An exposure apparatus

Abstract

The application relates to the field of display processing, and discloses an exposure device which comprises a rack, a support frame, a support assembly, a mask and a projection device. The support frame is arranged on the rack, the middle part of the support frame is provided with a light-transmitting hole, the support assembly is arranged on the support frame and located in the light-transmitting hole, the support assembly divides the light-transmitting hole into a first light-transmitting hole and a second light-transmitting hole arranged in sequence along the left and right sides, the mask is arranged on the support frame, the support frame and the support assembly are used for supporting the mask, the projection device is arranged on the rack and below the first light-transmitting hole and the second light-transmitting hole, the mask is provided with a first mask pattern and a second mask pattern, the first mask pattern and the second mask pattern are arranged above the first light-transmitting hole and the second light-transmitting hole respectively, and the projection device is used for imaging and splicing light passing through the first light-transmitting hole and the second light-transmitting hole together.

Description

Technical Field

[0001] This invention relates to the field of display manufacturing, and in particular to an exposure apparatus. Background Technology

[0002] An exposure machine is a photolithography device that transfers a mask pattern onto a glass substrate, typically used to manufacture display panels. As technology and demands evolve, display panel sizes continue to increase, requiring larger mask sizes as well. To avoid obstructing the exposure of the mask pattern, masks are generally supported only on both sides, leaving the middle area prone to deformation due to its own weight. The larger the mask, the more severe the deformation, placing higher demands on the mask's strength and significantly impacting exposure accuracy. Summary of the Invention

[0003] The technical problem to be solved by the present invention is to solve at least one of the technical problems mentioned above.

[0004] The solution to the technical problem of this invention is:

[0005] An exposure apparatus includes a frame, an illumination device, a support frame, a support assembly, a photomask, and a projection device. The illumination device is mounted on the frame. The support frame is mounted on the frame and has a light-transmitting hole in its center. The support assembly is mounted on the support frame and located within the light-transmitting hole. The support assembly separates the light-transmitting hole to form a first light-transmitting hole and a second light-transmitting hole arranged sequentially from left to right. The photomask is mounted on the support frame. The illumination device illuminates the photomask. Both the support frame and the support assembly support the photomask. The projection device is mounted on the frame and positioned below the first and second light-transmitting holes. The photomask has a first mask pattern and a second mask pattern, which are respectively positioned above the first and second light-transmitting holes. The projection device images light passing through the first light-transmitting hole into a first light spot and light passing through the second light-transmitting hole into a second light spot. The first and second light spots are then stitched together.

[0006] As a further improvement to the above technical solution, the support assembly includes a support beam, a slider, and two slide rails. The two slide rails are respectively fixed on the support frame and extend in the left and right directions. The light-transmitting hole is disposed between the two slide rails. Two sliders are provided, with at least one slider provided on each slide rail. The two ends of the support beam are respectively disposed on the two sliders. The sliders are fixed to the slide rails by screws.

[0007] As a further improvement to the above technical solution, the projection device includes a first offset mirror group, a second offset mirror group, and an exit mirror. The first offset mirror group is disposed below the first light-transmitting hole, and the second offset mirror group is disposed below the second light-transmitting hole. The first offset mirror group is mounted on the frame, and the second offset mirror group is mounted on the frame. The first offset mirror group is used to receive light passing through the first light-transmitting hole and emit light to the exit mirror. The second offset mirror group is used to receive light passing through the second light-transmitting hole and emit light to the exit mirror. The exit mirror is used to receive the light emitted by the first offset mirror group and the second offset mirror group and emit light downwards. After passing through the first offset mirror group, the light emitted from the exit mirror forms a first light spot on the workpiece. After passing through the second offset mirror group, the light emitted from the exit mirror forms a second light spot on the workpiece.

[0008] As a further improvement to the above technical solution, the first mask pattern includes a first pattern and a second pattern, the first pattern and the second pattern are connected to form a rectangle, the second mask pattern includes a third pattern and a fourth pattern, the third pattern and the fourth pattern are connected to form a rectangle, the second pattern and the third pattern are disposed between the first pattern and the fourth pattern, and the second pattern and the third pattern are identical.

