Temperature regulation system and method for uniform temperature field distribution

Abstract

The application discloses a temperature regulation system with uniform temperature field distribution, which comprises a growth chamber for accommodating plants, a temperature unit for detecting and regulating the temperature of the root system environment of the plants, and a culture solution unit capable of delivering culture solution to the plants, wherein the temperature unit comprises a temperature measuring assembly and a temperature adjusting assembly, the temperature adjusting assembly is arranged around the root system of the plants in a manner of directly delivering heat to the corresponding positions of the plants, and the culture solution unit is capable of delivering culture solution to the root system of the plants in a manner of adjusting the temperature of the culture solution, wherein, when the temperature measuring assembly collects data on the temperature of the root system of the plants at multiple different positions in the space of the growth chamber, the temperature adjusting assembly and / or the culture solution unit can exert an influence of adjusting the temperature on the corresponding positions of the root system of the plants based on the temperature of the root system of the plants. The application can make differentiated adjustment on the temperature environment of the root system of the plants distributed adjacently, so as to ensure that the temperature of the root system of the plants is relatively uniform.

Description

Technical Field

[0001] This invention relates to the field of plant cultivation technology, and to a temperature control system and method for uniform temperature field distribution. Background Technology

[0002] Currently, for planting models that incorporate artificial intervention, especially plant factory models for mass production, the planting space is always constructed in a dense manner due to the large scale of planting and the ability to provide the necessary growth environment to plants under artificial intervention. This significantly reduces the area required for production and also offers advantages in terms of streamlined production management. Therefore, planting troughs, planting racks, and other devices are used in plant factories, and planting methods are developing towards verticalization. Furthermore, some plants actually achieve better growth in a vertical direction, such as some upward-growing plants. Vertical planting reduces the competition for growth space between adjacent plants, allowing each target plant to grow in a more advantageous way. Additionally, horizontal planting also exists within the site. Another common nutrient supply method in plant factories is the use of atomization to disperse the nutrient solution into fine water droplets and spray them onto the plants to provide them with the necessary water and nutrients. Generally, at least the roots of the plant need to be provided with nutrients and water for it to absorb the necessary growth resources.

[0003] CN218389189U discloses a combined device for deep and shallow aeroponics and hydroponics, including a nutrient storage chamber and a culture integration chamber installed on the upper end of the nutrient storage chamber. The culture integration chamber includes a hydroponic chamber, a soil culture chamber, and an atomizing chamber installed on the upper end of the hydroponic chamber. A liquid guide pipe is connected between the nutrient storage chamber and the culture integration chamber, and the liquid guide pipe passes through the hydroponic chamber and the atomizing chamber respectively. The atomizing chamber includes an atomizing box and a culture pad installed in the atomizing box. Several planting holes for placing plant seedlings are opened on the culture pad. An atomizing rod is installed on the inner side wall of the atomizing box, offset from the planting holes. The atomizing rod extends into the culture pad and has atomizing nozzles for spraying seedlings symmetrically installed on the atomizing rod.

[0004] CN217722320U discloses an intelligent misting planter, including a base, multiple planting plates placed on the base, a top plate, and a controller. The base has a water tank filled with nutrient solution. A misting assembly is provided in the inner cavity, including a water pump, a liquid pipe, and multiple mist nozzles placed on the liquid pipe. Multiple planting holes are provided on the planting plates, and planting cups or sponges are embedded in the planting holes. Plants are cultivated in the planting cups, and their roots extend into the inner cavity. The nutrient solution is sprayed directly onto the plant roots after atomization.

[0005] However, current aeroponic cultivation techniques still have the following problems. First, during the spraying of the nutrient solution onto the roots, the solution diffuses into the air in the form of tiny droplets. These droplets have a large surface area and evaporate quickly, causing a drop in ambient temperature. In existing aeroponic systems, it is generally desirable to maintain the root zone at a temperature suitable for plant growth. However, the heat absorption caused by frequent spraying will result in the root temperature being lower than the expected or preset temperature, affecting the optimal growth conditions for the plant. Furthermore, in existing aeroponic systems, the nutrient solution nozzles are typically spaced regularly or irregularly. The heat generated by the spraying and evaporation of the nutrient solution creates an uneven temperature field in the plant root zone, resulting in localized temperature differences among the plant roots in different locations within the growth chamber, leading to variations in plant growth status. Secondly, for aeroponic plants, root temperature affects their growth patterns; even plants under the same cultivation conditions can exhibit unexpected differences in growth behavior depending on their location within the growth chamber, making it difficult to manage the uniformity of plant growth. Additionally, because the nutrient solution is repeatedly recirculated, its temperature gradually deviates from the preset initial temperature without intervention, increasing the fluctuations in the ambient temperature caused by the nutrient solution throughout the growth space. In particular, some specific plant varieties are highly sensitive to temperature changes; even slight differences or frequent temperature fluctuations can lead to growth stagnation or abnormalities.

