support rod 3 and the starting rod 5. The lift-rotating device 2 controls the action of the support rod 3 based on a control signal transmitted from the control section 40. The lift-rotating device 2 causes the glass particle deposition body M to rotate while lifting it.

[0061] The support rod 3 is disposed so as to pass through a through-hole formed in the upper wall of the reaction container 20, and a partition 4 and a starting rod 5 are installed at the lower end of one end portion (the lower end of the one end portion) disposed in the reaction container 20. Figure 1 The partition 4 is, for example, the same size as the horizontal cross-sectional plane of the upper wall of the reaction container 20. The other end portion (the lower end of the other end portion) of the support rod 3 is disposed outside the reaction container 20. Figure 1The upper end portion of the starting rod 5 (the upper end portion of the starting rod 5 in the drawing) is held by the elevating and rotating device 2. The starting rod 5 is a rod on which glass fine particles are deposited. The exhaust pipe 8a is a pipe that discharges glass fine particles (residues) and the like that are not attached to the starting rod 5 and the glass fine particle deposition body M together with the gas in the reaction vessel 20 to the outside of the reaction vessel 20 in the direction of the arrow in the drawing.

[0062] The support device 7 is a device that supports the starting rod 5 via the abutting portion 6 to suppress the swing. The abutting portion 6 abuts against the starting rod 5. The support device 7 controls the abutting portion 6 to perform the elevating action in accordance with the movement of the starting rod 5 on the basis of the control signal transmitted from the control portion 40.

[0063] The raw material container 11 stores therein liquid siloxane 12 as a raw material. As the siloxane, for example, octamethylcyclotetrasiloxane (OMCTS), decamethylcyclopentasiloxane (DMCPS), hexamethylcyclotrisiloxane, and hexamethyldisiloxane, or the like can be used. In the present example, a case where OMCTS is used as the siloxane is described.

[0064] The liquid siloxane 12 in the raw material container 11 is supplied to the vaporization portion 14 via the supply pipe 13. The vaporization portion 14 vaporizes the liquid siloxane 12 to become a siloxane gas on the basis of the control signal transmitted from the control portion 40. The siloxane gas is supplied to the burner 16 via the temperature-adjusting pipe 15. The temperature-adjusting pipe 15 maintains the temperature in the pipe at a high temperature so as not to liquefy the siloxane gas. The temperature-adjusting pipe 15 is, for example, a pipe in which a tape heater as a heat generator is wound.

[0065] The number of the burners 16 is not particularly limited, and can be one or two or more. In the present example, the number of the burners 16 is three. The siloxane gas vaporized in the vaporization portion 14 and a flame-forming gas are supplied to the burners 16. The flame-forming gas is, for example, hydrogen and oxygen. In addition, an inert gas such as nitrogen or argon can be supplied to the burners 16 as a seal gas. Note that, in the present example, the supply device that supplies the flame-forming gas to the burners 16 and the supply device that supplies the seal gas to the burners 16 are omitted from the drawing. Figure 1 Figure 1 The number of the burners 16 is not particularly limited, and can be one or two or more. In the present example, the number of the burners 16 is three. The siloxane gas vaporized in the vaporization portion 14 and a flame-forming gas are supplied to the burners 16. The flame-forming gas is, for example, hydrogen and oxygen. In addition, an inert gas such as nitrogen or argon can be supplied to the burners 16 as a seal gas. Note that, in the present example, the supply device that supplies the flame-forming gas to the burners 16 and the supply device that supplies the seal gas to the burners 16 are omitted from the drawing.

[0066] The outer side container 30 is a container that covers the periphery of the reaction vessel 20. The clean air supply device 31 is provided on the outer side container 30. The clean air supply device 31 supplies clean air into the outer side container 30 as shown by the arrow in the drawing. In the present example, the clean air supply device 31 is a device that supplies clean air to the outer side container 30. The clean air supply device 31 is, for example, a device that supplies clean air to the outer side container 30 via a pipe. Figure 1 ​In this example, the portion of the reaction vessel 20, except for the top and bottom, is covered by an outer container 30 filled with clean air. For the same reasons as the reaction vessel 20, the outer container 30 is preferably constructed of a metal that is not resistant to corrosive substances.

[0067] The control unit 40 controls the various operations of the lifting and rotating device 2. The control unit 40 sends control signals to the lifting and rotating device 2 to control the lifting speed and rotation speed of the glass microparticle deposit M. Furthermore, the control unit 40 controls the supply amount of siloxane gas to the burner 16 by controlling the operation of the gasification unit 14. Additionally, the control unit 40 controls the various operations of the support device 7.