[0009] As a further improvement to the above technical solution, the first light spot is in the form of a first right-angled trapezoid, and the second light spot is in the form of a second right-angled trapezoid. The hypotenuse of the first right-angled trapezoid and the hypotenuse of the second right-angled trapezoid are joined together, so that the first right-angled trapezoid and the second right-angled trapezoid are joined together to form a rectangle.

[0010] As a further improvement to the above technical solution, the first offset mirror group includes a first reflecting mirror, a second reflecting mirror, and a third reflecting mirror. The first reflecting mirror is disposed below the first light-transmitting hole. The first reflecting mirror is used to receive the light transmitted through the first light-transmitting hole and reflect it onto the second reflecting mirror. The first reflecting mirror reflects light to the right front. The second reflecting mirror receives the light emitted by the first reflecting mirror and reflects light downwards onto the third reflecting mirror. The third reflecting mirror is disposed below the second reflecting mirror and reflects light backwards onto the exiting mirror. The exiting mirror is located below the first reflecting mirror.

[0011] As a further improvement to the above technical solution, the second offset mirror group includes a fourth reflector, a fifth reflector, and a sixth reflector. The fourth reflector is located below the second light-transmitting aperture. The fourth reflector is used to receive the light transmitted through the second light-transmitting aperture and direct the light towards the fifth reflector to the left and front. After receiving the light emitted from the fourth reflector, the fifth reflector reflects the light downward onto the sixth reflector. The sixth reflector is located below the fifth reflector and between the fourth reflector and the exit mirror. The sixth reflector is a light-transmitting mirror. The light emitted from the sixth reflector intersects with the third reflector. The sixth reflector receives the light emitted from the fifth reflector and reflects it onto the exit mirror.

[0012] As a further improvement to the above technical solution, the light reflected from the fifth reflector is parallel to the light reflected from the third reflector.

[0013] As a further improvement to the above technical solution, the first offset mirror group also includes a wedge mirror group, which is disposed between the second reflector and the third reflector. The light emitted from the second reflector passes through the wedge mirror group and the third reflector in sequence, and the wedge mirror group is used to shift the light to the right.

[0014] As a further improvement to the above technical solution, the wedge mirror assembly includes a distance adjustment device, a first wedge mirror, and a second wedge mirror. The first wedge mirror and the second wedge mirror are respectively disposed on the distance adjustment device. The distance adjustment device is used to adjust the distance between the first wedge mirror and the second wedge mirror. The first wedge mirror and the second wedge mirror are centrally symmetrically arranged. The first wedge mirror and the second wedge mirror are arranged sequentially from top to bottom. The inclined surfaces of the first wedge mirror and the second wedge mirror are arranged facing away from each other.

[0015] The beneficial effects of this invention are as follows: The photomask can be placed on a support frame, and the support assembly supports the middle part of the photomask, thereby effectively supporting the middle part of the photomask and reducing sagging caused by gravity, which would affect the imaging quality after light passes through the photomask. A first mask pattern and a second mask pattern are set on the photomask. Correspondingly, the first mask pattern is positioned directly above the first light-transmitting hole, and the second mask pattern is positioned directly above the second light-transmitting hole. When light is projected from below, the light passes through the first and second photomasks and exits through the first and second light-transmitting holes, thus splitting into two beams. These two beams enter the projection device, where the images of these two beams are stitched together to form a complete pattern. This structure allows for the processing of larger display panels, and effectively prevents the photomask from bending or deforming during processing, resulting in high-quality display panels. Attached Figure Description

[0016] Figure 1 This is a front view of the exposure apparatus of the present invention;

[0017] Figure 2 This is an isometric view of the support frame of the present invention;

[0018] Figure 3 This is a bottom view of the support component of the present invention;

[0019] Figure 4 This is an axonometric view of the projection device of the present invention, the wedge-shaped mirror group is not shown in the figure;

[0020] Figure 5 This is an axonometric view of the projection device of the present invention, the wedge-shaped mirror group is not shown in the figure;

[0021] Figure 6 This is a side view of the projection device of the present invention;

[0022] Figure 7 This is a schematic diagram of the first and second light spots of the present invention being spliced ​​together.