[0006] Furthermore, on the one hand, there are differences in understanding among those skilled in the art; on the other hand, the applicant studied a large number of documents and patents when making this invention, but due to space limitations, not all details and contents were listed in detail. However, this does not mean that the present invention does not possess the features of these prior art. On the contrary, the present invention already possesses all the features of the prior art, and the applicant reserves the right to add relevant prior art to the background art. Summary of the Invention

[0007] High root temperatures exacerbate root respiration, hindering plant growth. Existing technologies offer solutions for precisely controlling root temperature. For example, patent CN107027404A discloses a cultivation device for precise root temperature control. This device includes a cultivation trough, a nutrient solution tank for storing and regulating its temperature, and a built-in water pump connected to the cultivation trough via a supply pipe. A return pipe connects the bottom of the trough to the nutrient solution tank. Adjusting the temperature of the nutrient solution supplied to the cultivation trough alters the root temperature. This technology provides a cultivation device and method for precisely controlling root temperature, addressing the limitations of existing cultivation methods that fail to achieve precise and uniform root temperature control and address root temperature fluctuations caused by irrigation and fertilization. In existing plant cultivation systems, nutrient solution nozzles are typically spaced at regular or irregular intervals. The heat generated by the spraying and evaporation of the nutrient solution creates an uneven temperature field in the plant root zone, resulting in localized temperature differences among the plant roots located in different parts of the growing chamber, thus leading to variations in plant growth status. However, this technical solution can only regulate the water temperature of a uniform nutrient solution tank and cannot provide differentiated regulation based on the specific needs of different plants, resulting in a low level of precision in the overall root temperature control system. To address the shortcomings of existing technologies, this invention provides a temperature control system with a uniform temperature field distribution, comprising: a growth chamber for accommodating planted plants; a temperature unit for detecting and controlling the temperature of the plant root environment; and a nutrient solution unit capable of delivering nutrient solution to the plants. The temperature unit includes a temperature measuring component and a temperature regulating component. The temperature regulating component is configured to be positioned around the plant roots based on directly transferring heat to corresponding locations on the plant. The nutrient solution unit is configured to deliver nutrient solution to the plant roots at least in a manner that adjusts the temperature of the nutrient solution. When the temperature measuring component collects data on the temperature of the plant roots at multiple different locations within the growth chamber, the temperature regulating component and / or the nutrient solution unit can apply temperature adjustment to the corresponding plant root locations based on the plant root temperature conditions.

[0008] Existing technologies have developed solutions for regulating the ambient temperature of different plant roots by using independently controlled temperature control devices. For example, patent document CN111183832A discloses a non-contact, temperature-adjustable integrated crop root culture device. This device uses an integrated base as a mounting base for the root boxes, placing them vertically on the base. A heating device extending vertically from the integrated base provides independent heating to each root box. This solution isolates the inner cylinder of the root box from the soil or medium contained within, thereby achieving non-contact independent temperature control and enabling control experiments at different temperatures through its integrated structure. However, the ambient temperature of plant roots at different locations within the same root box may still vary. This solution only detects and adjusts the overall temperature under a single environment, and cannot separately adjust for temperature differences along the longitudinal or lateral extension of the plant roots. Furthermore, this technical solution primarily achieves temperature adjustment through a non-contact temperature control device, which is completely opposite to the temperature adjustment method of this invention, which involves direct contact between the culture medium and the temperature regulating components and the plant roots. Therefore, those skilled in the art would not employ the aforementioned prior art to solve the technical problem of this invention. Compared to the aforementioned prior art, the temperature control system of this invention can set different temperature regulating devices around the plant roots by directly transferring heat to the corresponding locations on the plant. Based on the aforementioned distinguishing technical features, the problem to be solved by this invention can include: how to adjust the corresponding environmental temperature according to different locations of the plant roots. Specifically, plant roots extend longitudinally or laterally, and plant roots have different types of root hairs, namely, growing roots and absorbing roots. Under the influence of the range of lateral extension and the different growth patterns of the two types of roots, there are location-related temperature differences in the roots of adjacent plants, thus causing uneven growth of plant roots. When applying nutrient solutions or water to plants, neglecting the aforementioned temperature differences can lead to further temperature increases in some root areas, causing overheating and root death or resulting in a growth advantage in those areas compared to other parts of the plant. Conversely, it can also cause further temperature decreases in other root areas, leading to delayed growth in those areas. Therefore, this solution proposes establishing a location-dependent temperature acquisition array for plant roots, especially for the roots of adjacent plants, to collect information on the temperature field of the plant roots. Based on the distribution and intersection of multiple temperature fields, the distribution patterns of plant root types and growth states at different locations are identified. Furthermore, additional temperature adjustment components or nutrient solution units are used to adjust the temperature at the corresponding locations.In particular, by utilizing the regulatory effect of the culture medium unit on the growth status of plant roots, the growth process of plant roots is adjusted while regulating root temperature, which significantly reduces interference between adjacent plant roots and significantly improves the temperature uniformity and growth stability of plant roots.

[0009] Preferably, the temperature processing component is configured to establish a correlation between temperature and time based on multiple historical temperature data accumulated during the interval between two applications of culture medium to the plant roots, predict the root temperature change trend during the next interval based on the correlation, and adjust the detection interval of the temperature measurement component based on the change trend.

[0010] Compared with the prior art, the temperature processing component of the present invention can predict subsequent root temperature changes based on historical temperature data during temperature regulation. Based on the aforementioned distinguishing technical features, the problem to be solved by the present invention can include: how to reduce the detection frequency of the temperature measurement component while ensuring detection accuracy. Furthermore, since plant root growth is cyclical, the root temperature of plants is inconsistent at different times. At certain times, the temperature of plant roots needs to be closely monitored, such as when plants are photosynthesizing during the day, the temperature changes caused by the absorption of water or nutrients by their roots need to be closely monitored. At other times, temperature changes are relatively unimportant, such as during the plant's resting phase. This system can obtain historical temperature data at different times based on the array-set temperature acquisition component, thereby obtaining the temporal trend of plant root temperature changes. Based on the trend, the system can predict the temperature change at the next time point, thereby adjusting the detection interval of the temperature detection component in advance, that is, adjusting the detection frequency of the temperature detection component. When a large predicted temperature change is encountered, the detection frequency of the temperature detection component is increased; when a small predicted temperature change is encountered, the detection frequency of the temperature detection component is decreased. Therefore, the energy consumption of temperature detection components in this system can be further reduced, significantly improving the system's endurance and thus significantly reducing the overall energy consumption of the plant cultivation system. In existing technologies, due to the large number of plants in greenhouses, temperature acquisition components are often chosen from lower-cost models, resulting in relatively short lifespans; additionally, there are instances where temperature acquisition components utilize built-in power supplies. The harsh environmental conditions within plant factories lead to a higher failure rate for temperature acquisition components for these reasons. This solution, through the aforementioned methods, intelligently adjusts the operating frequency of the temperature acquisition components, significantly extending their expected lifespan, significantly reducing energy consumption, and improving endurance.

