A method and system for double hidden color pattern processing

Abstract

The embodiment of the application provides a kind of double hidden color pattern processing method and system, belong to nanophotonics field.The method comprises: the color pattern to be processed is collated with the color library configured in advance, according to the corresponding relationship between processing parameter and color in the color library configured in advance, the processing parameter corresponding to each color in the color pattern to be processed is obtained, and the color pattern to be processed includes color picture and hidden picture;Based on processing parameter, using processing equipment, color picture and hidden picture are processed on substrate using different nanostructure shape and are handled, to obtain double hidden color pattern interwoven by color picture and hidden picture.By using the laser processing equipment of the nonlinear polymerization principle, the feasibility of color control is increased, the preparation difficulty of structural color material is reduced, and the use of chemical pigments is not required in the present application, avoiding the use of harmful chemicals and reducing the negative impact on the environment, improving production efficiency.

Description

Technical Field

[0001] This invention relates to the field of nanophotonics technology, and more specifically to a method and system for processing dual-hidden color patterns. Background Technology

[0002] Currently, the most widely used colors are chemical colors, such as the colors of fabrics and pigments. However, chemical dyes can pollute the environment, and chemical colors are also easily bleached under high temperatures and exposure to sunlight. Structural colors, on the other hand, are micro- and nano-structures that are produced by changes in light on the structure. Therefore, they have the characteristics of high brightness, high preservation, high resolution, and environmental friendliness.

[0003] Structural colors are primarily achieved through thin-film structures, photonic crystal structures, metallic nanostructures, and dielectric nanostructures. Thin-film and photonic crystal structures can be realized using atomic layer deposition (ALD), chemical vapor deposition (CVD), colloidal particle assembly, and spin coating. Metallic and dielectric nanostructures are mainly achieved through electron beam lithography. One existing technology uses grayscale lithography and vapor deposition techniques to fabricate structural colors using a Ni / SiO2 / Al structure; it designs a metal-insulator-metal nanoscale disk structure, enabling color display of individual nanodisks; and it uses self-assembled SiO2 particles to fabricate structural colors.

[0004] These technologies all have some insurmountable drawbacks, such as complex and expensive etching processes that make them difficult to widely adopt; the assembly methods require the prior synthesis of nanocolloidal particles with uniform particle size, and due to the instability of the assembly process, assembly defects cannot be avoided, which reduces production efficiency. Summary of the Invention

[0005] The purpose of this invention is to provide a method and system for processing double-hidden color patterns, which can solve all or at least part of the technical defects existing in the prior art.

[0006] To achieve the above objectives, embodiments of the present invention provide a method for processing dual-hidden color patterns, including:

[0007] The color pattern to be processed is compared with a pre-configured color library. Based on the correspondence between processing parameters and colors in the pre-configured color library, the processing parameters corresponding to each color in the color pattern to be processed are obtained.

[0008] Based on the processing parameters, using a laser processing device based on the principle of nonlinear polymerization, the color image and the hidden image are processed into different nanostructure shapes on a substrate coated with photoresist, and the substrate coated with photoresist is processed to obtain a double hidden color pattern in which the color image and the hidden image are intertwined.

[0009] Optionally, the processing parameters include at least one of the height, linewidth, shape, size, and array periodicity characteristics of the nanostructure, wherein the shape of the nanostructure includes at least one of lattice, cross, strip, grating, and mesh.

[0010] Optionally, the configuration process of the color library includes:

[0011] Design arrays with various sizes and periods, and utilize the characteristics of arrays with various sizes and periods to produce different colors;

[0012] The laser processing equipment based on the aforementioned nonlinear polymerization principle produces color plates for each size structure and each periodic array, respectively.

[0013] The color swatches are processed to obtain a color library containing the correspondence between processing parameters and colors.

[0014] Optionally, the method of generating different colors by utilizing array characteristics of multiple size structures and multiple periods includes: generating different colors by utilizing array characteristics of multiple size structures and multiple periods, and generating a color effect in the visible spectrum range under white light illumination.

[0015] Optionally, if the shape of the nanostructure is lattice-like or grating-like, the color swatch is processed to obtain a color library containing the correspondence between processing parameters and colors, including:

[0016] The color swatches were placed under white light to obtain images of different colors.

[0017] The color swatches of different colors are analyzed in image analysis software, and the colors corresponding to the diameter, height, period, and power of the nanostructure are read to form a dot matrix color database and a grating color database.