[0068] (Apparatus for manufacturing glass microparticle deposits: Second Embodiment)

[0069] Next, use Figures 2 to 5 The apparatus 101 for manufacturing glass microparticle deposits M according to the second embodiment of this disclosure will be described. Figure 2 This is a schematic diagram illustrating the manufacturing apparatus 101 for the glass microparticle deposit M according to the second embodiment. Figure 2 As shown, the manufacturing apparatus 101 includes a reaction vessel 120 instead of a reaction vessel 20. Additionally, an exhaust pipe 8b is provided instead of an exhaust pipe 8a. Other components and usage... Figure 1 The constituent elements are the same. Therefore, the following description mainly focuses on the reaction vessel 120 and the exhaust pipe 8b.

[0070] The reaction vessel 120 has a structure that is divided into three parts along the axial direction (vertical direction) of the glass microparticle deposit M. Specifically, the reaction vessel 120 has a structure that is divided into an upper reaction vessel 21, a middle reaction vessel 22 located below the upper reaction vessel 21, and a lower reaction vessel 23 located below the middle reaction vessel 22. The upper reaction vessel 21, the middle reaction vessel 22, and the lower reaction vessel 23 are constructed of metals that are not resistant to corrosive substances.

[0071] The upper part 21 and the lower part 23 of the reaction vessel can be fixed to the outer vessel 30, for example. The middle part 22 of the reaction vessel is supported by the lower part 23, but is neither fixed to the upper part 21 nor to the lower part 23. That is, the middle part 22 of the reaction vessel is movable between the upper part 21 and the lower part 23.

[0072] The reaction vessel 22 has an exhaust section 22d extending in a direction opposite to the burner 16, separated by a glass microparticle deposit M. Additionally, an exhaust opening 22e (see reference) is provided on the exhaust section 22d. Figure 3One end of the exhaust pipe 8b is configured in a manner to cover the exhaust opening 22e. Residues and the like are exhausted together with the gas in the reaction vessel middle portion 22 from the exhaust portion 22d to the direction indicated by the arrow. In addition, the exhaust portion 22d also performs heat removal in the reaction vessel middle portion 22. From the viewpoint of improving the efficiency of the removal of residues and the like or heat removal, the length of the exhaust portion 22d in the up-down direction is preferably greater than the distance between the burner 16 at the uppermost stage and the burner 16 at the lowermost stage.

[0073] Figure 3 is a perspective view schematically showing Figure 2 the reaction vessel 120. Figure 3 The up-down direction shown in Figure 3 The left-right direction shown in Figure 3 is a direction opposite to the direction of the exhaust portion 22d and the burner 16 (not shown in the figure). Figure 3 The front-rear direction shown in Figure 4 and Figure 5 are as described above.

[0074] As shown in Figure 3 the reaction vessel middle portion 22 has a door portion 22a that is opened and closed in the front-rear direction. By opening the door portion 22a, work can be performed in the reaction vessel middle portion 22. In addition, in order to easily perform installation, the reaction vessel upper portion 21 and the reaction vessel lower portion 23 are configured to be opened and closed left and right. The exhaust portion 22d is provided so as to extend to the left direction. In addition, an exhaust opening 22e for exhaust and heat removal is provided at the left end of the exhaust portion 22d.

[0075] An upper end opening 22c is provided at the upper end 22b of the reaction vessel middle portion 22. The reaction vessel upper portion 21 covers the upper end opening 22c in a manner to have a gap in the up-down direction between the upper end 22b. In addition, although not shown, a lower end opening is provided at the lower end of the reaction vessel middle portion 22. The reaction vessel lower portion 23 covers the lower end opening. That is, the reaction vessel middle portion 22 has a cylindrical shape with both ends opened in the up-down direction, and the reaction vessel upper portion 21 and the reaction vessel lower portion 23 respectively function as lids that plug the both ends.

[0076] Figure 4 is a schematic view showing the positional relationship of the reaction vessel middle portion 22, the exhaust pipe 8b, and the outer vessel 30. As Figure 4As shown, the middle portion 22 of the reaction vessel is located inside the outer vessel 30. As shown by arrows, clean air is supplied to the outer vessel 30 from a clean air supply 31. Thus, the space between the middle portion 22 of the reaction vessel and the outer vessel 30 is filled with clean air. In addition, the middle portion 22 of the reaction vessel is provided with a clean air supply hole (not shown), and clean air is also supplied to the middle portion 22 of the reaction vessel as shown by arrows.

[0077] The exhaust portion 22d narrows in the front-rear direction as it goes toward the left direction. The exhaust pipe 8b is provided so as to cover the exhaust portion 22d and the exhaust opening 22e, and intrusion of debris and the like from the middle portion 22 of the reaction vessel into the space between the middle portion 22 of the reaction vessel and the outer vessel 30 is suppressed.