[0011] Preferably, based on the detection of temperature components at multiple distribution locations in space, the temperature fields of adjacent plant roots and the cross temperature fields are obtained, forming a cross temperature field. The culture medium unit adjusts at least one of its operating parameters based on the field-related information collected by the temperature unit, so that when the culture medium with temperature is introduced into the plant roots in at least one subsequent time period, the temperature value in the cross temperature field can be as required to be greater or less different from the adjacent temperature fields.

[0012] Compared with the prior art, the culture medium unit of the present invention can adjust the relevant temperature parameters of the culture medium according to the temperature distribution of plant roots at different adjacent locations. Based on the above distinguishing technical features, the problem to be solved by the present invention may include: how to reduce the temperature field difference between adjacent plant roots when new culture medium is added. Specifically, on the one hand, plants need to develop absorptive roots to promote their absorption of nutrients, but the expansion of absorptive roots will affect the root development of adjacent plants, especially since absorptive roots are formed in a lateral expansion manner. In the case of dense planting, the absorptive roots of adjacent plants are prone to contact around the plant, resulting in growth competition at this location, that is, adjacent plant roots compete for nutrients in the environment, thereby causing some disadvantaged plants to grow slowly and develop poorly. On the other hand, plants also need to develop growth roots as soon as possible in the early stage of growth so that they can obtain better growth and development advantages in the early stage. However, excessive development of growth roots also has negative effects on plants. Since growth roots do not have the ability to absorb and transform nutrients, it is difficult for plants to obtain sufficient substances required for growth, and it will cause the upper part of the plant to only grow upwards, thus delaying the development of flowers and fruits. This solution specifically detects the temperature field of the plant root environment and designs at least one atomizing nozzle that can cover the entire field for each field. This allows for the direct adjustment of the temperature field temperature using atomized liquid, while also regulating the growth status of plant roots in the relevant field based on the adjustment of the atomized nutrient solution. This deeply regulates the root temperature environment in terms of root growth, enabling plant roots to grow evenly in a uniform temperature environment.

[0013] Preferably, the culture medium unit introduces the culture medium into the plant roots through multiple atomizing nozzles. These atomizing nozzles, each with a spray range, are configured to cover the intersection of the plant's growing root area and the plant's absorbing root area, so that a single atomizing nozzle can apply a culture medium with at least one adjustable parameter to a specific area of ​​the plant's root system.

[0014] Compared with the prior art, the culture medium unit of the present invention can achieve full coverage of the plant root system through multiple atomizing nozzles. Based on the above-mentioned distinguishing technical features, the problem to be solved by the present invention can include: how to reduce the influence of a single atomizing nozzle on the overall plant root temperature. Specifically, during the process of spraying the culture medium onto the plant roots, the culture medium diffuses into the air in the form of tiny droplets, which have a large specific surface area and are easily and rapidly evaporated, causing a decrease in ambient temperature. When using a single atomizing nozzle to apply the culture medium, the ambient temperature of the entire plant root system varies greatly, and it is impossible to finely adjust the ambient temperature of the plant roots in adjacent areas. In existing aeroponic systems, it is generally desirable to maintain the plant root area at a temperature suitable for plant growth. The single atomizing nozzle setting can only achieve the expected temperature adjustment by frequently applying the culture medium. However, the evaporation and heat absorption caused by frequent spraying will lead to the plant root temperature being lower than the expected or preset temperature, affecting the optimal growth conditions for the plant. Therefore, the conventional setting method of the prior art cannot achieve accurate plant root temperature adjustment. Furthermore, each atomizing nozzle of the present invention corresponds to a temperature field or cross-field, so that the temperature of each field can be adjusted individually. More importantly, the plant root temperature and growth status corresponding to each field can be adjusted independently, so that different areas of the root system of a single plant, as well as the cross-field of the root systems of multiple adjacent plants, can grow in a uniform and reasonable manner.

[0015] Preferably, it further includes a processing control unit, which is communicatively connected to the temperature unit to obtain temperature field information and cross-temperature field information, and compares a first high temperature value in the temperature field information with a second high temperature value in the cross-temperature field adjacent to the temperature field, and controls at least one operating parameter of the culture medium unit based on the comparison result.

[0016] Preferably, when the first high temperature value is greater than the second high temperature value, the processing control unit adjusts the concentration of the culture solution applied to the corresponding plant root region in the culture solution unit to reduce the concentration of the culture solution applied to the absorbing root intersection region, and increases the flow rate of the culture solution applied to the absorbing root intersection region, without adjusting the temperature of the culture solution;

[0017] When the first high temperature value is greater than the second high temperature value, and the second high temperature value is further lower than the low threshold of the temperature warning, the processing control unit makes adjustments to reduce the flow rate of the culture medium applied to the corresponding plant root region, increase the flow rate of the culture medium applied to the absorbing root intersection region, and at the same time raise the temperature of the culture medium.