[0023] In the attached diagram: 1-frame, 2-support frame, 3-support assembly, 31-support beam, 32-slider, 33-slide rail, 4-mask, 41-first mask pattern, 42-second mask pattern, 5-projection device, 51-first offset mirror group, 511-first reflector, 512-second reflector, 513-third reflector, 514-first wedge mirror, 515-second wedge mirror, 52-second offset mirror group, 521-fourth reflector, 522-fifth reflector, 523-sixth reflector, 53-exit mirror, 6-illumination device, 71-first light spot, 72-second light spot. Detailed Implementation

[0024] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments have been briefly explained above. Obviously, the described drawings are only a part of the embodiments of the present invention, and not all of them. Those skilled in the art can obtain other design schemes and drawings based on these drawings without creative effort.

[0025] The following will clearly and completely describe the concept, specific structure, and technical effects of the present invention in conjunction with embodiments and accompanying drawings, so as to fully understand the purpose, features, and effects of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, not all of them. Other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are all within the scope of protection of the present invention. Furthermore, all connections / linkages mentioned herein do not simply refer to direct connection of components, but rather to the ability to form a better connection structure by adding or reducing connecting accessories according to specific implementation conditions. The various technical features in the present invention can be combined interactively without contradicting each other.

[0026] Reference Figures 1 to 7 An exposure apparatus includes a frame 1, an illumination device 6, a support frame 2, a support assembly 3, a photomask 4, and a projection device 5. The illumination device 6 is mounted on the frame 1. The support frame 2 is mounted on the frame 1 and has a light-transmitting hole in its center. The support assembly 3 is mounted on the support frame 2 and located within the light-transmitting hole. The support assembly 3 separates the light-transmitting hole to form a first light-transmitting hole and a second light-transmitting hole arranged sequentially from left to right. The photomask 4 is mounted on the support frame 2. The illumination device 6 is used for... The photomask 4 is illuminated by a support frame 2 and a support assembly 3. The support frame 2 and the support assembly 3 are both used to support the photomask 4. The projection device 5 is mounted on the frame 1 and is positioned below the first light-transmitting hole and the second light-transmitting hole. The photomask 4 is provided with a first mask pattern 41 and a second mask pattern 42. The first mask pattern 41 and the second mask pattern 42 are respectively positioned above the first light-transmitting hole and the second light-transmitting hole. The projection device 5 is used to stitch together the images of the light passing through the first light-transmitting hole and the second light-transmitting hole.

[0027] As described above, the illumination device 6 is used to illuminate the mask 4. The mask 4 can be placed on the support frame 2, and the support assembly 3 is used to support the middle part of the mask 4, thereby effectively supporting the middle part of the mask 4 and reducing the sagging of the middle part of the mask 4 due to gravity, which would affect the imaging quality after the light passes through the mask 4. A first mask pattern 41 and a second mask pattern 42 are set on the mask 4. Correspondingly, the first mask pattern 41 is set directly above the first light-transmitting hole, and the second mask pattern 42 is set directly above the second light-transmitting hole. When the light is projected from below, the light passes through the first mask 4 and the second mask 4 and then passes through the first light-transmitting hole and the second light-transmitting hole, thus splitting into two light rays. The two light rays enter the projection device 5 respectively, and the projection device 5 stitches the images of the two light rays together to form a complete pattern. This structure allows for the production of larger display panels, and effectively prevents the mask 4 from bending or deforming during the manufacturing process, resulting in high-quality display panels.

[0028] Traditionally, to prevent the mask 4 from sagging in the middle, the two ends of the mask 4 are pulled to make the mask 4 taut and straight. Although this method can straighten the middle of the mask 4, it is easy to damage the mask 4 during the pulling process.

[0029] The support assembly 3 is used to support the photomask 4 to reduce bending deformation of the photomask 4 under its own weight. In some embodiments, the support assembly 3 includes a support beam 31, a slider 32, and two slide rails 33. The two slide rails 33 are respectively fixed on the support frame 2 and extend in the left and right directions. The light-transmitting hole is disposed between the two slide rails 33. Two sliders 32 are provided, with at least one slider 32 on each slide rail 33. The two ends of the support beam 31 are respectively disposed on the two sliders 32, and the sliders 32 are fixed to the slide rails 33 by screws. The support beam 31 is disposed in the light-transmitting hole, dividing the light-transmitting hole into a first light-transmitting hole and a second light-transmitting hole. The operator can adjust the position of the slider 32 on the slide rail 33 according to the actual size of the first mask pattern 41 and the second mask pattern 42, thereby adjusting the position of the beam so that the size of the first light-transmitting hole and the second light-transmitting hole can be adapted to the first mask pattern 41 and the second mask pattern 42. After adjusting the relative position between slider 32 and slide rail 33, the operator can lock slider 32 and slide rail 33 with screws to prevent relative displacement between them.