[0078] Figure 5 is a schematic view for explaining thermal expansion in the reaction vessel 120. When the glass particle deposit M is manufactured, radiant heat is emitted from the glass particle deposit M. Due to this radiant heat and the like, the temperature at point A becomes 1200°C or higher, the temperature at point B becomes about 400°C, and the temperatures at points C and D become 200°C or lower. Note that point A is the surface of the glass particle deposit M. Point B is a position within a region Zl of the right side surface of the middle portion 22 of the reaction vessel. The upper end and the lower end of the region Zl are located at positions corresponding to the upper end and the lower end of the glass particle deposit M at the time of completion of the manufacture. Point C is a position within a region Z2 of the right side surface of the middle portion 22 of the reaction vessel. The region Z2 is a region above the region Zl of the right side surface of the middle portion 22 of the reaction vessel. Point D is a position near the exhaust opening 22e of the exhaust portion 22d.

[0079] When there is a temperature difference between point B and point C, the vessel at point B thermally expands. When the middle portion 22 of the reaction vessel thermally expands in the upward direction, for example, the middle portion 22 of the reaction vessel deforms so as to extend in the upward direction. Here, when the middle portion 22 of the reaction vessel is fixed to the upper portion 21 of the reaction vessel, the deformation due to thermal expansion cannot be permitted, and thus breakage can occur. However, as shown in region X in the upper left of Figure 5 As shown in region X in the upper left of

[0080] Similar to region Z2, the temperature in region Z3 is also around 200°C. Region Z3 is the region below region Z1 on the right side of the middle part 22 of the reaction vessel. Therefore, thermal expansion will also occur due to the temperature difference between region Z1 and region Z3. In this case, when thermal expansion occurs, for example, the middle part 22 of the reaction vessel may deform in a downward direction. Here, when the middle part 22 of the reaction vessel is fixed to the lower part 23 of the reaction vessel, deformation caused by thermal expansion cannot be tolerated, which may lead to breakage. However, since the middle part 22 of the reaction vessel is not fixed to the lower part 23 of the reaction vessel, such deformation is permissible even if the middle part 22 of the reaction vessel deforms in a downward direction. It should be noted that even if the middle part 22 of the reaction vessel deforms in a downward direction, its displacement is still permissible by the gap between the upper part 21 of the reaction vessel and the upper end 22b of the middle part 22 of the reaction vessel.

[0081] In addition, such as Figure 5 As shown in region X in the upper left corner, a gap with a distance d1 in the left-right direction is provided between the upper part 21 and the middle part 22 of the reaction vessel. There is no particular limitation on the distance d1, but it is preferably greater than or equal to the amount of displacement in the left-right direction of the middle part 22 of the reaction vessel caused by anticipated thermal expansion. Specifically, the distance d1 is preferably about 1 mm. It should be noted that, considering the small displacement in the left-right direction caused by thermal expansion at the upper end of the middle part 22 of the reaction vessel, the distance d1 can be less than 1 mm or even 0 mm. Reducing the distance d1 improves the airtightness. It should also be noted that the distance d1 can be expressed as the distance between the opposite portions of the upper part 21 and the middle part 22 of the reaction vessel in the left-right direction.

[0082] Furthermore, although not shown in the figure, it is preferable to also provide a gap with a predetermined distance in the left-right direction between the middle part 22 and the lower part 23 of the reaction vessel. Regarding the aforementioned predetermined distance, refer to the description concerning distance d1.

[0083] At point D, due to the temperature difference with the region to the right of point D, for example, the exhaust section 22d deforms in a manner extending to the left. Therefore, at the left end of the exhaust section 22d and... Figure 1 It is also preferable to provide a gap between the exhaust pipes 8b shown, which has a distance greater than the displacement of the exhaust section 22d in the left and right directions caused by the assumed thermal expansion.

[0084] Note that, in the second embodiment, an example in which the reaction vessel 120 is divided into three sections is described, but the present application is not limited to this. The reaction vessel 120 can be divided into at least two or more sections in the vertical direction. Also, the two or more sections after division can have a structure in which the sections are not fixed to each other and at least one section allows deformation due to thermal expansion. For example, a structure in which the reaction vessel upper section 21 and a section in which the reaction vessel middle section 22 and the reaction vessel lower section 23 are integrated can be adopted. Also, a structure in which the reaction vessel upper section 21 and the reaction vessel middle section 22 are integrated and the reaction vessel lower section 23 can be adopted.

[0085] (Method for manufacturing glass particle deposition body)

[0086] The method for manufacturing the glass particle deposition body M according to one embodiment of the present disclosure is a method for manufacturing the glass particle deposition body M using the manufacturing apparatus 1 or the manufacturing apparatus 101 described above. The manufacturing method according to the present disclosure can be applied without particular limitation as long as it is a method for generating glass particles from a siloxane gas and depositing the same, and, for example, an OVD (Outside Vapor Deposition) method, a VAD (Vapor Phase Axial Deposition) method, or an MMD (Multiburner Multilayer Deposition) method can be applied.