[0018] Preferably, when the first high temperature value is less than the second high temperature value and the second high temperature value is greater than the warning temperature, the processing control unit makes an adjustment to increase the spray flow rate of the culture medium applied by the culture medium unit to the absorbing root intersection area, without adjusting the culture medium temperature;

[0019] When the first highest temperature value is lower than the second highest temperature value, and the second highest temperature value is further higher than the warning temperature value, the processing control unit adjusts the flow rate of the culture medium applied to the absorbing root intersection area by the culture medium unit, thereby reducing the flow rate of the culture medium and activating the temperature control component in the temperature unit. Compared with the prior art, the processing control unit of the present invention can acquire temperature field information and intersection temperature field information, and compare the first highest temperature value in the temperature field information with the second highest temperature value in the adjacent intersection temperature field, and control the relevant operating parameters of the culture medium unit based on the comparison result. Based on the above distinguishing technical features, the problem to be solved by the present invention may include: how to ensure the stability between temperature control and nutrient supply. Specifically, through the above setting, the present invention enables the increased flow rate of the spray to quickly flow through the absorbing root intersection area, carrying away a certain amount of heat without affecting the content of nutrients absorbed by the absorbing roots per unit time, thereby enabling the plant absorbing roots to reduce the threat to the plant body caused by its temperature rise in a way that maintains good absorption.

[0020] Preferably, the temperature measurement component is configured to continuously monitor the surface of plant roots at different spatial heights within the growth chamber in a stepwise manner, and the temperature regulation component compensates the ambient temperature at the corresponding location in a stepwise manner based on the feedback from the temperature measurement component, so that the temperature fluctuation is within the temperature difference threshold.

[0021] Preferably, the temperature unit further includes a temperature processing component, which controls the temperature regulating component to apply the temperature adjustment effect to the plant root system when the difference between the second temperature detected by the temperature measuring component and the preset first temperature is greater than a preset temperature difference threshold.

[0022] A method for temperature control with uniform temperature field distribution, the method comprising:

[0023] When data on plant root temperatures at multiple different locations within the growth chamber are collected, the temperature is adjusted at the corresponding plant root locations based on the plant root temperature by directly transferring heat to the plants and / or by changing at least one parameter of the culture medium.

[0024] The advantages of this invention are:

[0025] 1. By regulating the temperature unit, the optimal temperature of plant roots in different locations within the growth chamber is maintained before and after the nutrient solution is sprayed. In other words, the nutrient solution mist sprayed from the atomizing nozzle will not significantly affect the temperature of the roots, allowing the plant roots to grow in a pre-set temperature environment and maintain the best growth condition.

[0026] 2. A stepped temperature control system is set up, which can adjust the temperature according to the actual situation of the plant root system at different steps. This can optimize energy allocation, avoid energy waste, and maintain the uniformity of plant growth at different steps while reducing the running time of temperature monitoring components in the later stage of system operation.

[0027] 3. By maintaining the temperature of the culture medium, the factor of excessive temperature difference caused by the recycling of the culture medium itself is eliminated, thus reducing the temperature fluctuation in the growth chamber. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the control system provided by the present invention;

[0029] Figure 2 This is a schematic diagram of the component relationships of the temperature unit of the present invention.

[0030] List of reference numerals

[0031] 100: Temperature unit; 200: Culture medium unit; 300: Growth chamber; 400: Root system; 500: Plant; 101: Temperature measurement component; 102: Temperature regulation component; 103: Temperature treatment component; 201: Atomizing nozzle; 202: Return water pipe; 203: Culture medium replenishment pipe; 204: Circulation pump; 205: Temperature regulator; 206: Water inlet pipe. Detailed Implementation

[0032] The following is in conjunction with the appendix Figure 1 and 2 Please provide a detailed explanation.

[0033] Currently, for planting models that incorporate artificial intervention, especially the Plant500 factory model for mass production, the planting space for Plant500 is always constructed in a dense manner due to the large scale of planting and the ability to provide the necessary growth environment for Plant500 under artificial intervention. This significantly reduces the area required for production and also offers advantages in terms of streamlined production management. Therefore, planting troughs, planting racks, and other devices are used in Plant500 factories, and planting methods are developing towards verticalization. Furthermore, some Plant500 species can actually achieve better growth in a vertical direction, such as some upward-growing Plant500 species. Vertical planting can reduce the competition for growth space between adjacent Plant500 species, allowing each target Plant500 to grow in a more advantageous manner. Additionally, there are also cases of horizontal planting within the site. In addition, a common nutrient supply method in plant 500 factories involves atomizing the nutrient solution into fine water droplets and spraying them onto the plants to provide them with the necessary water and nutrients. Generally, at least the roots of the plants need to be supplied with nutrients and water to allow them to absorb the necessary growth resources. However, current aeroponic cultivation technology still has the following problems. First, during the spraying of the nutrient solution onto the roots, the solution diffuses into the air in the form of tiny droplets. These droplets have a large surface area and evaporate quickly, causing a drop in ambient temperature. In existing aeroponic systems, it is generally desirable to maintain the root zone of the plants at a temperature suitable for plant growth. However, the heat absorption caused by frequent spraying will result in the root temperature of the plants falling below the expected or preset temperature, affecting the optimal growth conditions for the plants. Furthermore, in existing aeroponic systems, the nutrient solution nozzles are typically spaced regularly or irregularly. The heat generated by the spraying and evaporation of the nutrient solution creates an uneven temperature field around the roots of the plants (500), resulting in localized temperature differences among the roots (400) located at different positions within the growth chamber (300), leading to variations in the plant's growth status. Secondly, for plants (500) grown in aeroponic systems, the temperature of the roots (400) can cause unexpected differences in growth patterns even under the same cultivation conditions, making it difficult to manage the uniformity of plant growth. Additionally, because the nutrient solution is repeatedly recycled, its temperature will gradually deviate from the preset initial temperature without intervention, increasing the fluctuations in the ambient temperature caused by the nutrient solution throughout the growth space. In particular, some specific plant varieties (500) are highly sensitive to temperature changes; even slight differences or frequent temperature fluctuations can lead to growth stagnation or abnormalities.