[0030] To achieve the goal of fixing the slider 32 and the slide rail 33 with screws, the following implementation method can be adopted: the slider 32 is provided with screw holes for installing screws. When the screw is screwed into the screw holes and tightened, the screw will press against the slide rail 33. The static friction generated between the screw and the slide rail 33 will fix the slider 32 and the slide rail 33 relative to each other.

[0031] Preferably, the support beam 31 extends in the front-to-back direction, and the light-transmitting holes are rectangular. This makes it easier for the operator to determine the size of the first and second light-transmitting holes.

[0032] Of course, in actual use, when designing the first mask pattern 41 and the second mask pattern 42, it is also necessary to consider how to support the mask plate 4. During the design, the size difference between the first mask pattern 41 and the second mask pattern 42 should be minimized, so that the supporting beam 31 can be close to the middle of the mask plate 4 to support the mask plate 4.

[0033] The projection device 5 is used to bring the light transmitted through the first light-transmitting hole and the light transmitted through the second light-transmitting hole closer together, so that the final image is stitched together. In some embodiments, the projection device 5 includes a first offset mirror group 51, a second offset mirror group 52, and an exit mirror 53. The first offset mirror group 51 is disposed below the first light-transmitting hole, and the second offset mirror group 52 is disposed below the second light-transmitting hole. The first offset mirror group 51 is mounted on the frame 1, and the second offset mirror group 52 is mounted on the frame 1. The first offset mirror group 51 is used to receive light passing through the first light-transmitting hole and emit light to the exit mirror 53. The second offset mirror group 52 is used to receive light passing through the second light-transmitting hole and emit light to the exit mirror 53. The exit mirror 53 is used to receive the light emitted from the first offset mirror group 51 and the second offset mirror group 52 and emit light downwards. After passing through the first offset mirror group 51, the light emitted from the exit mirror 53 forms a first light spot 71 on the workpiece. After passing through the second offset mirror group 52, the light emitted from the exit mirror 53 forms a second light spot 72 on the workpiece. The first offset mirror group 51 and the second offset mirror group 52 respectively receive the light transmitted from below the first and second light-transmitting holes. By arranging the first offset mirror group 51 and the second offset mirror group 52, the light transmitted from the first light-transmitting hole and the light transmitted from the second offset mirror group 52 can be brought closer together. Thus, after the light rays emitted from the first offset mirror group 51 and the second offset mirror group 52 reach the exit mirror 53, the exit mirror 53 projects the first light spot 71 and the second light spot 72 downwards onto the workpiece, and the first light spot 71 and the second light spot 72 are joined together.

[0034] To facilitate high-precision stitching of the first light spot 71 formed by the first mask pattern and the second light spot 72 formed by the second mask pattern, in some embodiments, the first mask pattern 41 includes a first pattern and a second pattern, which are connected to form a rectangle. The second mask pattern 42 includes a third pattern and a fourth pattern, which are connected to form a rectangle. The second and third patterns are positioned between the first and fourth patterns, and the second and third patterns are identical. By setting the second and third patterns to be identical, the alignment of the first light spot 71 and the second light spot 72 can be better verified during stitching.

[0035] The first light spot 71 and the second light spot 72 formed by the first mask pattern 41 and the second mask pattern 42 during final imaging need to be stitched together. In use, the exposure equipment also includes a first objective lens and a second objective lens. The first objective lens is positioned below the first light-transmitting aperture, and the second objective lens is positioned below the second light-transmitting aperture. Different magnifications are provided by the objective lenses, thus the sizes of the first mask pattern 41 and the second mask pattern 42 on the mask plate 4 can differ to some extent. However, regardless of the magnification, the angle of the pattern remains unchanged, facilitating subsequent stitching.

[0036] In use, the lighting device 6 emits light, which, after passing through the filtering system within the lighting device 6, yields light of a specific wavelength. The light then passes through the shaping system within the lighting device 6 to form uniform surface illumination of a specific shape, such as a rectangle, trapezoid, or hexagon. In this invention, the lighting system generates two uniform surface illuminations of right-angled trapezoids, which correspond one-to-one with the third and fourth right-angled trapezoids, respectively.