[0018] Optionally, the color pattern to be processed is compared with a pre-configured color library. Based on the correspondence between processing parameters and colors in the pre-configured color library, the processing parameters corresponding to each color in the color pattern to be processed are obtained, including:

[0019] Read the color of the corresponding pixel in the hidden image on the double hidden color pattern, and look up the raster parameter corresponding to the color from the raster color database;

[0020] Read the color of the corresponding pixel in the color image on the double hidden color pattern, and look up the corresponding dot matrix parameter from the dot matrix color database.

[0021] Optionally, under polarized light illumination, the darkness of the color image is increased.

[0022] Optionally, under unpolarized illumination conditions, the color of the hidden image is consistent with the color of the background light; under polarized illumination conditions, the brightness of the hidden image's color is related to the polarization direction.

[0023] Optionally, the substrate may include glass, metal, alloy, dielectric thin film, semiconductor, silicon wafer, crystal or plastic.

[0024] On the other hand, the present invention also provides a dual-concealed color pattern processing system, comprising:

[0025] The acquisition unit is used to compare the color pattern to be processed with a pre-configured color library, and obtain the processing parameters corresponding to each color in the color pattern to be processed according to the correspondence between processing parameters and colors in the pre-configured color library. The color pattern to be processed includes a color image and a hidden image.

[0026] The processing unit is used to process the color image and the hidden image into different nanostructure shapes on a photoresist-coated substrate using a laser processing device based on the nonlinear polymerization principle, based on the processing parameters, and to process the photoresist-coated substrate to obtain a double hidden color pattern in which the color image and the hidden image are intertwined.

[0027] The above technical solution employs a laser processing device based on the nonlinear polymerization principle, characterized by high precision, programmable control, and adjustable power. This simplifies the preparation of structural color materials, improves the accuracy of color control, and reduces the difficulty of preparing structural color materials. Furthermore, unlike traditional pigment and dye preparation methods, this application does not require the use of chemical pigments or dyes, thereby avoiding the use of harmful chemicals and reducing negative environmental impacts. The photoresist preparation process is also more precise and controllable, reducing resource waste and improving production efficiency.

[0028] Other features and advantages of the embodiments of the present invention will be described in detail in the following detailed description section. Attached Figure Description

[0029] The accompanying drawings are provided to further illustrate embodiments of the present invention and form part of the specification. They are used together with the following detailed description to explain the embodiments of the present invention, but do not constitute a limitation thereof. In the drawings:

[0030] Figure 1 This is a flowchart illustrating an embodiment of a dual-hidden color pattern processing method provided by this invention.

[0031] Figure 2This is a schematic diagram of a laser processing device using the principle of nonlinear polymerization for printing, provided in an embodiment of the present invention.

[0032] Figure 3 This is a schematic diagram of a pattern laser processing structure design provided by an embodiment of the present invention;

[0033] Figure 4 This is an experimental effect diagram of a colored pattern provided in an embodiment of the present invention;

[0034] Figure 5 This is an experimental effect diagram of a hidden pattern provided in an embodiment of the present invention;

[0035] Figure 6 This is an experimental effect diagram of another colored pattern provided in an embodiment of the present invention;

[0036] Figure 7 This is the embodiment of the present invention and Figure 6 An experimental result diagram of a corresponding hidden pattern;

[0037] Figure 8 This is a schematic diagram of the structure of a dual hidden color pattern processing system provided in an embodiment of the present invention.

[0038] Explanation of reference numerals in the attached figures

[0039] 1 objective lens 2 ultrashort laser pulse beam

[0040] 3-nanometer array structure with 4 focused light spots

[0041] 5 photoresist 6 substrate Detailed Implementation

[0042] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit the scope of the present invention.

[0043] See Figure 1 The diagram shown is a flowchart of a dual-hidden color pattern processing method provided in an embodiment of the present invention, including the following execution steps:

[0044] Step 100: Compare the color pattern to be processed with the pre-configured color library, and obtain the processing parameters corresponding to each color in the color pattern to be processed according to the correspondence between processing parameters and colors in the pre-configured color library.

[0045] The colored pattern to be processed includes a colored image and a hidden image.

[0046] In some embodiments, the processing parameters include at least one of the height, linewidth, shape, size, and array periodicity characteristics of the nanostructure, wherein the shape of the nanostructure includes at least one of lattice, cross, strip, grating, and mesh.