[0034] When applying nutrient solution to the rhizosphere of plant 500, one or more atomizing nozzles 201 are used to deliver the atomized nutrient solution outward. Therefore, around the nozzle, based on aerodynamics and the movement of the droplets, there exists a nutrient solution range that at least surrounds the nozzle. This can also be referred to as the atmosphere of nutrient solution droplets. The portion of the plant 500 rhizosphere within this nutrient solution range can receive the nutrient solution droplets, thus achieving absorption. Regarding the rhizosphere of plant 500, regardless of whether the heat is generated by the evaporation of the nutrient solution or by the physiological reactions of the root cells, the temperature generally exhibits a gradient change, or at least a variation, outward from the rhizosphere of plant 500. Therefore, in one embodiment, this solution provides a temperature control system with a uniform temperature field distribution. The system includes a temperature unit 100, which is used to detect the temperature of the plant 500 rhizosphere and to regulate or assist in regulating the temperature of the plant 500 rhizosphere. In detail, the temperature unit 100 includes a temperature measuring component 101, which can be a temperature probe, such as a resistance thermometer or an infrared sensor. The temperature measuring component 101 can only measure the temperature within a certain range around it, typically only the temperature value of a single point. Therefore, configuring multiple temperature measuring components 101 at multiple locations allows for the acquisition of temperatures at different locations, thus forming a temperature field based on the relationship between space and temperature. The temperature field can be roughly described by the relationship between location and the corresponding temperature value. Based on the above, due to the interaction between the plant roots 400 and the culture medium, a temperature field exists centered on the plant roots 400. Adjacent plant roots 400 have multiple adjacent temperature fields, resulting in overlapping regions between different temperature fields, which can be called overlapping temperature fields. There is also a certain interaction between the overlapping temperature fields and the adjacent portions of the plants 500. Under normal circumstances, plant 500 has two types of roots during its growth: growth roots and absorptive roots. Growth roots mostly grow vertically downwards, while absorptive roots mostly grow horizontally. Growth roots mainly ensure the stability of plant 500 in the soil or growing medium and play a role in the conduction of substances, while absorptive roots absorb and transform beneficial nutrients in the soil or growing medium.On the one hand, plant 500 needs the development of absorbing roots to promote its absorption of nutrients. However, the expansion of absorbing roots can affect the development of the root systems 400 of adjacent plants 500, especially since absorbing roots are formed in a lateral expansion manner. In dense planting, the absorbing roots of adjacent plants 500 are prone to contact around the perimeter of the plant 500, leading to growth competition in that area. That is, adjacent plant roots 400 compete for nutrients in the environment, resulting in some disadvantaged plants 500 growing slowly and developing poorly. On the other hand, plant 500 also needs to develop growth roots as soon as possible in the early stages of growth to gain a better growth advantage. However, excessive development of growth roots also has a negative impact on plant 500. Since growth roots do not have the ability to absorb and transform nutrients, it is difficult for plant 500 to obtain sufficient substances for growth, and it will cause the upper part of the plant 500 to only grow upwards, delaying the development of flowers and fruits. Therefore, the root system 400 of plant 500 and their growth status should be controlled within an optimal range to improve the overall growth level of plant 500.

[0035] Furthermore, plant roots 400 undergo biochemical reactions during nutrient absorption and transformation. Generally, these reactions are exothermic, releasing heat around the absorbing roots. Some of this heat enters the air directly, while some is absorbed by droplets of the nutrient solution attached to or floating near the absorbing roots, causing the droplets to vaporize or heat up. Regardless of the method, the temperature around the absorbing roots exhibits a regionally high value. Moreover, based on the horizontal contact between adjacent plant roots 400, the more overlapping areas of the roots 400, the higher the level of heat release, and correspondingly, the higher the extreme temperature value in these overlapping areas. Therefore, based on the detection of the cross-temperature field, we can first understand the mutual influence between the rhizospheres of adjacent plants (500 and 500) by observing the actual absorption of plant 500. This provides an intuitive and accurate basis for judgment based on plant 500 absorption, enabling rapid and accurate subsequent adjustments. Secondly, temperature also has a reciprocal effect on plant roots (400). Excessively high ambient temperatures can affect the growth, development, and nutrient absorption levels of plant roots (400). Therefore, it is still necessary to control the temperature of plant roots (400) to prevent the roots from stopping growth or withering due to heat.

[0036] Based on the above, the system further includes a culture medium unit 200 for providing culture medium to the plant 500. Preferably, the culture medium unit 200 is configured to provide culture medium to the plant 500 in an atomized manner. Preferably, the culture medium unit 200 has multiple nozzles disposed within the growth chamber 300, and each nozzle can cover a certain spray range, with at least one nozzle capable of covering the intersection of the plant 500's root growth region and the plant 500's absorbing root region. Preferably, the multiple nozzles can be individually controlled to open or close, and / or their flow rates can be individually adjusted. Preferably, the system is equipped with a processing control unit, which is communicatively coupled to the temperature unit 100 to acquire temperature field information and cross-temperature field information detected by the latter, and compares a first high-temperature value in the temperature field information with a second high-temperature value in the cross-temperature field adjacent to the temperature field. In this scheme, the growing root region of plant 500 is approximated as the temperature field region, and the absorbing root crossing region of plant 500 is approximated as the crossing temperature field region. That is, the temperature of the root at that location can be reflected by the values ​​between the two temperature field regions mentioned above.