[0037] To ensure a good fit between the first light spot 71 and the second light spot 72, while avoiding overexposure, in some embodiments, the first light spot 71 is a first right-angled trapezoid, and the second light spot 72 is a second right-angled trapezoid. The hypotenuses of the first and second right-angled trapezoids are joined together to form a rectangle. The joined hypotenuses of the first and second right-angled trapezoids allow the operator to verify the fit. Furthermore, since a right-angled trapezoid is composed of a rectangle and a right-angled triangle, the first light spot 71 can be obtained by one light source, while the second light spot 72 can be obtained by another light source. That is, the illumination device 6 generates two beams of light, or the illumination device 6 includes a first light source and a second light source. The first light source illuminates the first mask pattern 41, and the second light source illuminates the second mask pattern 42. The first light source generates uniform surface illumination in the shape of a right trapezoid, and the second light source also generates illumination in the shape of a right trapezoid.

[0038] In the uniform surface illumination of the right-angled trapezoid shape generated by the first light source, the right-angled trapezoid can be divided into a rectangular part and a right-angled triangular part. The rectangular part is used to illuminate the first figure, and the right-angled triangular part is used to illuminate half of the second figure. The hypotenuse of the right-angled triangle coincides with the diagonal of the second figure.

[0039] Similarly, in the uniform surface illumination of the right trapezoid shape produced by the second light source, the right trapezoid can be divided into a rectangular part and a right-angled triangular part. The rectangular part is used to illuminate the fourth figure, and the right-angled triangular part is used to illuminate half of the third figure. The hypotenuse of the right-angled triangle coincides with the diagonal of the third figure.

[0040] In this way, the second and third patterns are each illuminated with half of their area, and the illuminated parts are different from the patterns, which can effectively avoid large-area overexposure caused by illuminating the same part.

[0041] In the uniform illumination of a right-angled trapezoidal surface produced by the first light source, the angle between the lower base and the hypotenuse of the trapezoid is 'a'. In the cloud-like illumination of a right-angled trapezoid produced by the second light source, the angle between the lower base and the hypotenuse of the trapezoid is 'b'. The angles a and b are equal in size.

[0042] The first deflecting mirror group 51 is used to deflect light to the right. In some embodiments, the first deflecting mirror group 51 includes a first reflecting mirror 511, a second reflecting mirror 512, and a third reflecting mirror 513. The first reflecting mirror 511 is disposed below the first light-transmitting hole. The first reflecting mirror 511 receives the light transmitted through the first light-transmitting hole and reflects it onto the second reflecting mirror 512. The first reflecting mirror 511 reflects the light to the right and forward. The second reflecting mirror 512 receives the light emitted from the first reflecting mirror 511 and reflects the light downwards onto the third reflecting mirror 513. The third reflecting mirror 513 is disposed below the second reflecting mirror 512 and reflects the light backwards onto the exiting mirror 53, which is located below the first reflecting mirror 511. In use, the amount of light deflection to the right is determined by the tilt angle of the first reflecting mirror 511 and the distance between the first reflecting mirror 511 and the second reflecting mirror 512. The third reflecting mirror 513 receives the light rays emitted downwards from the second reflecting mirror 512 and transfers these light rays into the exiting mirror 53.

[0043] The second offset mirror group 52 is used to deflect light to the left. In some embodiments, the second offset mirror group 52 includes a fourth reflector 521, a fifth reflector 522, and a sixth reflector 523. The fourth reflector 521 is located below the second light-transmitting aperture. The fourth reflector 521 is used to receive the light transmitted through the second light-transmitting aperture and direct the light towards the fifth reflector 522 to the left and forward. After receiving the light emitted from the fourth reflector 521, the fifth reflector 522 reflects the light downward onto the sixth reflector 523. The sixth reflector 523 is disposed below the fifth reflector 522 and between the fourth reflector 521 and the exit mirror 53. The sixth reflector 523 is a light-transmitting mirror. The light emitted from the sixth reflector 523 intersects with the third reflector 513. The sixth reflector 523 receives the light emitted from the fifth reflector 522 and reflects it onto the exit mirror 53. In use, the amount of light deflection to the right is determined by the tilt angle of the fourth reflector 521 and the distance between the first and second reflectors 512. The third reflector 513 receives the light rays emitted downward from the second reflector 512 and transfers these rays into the exit mirror 53.