[0047] In some implementations, the color library is pre-configured according to the following steps:

[0048] S1: Design arrays with various sizes and periods to generate different colors by utilizing the characteristics of arrays with various sizes and periods.

[0049] In some implementations, arrays of various sizes include, but are not limited to, nanometer-scale to micrometer-scale structures.

[0050] In some implementations, the array characteristics of multiple size structures and multiple periods are used to generate different colors under white light illumination, producing a color effect in the visible spectrum range.

[0051] S2: A laser processing device based on the aforementioned nonlinear polymerization principle produces color plates for each size structure and each periodic array, respectively.

[0052] S3: Process the color swatch to obtain a color library containing the correspondence between processing parameters and colors.

[0053] In some embodiments, if the nanostructure is lattice-like or grating-like, the color swatch is processed to obtain a color library containing the correspondence between processing parameters and colors, including:

[0054] The color swatches are placed under white light to acquire images of different colors. These images are then analyzed using image analysis software to determine the corresponding diameter, period, and power of the nanostructures, thus forming a dot matrix color database and a grating color database. In this embodiment, the dot matrix structure has a diameter of 300nm-1000nm, a height of 800nm-1500nm, and a period of 500nm-3500nm; the grating structure has a linewidth of 200nm-800nm, a height of 800nm-1500nm, and a period of 800nm-3500nm. The dimensions of these structures can be varied over a wider range according to the needs of specific applications to adapt to various color pattern production requirements.

[0055] In some implementations, the color pattern to be processed includes a color image and a hidden image. When performing step 100, the following steps may be specifically executed:

[0056] S1000: Read the color of the corresponding pixel of the hidden image on the double hidden color pattern, and look up the raster parameter corresponding to the color from the raster color database.

[0057] In some implementations, under unpolarized illumination conditions, the color of the hidden image is consistent with the color of the background light to achieve concealment; under polarized illumination conditions, the brightness of the hidden image's color is related to the polarization direction.

[0058] S1001: Read the color of the corresponding pixel in the color image on the double hidden color pattern, and search for the corresponding dot matrix parameter from the dot matrix color database.

[0059] In some implementations, the darkness of the color image increases under polarized light illumination conditions; in some practical applications, the colors of the color image darken under polarized light illumination conditions.

[0060] Step 101: Based on the processing parameters, using a laser processing device based on the principle of nonlinear polymerization, the color image and the hidden image are processed into different nanostructure shapes on a substrate coated with photoresist, and the substrate coated with photoresist is processed to obtain a double hidden color pattern in which the color image and the hidden image are intertwined.

[0061] In some embodiments, the substrate includes glass, metal, alloy, dielectric thin film, semiconductor, silicon wafer, crystal, or plastic.

[0062] In some implementations, a method for creating a double-hidden color pattern is achieved through the following steps:

[0063] Different nanoscale structures with varying parameters and arrays with different periods are designed to generate different colors by utilizing the structural and array characteristics of these different parameters. The nanoscale structures range in size from nanometer to micrometer and include, but are not limited to, various shapes such as lattice, cross, strip, grating, and mesh. In this embodiment, the design parameters are selected as follows: for the lattice structure, the diameter is 300nm-1000nm, the height is 800nm-1500nm, and the period is 500nm-3500nm; for the grating structure, the linewidth is 200nm-800nm, the height is 800nm-1500nm, and the period is 800nm-3500nm. The dimensions of these structures can be varied within a wider range according to the needs of specific applications to adapt to various color pattern production requirements.

[0064] Based on the designed lattice and grating array parameters, fabrication path parameters that can be recognized by the processing equipment are generated. These processing parameters include, but are not limited to, the height, linewidth, structural dimensions, and array periodicity of the nanostructure. The specific values ​​of these processing parameters can be adjusted and optimized according to the needs of specific applications to achieve the fabrication of different nanostructures and periodic arrays.

[0065] These nanoscale structures and periodic arrays are fabricated using laser processing equipment based on the principle of nonlinear polymerization, thereby obtaining color charts corresponding to different nanostructures and periodic arrays and different colors. The laser processing equipment used is PROME from MagicTech Nano, equipped with an adjustable real-time interface tracking module. Utilizing advanced optical system design and a self-developed motion control algorithm, it can achieve in-situ measurement with the probe light and processing light coaxially, ensuring positional accuracy during processing. The objective lens focusing depth can be adjusted simultaneously with interface tracking to meet the needs of structures with different processing heights. It features real-time optical calibration and one-click automatic leveling, eliminating concerns about long-term processing errors and promoting stable processing over extended periods. It also includes a laser energy stabilization system that automatically calibrates laser energy fluctuations, ensuring constant laser energy and consistent processing.