[0037] When the first high temperature value is greater than the second high temperature value, the processing control unit adjusts the concentration of the culture solution applied to the root region of the corresponding plant 500 in the culture solution unit 200 to decrease, and increases the flow rate of the culture solution applied to the cross region of the absorbing roots, without adjusting the temperature of the culture solution.

[0038] When the first high temperature value is greater than the second high temperature value, and the second high temperature value is further lower than the low threshold of the temperature warning, the processing control unit makes adjustments to reduce the flow rate of the culture medium applied by the culture medium unit 200 to the root region of the corresponding plant 500, increase the flow rate of the culture medium applied to the cross region of the absorbing roots, and at the same time raise the temperature of the culture medium.

[0039] If the first highest temperature value is lower than the second highest temperature value, and the second highest temperature value is lower than the warning temperature, the spraying of the culture medium will continue normally without any additional operations.

[0040] When the first high temperature value is lower than the second high temperature value, and the second high temperature value is higher than the warning temperature, the processing control unit adjusts the flow rate of the culture solution spray applied by the culture solution unit 200 to the cross region of the absorbing roots to increase, without adjusting the culture solution temperature. This allows the increased flow rate of the spray to quickly pass through the cross region of the absorbing roots, carrying away a certain amount of heat without affecting the amount of nutrients absorbed by the absorbing roots per unit time. Thus, the absorbing roots of plant 500 can maintain good absorption while reducing the threat of temperature rise to the plant 500 itself.

[0041] When the first high-temperature value is lower than the second high-temperature value, and the second high-temperature value is further higher than the warning temperature value, the processing control unit adjusts the flow rate of the culture medium applied by the culture medium unit 200 to the absorbing root intersection region and activates the temperature control component in the temperature unit 100 to blow the material in the absorbing root intersection region to the region where the growing roots are located in a purging manner. The temperature control component can be composed of components such as a fan or a jet assembly, which can force the fluid to perform a certain directional movement. In the above scheme, the culture medium is blown into the area where the growing roots are located, allowing the growing roots of plant 500 to be exposed to a higher moisture and nutrient environment. This guides the growing roots of plant 500 to gain an advantage in the competition for nutrients with the absorbing roots, thereby inhibiting the continued expansion of the absorbing roots within plant 500 in a physiologically compliant manner. Firstly, this avoids the absorbing roots of plant 500 from continuing to expand laterally and coming into contact with and becoming entangled with the root systems of other plants 400, thus preventing growth competition between plants 500, or preventing the absorbing roots of two plants 500 from getting close to each other and absorbing nutrients, causing heat fusion and accumulation. Secondly, compared to relying on pruning, knotting, or spraying chemicals to prevent the absorbing roots of plant 500 from expanding outward, this method is more effective. This method, while saving labor costs, utilizes the mutual constraints between heat and nutrient solution absorption, as well as the constraints between the plant's growth roots and absorbing roots. Heat is directed to the relatively cooler growth roots to promote water or nutrient absorption, thereby inhibiting the development of absorbing roots. Therefore, it can regulate the expansion of absorbing roots by utilizing the nutrient flow trends within the plant, preventing further expansion. This method eliminates the need for manual intervention in the direction of the plant's roots for extended periods, preventing plant rejection or damage caused by human intervention. Especially for high-value plant species, this method significantly reduces the risk of losses due to adjustments.

[0042] For the root system 400 of plant 500, the growth and absorption of its vegetative roots should be a relatively balanced process. Since the vegetative roots dominate the absorption of a relatively large portion of the nutrient resources, the heat generated there is slightly higher than that of the vegetative roots. However, generally speaking, the overall temperature field of the plant root system 400 should be slightly higher at the edge of the vegetative roots than in the middle of the vegetative roots. Therefore, based on the specific situation of each plant 500, reasonable temperature ranges for vegetative and vegetative roots can be obtained for each plant 500 through pre-testing experiments, prior experience, and artificial settings. If the actual temperature at a corresponding location is found to be too high or too low, it may be because the absorption efficiency of one type of root suddenly becomes significantly higher than that of the other at a certain time. This will lead to a continuous accumulation of heat at a certain location, causing root damage due to heat. On the other hand, it indicates that survival resources are moving on a large scale to the part with higher absorption, affecting the normal growth and development of the other part. Therefore, based on the need for balanced growth, it is necessary to limit the absorption intensity of any part of the plant 500 root system to prevent any part of the plant 500 from having an excessive growth advantage.

[0043] The first or second highest temperature value can be the highest temperature value in the temperature field or cross-temperature field, or the average of multiple relatively high values.

[0044] Preferably, a return water system is installed at the bottom of the growth chamber 300 to collect nutrient solution sprayed into the environment but not absorbed by the plant roots 400. This return water system is connected to a return water pipe 202, which is equipped with a circulation pump 204. The circulation pump 204 extracts the nutrient solution deposited at the bottom of the growth chamber 300 and pumps it back to the return water pipe 202. One end of the return water pipe 202 is connected to a nutrient solution replenishment end, which can replenish nutrient solution or water as needed. Preferably, a temperature regulator 205 is also installed on the return water pipe 202. The temperature regulator 205 can control and adjust the temperature of the nutrient solution, thereby enabling the plant roots 400 to absorb the nutrient solution at an optimal absorption temperature through temperature transfer, ensuring a suitable absorption temperature.