[0044] In practical use, the first reflector 511 and the second reflector 512 are not at the same height, nor are the fifth reflector 522 and the fourth reflector 521. This allows the second reflector 512 and the fifth reflector 522 to avoid each other and prevent interference. Furthermore, the first reflector 511 and the fourth reflector 521 are usually set at the same height for ease of installation.

[0045] To facilitate uniform light emission from the exiting mirror 53, in some embodiments, the light reflected from the fifth reflecting mirror 522 is parallel to the light reflected from the third reflecting mirror 513.

[0046] To further increase the amount of light that the first offset mirror group 51 can deflect, thereby adapting to the manufacture of display panels of more sizes and reducing the distance between the first reflector 511 and the second reflector 512, in some embodiments, the first offset mirror group 51 further includes a wedge mirror group, which is disposed between the second reflector 512 and the third reflector 513. Light rays emitted from the second reflector 512 pass sequentially through the wedge mirror group and the third reflector 513, and the wedge mirror group is used to shift the light rays to the right.

[0047] A wedge-shaped mirror assembly is used to translate light rays. In some embodiments, the wedge-shaped mirror assembly includes a distance adjustment device, a first wedge-shaped mirror 514, and a second wedge-shaped mirror 515. The first wedge-shaped mirror 514 and the second wedge-shaped mirror 515 are respectively disposed on the distance adjustment device, which is used to adjust the distance between the first wedge-shaped mirror 514 and the second wedge-shaped mirror 515. The first wedge-shaped mirror 514 and the second wedge-shaped mirror 515 are centrally symmetrically arranged, and are arranged sequentially from top to bottom. The inclined surfaces of the first wedge-shaped mirror 514 and the second wedge-shaped mirror 515 face away from each other. This structure is simple and easy to install.

[0048] The preferred embodiments of the present invention have been described in detail above, but the present invention is not limited to the embodiments described. Those skilled in the art can make various equivalent modifications or substitutions without departing from the spirit of the present invention, and these equivalent modifications or substitutions are all included within the scope defined by the claims of this application.

Claims

1. An exposure apparatus, comprising a frame (1), characterized in that, It also includes an illumination device (6), a support frame (2), a support assembly (3), a photomask (4), and a projection device (5). The illumination device (6) is mounted on the frame (1). The support frame (2) is mounted on the frame (1). The support frame (2) has a light-transmitting hole in the middle. The support assembly (3) is mounted on the support frame (2) and is located in the light-transmitting hole. The support assembly (3) separates the light-transmitting hole to form a first light-transmitting hole and a second light-transmitting hole arranged sequentially from left to right. The photomask (4) is mounted on the support frame (2). The illumination device (6) is used to illuminate the photomask (4). The support frame (2) and the support assembly (3) All are used to support the mask plate (4). The projection device (5) is set on the frame (1). The projection device (5) is set below the first light-transmitting hole and the second light-transmitting hole. The mask plate (4) is provided with a first mask pattern (41) and a second mask pattern (42). The first mask pattern (41) and the second mask pattern (42) are respectively set above the first light-transmitting hole and the second light-transmitting hole. The projection device (5) images the light passing through the first light-transmitting hole into a first light spot (71). The projection device (5) images the light passing through the second light-transmitting hole into a second light spot (72). The first light spot (71) and the second light spot (72) are spliced ​​together.

2. The exposure apparatus according to claim 1, characterized in that, The support assembly (3) includes a support beam (31), a slider (32), and two slide rails (33). The two slide rails (33) are respectively fixed on the support frame (2). The two slide rails (33) extend in the left and right directions respectively. The light-transmitting hole is set between the two slide rails (33). Two sliders (32) are provided. At least one slider (32) is provided on each slide rail (33). The two ends of the support beam (31) are respectively set on the two sliders (32). The sliders (32) are fixed to the slide rails (33) by screws.