[0066] like Figure 2 The diagram illustrates a laser processing device using a nonlinear polymerization principle for printing, according to an embodiment of the present invention. The specific processing steps are as follows: A substrate 6 is taken, which may include various materials such as glass, metal, alloy, dielectric film, semiconductor, silicon wafer, crystal, plastic, etc. These materials can be transparent or opaque. In this embodiment, a glass sheet or silicon wafer is used as the substrate. Then, ATP-DIP photoresist 5 is applied. The photoresist 5 must possess the following characteristics: optical properties suitable for nanostructure fabrication to optimize the optical performance of the nanostructure; photoresist curing properties adapted to the laser processing equipment; good chemical development properties to remove unwanted portions of the photoresist 5 during the fabrication process, thereby forming the desired nanostructure; and sufficient chemical and physical stability to withstand the chemical development process, ensuring the quality and stability of the pattern.

[0067] This method utilizes a micro / nano structure array formed on a substrate using photoresist to achieve structural colors with pure physical colors. Compared to existing pigment and dye preparation methods, this method offers significant advantages in terms of environmental friendliness. Unlike traditional pigment and dye preparation methods, this method eliminates the need for chemical pigments or dyes, thus avoiding the use of harmful chemicals. This reduces negative environmental impact and helps reduce the generation of hazardous waste, aligning with green environmental principles. Furthermore, the photoresist-based preparation process is more precise and controllable, reducing resource waste and improving production efficiency.

[0068] The specific processing principle is multiphoton or two-photon polymerization. The objective lens 1 focuses the ultrashort laser pulse beam 2 into a spot, causing the photoresist 5 to undergo nonlinear multiphoton polymerization and absorption at the laser focal point (focused spot 4). This makes the volume of a single exposure reach below the ordinary physical limit. The focused spot 4 moves in three dimensions with nanometer precision in the photoresist, realizing any designed shape and structure at the nanometer scale. Ultimately, this achieves the production of any designed three-dimensional materials and structures with nanometer precision (i.e., nanoarray structure 3).

[0069] By employing a two-photon laser direct writing method, highly precise three-dimensional fabrication of nanoarrays can be achieved. Accurate control of the two-photon laser parameters allows for efficient management of the color of structural color materials, thus meeting diverse application requirements. Compared to traditional methods, this method offers greater flexibility in color control, enabling more diverse designs. Furthermore, the two-photon laser direct writing system features high precision, programmable control, and adjustable power. Compared to traditional optical crystal fabrication methods, this method offers significant advantages in the preparation of structural color materials. This advantage simplifies the preparation of structural color materials and increases the feasibility of color control.

[0070] After processing, corresponding chemical reagents are used for development, resulting in a color chart. This chart primarily utilizes a laser direct-writing processing device based on the principle of nonlinear polymerization to fabricate a nanoarray structure with gradually varying power and periodicity on a substrate material. Each processing area under preset processing parameters is arranged in a regular, periodic pattern. The color chart is observed under white light using a microscope, and images of different colors are saved to a computer. The software analyzes the color chart images, extracting the colors and reading the colors corresponding to the diameter, period, and power, forming a dot matrix color database and a grating color database. The dot matrix structure has 726 colors corresponding to 726 parameters, and the grating structure has 264 colors corresponding to 264 parameters. The processing parameters consist of diameter, height, period, power, etc. Furthermore, the dot matrix color database and the grating color database correspond one-to-one with the processing parameters.

[0071] The process involves comparing the desired colored pattern with a color library to convert the required colors into parameters corresponding to laser processing. After designing the colored and hidden images to be processed, the hidden image is read to determine the color that the corresponding pixel should display on the colored image. The raster parameters corresponding to this color are then retrieved from the raster color database, and this part is replaced with the raster image. The power parameters are represented by the grayscale of the raster image. For the remaining colored parts, the corresponding parameters for the colors of the pixels in this part are retrieved from the dot matrix database and replaced with the dot matrix.