[0045] Preferably, such as Figure 1As shown, plants 500 within the growth chamber 300 can be planted vertically, for example, using multi-layer planting baskets. In this case, the roots of the plants 500 create a vertical drop between them. Simultaneously, to prevent mutual interference and entanglement between the plant roots 400, the plants 500 are also spaced horizontally. Thus, the roots of the plants 500 are arranged horizontally, with some higher and some lower. Preferably, to reduce planting space and concentrate the spraying area of ​​planting water, a preferred planting structure is that the plants 500 are planted in a conical arrangement. That is, a planting rack for planting the plants 500 is constructed in a conical structure, and the plants 500 are planted on the conical planting rack as needed. The roots of the plants 500 fall vertically into the conical planting rack, and the adjacent distance between the roots of multiple plants 500 near the bottom of the cone is relatively wide, while the adjacent distance between the roots of multiple plants 500 near the top of the cone is relatively close. One purpose of this design is to concentrate the spraying area of ​​planting water or liquid. Specifically, when the plant 500 is configured for cone-shaped planting, only one atomizing nozzle 201 located at or near the central axis of the cone is needed within the cone-shaped planting rack structure to meet the water or liquid (which can refer to nutrient solution) requirements of all the plant 500 roots on the entire cone-shaped planting rack. Furthermore, a ring-shaped temperature regulating component 102 is provided along the circumference of the cone structure. The temperature regulating component 102 can apply additional temperature compensation to the plant 500 roots when needed. Furthermore, the position of the temperature regulating component 102 is determined according to the position of each plant 500 root on the corresponding vertical level. Since the plant 500 roots have a certain length, there are clusters of multiple plant 500 roots at the same height in the vertical direction, typically ring-shaped clusters of plant 500 roots at the same height around the cone. Therefore, the temperature regulating component 102 can be set according to these ring-shaped plant 500 root clusters at different heights, so that each cluster can be compensated for temperature by its corresponding temperature regulating component 102. The atomizing nozzle 201 is connected via a water inlet pipe 206, which is equipped with a temperature regulator 205. The temperature regulator 205 can regulate the temperature of the flowing liquid, for example, by increasing or decreasing the liquid temperature, thereby adjusting the temperature of the liquid entering the water inlet pipe 206 and spraying out from the atomizing nozzle 201. Furthermore, a circulation pump 204 is installed on the pipe to provide the power for the liquid flow within the pipe. The other end of the water inlet pipe 206 is connected to the bottom of the growth chamber 300 (conical planting rack) via a return water pipe 202, used to collect the liquid falling into the growth chamber 300 and return it to the circulation system for the purpose of reusing valuable culture medium. Preferably, the return water pipe 202 may include a filter component inside or at its opening to filter liquid that meets the requirements before it enters the return water pipe 202.Furthermore, a branch of the return water pipe 202 connects to the culture medium replenishment pipe 203, which can supply liquid under controlled conditions to meet needs such as replenishing water or liquid to the culture medium. The atomizing nozzle 201 is positioned at the upper part of the conical growth chamber 300, at least to the extent that it can spray the roots of the plants 500 at the very top of the growth chamber 300.

[0046] Preferably, the temperature measuring component 101 is configured to continuously monitor the surface temperature of the plant root system 400 at different spatial heights within the growth chamber 300 in a stepwise manner, and the temperature regulating component 102 compensates the ambient temperature at the corresponding location in a stepwise manner based on the feedback from the temperature measuring component 101, ensuring that the temperature fluctuations are within the temperature difference threshold. Figure 2 As shown, the temperature unit 100 also includes a temperature processing component 103, which pre-stores a first temperature and a temperature difference threshold. The temperature measurement component 101 is configured as an infrared sensor, and the temperature it monitors is recorded as a second temperature. The temperature processing component 103 can record this temperature and, based on the comparison between the difference between the first and second temperatures and the temperature difference threshold, transmit a variable electrical signal to the temperature regulation component 102. The temperature processing component 103 can establish a time-related correlation (which can be a functional relationship, a relationship curve, etc.) by accumulating multiple historical temperature data during the interval between two applications of nutrient solution from the nutrient solution unit 200 to the roots of the plant 500 (which can be within the spraying interval of the atomizing nozzle 201), predicting the trend of root temperature change in the next interval. This relationship is calibrated using multiple temperature records within this time period, gradually reducing the monitoring time of the temperature measurement component 101. Obviously, different levels of temperature processing components 103 can obtain different relationships. The culture medium unit 200 includes an atomizing nozzle 201 disposed inside the growth chamber 300 and a circulating heating component (composed of a return water pipe 202, a culture medium replenishment pipe 203, a circulating pump 204, a temperature regulator 205, and an inlet water pipe 206) disposed outside the growth chamber 300. The atomizing nozzle 201 is located in a slightly elevated position in the middle of the growth chamber 300, enabling it to spray the culture medium in an atomized form and diffuse it throughout the entire interior space of the growth chamber 300. The circulating heating component can recover the culture medium deposited at the bottom of the growth chamber 300 and resupply it to the atomizing nozzle 201 after circulating heating. The temperature of the heated culture medium is set as a first temperature. A temperature control subunit is provided, with each temperature control subunit arranged in conjunction with the atomizing nozzle 201. The temperature control subunit is configured to perform heat compensation based on the spraying frequency and flow rate of the atomizing nozzle 201, avoiding local temperature fluctuations and overall temperature drops caused by evaporation of the sprayed liquid.