3. The exposure apparatus according to claim 1, characterized in that, The projection device (5) includes a first offset mirror group (51), a second offset mirror group (52), and an exit mirror (53). The first offset mirror group (51) is disposed below the first light-transmitting hole, and the second offset mirror group (52) is disposed below the second light-transmitting hole. The first offset mirror group (51) is mounted on the frame (1), and the second offset mirror group (52) is mounted on the frame (1). The first offset mirror group (51) is used to receive light passing through the first light-transmitting hole and emit light to the exit mirror (53). The second offset mirror group (53) is used to receive light passing through the first light-transmitting hole and emit light to the exit mirror (53). The shifting mirror group (52) is used to receive the light passing through the second light-transmitting hole and emit the light to the exiting mirror (53). The exiting mirror (53) is used to receive the light emitted from the first shifting mirror group (51) and the second shifting mirror group (52) and emit the light downward. After passing through the first shifting mirror group (51), the light emitted from the exiting mirror (53) forms the first light spot (71) on the workpiece. After passing through the second shifting mirror group (52), the light emitted from the exiting mirror (53) forms the second light spot (72) on the workpiece.

4. The exposure apparatus according to claim 1, characterized in that, The first mask pattern (41) includes a first pattern and a second pattern. The first pattern and the second pattern are connected to form a rectangle. The second mask pattern (42) includes a third pattern and a fourth pattern. The third pattern and the fourth pattern are connected to form a rectangle. The second pattern and the third pattern are disposed between the first pattern and the fourth pattern. The second pattern and the third pattern are the same.

5. The exposure apparatus according to claim 1 or 4, characterized in that, The first light spot (71) is a first right-angled trapezoid, and the second light spot (72) is a second right-angled trapezoid. The hypotenuse of the first right-angled trapezoid and the hypotenuse of the second right-angled trapezoid are joined together, so that the first right-angled trapezoid and the second right-angled trapezoid are joined together to form a rectangle.

6. The exposure apparatus according to claim 3, characterized in that, The first offset mirror group (51) includes a first reflector (511), a second reflector (512), and a third reflector (513). The first reflector (511) is disposed below the first light-transmitting hole. The first reflector (511) is used to receive the light transmitted through the first light-transmitting hole and reflect it onto the second reflector (512). The first reflector (511) reflects light to the right front. The second reflector (512) receives the light emitted by the first reflector (511). The second reflector (512) reflects light downward to the third reflector (513). The third reflector (513) is disposed below the second reflector (512). The third reflector (513) reflects light backward to the exit mirror (53). The exit mirror (53) is located below the first reflector (511).

7. The exposure apparatus according to claim 6, characterized in that, The second offset mirror group (52) includes a fourth reflector (521), a fifth reflector (522), and a sixth reflector (523). The fourth reflector (521) is located below the second light-transmitting aperture. The fourth reflector (521) is used to receive the light transmitted through the second light-transmitting aperture and direct the light towards the fifth reflector (522) to the left front. After receiving the light emitted from the fourth reflector (521), the fifth reflector (522) reflects the light downwards to the sixth reflector (523). 23) The sixth reflector (523) is located below the fifth reflector (522). The sixth reflector (523) is located between the fourth reflector (521) and the exit mirror (53). The sixth reflector (523) is a light-transmitting mirror. The light emitted from the sixth reflector (523) intersects with the third reflector (513). The sixth reflector (523) receives the light emitted from the fifth reflector (522) and reflects it onto the exit mirror (53).

8. The exposure apparatus according to claim 7, characterized in that, The light reflected from the fifth reflector (522) is parallel to the light reflected from the second reflector (512).

9. The exposure apparatus according to claim 6, characterized in that, The first offset mirror group (51) also includes a wedge mirror group, which is disposed between the second reflector (512) and the third reflector (513). The light emitted from the second reflector (512) passes through the wedge mirror group and the third reflector (513) in sequence. The wedge mirror group is used to shift the light to the right.

10. The exposure apparatus according to claim 9, characterized in that, The wedge mirror assembly includes a distance adjustment device, a first wedge mirror (514), and a second wedge mirror (515). The first wedge mirror (514) and the second wedge mirror (515) are respectively disposed on the distance adjustment device. The distance adjustment device is used to adjust the distance between the first wedge mirror (514) and the second wedge mirror (515). The first wedge mirror (514) and the second wedge mirror (515) are centrally symmetrically arranged. The first wedge mirror (514) and the second wedge mirror (515) are arranged sequentially from top to bottom. The inclined surfaces of the first wedge mirror (514) and the second wedge mirror (515) are arranged facing away from each other.

Images