[0087] The method for manufacturing the glass particle deposition body M according to one embodiment of the present disclosure includes a step of generating glass particles by causing an oxidation reaction of a siloxane by the burner 16 in the reaction vessel 20 or 120 composed of a metal that does not have corrosion resistance against a corrosive substance. The manufacturing method according to the present embodiment can be applied to a publicly known manufacturing method other than the use of the reaction vessel 20 or 120 composed of a metal that does not have corrosion resistance against a corrosive substance according to the present disclosure.

[0088] The present embodiment has been described above, but it is needless to say that the technical scope of the present application should not be construed limitatively by the description of the embodiment. It will be understood by those skilled in the art that the present embodiment is merely an example and various modifications of the embodiment can be made within the scope of the application recited in the claims. Therefore, the technical scope of the present application should be determined based on the scope of the application recited in the claims and the equivalent scope thereof.

[0089] Explanation of symbols

[0090] 1, 101: (Glass particle deposition body) manufacturing apparatus

[0091] 2: Lifting and rotating device

[0092] 3: support rod

[0093] 4: partition

[0094] 5: starting rod

[0095] 6: abutment portion

[0096] 7: support device

[0097] 8a, 8b: exhaust pipe

[0098] 11: raw material container

[0099] 12: liquid siloxane

[0100] 13: supply pipe

[0101] 14: vaporization portion

[0102] 15: temperature adjustment pipe

[0103] 16: burner

[0104] 20, 120: reaction vessel

[0105] 21: upper portion of reaction vessel

[0106] 22: middle portion of reaction vessel

[0107] 22a: door portion

[0108] 22b: upper end

[0109] 22c: upper end opening

[0110] 22d: exhaust portion

[0111] 22e: exhaust opening

[0112] 23: lower portion of reaction vessel

[0113] 30: outer container

[0114] 31: clean air supply device

[0115] 40: control portion

[0116] d1, d2: distance

[0117] M: glass fine particle deposition body

Claims

1. A glass particle deposit manufacturing apparatus that manufactures a glass particle deposit by depositing glass particles generated from a siloxane, the glass particle deposit manufacturing apparatus comprising: a reaction vessel composed of a metal that does not have corrosion resistance against a corrosive substance; the reaction vessel being divided into at least two or more sections in the axial direction of the glass particle deposit, i.e., the up-and-down direction, when the glass particle deposit is manufactured; the two or more sections having a structure in which the sections are not fixed to each other and at least one section allows deformation caused by thermal expansion when the section thermally expands; a reaction vessel upper portion, a reaction vessel middle portion located below the reaction vessel upper portion, and a reaction vessel lower portion located below the reaction vessel middle portion; the reaction vessel middle portion being open at both ends in the up-and-down direction; the reaction vessel middle portion having an exhaust portion that extends toward the opposite direction of a burner across the glass particle deposit; the exhaust portion being provided with an exhaust opening; one end of an exhaust pipe being configured to cover the exhaust opening, a gap having a distance of more than the displacement amount of the exhaust portion caused by thermal expansion being provided between the exhaust portion and the exhaust pipe; the reaction vessel upper portion covering the upper end opening of the reaction vessel in a manner that has a gap between the upper end of the reaction vessel middle portion and the reaction vessel upper portion in the up-and-down direction; and the reaction vessel lower portion covering the lower end opening of the reaction vessel and supporting the reaction vessel middle portion.

2. The glass particle deposit manufacturing apparatus according to claim 1, wherein the metal includes one or more of stainless steel or iron and aluminum.

3. The glass particle deposit manufacturing apparatus according to claim 1 or claim 2, wherein the metal that constitutes the inner surface of the reaction vessel is mirror finished.

4. The glass particle deposit manufacturing apparatus according to claim 3, wherein the Vickers hardness of the metal that constitutes the inner surface of the reaction vessel is 125 Hv or more. As the two or more sites, there are included:

5. The glass particle deposit manufacturing apparatus according to any one of claims 1 to 4, wherein the corrosive substance is chlorine or hydrochloric acid.

6. A glass particle deposit manufacturing method that manufactures a glass particle deposit by depositing glass particles generated from a siloxane using the glass particle deposit manufacturing apparatus according to any one of claims 1 to 5, the glass particle deposit manufacturing method comprising: a step of causing the siloxane to undergo an oxidation reaction by a burner in a reaction vessel composed of a metal that does not have corrosion resistance against a corrosive substance to generate glass particles. ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​

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