[0047] It should be noted that the specific embodiments described above are exemplary. Those skilled in the art can devise various solutions inspired by the disclosure of this invention, and these solutions all fall within the scope of this invention and its protection. Those skilled in the art should understand that this specification and its accompanying drawings are illustrative and do not constitute a limitation on the claims. The scope of protection of this invention is defined by the claims and their equivalents. This specification contains multiple inventive concepts; terms such as "preferredly," "according to a preferred embodiment," or "optionally" indicate that the corresponding paragraph discloses an independent concept. The applicant reserves the right to file divisional applications based on each inventive concept. Throughout the text, features introduced by "preferredly" are merely optional and should not be construed as mandatory. Therefore, the applicant reserves the right to abandon or delete relevant preferred features at any time.

Claims

1. A temperature regulation system with uniform temperature field distribution, comprising: a growth chamber for accommodating a plant, a temperature unit for detecting and regulating the temperature of the plant root system, a nutrient solution unit for delivering nutrient solution to the plant, a processing control unit communicatively coupled to the temperature unit to obtain temperature field information and cross temperature field region information, characterized in that the temperature unit comprises a temperature measurement component, a temperature processing component and a temperature regulating component, the temperature regulating component is configured to be arranged around the plant root system in a manner of directly delivering heat to the corresponding position of the plant, and the nutrient solution unit is configured to deliver nutrient solution to the plant root system in a manner of adjusting the temperature of the nutrient solution, in the case that the temperature measurement component collects data of the temperature of the plant root system at multiple different positions in the space of the growth chamber, based on the temperature of the plant root system, the temperature regulating component and / or the nutrient solution unit applies an adjusting temperature effect to the corresponding plant root system position, based on the detection of the temperature measurement component at multiple distributed positions in the space, the temperature field formed by processing the temperature field of each growth root area of the adjacent plant root system and the cross temperature field region of the absorbing root cross area in the relationship between space and temperature are obtained, and based on the field related information collected by the temperature unit, the nutrient solution unit adjusts at least one of its working parameters, so that when the nutrient solution with temperature is introduced to the plant root system in the subsequent at least one time period, the temperature value in the cross temperature field region is required to be more different or less different from the adjacent temperature field, based on the comparison of the first high temperature value in the temperature field information with the second high temperature value in the cross temperature field region adjacent to the temperature field, based on the comparison result, the processing control unit controls at least one working parameter of the nutrient solution unit, in the case that the first high temperature value is greater than the second high temperature value, the processing control unit adjusts so that the concentration of the nutrient solution applied to the corresponding plant growth root area in the nutrient solution unit is reduced, and the flow of the nutrient solution applied to the absorbing root cross area is increased, without adjusting the temperature of the nutrient solution; in the case that the first high temperature value is greater than the second high temperature value, and the second high temperature value is further lower than the temperature warning low threshold value, the processing control unit adjusts the flow of the nutrient solution applied to the corresponding plant growth root area in the nutrient solution unit to be reduced, and the flow of the nutrient solution applied to the absorbing root cross area to be increased, while the temperature of the nutrient solution is increased; in the case that the first high temperature value is less than the second high temperature value, and the second high temperature value is greater than the warning temperature, the processing control unit adjusts the flow rate of the nutrient solution spray applied to the absorbing root cross area in the nutrient solution unit to be increased, without adjusting the temperature of the nutrient solution; in the case that the first high temperature value is less than the second high temperature value, and the second high temperature value is further greater than the warning temperature value, the processing control unit adjusts the flow of the nutrient solution applied to the absorbing root cross area in the nutrient solution unit to be reduced and turns on the temperature control component in the temperature unit.

2. The regulation system of claim 1, wherein, The temperature processing component (103) is configured to establish a correlation between temperature and time based on historical temperature data accumulated within the interval time between two times of culture solution application to the plant root system (400), and predict the temperature change trend of the root system (400) within the next interval time based on the correlation, and adjust the detection interval of the temperature measuring component (101) based on the change trend.

3. The regulation system of claim 1, wherein, The culture solution unit (200) introduces the culture solution to the plant (500) roots through a plurality of atomizing nozzles (201), each of which has a spray range and is configured to cover the growth root area of the plant (500) and the intersection area of the absorption roots of the plant (500), so that a single atomizing nozzle (201) can apply culture solution with at least one adjustment parameter to the plant root system (400) in a specific area.

4. The regulation system of claim 1, wherein, The temperature measuring component (101) is configured to continuously monitor the surfaces of the plant root system (400) at different spatial heights in the growth chamber (300) in a stepped manner, and the temperature adjusting component (102) compensates for the ambient temperature at the corresponding position in a stepped manner based on the feedback result of the temperature measuring component (101), so that the temperature fluctuation is within the temperature difference threshold.

5. The regulation system of claim 1, wherein, In the case where the difference between the second temperature detected by the temperature measuring component (101) and the preset first temperature is greater than the preset temperature difference threshold, the temperature processing component (103) controls the temperature adjusting component (102) to apply an adjustment temperature to the plant root system (400) position.

6. A method of using the temperature regulation system of uniform temperature field distribution according to any one of claims 1 to 5, characterized in that, The method comprises: In the case of data collection on the temperature of the plant root system (400) at a plurality of different positions in the space of the growth chamber (300), based on the temperature of the plant root system (400), an adjustment temperature is applied to the corresponding plant root system (400) position by directly transferring heat to the plant (500) and / or by changing at least one parameter of the culture solution.

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