[0072] The processing software reads the processed image and plans the laser path to be processed on the image. For example... Figure 3The diagram illustrates a pattern laser processing structure design according to an embodiment of the present invention. Based on corresponding processing parameters, a laser processing device based on the principle of nonlinear polymerization is used to process the pattern onto a substrate coated with photoresist. After chemical treatment of the photoresist, a pattern with color and hidden polarization sensitivity is obtained. Figure 4 The image shown is an experimental result of a colored pattern provided by an embodiment of the present invention. Figure 5 This is an experimental effect diagram of a hidden pattern provided in an embodiment of the present invention. For example... Figure 6 The image shown is an experimental result of another colored pattern provided in an embodiment of the present invention. Figure 7 The embodiments of the present invention provide and Figure 6 The image shows the experimental results of a hidden pattern. Under white light illumination, the colored pattern, excluding the portion containing the hidden information, darkens under polarized light. The hidden pattern is written using a polarization-sensitive structure array, displaying the same color as the background light under unpolarized white light illumination, thus achieving concealment. However, under polarized light illumination, the pattern's color and brightness are related to the polarization direction. The final result is an optically encrypted color image containing both types of information.

[0073] See Figure 8 As shown in the diagram, this embodiment of the invention also provides a structural schematic of a dual-hidden color pattern processing system, comprising:

[0074] The acquisition unit 800 is used to compare the color pattern to be processed with a pre-configured color library, and obtain the processing parameters corresponding to each color in the color pattern to be processed according to the correspondence between processing parameters and colors in the pre-configured color library. The color pattern to be processed includes color images and hidden images.

[0075] The processing unit 801 is used to process the color image and the hidden image with different nanostructure shapes on a photoresist-coated substrate using a laser processing device based on the nonlinear polymerization principle, based on the processing parameters, and to process the photoresist-coated substrate to obtain a double hidden color pattern in which the color image and the hidden image are intertwined.

[0076] Those skilled in the art will understand that embodiments of this application can be provided as methods, systems, or computer program products. Therefore, this application can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, this application can take the form of a computer program product embodied on one or more computer-usable storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0077] This application is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of this application. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart... Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0078] These computer program instructions may also be stored in a computer-readable storage medium that can direct a computer or other programmable data processing device to function in a particular manner, such that the instructions stored in the computer-readable storage medium produce an article of manufacture including instruction means, which are implemented in a process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0079] These computer program instructions may also be loaded onto a computer or other programmable data processing equipment to cause a series of operational steps to be performed on the computer or other programmable equipment to produce a computer-implemented process, thereby providing instructions that execute on the computer or other programmable equipment for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 The steps of the function specified in one or more boxes.

[0080] In a typical configuration, a computing device includes one or more processors (CPU), input / output interfaces, network interfaces, and memory.

[0081] Memory may include non-persistent memory in computer-readable media, such as random access memory (RAM) and / or non-volatile memory, such as read-only memory (ROM) or flash RAM. Memory is an example of computer-readable media.

[0082] Computer-readable media includes both permanent and non-permanent, removable and non-removable media that can store information using any method or technology. Information can be computer-readable instructions, data structures, modules of programs, or other data. Examples of computer storage media include, but are not limited to, phase-change memory (PRAM), static random access memory (SRAM), dynamic random access memory (DRAM), other types of random access memory (RAM), read-only memory (ROM), electrically erasable programmable read-only memory (EEPROM), flash memory or other memory technologies, CD-ROM, digital versatile optical disc (DVD) or other optical storage, magnetic tape, magnetic magnetic disk storage or other magnetic storage devices, or any other non-transferable medium that can be used to store information accessible by a computing device. As defined herein, computer-readable media does not include transient computer-readable media, such as modulated data signals and carrier waves.

[0083] It should also be noted that the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus. Unless otherwise specified, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element.

[0084] The above are merely embodiments of this application and are not intended to limit the scope of this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of the claims of this application.

Claims

1. A method for processing a double-hidden color pattern, characterized in that, include: The colored pattern to be processed is compared with a pre-configured color library. Based on the correspondence between processing parameters and colors in the pre-configured color library, the processing parameters corresponding to each color in the colored pattern to be processed are obtained. The colored pattern to be processed includes colored images and hidden images. Based on the processing parameters, using a laser processing device based on the principle of nonlinear polymerization, the color image and the hidden image are processed into different nanostructure shapes on a substrate coated with photoresist, and the substrate coated with photoresist is processed to obtain a double hidden color pattern in which the color image and the hidden image are intertwined. The processing parameters include at least one of the height, linewidth, shape, size, and array periodicity characteristics of the nanostructure, wherein the shape of the nanostructure includes at least one of lattice, cross, strip, grating, and mesh. The configuration process for the color library includes: Design arrays with various sizes and periods, and utilize the characteristics of arrays with various sizes and periods to produce different colors; The laser processing equipment based on the aforementioned nonlinear polymerization principle produces color plates for each size structure and each periodic array, respectively. The color swatches are processed to obtain a color library containing the correspondence between processing parameters and colors; If the nanostructure has a lattice or grating shape, the color swatch is processed to obtain a color library containing the correspondence between processing parameters and colors, including: The color swatches were placed under white light to obtain images of different colors. The color swatches of different colors are analyzed in image analysis software, and the colors corresponding to the diameter, height, period and power of the nanostructure are read to form a dot matrix color database and a grating color database. The step of comparing the color pattern to be processed with a pre-configured color library, and obtaining the processing parameters corresponding to each color in the color pattern to be processed according to the correspondence between processing parameters and colors in the pre-configured color library, includes: Read the color of the corresponding pixel in the hidden image on the double hidden color pattern, and look up the raster parameter corresponding to the color from the raster color database; Read the color of the corresponding pixel in the color image on the double hidden color pattern, and look up the dot matrix parameter corresponding to the color from the dot matrix color database; The lattice structure has a diameter of 300nm-1000nm, a height of 800nm-1500nm, and a period of 500nm-3500nm; the grating structure has a linewidth of 200nm-800nm, a height of 800nm-1500nm, and a period of 800nm-3500nm.

2. The method for processing dual hidden color patterns according to claim 1, characterized in that, The method of generating different colors using array characteristics of various sizes and periods includes: Different colors are generated by using arrays with various sizes and periods, and under white light illumination, a color effect is produced within the visible spectrum.

3. The method for processing dual hidden color patterns according to claim 1, characterized in that, Under polarized light illumination, the darkness of the color image increases.

4. The method for processing dual hidden color patterns according to claim 1, characterized in that, Under unpolarized illumination, the color of the hidden image is consistent with the color of the background light; under polarized illumination, the brightness of the hidden image's color is related to the polarization direction.

5. The method for processing a double-hidden color pattern according to claim 1, characterized in that, The substrate may be glass, metal, alloy, dielectric thin film, semiconductor, silicon wafer, crystal or plastic.

6. A dual-concealed color pattern processing system, characterized in that, include: The acquisition unit is used to compare the color pattern to be processed with a pre-configured color library, and obtain the processing parameters corresponding to each color in the color pattern to be processed according to the correspondence between processing parameters and colors in the pre-configured color library. The color pattern to be processed includes a color image and a hidden image. The processing unit is used to process the color image and the hidden image with different nanostructure shapes on a photoresist-coated substrate using a laser processing device based on the nonlinear polymerization principle, based on the processing parameters, and to process the photoresist-coated substrate to obtain a double hidden color pattern in which the color image and the hidden image are intertwined. The processing parameters include at least one of the height, linewidth, shape, size, and array periodicity characteristics of the nanostructure, wherein the shape of the nanostructure includes at least one of lattice, cross, strip, grating, and mesh. The configuration process for the color library includes: Design arrays with various sizes and periods, and utilize the characteristics of arrays with various sizes and periods to produce different colors; The laser processing equipment based on the aforementioned nonlinear polymerization principle produces color plates for each size structure and each periodic array, respectively. The color swatches are processed to obtain a color library containing the correspondence between processing parameters and colors; If the nanostructure has a lattice or grating shape, the color swatch is processed to obtain a color library containing the correspondence between processing parameters and colors, including: The color swatches were placed under white light to obtain images of different colors. The color swatches of different colors are analyzed in image analysis software, and the colors corresponding to the diameter, height, period and power of the nanostructure are read to form a dot matrix color database and a grating color database. The step of comparing the color pattern to be processed with a pre-configured color library, and obtaining the processing parameters corresponding to each color in the color pattern to be processed according to the correspondence between processing parameters and colors in the pre-configured color library, includes: Read the color of the corresponding pixel in the hidden image on the double hidden color pattern, and look up the raster parameter corresponding to the color from the raster color database; Read the color of the corresponding pixel in the color image on the double hidden color pattern, and look up the dot matrix parameter corresponding to the color from the dot matrix color database; The lattice structure has a diameter of 300nm-1000nm, a height of 800nm-1500nm, and a period of 500nm-3500nm; the grating structure has a linewidth of 200nm-800nm, a height of 800nm-1500nm, and a period of 800nm-3500nm.

Images